Patent Grant
RE44155
The present invention provides thin film coatings for glass sheets and other substrates. More particularly, the invention provides thin film coatings including film comprising titania over a base layer, such as silica. The invention also provides methods of depositing such coatings onto glass sheets and other substrates.
For many years, it has been known that titanium dioxide can be used as a photocatalyst. A great deal of research has been done with a view toward providing coatings that have self-cleaning properties. The pursuit of self-cleaning window coatings, in particular, has been an active field of exploration. These coatings typically involve a titanium dioxide layer on a glass pane. The coatings are commonly provided with a relatively thick layer of titanium dioxide and/or a specific under-layer system designed for achieving high levels of photoactivity. Thick titanium dioxide layers, unfortunately, produce high levels of visible reflectance, thus creating a somewhat mirror-like appearance. This high visible reflection tends to exaggerate the appearance of dirt on a window. Further, some known under-layer systems teach that specific materials and crystal structures must be used for the under-layer film(s) to achieve acceptable photoactivity levels. Moreover, some known photocatalytic coatings are said to require heating during film deposition to achieve acceptable levels of photoactivity.
Known photocatalytic coatings also tend to have properties that are less than ideal for window applications. As noted above, the visible reflectance of some known photocatalytic coatings is unacceptably high. Moreover, the reflected colors of these coatings tend not to be ideal. Further, some of these coatings have particularly rough surfaces, since they are designed to have large surface areas that facilitate high photoactivity levels. These rough coatings, unfortunately, tend to be quite vulnerable to being abraded. They are also particularly susceptible to taking on and stubbornly retaining dirt and other contaminants. Finally, with some recent photocatalytic coatings (e.g., those having complex under-layer systems), it is unclear whether these coatings will exhibit the longevity (e.g., in-field durability over time) that is required for number-one-surface coatings.
The present invention provides low-maintenance coatings that offer exceptional durability, exceptional optical properties, reliable production processes, and surprising cleanliness/maintenance properties.
The following detailed description is to be read with reference to the drawings, in which like elements in different drawings have like reference numerals. The drawings, which are not necessarily to scale, depict selected embodiments and are not intended to limit the scope of the invention. Skilled artisans will recognize that the given examples have many alternatives that fall within the scope of the invention.
Many embodiments of the invention involve a coated substrate. A wide variety of substrate types are suitable for use in the invention. In some embodiments, the substrate 10 is a sheet-like substrate having generally opposed first 12 and second 14 major surfaces. For example, the substrate can be a sheet of transparent material (i.e., a transparent sheet). The substrate, however, is not required to be a sheet, nor is it required to transparent.
The substrate can optionally be a component of any of a variety of building materials. Examples of anticipated applications include embodiments wherein the substrate is a sash (e.g., a window sash or a door sash), a siding panel (e.g., an aluminum siding panel), a tent panel, a tarpaulin (e.g., a fluorocarbon polymer tarpaulin), a plastic film (e.g., a fluorocarbon plastic film), a roofing shingle, a window blind (such as a metal, plastic, or paper window blind), a paper screen (e.g., a shoji), a railing, a baluster, or an escutcheon. In one embodiment, the substrate is a ceramic tile, such as a wall, ceiling, or floor tile. In another embodiment, the substrate is a glass block. A variety of suitable glass blocks can be obtained commercially from Saint-Gobain Oberland (Koblenz, Germany). In still other embodiments, the substrate is a polyester film, a polyethylene film, a terephthalate film, etc. Suitable films of this nature can be obtained commercially from Nippon Soda Co., Ltd. (Tokyo, Japan). In further embodiments, the substrate is a fence or wall, such as a noise-reduction fence or wall.
Other anticipated applications include embodiments wherein the substrate 10 is part of a sink, toilet, urinal cover, lighting fixture, a cover for a lighting fixture (e.g., a lamp cover), or another bathroom fixture or appliance. Still further, the substrate in one embodiment is a key, button, or key pad for a computer or another machine. In yet another embodiment, the substrate is an article of paper clothing (e.g., a paper-based shirt, dress, or pants for medical professionals), an article of cloth clothing, or an article of clothing of another fabric.
For many applications, the substrate will comprise a transparent (or at least translucent) material, such as glass or clear plastic. For example, the substrate is a glass sheet (e.g., a window pane) in certain embodiments. A variety of known glass types can be used, and soda-lime glass will commonly be preferred. In certain preferred embodiments, the substrate is part of a window, skylight, door, or other glazing. In some cases, the substrate is part of an automobile windshield, an automobile side window, an exterior or interior rear-view mirror, a bumper, a hubcap, a windshield wiper, or an automobile hood panel, side panel, trunk panel, or roof panel. In other embodiments, the substrate is a piece of aquarium glass, a plastic aquarium window, or a piece of greenhouse glass. In a further embodiment, the substrate is a refrigerator panel, such as part of a refrigerator door or window.
Substrates of various sizes can be used in the present invention. Commonly, large-area substrates are used. Certain embodiments involve a substrate having a major dimension (e.g., a length or width) of at least about 0.5 meter, preferably at least about 1 meter, perhaps more preferably at least about 1.5 meters (e.g., between about 2 meters and about 4 meters), and in some cases at least about 3 meters. In some embodiments, the substrate is a jumbo glass sheet having a length and/or width that is between about 3 meters and about 10 meters, e.g., a glass sheet having a width of about 3.5 meters and a length of about 6.5 meters. Substrates having a length and/or width of greater than about 10 meters are also anticipated.
In some embodiments, the substrate is a generally square or rectangular glass sheet. The substrate in these embodiments can have any of the dimensions described in the preceding paragraph and/or in the following paragraph. In one particular embodiment, the substrate is a generally rectangular glass sheet having a width of between about 3 meters and about 5 meters, such as about 3.5 meters, and a length of between about 6 meters and about 10 meters, such as about 6.5 meters.
Substrates of various thicknesses can be used in the present invention. In some embodiments, the substrate (which can optionally be a glass sheet) has a thickness of about 1-5 mm. Certain embodiments involve a substrate with a thickness of between about 2.3 mm and about 4.8 mm, and perhaps more preferably between about 2.5 mm and about 4.8 mm. In one particular embodiment, a sheet of glass (e.g., soda-lime glass) with a thickness of about 3 mm is used. In one group of embodiments, the thickness of the substrate (which can be glass, plastic, or another material) is between about 4 mm and about 20 mm. Thicknesses in this range, for example, may be useful for aquarium tanks (in which case, the substrate can optionally be glass or acrylic). When the substrate is float glass, it will commonly have a thickness of between about 4 mm and about 19 mm. In another group of embodiments, the substrate is a thin sheet (e.g., of glass) having a thickness of between about 0.35 mm and about 1.9 mm. Embodiments of this nature can optionally involve the substrate being a sheet of display glass or the like.
With reference to
In some embodiments of the present invention, the base film 30 is deposited directly over the substrate 10 (e.g., directly over a major surface 12 of the substrate). The base film 30 generally comprises any dielectric film. In preferred embodiments, this film 30 comprises, or consists essentially of, silica (e.g., silicon dioxide). When the base film 30 is a silica film, it can include small amounts of an electrically-conductive material, such as aluminum, which may be oxidized in the film 30. For example, this film 30 can be deposited by sputtering a silicon-containing target that includes a small amount of aluminum or another metal that enhances the electrical conductivity of the target. The base film 30 (an entire thickness of which may comprise or consist essentially of silica) preferably has (e.g., is deposited at) a physical thickness of less than about 300 angstroms, and more preferably less than 100 angstroms. In certain embodiments, the film 30 is less than 95 angstroms. These small thicknesses facilitate a surprisingly array of exceptional properties in the present coating.
The coating 40 includes a titania-containing film 50 that desirably is deposited directly over the base film 30. In certain embodiments, the titania-containing film 50 is deposited directly over an entirely or substantially amorphous base film. In some of these embodiments, the substrate is a glass sheet that has been subjected to a post-coating-deposition glass tempering procedure, and the base film 30 is entirely or substantially amorphous, such that the titania-containing film 50 is directly over an entirely or substantially amorphous base film.
The titania-containing film 50 can comprise one or more other materials, such as oxides of iron, silver, copper, tungsten, aluminum, zinc, strontium, palladium, gold, platinum, nickel, cobalt, or combinations thereof. Preferably a major percentage (e.g., by weight) of the film 50 is titania. In preferred embodiments, this film 50 consists essentially of, or consists of, titanium dioxide. In some embodiments, though, the film 50 consists essentially of, or consists of, substoichiometric titanium oxide (TiOx, where x is less than 2). The film 50 (an entire thickness of which may consist essentially of titania) desirably has (e.g., is deposited at) a physical thickness of less than 100 angstroms. In preferred embodiments, the film 50 has a thickness of less than 50 angstroms, preferably less than 40 angstroms, and more preferably less than 35 angstroms. In one particular embodiment, the film 50 has a thickness of between about 5 angstroms and about 30 angstroms.
It has been discovered that the film 50 when provided at these very small thicknesses provides surprisingly advantageous low maintenance properties, while at the same time achieving exceptionally low visible reflection, neutral color, and exceptional durability. Moreover, in some embodiments, the film 50 is a sputtered film (optionally sputtered reactively using one or more metallic targets consisting essentially of titanium) deposited at low temperatures (e.g., sputter deposited while maintaining the substrate at less than about 250 degrees Celsius and preferably less than 200 degrees Celsius), and it is perhaps more surprising that a sputtered film of this nature exhibits such useful low-maintenance properties.
