Claims
- 1. An alkaline low-foaming cleaning solution for the removal of organic soils from hard surfaces and consisting essentially of:
(i) hydrogen peroxide in a concentration of from about 0.005% to about 50% w/w, based on the total weight of the solution; (ii) at least one cation sequestering agent in a concentration of from about 0.01% to about 50% w/w, based on the total weight of the solution; (iii)-at least one anionic surfactant selected from the group consisting of short chain (C3-C8) alkane sulfonates and short chain (less than C5) alkylarenesulfonates, in a concentration of from about 0.005% to about 40% w/w, based on the total weight of the solution; and (iv) at least one diluent selected from the group consisting of deionized water, water, and mixtures thereof, to 100% w/w.
- 2. A cleaning solution according to claim 1 wherein said hydrogen peroxide is supplied by a source of hydrogen peroxide selected from the group consisting of sodium percarbonate, sodium perborate monohydrate, and sodium perborate tetrahydrate, and mixtures thereof.
- 3. A cleaning solution according to claim 1 wherein the pH is from about 9 to about 11.5.
- 4. A cleaning solution according to claim 1 wherein said at least one surfactant is selected from the group consisting of alkali metal and ammonium salts of octane sulfonic acid, alkali metal and ammonium salts of cumene, toluene, and xylene sulfonic acids, and mixtures thereof.
- 5. A cleaning solution according to claim 1 wherein said cation sequestering agent is selected from the group consisting of citric acid, glycolic acid, polyphosphates obtained by the thermal treatment of monosodium phosphate, amino phosphonic acid compounds with 1 to 5 phosphonic acid moieties, amino-carboxylic acid analogues of amino phosphonic acid compounds with 1 to 5 phosphonic acid moieties, and mixtures thereof.
- 6. A cleaning solution according to claim 5 wherein said polyphosphates are selected from the group consisting of tetrasodium pyrophosphate, sodium tripolyphosphate, sodium tetraphosphate, sodium hexametaphosphate, and mixtures thereof.
- 7. A cleaning solution according to claim 5 wherein said amino phosphonic acid compounds are selected from the group consisting of amino tri(methylene phosphonic acid), 1-hydroxyethylidene-1,1,-diphosphonic acid, diethylenetriaminepenta (methylene phosphonic acid), ethylene diamine tetra(methylene phosphonic acid), and mixtures thereof.
- 8. A cleaning solution according to claim 5 wherein said amino-carboxylic acid analogues are selected from the group consisting of ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid, nitrilotriacetic acid and mixtures thereof.
- 9. A cleaning solution according to claim 1 wherein, for every one part by weight hydrogen peroxide, there is from about 0.25 to about 4 parts by weight cation sequestering agent.
- 10. A cleaning solution according to claim 1 wherein hydrogen peroxide is present in a concentration of from about 1% to about 20% w/w, said cation sequestering agent is present in a concentration of from about 0.5% to about 20% w/w, and said anionic surfactant is present in a concentration of from about 0.005% to about 3% w/w, all based on the total weight of the solution.
- 11. A cleaning solution according to claim 10 wherein hydrogen peroxide is present in a concentration of from about 2% to about 7% w/w, said cation sequestering agent is present in a concentration of from about 0.5% to about 7% w/w, and said anionic surfactant is present in a concentration of from about 0.01% to about 2% w/w, all based on the total weight of the solution.
- 12. A cleaning solution according to claim 1 wherein hydrogen peroxide is present in a concentration of from about 0.005% to about 2% w/w, said cation sequestering agent is present in a concentration of from about 0.01% to about 2% w/w, and said anionic surfactant is present in a concentration of from about 0.005% to about 3% w/w, all based on the total weight of the solution.
- 13. A cleaning solution according to claim 12 wherein hydrogen peroxide is present in a concentration of from about 0.01% to about 1% w/w, said cation sequestering agent is present in a concentration of from about 0.01% to about 1% w/w, and said anionic surfactant is present in a concentration of from about 0.01% to about 2% w/w, all based on the total weight of the solution.
