Low impedance oxide resistant grounded capacitor for an AIMD

Information

  • Patent Grant
  • 9931514
  • Patent Number
    9,931,514
  • Date Filed
    Monday, August 29, 2016
    8 years ago
  • Date Issued
    Tuesday, April 3, 2018
    6 years ago
Abstract
A hermetically sealed filtered feedthrough assembly for an active implantable medical device includes an electrically conductive ferrule hermetically sealed by a first braze to an insulator. A conductor is hermetically sealed to and disposed through the insulator. A filter capacitor has an active electrode plate and a ground electrode plate which are disposed within and supported by a capacitor dielectric in an interleaved, partially overlapping relationship. A first passageway is disposed through the capacitor dielectric having a capacitor internal metallization which is connected to the active electrode plate. A capacitor external metallization electrically connects to the ground electrode plate. An oxide-resistant metal addition includes a conductive core with a conductive cladding of a different material. A first electrical connection is between the oxide-resistant metal addition and the capacitor external metallization. A second electrical connection is between the oxide-resistant metal addition and the ferrule.
Description
FIELD OF THE INVENTION

The present invention generally relates to feedthrough capacitors. More particularly, the present invention relates to a feedthrough capacitor located on the device side of a medical device with a low impedance and oxide-resistant electrical connection to the device housing.


BACKGROUND OF THE INVENTION

Feedthrough capacitors and MLCC chip capacitors are well known in the prior art for active implantable medical devices (AIMDs). One is directed to U.S. Pat. Nos. 5,333,095; 5,905,627; 6,275,369; 6,529,103; and 6,765,780 all of which are incorporated herein by reference. The hermetic seal feedthrough terminal assemblies generally consist of a titanium ferrule into which an alumina hermetic seal is gold brazed. One or more leadwires penetrate through the alumina in non-conductive relationship with the ferrule. Gold brazes are also used to form a hermetic terminal between the one or more leadwires and the alumina ceramic.


First, some general information concerning good engineering design practice for electromagnetic interference (EMI) filters is described. It is very important to intercept the EMI at the point of lead conductor ingress and egress to the AIMD. It would be an inferior practice to put filtering elements down in the circuit board as this would draw EMI energy inside of the AIMD housing where it could re-radiate or cross-couple to sensitive AIMD circuits. A superior approach is to mount one or more feedthrough or MLCC-type capacitors right at the point of leadwire entrance so that the capacitor can be coupled to high frequency EMI signals from the lead conductors directly to the AIMD housing, which acts as an energy dissipating surface.


There are some interesting design challenges however. The titanium ferrule, which is laser welded into the overall AIMD housing, is at ground potential. Titanium tends to form oxides which act as either insulators or semi-conductors. Accordingly, grounding the feedthrough capacitor electrode plates directly to the titanium ferrule is contra-indicated. Reference is made to U.S. Pat. No. 6,465,779 (which is incorporated with this reference) which describes gold bond pad areas where the feedthrough capacitor external metallization can be directly connected to gold. The gold to which the feedthrough capacitor is directly connected is the braze material used to form the hermetic seal between the alumina and the titanium ferrule. As noted above, the hermetic seal is formed via a brazing process. By attaching the capacitor's ground plates to the gold, one can be assured that there will be no oxide that will increase the capacitor's equivalent series resistance (ESR) which can seriously degrade the capacitor's performance at high frequency. An undesirable aspect of using the gold braze for attachment is that gold is very expensive. Accordingly, there is a need for methods that provide a reliable low impedance ground path which is oxide resistant for grounding of AIMD filter capacitors. The present invention fulfills these needs and provides other related advantages.


SUMMARY OF THE INVENTION

An exemplary embodiment of a hermetically sealed filtered feedthrough assembly for an active implantable medical device (AIMD), includes: a) a ferrule of an electrically conductive material, the ferrule comprising a ferrule opening extending from a ferrule first end to a ferrule second end; b) an insulator of an electrically non-conductive material, the insulator comprising an insulator outer surface extending from an insulator first end to an insulator second end; c) an insulator metallization disposed at least partially on the insulator outer surface; d) a first braze hermetically sealing the insulator to the ferrule, the first braze formed between the ferrule and the insulator metallization of the insulator; e) a conductor hermetically sealed to and disposed through the insulator between the insulator first end and the insulator second end, the conductor in electrically non-conductive relation to the ferrule; f) a filter capacitor disposed near and/or on the insulator second end, the filter capacitor comprising: i) a capacitor dielectric comprising an dielectric outer surface extending from a first dielectric end to a second dielectric end; ii) at least one active electrode plate and at least one ground electrode plate disposed within and supported by the capacitor dielectric in an interleaved, partially overlapping relationship; iii) a first passageway disposed through the capacitor dielectric from the first dielectric end to the second dielectric end; iv) a capacitor internal metallization disposed within the first passageway electrically connected to the at least one active electrode plate and in non-conductive relation with the at least one ground electrode plate; v) a capacitor external metallization disposed at least partially on the dielectric outer surface, the capacitor external metallization electrically connected to the at least one ground electrode plate and in non-conductive relation with the at least one active electrode plate; g) an oxide-resistant metal addition, comprising: i) a conductive core; ii) a conductive cladding disposed on the conductive core, wherein the conductive core and the conductive cladding are different materials; h) a first electrical connection between the oxide-resistant metal addition and the capacitor external metallization; and i) a second electrical connection between the oxide-resistant metal addition and the ferrule.


In other exemplary embodiments, the second electrical connection between the oxide-resistant metal addition and the capacitor external metallization may be selected from the group consisting of a solder, a solder BGA, a solder paste, an epoxy, and a polyimide.


The second electrical connection between the oxide-resistant metal addition and the capacitor external metallization may be a laser weld or a second braze. The first and second brazes may comprise two brazes configured to reflow at different temperatures, the first braze comprising a higher temperature braze and the second braze comprising a lower temperature braze. The second braze may be selected from the group consisting of a low temperature gold alloy, a nano-gold preform and a fine gold wire with small grain size. The first braze may be disposed at or near the ferrule first end or the first braze may be disposed at or near the ferrule second end. The first braze may hermetically seal the insulator to the ferrule and also form the second electrical connection between the oxide-resistant metal addition and the ferrule.


The conductive core may be selected from the group consisting of stainless steel, MP35N and niobium. The conductive core may be selected from the group consisting of a solid material, a plurality of fibers twisted, braided and/or woven and a hollow tube. The conductive cladding may be selected from the group consisting of gold, palladium and platinum. A manufacturing process of the conductive cladding may be selected from the group consisting of a plating, an electroplating, a drawn filled tubing, a vapor or chemical deposition and an overcoating.


The oxide-resistant metal addition may be a plurality of oxide-resistant metal additions. The first electrical connection may be a plurality of first electrical connections. The feedthrough filter assembly of claim 1, wherein the second electrical connection may be a plurality of second electrical connections. The first electrical connection may be disposed a distance apart from the second electrical connection in a direction along a longitudinal length of the oxide-resistant metal addition.


The capacitor external metallization may be an adhesion metallization and a wetting metallization, wherein the adhesion metallization is disposed at least partially on the outer insulator surface and wherein the wetting metallization is disposed on the adhesion metallization.


An insulative washer may be disposed between the insulator and the filter capacitor.


The ferrule may be configured to be joined to an AIMD housing by a laser weld or braze or the ferrule may be formed from and as a continuous part of an AIMD housing.


The ferrule first end and the insulator first end may be associated with a body fluid side and the ferrule second end and the insulator second end may be associated with a device side.


The insulator first end and the ferrule first end may be oriented facing a same first direction, and wherein the insulator second end and the ferrule second end may be oriented facing a same second direction, the same first direction being opposite of the same second direction.


Other features and advantages of the present invention will become apparent from the following more detailed description, when taken in conjunction with the accompanying drawings, which illustrate, by way of example, the principles of the invention.





BRIEF DESCRIPTION OF THE DRAWINGS

The accompanying drawings illustrate the invention. In such drawings:



FIG. 1 illustrates a wire-formed diagram of a generic human body showing various types of active implantable and external medical devices currently in use;



FIG. 2 is an isometric cut-away view of a unipolar feedthrough capacitor;



FIG. 3 is a cross-sectional view of the unipolar capacitor of FIG. 2 shown connected to the hermetic terminal of an AIMD;



FIG. 4 is a schematic diagram of the unipolar feedthrough capacitor shown in FIGS. 2 and 3;



FIG. 5 is an exploded view of the cover sheets and internal electrodes of the unipolar capacitor previously described in FIGS. 2 and 3;



FIG. 6 is a diagrammatic perspective view of a typical AIMD;



FIG. 7 is an isometric view of the quad polar feedthrough capacitor previously described in the prior art pacemaker of FIG. 6;



FIG. 8 is a sectional view taken from section 8-8 of FIG. 7 and illustrates the quad polar feedthrough capacitor interior electrode plates;



FIG. 9 is an exploded view of the quad polar feedthrough capacitor of FIG. 7;



FIG. 10 is the schematic diagram of the quad polar feedthrough capacitor of FIG. 7;



FIG. 11 illustrates a prior art quad polar feedthrough capacitor that is rectangular instead of round;



FIG. 12 is an isometric view of the feedthrough assembly before the feedthrough capacitor is placed on top;



FIG. 13 is taken from section 13-13 from FIG. 11 showing the four active electrode plates;



FIG. 14 is taken from section 14-14 from FIG. 11 and illustrates the ground electrode plate;



FIG. 15 is an assembly view taken from FIGS. 11-14 showing the quad polar rectangular feedthrough capacitor mounted onto the hermetic seal housing and the ferrule;



FIG. 16 is a sectional view taken from section 16-16 from FIG. 15 cutting through one of the leadwires;



FIG. 17 is the electrical schematic diagram of the quad polar feedthrough capacitors previously illustrated in FIGS. 14 and 15;



FIG. 18 is a perspective view showing gold bond pads used to eliminate the problem of attachment to oxides of titanium between the feedthrough capacitor outside diameter and its ground electrode plate sets;



FIG. 19 shows that the electrical connections between the capacitor's ground metallization is now directly connected to the oxide resistant noble pad;



FIG. 20 is a sectional view of the structure of FIG. 19 taken through lines 20-20;



FIG. 21 is very similar to FIG. 19, except that the quad polar capacitor is round which is consistent with the feedthrough capacitor previously illustrated in the cardiac pacemaker of FIG. 6;



FIG. 22 is generally taken from section 22-22 from FIG. 21 cutting through two leadwires and illustrates the capacitor's internal structure including its ground and active electrode plates;



FIG. 23 illustrates the electrical schematic diagram of the improved rectangular quad polar feedthrough capacitor of FIG. 19 and the round quad polar capacitor of FIG. 21;



FIG. 24 illustrates attenuation versus frequency comparing the ideal feedthrough capacitor to one that has undesirable ground electrode plate connection to an oxidized surface;



FIG. 25 is a perspective view of an exemplary feedthrough capacitor embodying the present invention;



FIG. 26 is a sectional view taken along line 26-26 of the structure of FIG. 25;



FIG. 27 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 27A is an exploded view of the structure of FIG. 27 showing the peninsula portion of the ferrule;



FIG. 28 is a sectional view taken along line 28-28 of the structure of FIG. 27;



FIG. 28A is an enlarged view of a novel embodiment of a similar structure to FIG. 28 taken along lines 28A-28A;



FIG. 28B is another embodiment similar to the structure of FIG. 28A now showing a rectangular shaped structure attached to the ferrule;



FIG. 28C is a view similar to 27A except now showing a recess on the ferrule for the wire to fit within;



FIG. 29 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 30 is a sectional view taken along line 30-30 of the structure of FIG. 29 cutting through two leadwires;



FIG. 31 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 32 is a sectional view taken along line 32-32 of the structure of FIG. 31 cutting through two leadwires;



FIG. 33 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 34 is a sectional view taken along the non-linear line 34-34 of the structure of FIG. 33;



FIG. 35 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 36 is an exploded view of the structure of FIG. 35 showing the peninsula portion of the ferrule;



FIG. 37 is a sectional view taken along line 37-37 of the structure of FIG. 35;



FIG. 38 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 39 is a sectional view taken along line 39-39 of the structure of FIG. 38 now showing a ground electrode plate;



FIG. 40 is an sectional view taken along line 40-40 of the structure of FIG. 38 now showing an active electrode plate;



FIG. 41 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 42 is an sectional view taken along line 42-42 of the structure of FIG. 41 now showing a ground electrode plate;



FIG. 43 is an sectional view taken along line 43-43 of the structure of FIG. 41 now showing an active electrode plate;



FIG. 44 is a sectional view taken along the non-linear lines 44-44 of the structures of both FIGS. 38 and 41;



FIGS. 45A, 45B and 45C are perspective views of various embodiments of the novel ground attachments shown in FIGS. 38, 41 and 44;



FIG. 46 is a perspective view of another exemplary feedthrough capacitor embodying the present invention;



FIG. 47 is an exploded view of the structure of FIG. 46 showing the novel ground attachment below the capacitor;



FIG. 48 is a perspective view of another exemplary feedthrough embodying the present invention now showing novel rectangular ground attachments in the ferrule;



FIG. 49 is a perspective view of another exemplary feedthrough embodying the present invention now showing novel circular ground attachments in the ferrule;



FIG. 50 is similar to either FIG. 48 or 49 now showing the capacitor grounded to the ferrule;



FIG. 51 is a sectional view taken along line 51-51 of the structure of FIG. 50 now showing a ground electrode plate;



FIG. 52 is a sectional view taken along line 52-52 of the structure of FIG. 50 now showing an active electrode plate;



FIG. 53 is a perspective view of another exemplary feedthrough embodying the present invention now showing novel ground attachments around the continuous perimeter of the ferrule;