One group of embodiments provides a substrate 10 (e.g., a glass sheet) having a first major surface 12 directly over which is deposited the base film 30 at a thickness of less than about 300 angstroms, wherein the titania-containing film is deposited directly over the base film 30 at a thickness of less than 50 angstroms. In these embodiments, the base film 30 preferably comprises a dielectric material. As noted above, silica is used in some embodiments.
Certain particular embodiments provide a substrate 10 (e.g., a glass sheet) having a first major surface 12 directly over which is deposited a base film 30 consisting essentially of silica (e.g., SO2) at a thickness of between about 70 angstroms and about 120 angstroms, wherein a film 50 consisting essentially of titania (e.g., TiO2) is deposited directly over the base film 30 at a thickness of between about 30 angstroms and about 300 angstroms. In some preferred embodiments of this nature, the base film 30 has a thickness of between about 70 angstroms and about 120 angstroms, perhaps optimally about 100 angstroms, while the titania-containing film 50 has a thickness of between about 30 angstroms and about 120 angstroms, perhaps optimally about 100 angstroms.
In a further embodiment, the thickness of the titania-containing film 50 is less than 100 angstroms (and optionally less than about 80 angstroms) but greater than about 30 angstroms, while the base film 30 has a thickness of less than about 300 angstroms (and optionally less than about 100 angstroms) but greater than about 30 angstroms. In some cases of this nature, the base film consists essentially of silica while the titania-containing film consists essentially of titania.
Certain embodiments provide a substrate 10 (e.g., a glass sheet) having a first major surface 12 directly over which is deposited a base film 30 consisting essentially of silica (e.g., SiO2) at a thickness of less than 100 angstroms, wherein a titania-containing film 50 consisting essentially of titania (e.g., TiO2) is deposited directly over the base film 30 at a thickness of less than 50 angstroms. In some preferred embodiments of this nature, the base film 30 has a thickness of about 90 angstroms, while the titania-containing film 50 has a thickness of about 25 angstroms. Following is an exemplary embodiment of this nature:
The diagram above exemplifies one coating of a group of embodiments wherein there is provided a substrate 10 having a first major surface 12 over which is deposited the base film 30, wherein the titanium-containing film 50 is deposited directly over the base film 30, and each of these two films has a thickness of less than 100 angstroms. In the diagram above, the base film comprises silica, although this is not required in all of the present embodiments. The base film 30 in the present group of embodiments can optionally be deposited directly over the substrate.
In the present coating 40, the film 50 desirably is the outermost film of the coating. Conventional wisdom in the art would suggest that the very small thicknesses of the present coating 40 would not yield enough photoactivity to give useful properties, especially for embodiments where the film 50 is sputtered. Surprisingly, though, the present coating exhibits photoactivity levels that are believed to be advantageous for keeping windows (e.g., monolithic panes or IG units) free of particular contaminants that tend to build up on windows during the course of routine manufacturing. The present coating also exhibits advantageous water-sheeting properties, while at the same time having exceptional optical properties and durability.
With reference to
With reference to
In the illustrated embodiment, the exterior pane 10 has an exterior surface 12 and an interior surface 14. The interior pane 10′ has an interior surface 16 and an exterior surface 18. The pane 10 can be mounted in a frame (e.g., a window frame) such that the exterior surface 12 is exposed to an outdoor environment (e.g., such that the low maintenance coating 40 is exposed to such an environment). Interior surfaces 14 and 16 are both exposed to the atmosphere in the between-pane space 800 of the insulating glass unit. The optional low-emissivity coating 80 can be positioned on either one of the interior surfaces 14 or 16. In
With reference to
The invention also provides methods for producing coated substrates. These methods involve depositing the low-maintenance coating 40 (i.e., by depositing each film of any embodiment described above) upon a substrate 10. As noted above, the low-maintenance coating includes at least two films. These films 30, 50 can be deposited by a variety of well known coating techniques. In certain embodiments, the coating 40 (or at least the film 50) is deposited by sputtering, optionally at a low temperature (e.g., while maintaining the substrate at below about 250 degrees Celsius, and perhaps more preferably below 200 degrees Celsius). Alternatively, other coating techniques can be used, including chemical vapor deposition (CVD), plasma enhanced chemical vapor deposition, and pyrolytic deposition. Various embodiments of the coating 40 have been described, and the present methods involve depositing any of the described coating embodiments by any thin film deposition method.
Sputtering is well known in the present art.
The illustrated sputtering chamber 200 includes a base (or “floor”) 220, a plurality of side walls 222, and a ceiling (or “top lid” or “cover”) 230, together bounding a sputtering cavity 202. In
As noted above, the invention provides methods of producing a coated substrate by sputter depositing onto the substrate each film of any coating embodiment described in the present disclosure. Preferably, the sputtering of the coating 40 (or at least the sputtering of the titania-containing film 50) is carried out while maintaining the substrate at a temperature of less than about 250 degrees Celsius, and more preferably less than 200 degrees Celsius (e.g., without supplemental heating of the substrate). In such cases, the coating preferably is sputter deposited without any supplemental means for delivering energy to the growing film (e.g., without any heating of the substrate beyond that which occurs normally from the plasma and ion bombardment of conventional sputtering). In other cases, the film is deposited by a sputter deposition technique that includes a supplemental heating (or other supplemental energy delivery).
In certain methods of the invention, the low-maintenance coating 40 is applied to a substrate 10 in a multiple-chamber sputtering line. Sputtering lines are well known in the present art. A typical sputtering line includes a series of coat zones, or sputtering chambers, aligned and connected such that a sheet-like substrate can be passed from one coat zone to the next by conveying the substrate horizontally over spaced-apart transport rollers 210 in each of the zones (the rollers form a continuous path of substrate travel 45 through the sputtering line). The substrate is typically conveyed at speeds of between about 100-500 inches per minute.
In one particular method, the substrate 10 is positioned at the inlet of the sputtering line and conveyed through a series of sputtering bays. Each bay is provided with one cathode having two rotatable cylindrical targets. The substrate 10 is conveyed at a rate of about 350 inches per minute, while sputtering each target at a desired power level.
First, the substrate is conveyed through five sputtering bays that are adapted to deposit the base film 30. In more detail, each bay has a cathode comprising two silicon sputtering targets. The silicon targets in these bays are sputtered in oxidizing atmosphere to deposit a silicon dioxide film directly upon the first major surface 12 of the substrate. The atmosphere in each of these bays may consist essentially of oxygen (e.g., about 100% O2). Alternatively, the atmosphere may comprise Ar/O2 (e.g., oxygen and up to about 40% argon). A power of about 57 kW is applied to each of these cathodes. The substrate 10 is conveyed beneath the targets at a rate of about 350 inches per minute, while sputtering each of these targets at the 57 kW power level. This results in the deposition of a silicon dioxide base film having a thickness of about 90 Å. As noted above, each silicon target may include some aluminum or another material to enhance the conductivity of the target.
The substrate is then conveyed through four more sputtering bays to deposit the titania-containing film 50. Each of these bays has a cathode comprising two titanium sputtering targets. These titanium targets are sputtered in an oxidizing atmosphere to deposit a titanium dioxide film directly upon the base film 30. The atmosphere in each such bay may consist essentially of oxygen. Alternatively, the atmosphere may comprise Ar/O2. A power of about 100 kW is applied to each of these cathodes. The substrate 10 is conveyed beneath the targets at a rate of about 350 inches per minute, while sputtering each of these targets at the 100 kW power level. This results in the deposition of a titanium dioxide film having a thickness of about 25 Å. This titanium dioxide forms the outermost portion of the coating 40 (and is exposed) in the present embodiment.
In the method just described, it is to be appreciated that the second major surface 14 of the substrate 10 may previously have been, or may subsequently be, coated with an optional low-emissivity coating 80. For instance, the coat zones just described for use in depositing the base film 30 and titania-containing film 50 can be a sputter-up coat zones located toward the end of a sputtering line that includes a relatively large number of preceding sputter-down coat zones in which the optional low-emissivity coating 80 may have been applied. Particularly useful sputter-up/sputter-down methods and equipment are described in U.S. patent application Ser. No. 09/868,542, the entire contents of which are incorporated herein by reference.
While preferred embodiments of the present invention have been described, it should be understood that numerous changes, adaptations, and modifications can be made therein without departing from the spirit of the invention and the scope of the appended claims.