- 14. An alkaline low-foaming cleaning solution according to claim 1 containing at least one corrosion inhibitor in a concentration of from about 0.01% to about 5% w/w, based on the total weight of the solution.
- 15. A cleaning solution according to claim 14 wherein said corrosion inhibitor is selected from the group consisting of triazoles, nitrites, molybdates, benzoates, gluconates, short chain (C2-C5) polyhydric alcohols, and mixtures thereof.
- 16. A cleaning solution according to claim 15 wherein said corrosion inhibitor is selected from the group consisting of 1,2,3-Benzotriazole, sodium nitrite, sodium molybdate, propylene glycol, and mixtures thereof.
- 17. A cleaning solution according to claim 1 containing at least one buffer in an amount effective to achieve said alkaline pH.
- 18. A dry particulate cleaning formulation which can be dissolved in water, deionized water, or mixtures thereof to form a cleaning solution according to claim 1.
- 19. A dry particulate cleaning formulation according to claim 18 containing at least one source of hydrogen peroxide selected from the group consisting of sodium percarbonate, sodium perborate monohydrate, and sodium perborate tetrahydrate, and mixtures thereof.
- 20. A dry particulate cleaning formulation according to claim 19 containing from about 5% to about 30% w/w of said at least one source of hydrogen peroxide, from about 5% to about 50% w/w of at least one cation sequestering agent, and from about 2% to about 20% w/w of at least one anionic surfactant selected from the group consisting of short chain (C3-C8) alkane sulfonates and short chain (less than C5) alkylarenesulfonates, all based on the total weight of the formulation.
- 21. A dry particulate cleaning formulation according to claim 20 wherein said at least one source of hydrogen peroxide is present in an amount of from about 15% to about 25% w/w, said cation sequestering agent is present in an amount of from about 10% to about 20% w/w, and said at least one anionic surfactant is present in an amount of from about 2% to about 10% w/w, all based on the total weight of the formulation.
- 22. A dry particulate cleaning formulation according to claim 18 containing an inert filler selected from the group consisting of sulfate salts, phosphate salts, silicate salts, carbonate salts, and mixtures thereof.
- 23. A method of cleaning equipment used to circulate food products, in place, comprising:
(1) providing a cleaning solution according to claim 13; and (2) circulating said cleaning solution through equipment to be cleaned at a temperature of 20° C. or higher.
- 24. A low-foaming cleaning solution having a pH of from about 8 to about 11.5 and consisting essentially of:
a) at least one surfactant selected from the group consisting of C3-C8 alkane sulfonates, C3-C8 alkyl sulfates, C1-C7 alkyl naphthalene sulfonates, polyoxyethylene/polyoxypropylene block copolymers having a polyoxypropylene molecular weight of from about 1500 to about 8500, of which less than about 30% of the total molecular weight is due to the polyoxyethylene portion, and mixtures thereof, in a concentration of from about 0.005% to about 40% w/w of the total solution; b) at least one active oxygen releasing compound selected from the group consisting of hydrogen peroxide, at least one source of hydrogen peroxide, and mixtures thereof, in an amount effective to produce a hydrogen peroxide concentration of from about 0.005% to about 50% w/w of the total solution; c) at least one builder in a concentration of from about 0.001% to about 50% w/w of the total solution; and d) at least one diluent selected from the group consisting of water, deionized water, and mixtures thereof, to 100% w/w.
- 25. A cleaning solution according to claim 24 wherein said source of hydrogen peroxide is selected from the group consisting of percarbonate, persilicate, persulphate, perborate, peroxyacids, dialkyl peroxides, diacyl peroxides, preformed percarboxylic acids, organic peroxides, inorganic peroxides, hydroperoxides, and mixtures thereof.