FIG. 54 is an exploded view of another exemplary feedthrough capacitor embodying the present invention now showing novel ground attachment plate;



FIG. 55 is the perspective assembled view of the structure of FIG. 54 showing the capacitor metallization grounded to the novel plate;



FIG. 56 is a sectional view similar to FIG. 28 showing an alternative hermetic seal between the ferrule and the insulator;



FIG. 57 is a sectional view similar to FIG. 28 showing another alternative hermetic seal between the ferrule and the insulator;



FIG. 58 is a sectional view similar to FIG. 26 showing discontinuous leadwires;



FIG. 59 is a sectional view similar to FIG. 58 now showing MLCC chip capacitors instead of feedthrough capacitors;



FIG. 60 is a sectional view similar to FIG. 58 now showing no gold brazes between the alumina insulator and the corresponding leads but rather a co-fired alumina ceramic;



FIG. 61 is a sectional view similar to FIG. 59 now with a substrate or circuit board;



FIG. 62 is a sectional view similar to FIG. 58 now showing a co-fired alumina ceramic insulator with solid filled vias;



FIG. 63 is an enlarged sectional view taken from section 63-63 from FIG. 62 showing human or robotic manufacturing;



FIG. 64 is an enlarged sectional view taken from section 64-64 from FIG. 62 showing a laser-welded metallurgical bond;



FIG. 65 is an enlarged sectional view similar to section 63-63 now showing a circular clad wire 218 as an oxide-resistant metal addition;



FIG. 66 is an enlarged sectional view similar to section 63-63 now showing a square clad wire 218 as an oxide-resistant metal addition;



FIG. 67 is an isometric view similar to FIG. 25, but now showing a cladded wire 218 as a metal addition;



FIG. 68 is an isometric view similar to FIG. 67, however now the metal addition is a multitude of metal additions;



FIG. 69 is an enlarged sectional view taken along lines 69-69 from FIG. 67, but now showing the metal-joining process 220 with the cladding from the cladded wire metal addition 218;



FIG. 70 is an enlarged sectional view similar to FIG. 69, but now showing a square and/or rectangular metal addition 218;



FIG. 71 is an enlarged sectional view similar to FIG. 69, but now showing a cladded wire metal addition 218 brazed to the ferrule in a secondary braze operation;



FIG. 72 is an enlarged sectional view similar to FIG. 71 wherein now the braze to the cladded wire metal addition 218 is made at the same time as the braze between the ferrule 216 and the metallization 223 of the insulator;



FIG. 73 is an enlarged sectional view similar to FIG. 72, but now showing that a common and continuous braze can connect the ferrule to the cladded wire metal addition 218 while also forming a hermetic seal between the ferrule and the metallization of the insulator.





DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS


FIG. 1 is a wire-formed diagram of a generic human body showing various types of active implantable and external medical devices 100 that are currently in use. 100A is a family of external and implantable hearing devices which can include the group of hearing aids, cochlear implants, piezoelectric sound bridge transducers and the like. 100B includes an entire variety of neurostimulators and brain stimulators. Neurostimulators are used to stimulate the Vagus nerve, for example, to treat epilepsy, obesity and depression. Brain stimulators are similar to a pacemaker-like device and include electrodes implanted deep into the brain for example but not limited to sensing the onset of the seizure and also providing electrical stimulation to brain tissue to prevent the seizure from actually happening, or for treating memory loss, Alzheimer's and the like. The leadwires that come from a deep brain stimulator are often placed using real time imaging. Most commonly such leadwires are placed during real time MRI. 100C shows a cardiac pacemaker which is well-known in the art. 100D includes the family of left ventricular assist devices (LVAD's), and artificial hearts, including the recently introduced artificial heart known as the ABIOCOR. 100E includes an entire family of drug pumps which can be used for dispensing of insulin, chemotherapy drugs, pain medications and the like. Insulin pumps are evolving from passive devices to ones that have sensors and closed loop systems. That is, real time monitoring of blood sugar levels will occur. These devices tend to be more sensitive to EMI than passive pumps that have no sense circuitry or externally implanted leadwires. 100F includes a variety of external or implantable bone growth stimulators for rapid healing of fractures. 100G includes urinary incontinence devices. 100H includes the family of pain relief spinal cord stimulators and anti-tremor stimulators. 100H also includes an entire family of other types of neurostimulators used to block pain. 100I includes a family of implantable cardioverter defibrillators (ICD) devices and also includes the family of congestive heart failure devices (CHF). This is also known in the art as cardio resynchronization therapy devices, otherwise known as CRT devices. 100J illustrates an externally worn pack. This pack could be an external insulin pump, an external drug pump, an external neurostimulator, a Holter monitor with skin electrodes or even a ventricular assist device power pack.



FIG. 2 is an isometric cut-away view of a unipolar feedthrough capacitor 132. It has an outside diameter metallization 142 and an inside diameter metallization 144. Active electrode plates 148 and ground electrode plates 146 are interleaved in the dielectric body. As can be seen, the active and ground electrode plates are generally parallel to one another. The active electrode plate set 148 is connected to the inside diameter metallization 144. The ground electrode plate set 146 is connected to the outside diameter metallization 142. Metallization surfaces 142 and 144 can be glass fritted platinum silver or various types of plating. The metallization surfaces 142 and 144 are very important as it is easy to make electrical connection of these surfaces to other circuit elements.



FIG. 3 is a cross-sectional view of the unipolar capacitor of FIG. 2 shown connected to the hermetic terminal of an active implantable medical device, such as a cardiac pacemaker. Shown is a hermetic seal formed from an insulator 160, such as an alumina ceramic, glass or the like. A gold braze 162 forms a hermetic seal between the insulator 160 and leadwire 114, 111. The leadwire labeled 114 on the body fluid side is generally directed to an implantable lead that has an electrode contactable to biological cells (not shown). And there is a second gold braze 150 which hermetically connects the outside diameter of the insulator material 160 to a ferrule 112. To help form a hermetic seal between the insulator 160 and the leadwire 114 or ferrule 112, an adhesion layer 153 and a wetting layer 151 are used. Not shown is a typical first operation wherein the alumina ceramic 160 is first prepared by sputtering typically with a layer of molybdenum and then a layer of titanium. The first layer of molybdenum is the adhesion layer 153 and the second layer of titanium is the wetting layer 151 which provides for good wetting of the gold braze 162 or 150 to form the hermetic seal. In the prior art, the ferrule is generally of titanium. The AIMD housing 116 is also generally of titanium. The housing 116 also serves as an electrical ground represented by the ground symbol. A laser weld 154 is formed which connects the ferrule 112 to the AIMD housing 116 electrically and mechanically. The laser weld 154 also forms a hermetic seal. The unipolar feedthrough capacitor 132 of FIG. 2 is shown mounted directly to the hermetic seal insulator. An electrical connection 156 connects the capacitor inside diameter metallization 144 to leadwire 111. There is also an electrical connection material 152 connected directly to the ferrule 112 as shown. This electrical connection 152 is substantially inferior to the present invention and thus undesirable. As shown, an electrical connection is being made directly to the titanium surface 112. It is well known that titanium, particularly when brought to elevated temperatures, forms oxides. Oxides of titanium, for example, titanium dioxide is so stable, it is used as a paint pigment. It is also highly resistive and also has semi-conductive properties. For this reason, this creates an undesirable series resistance ROXIDE between the feedthrough capacitor and the ferrule 112 and/or AIMD housing 116.



FIG. 4 is a schematic diagram of unipolar feedthrough capacitor shown in FIGS. 2 and 3. Shown is an ideal feedthrough capacitor C. In general, feedthrough capacitors are three-terminal devices in that there is an input side 114 (terminal one), an output side 111 (terminal two) and a ground 116 (terminal three). It is well known that an implanted lead can undesirably act as an antenna and couple to high frequency electromagnetic interference (EMI) energy. This EMI energy may be undesirably coupled along the implanted leadwire conductors to lead 111, which is directed to sensitive AIMD electronics. It is well known that EMI can disrupt the proper operation of AIMD electronic circuitry. For example, there have been a number of case reports of complete inhibition of cardiac pacemakers when EMI was falsely detected as a normal cardiac rhythm and the pacemaker inhibited. This is immediately life-threatening as its leaves a pacemaker dependent patient without a heartbeat during the entire time of the EMI exposure. The feature in the feedthrough capacitor as illustrated in FIGS. 2 and 3 is to divert incoming EMI energy in the implanted lead and dissipate it to the electromagnetically shielded housing 116 of the AIMD which said EMI energy may be dissipated as a harmless amount of thermal or RF energy. In other words, it is the job of feedthrough capacitors to protect the sensitive AIMD electronics while at the same time freely allowing pacing or therapeutic pulses to pass and also to allow the AIMD to sense biological signals that are generally in the frequency range from zero to 2000 Hz without interruption. The capacitor is also known as a frequency variable impedance element. The capacitive reactance XC in ohms is given by the equation:

XC=1/[2πfC]

wherein, f=frequency in hertz and C=the capacitance in farads. This inverse relationship with frequency means that, at very low frequencies, the capacitor looks like an open circuit (as if it were not there at all), and at very high frequencies, the capacitor acts as a short circuit where it diverts undesirable RF energy such as emissions from cellular telephones, microwave ovens or the like.


Referring once again to FIG. 4, one can see ROXIDE. This resistive element is highly undesirable because it degrades the performance of the feedthrough capacitor all across its frequency range. There is also a great deal of variability in this oxide. During the gold brazing operation or during the formation of the hermetic seal, oxide poisoning may reach any corner or part of the brazing oven. The inventors have experienced some of the parts to be relatively oxide free where others in the lot may have a very thick or heavy oxide build-up.



FIG. 5 is an exploded view of the cover sheets 147 and internal electrodes of the unipolar capacitor 132 previously described in FIGS. 2 and 3. One can see that there are active electrode plates 148 screened onto dielectric layers 149 and interleaved with ground electrode plates 146. A number of blank cover sheets 147 are placed on top and bottom for insulative and mechanical strength purposes.



FIG. 6 is a diagrammatic explosion of a typical AIMD, such as a cardiac pacemaker 100C. It has an overall electromagnetic shielded titanium housing 116 along with a polymer header block (connector block) 101. Shown, are two implantable leads 107 and 107′, which in this case are directed to chambers of the heart 124. There are additional electrodes located at point 109a, 109b in the right ventricle and distal electrode 109a′, 109b′ located in the right atrium. In the art, this is known as a simple dual chamber bipolar pacemaker. As shown, EMI can be undesirably coupled to leads 107 and 107′ where it can be conductive to the leadwires 114 of the hermetic seal assembly 120. The feedthrough capacitor element 132 diverts the EMI conducted on leads 114 into the conductive AIMD housing 116 where it is dissipated as eddy currents or RF energy (EMI) as simply coupled to surrounding body tissues. In any event, the EMI is prevented from reaching the delicate AIMD circuit boards 122. The leads 107, 107′ have male connectors 105, 105′ which are inserted into female connectors 103, 103′ of the header block 101.



FIG. 7 is an isometric view of the quad polar feedthrough capacitor 132 previously described in the prior art pacemaker of FIG. 6. The quad polar feedthrough capacitor has an outside diameter metallization 142 and four feedthrough holes all of which have inside diameter metallization 144.



FIG. 8 is a sectional view taken from section 8-8 of FIG. 7 and illustrates the quad polar feedthrough capacitor interior electrode plates. There is a ground electrode plate set 146 which is coupled to the outside diameter metallization 142. There are four different sets of active electrode plates 148 which are each coupled to their own individual feedthrough hole 134.



FIG. 9 is an exploded view of the quad polar feedthrough capacitor of FIG. 7. Shown, are the four active electrode plate areas 148 and the ground electrode plates 146. As previously described, these active and ground electrode plates are in interleaved relationship. There are also a number of blank ceramic cover sheets 147 added on top and bottom for mechanical strength and electrical insulation. Those skilled in the capacitor art will understand that a higher voltage capacitor could be built by interleaving additional blank electrodes between the active and ground electrode plates thereby building up the dielectric thickness. Typically, the dielectric material could be of barium titanate ceramic and could vary in dielectric constant k anywhere from 50 all the way up to several thousand.



FIG. 10 is the schematic diagram of the quad polar feedthrough capacitor of FIG. 6. Again, as previously described for the unipolar capacitor of FIG. 2 and FIG. 4, there is an undesirable resistance ROXIDE as shown. Ideally, feedthrough capacitors are three-terminal devices that have no series inductance or series resistance in their ground connection. This is why they make such effective broadband electromagnetic interference filters. In general, a feedthrough capacitor can provide attenuation over a very broad frequency range extending even to 18 to 20 GHz. However, this oxide is highly undesirable as it can seriously degrade filter performance. In general, filter performance is described by the terms insertion loss or by attenuation. Both of these are generally measured in a balanced 50 ohm system with the measurement units in decibels.



FIG. 11 illustrates a prior art quad polar feedthrough capacitor that, in this case, is rectangular instead of round. It still has an outside metallization 142, but in this embodiment, instead of being all around a perimeter or outside diameter, it is shown only over a portion of the rectangular edge of the capacitor. In another embodiment (not shown) the outside metallization 142 could extend around the entire perimeter of the capacitor. Feedthrough metallization 144 is provided for each of the four feedthrough holes. FIG. 11 in combination with FIG. 12 illustrates an exploded assembly view wherein the capacitor of FIG. 11 is designed to be mounted atop a prior art quad polar hermetic terminal of FIG. 12. The hermetic terminal of FIG. 12 has four leadwires 111, 114, a hermetic insulator 124 and a ferrule 112, generally of titanium. There is a gold braze 150 which forms a hermetic joint between the ferrule 112 and the generally alumina ceramic insulator 124. There are four more gold brazes 162 which join leadwire 111 to the inside diameter holes of the hermetic insulator 124.



