Patent Application
20100164128
This invention describes apparatus for the fabrication of ophthalmic lens molds and mold inserts and, more specifically, in some embodiments, the formation of an ophthalmic lens mold with a free form surface.
It is known to fabricate ophthalmic lens mold parts via injection molding techniques, wherein the resulting lens mold parts can be used to cast molding techniques in which a monomer material is deposited in a cavity defined between optical surfaces of two or more opposing mold parts. Multi-part molds used to fashion hydrogels into a useful article, such as an ophthalmic lens, can include for example, a first mold part with a convex portion that corresponds with a back curve of an ophthalmic lens and a second mold part with a concave portion that corresponds with a front curve of the ophthalmic lens.
It is desirable therefore to have additional methods and apparatus conducive to the formation of an ophthalmic lens of a predetermined size and shape such that it can be customized to one or both of a specific patient or purpose.
The present invention is directed to an ophthalmic lens including mold part with a first portion that includes multiple voxels of polymerized crosslinkable material and a second portion with a layered volume of crosslinkable material polymerized above a gel point.
Generally, a Reactive Mixture including a photoabsorptive component is exposed to a source of actinic radiation to form a mold part useful for forming a cast molded ophthalmic lens or a lens. In some embodiments, at least a portion of the mold part includes an arcuate surface with an optical quality surface. The actinic radiation is controllable to cure a portion of the Reactive Mixture in a predefined pattern. The predefined pattern can include one surface formed along an optical quality substrate surface and a second surface is free formed within the volume of Reactive Mixture.
Voxels of polymerized lens mold material are formed via exposure of a crosslinkable material to multiple rays of actinic radiation, each ray of actinic radiation originating from a source and reflected towards a predetermined portion of the reactive mixture for a predetermined amount of time. Each ray of actinic radiation can be reflected towards a predetermined portion of the Reactive Mixture for a predetermined amount of time comprising a predetermined wavelength. In some embodiments, the second portion is formed via exposure of a Reactive Mixture to multiple rays of actinic radiation originating from multiple points.
In some embodiments, a mold part can be formed from a Mold Precursor comprising both fluent and structural regions. In a preferred embodiment, the structural regions are in large part determined by the operation of the Voxel lithographic section; however the fluent region can be determined in numerous ways while also being influenced by the Voxel lithographic section. Alternative embodiments may form a lens from the effect of the Voxel lithographic section without going through the Lens Precursor intermediate product.
The present invention provides for methods and apparatus for forming a Mold Part and for forming a Mold Precursor. In the following sections, detailed descriptions of embodiments of the invention will be given. The description of both preferred and alternative embodiments though thorough, are exemplary embodiments only, and it is understood that to those skilled in the art that variations, modifications and alterations may be apparent. It is therefore to be understood that the exemplary embodiments do not limit the broadness of the aspects of the underlying invention as defined by the claims.
In this description and claims directed to the presented invention, various terms may be used for which the following definitions will apply:
“Actinic Radiation” as used herein, refers to radiation that is capable of initiating a chemical reaction.
“Arcuate” as used herein, refers to a curve or bend like a bow.
“Beer's Law” as referred to herein, and sometimes referred to as “Beers-Lambert Law” is: I(x)/I0=exp (-αcx), wherein I(x) is the intensity as a function of distance x from the irradiated surface, I0 is the incident intensity at the surface, α is the absorption coefficient of the absorbing component, and c is the concentration of the absorbing component.
“Collimate” as used herein, means to limit the cone angle of radiation, such as light that proceeds as output from an apparatus receiving radiation as an input; in some embodiments the cone angle may be limited such that proceeding light rays are parallel. Accordingly, a “collimator” includes an apparatus that performs this function and “collimated” describes the effect on radiation.
“DMD” as used herein, refers to a digital micromirror device which is a bistable spatial light modulator consisting of an array of movable micromirrors functionally mounted over a CMOS SRAM. Each mirror is independently controlled by loading data into the memory cell below the mirror to steer reflected light, spatially mapping a pixel of video data to a pixel on a display. The data electrostatically controls the mirror's tilt angle in a binary fashion, where the mirror states are either +X degrees (on) or −X degrees (off). For current devices, X can be either 10 degrees or 12 degrees (nominal). Light reflected by the on mirrors then is passed through a projection lens and onto a screen. Light is reflected off to create a dark field, and defines the black-level floor for the image. Images are created by gray-scale modulation between on and off levels at a rate fast enough to be integrated by the observer. The DMD (digital micromirror device) is sometimes DLP projection systems.
“DMD Script” as used herein, shall refer to a control protocol for a spatial light modulator and also to the control signals of any system component, such as, for example, a light source or filter wheel either of which may include a series of command sequences in time. Use of the acronym DMD is not meant to limit the use of this term to any one particular type or size of spatial light modulator.
“Fixing Radiation” as used herein, refers to Actinic Radiation sufficient to one or more of: polymerizing and crosslinking essentially all Reactive Mixture comprising a Lens Precursor or lens.
“Fluent Lens Reactive Media” as used herein, means a Reactive Mixture that is flowable in either its native form, reacted form, or partially reacted form and is formed upon further processing into a part of an ophthalmic lens.
“Free-form” as used herein, refers to a surface that is formed by the crosslinking of a Reactive Mixture and is not shaped according to a cast mold.
“Gel Point” as used herein, shall refer to the point at which a gel or insoluble fraction is first observed. Gel point is the extent of conversion at which the liquid polymerization mixture is crosslinked to the extent that it becomes a solid. Gel point can be determined using a soxhlet experiment: Polymer reaction is stopped at different time points and the resulting polymer is analyzed to determine the weight fraction of residual insoluble polymers. The data can be extrapolated to the point where no gel is present. This point where no gel is present is the gel point. The gel point may also be determined by analyzing the viscosity of the reaction mixture during the reaction. The viscosity can be measured using a parallel plate rheometer, with the reaction mixture between the plates. At least one plate should be transparent to radiation at the wavelength used for polymerization. The point at which the viscosity approaches infinity is the gel point. Gel point occurs at the same degree of conversion for a given polymer system and specified reaction conditions.
“Lens” as used herein, refers to any ophthalmic device that resides in or on the eye. These devices can provide optical correction or may be cosmetic. For example, the term “lens” can refer to a contact lens, intraocular lens, overlay lens, ocular insert, optical insert or other similar device through which vision is corrected or modified, or through which eye physiology is cosmetically enhanced (e.g. iris color) without impeding vision. In some embodiments, the preferred lenses of the invention are soft contact lenses made from silicone elastomers or hydrogels, which include but are not limited to silicone hydrogels, and fluorohydrogels.
“Mold Precursor” as used herein, means a composite object consisting of a Mold Precursor Form and a Fluent Lens Reactive Mixture in contact with the Mold Precursor Form. For example, in some embodiments Fluent Reactive Media is formed in the course of producing a Lens Precursor Form within a volume of Reactive Mixture. Separating the Lens Precursor Form and adhered Fluent Lens Reactive Media from a volume of Reactive Mixture used to produce the Lens Precursor Form can generate a Lens Precursor. Additionally, a Lens Precursor can be converted to a different entity by either the removal of significant amounts of Fluent Lens Reactive Mixture or the conversion of a significant amount of Fluent Lens Reactive Media into non-fluent incorporated material.