The present application claims priority to provisional U.S. patent application filed Jul. 12, 2004 and assigned Ser. No. 60/587,210, and provisional U.S. patent application filed Mar. 7, 2005 and assigned Ser. No. 60/659,491, the entire disclosures of which are incorporated herein by reference.
| Number | Name | Date | Kind |
|---|---|---|---|
| 1256818 | Nile | Feb 1918 | A |
| 2808351 | Colbert | Oct 1952 | A |
| 2780553 | Pawlyk | Feb 1957 | A |
| 3505092 | Ryan | Apr 1970 | A |
| 3528906 | Cash, Jr. | Sep 1970 | A |
| 3679291 | Apfel | Jul 1972 | A |
| 3727666 | Vander Sluis | Apr 1973 | A |
| 3829197 | Thelen | Aug 1974 | A |
| 3840451 | Golyanov | Oct 1974 | A |
| 3844924 | Cunningham | Oct 1974 | A |
| 3852098 | Bloss | Dec 1974 | A |
| 3854796 | Thelen | Dec 1974 | A |
| 3911579 | Lane | Oct 1975 | A |
| 3925182 | Carmichael | Dec 1975 | A |
| 3934961 | Itoh | Jan 1976 | A |
| 3968018 | Lane | Jul 1976 | A |
| 3970037 | Sopko | Jul 1976 | A |
| 3990784 | Gelber | Nov 1976 | A |
| 4012119 | Adams | Mar 1977 | A |
| 4029566 | Brandmair | Jun 1977 | A |
| 4045125 | Farges | Aug 1977 | A |
| 4052520 | Chang | Oct 1977 | A |
| 4060660 | Carlson | Nov 1977 | A |
| 4107350 | Berg | Aug 1978 | A |
| 4130672 | Onoki | Dec 1978 | A |
| 4166018 | Chapin | Aug 1979 | A |
| 4194022 | Gillery | Mar 1980 | A |
| 4212663 | Aslami | Jul 1980 | A |
| 4212903 | Schnell | Jul 1980 | A |
| 4214014 | Hofer | Jul 1980 | A |
| 4216259 | Groth | Aug 1980 | A |
| 4238276 | Kinugawa | Dec 1980 | A |
| 4252629 | Bewer | Feb 1981 | A |
| 4261722 | Novak | Apr 1981 | A |
| 4322276 | Meckel | Mar 1982 | A |
| 4331526 | Kuehnie | May 1982 | A |
| 4332922 | Kossmehl | Jun 1982 | A |
| 4336119 | Gillery | Jun 1982 | A |
| 4351861 | Henery | Sep 1982 | A |
| 4356073 | McKelvey | Oct 1982 | A |
| 4377613 | Gordon | Mar 1983 | A |
| 4422916 | McKelvey | Dec 1983 | A |
| 4422917 | Hayfield | Dec 1983 | A |
| 4440822 | Gordon | Apr 1984 | A |
| 4465575 | Love | Aug 1984 | A |
| 4466258 | Sando | Aug 1984 | A |
| 4466877 | McKelvey | Aug 1984 | A |
| 4485146 | Mizuhashi | Nov 1984 | A |
| 4486286 | Lewin | Dec 1984 | A |
| 4503125 | Nelson | Mar 1985 | A |
| 4504519 | Zelez | Mar 1985 | A |
| 4556599 | Sato | Dec 1985 | A |
| 4568622 | Minami | Feb 1986 | A |
| 4569738 | Kieser | Feb 1986 | A |
| 4571350 | Parker | Feb 1986 | A |
| 4576864 | Krautter | Mar 1986 | A |
| 4661409 | Kieser | Apr 1987 | A |
| 4663234 | Bouton | May 1987 | A |
| 4673475 | Windischmann | Jun 1987 | A |
| 4692428 | Murrell | Sep 1987 | A |
| 4704339 | Green | Nov 1987 | A |
| 4713311 | Senske | Dec 1987 | A |
| 4717622 | Kurokawa | Jan 1988 | A |
| 4725345 | Sakamoto | Feb 1988 | A |
| 4728529 | Etzkorn | Mar 1988 | A |
| 4732454 | Saito | Mar 1988 | A |
| 4737252 | Hoffman | Apr 1988 | A |
| 4769291 | Belkind | Sep 1988 | A |
| 4777090 | Ovshinsky | Oct 1988 | A |
| 4780334 | Ackerman | Oct 1988 | A |
| 4798660 | Ermer | Jan 1989 | A |
| 4814056 | Welty | Mar 1989 | A |
| 4816127 | Eltouky | Mar 1989 | A |
| 4834857 | Gillery | May 1989 | A |
| 4838935 | Dunlop | Jun 1989 | A |
| 4849081 | Ross | Jul 1989 | A |
| 4851095 | Scobey | Jul 1989 | A |
| 4854670 | Mellor | Aug 1989 | A |
| 4859493 | Lemelson | Aug 1989 | A |
| 4861680 | Meyer | Aug 1989 | A |
| 4882827 | Kusumi | Nov 1989 | A |
| 4883574 | Dos Santos | Nov 1989 | A |
| 4894133 | Hedgcoth | Jan 1990 | A |
| 4902580 | Gillery | Feb 1990 | A |
| 4915977 | Okamoto | Apr 1990 | A |
| 4919778 | Dietrich | Apr 1990 | A |
| 4931213 | Cass | Jun 1990 | A |
| 4931315 | Mellor | Jun 1990 | A |
| 4931778 | Guajardo | Jun 1990 | A |
| 4940636 | Brock | Jul 1990 | A |
| 4952430 | Bowser | Aug 1990 | A |
| 4954465 | Kawashima | Sep 1990 | A |
| 4961958 | Desphandey | Oct 1990 | A |
| 4963240 | Fukasawa | Oct 1990 | A |
| 4981568 | Taranko | Jan 1991 | A |
| 4990234 | Szczyrbowski | Feb 1991 | A |
| 4995893 | Jenkins | Feb 1991 | A |
| 4997576 | Heller | Mar 1991 | A |
| 5006248 | Anderson | Apr 1991 | A |
| 5008002 | Uno | Apr 1991 | A |
| 5020288 | Swensen | Jun 1991 | A |
| 5026415 | Yamamoto | Jun 1991 | A |
| 5032421 | Sarma | Jul 1991 | A |
| 5035784 | Anderson | Jul 1991 | A |
| 5047131 | Wolfe | Sep 1991 | A |
| 5071206 | Hood | Dec 1991 | A |
| 5073241 | Watanabe | Dec 1991 | A |
| 5073450 | Nietering | Dec 1991 | A |
| 5073451 | Iida | Dec 1991 | A |
| 5090985 | Soubeyrand | Feb 1992 | A |
| 5104539 | Anderson | Apr 1992 | A |
| 5105310 | Dickey | Apr 1992 | A |
| 5106671 | Amberger | Apr 1992 | A |
| 5107643 | Swensen | Apr 1992 | A |
| 5108574 | Kirs | Apr 1992 | A |
| 5110637 | Ando | May 1992 | A |
| 5126218 | Clarke | Jun 1992 | A |
| RE34035 | Dimigen | Aug 1992 | E |
| 5139633 | Kashida | Aug 1992 | A |
| 5160534 | Hiraki | Nov 1992 | A |
| 5165972 | Porter | Nov 1992 | A |
| 5168003 | Proscia | Dec 1992 | A |
| 5171414 | Amberger | Dec 1992 | A |
| 5176897 | Lester | Jan 1993 | A |
| 5179468 | Gasloli | Jan 1993 | A |
| 5190807 | Kimock | Mar 1993 | A |
| 5194990 | Boulos | Mar 1993 | A |
| 5196400 | Chen | Mar 1993 | A |
| 5201926 | Szczyrbowski | Apr 1993 | A |
| 5209996 | Kashida | May 1993 | A |
| 5211759 | Zimmerman | May 1993 | A |
| 5234487 | Wickersham | Aug 1993 | A |
| 5245468 | Demiryont | Sep 1993 | A |
| 5254392 | Burns | Oct 1993 | A |
| 5284539 | McKernan | Feb 1994 | A |
| 5286524 | Slutz | Feb 1994 | A |
| 5298048 | Lingle | Mar 1994 | A |
| 5298338 | Hiraki | Mar 1994 | A |
| 5302449 | Eby | Apr 1994 | A |
| 5306547 | Hood | Apr 1994 | A |
| 5306569 | Hiraki | Apr 1994 | A |
| 5318830 | Takamatsu | Jun 1994 | A |
| 5338422 | Belkind | Aug 1994 | A |
| 5342676 | Zagdoun | Aug 1994 | A |
| 5346600 | Nieh | Sep 1994 | A |
| 5354446 | Kida | Oct 1994 | A |
| 5356718 | Athey | Oct 1994 | A |
| 5366764 | Sunthankar | Nov 1994 | A |
| 5378527 | Nakanishi | Jan 1995 | A |
| 5394269 | Takamatsu | Feb 1995 | A |
| 5397050 | Mueller | Mar 1995 | A |
| 5401543 | O'Neill | Mar 1995 | A |
| 5405517 | Lampkin | Apr 1995 | A |
| 5415756 | Wolfe | May 1995 | A |
| 5417827 | Finley | May 1995 | A |
| 5424130 | Nakanishi | Jun 1995 | A |
| 5453459 | Roberts | Sep 1995 | A |
| 5470527 | Yamanobe | Nov 1995 | A |