FIG. 13 is taken from section 13-13 from FIG. 11. Shown are the four active electrode plates 148 of the feedthrough capacitor.



FIG. 14 is taken from section 14-14 from FIG. 11 and illustrates the ground electrode plate 146 of the feedthrough capacitor.



FIG. 15 is an assembly view taken from FIGS. 11 and 12 showing the quad polar rectangular feedthrough capacitor mounted onto the hermetic seal housing and the ferrule 112. An electrical connection 152 is generally made with a thermal-setting conductive adhesive between the capacitor metallization 142 directly to the ferrule 112.



FIG. 16 is a sectional view taken from section 16-16 from FIG. 15. This sectional view goes through one of the leadwires 111 and shows the interior ground electrode plate set 146 and the active electrode plate set 148. The ground electrode plates 146 make electrical and mechanical contact to the capacitor ground metallization 142. There is an electrical connection 152 shown directly to the top surface of the titanium ferrule 112. There is a cross-hatched area 164 which shows the formation of a very undesirable layer of titanium oxides. For simplicity, this layer is shown only on the top surface, but in reality, it would coat all of the surfaces of the titanium cross-section. As previously mentioned, the formation of this oxide can happen during initial gold brazing, during subsequent storage and handling of the overall filter feedthrough subassembly, or during laser welding of the ferrule 112 into the AIMD housing 116. One particular problem is that the thermal-setting conductive adhesive 152 always contains a certain amount of available oxygen. When a laser weld is formed to the AIMD housing, which is positioned to be placed in slot 163, this significantly raises the temperature of thermal-setting conductive adhesive 152. This is why a thermal-setting conductive polyimide is the connection material of choice, as a conductive polyimide is stable at temperatures well above 300 degrees C. This is in comparison to most epoxies which are only rated to about 230 degrees C. When this assembly is raised through laser welding to high temperature, oxygen can be released from a thermal-setting conductive material 152 and then be formed as a titanium dioxide or trioxide 164 on the ferrule 112 of the hermetic seal.



FIG. 17 is the schematic diagram of the quad polar feedthrough capacitors previously illustrated in FIGS. 11, 15 and 16. Shown, is the undesirable ROXIDE which is shown in series between the ideal feedthrough capacitor and ground, which is the same electrical potential as the AIMD housing 116. As will be shown, the presence of this resistive oxide seriously degrades the filter performance.



FIG. 18 is taken from FIG. 20 of U.S. Pat. No. 6,765,779 which describes gold bond pads to eliminate the problem of attachment to oxides of titanium between the feedthrough capacitor outside diameter and its ground electrode plate sets. Referring to FIG. 18, one can see that there are novel gold braze pads 165 that have been added. Referring to FIG. 12, one can see that these gold braze pads 165 are not present.



FIG. 19 shows that the electrical connections 152 between the capacitor's ground metallization 142 is now directly made to this non-oxidizable noble pad 165. U.S. Pat. No. 6,765,779 is incorporated herein by reference. As is shown in the '779 patent, one possible material for the oxide resistant pad 165 is gold. This gold pad 165 is continuous and is co-formed at the same time the hermetic seal (gold braze) is made to the alumina ceramic insulator 160. In fact, this is a limitation of U.S. Pat. No. 6,765,779 in that the gold bond pad 165 is always formed as part of the co-braze to the alumina ceramic insulator 160.



FIG. 20 is generally taken from section 20-20 from FIG. 19. It is very similar to FIG. 16 except that the gold braze area 165 has been enlarged to include the gold bond pad area 165. Pure gold has a high melting point (1064° C.) which is above the allotropic transformation temperature of titanium (883° C.). Titanium is soluble in gold, particularly more so at elevated temperature. Elevated temperature maximizes titanium dissolution into gold. As previously noted, titanium is highly reactive to air readily forming surface oxides. Brazing to titanium, therefore, is generally performed at high vacuum. At high vacuum brazing temperatures, when a gold brazed joint 164 is formed between, for example, a gold braze preform and a titanium ferrule, the titanium reacts with the gold to form a direct metallurgical bond to the titanium ferrule 112. As this direct metallurgical bond is gold-rich, it essentially retains the high conductivity of the gold and its oxide resistant properties. In this regard, the enlarged gold braze area surface, that is, the bonding pad that is formed is part of the oxide-resistant metallurgical bond (oxide-resistant also means oxide-free for the most part as any oxides that are formed are very minimal). This enlarged gold braze area serves as the electrical connection material that is connectable to the capacitor ground metallization 142. To summarize, a continuous electrical connection that is consistent in its conductivity over the service life of the device is made. The electrical connection is between the titanium ferrule 112 and the filter capacitor ground metallization 142 via the electrical connection material 152 directly to the non-oxidizable pad 165.



FIG. 21 is very similar to FIG. 19, except in this case, the quad polar capacitor is round which is consistent with the feedthrough capacitor 132 previously illustrated in the cardiac pacemaker of FIG. 6.



FIG. 22 is generally taken from section 22-22 from FIG. 21 and illustrates the capacitor's internal structure including its ground and active electrode plates. Importantly, outside diameter electrical connection material 152, which connects the outside diameter metallization 142 to the ferrule 112, is directly attached to the gold braze material 165. The fact that some of this overlaps onto the titanium surface is not important. What is critical is that a suitable amount of the electrical connection material 152 is directly attached to an oxide resistant noble surface, so that an undesirable resistance can never develop.



FIG. 23 illustrates the schematic diagram of the improved rectangular quad polar feedthrough capacitor of FIG. 19 and the round quad polar capacitor of FIG. 21. One can see that we now have insignificant resistance in the connection from the feedthrough capacitor to ground 116, which is the overall shielded equipotential surface of the electromagnetically shielded housing 116.



FIG. 24 is attenuation versus frequency curves which compares the ideal feedthrough capacitor to one that has undesirable ground electrode plate connection to an oxidized surface. One can see that the feedthrough capacitor with the resistive oxide ROXIDE has greatly reduced attenuation all across the frequency band as compared to the ideal feedthrough capacitor.



FIG. 25 illustrates an embodiment of a filtered feedthrough assembly of the present invention 210. Illustrated is a ferrule 216 of the hermetic seal. The ferrule 216 is generally of titanium. In this case, it has a continuous slot 217, which can receive the can halves of an active implantable medical device, such as a cardiac pacemaker. These titanium can halves are then laser welded to the titanium ferrule 216. In general, a feedthrough capacitor 212 would be oriented towards the inside of the can to protect it from body fluids. In this case, there are novel round platinum iridium wires 218, which have been laser welded 220 directly to the ferrule 216. Laser weld 220 could also be replaced by a resistance weld or a secondary braze operation at a lower temperature using for example, but not limited to, copper based brazing materials such as Cu-Sil or Ti—Cu-Sil, silver based brazing materials such as Silvaloy (Ag—Cu—Zn) or Gapasil (Ag—Pd—Ga), gold based brazing materials such as Au—Cu, Au—Cu—Ag, or Au—Cu—Ni, or palladium based braze materials such as Pd—Ni—Si. A capacitor ground metallization 223 is attached using solder or thermal-setting conductive adhesives 222 to the platinum iridium wire 218. The platinum iridium wire can actually be of any noble material including platinum, gold, palladium, silver, ruthenium, rhodium, osmium, iridium, alloys based on each of these noble metals and combinations thereof. Leadwires 211 through 211′″ pass through the feedthrough capacitor and through the hermetic seal. This is best understood by referring to FIG. 26, which is taken from section 26-26 from the structure of FIG. 25.



FIG. 26 illustrates the laser weld 220, the noble wire 218 and the solder or thermal-setting conductive adhesive 222. In FIG. 26, one can see the capacitor interior electrode plate stacks. A ground electrode plate stack 230 and an active electrode plate stack are designated by 232′ and 232′ which are connected respectively to terminal pins 211′ and 211′. It is understood by one skilled in the art that various structures and techniques are used to connect the active electrode plates to the leadwires. On the body fluid side of the capacitor, one can see gold brazes 226 and 228. Gold braze 226 connects the ferrule 216 to the alumina insulator 224 providing a robust mechanical and hermetically sealed joint. Gold braze 228 forms a robust mechanical and hermetic seal between the alumina ceramic 224 and the leads 211. An electrical connection 256 connects the capacitor inside diameter metallization 255 to the leadwire 211.


Referring once again to FIGS. 25 and 26, one can see that the leadwire 218 provides a very novel feature, that is, electrical connection material 222 does not directly attach to the ferrule 216. The reason for this is that the ferrule is typically of titanium, which commonly forms titanium oxides. Titanium oxides are very resistive and can also act as semi-conductors. This means that a direct connection to titanium would degrade the effectiveness of the capacitor ground electrode plate stack. The noble wire 218 acts as an intermediate surface. By laser welding 220 the wire 218 to the titanium ferrule 216, one forms a very strong oxide resistant metallurgical bond. Now, the surface on wire 218 is relatively oxide free. For example, it could be gold, platinum, palladium, silver, ruthenium, rhodium, osmium, iridium, alloys based on each of these noble metals and combinations thereof which are oxide resistant at room temperatures. In fact, the wire 218 could be pure platinum and not platinum iridium. The reason for this is that the iridium can form undesirable oxides.


Referring once again to FIG. 26, shown is that the gold brazes forming the hermetic seals 226 and 228 are on the body fluid side. There are a number of AIMD manufacturers that prefer having the gold braze on the body fluid side. By having the gold braze in this location, however, making a connection to the capacitor's outside perimeter or diameter metallization 223 to the same gold braze surface becomes impossible. In other words, as previously described in FIG. 18, there is no possibility to provide the gold bond pad 165, which is a contiguous part of the hermetic seal braze 226. This is a major driving feature of the present invention in that a methodology is provided so that the feedthrough capacitor can be properly grounded to an oxide resistant surface even when the gold brazes are disposed on the opposite side (opposite the body fluid side).


Referring back to FIG. 26, one can see that there is an electrical pathway described as the electrical path from the capacitor internal ground electrode plate set 230, then through the capacitor peripheral or exterior metallization 223, and then through the electrical connection material which would have an a total resistance of less than 5-milliohms and a total inductance of less than 10 nanohenries. In another embodiment, total resistance of this grounding path would be less than 1-milliohm and the total inductance would be less than 1 nanohenry. As used herein, the definition of the term “grounding pathway” is the aforementioned grounding pathway extending from the capacitor internal electrode plates all the way to the AIMD conductive housing 116.



FIGS. 27-28 are similar to FIGS. 25-26 but now show a peninsula structure 244 formed as part of the ferrule 216. A ground wire 242 is attached to the peninsula 244. As can be seen best in the cross-section of FIG. 28, the ground wire 242 is not connected to the ground electrode plates 230. The ground electrode plates are still electrically coupled to the metallization 223 which is then electrically coupled to the ferrule 216 through the weld 220, the wire 218 and the thermosetting conductive adhesive 222 or solder.


Referring once again to FIG. 27A, one can see that the grounded peninsula 244, which is a continuous part of the machined ferrule 216, is electrically attached via material 219 to the grounded pin 242. The ground material could be a laser weld, a gold braze, a solder, a thermal-setting conductive adhesive or the like. In general, pin 242 is provided as a convenience to the AIMD manufacturer to either ground the internal circuit board, or to provide an addition pacing vector to a conductor of an implanted lead (not shown) or both. The electrical ground attachment from the peninsula 244 to lead 242 is very low in resistivity, meaning that it would also be applicable for high voltage implantable cardioverter defibrillator applications. In such an application, a very high shock current would flow through this ground joint to an external electrode (not shown).



FIG. 28A is an enlarged view of a new embodiment of the structure from FIG. 28 taken from lines 28A-28A now showing the wire 218 recessed into the ferrule 216. In this way the wire 218 may be positioned and affixed in a more efficient manner.



FIG. 28B is an enlarged view of another embodiment of the structure from FIG. 28 taken from lines 28B-28B now showing the rectangular wire 218 recessed into the ferrule 216. In this way the rectangular wire 218 may be positioned and affixed in a more efficient manner.


The round wire illustrated in FIG. 28A and the rectangular wire illustrated in FIG. 28B are just two embodiments. An infinite number of drawn wire shapes are available to the designer in the present application. This can include a square wire, a triangular wire, an elliptical wire or any cross-sectional shape that one can imagine. Accordingly, the present invention is not limited to any particular geometry wire and is in fact, inclusive of all possible geometries. As will be further illustrated, the oxide-resistant wire addition or metal additions of the present invention may also be comprised of cladded wire. An example of a cladded wire would be one with platinum cladding over an inexpensive copper core. The purpose of cladding is to provide an oxide resistant surface, but also reduce the cost by minimizing the use of precious metals.



FIG. 28C shows a perspective view similar to FIG. 27A now with the recess 231 and inserts 233 clearly shown. The inserts 233 are placed in the recess 231 before the wire 218 is placed and may be gold metal, gold brazed or any of the material variations and connection methods already described herein.



FIG. 29 is similar to FIG. 25 and illustrates that the two wires 218 could be replaced by a number of pads 234 as shown. In general, the pads could be formed as a continuous part (not shown) of the machining of the ferrule 216 or they could be added as a subsequent assembly by gold brazing or laser welding 220 as shown. The pads 234 would be of the same noble materials previously described as for the wire 218. This means that a convenient oxide resistant electrical connection 222 could be made using solder or thermal-setting conductive adhesives.