“Mold Precursor Form” as used herein, means a non-fluent object with at least one optical quality surface which is consistent with being incorporated upon further processing into an ophthalmic lens Mold Part.
“Reactive Mixture” as used herein, may be interchangeably used with “reactive monomer mixture” or “crosslinkable material” referring to a monomer or prepolymer material which can be cured and/or crosslinked to form an ophthalmic lens Mold Part or portion of an ophthalmic lens Mold Part. Various embodiments can include lens forming mixtures with one or more additives such as: UV blockers, tints, photoinitiators or catalysts, and other additives one might desire in an ophthalmic lenses such as, contact or intraocular lenses.
“Mold” as used herein, refers to a rigid or semi-rigid object that may be used to form lenses from uncured formulations. Some preferred molds include two mold parts forming a front curve mold part and a back curve mold part.
“Radiation Absorbing Component” as used herein, refers to a radiation-absorbing component which can be combined in a reactive monomer mix formulation and which can absorb radiation in a specific wavelength range.
“Stereolithographic Mold Precursor” as used herein, means a Mold Precursor wherein the Lens Precursor Form has been formed by use of a stereolithographic technique.
“Substrate” as used herein, means a physical entity upon which other entities are placed or formed.
“Voxel” or “Actinic Radiation Voxel” as used herein is a volume element, representing a value on a regular grid in three-dimensional space. A Voxel can be viewed as a three dimensional pixel; however, wherein a pixel represents 2D image data, a Voxel includes a third dimension. In addition, wherein Voxels are frequently used in the visualization and analysis of medical and scientific data, in the present invention, a Voxel is used to define the boundaries of an amount of actinic radiation reaching a particular volume of Reactive Mixture, thereby controlling the rate of crosslinking or polymerization of that specific volume of Reactive Mixture. By way of example, Voxels are considered in the present invention as existing in a single layer conformal to a 2-D mold surface wherein the Actinic Radiation may be directed normally to the 2-D surface and in a common axial dimension of each Voxel. As an example, specific volume of Reactive Mixture may be crosslinked or polymerized according to 768×768 Voxels.
“Xgel” as used herein, is the extent of chemical conversion of a crosslinkable Reactive Mixture at which the gel fraction becomes greater than zero.
Voxel-based lithography methods include inputting Mold parameters into a computer or other processor for executing an algorithmic calculation. An algorithm takes the above-mentioned input parameters. A series of “frames” may now be determined for the exposure “movie” or script that will be communicated to the spatial light modulator.
There may also be numerous methodologies that can be used to convert an algorithmic output for a particular voxel element into the planned light reflection profile in time that would include the “DMD” script. By way of example, a total intensity value desired by the algorithm may be delivered to a voxel location at the reactive mixture as a series of time steps where the input intensity of the light illumination systems is reflected during the entire time. The integrated intensity of full “on” steps may then be supplemented by another time step where a partial value is written to the mirror element and thus the mirror has a duty cycle “On” level which is generally less than full on, for the remaining time steps that will be exposed to the reactive mixture as a whole. This particular voxel element could then be “off” for the remaining duration. An alternative methodology may include taking the average value of intensity for the number of steps or “frames” that will be delivered and using that value to set the bulk of the frame values that are sent to the DMD. It may be clear to one in the art, that the generality of spatial light modulators discussed in the previous apparatus discussion, as well, have methodology embodiments to correlate with the intent of creating this intensity and time exposure control.
While the above described methods are given examples relating to modulating a fixed intensity applied to the spatial illumination device through the action of the spatial illumination device, more advanced methodologies may derive if the intensity from the light source is modulated either at the source or in the optic system with light filtration. Further embodiments may derive from the combination of intensity control both in the illumination system components and in the spatial illumination modulator. Still further embodiments may derive from the control of the wavelength of illumination.
The method of forming the “DMD” script, which from a general sense should be considered to relate to control signals to any spatial light modulator of any size and also to the control signals of any system component, as for example the light source, filter wheel and the like, may therefore, in general include creating a series of programmed command sequences in time. It may be obvious to one skilled in the art that there are numerous embodiments relating to the method of creating a control signal program that encompass the many embodiments of the details of the actinic radiation, of the details of the optic system employed and of the details of materials comprising the Reactive Mixture.
It may be noticed that the details of a “DMD” script and the algorithms may have relationship to results obtained after processing. The feedback of critical parameters will be discussed later, and such detailed discussion is thus deferred. Nevertheless, in terms of the method of creation of a DMD script, the double headed arrows pointing to and from the voxel based lithography methodology and feedback and metrology methodology refer in part to a role in this information exchange in the methods to create a DMD script.
Another input into the methodology of forming a Mold Precursor includes formulating and preparing a Reactive Mixture for the system. For example, chemical constituents acting as monomer units in the reactive mixture may include chemicals that are photoreactive to light in the ultraviolet spectrum, as has been described in some of the embodiments. However, unlike some other methodologies which do not consider the effects of the Beer-Lambert Law, Reactive Mixtures in the present invention include molecules which photoreactively absorb actinic radiation. Components within the system may likewise be tailored for consistency to another portion of the electromagnetic spectrum.
In some embodiments, Reactive Mixture includes one or more actinically reactive monomer types that are mixed with other chemical constituents. By way of non-limiting example, other chemicals may be included as absorbing compounds. Such an additive to the Reactive Mixture may be, for example, important in embodiments that operate the voxel-based lithography in such a manner that the intensity of the actinic radiation along a path defined by a voxel element may be modeled by the Beer-Lambert Law. One or more such components may largely define a thickness sensitivity of a formation process within a voxel element. In addition, some embodiments can include addition of a component to the Reactive Mixture that absorbs light within a relevant spectral region.
In other embodiments, an absorbing component of the Reactive Mixture may include additional complexity to that just discussed. For example, it is within the scope of some embodiments of the present invention that an actinic radiation absorber component may include multiple molecules that absorb light in differing manners and/or wavelengths. Additional embodiments may derive from absorber elements comprised of molecules that have multiple, relevant, bands of absorption themselves. Still further embodiments of methodology may include adding components to the Reactive Mixture that have a combined monomer and absorber role. This combined role in turn may, in some embodiments, also allow for a continued absorbance role even after a monomer undergoes chemical reaction. Alternatively, additional embodiments may include chemicals added to a Reactive Mixture which have one or more properties of altered absorbance as actinic reactions occur. From a general perspective, it may be clear that many embodiments for the methodology of comprising a Reactive Mixture with a constituent to absorb radiation at one or more relevant spectral bands may be within the scope of the invention.
