In the following, embodiments according to the present invention will be described with reference to the accompanying drawings.
The beam 1 is constituted by a thick plate, and the periphery of the thick plate is formed in a rectangular shape. On the upper surface of the beam 1, a recessed part 2 which is recessed toward the lower surface side is formed in a position in the inside from the periphery. And a transmission rod 4 extending upward from the bottom surface of the recessed part 2 is formed at the center part C of the beam 1 and is integrated with the beam 1. On the other hand, an attaching part 3 projecting downward at the center part C of the beam 1 is formed on the lower surface of the beam 1. The attaching part 3 is a part used at the time when the load sensor is attached to an object to be measured.
The sensor plate 5 is a member made of a thin plate material which is formed into a rectangular shape. The sensor plate 5 is arranged on the upper surface of the beam 1 so as to traverse the recessed part 2 of the beam 1. Both end parts 5a, 5a of the sensor plate 5 in its long axis direction (X axis direction) are fixed to the edge part 2a of the recessed part 2 by welding, so that the sensor plate is joined to the beam 1. On the other hand, a through hole 6 penetrating the thickness of the sensor plate 5 is formed at the center part C of the sensor plate 5. The tip of the transmission rod 4 extending from the bottom part of the recessed part 2 is inserted into the through hole 6. In addition, the tip of the inserted transmission rod 4 is welded to the sensor plate 5, so that the beam 1 and the sensor plate 5 are also joined to each other at the center part C.
Recessed grooves 7, 8, 9 and 10 as recessed parts which extend in the short axis direction (Y axis direction) of the sensor plate 5 are formed in four places in the long axis direction (X axis direction) on the lower surface of the sensor plate 5. These recessed grooves 7, 8, 9 and 10 are respectively arranged in the positions which are line symmetrical to a center line CL passing through the center part C and extending in the short axis direction (Y axis direction), and the recessed grooves are formed by etching simultaneously with the formation of the through hole 6. The stress concentration is caused by forming the recessed grooves 7, 8, 9 and 10 and making the thickness thin, so that the four places function as the stress concentrating parts 11, 12, 13 and 14.
Moreover, in the stress concentrating parts 11, 12, 13 and 14, pairs of strain gauges 21a to 21d and 22a to 22d are provided on the upper surface opposite to the lower surface on which the recessed grooves 7, 8, 9 and 10 are formed. The strain gauges 21a to 21d and 22a to 22d are elements which convert the strain caused in the sensor plate 5 to an electric signal. In the present embodiment, the strain gauges 21a to 21d and 22a to 22d are provided in the stress concentrating parts 11, 12, 13 and 14, respectively, in a manner that the axis direction of the strain gauges coincides with the long axis direction (X axis direction) of the sensor plate 5.
Further, as shown in
In this way, in order to accurately arrange the strain gauges 21a to 21d and 22a to 22d so as to be point symmetrical to the center part C and in the positions of the stress concentrating parts 11, 12, 13 and 14, the through hole 6 provided in the center part C is used as a mark in this load sensor. That is, the distance to the through hole 6 and the direction with respect to the through hole 6 are determined by using the through hole 6 as a mark, and thereby the strain gauges 21a to 21d and 22a to 22d are positioned.
Note that the arrangement of the stress concentrating parts and strain gauges 21a to 21d and 22a to 22d is not limited to the embodiment shown in
In the sensor plate shown in
In the sensor plate 5 shown in
As for the strain gauges 21a, 21b, 22a and 22b provided in the stress concentrating part 12, the axis direction of the two strain gauges 21a and 21b arranged on the outside in the short axis direction (Y axis direction) is made to coincide with the short axis direction (Y axis direction) of the sensor plate 5, while the axis direction of the two strain gauges 22a and 22b arranged on the inside in the short axis direction (Y axis direction) is made to coincide with the long axis direction (X axis direction) of the sensor plate 5. Similarly, as for the strain gauges 21c, 21d, 22c and 22d provided in the stress concentrating part 13, the axis direction of the two strain gauges 21c and 21d arranged on the outside in the short axis direction (Y axis direction) is made to coincide with the short axis direction (Y axis direction) of the sensor plate 5, while the axis direction of the two strain gauges 22c and 22d arranged on the inside in the short axis direction (Y axis direction) is made to coincide with the long axis direction (X axis direction) of the sensor plate 5.
By arranging the strain gauges 21a to 21d and 22a to 22d in this way, four pairs of the strain gauges arranged in the positions which are point symmetrical with respect to the center part C. That is, the strain gauge 21a and the strain gauge 21d, the strain gauge 21b and the strain gauge 21c, the strain gauge 22a and the strain gauge 22d, and the strain gauge 22b and the strain gauge 22c are point symmetrical with respect to the center part C, respectively.