- 26. A cleaning solution according to claim 24 wherein said anionic surfactant is present in a concentration of from about 0.005% to about 4% w/w, said at least one active oxygen releasing compound is present in an amount effective to produce a hydrogen peroxide concentration of from about 0.005% to about 3% w/w, and said at least one builder is present in a concentration of from about 0.001% to about 11% w/w, all based on the total weight of the solution.
- 27. A cleaning solution according to claim 26 wherein said at least one surfactant is present in a concentration of from about 1.5% to about 4% w/w, said at least one active oxygen releasing compound is present in an amount effective to produce a hydrogen peroxide concentration of from about 2% to about 3% w/w, and said at least one builder is present in a concentration of from about 6% to about 11% w/w, all based on the total weight of the solution.
- 28. A cleaning solution according to claim 26 wherein said at least one surfactant is present in a concentration of from about 0.005% to about 0.03% w/w, said at least one active oxygen releasing compound is present in an amount effective to produce a hydrogen peroxide concentration of from about 0.005% to about 0.03% w/w, and said at least one builder is present in a concentration of from about 0.001% to about 0.10% w/w, all based on the total weight of the solution.
- 29. A cleaning solution according to claim 24 wherein, for every one part by weight of hydrogen peroxide produced by said at least one active oxygen releasing compound, there is from about 0.25 to about 4 parts by weight of said at least one builder.
- 30. A cleaning solution according to claim 25 wherein said at least one source of hydrogen peroxide is selected from the group consisting of sodium percarbonate, sodium perborate monohydrate, sodium perborate tetrahydrate, and mixtures thereof.
- 31. A cleaning solution according to claim 24 wherein the pH is from about 8 to about 9.5.
- 32. A cleaning solution according to claim 24 wherein said at least one surfactant is selected from the group consisting of alkali metal and ammonium salts of octane sulfonic acid, and alkali metal and ammonium salts of cumene, toluene, xylene sulfonic acids, and mixtures thereof.
- 33. A cleaning solution according to claim 24 herein said at least one surfactant is selected from the group consisting of sodium octyl sulfonate, sodium xylene sulfonate, a block copolymer consisting of a polyoxyethylene block capped at both ends by polyoxypropylene blocks where the total molecular weight of the polyoxypropylene portion is 1700 and the polyoxyethylene portion comprises about 20% of the total molecular weight, and mixtures thereof.
- 34. A cleaning solution according to claim 24 wherein said at least one surfactant is selected from the group consisting of C3-C8 alkane sulfonates, C3-C8 alkyl sulfates, C,-C7 alkyl naphthalene sulfonates, and mixtures thereof.
- 35. A cleaning solution according to claim 24 wherein said at least one builder is a cation sequestering agent selected from the group consisting of citric acid, glycolic acid, polyphosphates obtained by the thermal treatment of monosodium phosphate, amino phosphonic acid compounds with 1 to 5 phosphonic acid moieties, amino-carboxylic acid analogues of amino phosphonic acid compounds with 1 to 5 phosphonic acid moieties, and mixtures thereof.
- 36. A cleaning solution according to claim 35 wherein said polyphosphates are selected from the group consisting of tetrasodium pyrophosphate, sodium tripolyphosphate, sodium tetraphosphate, sodium hexametaphosphate, and mixtures thereof.
- 37. A cleaning solution according to claim 35 wherein said amino phosphonic acid compounds are selected from the group consisting of amino tri(methylene phosphonic acid), 1-hydroxyethylidene-1,1,-diphosphonic acid, diethylenetriaminepenta (methylene phosphonic acid), ethylene diamine tetra(methylene phosphonic acid), and mixtures thereof.
- 38. A cleaning solution according to claim 35 wherein said amino-carboxylic acid analogues are selected from the group consisting of ethylenediaminetetraacetic acid, diethylenetriaminepentaacetic acid, nitrilotriacetic acid, and mixtures thereof.