Additional embodiments may derive if addition of an inhibitor component is included into the method of preparing a Reactive Mixture. In this sense, an inhibitor compound would have a role in reacting with a chemical product that has formed in the Reactive Mixture. In some embodiments, absorption of actinic radiation may generate one or more free radical chemical species. An inhibitor may act in reacting with the free radical species, and thereby, end a path of polymerizing reactions. One effect of such an embodiment would be to limit the duration of a photochemical polymerization reaction, or in other ways limit the distance that a polymerization reaction may occur away from the original photo absorption initiator event. In some embodiments, addition of an inhibitor to the Reactive Mixture, therefore, may have relevance on the spatial resolution that a collection of photons in a voxel element will ultimately reflect in the spatial localization of the reactions that they initiate. In general, the action of the inhibitor may include numerous embodiments relevant to the art.
The types of chemical species or components of the reactive mixture that may act in an inhibitory manner include numerous other embodiments of the art. As with the absorber, it is within the scope of the invention for an inhibitor to have dual roles, in inhibiting multiple polymerization pathways. Furthermore, an inhibitor may include a portion of a monomer molecule itself An inhibitor may have a thermal or photoreactive sensitivity. Still other embodiments may derive from the nature of the inhibitor in its pure chemical state as it may include a dissolved form in the mixture but exhibit gaseous, liquid or solid characteristics in its pure form.
The method of preparing a Reactive Mixture may have additional embodiments with respect to the addition of an initiator component. A Reactive Mixture may include a photoabsorptive component that, in absorbing a photon, generates a chemical species that precipitates a polymerization reaction. In some embodiments, an initiator may also include a molecule that absorbs significantly in a particular band. Further embodiments may occur with initiator molecules that are photoabsorptive in multiple relevant bands for the apparatus. Its absorption may include a relatively broad band of relevant frequencies as well. Still further embodiments are possible if the initiator component of the Reactive Mixture derives from chemical initiator reactivity residing in one or more of the monomer molecule types in the Reactive Mixture as well.
In some embodiments, Reactive Mixture contained in the reservoir can be equilibrated to have a desired concentration of dissolved oxygen or other gas. Equilibration may be accomplished, for example, by storing a vessel containing a volume of Reactive Mixture in an enclosure with an ambient atmosphere that includes a predetermined amount of oxygen (or other gas) present to equilibrate to the desired concentration when dissolved. Additional embodiments may include automated equipment that may exchange a correct amount of oxygen into a flowing Reactive Mixture via membrane technology. Other methods of incorporating dose the reactive mixture to a desired level of incorporated gas consistent with the scope of the invention.
In some embodiments, a volume of the dosed Reactive Mixture may now be transferred in a manual means into the reservoir comprising the vessel to contain the mixture in the proximity of the forming optic surface. Other embodiments may include automated mechanisms to fill the reservoir with the Reactive Mixture. Still further embodiments of the invention may include filling disposable vessels that may be used when needed for the Mold forming process. The invention scope includes using a methodology of some kind to fill the reservoir in proximity of the forming optic surface with at least an amount of Reactive Mixture that is greater than the amount of material which will include a formed Mold after all processing.
Generally, a Reactive Mixture includes an absorbing element such that there is a significant absorptive reduction of the intensity of actinic radiation directed into the Reactive Mixture based upon the depth that the imaged actinic radiation has passed through; as may in some embodiments be modeled with a Beer's law formalism.
In some embodiments, following the exposure of a volume of Reactive Mixture to a DMD script of actinic radiation, a forming optic through which the script was played will be removed from the remaining volume of Reactive Mixture. Some embodiments may include simply raising the forming optic from the reservoir of Reactive Mixture. In other embodiments, the reservoir may be lowered away from the forming optic. Various embodiments may also include the removal of a structure attached to the forming optic from the volume of Reactive Mixture. Structures may include, for example, a Mold Precursor Form, a Mold Precursor or a Mold.
Still further embodiments may derive from automating either the lowering or raising step with equipment capable of controlling the rate of such removal with some precision. In alternative embodiments, the reservoir of Reactive Mixture may be drained in some manner resulting in separation of the forming optic with attached Mold Precursor Form from the Reactive Mixture.
The present invention provides apparatus and methods of forming a Mold Part with multiple optic zones. The multiple optic zones include one or both of optical characteristics provided by a change in refractive index and a shape of a Mold area in the optic zone. In some embodiments, areas of different refractive index are spatially distributed within the optic zone to correspond with vision correction needs of a patient.
The present invention can utilize modulation of actinic radiation to create one or more areas of different refractive indices based on differential curing and also modulate the actinic radiation according to photo absorptive characteristics of a reactive mixture to form a surface with optical qualities. The invention, in a further aspect, provides a method of modulating or attenuating UV light to achieve differential curing of bulk reactive mixture material. Accordingly, some embodiments include two or more optical zones, wherein each optical zone may be formed by one or both of a different refractive index and a different optical curvature.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. Generally, the nomenclature used herein and the manufacturing procedures are well known and commonly employed in the art. Conventional methods are used for these procedures, such as those provided in the art and various general references. Where a term is provided in the singular, the inventors also contemplate the plural of that term.
A “crosslinkable and/or polymerizable material” refers to a material which can be polymerized and/or crosslinked by actinic radiation to obtain crosslinked and/or polymerized material which are biocompatible. Examples of actinic radiation are UV irradiation, ionized radiation (e.g. gamma ray or X-ray irradiation), microwave irradiation, and the like.
“Polymer” means a material formed by polymerizing one or more monomers.
A “prepolymer” refers to a starting polymer which can be polymerized and/or crosslinked upon actinic radiation to obtain a crosslinked polymer having a molecular weight much higher than the starting polymer.
The present invention is generally related to the manufacture and design of contact Molds. In one aspect, the present invention provides a method to produce a Mold optical zone with a desired power by modulating an energy source to create varying light intensity according to an illumination scheme. According to the present invention, the illumination scheme may be combined with photoabsorptive characteristics of a Reactive Mixture. A varied light intensity may differentially cure the Reactive Mixture to create a spatial distribution of refractive indices in the optical zone of a Mold within the cured Mold. The intensity of the energy source, such as UV light, for example, is varied to manipulate the optical wavefront. The optical wavefront may be manipulated according to a specified pattern, such as a Zernike polynomial basis set or a presbyopic aberration pattern. The optical wavefront may be derived from the aberrometry data, corneal topography data or calculated as with a presbyopic correction wavefront.
Some Mold designs included in the present invention may cancel or correct optical aberrations and defocus. Two basic methods for correcting defocus involve designing a Mold surface profile or by changing the index or indices of refraction by the cure. The present invention provides for spatially distributing an index or indices of refraction in an optical zone of a Mold to compensate for defects and design of a Mold surface together in one Mold. A Mold design may be pre-designed as a generic Mold or can be specially designed for a user. In a specific embodiment in which an ophthalmic Mold is designed for the user, an ophthalmic wavefront sensor may be used to measure the irregularities on the eye, such as for example, a Shack-Hartmann wavefront sensor.