| 5470661 | Bailey | Nov 1995 | A |
| 5476713 | Abiko | Dec 1995 | A |
| 5482602 | Cooper | Jan 1996 | A |
| 5496621 | Makita | Mar 1996 | A |
| 5498475 | Takigawa | Mar 1996 | A |
| 5507930 | Yamashita | Apr 1996 | A |
| 5512152 | Schicht | Apr 1996 | A |
| 5513039 | Lu | Apr 1996 | A |
| 5514485 | Ando | May 1996 | A |
| 5520996 | Balian | May 1996 | A |
| 5525406 | Goodman | Jun 1996 | A |
| 5527755 | Wenski | Jun 1996 | A |
| 5529631 | Yoshikawa | Jun 1996 | A |
| 5552180 | Finley | Sep 1996 | A |
| 5558751 | Mahler | Sep 1996 | A |
| 5563734 | Wolfe | Oct 1996 | A |
| 5569362 | Lerbet | Oct 1996 | A |
| 5569501 | Bailey | Oct 1996 | A |
| 5589280 | Gibbons | Dec 1996 | A |
| 5593784 | Chinzi | Jan 1997 | A |
| 5593786 | Parker | Jan 1997 | A |
| 5594585 | Komatsu | Jan 1997 | A |
| 5595813 | Ogawa | Jan 1997 | A |
| 5595825 | Guiselin | Jan 1997 | A |
| 5597622 | Zoller | Jan 1997 | A |
| 5599422 | Adams | Feb 1997 | A |
| 5605609 | Ando | Feb 1997 | A |
| 5609924 | McCurdy | Mar 1997 | A |
| 5611899 | Maass | Mar 1997 | A |
| 5616225 | Sieck | Apr 1997 | A |
| 5616532 | Heller | Apr 1997 | A |
| 5618388 | Seeser | Apr 1997 | A |
| 5618590 | Naruse | Apr 1997 | A |
| 5620572 | Bjornard | Apr 1997 | A |
| 5624423 | Anjur | Apr 1997 | A |
| 5624760 | Collins | Apr 1997 | A |
| 5633208 | Ishikawa | May 1997 | A |
| 5635287 | Balian | Jun 1997 | A |
| 5643423 | Kimock | Jul 1997 | A |
| 5643432 | Qiu | Jul 1997 | A |
| 5645699 | Sieck | Jul 1997 | A |
| 5645900 | Ong | Jul 1997 | A |
| 5669144 | Hahn | Sep 1997 | A |
| 5674625 | Takahashi | Oct 1997 | A |
| 5674658 | Burberry | Oct 1997 | A |
| 5679431 | Chen | Oct 1997 | A |
| 5679978 | Kawahara | Oct 1997 | A |
| 5683560 | Szczyrbowski | Nov 1997 | A |
| 5683561 | Hollars | Nov 1997 | A |
| 5686372 | Langford | Nov 1997 | A |
| 5698262 | Soubeyrand | Dec 1997 | A |
| 5715103 | Amano | Feb 1998 | A |
| 5719705 | Machol | Feb 1998 | A |
| 5723172 | Sherman | Mar 1998 | A |
| 5724187 | Varaprasad | Mar 1998 | A |
| 5733660 | Makita | Mar 1998 | A |
| 5733669 | Veyhl | Mar 1998 | A |
| 5744215 | Neuman | Apr 1998 | A |
| 5745291 | Jenkinson | Apr 1998 | A |
| 5750265 | Goodman | May 1998 | A |
| 5755867 | Chikuni | May 1998 | A |
| 5762674 | Maltby, Jr. | Jun 1998 | A |
| 5763087 | Falabella | Jun 1998 | A |
| 5780119 | Dearnaley | Jul 1998 | A |
| 5780149 | McCurdy | Jul 1998 | A |
| 5780380 | Endoh | Jul 1998 | A |
| 5789040 | Martinu | Aug 1998 | A |
| 5811191 | Neuman | Sep 1998 | A |
| 5812405 | Meredith, Jr. | Sep 1998 | A |
| 5814195 | Lehan | Sep 1998 | A |
| 5814196 | Hollars | Sep 1998 | A |
| 5820994 | Gotoh | Oct 1998 | A |
| 5827490 | Jones | Oct 1998 | A |
| 5830252 | Finley | Nov 1998 | A |
| 5830327 | Kolenkow | Nov 1998 | A |
| 5830332 | Babich | Nov 1998 | A |
| 5846613 | Neuville | Dec 1998 | A |
| 5849200 | Heller | Dec 1998 | A |
| 5853866 | Watanabe | Dec 1998 | A |
| 5854169 | Heller | Dec 1998 | A |
| 5854708 | Komatsu | Dec 1998 | A |
| 5863398 | Kardokus | Jan 1999 | A |
| 5866199 | Swidler | Feb 1999 | A |
| 5866260 | Adams, Jr. | Feb 1999 | A |
| 5869187 | Nakamura | Feb 1999 | A |
| 5869808 | Hyllberg | Feb 1999 | A |
| 5871843 | Yoneda | Feb 1999 | A |
| 5873203 | Thiel | Feb 1999 | A |
| 5874701 | Watanabe | Feb 1999 | A |
| 5877391 | Kanno | Mar 1999 | A |
| 5888593 | Petrmichl | Mar 1999 | A |
| 5891556 | Anderson | Apr 1999 | A |
| 5896553 | Lo | Apr 1999 | A |
| 5897957 | Goodman | Apr 1999 | A |
| 5935716 | McCurdy | Aug 1999 | A |
| 5939188 | Moncur | Aug 1999 | A |
| 5939194 | Hashimoto | Aug 1999 | A |
| 5939201 | Boire | Aug 1999 | A |
| 5948538 | Brochot | Sep 1999 | A |
| 5961843 | Hayakawa | Oct 1999 | A |
| 5962115 | Zmelty | Oct 1999 | A |
| 5965246 | Guiselin | Oct 1999 | A |
| 5968328 | Teschner | Oct 1999 | A |
| 5972184 | Hollars | Oct 1999 | A |
| 5981426 | Langford | Nov 1999 | A |
| 5993734 | Snowman | Nov 1999 | A |
| 6013372 | Hayakawa | Jan 2000 | A |
| 6027766 | Greenberg | Feb 2000 | A |
| 6037289 | Chopin | Mar 2000 | A |
| 6040939 | Demiryont | Mar 2000 | A |
| 6045903 | Seino | Apr 2000 | A |
| 6046403 | Yoshikawa | Apr 2000 | A |
| 6054024 | Toyama | Apr 2000 | A |
| 6054227 | Greenberg | Apr 2000 | A |
| 6068914 | Boire | May 2000 | A |
| 6071606 | Yamazaki | Jun 2000 | A |
| 6071623 | Sugawara | Jun 2000 | A |
| 6074981 | Tada | Jun 2000 | A |
| 6077482 | Kanno | Jun 2000 | A |
| 6077492 | Anpo | Jun 2000 | A |
| 6090489 | Hayakawa | Jul 2000 | A |
| 6103363 | Boire | Aug 2000 | A |
| 6114043 | Joret | Sep 2000 | A |
| 6120747 | Sugishima | Sep 2000 | A |
| 6124044 | Swidler | Sep 2000 | A |
| 6139803 | Watanabe | Oct 2000 | A |
| 6139968 | Knapp | Oct 2000 | A |
| 6153067 | Maishev | Nov 2000 | A |
| 6154311 | Simmons | Nov 2000 | A |
| 6156171 | Hollars | Dec 2000 | A |
| 6156409 | Doushita | Dec 2000 | A |
| 6165256 | Hayakawa | Dec 2000 | A |
| 6165598 | Nelson | Dec 2000 | A |
| 6165616 | Lemelson | Dec 2000 | A |
| 6171659 | Vanden Brande | Jan 2001 | B1 |
| 6179971 | Kittrell | Jan 2001 | B1 |
| 6179972 | Kittrell | Jan 2001 | B1 |
| 6191062 | Hayakawa | Feb 2001 | B1 |
| 6193378 | Tonar | Feb 2001 | B1 |
| 6193856 | Kida | Feb 2001 | B1 |
| 6194346 | Tada | Feb 2001 | B1 |
| 6197101 | Matsumura | Mar 2001 | B1 |
| 6210750 | Cho | Apr 2001 | B1 |
| 6210779 | Watanabe | Apr 2001 | B1 |
| 6228480 | Kimura | May 2001 | B1 |
| 6228502 | Saitoh | May 2001 | B1 |
| 6238738 | McCurdy | May 2001 | B1 |
| 6242752 | Soma | Jun 2001 | B1 |
| 6248397 | Ye | Jun 2001 | B1 |
| 6261693 | Veerasamy | Jul 2001 | B1 |
| 6270633 | Onaka | Aug 2001 | B1 |
| 6274244 | Finley | Aug 2001 | B1 |
| 6299981 | Azzopardi | Oct 2001 | B1 |
| 6319326 | Koh | Nov 2001 | B1 |
| 6326079 | Philippe | Dec 2001 | B1 |
| 6329060 | Barkac | Dec 2001 | B1 |
| 6329925 | Skiver | Dec 2001 | B1 |
| 6333084 | Woodard | Dec 2001 | B1 |
| 6334938 | Kida | Jan 2002 | B2 |
| 6335479 | Yamada | Jan 2002 | B1 |
| 6336998 | Wang | Jan 2002 | B1 |
| 6337124 | Anderson | Jan 2002 | B1 |
| 6346174 | Finley | Feb 2002 | B1 |
| 6350397 | Heikkila | Feb 2002 | B1 |
| 6352755 | Finley | Mar 2002 | B1 |
| 6354109 | Boire | Mar 2002 | B1 |
| 6362121 | Chopin | Mar 2002 | B1 |