Throughout the invention, the intermediate biostable and oxide resistant intermediate structure, such as lead 218 shown in FIG. 27 with pad 234 as illustrated in FIG. 29, must have the following properties: 1) they must be weldable or brazable to the titanium ferrule 216; 2) this weld or braze joint 220 must break through any oxides of titanium and form a metallurgical bond between the structure 218 or 234 and the ferrule 216; and 3) the intermediate biostable wire 218 or pad 234 must be connectable to the capacitor's external metallization 223. The number of connection methods to the capacitor's external metallization is limited. This includes solders, solder paste and all types of thermal-setting conductive adhesives. In general, although possible, it is not reliably possible to braze or weld directly to the capacitor's external metallization 223, hence this option is not a preferred embodiment. In summary, the biostable wire 218 or pad 234 need not be platinum, but it can consist of a long list of metals, alloys based on these metals and combinations thereof that would meet the above criteria. Choices would be gold, palladium, tantalum, and niobium, alloys based on these metals and combinations thereof. Additional non-limiting considerations include: tungsten, iridium, ruthenium, rhodium, silver, osmium, alloys based on these metals and combinations thereof. Other nonlimiting examples include platinum based materials such as platinum-rhodium, platinum-iridium, platinum-palladium, platinum-tungsten, platinum-ruthenium, platinum-gold, gold-palladium, gold-silver, silver-palladium, gold-platinum and naturally occurring alloys like platiniridium (platinum-iridium), iridiosmium and osmiridium (iridium-osmium).


It will be appreciated that the pad 234 could also be clad as previously described, to the various wires 218 of FIG. 25 and on.



FIG. 30 is a sectional view taken from section 30-30 from FIG. 29 illustrating that the pads 234 and 234′ are disposed on both sides of the capacitor. It will be understood to those skilled in the art that they could also be disposed at the ends of the capacitor (not shown). It will be appreciated to one skilled in the art that the pads could be connected. For example, referring once again to FIG. 27, pads 234 and 234a could be filled in between so that there was one large continuous pad. These pads could also have holes in them to further facilitate the electrical attachment between the pad and the capacitor external ground metallization 223.



FIG. 31 is a perspective view of another embodiment similar to FIGS. 25-30 now showing a different configuration of pad 234. Here, pad 234 is shown in an L-shape. There is a hole in the bottom of the pad facilitating the laser weld or braze 220 to the ferrule 216. FIG. 32 is a sectional view taken along line 32-32 from the structure of FIG. 31.



FIG. 33 is a perspective view of yet another embodiment of a feedthrough capacitor assembly 210 similar to FIGS. 25-32. Here the pad 234 is a long pad that spans the length of the long side of the capacitor 212. The pad 234 has a large hole to facilitate the placement and bonding of the conductive adhesive 222.



FIG. 34 is a sectional view taken from section 34-34 from FIG. 33. It shows the long bracket 234 cross-section along with laser weld or braze 220.



FIG. 35 is similar to FIG. 25 except in this case there are more terminal pins 211. Accordingly, it is necessary that the oxide-resistant biostable wire 218 be longer and have more laser welds 220. This is because it would be undesirable to have a long distance between a filtered terminal pin and its associated ground. This is because inductance and resistance can build up across an internal ground plane, thereby degrading the RF filtered performance of a distal filtered pin. FIG. 36 is an exploded view of the structure of FIG. 35. In FIG. 36, the ground pin 242 is shown laser welded 219 or gold brazed 219 into the ferrule 216 in the peninsula area 244. In this case, the capacitor is a conventional capacitor wherein the ground electrode plates are terminated with metallization 223 disposed along the two long outside ends of the capacitor 212. In this case, there is no connection between terminal pin 242 and the capacitor's ground electrode plate stack 230. In a different embodiment (not shown), a capacitor's ground electrode plates could be connected to this grounded pin as completely described in U.S. Pat. No. 5,905,627, the contents of which are incorporated herein by reference. Referring once again to FIGS. 35-37, an alternative is given wherein a direct connection to terminal pin 242 and the grounding of the capacitor's electrode stacks 230 is nonexistent. That is, the electrical connection is between the capacitor metallization 223 and the noble wires 218.



FIG. 37 is a sectional view taken from section 37-37 from FIG. 35 illustrating that any one of the active pins 211 passes through feedthrough holes near the center of the capacitor 212 in a staggered pattern where the pin 211 makes contact with its own individual set of active electrode plates or many active electrode plates 232. The ground electrode plates 230 contact the capacitor's long-side perimeter metallization 223. The electrical attachment material 222 attaches the capacitor ground metallization 223 to the noble wire 218. The electrical attachment material 222 can be a solder or a thermal-setting conductive adhesive. The wire 218 can then be brazed or welded 220 to the ferrule 216.



FIG. 38 is similar to FIG. 35, which illustrates an alternative method of grounding the capacitor's ground electrode stack 230. Referring back to FIG. 36, one can see the novel ferrule peninsula 244 to which ground pin 242 is electrically and mechanically attached. In FIG. 28, ground pin 242 is electrically attached to the ferrule 216 and is thereby grounded in a similar manner as shown in FIG. 36. A novel L-shaped clip 246′ is electrically attached to ground pin 242 and engages a portion of the capacitor's external ground metallization 223. This is best illustrated in FIG. 28, where the ground clip 246′ being electrically connected 222 to the capacitor's ground metallization 223 is shown. Then, the ground pin 242 is electrically connected at 251 to the ground clip 246′.


Referring back to FIG. 38, illustrated is clip 246′ disposed on the top surface of the capacitor 212. There is an insulating structure 252 that is disposed on top of capacitor 212. This can be a conformal coating of insulation, an insulation sheet with adhesive layer, or even an alumina ceramic thin sheet of insulation. For the case where this insulation sheet 252 is alumina ceramic, it may have a cut-out pocket so that the clip 246′ drops down into it and fits flush with the top of the insulating layer 252. This would help to hold the clip 246′ in place and to index it.



FIG. 39 shows the ground electrode plate 230 which does not make contact with the leadwires 211 or the grounded wire 242. The ground electrode plate 230 makes contact with metallization 223 which is then in electrical contact with novel pad 246′.



FIG. 40 shows a multitude of active electrode plates 232 electrically coupled to the leadwires 211. Note that the grounded pin 242 lacks an active electrode plate 232.



FIGS. 41-43 are very similar to FIGS. 38-40. FIGS. 41-43 show a different embodiment of the novel pad 246a. Pad 246a is longer along the length of increased metallization 223. This design would increase filter performance due to the shortened electrical pathways. In this way, the inductance across the ground planes of the capacitor is greatly reduced. This means that outer pins 211 will have improved attenuation and greater insertion loss than the structure previously illustrated in FIG. 38.



FIG. 44 is a sectional view for both FIGS. 38 and 41. One can see better the peninsula or extension 244 that attaches to the ground wire 242. Referring once again to FIG. 44, one can see that the peninsula structure 244 can alternatively be placed on the right side as opposed to the left side. In addition, peninsula 244 could be placed on both sides, which would mean that there would be two ground pins 242. In this way, metallization 223 could also be added to the right side of the capacitor so that the right side became a mirror image of the core structure 246′ and grounded lead 242. An advantage of having two grounded pins 242 would be even lower inductance and resistance in the grounding path from the capacitor ground electrodes 230 through to the ferrule 216.



FIGS. 45A, 45B and 45C illustrate various types of L-shaped clips 246. In FIG. 45C, one can see the advantage of having a clip with an elliptical hole 247 because this allows electrical connection material 222, which can be a solder or a thermal-setting conductive adhesive, to be placed on the outside of the clip and also inside the elliptical hole. This increases the electrical contact area and thereby reduces the resistance as well as improves mechanical strength.



FIGS. 46 and 47 are an alternative embodiment of clip 246b previously illustrated in FIGS. 38 and 41. The novel clip 246b is under the capacitor 212 sandwiched between the ferrule 216 and the capacitor 212. A hole 247 is also in the clip 246b to facilitate placement of conductive adhesive 222. FIG. 47 is an exploded view that best shows the shape of novel clip 246b.


In the alternative embodiment shown in FIG. 46, the clip 246b is disposed underneath the capacitor 212 and electrically and mechanically attached directly to the peninsula structure 244. Having the clip 246b disposed underneath the capacitor 212, and then coming up on the side as is illustrated, would improve the RF performance of the capacitor. Effectively, this would shorten the ground pin 242 to almost zero thereby reducing the impedance and inductance of the ground clip 246b. A notch (not shown) could be put in the ferrule 216 of the hermetic terminal to facilitate the clip coming out through the bottom so that the capacitor 212 still would sit flush on top of the ferrule structure 216.



FIGS. 48-53 are similar to FIGS. 25-34 except that in this case pockets 248 and noble metal inserts 250 have been formed so that an oxide resistant electrical attachment 222 can be made between the capacitor ground metallization 223 and the ferrule 216. An alternative embodiment 250′ is shown where first, a brazing perform, such as a gold braze perform 250a, is placed and then a platinum cap 250b is placed over it. Alternative metals may be used as noted earlier. In addition, instead of a braze 250a, one could use a resistance weld or lower temperature brazes such as those listed previously with the Cu-Sil or Ti—Cu-Sil examples. Platinum pad 250b would be slightly longer in the length direction and slightly longer in the width direction than the underlying pre-form 250a. This overlaying would prevent it from reflowing and leaking out during a gold braze operation. In addition, the pad 250b would protrude above the surface of the ferrule. This turns out to be very convenient during electrical attachment of the feedthrough capacitor (not shown) outside perimeter metallization 223. In other words, the protruding pad 250b would provide a convenient stop for a solder paste, a solder pre-form or a thermal-setting conductive adhesive (dispensed by robot). This is best understood by referring to FIGS. 48 and 49, which shows that a pocket 248 and 248a are first formed at the time of manufacturing the ferrule 216 of the hermetic seal subassembly 210. These pockets can be rectangular (as shown), can be rectangular with rounded ends or it can be round holes as illustrated as 248a or even a continuous groove or slot as illustrated in FIG. 53 as 248c. Into these pockets or grooves 248 can be placed a noble wire 218 as previously described in FIG. 25, or a material 250, such as CuSil or TiCuSil or any other material as disclosed earlier that can form a metallurgically sound bond to titanium while at the same time, providing an oxide resistant surface to which electrical attachment 222 can form a solid bond.


Referring once again to FIG. 49, one can see that there is an alternative arrangement similar to that previously described in FIG. 48. In this case, a circular gold braze pre-form 250Ab could first be placed into the counter-bore hole 248a and then a platinum or equivalent cap 250Aa could be placed over it. These could all be reflowed into place leaving a convenient area to make electrical attachment between the capacitor external ground metallization 223, through the oxide resistant pad 250Aa, through the braze material 250Ab and, in turn, to the ferrule 216.



FIG. 50 is an isometric view of the quad polar feedthrough capacitor 212 shown mounted to the hermetically sealed ferrule assembly previously illustrated in FIG. 48. Shown is an electrical attachment material 222 between the capacitor ground metallization 223 that connects to the oxide resistant connection pads 250, 250′. Referring once again to FIG. 50, one can see that there is metallization 223 on both short ends of the capacitor 212. This metallization 223 could extend along the long sides or, alternatively, along all perimeter sides of the capacitor. In the case where the length of the perimeter metallization 223 is made longer, then additional pockets and oxide resistant pads 250 would be required.



FIGS. 51 and 52 illustrate the ground and active electrode plate sets of the capacitor 212 previously illustrated in FIG. 50. In FIG. 51, shown is that the ground electrode plate 230 does not make contact with any of the terminal pins 211. The metallization 223 contacts the ground electrode plate set 230 on its left and right ends. FIG. 52 illustrates the active electrode plates 232. In this case, the active electrode plates 232 are connected to each one of the feedthrough terminal pins 211.



FIG. 53 is the same ferrule as previously described in FIGS. 49 and 50 except that instead of a discrete number of machined pads 248, there is a continuous groove 248c formed around the entire perimeter of the capacitor. This would be filled with Cu-Sil or Ti—Cu-Sil or any other material previously listed to form an oxide resistant connection area for the feedthrough capacitor (not shown). A feedthrough capacitor 212, in this case, would have perimeter metallization 223 along all four of its perimeter sides and either a continuous or a multiplicity of short electrical connections 222 would be made between the capacitor metallization 223 and the gold braze or equivalent material that has been flowed in the trough 248c (not shown).



FIGS. 54 and 55 are yet another embodiment of the present invention. As shown in FIG. 54, gold films 250b may be placed on top of the ferrule 216. Then a conductive sheet 254 is laid overtop the gold films 250b. In a brazing procedure the gold films or plates bond between the conductive sheet 254 and the ferrule 216. The capacitor 212 can be placed overtop the conductive sheet 254 and then an electrical connection using conductive adhesives 222 can be made between the external metallization 223 and the conductive sheet 254. As shown in FIGS. 54 and 55, the metallization is around the entirety of the capacitor 212. This design would also reduce both the inductance and equivalent series resistance of the capacitor 212. The conductive sheet 254 is of a different material as compared to the ferrule 216 and the gold films 250b, and therefore forms an oxide-resistant metal addition.



FIG. 56 is similar to FIG. 28 wherein, the gold brazes 228 for the leadwires are directed to the body fluid side. In FIG. 28, the alumina insulator 224 is hermetically sealed with gold braze 226 to the ferrule 216 which is shown with the gold braze 226 between a ferrule interwall and the outside wall of the alumina ceramic insulator 224. FIG. 56 is different in that the gold braze 226 is between the top of the ferrule or a step towards the top of the ferrule 216 and is not between a ferrule or insulator side wall. Referring once again to FIG. 56, one can see that there is a clip structure 234, which is similar to the clip structure 234 previously illustrated in FIG. 33. The clip 234 has an opening to receive a solder or thermal setting conductive adhesive 222 as shown. In general, this clip structure 234 will be an oxide-resistant metal addition in accordance with the present invention, which may be welded or brazed 220 to the ferrule 216.