Starting at the retina, an ideal wavefront is generated, which passes through the optical path of the eye. The wavefront sensor illuminates the fovea with a narrow-beam light source, typically a laser diode or an LED, and records the position of the scattered light through a lenslet array. As the wavefront (the optical wavefront of the electromagnetic wave from the optical element) exits the eye, it contains a complete map of the eye's aberrations for analysis by the sensor. The lenslet array breaks up the nearly collimated beam into points on a digital camera, typically a CCD or a CMOS imager. Once the wavefront is received by the sensor, a complex series of analyses may be performed to provide a more complete picture of the eye's optical path. The data may then be fit to a Zernike basis set.
After the optical and mechanical design for a contact Mold is completed, a Mold design is preferably in a neutral file format, for example, such as IGES or VDA, or in a proprietary file format. After the known defects are fit into a Zernike or similar mathematical representation, the mathematical representation is converted into optical power.
In a preferred embodiment of the present invention, the Reactive Mixture will cure based upon Mold design. The Mold design may thereby result in one or more optical zones of the Mold.
In another aspect of some embodiments of the present invention, formation of an ophthalmic Mold may be enhanced via metrology and feedback. One or more desired Mold parameters may be input from an external source. For exemplary purposes, the model of the Mold surface may come from an ocular measurement device applied to a patient's eye. A Mold Precursor may be formed on a voxel by voxel basis. A Mold and/or Mold Precursor may subsequently be processed with the Mold Precursor processing methodology to fashion a “dry” form of an ophthalmic Mold. A dry ophthalmic Mold may now be measured in a metrology step. For exemplary purposes, this step may include use of a laser displacement sensor.
Algorithms may process this data to compare the result to what would be expected if the Mold matched the input parameters. In some embodiments, differences from the input parameters may be processed and correspond with a need to change the parameters used to process the Mold in the voxel based lithography system. The data may also be processed and correspond to parameter changes desired in the Mold Precursor processing methodology. It may be apparent that the various computational and control methodology may be performed on various data processing equipment including but not limited to mainframes, personal computers, industrial computers and other similar computational environments.
In some slightly different embodiments, an additional type of measurement may gauge the quality aspects of the Mold for global equipment feedback. As a non-limiting example, a particulate detection scheme may be deployed in some embodiments to measure the presence of such defects in the produced Mold Precursor. If such a measurement gave a result flagging a particulate issue, there could be a feedback loop that might in some embodiments involve feedback to an operator of the apparatus and methodology to remedy the issue flagged. It may be obvious to one skilled in the art that numerous metrology embodiments may include art within the scope of this invention where a measurement result is feedback to an operator.
Referring now to
A spatial intensity controller 530, or collimator, may be used to condense, diffuse and, in some embodiments, collimate light from the light source to create a beam of light 540, which is highly uniform in intensity. Further, in some embodiments, the beam 540 impinges on a digital mirror device (“DMD”) 510 which divides the beam into pixel elements of intensity each of which can be assigned a digital ON or OFF value. The mirror at each pixel reflects light in one of two paths. An “ON” path, item 550, is the path that leads to photons proceeding toward a reactive chemical media.
Conversely, in some embodiments, an “OFF” state includes light being reflected along a different path that will lie between the paths depicted as items 516 and 517. An “OFF” path may be used to direct photons to impinge upon a beam dump 515 which functionally absorbs or otherwise entraps photons directed towards it.
Referring now again to the “ON” path 550, light depicted in the ON path may include many different potential pixel values that have been set to an “ON” value and which are spatially directed along an individual path corresponding to a pixel location. A time averaged intensity of each of the pixel elements along their respective paths 550, can be represented as a spatial intensity profile 560, across the spatial grid defined by the DMD 510.
Pixel elements in an ON state will have photons directed along their respective paths 550. In some embodiments, a light beam, or ray, may be focused by a focusing element. By way of example, light paths 550, may be imaged such that they impinge in a manner essentially normal or perpendicular to the surface manner upon the optic surface of a forming optic 580. Imaged light may proceed through a forming optic 580, and into a reservoir that contains reactive Mold mixture 590.
The interaction of a light ray associated with a given pixel location defines an ON state Voxel element in the volume of reactive media or crosslinkable material contained in the reservoir 590, and around the forming optic 580. Photons in this volume of reactive media may be absorbed and precipitate an actinic reaction in the molecule that absorbs it, leading to a polymerization state change of the monomer in the general vicinity of the molecule.
In some embodiments, an ambient environment, including temperature and humidity, encompassing apparatus 500 can be controlled. The nature of the ambient gaseous environment can be controlled, for example, through the use of purging nitrogen gas. Purging can be performed to increase or reduce oxygen partial pressure to predetermined levels. Humidity may also be maintained at relatively predetermined levels, such as at relatively lower levels than an office environment.
The level of vibrational energy that is allowed to interact with the individual apparatus components is another environmental parameter that may be controlled in some embodiments. In some embodiments, large massive support structures define a relative low vibrational environment. Other embodiments may include some or all of the Voxel-based lithographic system 500 to be supported upon active vibrational supports. Without limiting the generality of possible solutions, it is well known in the art that air bladder support pistons can significantly reduce vibrational transfer into an isolated system. Other standard means of vibrational isolation may as well be consistent with the scope of the invention.
Particulates in the environment of the apparatus may introduce undesirable defect modes of various types including incorporation into the product Mold Precursors and Molds. For example, in the optic path, particulates can modulate the actual intensity of one or more Voxel elements and/or affect the function of a particular mirror element. For these reasons, at a minimum, it is entirely within the scope of the invention to provide a means of controlling particulate matter in the environment. One example of an embodiment to achieve this would be the incorporation of high efficiency particulate air (HEPA) filters into the body of the apparatus environment and a means of forcing air through the filters sufficient to establish a laminar flow regime in exposed portions of the apparatus. Nevertheless, any embodiment to significantly limit particulate levels in and around the apparatus is within the intended scope of the invention.
Another aspect of the detailed environmental support for optical apparatus according to the present invention includes the ambient light and manners to control it. In some embodiments, ambient lighting provides actinic radiation and it is therefore prudent to limit stray sources of photon energy.
Accordingly, in some embodiments, apparatus 500 can be enclosed in opaque materials consistent with the previously discussed environmental needs. A preferred embodiment may employ the use of filtered light sources in the environment of the apparatus, which may be sufficient to avoid exposure of active portions of the apparatus to contaminating environmental lighting.
Referring now to
In some embodiments it is desirable for a light source 620 to provide light in a narrow spectral band. The components of an exemplary light system 600, provide the means of accomplishing said narrow spectral character. In a preferred embodiment, a light source 620 includes a light emitting diode, which exists in an environmental support and enclosure 610. For exemplary purposes, in some embodiments a light emitting diode source can include the model AccuCure ULM-2-365 light source with controller from Digital Light Lab Inc. (Knoxville, Tenn. USA) This model emits a narrow band of light centered around 365 nm and further having the characteristics of a full width at half maximum breadth of approximately 9 nm. Thus, this commercially available light source component already emits light in a desirable narrow band without further apparatus. It may be clear that any LED or other light emitting product with similar characteristics may also be utilized.