| 6365010 | Hollars | Apr 2002 | B1 |
| 6365014 | Finley | Apr 2002 | B2 |
| 6368664 | Veerasamy | Apr 2002 | B1 |
| 6368668 | Kobayashi | Apr 2002 | B1 |
| 6379746 | Birch | Apr 2002 | B1 |
| 6379776 | Tada | Apr 2002 | B1 |
| 6387844 | Fujishima | May 2002 | B1 |
| 6403686 | Pickett | Jun 2002 | B1 |
| 6413581 | Greenberg | Jul 2002 | B1 |
| 6414213 | Ohmori | Jul 2002 | B2 |
| 6419800 | Anzaki | Jul 2002 | B2 |
| 6425670 | Komatsu | Jul 2002 | B1 |
| 6428172 | Hutzel | Aug 2002 | B1 |
| 6436542 | Ogino | Aug 2002 | B1 |
| 6440278 | Kida | Aug 2002 | B1 |
| 6447123 | Tonar | Sep 2002 | B2 |
| 6451178 | Szczyrbowski | Sep 2002 | B2 |
| 6461686 | Vanderstraeten | Oct 2002 | B1 |
| 6464951 | Kittrell | Oct 2002 | B1 |
| 6465088 | Talpaert | Oct 2002 | B1 |
| 6468402 | Vanderstraeten | Oct 2002 | B1 |
| 6468403 | Shimizu | Oct 2002 | B1 |
| 6468428 | Nishii | Oct 2002 | B1 |
| 6488824 | Hollars | Dec 2002 | B1 |
| 6500690 | Yamagishi | Dec 2002 | B1 |
| 6501387 | Skiver | Dec 2002 | B2 |
| 6511587 | Vanderstraeten | Jan 2003 | B2 |
| 6570709 | Katayama | May 2003 | B2 |
| 6576344 | Doushita | Jun 2003 | B1 |
| 6582839 | Yamamoto | Jun 2003 | B1 |
| 6596664 | Kittrell | Jul 2003 | B2 |
| 6635155 | Miyamura | Oct 2003 | B2 |
| 6660365 | Krisko | Dec 2003 | B1 |
| 6673738 | Ueda | Jan 2004 | B2 |
| 6677063 | Finley | Jan 2004 | B2 |
| 6679978 | Johnson | Jan 2004 | B2 |
| 6680135 | Boire | Jan 2004 | B2 |
| 6682773 | Medwick | Jan 2004 | B2 |
| 6716323 | Siddle | Apr 2004 | B1 |
| 6720066 | Talpaert | Apr 2004 | B2 |
| 6722159 | Greenberg | Apr 2004 | B2 |
| 6730630 | Okusako | May 2004 | B2 |
| 6733889 | Varanasi | May 2004 | B2 |
| 6743343 | Kida | Jun 2004 | B2 |
| 6743749 | Morikawa | Jun 2004 | B2 |
| 6761984 | Anzaki | Jul 2004 | B2 |
| 6770321 | Hukari | Aug 2004 | B2 |
| 6777030 | Veerasamy | Aug 2004 | B2 |
| 6777091 | Kijima | Aug 2004 | B2 |
| 6781738 | Kikuchi | Aug 2004 | B2 |
| 6787199 | Anpo | Sep 2004 | B2 |
| 6789906 | Tonar | Sep 2004 | B2 |
| 6794065 | Morikawa | Sep 2004 | B1 |
| 6800182 | Mitsui | Oct 2004 | B2 |
| 6800183 | Takahashi | Oct 2004 | B2 |
| 6800354 | Baumann | Oct 2004 | B2 |
| 6804048 | MacQuart | Oct 2004 | B2 |
| 6811856 | Nun | Nov 2004 | B2 |
| 6818309 | Talpaert | Nov 2004 | B1 |
| 6829084 | Takaki | Dec 2004 | B2 |
| 6830785 | Hayakawa | Dec 2004 | B1 |
| 6833089 | Kawahara | Dec 2004 | B1 |
| 6835688 | Morikawa | Dec 2004 | B2 |
| 6840061 | Hurst | Jan 2005 | B1 |
| 6846556 | Boire | Jan 2005 | B2 |
| 6869644 | Buhay | Mar 2005 | B2 |
| 6870657 | Fitzmaurice | Mar 2005 | B1 |
| 6872441 | Baumann | Mar 2005 | B2 |
| 6875319 | Nadaud | Apr 2005 | B2 |
| 6878242 | Wang | Apr 2005 | B2 |
| 6878450 | Anpo | Apr 2005 | B2 |
| 6881701 | Jacobs | Apr 2005 | B2 |
| 6890656 | Iacovangelo | May 2005 | B2 |
| 6908698 | Yoshida | Jun 2005 | B2 |
| 6908881 | Sugihara | Jun 2005 | B1 |
| 6916542 | Buhay | Jul 2005 | B2 |
| 6921579 | O'Ohaughnessy | Jul 2005 | B2 |
| 6929862 | Hurst | Aug 2005 | B2 |
| 6939611 | Fujishima | Sep 2005 | B2 |
| 6952299 | Fukazawa | Oct 2005 | B1 |
| 6954240 | Hamamoto | Oct 2005 | B2 |
| 6962759 | Buhay | Nov 2005 | B2 |
| 6964731 | Krisko | Nov 2005 | B1 |
| 6974629 | Krisko | Dec 2005 | B1 |
| 6997570 | Nakaho | Feb 2006 | B2 |
| 7005188 | Anderson | Feb 2006 | B2 |
| 7005189 | Tachibana | Feb 2006 | B1 |
| 7011691 | Abe | Mar 2006 | B2 |
| 7022416 | Teranishi | Apr 2006 | B2 |
| 7049002 | Greenberg | May 2006 | B2 |
| 7052585 | Veerasamy | May 2006 | B2 |
| 7060643 | Sanbayashi | Jun 2006 | B2 |
| 7096692 | Greenberg | Aug 2006 | B2 |
| 7118936 | Kobayashi | Oct 2006 | B2 |
| 7138181 | McCurdy | Nov 2006 | B2 |
| 7157840 | Fujishima | Jan 2007 | B2 |
| 7175911 | Zhou | Feb 2007 | B2 |
| 7179527 | Sato | Feb 2007 | B2 |
| 7195821 | Tixhon | Mar 2007 | B2 |
| 7198699 | Thomsen | Apr 2007 | B2 |
| 7211513 | Remington, Jr. | May 2007 | B2 |
| 7211543 | Nakabayashi | May 2007 | B2 |
| 7223523 | Boykin | May 2007 | B2 |
| 7232615 | Buhay | Jun 2007 | B2 |
| 7255831 | Wei | Aug 2007 | B2 |
| 7261942 | Andrews | Aug 2007 | B2 |
| 7264741 | Hartig | Sep 2007 | B2 |
| 7294365 | Hayakawa | Nov 2007 | B2 |
| 7294404 | Krisko | Nov 2007 | B2 |
| 7300634 | Yaniv | Nov 2007 | B2 |
| 7309405 | Cho | Dec 2007 | B2 |
| 7309664 | Marzolin | Dec 2007 | B1 |
| 7311961 | Finley | Dec 2007 | B2 |
| 7320827 | Fujisawa | Jan 2008 | B2 |
| 7323249 | Athey | Jan 2008 | B2 |
| 7348054 | Jacquiod | Mar 2008 | B2 |
| 7354624 | Millero | Apr 2008 | B2 |
| 7361963 | Ikadai | Apr 2008 | B2 |
| 7387839 | Gueneau | Jun 2008 | B2 |
| 7534466 | Hartig | May 2009 | B2 |
| 7604865 | Krisko | Oct 2009 | B2 |
| 7713632 | Krisko | May 2010 | B2 |
| 20010007715 | Toyoshima | Jul 2001 | A1 |
| 20010016262 | Toyoshima | Aug 2001 | A1 |
| 20010030808 | Komatsu | Oct 2001 | A1 |
| 20020012779 | Miyashita | Jan 2002 | A1 |
| 20020014634 | Koyama | Feb 2002 | A1 |
| 20020016250 | Hayakawa | Feb 2002 | A1 |
| 20020028361 | Boire | Mar 2002 | A1 |
| 20020045073 | Finley | Apr 2002 | A1 |
| 20020046945 | Hosokawa | Apr 2002 | A1 |
| 20020071956 | Boire | Jun 2002 | A1 |
| 20020102352 | Hartig | Aug 2002 | A1 |
| 20020110638 | Boire | Aug 2002 | A1 |
| 20020119307 | Boire | Aug 2002 | A1 |
| 20020155265 | Choi | Oct 2002 | A1 |
| 20020155299 | Harris | Oct 2002 | A1 |
| 20020172775 | Buhay | Nov 2002 | A1 |
| 20020189938 | Baldwin | Dec 2002 | A1 |
| 20030038028 | Schultheis | Feb 2003 | A1 |
| 20030039843 | Johnson | Feb 2003 | A1 |
| 20030043464 | Dannenberg | Mar 2003 | A1 |
| 20030048538 | Tonar | Mar 2003 | A1 |
| 20030054177 | Jin | Mar 2003 | A1 |
| 20030064231 | Hurst | Apr 2003 | A1 |
| 20030096701 | Fujishima | May 2003 | A1 |
| 20030143437 | Ohtsu | Jul 2003 | A1 |
| 20030152780 | Baumann | Aug 2003 | A1 |
| 20030180547 | Buhay | Sep 2003 | A1 |
| 20030186089 | Kikuchi | Oct 2003 | A1 |
| 20030207028 | Boire | Nov 2003 | A1 |
| 20030215647 | Yoshida | Nov 2003 | A1 |
| 20030224620 | Kools | Dec 2003 | A1 |
| 20030235695 | Greenberg | Dec 2003 | A1 |
| 20030235720 | Athey | Dec 2003 | A1 |
| 20040005466 | Arai | Jan 2004 | A1 |
| 20040009356 | Medwick | Jan 2004 | A1 |
| 20040020761 | Thomsen | Feb 2004 | A1 |
| 20040032655 | Kikuchi | Feb 2004 | A1 |