FIG. 57 is very similar to FIG. 56 except that in this case, the ferrule 216 does not has a step in it, wherein now the gold braze 226 is formed between the top face of the ferrule 216 and the bottom of the step on the alumina ceramic insulator 224.



FIG. 58 is very similar to FIG. 26 except that the wires 211, 214 are discontinuous. There are actually two different subassemblies in FIG. 58. The lower subassembly is the hermetic seal subassembly, which is formed in a single process in a gold brazing furnace, thereby connecting a hermetic seal gold braze 226 between the ferrule 216 and the alumina insulator 224 and another gold braze 228 between the leadwire portions 214 and the alumina insulator 224. As part of this pre-assembly, the oxide-resistant metal addition wire 218 is gold brazed or laser welded 220 to the ferrule 216. In a separate manufacturing operation, the capacitor structure is fabricated, including its monolithic structure of alternating ground and active electrode plates, application of the outside perimeter or diameter metallization 223 and the metallization 255 on the inside of the feedthrough holes. Also pre-assembled are leadwires 211. There is a major advantage to this structure in that, the leadwires 211 can be of non-biocompatible and of toxic material since they are completely enclosed within the hermetically sealed and biocompatible AIMD housing. In other words, leadwires 211 never come into contact with bodily fluids or tissue. Therefore, leadwires 211 could be insulated copper wires or the like. In general, they are soldered or installed by a thermal-setting conductive adhesive 256 into the capacitor subassembly. The capacitor subassembly is then joined to the hermetic seal subassembly by a means of a ball grid array (solder), a thermal-setting conductive adhesive, or the like 260. The left side of the cross-section in FIG. 58 shows that the space between the leadwire segments 211 and 214 is greater, thereby requiring a higher volume of connecting material 260 as opposed to the shorter distance illustrated in the right side of the drawing. In order to minimize the resistance and optimize the current carrying capabilities, the reduced amount of conductive material 260, as shown on the right, may have less resistance and more current carrying capabilities.


Referring once again to FIG. 58, capacitor 212 is a three-terminal feedthrough capacitor, also known as a planar array. FIG. 59 is similar to FIG. 58 except that instead of a multipole feedthrough capacitor, there are individual MLCC chip capacitors 212′ employed. Chip caps mounted directly to a hermetic seal or to a substrate that is attached to a hermetic seal are described in U.S. Pat. Nos. 5,650,759 and 5,896,627, the contents of which are incorporated herein by reference. These two patents don't provide any way of connecting to the ferrule (ground) in an oxide-resistant manner. Referring once again to FIG. 59, one can see that the ground wire metal addition 218 of FIG. 58 has been replaced on the left side by an L-shaped wire 234 and on the right, by a square shaped wire 218. As previously stated, wires can be drawn into a multitude of cross-sections in the present invention and is not limited to any one shape. Referring to FIG. 59, chip capacitor 212′ is a two-terminal MLCC.



FIG. 60 is very similar to FIG. 58 except that there are no gold brazes between the alumina insulator 224 and the corresponding leads 214. In this case, the leads 214 are co-fired with the alumina ceramic 224 to form a homogeneous structure. One can see that there are layers and conductive circuit traces 262 embedded. The purpose of this is to further improve the hermeticity of the structure. On the left hand side of FIG. 60, there is a lead 211 which is continuous and is co-fired into the alumina ceramic structure 224. On the right side, there is a short pin 211b that is co-fired into the alumina ceramic 224. This lead is then joined by electrical connection material 256 to the lead segment 211a, which extends towards AIMD internal electronic circuits. The advantage to the structure showing on the right hand side of FIG. 60 is that lead 211a can be a standard tin copper lead (or other inexpensive non-biocompatible lead material. The circuit traces or layers 262, as shown in FIG. 60, are laid down in the green state (prior to sintering) of the alumina substrate 224. In other words, the alumina substrate is initially a monolithic structure that has internal circuit traces 262 which are staggered back and forth to form a continuous conductive path through the hermetic seal insulator 224. The purpose of the staggering is to greatly improve the hermeticity and pull strength of the completed structure.



FIG. 61 is very similar to FIG. 59 except that in this case, there is a substrate or circuit board 264, which is placed adjacent the top side of the hermetic seal subassembly. On the left side, the circuit board has circuit traces 263 and 263′ to which the monolithic ceramic capacitor (MLCC) 212′ is electrically and physically attached. The left side of the MLCC capacitor has an electrical attachment material 222, which can be a solder, a thermal-setting conductive adhesive or the like. It attaches the left hand capacitor metallization 225 to the circuit trace 263. There is an additional electrical connection material 266. The right hand side of FIG. 61 also shows an MLCC capacitor. It is known to those skilled in the art that the rectangular MLCC could be flipped around in its orientation.



FIG. 62 shows a co-fired alumina ceramic insulator 224 with solid filled vias 214a, as shown. Typically these are co-fired into a single monolithic structure. For example, the structure of FIG. 62 is taught in U.S. patent publication 2014-0036409 (application Ser. No. 13/743,276), which is incorporated in full herein with this reference. The ceramic capacitor, which sits on top of the alumina ceramic insulator has leads 211, which can either be pre-installed or installed by soldering or thermal-setting conductive adhesive 256, which also makes an electrical and mechanical attachment to the solid filled vias 214a. In accordance with the present invention, the outside diameter metallization 223 of the capacitor 212 is electrically connected with a solder or a thermal-setting conductive adhesive 222 to the oxide-resistant metal addition 218. The oxide-resistant metal addition 218 can be brazed or welded 220 to the ferrule 216 in accordance with the present invention.



FIG. 63 is taken from section 63-63 from FIG. 62 showing what can happen during practical manufacturing using human or robotic dispensers. For example, if electrical connection material 222 is a solder or thermal-setting conductive adhesive, it can flow over the metal addition 218 and down across its weld or gold braze 220 to the ferrule 216. As shown in FIG. 63, this material 222 could also flow all the way down to the ferrule (which is subject to oxidation). The purpose of this is to illustrate that when materials are flowing, they can flow over the top of previously placed materials. However, the primary electrical path of the present invention is still between electrical connective material 222, the metal addition 218 and its metallurgical attachment 220 to the ferrule 216.



FIG. 64 is taken from section 64-64 from FIG. 62 and shows what the assembly of FIG. 62 would really look like after a laser welding or brazing 220 of the metal addition 218. We can see that part of it has reflowed or become molten and it has flowed in and metallurgically bonded with the titanium of the ferrule 216. This metallurgical bond is illustrated by 220, but as can be seen in FIG. 64, it would be more normal that it would have an irregular shape, as illustrated.



FIG. 65 is very similar to section 63-63 taken from FIG. 62 except that in this case, the oxide-resistant metal addition 218 is a clad wire, which has an core 268 supporting an outer cladding 270. There are many types of clad wire readily available, including laser cladded wire wherein cladding is achieved using a powdered or wire feedstock metal that is melted and consolidated by use of a laser to clad the core metal. Additionally, this enables mixed geometry cladding options, and particular ones that pose manufacturability challenges from traditional cladding methods. As one example, a platinum clad silver or copper wire would be much cheaper than a solid platinum wire and would still provide an oxide-resistant metal addition. Other types of cladded wires include gold clad stainless steels, palladium clad MP35N, palladium clad Ni—Co—Cr—Mo alloys, platinum clad molybdenum, platinum iridium clad niobium, platinum clad tantalum, silver clad nitinol, silver clad nickel titanium alloys, gold clad nickel titanium alloys, platinum alloy clad molybdenum, gold alloy clad stainless steels, gold clad tantalum and other similar noble metal and noble metal alloy cladding of lower cost core metal option combinations. Such cladding/core options may be customer specified combinations as appropriate for the application performance demands and any combination of the cladding and core metal as given above are options. Additionally, more than one cladding layer may be used to achieve specific application performance needs.



FIG. 66 is very similar to FIG. 65, except in this case the cladded wire as an oxide-resistant metal addition 218 has a square cross-section instead of a round cross-section. Again, any geometry wire can be clad and the present invention is not limited to any one particular shape of wire.



FIG. 67 is very similar to FIG. 25, except that the oxide-resistant metal addition 218 is cladded, which is also shown in cross-section in FIG. 65 herein. Metal-clad wire may provide for a complete metallurgical bond between layers. It is typically manufactured using various heat, pressure and reduction techniques. Some non-limiting examples include gold cladding/stainless steel core, palladium cladding/MP35N core, or platinum cladding/niobium core. It will be understood by those skilled in the art that other cladding/core material options are possible. Herein the term “cladding” is a reference to many types of manufacturing processes including but not limited to plating, electroplating, drawn filled tube wires, vapor or chemical deposited coatings and other such metal overcoated options. Further, the term “core” as used herein may include a solid material, one or more fibers, twisted, braided or woven wires or hollow tubing with one or more lumens. Additionally, in an embodiment not shown, a core/cladding wire may be replaced with multiple fibers or wires comprising multiple and/or different materials.



FIG. 67 illustrates that the laser welding, brazing or other type of metallurgical attachment 220 (metal-joining process options) may be at or adjacent to the ends of the oxide-resistant metal addition 218, or distributed along the length thereof. The attachment 220 may be continuous or discontinuous along the length of the oxide-resistant metal addition 218. For example, the metallurgical attachment 220 may be at the ends of the first metal addition 218 and along the length, continuously or discontinuously, along the second metal addition 218. Depending on the method of metallurgical attachment chosen, the outer cladding 220 may selectively be raised to a temperature so that it melts preferentially with respect to the core 268 of the clad wire 218. In this case, the oxide-resistant metal addition 218 may comprise a cladding 270 having a lower melting temperature than that of the core metal 268. A metal-joining process then is used to melt and flow the cladding 270 of the wire 218 into contact with the ferrule 216. Variations regarding the degree of melt will be understood by those skilled in the art. For example, a gold or platinum-clad copper wire 218 can be laser welded 220 to the ferrule 216 with the result that the cladding 270 in addition to some of the core material 268 is melted onto the ferrule 216 to form the attachment 220. In this specific, but non-limiting case, the cladded wire 218 offers benefits when cost is an issue. Platinum or gold cladding 270 of a copper core 268 is more cost effective than a solid platinum or gold wire. Correspondingly, an oxide resistant plated wire may be used in place of a clad wire. It is noted that some areas of the clad wire 218 which do not form the metallurgical attachment 220 remain undisturbed, offering oxide-resistant electrical connection 222 for making contact between a capacitor ground metallization 223 and a secondary metal addition, and then, in turn, to the ferrule 216. Generally, a ferrule 216 is intended to be laser welded into the housing of an AIMD (not shown).



FIG. 68 is very similar to FIG. 69, however now the cladded wires serving as the oxide-resistant metal additions 218 are discontinuous segments, placed along the sides or the ends (not shown) or around the circumference of a rectangular or round feedthrough capacitor (not shown). Referring once again to FIG. 68, each end of the cladded oxide-resistant metal additions 218 and 218′ are shown to have been metallurgically attached to the ferrule 216 via a metallurgical attachment 220, 220′. In this case, the outer circumferential area near the ends of the cladded wires 218 and 218′ are melted/welded to the ferrule 216. This leaves an undisturbed portion remaining in the center of each wire 218 and 218′ where a thermal-setting conductive adhesive or solder 222 is provided to make an oxide-resistant connection to the capacitor outside perimeter ground metallization 223. Referring back again to FIG. 68, there are two wire segments 218 and 218′, however, it is understood by those skilled in the art that there can be any number of segments 218, 218′ . . . 218n.



FIG. 69 is a sectional view taken along section 69-69 of FIG. 67, showing that the metallurgical attachment 220 near the ends of the cladded oxide-resistant metal addition 218 has penetrated any oxide present on the ferrule material 216. It will be understood that metallurgical attachment 220 can be formed during a laser weld process between ferrule 216 and cladded wire 218. Alternatively, metallurgical attachment 220 can be created by adding an additional material to the ferrule/wire combination and subjecting it to a metal joining process. FIG. 69 also illustrates that the metallurgical attachment 220 may include a portion of the cladding 270 and, optionally, a melted portion of the core 268.



FIG. 70 is very similar to FIG. 69; however, the round wire of the metal addition 218 is square. Other shapes appropriate for a specific joint design will be understood by those skilled in the art, including oval, rectangular, triangular, and the like. The details provided for FIG. 69 apply entirely and equally to FIG. 70. In the case where more than one oxide-resistant metal addition 218 is used, each metal addition can be of the same shape or alternatively at least one of the multiple metal additions may be of a different shape.



FIG. 71 is similar to FIG. 70 in that gold braze 226 is shown. The hermetic braze 226 seals the ferrule 216 to the adhesion 153 and wetting layers 151 supported on the insulator 224. In this embodiment, oxide-resistant metal addition 218 is metallurgically attached in an oxide resistant fashion to ferrule 216 using a low temperature brazing material 226′. The secondary brazing operation to attach the oxide-resistant metal addition 218 is performed prior to the capacitor 212 attachment process. Capacitor ground metallization 223 is then electrically attached to the cladding 270 of the oxide-resistant metal addition 218 using thermal-setting conductive adhesive or solder 222.