Alternatively, wider spectrum light sources, such as, for example carbon arc lamps or Xenon lamps may also be used. In this alternative, a broad band source can be utilized. Light emits out of the environmental container 610 and proceeds through a filter wheel 630 deployed on the light source 620. The filter wheel 630, can contain multiple, distinct filters 631, at different operational locations and these filters 631, may, for example, include a band pass filter that will transmit light centered at 365 nm with a full width at half maximum breadth of a similar 10 nm performance. In this embodiment, the filter wheel can be actuated by a motorized actuator 610 which can index the filter wheel to different filters; and therefore allow the exemplary Voxel-lithographic system embodiment to operate at multiple selectable wavelengths.
It may be clear that numerous alternative embodiments may easily derive, including in a non-limiting perspective, the fact that the filter 631 may be mounted in a fixed manner proximate to the wide band light source 620 and provide an appropriate embodiment. In another aspect, a multiple wavelength capability may be derived from an alternative embodiment where there are multiple LED light sources 620, in the environment 610 that are activated individually for a different wavelength.
More generally, it should be apparent that some embodiments may include various light sources, including, for example, incandescent, laser, light emitting and other analogous products with or without filters of various kinds. Additionally, in some embodiments, light sources capable of emitting light in a controlled spectral band can be utilized and are within the scope of this invention.
The light source 600, additionally may have the characteristic of being stable, uniform and relatively intense. In some preferred embodiments, an AccuCure LED light source 620, outputs intense light and includes an internal monitoring feedback loop to maintain a stable intensity over time periods.
A light source 620, can include means for modulating the intensity in a controlled manner; including modulating the source on and off with a defined duty cycle. Thus, over an integrated period of time, this mode of intensity control will result in selectable time averaged intensity levels. Alternatively, in an additional operational embodiment, the LED source can modulate intensity via a voltage controlled operational mode where the change in intensity occurs for the time independent level of emitted intensity.
For stability of the output of any light source component 620, additional features in the environment of the light source may include additional embodiment definitions. Examples of this aspect could include temperature control means via cooling systems. Other environmental controls may include different embodiment definitions consistent with the intent of this invention.
In a different aspect, the light source apparatus 600, provides an alternative embodiment for intensity modulation. The individual light source 620 may be operated to emit a given intensity and the filter wheel 630 may be actuated by a motorized element 610, to intercept the emitted light with a neutral density filter 631. Thus, the intensity of light provided to the rest of the Voxel-lithographic system will be modulated to a lower intensity. From a generality perspective, it may be noted that the design of the individual light filters 631 may involve numerous degrees of freedom and in their own right include different embodiment aspects. By way of a non-limiting example, a filter may be designed to modulate intensity in a spatially defined manner such that it defines higher intensity along one path through its body than in another path. In a second non-limiting example, a filter wheel may be designed to modulate intensity in a manner such that it is synchronized with operation of the DMD, thereby allowing coordination of pixels and intensities defined by the density values of each filter wheel segment. Combinations of these operational modes provide alternative embodiments, and it should also be clear that any means of controlling light intensity of the characteristics thus described is within the scope of the invention.
In some embodiments, a filter wheel 630 can shutter a filter element 631 so that it blocks irradiation from the rest of the optic system. There may be numerous advantages to incorporating such a function including the stability and longevity of downstream optic components. Additionally, in some embodiments, the stability of a light source component 620 may be improved if it is allowed to continuously operate. A blocking filter 631, may allow for means of performing steps in the rest of the operational system that require the absence of the light from the light source 600. While a particular location of the filter wheel 630 has been described, embodiments may include other appropriate locations along the optic path.
In another aspect, in some embodiments, a Voxel-based lithography optical apparatus may include a homogenizing and/or collimating optic. This apparatus is designed to take the light output of the light source 620 and produce output radiation 640 that is of more uniform intensity and is focused upon the DMD 510.
Referring now to
Collimating apparatus may include a collimation component and a homogenization component. In the preferred embodiment, light is collimated sufficiently by the light source to proceed into an optics column 700 and impinge a set of roughly 1-inch focusing optics 710. The focusing optics 710 may include lens components available, for example, from CVI Laser, Inc. (Albuquerque, N. Mex. USA).
One or more optics 710 may be utilized to focus source light onto a light pipe 720. The light pipe 720 is functional to homogenize the input light and smooth out non-uniformities in the spatial intensity. The light pipe 720 may include a hexagonal shaped optic pipe made of UV grade acrylic material. Alternative embodiments can include optical apparatus for homogenizing the source light spatial uniformity.
The homogenized light output from the light pipe 720, is focused by an optic element 730, such as, for example, of the type available from CVI Laser Inc. (Albuquerque, N. Mex. USA). The focused light now proceeds through an aperture stop 740, on to a set of roughly 2-inch focusing elements 750. Again, these focusing elements are optics as may be available through Thorlabs Inc. (Newton N.J. USA), by way of example. The intent of the focusing optics 750, now is to direct the light to a focal location at the digital mirror device (DMD). This completes the path of light in the illumination section of a Voxel-based lithographic system. There may be numerous embodiments that may alter aspects of the collimator and homogenizer components to achieve a similar aim in illuminating the DMD with intense, uniform light of a desired central wavelength and spectral bandwidth, which are within the scope of the invention.
Referring now to
In other embodiments, a Spatial Light Modulator (SLM) such as those available from Fraunhofer Institut Photonische Microsysteme of Germany can be used to control radiation on a Voxel by Voxel basis and can include the spatial modulation in intensity function 810. The mirror-like surface of the SLM may actually be composed of multiple (i.e. thousands) tiny moveable mirrors, each mirror with its own storage cell within the integrated circuit. As the image of the desired intensity profile is sent to the SLM, individual mirrors are either flexed or remain flat (unlike the TI DMD which rotates or tilts the micromirrors). Light reflected off the flexed mirrors is scattered such that it does not pass through and expose the actinically reactive chemical mixture.
Referring now again to
Light that is reflected from mirror elements in the “on” position takes a different path and heads towards focusing elements 840. As with the other optics, these roughly 1-inch focusing optics are components that may for example be available from Thorlabs
Inc. (Newton N.J. USA). These focusing optics elements focus the “on” state light emanating from the DMD 810 as an object onto the forming optic where the reaction of light with reactive monomer mixture occurs.
In some embodiments, it is desirable to provide a means of imaging and monitoring the status of the optic path directly, rather than inferring from results on Molds produced. In the preferred embodiment of the Voxel-based lithography optical apparatus, provision is provided for this direct monitoring. Light that would be focused onto the forming optic, is intercepted with a mirror that can be switched into and out of the beam path. The light that is so directed is then incident on a photo-detective imaging apparatus.
Referring now to
Continuing with
The reservoir 950, which contains the Reactive Mixture, may be filled with an appropriate volume of said Reactive Mixture. In some embodiments, this filling could be performed before the forming optic 930, is positioned relative to the reservoir 950. In other embodiments, the forming optic 930 and the reservoir 950, may be placed inside a containment vessel 990 and subjected to the purging with a gas flow 960. Filtering of the Reactive Mixture prior to use may also be employed. Thereafter, a volume of the Reactive Mixture 945, may be quantitatively filled into the reservoir 950.