| 20040043260 | Nadaud | Mar 2004 | A1 |
| 20040063320 | Hollars | Apr 2004 | A1 |
| 20040069623 | Vanderstraeten | Apr 2004 | A1 |
| 20040115362 | Hartig | Jun 2004 | A1 |
| 20040140198 | Cho | Jul 2004 | A1 |
| 20040146721 | Hartig | Jul 2004 | A1 |
| 20040149307 | Hartig | Aug 2004 | A1 |
| 20040163945 | Hartig | Aug 2004 | A1 |
| 20040179978 | Kobayashi | Sep 2004 | A1 |
| 20040180216 | Veerasamy | Sep 2004 | A1 |
| 20040180220 | Gueneau | Sep 2004 | A1 |
| 20040196580 | Nakaho | Oct 2004 | A1 |
| 20040202890 | Kutilek | Oct 2004 | A1 |
| 20040206024 | Graf | Oct 2004 | A1 |
| 20040214010 | Murata | Oct 2004 | A1 |
| 20040216487 | Boire | Nov 2004 | A1 |
| 20040219348 | Jacquiod | Nov 2004 | A1 |
| 20040241040 | Wei | Dec 2004 | A1 |
| 20040241490 | Finley | Dec 2004 | A1 |
| 20040247901 | Suzuki | Dec 2004 | A1 |
| 20040248725 | Hiraoka | Dec 2004 | A1 |
| 20040253382 | De Bosscher | Dec 2004 | A1 |
| 20040253471 | Thiel | Dec 2004 | A1 |
| 20050003672 | Kools | Jan 2005 | A1 |
| 20050016835 | Krisko | Jan 2005 | A1 |
| 20050019505 | Hamamoto | Jan 2005 | A1 |
| 20050019700 | Hayakawa | Jan 2005 | A1 |
| 20050020444 | Hiraoka | Jan 2005 | A1 |
| 20050025982 | Krisko | Feb 2005 | A1 |
| 20050031876 | Lu | Feb 2005 | A1 |
| 20050042375 | Minami | Feb 2005 | A1 |
| 20050044894 | Nelson | Mar 2005 | A1 |
| 20050051422 | Rietzel | Mar 2005 | A1 |
| 20050084688 | Garrec | Apr 2005 | A1 |
| 20050106397 | Krisko | May 2005 | A1 |
| 20050137084 | Krisko | Jun 2005 | A1 |
| 20050191505 | Akarsu | Sep 2005 | A1 |
| 20050191522 | Anzaki | Sep 2005 | A1 |
| 20050221098 | Azzopardi | Oct 2005 | A1 |
| 20050227008 | Okada | Oct 2005 | A1 |
| 20050233893 | Sakatani | Oct 2005 | A1 |
| 20050233899 | Anzaki | Oct 2005 | A1 |
| 20050238861 | Buhay | Oct 2005 | A1 |
| 20050244678 | Arfsten | Nov 2005 | A1 |
| 20050245382 | Iwahashi | Nov 2005 | A1 |
| 20050245383 | Iwahashi | Nov 2005 | A1 |
| 20050247555 | Thiel | Nov 2005 | A1 |
| 20050248824 | Fukazawa | Nov 2005 | A1 |
| 20050252108 | Sanderson | Nov 2005 | A1 |
| 20050258030 | Finley | Nov 2005 | A1 |
| 20050266248 | Millero | Dec 2005 | A1 |
| 20050272590 | Iwahashi | Dec 2005 | A1 |
| 20060003545 | Veerasamy | Jan 2006 | A1 |
| 20060011945 | Spitzer-Keller | Jan 2006 | A1 |
| 20060014027 | Oudard | Jan 2006 | A1 |
| 20060014050 | Gueneau | Jan 2006 | A1 |
| 20060019104 | Hurst | Jan 2006 | A1 |
| 20060029813 | Kutilek | Feb 2006 | A1 |
| 20060031681 | Smith | Feb 2006 | A1 |
| 20060032739 | Ikeda | Feb 2006 | A1 |
| 20060051597 | Anzaki | Mar 2006 | A1 |
| 20060055513 | French | Mar 2006 | A1 |
| 20060057298 | Krisko | Mar 2006 | A1 |
| 20060057401 | Krisko | Mar 2006 | A1 |
| 20060070869 | Krisko | Apr 2006 | A1 |
| 20060090996 | Yaniv | May 2006 | A1 |
| 20060102465 | Blondeel | May 2006 | A1 |
| 20060105103 | Hartig | May 2006 | A1 |
| 20060107599 | Luten | May 2006 | A1 |
| 20060110605 | Luten | May 2006 | A1 |
| 20060118406 | Delahoy | Jun 2006 | A1 |
| 20060121315 | Myli | Jun 2006 | A1 |
| 20060127604 | Ikadai | Jun 2006 | A1 |
| 20060134322 | Harris | Jun 2006 | A1 |
| 20060134436 | Maschwitz | Jun 2006 | A1 |
| 20060141290 | Sheel | Jun 2006 | A1 |
| 20060152832 | Aumercier | Jul 2006 | A1 |
| 20060159906 | Messere | Jul 2006 | A1 |
| 20060165996 | Veerasamy | Jul 2006 | A1 |
| 20060194066 | Ye | Aug 2006 | A1 |
| 20060196765 | Cheng | Sep 2006 | A1 |
| 20060201203 | Labrousse | Sep 2006 | A1 |
| 20060210783 | Seder | Sep 2006 | A1 |
| 20060210810 | Harris | Sep 2006 | A1 |
| 20060225999 | Fukawa | Oct 2006 | A1 |
| 20060228476 | McCurdy | Oct 2006 | A1 |
| 20060234064 | Baubet | Oct 2006 | A1 |
| 20060247125 | Choi | Nov 2006 | A1 |
| 20060263610 | Greenberg | Nov 2006 | A1 |
| 20060275612 | Baubet | Dec 2006 | A1 |
| 20070025000 | Lin | Feb 2007 | A1 |
| 20070029187 | Krasnov | Feb 2007 | A1 |
| 20070029527 | Mills | Feb 2007 | A1 |
| 20070030569 | Lu | Feb 2007 | A1 |
| 20070031593 | Krasnov | Feb 2007 | A1 |
| 20070031681 | Anzaki | Feb 2007 | A1 |
| 20070031682 | Krasnov | Feb 2007 | A1 |
| 20070042893 | Koike | Feb 2007 | A1 |
| 20070065670 | Varaprasad | Mar 2007 | A1 |
| 20070077406 | Jacobs | Apr 2007 | A1 |
| 20070087187 | Lu | Apr 2007 | A1 |
| 20070092734 | Durandeau | Apr 2007 | A1 |
| 20070108043 | Lu | May 2007 | A1 |
| 20070109543 | Hoffman | May 2007 | A1 |
| 20070111012 | Rimmer | May 2007 | A1 |
| 20070116966 | Mellott | May 2007 | A1 |
| 20070116967 | Medwick | May 2007 | A1 |
| 20070129248 | Labrousse | Jun 2007 | A1 |
| 20070134501 | McMaster | Jun 2007 | A1 |
| 20070137673 | Boykin | Jun 2007 | A1 |
| 20070148064 | Labrousse | Jun 2007 | A1 |
| 20070184291 | Harris | Aug 2007 | A1 |
| 20070196563 | Wuwen | Aug 2007 | A1 |
| 20070218264 | Gueneau | Sep 2007 | A1 |
| 20070218265 | Harris | Sep 2007 | A1 |
| 20070218311 | O'Shaughnessy | Sep 2007 | A1 |
| 20070224357 | Buhay | Sep 2007 | A1 |
| 20070231501 | Finley | Oct 2007 | A1 |
| 20070237968 | Kijima | Oct 2007 | A1 |
| 20070254163 | Veerasamy | Nov 2007 | A1 |
| 20070254164 | Veerasamy | Nov 2007 | A1 |
| 20070264494 | Krisko | Nov 2007 | A1 |
| 20070275252 | Krasnov | Nov 2007 | A1 |
| 20070275253 | Thiel | Nov 2007 | A1 |
| 20080011408 | Maschwitz | Jan 2008 | A1 |
| 20080014349 | Otani | Jan 2008 | A1 |
| 20080026161 | Frings | Jan 2008 | A1 |
| 20080115471 | Labrousse | May 2008 | A1 |
| 20080119352 | Kitaguchi | May 2008 | A1 |
| 20080124460 | Athey | May 2008 | A1 |
| 20080188370 | Vormberg | Aug 2008 | A1 |
| Number | Date | Country |
|---|---|---|
| 2290999 | May 1998 | CA |
| 39 06 453 | Sep 1990 | DE |
| 43 13 284 | Oct 1994 | DE |
| 19736925 | Mar 1998 | DE |
| 19644752 | Apr 1998 | DE |
| 19831610 | Jan 1999 | DE |
| 10100221 | Jul 2001 | DE |
| 10100223 | Jul 2001 | DE |
| 0 207 646 | Jan 1987 | EP |
| 0 207 646 | Feb 1992 | EP |
| 0 470 379 | Feb 1992 | EP |
| 0 470 379 | Feb 1992 | EP |
| 0 279 550 | Apr 1993 | EP |
| 0 369 581 | Dec 1993 | EP |
| 0 369 581 | Dec 1993 | EP |
| 0 574 119 | Dec 1993 | EP |
| 0 590 477 | Apr 1994 | EP |
| 0 601 928 | Jun 1994 | EP |
| 0 611 733 | Aug 1994 | EP |
| 0 515 847 | Feb 1995 | EP |
| 0 515 847 | Feb 1995 | EP |
| 0 636 702 | Feb 1995 | EP |