In the embodiment shown in
Specifically, the strain gauges 21a, 21b, 22a and 22b are provided in the stress concentrating part 12 corresponding to the position of the recessed groove 8, and the strain gauges 21c, 21d, 22c and 22d are provided in the stress concentrating part 13 corresponding to the position of the recessed groove 9.
In the stress concentrating part 12, the axis direction of the two strain gauges 21a and 21b arranged on the inside in the short axis direction (Y axis direction) is made to coincide with the short axis direction (Y axis direction) of the sensor plate 5. On the other hand, the axis direction of two strain gauges 22a and 22b arranged on the outside in the short axis direction (Y axis direction) is made to coincide with the long axis direction (X axis direction) Similarly, in the stress concentrating part 13, the axis direction of the two strain gauges 21c and 21d arranged on the inside in the short axis direction (Y axis direction) is made to coincide with the short axis direction (Y axis direction), and the axis direction of the two strain gauges 22c and 22d arranged on the outside is made to coincide with the long axis direction.
By arranging the strain gauges 21a to 21d and 22a to 22d in this way, four pairs of the strain gauges arranged in the positions which are point symmetrical to the center part C, are formed. That is, the pairs of the strain gauge 21a and the strain gauge 21d, the strain gauge 21b and the strain gauge 21c, the strain gauge 22a and the strain gauge 22d, and the strain gauge 22b and the strain gauge 22c are point symmetrical to the center part C, respectively.
Further, on the sensor plate 5 shown in
In the strain gauges 21a, 21b, 22a and 22b arranged in the stress concentrating part 12, the two strain gauges 21a and 21b are arranged such that the axis directions of the strain gauges are directed in the short axis direction (Y axis direction), and are in parallel with each other. Further, the two strain gauges 22a and 22b are arranged such that the axis directions of the two strain gauges are directed in the long axis direction (X axis direction) so as to allow the two strain gauges to be connected with both ends of the strain gauges 21a and 21b, and are arranged in parallel with each other.
Also in the embodiment shown in
In the above, the explanation is given with reference to the examples of the sensor plate 5 in which the pairs of the recessed grooves 7 and 8 and the pairs of the recessed grooves 9 and 10 are formed on the respective sides in the long axis direction (X axis direction) with the center line CL passing through the center part C as the boundary, and thereby the stress concentrating parts 11, 12, 13 and 14 are formed. However, the present invention is not limited to these examples, three or more recessed grooves may also be formed on each side, so as to provide the stress concentrating parts. Further, as for the positions in which the strain gauges 21a to 21d and 22a to 22d are attached, in the examples shown in
Further, one recessed groove may also be formed on each side in the long axis direction (X axis direction) of the sensor plate in a manner that the formed recessed grooves are symmetrical with each other with respect to the center line CL, as a result of which one stress concentrating part is provided so as to correspond to each of the recessed grooves.
The axis direction of two strain gauges 21a and 21b arranged on the outside in the short axis direction (Y axis direction) among the strain gauges 21a, 21b, 22a and 22b provided in the stress concentrating part 34 provided on the one side, is made to coincide with the short axis direction (Y axis direction) of the sensor plate 30. On the other hand, the axis direction of two strain gauges 22a and 22b arranged on the inside in the short axis direction (Y axis direction) is made to coincide with the long axis direction (X axis direction). Similarly, the axis direction of two strain gauges 21c and 21d arranged on the outside in the short axis direction (Y axis direction) among the strain gauges 21c, 21d, 22c, and 22d provided in the stress concentrating part 35, is made to coincide with the short axis direction (Y axis direction) , while the axis direction of two strain gauges 22c and 22d arranged on the inside is made to coincide with the long axis direction (X axis direction).
By arranging the strain gauges 21a to 21d and 22a to 22d in this way, the strain gauges 21a to 21d and 22a to 22d are also arranged so as to be point symmetrical with respect to the center part C, respectively. For example, the strain gauge 21a in the stress concentrating part 34 and the strain gauge 21d in the stress concentrating part 35 are point symmetrical with respect to the center part C. Similarly, the strain gauge 22b in the stress concentrating part 34 and the strain gauge 22c in the stress concentrating part 35 are point symmetrical with respect to the center part C.
Note that also in the case where the strain gauges 21a to 21d and 22a to 22d are arranged in the embodiments shown in
The strain gauges 21a to 21d and 22a to 22d are formed of a semiconductor silicon thin film by using a CVD method, a sputtering method, and the like.