There may be numerous means to transfer the Reactive Mixture 945, including hand filling, quantitative fluid transfer by automatic means or filling until a level detector measures the appropriate level of Reactive Mixture 945 in the reservoir 950. From a general perspective, it may be obvious to one skilled in the art that numerous embodiments to transfer an appropriate amount of Reactive Mixture 945 may be practical, and such techniques are well within the scope of invention.
In embodiments where the level of oxygen is critical to the photoprocessing steps, it may be apparent that oxygen may be present as a dissolved species in the reactive monomer mixture 945. In such an embodiment, means to establish the oxygen concentration in the reactive monomer mixture 945 are required. Some embodiments to accomplish this function include allowing the mixture to dwell in the gaseous environment through which the purge gas 960, is flowing. Alternative embodiments may involve vacuum purging of the dissolved gasses in a supply of the monomer mixture and reconstituting a desired amount of oxygen during a dispensing of the mixture through membrane exchange of gas with the liquid to be dispensed. Within the scope of the invention, it should be apparent that any means to establish the needed dissolved gas at an appropriate concentration is acceptable. Furthermore, in a more general sense, other materials may act as appropriate inhibitors in the presence or absence of the dissolved oxygen. From an even more general perspective, embodiments that include apparatus to establish and maintain an appropriate level of inhibitor are anticipated in the scope of the invention.
Referring now to
Referring now to
The forming optic 1010 is at least partially transmissive to a desired spectrum of actinic radiation. Accordingly, in various embodiments, forming optic 1010, may include, by way of example, one or more of: quartz, plastic, glass, or other material transmissive of light wavelengths operative to cure a reactive monomer mixture used. It may further be noted that the shape of the forming optic 1010 includes one of the surfaces 1011 with characteristics to be imparted into a Mold or Mold Precursor, formed along the surface 1011 via polymerization resulting from the forming actinic radiation that passes through the forming optic 1010. Numerous shape embodiments may include the inventive art herein.
Within the various embodiments that may be employed for the design and characteristics of a forming optic 1010, individual examples of said pieces may have unique aspects related, for example, to its stock material, manufacturing, history of usage and/or other causes. These aspects may or may not interact with the overall function of the Voxel lithographic system 500, creating unique optical offsets for the Voxel by Voxel intensity profile required to achieve an end product aim. Therefore, some embodiments may employ means to condition forming optics 1010, maintain them and track them. By reason of example, one embodiment may be to encode an identification mark in machine readable format on the flat surface of a forming optic piece 1040. Additional embodiments could include, for example, the attachment of an RF identification device along with said identification mark for machine readability. There may be numerous other embodiments to identify individual forming optic pieces 1040, that may include the intent of this invention.
The output product of the Voxel-based lithography optical equipment 500 may include numerous embodiments. In one embodiment, as shown at 900 a reactive product 940 will form on the surface of the forming optic 930 while still residing in the residual reactive chemical mixture 945. The action of removing the forming optic 930 with reactive product 940, from the chemical mixture 945 may include additional embodiments of the apparatus. In some such embodiments, the forming optic 930 and adhered reactive product 940 may be raised out of the chemical mixture 945 under the action of robotic automation for example.
Referring now to
Various aspects of the Fluent Mold Reactive Mixture may be affected by this processing; including for example, that less viscous components in the Fluent Mold Reactive Mixture may be separated and removed. It should be apparent to those skilled in the art that there are many different embodiment options related to how the chemical removal process may be performed, all consistent with the scope of this invention.
In general, embodiment options may include numerous physical designs to draw away chemical from the surface. An example of a different embodiment may be the actuation of a vacuum system component 1220 to assist in drawing away the Fluent Mold Reactive Mixture 1240. By way of non-limiting example, another embodiment may be included of redundant copies of the capillary apparatus 1210, deployed with their points mimicking the shape of the forming optic surface 1250. Additionally, the chemical removal could be performed with a high surface area material, like sponge, or nanoscale materials with high surface area, as an example. Restating a concept described previously, an alternative embodiment may include controlling the rate of withdrawal of a Mold Precursor on a forming optic 930, from the Reactive Mixture 945. The surface tension forces, in this embodiment may include a form of chemical removal, with similarity to a capillary wicking step; and result in the reduction of the amount of Fluent Mold Reactive Mixture remaining when the Mold Precursor results. From a generality perspective, the numerous embodiments of apparatus that could perform the function of removal of portions of the Fluent Mold Reactive Mixture 1240 include art within the scope of the invention.
The vacuum system component 1220, in the preferred embodiment, has an alternative function to that previously defined. In the processing of multiple Mold
Precursors, the chemical removal apparatus 1200 will perform chemical removal numerous times. The vacuum system component 1220, may be used to clean and evacuate the capillary apparatus 1210. A different embodiment may include a cleansing solvent being flowed through the capillary apparatus 1210, in conjunction with the vacuum system component 1220.
Referring now again to
Item 1320, a forming optic holding apparatus, includes an apparatus to flexibly hold a forming optic in a desired firm location. The forming optic piece, as depicted as 1000 in previous discussion may employ similar location schemes as when located in the Voxel-based lithographic apparatus 500 in this embodiment. Alternative embodiments may enable the transfer of the forming optic holding apparatus 1000 under automated means. It should be apparent that numerous alternatives in manners of holding the forming optic and locking it into an appropriate location in a flowable chemical removal apparatus include consistent aspects of the current invention.
The discussion thus far has generally depicted embodiments with the axis of the forming optic located such that it is perpendicular to a horizontal plane and in the direction of gravitational forces. Alternative embodiments may allow a rotation of the axis at some angle about this perpendicular orientation. Item 1350 includes an adjustment means to alter the angle the forming optic axis makes with gravity. The fundamental effect of such a change would be that the fluent matter 1710 on the Mold Precursor will tend to pool at a location off of the center of the forming optic center. In some embodiments there may be advantages to drawing off fluent media at a location off center.
A number of indicated items in
Referring now to
By way of example, some alternative embodiments for processing in the fixing apparatus may include a Mold Precursor Form where fluent material may have been washed off in a washing system. As this Mold Precursor Form in a fixed form may include a Mold of certain characteristics in its own right, it is within the scope of the invention to anticipate embodiments that involve the use of the fixing apparatus in a manner that does not require the stabilization apparatus per se. In a more general sense, the invention may anticipate numerous embodiments of materials and forms where the fixing apparatus may fix materials that do not require a previous flowing of a fluent material on the surface to be fixed. By way of example, a Mold Precursor Form that has been formed with the Voxel-based lithographic optical system and has Fluent Mold Reactive Mixture washed off may still include an embodiment where the fixing apparatus is capable of fixing the Mold Precursor into a Mold.