The low temperature brazing material 226′ may comprise, but is not limited to, low temperature gold alloys, nano-gold preforms, fine gold wire with small grain size. Two non-limiting examples for lower temperature, biocompatible brazes (<850° C.) include: 82Au-18In (530° C.) and 88Au-12Ge (356° C.). Braze material 226′ is within the device (AIMD) housing, so it need not be biocompatible. Among the alloys that could be considered are: copper/silver (28/72)—melting point (MP) 780° C., indium/copper/silver (10/27/63)—MP 685-730° C., gold/nickel (82/18)—MP 950° C., nickel/gold/copper (3/35/62)—MP 1000-1030° C., gold/nickel/titanium compositions including those disclosed in U.S. Pat. No. 4,938,922 (the contents of which are incorporated herein by reference), Johnson Matthey® silver-copper eutectic and pure metal brazes, Pallabraze® alloys and Orobraze® alloys. Active metal braze materials may also be considered. These materials have the primary braze material combined by forging or cladding to a small amount of another metal, usually titanium. It is known that the addition of titanium to various braze alloy compositions results in increased reactivity and considerable improvement in wetting behavior with a ceramic material. The ceramic is wet by the formation of an intermetallic interfacial reaction product which can then form a joint with the braze alloy. In active metal brazing, the metal facilitates the bonding mechanism to an un-metallized ceramic surface.



FIG. 72 is similar to FIG. 71 except in this case the hermetic seal gold braze 226 is disposed on the device side instead of the body fluid side. Since both brazes (226 and 226′) are positioned for the melted gold to gravimetrically flow in the same direction, this design option offers single operation brazing to form the hermetic seal 226 and the attachment of the oxide-resistant metal addition 218 to the ferrule 216 by braze 226′.



FIG. 73 is very similar to FIG. 72, however, now a single gold braze 226 can simultaneously form the hermetic seal between ferrule 216 and the wetting 151 and adhesion layers 153 supported on the insulator 224 while at the same time electrically and mechanically joining the oxide-resistant metal addition 218 to the ferrule 216.


Although several embodiments have been described in detail for purposes of illustration, various modifications may be made to each without departing from the scope and spirit of the invention. Various features of one embodiment may be incorporated into another embodiment, as each embodiment is not exclusive of the other features taught and shown herein. Accordingly, the invention is not to be limited, except as by the appended claims.

Claims
  • 1. A hermetically sealed filtered feedthrough assembly for an active implantable medical device, the filtered feedthrough assembly comprising: a) a ferrule of an electrically conductive material, the ferrule comprising a ferrule opening extending to a ferrule first end and a ferrule second end;b) an insulator of an electrically non-conductive material, the insulator comprising an insulator outer surface extending to an insulator first end and an insulator second end, wherein the insulator is disposed at least partially within the ferrule opening where a first gold braze hermetically seals the insulator to the ferrule, and wherein an insulator passageway extends through the insulator;c) an insulator metallization disposed at least partially on the insulator outer surface;d) a conductor residing in the insulator passageway where a second gold braze hermetically seals the conductor to the insulator, the conductor extending to a conductor first segment and a conductor second segment, wherein at least the conductor first segment extends outwardly beyond the insulator first end;e) a filter capacitor disposed near and/or on the insulator first end, the filter capacitor comprising: i) a capacitor dielectric comprising a dielectric outer surface extending to a first dielectric end and a second dielectric end;ii) at least one active electrode plate and at least one ground electrode plate disposed within and supported by the capacitor dielectric in an interleaved, partially overlapping relationship;iii) a dielectric passageway disposed through the capacitor dielectric to the dielectric first end and the dielectric second end;iv) a capacitor internal metallization disposed within the dielectric passageway and being conductively connected to the at least one active electrode plate and in non-conductive relation with the at least one ground electrode plate, wherein the conductor first segment extending outwardly beyond the insulator first end resides in the dielectric passageway where the conductor is conductively connected to the capacitor internal metallization and the at least one active electrode plate;v) a capacitor external metallization disposed at least partially on the dielectric outer surface, the capacitor external metallization being conductively connected to the at least one ground electrode plate and in non-conductive relation with the at least one active electrode plate;f) an oxide-resistant metal addition, comprising: i) a conductive core;ii) a conductive cladding disposed on the conductive core, wherein the conductive core and the conductive cladding are different materials;g) a first conductive connection between the oxide-resistant metal addition and the capacitor external metallization; andh) a second conductive connection between the oxide-resistant metal addition and the ferrule.
  • 2. The feedthrough filter assembly of claim 1, wherein the first conductive connection is selected from the group consisting of a solder, a solder BGA, a solder paste, an epoxy, and a polyimide.
  • 3. The feedthrough filter assembly of claim 2, wherein the second conductive connection comprises a laser weld.
  • 4. The feedthrough filter assembly of claim 2, wherein the second conductive connection comprises a third braze.
  • 5. The feedthrough filter assembly of claim 4, wherein the third braze comprising a lower temperature braze material than the first and second gold brazes.
  • 6. The feedthrough filter assembly of claim 5, wherein the third braze is selected from the group consisting of a low temperature gold alloy, a nano-gold preform, and a fine gold wire with small grain size.
  • 7. The feedthrough filter assembly of claim 5, wherein the first gold braze is disposed at or near the ferrule first end.
  • 8. The feedthrough filter assembly of claim 7, wherein the first gold braze is disposed at or near the ferrule second end.
  • 9. The feedthrough filter assembly of claim 8, wherein the first gold braze hermetically sealing the insulator to the ferrule also forms the second conductive connection between the oxide-resistant metal addition and the ferrule.
  • 10. The feedthrough filter assembly of claim 1, wherein the conductive core of the oxide-resistant metal addition is selected from the group consisting of stainless steel, MP35N, and niobium.
  • 11. The feedthrough filter assembly of claim 10, wherein the conductive core of the oxide-resistant metal addition is selected from the group consisting of a solid material, a hollow tube, a plurality of twisted fibers, a plurality of braided fibers, and a plurality of woven fibers.
  • 12. The feedthrough filter assembly of claim 10, wherein the conductive cladding of the oxide-resistant metal addition is selected from the group consisting of gold, palladium and platinum.
  • 13. The feedthrough filter assembly of claim 12, wherein the conductive cladding of the oxide-resistant metal addition is characterized as having been contacted to the conductive core by a process selected from the group consisting of plating, electroplating, as a drawn filled tubing, as a vapor deposition, as a chemical deposition, and as an overcoating.
  • 14. The feedthrough filter assembly of claim 1, wherein the oxide-resistant metal addition comprises a plurality of oxide-resistant metal additions.
  • 15. The feedthrough filter assembly of claim 1, wherein the first conductive connection comprises a plurality of first conductive connections.
  • 16. The feedthrough filter assembly of claim 1, wherein the second conductive connection comprises a plurality of second conductive connections.
  • 17. The feedthrough filter assembly of claim 1, wherein the first conductive connection is spaced from the second conductive connection along a length of the oxide-resistant metal addition.
  • 18. The feedthrough filter assembly of claim 1, wherein the capacitor external metallization comprises an adhesion metallization and a wetting metallization, and wherein the adhesion metallization is disposed at least partially on the insulator outer surface and the wetting metallization is disposed on the adhesion metallization.
  • 19. The feedthrough filter assembly of claim 1, wherein an insulative washer is disposed between the insulator and the filter capacitor.
  • 20. The feedthrough filter assembly of claim 1, wherein the ferrule is configured to be attachable to an opening in a housing of an active implantable medical device by a laser weld or braze.
  • 21. The feedthrough filter assembly of claim 1, wherein the ferrule is a continuous part of an active implantable medical device housing.
  • 22. The feedthrough filter assembly of claim 1, wherein the ferrule first end and the insulator first end are associated with a device side and the ferrule second end and the insulator second end are associated with a body fluid side of the assembly.
  • 23. The feedthrough filter assembly of claim 1, wherein the second conductive connection comprises a portion of the cladding and the core of the oxide-resistant metal addition.
  • 24. A hermetically sealed filtered feedthrough assembly for an active implantable medical device, the filtered feedthrough assembly comprising: a) a ferrule of an electrically conductive material, the ferrule comprising a ferrule opening extending to a ferrule first end and a ferrule second end, wherein the ferrule is configured to be attachable to an opening in a housing of an active implantable medical device;b) an insulator of an electrically non-conductive material, the insulator comprising an insulator outer surface extending to an insulator first end and an insulator second end, wherein the insulator is disposed at least partially within the ferrule opening where a first gold braze hermetically seals the insulator to the ferrule, and wherein an insulator passageway extends through the insulator;c) an insulator metallization disposed at least partially on the insulator outer surface;d) a conductor residing in the insulator passageway where a second gold braze hermetically seals the conductor to the insulator, the conductor extending to a conductor first segment and a conductor second segment, wherein at least the conductor first segment extends outwardly beyond the insulator first end;e) a filter capacitor disposed near and/or on the insulator first end, the filter capacitor comprising: i) a capacitor dielectric comprising a dielectric outer surface extending to a first dielectric end and a second dielectric end;ii) at least one active electrode plate and at least one ground electrode plate disposed within and supported by the capacitor dielectric in an interleaved, partially overlapping relationship;iii) a dielectric passageway disposed through the capacitor dielectric to the dielectric first end and the dielectric second end;iv) a capacitor internal metallization disposed within the dielectric passageway and being conductively connected to the at least one active electrode plate and in non-conductive relation with the at least one ground electrode plate, wherein the conductor first segment extending outwardly beyond the insulator first end resides in the dielectric passageway where the conductor is conductively connected to the capacitor internal metallization and the at least one active electrode plate;v) a capacitor external metallization disposed at least partially on the dielectric outer surface, the capacitor external metallization being conductively connected to the at least one ground electrode plate and in non-conductive relation with the at least one active electrode plate;f) an oxide-resistant metal addition, comprising: i) a conductive core;ii) a conductive cladding disposed on the conductive core, wherein the conductive core and the conductive cladding are different materials;g) a first conductive connection between the oxide-resistant metal addition and the capacitor external metallization; andh) a second conductive connection between the oxide-resistant metal addition and the ferrule, wherein the second conductive connection comprise a portion of the cladding contacting the ferrule.
CROSS-REFERENCE TO RELATED APPLICATIONS

This continuation-in-part application claims priority to U.S. patent application Ser. No. 14/826,229, filed on Aug. 14, 2015; now U.S. Pat. No. 9,427,596, which is a continuation-in-part application to U.S. patent application Ser. No. 14/202,653, filed on Mar. 10, 2014, now U.S. Pat. No. 9,108,066, which claims the benefit of U.S. provisional application Ser. No. 61/841,419, filed on Jun. 30, 2013; the contents of which all of these applications are fully incorporated herein with these references.