The above strain gauges 21a to 21d and 22a to 22d are mutually connected to form a bridge circuit, as shown in
For example, in
Then, in the bridge circuit, a power supply Vin is connected between a connection point at which the pair of strain gauges 21a and 21d is connected to the pair of strain gauges 22b and 22c, and a connection point at which the pair of the strain gauges 21b and 21c is connected to the pair of the strain gauges 22a and 22d, so that a voltage is applied to the bridge circuit. On the other hand, a connection point at which the pair of strain gauges 21a and 21d is connected to the pair of strain gauges 22a and 22d, and a connection point at which the pair of strain gauges 21b and 21c is connected to the pair of strain gauges 22b and 22c, are used as output terminals.
Note that the strain gauges arranged in the point-symmetrical positions are connected in parallel with each other in the bridge circuit shown in
In the bridge circuit shown in
In the above, the case where the tip of the transmission rod 4 of the beam 1 is inserted into the through hole 6 formed in the center part C of the sensor plate 5 and the inserted portion is joined, is explained, but the constitution as shown in
In a load sensor according to the present embodiment, the beam 1 and the sensor plate 5 are not joined in the center part C but are separated from each other. A recess 6A is formed in the center part C on the upper surface of the sensor plate 5, and at the same time, recessed grooves 7, 8, 9 and 10 are formed on the rear surface by etching. On the other hand, a transmission rod 4A which projects from the bottom surface of the recessed part 2 towards the sensor plate 5 is formed in the position of the center part C in the recessed part 2 of the beam 1. The upper end of the transmission rod 4A is not joined to the sensor plate 5, but is only brought into contact with the lower surface of the sensor plate 5. Even in this load sensor, it is possible to measure a load in the direction in which the tip of the transmission rod 4A is pressed against the center part C of the sensor plate 5 upward from the lower part.
Here, the recess 6A formed on the upper surface of the sensor plate 5 serves as a mark at the time of arranging strain gauges. That is, with the recess 6A formed as a mark, the strain gauges are accurately positioned with respect to the recessed grooves 7, 8, 9 and 10 on the rear surface. Note that the mark at the time of positioning the strain gauges is not limited to the case where the mark is provided at one place of the center part C. In the sensor plate 5 shown in
The load sensor provided with the above described constitution is manufactured as follows.
Plural sensor plates 5 are formed so as to be arranged longitudinally and laterally in the respective regions by applying the etching processing to the substrate 40. Further, in the etching processing, thin connecting pieces 42 extending in the short axis direction (Y axis direction) of the sensor plates 5 are formed simultaneously, and the sensor plates 5 are mutually connected with the connecting pieces 42 so that each sensor plate 5 is arranged continuously in the short axis direction (Y axis direction) . Note that the connecting direction is not limited to the short axis direction (Y axis direction), and the sensor plates 5 may also be arranged continuously in the long axis direction (X axis direction) Further, the sensor plates 5 may also be arranged continuously in both of the directions.
Further, in this manufacturing process, by performing etching processing from both sides, the through hole 6 penetrating in the thickness direction is formed at the center of each sensor plate 5. Further, by the etching processing from the rear surface, recessed grooves 7, 8, 9 and 10 extending in the short axis direction (Y axis direction) are formed in four places on the rear surface of each sensor plate 5 simultaneously with the formation of the through hole 6, respectively. The recessed grooves 7, 8, 9 and 10 formed in the respective positions of each sensor plate 5 are formed on the same straight lines extending in the short axis direction (Y axis direction) at the respective positions.
In this way, by the etching processing, a sensor plate group 41 having plural sensor plates 5 is formed from one substrate 40. Further, in each sensor plate 5, the formation of the external shape, the formation of the through hole 6 at the center part C, and the formation of the recessed grooves 7, 8, 9 and 10 forming the stress concentrating parts 11, 12, 13 and 14 are carried out by a single process by subjecting the single substrate 40 to the etching processing from both sides of the substrate. Note that in the case of the sensor plate 5 shown in
Note that the external shape of the sensor plate 5, the through hole 6 formed in the center part C, and the recessed grooves 7, 8, 9 and 10 formed on one surface side of the sensor plate 5 are not limited to be formed by the etching processing, and may also be formed by laser processing. When the laser processing is performed, the external shape, the through hole 6, and the recessed grooves 7, 8, 9 and 10 may be formed from one surface side of the sensor plate 5 on which the recessed grooves 7, 8, 9, and 10 are formed.