Some embodiments include alternative manners to cause the movement of the Fluent Mold Reactive Mixture. By way of example, in some embodiments, agitating a Mold Precursor surface including Fluent Mold Reactive Mixture may enable the movement of the Fluent Mold Reactive Mixture. Additionally, for example, it may be desirable in some embodiments to spin a Mold Precursor around a central axis in a spin coating manner common to film processing.
Still other embodiments may include minimizing gravitational force experienced by the Fluent Mold Reactive Mixture by way of dropping the Mold Precursor 1410 in a controlled manner over a certain distance. Additional embodiments may alter the effect of gravity by changing the level of the surface 1450 upon which the Mold Precursor 1410, forming optic 1420, and holder 1430, are rested. With a different surface level, the forces on the Fluent Mold Reactive Mixture in the center optic region may vary and cause movement.
In another aspect, some embodiments may include chemical or physical changes to the Fluent Mold Reactive Mixture. By way of example, an alternative embodiment may include the introduction of a solvent material in and around the fluent reactive chemical in such a manner to change its fluent nature. Additionally, said added material may affect the surface energy properties of components in the Mold Precursor system. The properties of the fluent reactive chemical 1710 may be partially altered through the use of the fixing irradiation, to alter the fluent nature in a manner that is distinct from fixing. Numerous alternative embodiments of a general nature relating to altering properties of the fluent chemical system may be anticipated by the nature of this invention.
At a significantly fundamental level, the nature of the reactive chemical mixture may interact with the various embodiments of apparatus to enable different results. It should be apparent that the nature of the stabilization and fixing apparatus 1400, and variation in embodiments that derive from changing the fundamental chemical components in the reactive chemical mixture include embodiments within the scope of the invention.
As the materials of the Mold Precursor may include part of a formed Mold, it may be obvious to one skilled in the art that the environmental controls in and around the stabilization and fixing apparatus include important embodiment aspects. For example, control of particulate matter with, for example, HEPA filtrated air flow may include one embodiment of environmental control. As the fluent media is still sensitive to actinic radiation, controls over stray light entering the environment include additional embodiment options. The numerous aspects of environmental control that may be apparent to one skilled in the art include art within the scope of this invention.
In some embodiments, the interaction of laser light 1515, from a laser displacement sensor 1510 such as one manufactured by Keyence (Osaka, Japan) model LT-9030, with the surface of the Mold sample 1520 occurs as the sample 1520 forming optic 1530 and holding clamp 1540 rotate axially. A rotary servomotor 1570, drives a rotary bearing kinematic stage upon which the sample assembly sits. For stability of the rotation, the center of mass of the Mold sample assembly is set, in some embodiments, as close to the center point as possible. As the stage rotates, the laser displacement sensor 1510, measures displacement of multiple points along axial rings of the surface of the Mold 1520. After the stage rotates a full turn, the displacement sensor 1510 is moved azimuthally. Each movement creates a new circular profile around the surface of the Mold. The process in this embodiment repeats until the entire Mold surface has been profiled. By measuring a particular forming optic 1530 without the Mold sample 1520, the surface location of the forming optic may be obtained in an equivalent spherical notation format. Subtracting this result from the result with the Mold upon the optic results in a thickness mapping of the Mold product. Again, unique identification of a forming optic in an electronic format, via an attached RFID or by some other means, may include another embodiment form for the apparatus.
In some embodiments of this type, a free vibrational displacement of the sample surface 1520 relative to the sensor 1510 can include a significant error on the displacement measurement obtained by the system. Therefore, vibrational damping and isolation may be included. Accordingly, in some embodiments a massive supporting table 1580 sitting upon vibrational isolation mounts 1590 can be utilized to minimize vibrational effects. Some embodiments may be less sensitive to vibrational noise than others; however, generally speaking various methods of minimizing vibrational energy transfer modes into the environment around the various forms of detectors and the sample locating apparatus include embodiments within the scope of the invention.
Other embodiments may employ different measurement systems, in some cases in addition to the first described laser displacement sensor, to extract Mold characteristics. By way of non-limiting example, a Shack-Hartmann Wavefront Sensor available from Thorlabs Inc (Newton, N.J., USA), may also be used in some embodiments to determine thickness of the formed Mold body.
From a general perspective, there may be a significant diversity in metrology devices that are anticipated within the scope of this invention, including in part and for example, techniques to characterize the refractive index, radiation absorption, and density. Aspects relating to environmental controls may also be anticipated including for example, particle detection. These various techniques may be located in the same environment and location as the exemplary metrology device 1500, or in alternative embodiments may include additional locations within or external to the generalized system environment.
Collection, storage and communication of metrology and logistical data relating to particular samples and components used in the production of particular samples include a general embodiment principle of the invention. These various data may be useful in establishing feedback loops for control of Mold characteristics. In an exemplary and preferred embodiment, the output from the laser displacement sensor based metrology apparatus 1500 for a Mold sample 1520 is recorded and stored in a computing system. The individual forming optic piece, in one embodiment 1530, may have had the similar laser displacement metrology performed on it before being used in the production of said sample 1520. Through use of the data computing system the displacement data may be processed in some manner to generate a representation of the thickness of the Mold sample thus produced.
Within the computing system a desired model for the Mold sample, useful in providing starting parameter set points for the various components in the Mold fabrication system, may be compared to the manipulation of the displacement data for the sample, 1520, and forming optic 1530. In some embodiments, various location points in a model may be mapped or correlated back to the individual components of the imaging system; in the preferred embodiment, a particular Voxel element in the Voxel-based lithography optic system. Via adjustment of the parameters for that Voxel, a next Mold or Mold Precursor sample may be produced with adjusted performance compared to the previous sample. Within the numerous embodiments of metrology and the various calculational algorithms and apparatus, there should be a clarity to one skilled in the art, that many alternative embodiments of obtaining, processing, modeling, feeding back, and communicating of data include elements within the scope of this invention.
Referring now to
Precursor, which includes fluent Mold Reactive Mixture, or crosslinkable material that is formed by voxel by voxel polymerization. As a forming optic or other substrate and a voxel by voxel structure of reacted material is removed from a reservoir of Reactive Mixture, there may be a viscous material that adheres to the surface of the voxel by voxel structure or Mold Precursor Form. This combination of a Mold Precursor Form and the fluent Mold reactive media on it that is capable of being formed after further processing into part of an ophthalmic Mold device is what makes up a Mold Precursor.
In some embodiments, the Mold Precursor assumes a three-dimensional shape, however, because of the fluent nature of the adsorbed reactive media, the entity does not have a fixed three-dimensional form.
The Mold Precursor may also include a first surface 1601 which may be formed along a substrate 1605, such as, for example a substrate 1605 with an optical quality surface. The first surface 1601 includes a portion of media with a first crosslink density degree at least partially polymerized above a gel point. The Mold Precursor 1600 also includes a second surface 1602 second surface comprising a second crosslink density degree of cure at about the gel point or less than the gel point.