US Referenced Citations (515)
Number Name Date Kind
3681612 Kinzler et al. Aug 1972 A
3745430 Kerr et al. Jul 1973 A
3871382 Mann Mar 1975 A
3961294 Hollyday Jun 1976 A
3968802 Ballis Jul 1976 A
3980975 Maxon et al. Sep 1976 A
4188598 Hunt Feb 1980 A
4236127 Scherba Nov 1980 A
4295467 Mann et al. Oct 1981 A
4320763 Money Mar 1982 A
4424551 Stevenson et al. Jan 1984 A
4431005 McCormick Feb 1984 A
4437474 Peers-Trevarton et al. Mar 1984 A
4445501 Bresler May 1984 A
4572198 Codrington Feb 1986 A
4585001 Belt Apr 1986 A
4633181 Murphy-Boesch et al. Dec 1986 A
4643186 Rosen et al. Feb 1987 A
4654880 Sontag Mar 1987 A
4672972 Berke Jun 1987 A
4689621 Kleinberg Aug 1987 A
4712555 Thornander et al. Dec 1987 A
4746864 Satoh et al. May 1988 A
4754752 Ginsburg et al. Jul 1988 A
4757820 Itoh Jul 1988 A
4766381 Conturo et al. Aug 1988 A
4788980 Mann et al. Dec 1988 A
4799499 Bisping Jan 1989 A
4813429 Eshel et al. Mar 1989 A
4823812 Eshel et al. Apr 1989 A
4832023 Murphy-Chutorian et al. May 1989 A
4858064 Segawa et al. Aug 1989 A
4858623 Bradshaw et al. Aug 1989 A
4859950 Keren Aug 1989 A
4932411 Fritschy et al. Jun 1990 A
4940052 Mann et al. Jul 1990 A
4944298 Sholder Jul 1990 A
4960106 Kubokawa et al. Oct 1990 A
4989608 Ratner Feb 1991 A
4991580 Moore Feb 1991 A
5019075 Spears et al. May 1991 A
5039965 Higgins Aug 1991 A
5044375 Bach et al. Sep 1991 A
5052404 Hodgson et al. Oct 1991 A
5063348 Kuhara et al. Nov 1991 A
5095911 Pomeranz Mar 1992 A
5099208 Fitzpatrick et al. Mar 1992 A
5167233 Eberle et al. Dec 1992 A
5178618 Kandarpa Jan 1993 A
5190046 Shturman Mar 1993 A
5197468 Proctor et al. Mar 1993 A
5209233 Holland et al. May 1993 A
5211165 Dumoulin et al. May 1993 A
5217010 Tsitlik et al. Jun 1993 A
5222506 Patrick et al. Jun 1993 A
5246438 Langberg Sep 1993 A
5251120 Smith Oct 1993 A
5268810 Dimarco et al. Dec 1993 A
5271400 Dumoulin et al. Dec 1993 A
5300108 Rebell et al. Apr 1994 A
5306291 Kroll et al. Apr 1994 A
5307808 Dumoulin et al. May 1994 A
5307814 Kressel et al. May 1994 A
5318025 Dumoulin et al. Jun 1994 A
5323776 Blakeley et al. Jun 1994 A
5323778 Kandarpa et al. Jun 1994 A
5331505 Wilheim Jul 1994 A
5333095 Stevenson et al. Jul 1994 A
5334045 Cappa et al. Aug 1994 A
5334193 Nardella Aug 1994 A
5348010 Schnall et al. Sep 1994 A
5352979 Conturo Oct 1994 A
5358515 Hurter et al. Oct 1994 A
5363845 Chowdhury et al. Nov 1994 A
5365928 Rhinehart et al. Nov 1994 A
5370644 Langberg Dec 1994 A
5398683 Edwards et al. Mar 1995 A
5400787 Marandos Mar 1995 A
5404880 Throne Apr 1995 A
5413104 Buijs et al. May 1995 A
5419325 Dumoulin et al. May 1995 A
5428337 Vinclarelli et al. Jun 1995 A
5433717 Rubinsky et al. Jul 1995 A
5437277 Dumoulin et al. Aug 1995 A
5443066 Dumoulin et al. Aug 1995 A
5443489 Ben-Haim Aug 1995 A
5447156 Dumoulin et al. Sep 1995 A
5450090 Gels et al. Sep 1995 A
5451232 Rhinehart et al. Sep 1995 A
5462055 Casey et al. Oct 1995 A
5466254 Helland Nov 1995 A
5476095 Schnall et al. Dec 1995 A
5476483 Bornzin et al. Dec 1995 A
5491300 Huppenthal et al. Feb 1996 A
5493259 Blalock et al. Feb 1996 A
5498261 Strul Mar 1996 A
5507743 Edwards et al. Apr 1996 A
5512825 Atalar et al. Apr 1996 A
5514173 Rebell et al. May 1996 A
5540679 Fram et al. Jul 1996 A
5545201 Helland et al. Aug 1996 A
5558093 Pomeranz Sep 1996 A
5578008 Hara Nov 1996 A
5588432 Crowley Dec 1996 A
5590657 Cain et al. Jan 1997 A
5591218 Jacobson Jan 1997 A
5620476 Truex et al. Apr 1997 A
5623241 Minkoff Apr 1997 A
5623724 Gurkovich et al. Apr 1997 A
5629622 Scampini May 1997 A
5650759 Hittman et al. Jul 1997 A
5662108 Budd et al. Sep 1997 A
5682897 Pomeranz Nov 1997 A
5683435 Truex et al. Nov 1997 A
5685878 Falwell et al. Nov 1997 A
5697958 Paul et al. Dec 1997 A
5699801 Atalar et al. Dec 1997 A
5700548 Warnier et al. Dec 1997 A
5706810 Rubinskr et al. Jan 1998 A
5715825 Crowley Feb 1998 A
5716390 Li Feb 1998 A
5722998 Prutchi et al. Mar 1998 A
5735884 Thompson et al. Apr 1998 A
5735887 Barreras et al. Apr 1998 A
5741321 Brennen Apr 1998 A
5751539 Stevenson et al. May 1998 A
5757252 Cho May 1998 A
5759202 Schroeppel Jun 1998 A
5765779 Hancock et al. Jun 1998 A
5769800 Gelfand et al. Jun 1998 A
5772693 Brownlee Jun 1998 A
5775338 Hastings Jul 1998 A
5779669 Haissaguerre et al. Jul 1998 A
5782891 Hassler et al. Jul 1998 A
5792055 McKinnon Aug 1998 A
5800467 Park et al. Sep 1998 A
5822174 Yamate et al. Oct 1998 A
5824026 Diaz et al. Oct 1998 A
5824029 Weijand et al. Oct 1998 A
5833608 Acker Nov 1998 A
5836992 Thompson et al. Nov 1998 A
5840031 Crowley Nov 1998 A
5851226 Skubitz et al. Dec 1998 A
5855995 Haq et al. Jan 1999 A
5864234 Luedeke Jan 1999 A
5868674 Glowinski et al. Feb 1999 A
5879347 Saadat Mar 1999 A
5891134 Goble et al. Apr 1999 A
5896267 Hittman et al. Apr 1999 A
5905627 Brendel et al. May 1999 A
5916162 Snelten et al. Jun 1999 A
5928145 Ocali et al. Jul 1999 A
5928159 Eggers et al. Jul 1999 A
5929729 Swarup Jul 1999 A
5938609 Pomeranz Aug 1999 A
5938692 Rudie Aug 1999 A
5959336 Barsan Sep 1999 A
5959829 Stevenson et al. Sep 1999 A
5964705 Truwit et al. Oct 1999 A
5973906 Stevenson et al. Oct 1999 A
5973907 Reed Oct 1999 A
5978204 Stevenson Nov 1999 A
6004269 Crowley et al. Dec 1999 A
6008980 Stevenson et al. Dec 1999 A
6011995 Guglielmi et al. Jan 2000 A
6026316 Kucharczyk et al. Feb 2000 A
6027500 Buckles et al. Feb 2000 A
6031375 Atalar et al. Feb 2000 A
6031710 Wolf et al. Feb 2000 A
6041496 Haq et al. Mar 2000 A
6045532 Eggers et al. Apr 2000 A
6052614 Morris et al. Apr 2000 A
6055457 Bonner Apr 2000 A
6066136 Geistert May 2000 A
6099524 Lipson et al. Aug 2000 A
6101417 Vogel et al. Aug 2000 A
6128522 Acker et al. Oct 2000 A
6129670 Burdette et al. Oct 2000 A
6137161 Gilliland et al. Oct 2000 A
6141594 Flynn et al. Oct 2000 A
6146743 Haq et al. Nov 2000 A
6159560 Stevenson et al. Dec 2000 A
6171240 Young et al. Jan 2001 B1
6171241 McVeigh et al. Jan 2001 B1
6188219 Reeder et al. Feb 2001 B1
6198972 Hartlaub et al. Mar 2001 B1
6209764 Hartlaub et al. Apr 2001 B1
6226545 Gilderdale May 2001 B1
6236205 Lüdeke et al. May 2001 B1
6238390 Tu et al. May 2001 B1
6252761 Branchevsky Jun 2001 B1
6263229 Atalar et al. Jul 2001 B1
6272370 Gillies et al. Aug 2001 B1
6275369 Stevenson et al. Aug 2001 B1
6280385 Melzer et al. Aug 2001 B1
6284080 Haq et al. Sep 2001 B1
6284971 Atalar et al. Sep 2001 B1
6332089 Acker et al. Dec 2001 B1
6370427 Alt et al. Apr 2002 B1
6373673 Anthony Apr 2002 B1
6390996 Halperin et al. May 2002 B1
6395637 Park et al. May 2002 B1
6408202 Lima et al. Jun 2002 B1
6414835 Wolf et al. Jul 2002 B1
6424234 Stevenson Jul 2002 B1
6428537 Swanson et al. Aug 2002 B1
6433653 Matsumura et al. Aug 2002 B1
6456481 Stevenson Sep 2002 B1
6459935 Piersma Oct 2002 B1
6470545 Branchevsky Oct 2002 B1
6473291 Stevenson Oct 2002 B1
6473314 Custer et al. Oct 2002 B1
6486529 Chi et al. Nov 2002 B2
6493591 Stokes Dec 2002 B1
6512666 Duva Jan 2003 B1
6529103 Brendel et al. Mar 2003 B1
6535766 Thompson et al. Mar 2003 B1
6539253 Thompson et al. Mar 2003 B2
6539261 Dal Molin Mar 2003 B2
6549800 Atalar et al. Apr 2003 B1
6556009 Kellman et al. Apr 2003 B2
6566978 Stevenson et al. May 2003 B2
6567259 Stevenson et al. May 2003 B2
6567703 Thompson et al. May 2003 B1
6593884 Gilboa et al. Jul 2003 B1
6606513 Lardo et al. Aug 2003 B2
6615483 Lindegren Sep 2003 B2
6628980 Atalar et al. Sep 2003 B2
6633780 Berger Oct 2003 B1
6643903 Stevenson et al. Nov 2003 B2
6654628 Silber et al. Nov 2003 B1
6660116 Wolf Dec 2003 B2
6675033 Lardo et al. Jan 2004 B1
6675036 Kreger et al. Jan 2004 B2
6675779 King et al. Jan 2004 B2
6675780 Wendels et al. Jan 2004 B1
6687550 Doan Feb 2004 B1
6690963 Ben-Haim et al. Feb 2004 B2
6694583 Branchevsky Feb 2004 B2
6697675 Safarevich et al. Feb 2004 B1
6701176 Halperin et al. Mar 2004 B1
6714809 Lee et al. Mar 2004 B2
6728575 Hedberg Apr 2004 B2
6728579 Lindgren et al. Apr 2004 B1
6759388 Marchant et al. Jul 2004 B1
6765779 Stevenson Jul 2004 B2
6765780 Brendel et al. Jul 2004 B2
6768630 Togashi Jul 2004 B2
6771067 Kellman et al. Aug 2004 B2
6795730 Connelly et al. Sep 2004 B2
6806806 Anthony Oct 2004 B2
6823215 Obel et al. Nov 2004 B2
6829509 MacDonald et al. Dec 2004 B1
6847837 Melzer et al. Jan 2005 B1
6868288 Thompson Mar 2005 B2
6871091 Wilkinson et al. Mar 2005 B2
6876885 Swoyer et al. Apr 2005 B2
6882248 Stevenson et al. Apr 2005 B2
6888715 Stevenson et al. May 2005 B2
6898454 Atalar et al. May 2005 B2
6901292 Hrdlicka et al. May 2005 B2
6904307 Karmarkar et al. Jun 2005 B2
6925328 Foster et al. Aug 2005 B2
6930242 Helfer et al. Aug 2005 B1
6931283 Magnusson Aug 2005 B1
6931286 Sigg et al. Aug 2005 B2
6934588 Brand et al. Aug 2005 B1
6944489 Zeijlemaker et al. Sep 2005 B2
6944507 Fröberg et al. Sep 2005 B2
6949929 Gray et al. Sep 2005 B2
6950696 Björling et al. Sep 2005 B2
6952613 Swoyer et al. Oct 2005 B2
6971391 Wang et al. Dec 2005 B1
6985347 Stevenson et al. Jan 2006 B2
6985775 Reinke et al. Jan 2006 B2
6999818 Stevenson et al. Feb 2006 B2
7012192 Stevenson et al. Mar 2006 B2
7013180 Dougherty et al. Mar 2006 B2
7015393 Weiner et al. Mar 2006 B2
7038900 Stevenson et al. May 2006 B2
7039455 Brosovich et al. May 2006 B1
7046499 Imani et al. May 2006 B1
7047073 Höijer et al. May 2006 B2
7050855 Zeijlemaker et al. May 2006 B2
7068491 Burdon et al. Jun 2006 B1
7091412 Wang et al. Aug 2006 B2
7092766 Salys et al. Aug 2006 B1
7110227 Anthony et al. Sep 2006 B2
7113387 Stevenson et al. Sep 2006 B2
7123013 Gray Oct 2006 B2
7127294 Wang et al. Oct 2006 B1
7148783 Parsche et al. Dec 2006 B2
7149578 Edvardsson Dec 2006 B2
7149773 Haller et al. Dec 2006 B2
7155271 Halperin et al. Dec 2006 B2
7162302 Wang et al. Jan 2007 B2
7164572 Burdon et al. Jan 2007 B1
7164950 Kroll et al. Jan 2007 B2
7174219 Wahlstrand et al. Feb 2007 B2
7199995 Stevenson Apr 2007 B2
7236816 Kumar et al. Jun 2007 B2
7236834 Christopherson et al. Jun 2007 B2
7276474 Marchant et al. Oct 2007 B2
7301748 Anthony et al. Nov 2007 B2
7310216 Stevenson et al. Dec 2007 B2
7319905 Morgan et al. Jan 2008 B1
7322832 Kronich et al. Jan 2008 B2
7327553 Brendel Feb 2008 B2
7363090 Halperin et al. Apr 2008 B2
7369898 Kroll et al. May 2008 B1
7387928 Cheung Jun 2008 B2
7388378 Gray et al. Jun 2008 B2
7422568 Yang et al. Sep 2008 B2
7423860 Anthony et al. Sep 2008 B2
7428136 Barnett Sep 2008 B2
7433168 Anthony Oct 2008 B2
7436672 Ushijima et al. Oct 2008 B2
7439449 Kumar et al. Oct 2008 B1
7446996 Togashi Nov 2008 B2
7450396 Ye et al. Nov 2008 B2
7480988 Ok et al. Jan 2009 B2
7495884 Togashi Feb 2009 B2
7517769 Van Schuylenbergh et al. Apr 2009 B2
7529590 MacDonald May 2009 B2
7561906 Atalar et al. Jul 2009 B2
7586728 Anthony Sep 2009 B2
7593208 Anthony et al. Sep 2009 B2
7675729 Anthony et al. Mar 2010 B2
7679926 Hsu et al. Mar 2010 B2
7689288 Stevenson et al. Mar 2010 B2
7693576 Lavie et al. Apr 2010 B1
7702387 Stevenson et al. Apr 2010 B2
7719854 Youker et al. May 2010 B2
7729770 Cabelka et al. Jun 2010 B2