| 0 637 572 | Feb 1995 | EP |
| 0 639 655 | Feb 1995 | EP |
| 0 657 562 | Jun 1995 | EP |
| 0 689 096 | Dec 1995 | EP |
| 0 689 096 | Dec 1995 | EP |
| 0 689 962 | Jan 1996 | EP |
| 0 689 962 | Jan 1996 | EP |
| 0 737 513 | Oct 1996 | EP |
| 0 328 257 | Apr 1997 | EP |
| 0 328 257 | Apr 1997 | EP |
| 0 787 696 | Aug 1997 | EP |
| 0 820 967 | Jan 1998 | EP |
| 0 820 967 | Jan 1998 | EP |
| 0 771 766 | Sep 1998 | EP |
| 0 870 530 | Oct 1998 | EP |
| 0 753 882 | Nov 1998 | EP |
| 0 884 288 | Dec 1998 | EP |
| 0 799 255 | Feb 1999 | EP |
| 0 901 991 | Mar 1999 | EP |
| 0 345 045 | Jan 2000 | EP |
| 0 838 535 | Feb 2000 | EP |
| 0 850 203 | Jan 2001 | EP |
| 1 066 878 | Jan 2001 | EP |
| 0 850 204 | Dec 2001 | EP |
| 1 179 515 | Feb 2002 | EP |
| 0 944 557 | Nov 2002 | EP |
| 1 254 870 | Nov 2002 | EP |
| 0 737 513 | Sep 2003 | EP |
| 0 887 104 | Nov 2003 | EP |
| 1 046 727 | Nov 2003 | EP |
| 1 375 444 | Jan 2004 | EP |
| 1 411 386 | Apr 2004 | EP |
| 1 074 525 | Sep 2004 | EP |
| 1 466 665 | Oct 2004 | EP |
| 1 466 665 | Oct 2004 | EP |
| 1 500 634 | Jan 2005 | EP |
| 1 518 836 | Mar 2005 | EP |
| 1 640 149 | Mar 2006 | EP |
| 0 816 466 | May 2006 | EP |
| 1 506 143 | May 2006 | EP |
| 2699164 | Feb 1995 | FR |
| 2738812 | Mar 1997 | FR |
| 2738813 | Mar 1997 | FR |
| 2738836 | Mar 1997 | FR |
| 2800731 | May 2001 | FR |
| 2814094 | Mar 2002 | FR |
| 2838734 | Oct 2003 | FR |
| 2838735 | Oct 2003 | FR |
| 2857885 | Jan 2005 | FR |
| 2861385 | Apr 2005 | FR |
| 2861386 | Apr 2005 | FR |
| 2869897 | Nov 2005 | FR |
| 2884147 | Oct 2006 | FR |
| 0232680 | Apr 1925 | GB |
| 1231280 | May 1971 | GB |
| 1426906 | Mar 1976 | GB |
| 1438462 | Jun 1976 | GB |
| 2028376 | Mar 1980 | GB |
| 1595061 | Aug 1981 | GB |
| 2201428 | Feb 1988 | GB |
| 2302102 | Jan 1997 | GB |
| 2316687 | Aug 1997 | GB |
| 2327428 | Jul 1998 | GB |
| 57-140339 | Aug 1982 | JP |
| 57-140339 | Aug 1982 | JP |
| 60-081048 | May 1985 | JP |
| 60081048 | May 1985 | JP |
| 61-091042 | May 1986 | JP |
| 61-091042 | May 1986 | JP |
| 62-161945 | Jul 1987 | JP |
| 62-161945 | Jul 1987 | JP |
| 01-014129 | Jan 1989 | JP |
| 01-014129 | Jan 1989 | JP |
| 01-118807 | May 1989 | JP |
| 01-118807 | May 1989 | JP |
| 3-122274 | May 1991 | JP |
| 3-122274 | May 1991 | JP |
| 3-187039 | Aug 1991 | JP |
| 3-187039 | Aug 1991 | JP |
| 3-193872 | Aug 1991 | JP |
| 3-193872 | Aug 1991 | JP |
| 4-276066 | Oct 1992 | JP |
| 5-214525 | Aug 1993 | JP |
| 6-330297 | Nov 1994 | JP |
| 7-149545 | Jun 1995 | JP |
| 7-149545 | Jun 1995 | JP |
| 7-215074 | Aug 1995 | JP |
| 7-215074 | Aug 1995 | JP |
| 7-233469 | Sep 1995 | JP |
| 7-233469 | Sep 1995 | JP |
| 7-508491 | Sep 1995 | JP |
| 7-508491 | Sep 1995 | JP |
| 7-315874 | Dec 1995 | JP |
| 7-315874 | Dec 1995 | JP |
| 7-315889 | Dec 1995 | JP |
| 7-315889 | Dec 1995 | JP |
| 8-011631 | Jan 1996 | JP |
| 8-011631 | Jan 1996 | JP |
| 8-012378 | Jan 1996 | JP |
| 8-012378 | Jan 1996 | JP |
| 8-109043 | Apr 1996 | JP |
| 8-109043 | Apr 1996 | JP |
| 8-134638 | May 1996 | JP |
| 8-134638 | May 1996 | JP |
| 8-158048 | Jun 1996 | JP |
| 8-227006 | Sep 1996 | JP |
| 8-227006 | Sep 1996 | JP |
| 9-189801 | Jul 1997 | JP |
| 9-189801 | Jul 1997 | JP |
| 9-202651 | Aug 1997 | JP |
| 9-202651 | Aug 1997 | JP |
| 9-249967 | Sep 1997 | JP |
| 9-249967 | Sep 1997 | JP |
| 10-36144 | Feb 1998 | JP |
| 10-36144 | Feb 1998 | JP |
| 10-048805 | Feb 1998 | JP |
| 10-048805 | Feb 1998 | JP |
| 10-278165 | Oct 1998 | JP |
| 11-095014 | Apr 1999 | JP |
| 11-095014 | Apr 1999 | JP |
| 11-302038 | Nov 1999 | JP |
| 2000-094569 | Apr 2000 | JP |
| 2003-311157 | Nov 2003 | JP |
| 2005-213585 | Aug 2005 | JP |
| 2006-305527 | Nov 2006 | JP |
| WO 8706626 | Nov 1987 | WO |
| WO 8910430 | Nov 1989 | WO |
| WO 9217621 | Oct 1992 | WO |
| WO 9217621 | Oct 1992 | WO |
| WO 9625534 | Aug 1996 | WO |
| WO 9703763 | Feb 1997 | WO |
| WO 9707066 | Feb 1997 | WO |
| WO 9707069 | Feb 1997 | WO |
| WO 9708359 | Mar 1997 | WO |
| WO 9710185 | Mar 1997 | WO |
| WO 9710186 | Mar 1997 | WO |
| WO 9711916 | Apr 1997 | WO |
| WO 9715499 | May 1997 | WO |
| WO 9725201 | Jul 1997 | WO |
| WO 9737801 | Oct 1997 | WO |
| WO 9737946 | Oct 1997 | WO |
| WO 9742351 | Nov 1997 | WO |
| WO 9742357 | Nov 1997 | WO |
| WO 9806675 | Feb 1998 | WO |
| WO 9823549 | Jun 1998 | WO |
| WO 9825700 | Jun 1998 | WO |
| WO 9911896 | Mar 1999 | WO |
| WO 9944954 | Sep 1999 | WO |
| WO 0013257 | Mar 2000 | WO |
| WO 0015571 | Mar 2000 | WO |
| WO 0027771 | May 2000 | WO |
| WO 0037376 | Jun 2000 | WO |
| WO 0037377 | Jun 2000 | WO |
| WO 0040402 | Jul 2000 | WO |
| WO 0050354 | Aug 2000 | WO |
| WO 0075083 | Dec 2000 | WO |
| WO 0075087 | Dec 2000 | WO |
| WO 0102496 | Jan 2001 | WO |
| WO 0132578 | May 2001 | WO |
| WO 0168786 | Sep 2001 | WO |
| WO 0171055 | Sep 2001 | WO |
| WO 03012540 | Feb 2002 | WO |
| WO 02024971 | Mar 2002 | WO |
| WO 0240417 | May 2002 | WO |
| WO 0249980 | Jun 2002 | WO |
| WO 02085809 | Oct 2002 | WO |
| WO 03009061 | Jan 2003 | WO |
| WO 03006393 | Jan 2003 | WO |
| WO 03050056 | Jun 2003 | WO |
| WO 03053577 | Jul 2003 | WO |
| WO 03062166 | Jul 2003 | WO |
| WO 03068500 | Aug 2003 | WO |
| WO 03072849 | Sep 2003 | WO |
| WO 03080530 | Oct 2003 | WO |
| WO 03087002 | Oct 2003 | WO |
| WO 03087005 | Oct 2003 | WO |
| WO 03091471 | Nov 2003 | WO |
| WO 03093188 | Nov 2003 | WO |
| WO 03095385 | Nov 2003 | WO |
| WO 03095695 | Nov 2003 | WO |
| WO 03097549 | Nov 2003 | WO |
| WO 03106732 | Dec 2003 | WO |
| 2006017311 | Feb 2004 | WO |
| WO 2004013376 | Feb 2004 | WO |
| WO 2004034105 | Apr 2004 | WO |
| WO 2004061151 | Jul 2004 | WO |
| WO 2004067464 | Aug 2004 | WO |
| WO 2004085699 | Oct 2004 | WO |
| WO 2004085701 | Oct 2004 | WO |
| WO 2004086104 | Oct 2004 | WO |
| WO 2004087985 | Oct 2004 | WO |
| WO 2004089836 | Oct 2004 | WO |
| WO 2004089838 | Oct 2004 | WO |
| WO 2004089839 | Oct 2004 | WO |
| WO 2004092088 | Oct 2004 | WO |
| WO 2004092089 | Oct 2004 | WO |
| WO 2004097063 | Nov 2004 | WO |
| WO 2004108618 | Dec 2004 | WO |
| WO 2004108619 | Dec 2004 | WO |
| WO 2004108846 | Dec 2004 | WO |
| WO 2004113064 | Dec 2004 | WO |
| WO 2005000758 | Jan 2005 | WO |