- 39. A cleaning solution according to claim 24 containing at least one corrosion inhibitor for inhibiting corrosion of metallic substrates upon drying, in a concentration of from about 0.005% to about 5% w/w of the total solution, said at least one corrosion inhibitor being selected from the group consisting of C2-C5 polyhydric alcohols, triazoles, nitrites, molybdates, benzoates, gluconates, and mixtures thereof.
- 40. A cleaning solution according to claim 39 wherein said at least one corrosion inhibitor is selected from the group consisting of 1,2,3-benzotriazole, sodium nitrite, sodium molybdate, propylene glycol, and mixtures thereof.
- 41. A cleaning solution according to claim 39 wherein said at least one corrosion inhibitor is present in a concentration of from about 0.005% to about 1.5% w/w of the total solution.
- 42. A low-foaming cleaning solution having a pH of from about 8 to about 9.5 and consisting essentially of:
a) at least one surfactant selected from the group consisting of sodium octyl sulfonate, sodium xylene sulfonate, and a block copolymer consisting of a polyoxyethylene block capped at both ends by polyoxypropylene blocks where the total molecular weight of the polyoxypropylene portion is 1700 and the polyoxyethylene portion comprises about 20% of the total molecular weight, and mixtures thereof, in a concentration range of from about 0.005% to about 4% w/w of the total solution; b) hydrogen peroxide in a concentration of from about 0.005% to about 3% w/w of the total solution; c) at least one cation sequestering agent selected from the group consisting of citric acid, 1-hydroxyethylidene-1,1,-diphosphonic acid, and mixtures thereof, in a concentration of from about 0.001% to about 11% w/w of the total solution; d) at least one corrosion inhibitor selected from the group consisting of propylene glycol, 1,2,3-benzotriazole, sodium nitrite, sodium molybdate, propylene glycol, and mixtures thereof, in a concentration of from about 0.005% to about 1.5% w/w of the total solution; and e) at least one solvent selected from the group consisting of water, deionized water, and mixtures thereof to 100% w/w of the total solution.
- 43. A dry particulate cleaning formulation which can be dissolved in water, deionized water, or mixtures thereof, to produce a cleaning solution according to claim 24.
- 44. A dry particulate cleaning formulation according to claim 43 wherein said at least one surfactant is present in a concentration of from about 2% to about 20% w/w, said at least one active oxygen releasing compound is present in an amount to produce hydrogen peroxide in a concentration of from about 5% to about 30% w/w, and said at least one builder is present in a concentration of from about 5% to about 50% w/w, all based on the total weight of the formulation.
- 45. A dry particulate formulation according to claim 44 wherein said at least one surfactant is present in a concentration of from about 2% to about 10% w/w, said at least one active oxygen releasing compound is present in an amount to produce hydrogen peroxide in a concentration of from about 15% to about 25% w/w, and said at least one builder is present in a concentration of from about 10% to about 20% w/w, all based on the total weight of the formulation.
- 46. A dry particulate formulation according to claim 43 comprising a diluent in the form of at least one inert filler selected from the group consisting of sulfate salts, phosphate salts, silicate salts, carbonate salts, and mixtures thereof.
- 47. A method of cleaning equipment used to circulate food products, in place, comprising:
(1) providing a cleaning solution according to claim 28; and (2) circulating said cleaning solution through equipment to be cleaned at a temperature of 40° C. or higher.
Parent Case Info
[0001] This application is a continuation-in-part of U.S. application Ser. No. 09/718,701 filed on Nov. 22, 2000, which application is entitled under 35 U.S.C. 119(e) to the benefit of U.S. provisional application No. 60/167,631, filed on Nov. 26, 1999.
Provisional Applications (1)
|
Number |
Date |
Country |
|
60167631 |
Nov 1999 |
US |
Continuation in Parts (1)
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Number |
Date |
Country |
Parent |
09718701 |
Nov 2000 |
US |
Child |
10193182 |
Jul 2002 |
US |