In some embodiments, portions of the fluent Mold reactive media may be removed from the Mold Precursor. By way of non-limiting example, the fluent Mold reactive media may be removed by capillary action. In some embodiments, the methodology may include a dwelling step to allow some of the fluent Mold reactive media to pool together before the step of capillary action is performed. In still further embodiments, the Mold surface may be positioned so that its surface axis is angled relative to the direction of gravity. It may be obvious that numerous embodiments relating to methods to remove fluent Mold reactive media with a capillary based apparatus may be possible and include art within the scope of this invention.
In other embodiments, the methodology to remove fluent Mold reactive media may include alternative apparatus to the capillary wicking equipment. For example, a method comprising using an absorptive surface to remove the fluent media may include some embodiments. Additional embodiments may relate to methods using apparatus with many capillary points rather than the one described in detail. Still further embodiments may include methods to spin process the Mold Precursor to remove the fluent material. Any of the numerous methods to use an apparatus to remove some of the fluent material, as may be obvious to one skilled in the arts may include aspects within the scope of this invention.
A different type of embodiment to remove material from the top surface of the Mold Precursor may include the method of defining relief features into the Mold body for this purpose. In these types of embodiments, features such as the drain channels mentioned in a previous section may be designed for the purpose of creating a location to enable the relatively low viscosity fluent media to flow out of thereby creating below grade space for the relatively higher viscosity to flow into. In further embodiments, the use of spinning of the Mold body may also include embodiments to remove Mold material in conjunction with designing relief features for the material to flow into. It may be obvious to one skilled in the arts that embodiments comprising the various embodiments of different relief surface design also include art within the scope of this invention.
During stabilization, fluent Mold reactive media may flow under various forces to find a low energy and relatively stable state along the surface of the Mold Precursor Form.
At a microscopic level, it may be evident, that a surface of a precursor form may locally have some level of roughness to it. Numerous aspects of the forming embodiments may determine the nature of this roughness, for example of one such case, the effect of the inhibitor to relatively abruptly stop reaction in the vicinity that it starts. The surface forces of the fluent media, frictional and diffusion forces, the force of gravity and other applied forces combine in many embodiments to create a smooth covering that has flowed over the topography. In the methodology that determines these forces there are numerous embodiment possibilities within the scope of the invention.
In some embodiments, a Mold Precursor may be configured to allow the fluent Mold reactive media to flow under the force of gravity. The method to perform this may include the movement of the Mold Precursor into different orientations to aid in flow. Alternative embodiments may include the opposite strategy by maintaining the Mold Precursor in a fixed state with as little movement as practical. Still further alternative embodiments may include subjecting the fluent material to the forces related to spinning the Mold Precursor around an axis. In some embodiments, this spinning may be performed around an axis centered in the middle of the Mold Precursor. In alternative embodiments, said spinning may include rotating the Mold Precursor around an external axis point while either facing the top of the Mold Precursor towards or away from the axis point or at the myriad possible orientations between such. In still other embodiments, the Mold Precursor may be processed in a free fall environment to minimize the effect of gravity. It may be apparent to one skilled in the arts that there may be numerous methods related to the application of fluent forces to the Mold Precursor during a stabilization method.
In other embodiments, the fluent nature of the fluent media may be altered by methodology. In some embodiments, the viscosity of the fluent media may be altered by means of dilution or solvation. Alternative embodiments may include evaporating some of the diluent to increase viscosity. An exposure to some level of actinic radiation may include still further methods to alter said fluent films viscosity. There may be numerous embodiments relating to altering the viscosity of the fluent media.
In still other embodiments, the surface energy related forces on the fluent Mold reactive media may be altered by methodology. In some embodiments this may include the addition of surfactants to the nascent Reactive Mixture. In alternative embodiments additives or chemical reactants may be added to the Mold Precursor for the purpose of altering the surface energy.
After a methodology of stabilization has been performed the fluent material may in some embodiments be subjected to a next methodology type fixation, to convert it into a non-fluent state. In some embodiments, the nature of the actinic radiation applied during the fixing method may include alternatives. The spectral band or bands applied may be an example of one type of methodology embodiment. Alternative embodiments may include the intensity of the radiation applied. In alternative embodiments, the application of various aspects of the fixation irradiation may include time dependency. By way of non-limiting example, an initial wavelength band may include a first step that then is changed to a different band. The universe of embodiments that may be obvious to one skilled in the art for the method of defining the light conditions are within the scope of this invention.
In some embodiments, a fixation method may include different paths that the irradiation may take. In an example of type of embodiment, the irradiation may occur on the front surface of the Mold Precursor; or alternatively through the back surface. Still other embodiments may derive from multiple sources of irradiation, some perhaps with different light characteristics to create different effects of the actinic radiation in the Mold Precursor entities. Still further embodiments may derive from the fixation method comprising other energy forms than radiation. By way of generality, the numerous methods that may include a fixation step are within the scope of the invention.
In some embodiments, after fixation has occurred, the processing of the Mold Precursor has been completed. This completed product may, in some embodiments, be processed further. By way of non-limiting example, if the product of the fixation were introduced back into the voxel based lithography methodology a second layer of processing may occur. This multi-pass aspect introduces many embodiment methodology options.
In some embodiments, the complex Mold Precursor that may be formed from multiple passes which may include by way of non-limiting example, a first step where an ophthalmic Mold surface is defined and a second step where profile features are added to the surface. Other complex embodiments of the methodology may include, for example, a first pass through the voxel based lithography system with conditions, as some of the previous examples described, that make for isolated voxel columns along the Mold Precursor Form. A second voxel based lithography step may then include filling in the features between voxel columns with a material of a different characteristic. Continuing a third pass through the system may then define an ophthalmic Mold 1703. It may be obvious that the generalization to methodology of multiple passes through the system, each of which may have the abundant different embodiment possibilities discussed, may include a great many different embodiments all within the scope of the invention.
In some other embodiments, the Mold Precursor may be formed by applying a fluent reactive media onto a Mold Precursor Form. For example, the Mold Precursor Formed by way of the voxel-based lithography methods may be subjected to a washing system as an extreme method of removal of the fluent Mold reactive media. A Mold Precursor Form will derive from the washing method. In some embodiments, this Mold Precursor Form may next be subjected to a method of adding a next fluent Mold reactive media to its surface. The resulting Mold Precursor may now have a different distribution of monomer and multimeric molecules, or in some embodiments may include different polymer chemistry than that used to form the Mold Precursor Form. It may be apparent to one skilled in the art that numerous embodiments comprising the methodology to apply fluent Mold media onto a variety of Mold Precursor Form embodiments include art within the scope of this invention.
This application is a divisional of currently pending U.S. patent application Ser. No. 12/609,833, filed Oct. 30, 2009 as a Continuation-in-Part of U.S. patent application Ser. No. 11/740,555, filed Apr. 26, 2007, now abandoned, the contents of which are relied upon and incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| Parent | 12609833 | Oct 2009 | US |
| Child | 12707023 | US |
| Number | Date | Country | |
|---|---|---|---|
| Parent | 11740555 | Apr 2007 | US |
| Child | 12609833 | US |