Then, after the sensor plate group 41 is formed from the substrate 40, a film forming process is performed as shown in
In the film forming process, a thin silicon oxide film 50 is first formed on each sensor plate 5 constituting the sensor plate group 41, by the CVD method. The sensor plate 5 and the strain gauges 21a to 21d and 22a to 22d are electrically insulated by the formed thin silicon oxide film 50. Then, a semiconductor silicon thin film is similarly formed on the entire surface of the respective sensor plates 5 by the CVD method. In this case, strain gauge patterns 51 are formed by etching, and the positioning of the strain gauge patterns 51 is performed on the basis of the through hole 6 which is already formed by the above described etching processing. That is, the distance and direction of the strain gauge patterns 51 to the through hole 6 formed in the center part C are determined beforehand so as to enable the strain gauge patterns 51 to overlap the recessed grooves 7, 8, 9, and 10 which form the stress concentrating parts. Thereby, the patterns are accurately formed in the position of the stress concentrating parts.
Then, thin gold films 52 for wiring and leading out electrodes are vapor-deposited. Then, a silicon nitride film 53 for protecting the strain gauges is formed by the CVD method.
In this way, in the film forming process, batch processing is applied to the sensor plate group 41 which consists of plural sensor plates 5, so that plural sensor plates 5 are film formed at once.
After the film forming process is finished, the connecting pieces 42 connecting the sensor plates 5 with each other are cut, so that individual sensor plates 5 are formed. The cutting may be performed by using, for example, a cut saw and the like.
The sensor plate 5 on which the strain gauges 21a to 21d and 22a to 22d are provided is subsequently joined to the beam 1, and is formed as a load sensor having the constitution shown in
The above described load sensor functions as follows.
Reference is again being made to
In the sensor plate 5, both ends in the long axis direction (X axis direction) are joined to the beam 1 at the edge parts 2a of the recessed part 2 of the beam 1, while the center part C of the sensor plate 5 is also joined to the transmission rod 4. This makes the sensor plate 5 function as a fixed beam. Thereby, the center part C to which the displacement is transmitted by the transmission rod 4 is vertically displaced relatively to the both end parts 5a. For example, when the center part C of the beam 1 is displaced towards the upper part, the displacement is transmitted to the center part C of the sensor plate 5 via the transmission rod 4, so that the center part C of the sensor plate 5 is displaced upward relatively to the both end parts 5a, as shown in
Then, the strain generated by this displacement is intensively generated in the stress concentrating parts 11, 12, 13 and 14. In this case, compressive strain is generated on the upper surface of the stress concentrating parts 11 and 14 on the outside, while tensile strain is generated on the upper surface of the stress concentrating parts 12 and 13 on the inside. When these kinds of strain are measured by arranging the strain gauges 21a to 21d and 22a to 22d as shown in
Next, the case where the load is applied in the direction other than the Z axis direction shown in
Here, the explanation is made by simplifying the model of deformation. Note that as for the direction of each axis, the X-axis coincides with the long axis direction of the sensor plate 5, and the Y-axis coincides with the short axis direction. Further, the clockwise direction is set as the positive direction of θ, facing the sensor plate 5 (see
When a load is applied to the sensor plate 5 in the Y axis direction as shown in
The tensile strain is generated in the outside part of the curving from the center part C of the sensor plate 5 in the Y axis direction. This causes the resistance values of the strain gauges 21a, 22a, 22c, and 21c to be changed to the positive side. On the other hand, the compressive strain is generated in the inside part of the curving from the center part C of the sensor plate 5 in the Y axis direction. This causes the resistance values of the strain gauges 21b, 22b, 22d, and 21d to be changed to the negative side. As shown in
The relationships between the resistance value changes of the respective strain gauges 21a to 21d and 22a to 22d and the measured values of the output voltage are summarized as shown in Table 1, at the time when the load in the X axis direction and in the rotational directions in the X, Y and Z axes is similarly applied. Note that in this table 1, “+1” represents a change to the positive side, and “−1” represents a change to the negative side, respectively. As can be seen from Table 1, except for the case where the load is applied in the Z axis direction, the resistance value changes of the strain gauges 21a to 21d and 22a to 22d are mutually cancelled, as a result of which the output voltage becomes “zero”.
The reason why such measurement result is obtained is that the strain gauges 21a to 21d and 22a to 22d provided on the sensor plate 5 are arranged so as to be point symmetrical with respect to the center part C, and hence, when a load is applied in a direction other than the target direction (Z axial direction) to be measured, resistance value changes of different polarities are generated in the strain gauges 21a to 21d and 22a to 22d, and further is that in each pair of the strain gauges 21a to 21d and 22a to 22d, the strain gauges are connected in parallel to each other, and hence, the resistance value changes in the paired strain gauges are canceled.
Note that the resistance value changes of the strain gauges 21a to 21d and 22a to 22d which are arranged in the point-symmetrical positions are mutually canceled, and hence, also in the case where the strain gauges of each gauge pair are connected in series as shown in
Number | Date | Country | Kind |
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2004-206983 | Jul 2004 | JP | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/JP05/13072 | 7/14/2005 | WO | 00 | 1/9/2007 |