7733621 Anthony et al. Jun 2010 B2
7812691 Fisk et al. Oct 2010 B1
7839146 Gray Nov 2010 B2
7844319 Susil et al. Nov 2010 B2
7844343 Wahlstrand et al. Nov 2010 B2
7853324 Stevenson et al. Dec 2010 B2
7899551 Westlund et al. Mar 2011 B2
7901761 Jiang et al. Mar 2011 B1
7957806 Stevenson et al. Jun 2011 B2
7989080 Greenberg et al. Aug 2011 B2
8000804 Wessendorf et al. Aug 2011 B1
8043454 Jiang et al. Oct 2011 B1
8095224 Truex et al. Jan 2012 B2
8163397 Ok et al. Apr 2012 B2
8219208 Stevenson et al. Jul 2012 B2
8301249 Min Oct 2012 B2
8659870 Brendel et al. Feb 2014 B2
8763245 Lucisano et al. Jul 2014 B1
8874206 Malinowski et al. Oct 2014 B2
9108066 Woods et al. Aug 2015 B2
20020055678 Scott et al. May 2002 A1
20020095197 Lardo et al. Jul 2002 A1
20020177771 Guttman et al. Nov 2002 A1
20020192688 Yang et al. Dec 2002 A1
20030013948 Russell Jan 2003 A1
20030028094 Kumar et al. Feb 2003 A1
20030028095 Tulley et al. Feb 2003 A1
20030050557 Susil et al. Mar 2003 A1
20030053284 Stevenson et al. Mar 2003 A1
20030083570 Cho et al. May 2003 A1
20030083723 Wilkinson et al. May 2003 A1
20030083726 Zeijlemaker et al. May 2003 A1
20030140931 Zeijlemaker et al. Jul 2003 A1
20030144704 Terry et al. Jul 2003 A1
20030144705 Funke Jul 2003 A1
20030144706 Funke Jul 2003 A1
20030144716 Reinke et al. Jul 2003 A1
20030144718 Zeijlemaker Jul 2003 A1
20030144719 Zeijlemaker Jul 2003 A1
20030144720 Villaseca et al. Jul 2003 A1
20030144721 Villaseca et al. Jul 2003 A1
20030171792 Zarinetchi et al. Sep 2003 A1
20030179536 Stevenson et al. Sep 2003 A1
20030204217 Greatbatch Oct 2003 A1
20030208252 O'Boyle et al. Nov 2003 A1
20030212373 Hall et al. Nov 2003 A1
20030213605 Brendel et al. Nov 2003 A1
20040015079 Berger et al. Jan 2004 A1
20040034338 Thierfelder et al. Feb 2004 A1
20040088012 Kroll et al. May 2004 A1
20040167392 Halperin et al. Aug 2004 A1
20040210289 Wang et al. Oct 2004 A1
20040230271 Wang et al. Nov 2004 A1
20040249428 Wang et al. Dec 2004 A1
20040263173 Gray Dec 2004 A1
20040263174 Gray et al. Dec 2004 A1
20050007718 Stevenson et al. Jan 2005 A1
20050070972 Wahlstrand et al. Mar 2005 A1
20050113669 Helfer et al. May 2005 A1
20050113676 Weiner et al. May 2005 A1
20050113873 Weiner et al. May 2005 A1
20050113874 Connelly et al. May 2005 A1
20050113876 Weiner et al. May 2005 A1
20050197677 Stevenson Sep 2005 A1
20050201039 Stevenson et al. Sep 2005 A1
20050215914 Bornzin et al. Sep 2005 A1
20050222642 Przybyszewski et al. Oct 2005 A1
20050222647 Wahlstrand et al. Oct 2005 A1
20050222656 Wahlstrand et al. Oct 2005 A1
20050222657 Wahlstrand et al. Oct 2005 A1
20050222658 Hoegh et al. Oct 2005 A1
20050222659 Olsen et al. Oct 2005 A1
20050247472 Helfer et al. Nov 2005 A1
20050248340 Berkcan et al. Nov 2005 A1
20050248907 Stevenson et al. Nov 2005 A1
20060009819 Przybyszewski Jan 2006 A1
20060025820 Phillips et al. Feb 2006 A1
20060030774 Gray et al. Feb 2006 A1
20060032665 Ice Feb 2006 A1
20060041294 Gray Feb 2006 A1
20060085043 Stevenson Apr 2006 A1
20060100506 Halperin et al. May 2006 A1
20060119361 Karmarkar et al. Jun 2006 A1
20060200218 Wahlstrand Sep 2006 A1
20060211979 Smith et al. Sep 2006 A1
20060212096 Stevenson Sep 2006 A1
20060221543 Stevenson et al. Oct 2006 A1
20060229693 Bauer et al. Oct 2006 A1
20060247684 Halperin et al. Nov 2006 A1
20060247747 Olsen et al. Nov 2006 A1
20060247748 Wahlstrand et al. Nov 2006 A1
20060252314 Atalar et al. Nov 2006 A1
20060259093 Stevenson et al. Nov 2006 A1
20060271138 MacDonald Nov 2006 A1
20070035910 Stevenson Feb 2007 A1
20070043399 Stevenson et al. Feb 2007 A1
20070083244 Stevenson et al. Apr 2007 A1
20070088416 Atalar et al. Apr 2007 A1
20070093142 MacDonald et al. Apr 2007 A1
20070106332 Denker et al. May 2007 A1
20070112398 Stevenson et al. May 2007 A1
20070123949 Dabney et al. May 2007 A1
20070167867 Wolf Jul 2007 A1
20070168005 Gray Jul 2007 A1
20070168006 Gray Jul 2007 A1
20070179554 Lyer et al. Aug 2007 A1
20070179577 Marshall et al. Aug 2007 A1
20070203529 Iyer et al. Aug 2007 A1
20070208383 Williams Sep 2007 A1
20070250143 Sommer et al. Oct 2007 A1
20070255332 Cabelka et al. Nov 2007 A1
20070255377 Marshall et al. Nov 2007 A1
20070288058 Halperin et al. Dec 2007 A1
20070299490 Yang et al. Dec 2007 A1
20080004670 McVenes et al. Jan 2008 A1
20080033497 Bulkes et al. Feb 2008 A1
20080039709 Karmarkar Feb 2008 A1
20080049376 Stevenson et al. Feb 2008 A1
20080049410 Kawaguchi et al. Feb 2008 A1
20080051854 Bulkes et al. Feb 2008 A1
20080071313 Stevenson et al. Mar 2008 A1
20080116997 Dabney et al. May 2008 A1
20080132986 Gray et al. Jun 2008 A1
20080132987 Westlund et al. Jun 2008 A1
20080140149 John et al. Jun 2008 A1
20080158746 Anthony et al. Jul 2008 A1
20080161886 Stevenson et al. Jul 2008 A1
20080195180 Stevenson et al. Aug 2008 A1
20080195186 Li et al. Aug 2008 A1
20080195187 Li et al. Aug 2008 A1
20080221638 Wedan et al. Sep 2008 A1
20080239622 Hsu et al. Oct 2008 A1
20080243218 Bottomley et al. Oct 2008 A1
20080247111 Anthony et al. Oct 2008 A1
20080247116 Kawano et al. Oct 2008 A1
20080247117 Elam et al. Oct 2008 A1
20080262584 Bottomley et al. Oct 2008 A1
20080262592 Jordan et al. Oct 2008 A1
20080264685 Park et al. Oct 2008 A1
20080269591 Halperin et al. Oct 2008 A1
20080277153 Teshome et al. Nov 2008 A1
20090036944 Fonte Feb 2009 A1
20090097219 Cho et al. Apr 2009 A1
20090099440 Viohl Apr 2009 A1
20090099555 Viohl et al. Apr 2009 A1
20090107717 Hsu et al. Apr 2009 A1
20090116167 Stevenson et al. May 2009 A1
20090128976 Anthony May 2009 A1
20090139760 Tanaka Jun 2009 A1
20090163974 Taylor Jun 2009 A1
20090163980 Stevenson Jun 2009 A1
20090180237 Hou et al. Jul 2009 A1
20090187229 Lavie Jul 2009 A1
20090236141 Kim et al. Sep 2009 A1
20090243756 Stevenson et al. Oct 2009 A1
20090270948 Nghiem et al. Oct 2009 A1
20090281592 Vase Nov 2009 A1
20090312835 Stevenson Dec 2009 A1
20100010602 Wedan et al. Jan 2010 A1
20100016936 Stevenson et al. Jan 2010 A1
20100023000 Stevenson et al. Jan 2010 A1
20100023095 Stevenson et al. Jan 2010 A1
20100046135 Niki et al. Feb 2010 A1
20100046137 Adachi Feb 2010 A1
20100076538 Desai et al. Mar 2010 A1
20100109958 Haubrich et al. May 2010 A1
20100109966 Mateychuk et al. May 2010 A1
20100114276 Min et al. May 2010 A1
20100114277 Zhao et al. May 2010 A1
20100138192 Min Jun 2010 A1
20100149042 Utsi et al. Jun 2010 A1
20100151113 Shelton Jun 2010 A1
20100160989 Legay Jun 2010 A1
20100174348 Bulkes et al. Jul 2010 A1
20100174349 Stevenson et al. Jul 2010 A1
20100198312 Stevenson et al. Aug 2010 A1
20100217262 Stevenson et al. Aug 2010 A1
20100217264 Odom et al. Aug 2010 A1
20100217341 John et al. Aug 2010 A1
20100234907 Dobak Sep 2010 A1
20110043297 Stevenson et al. Feb 2011 A1
Foreign Referenced Citations (56)
Number Date Country
0243573 Nov 1987 EP
0145430 May 1991 EP
0466424 Jan 1992 EP
0557127 Aug 1993 EP
0673621 Sep 1995 EP
0498996 Mar 1997 EP
1021730 Apr 2003 EP
0930509 Mar 2004 EP
1469910 Dec 2006 EP
1883449 Jan 2009 EP
2025361 Feb 2009 EP
60141034 Jul 1985 JP
61181925 Aug 1986 JP
62233905 Oct 1987 JP
4071536 Mar 1992 JP
6054823 Mar 1994 JP
06070902 Mar 1994 JP
6176962 Jun 1994 JP
7272975 Oct 1995 JP
7272975 JP Oct 1995 JP
9094238 Apr 1997 JP
11239572 Sep 1999 JP
2004254257 Sep 2004 JP
2004289760 Oct 2004 JP
2005117606 Apr 2005 JP
2007129565 May 2007 JP
8704080 Jul 1987 WO
9210213 Jun 1992 WO
9423782 Oct 1994 WO
9740396 Oct 1997 WO
9852461 Nov 1998 WO
9919739 Apr 1999 WO
0010456 Mar 2000 WO
0025672 May 2000 WO
02083016 Oct 2002 WO
2003037424 May 2003 WO
2003063946 Aug 2003 WO
2003063952 Aug 2003 WO
2003063953 Aug 2003 WO
2003063955 Aug 2003 WO
2003063956 Aug 2003 WO
2003063957 Aug 2003 WO
2005081784 Sep 2005 WO
2005102445 Nov 2005 WO
2005102446 Nov 2005 WO
2005102447 Nov 2005 WO
2005115531 Dec 2005 WO
2006093685 Sep 2006 WO
2007047966 Apr 2007 WO
2007089988 Aug 2007 WO
2007102893 Sep 2007 WO
2007145671 Dec 2007 WO
2008077037 Jun 2008 WO
2008111986 Sep 2008 WO
2010008833 Jan 2010 WO
2013158552 Oct 2013 WO
Non-Patent Literature Citations (17)
Entry
Konings, et al., “Heating Around Intravascular Guidewires by Resonating RF Waves”, Journal of Magnetic Resonance Imaging, 2000, 79-85.
Luchinger, “Safety Aspects of Cardiac Pacemakers in Magnetic Resonance Imaging”, A dissertation submitted to the Swiss Federal Institute of Technology Zurich, Switzerland, 2002.
Roguin, et al., “Modern Pacemaker and Implantable Cardioverter/Defibrillator systems Can Be Magnetic Resonance Imaging Safe”, Journal of the American Heart Association, Aug. 4, 2004, 475-482.
Search, European Search Report, Application No. 12157697.9, dated Jul. 5, 2012.
Shellock, et al., “Comparative Analyses of MR-Induced Distal Heating in Novel Filtered Cardiac Pacing Leads UsingTwo Geometric Configurations”, 17th Scientific Meeting & Exhibition of the International Society for Magnetic Resonance in Medicine, Honolulu, Hawaii, Apr. 2009, 3014.
Shellock, “MRI Issues for Neuromodulation Devices”, Institute for Magnetic Resonance Safety Education, and Research (IMRSER).
Susil, et al., “Multifunctional Interventional Devices for MRI: A Combined Electrophysiology/MRI Catheter”, 2002, 594-600.
Susil, et al., U.S. Appl. No. 60/283,725, Multifunctional Interventional Devices for Use in MRI, filed Apr. 13, 2001.
Weiner, et al., U.S. Appl. No. 60/269,817, Electromagnetic Interference immune Cardiac Assist System, filed Feb. 20, 2001.
Wilk, et al., “High-K Gate Dielectrics: Current Status and Materials Properties Considerations”, Journal of Applied Physics, vol. 89, No. 10, May 15, 2001, 5243-5275.
Balanis, “Advanced Engineering Electromagnetics”, 1989.
Clement et al., “Estimation of Effective Lead Loop Area for Implantable Pulse Generators and Cardioverter/Defibrillators for Determination of Susceptibility to Radiated Electromagnetic Interference”, AAMI EMC Task Force, Apr. 12, 2004, 10 pages.
Ennis et al., “Cautions About the Use of Equivalent Series Resistance (ESR) in Specifying Capacitors”, Mar. 8, 1993, 58-64.
EPsearch, Application 10167031.3, Sep. 19, 2012.
EPsearch, Application 10167045.3, Oct. 10, 2012.
Gabriel et al., “The Dielectric Properties of Biological Tissues: Parametric Models for the Dielectric Spectrum of Tissues”, Parametric Models for the Dielectric Spectrum of Tissues, Phys. Med. Bio. 41, 1996, 2271-2293.
Johnson et al., “Characterization of the Relationship between MR-Induced Distal Tip Heating in Cardiac Pacing Leads and Electrical Performance of Novel Filtered Tip Assemblies”, 17th Scientific Meeting & Exhibition of the International Society for Magnetic Resonance in Medicine, Honolulu, Hawaii, Apr. 2009, 307.
Related Publications (1)
Number Date Country
20160367821 A1 Dec 2016 US
Provisional Applications (1)
Number Date Country
61841419 Jun 2013 US
Continuation in Parts (2)
Number Date Country
Parent 14826229 Aug 2015 US
Child 15250210 US
Parent 14202653 Mar 2014 US
Child 14826229 US