| WO 2005000759 | Jan 2005 | WO |
| WO 2005005337 | Jan 2005 | WO |
| WO 2005007286 | Jan 2005 | WO |
| WO 2005009914 | Feb 2005 | WO |
| WO 2005012593 | Feb 2005 | WO |
| WO 2005023723 | Mar 2005 | WO |
| WO 2005040056 | May 2005 | WO |
| WO 2005040058 | May 2005 | WO |
| WO 2005063646 | Jul 2005 | WO |
| WO 2005102952 | Nov 2005 | WO |
| WO 2005102953 | Nov 2005 | WO |
| WO 2005110937 | Nov 2005 | WO |
| WO 2005111257 | Nov 2005 | WO |
| WO 2006004169 | Jan 2006 | WO |
| WO 2006007062 | Jan 2006 | WO |
| WO 2006017311 | Feb 2006 | WO |
| WO 2006017349 | Feb 2006 | WO |
| WO 2006019995 | Feb 2006 | WO |
| WO 2006020477 | Feb 2006 | WO |
| WO 2006028729 | Mar 2006 | WO |
| WO 2006036605 | Apr 2006 | WO |
| WO 2006054954 | May 2006 | WO |
| WO 2006055513 | May 2006 | WO |
| WO 2006057830 | Jun 2006 | WO |
| WO 2006062902 | Jun 2006 | WO |
| WO 2006064059 | Jun 2006 | WO |
| WO 2006064060 | Jun 2006 | WO |
| WO 2006066101 | Jun 2006 | WO |
| WO 2006077839 | Jul 2006 | WO |
| WO 2006089964 | Aug 2006 | WO |
| WO 2006101994 | Sep 2006 | WO |
| WO 2006108985 | Oct 2006 | WO |
| WO 2006117345 | Nov 2006 | WO |
| WO 2006134335 | Dec 2006 | WO |
| WO 2007016127 | Feb 2007 | WO |
| WO 2007018974 | Feb 2007 | WO |
| WO 2007018975 | Feb 2007 | WO |
| WO 2007045805 | Apr 2007 | WO |
| WO 2007080428 | Jul 2007 | WO |
| WO 2007092511 | Aug 2007 | WO |
| WO 2007093823 | Aug 2007 | WO |
| WO 2007096461 | Aug 2007 | WO |
| WO 2007110482 | Oct 2007 | WO |
| WO 2007121211 | Oct 2007 | WO |
| WO 2007121215 | Oct 2007 | WO |
| WO 2007127060 | Nov 2007 | WO |
| WO 2007130140 | Nov 2007 | WO |
| Entry |
|---|
| Anderson et al., “An Improved Photocatalyst of TiO2/SiO2 prepared by a Sol-Gel Synthesis”, J. Phys. Chem., 1995, 99, 9882-9885. |
| Anderson et al., “Improved Photocatalytic Activity and Characterization of Mixed TiO2/SiO2 and TiO2/Al2O3 Materials”, J. Phys. Chem., 1997, 101, 2611-2616. |
| Ang et al., “Deposition of high stability thin film ternary alloy resistors by sputtering,” In: International conf. on Vacuum Metallurgy, 4th, Tokyo, Japan Jun. 4-8, 1973. |
| U.S. Appl. No. 11/273,979 Non Final Office Action mailed Jun. 16, 2008, 9 pgs. |
| U.S. Appl. No. 11/273,979 Response to Non Final Office Action filed Dec. 16, 2008, 15 pgs. |
| Bell et al., “Electrochromism in sol-gel deposited TiO2 films,” Proceedings SPIE—The International Society for Optical Engineering, vol. 2255, Apr. 18-22, 1994. |
| Brat et al., “The Influence of Tungsten-10Wt% Titanium Sputtering Target Purity and Density on VLSI Applications,” 2nd ASM International™ Electronic Materials and Processing Congress (Apr. 24-28, 1989, Philadelphia, PA). |
| Chen Wen-mei et al, “The Effect of SiO2 Additive on Super-hydrophilic Property of TiO2- SiO2 Thin Film by Sol-gel Method”, Journal of Wuhan University of Technology-Mater. Sci. Ed. (Sep. 2001), vol. 16, No. 3, 30-33. |
| Creighton, “Non-Selective Tungsten CVD Using Tungsten Hezxacarbonyl,” Sandia National Laboratories, Albuquerque, NM, 1987. |
| de Tacconi et al., “Nanoporous TiO2 and WO3 Films by Anodization of Titanium and Tungsten Substrates: Influence of process Variables on Morphology and Photoelectrochemical Response,” J. Phys. Chem B 2006, 110, pp. 25347-25355. |
| Derwent Abstract 007612002 (Abstract of JP 879697). |
| Diesburg et al., “Low Mobile Ion Contamination From Sputtered High Purity Tungsten,” 12th International Plansee Seminar, 1973, 1989, pp. 371-378. |
| Enesca et al., “Novel Approach of TiO2/WO3 for Water Splitting,” 20th European photovoltaic Solar Energy Conference, Jun. 6-10, 2005, pp. 262-265. |
| Gao et al., “Great Enhancement of Photocatalytic Activity of Nitrogen-Doped Titania by Coupling with Tungsten Ozxide,” J. Phys. Chem B 2006, 110, pp. 14391-14397. |
| Göttsche et al., “Electrochromic mixed Wo3- TiO2 thin films produced by sputtering and the sol-gel technique: a comparison,” Solar Energy Materials and Solar Cells 31 (1993) pp. 415-428. |
| Guan et al, “Enhanced effect and mechanism of SiO2 addition in super-hydrophilic property of TiO2 films” Surf. And Coating Tech 173 (2003) pp. 219-223. |
| Guan, “Hydrophilic property of TiO2/SiO2 mixing films” Trans. Nonferrous Met. Soc. China (2004), vol. 14, No. 2, pp. 251-254. |
| Guan, “Relationship between photocatalytic activity, hydrophilicity and self-cleaning effect of TiO2/SiO2 films” Surf. And Coating Tech 191 (2005) pp. 155-160. |
| Gusev et al., “Sputtering of tungsten, tungsten oxide, and tungsten—carbon mixed layers by deuterium ions in the threshold energy region,” Tech Phys. 44 (9), Sep. 1999, pp. 1123-1127. |
| Hamelmann et al., “Metal oxide/silicon oxide multilayer with smooth interfaces produced by in situ controlled plasma-enhanced MOCVD,” Thin Solid Films 358 (2000), pp. 90-93. |
| Hashimoto et al., “Lifetime of Electrochromism of AmorphousWO3- TiO2 thin Films,” J. Electrochem. Soc., vol. 138, No. 8, Aug. 1991, pp. 2403-2408. |
| Herrera et al., “Synthesis, characterization, and catalytic function of novel highly dispersed tungsten oxide catalysts on mesoporous silica,” J. Catalysis 239 (2006), pp. 200-211. |
| Higashimoto et al., “Photoelectrochemical properties of hybrid WO3TiO2 electrode. Effect of structures of WO3 on charge separation,” Thin Solid Films 503 (2006), pp. 201-206. |
| Hodgson et al., “Photocatalytic Reactor Systems with Tungsten Oxide-Modified Titanium Dioxide for Indoor Air Applications,” 11th Conference on TiO2 Photocatalysis: fundamentals & Applications (Sep. 25-28, 2006, Pittsburgh, PA). |
| Ingo et al., “XPS studies of SiO2- TiO2 powders prepared by sol-gel process”, Appl. Surf. Sci. 1993, 70/71A, pp. 230-234. |
| Irie et al., “Interfacial structure dependence of layered TiO2/Wo3 thin films on the photoinduced hydrophilic property,” Vacuum 74 (2004), pp. 625-629. |
| Jossen et al., “Thermal stability and catalytic activity of flame-made silica-vanadia-tungsten oxide-titania,”, App. Catalysis B: Environmental 69 (2007), pp. 181-188. |
| Kanou, “Application of High Purity W for VLSI Sputtering Targets,” 7th International Tungsten Symposium, Sep. 1996, pp. 410-418. |
| Keller et al., “Photocatalytic oxidation of butyl acetate in vapor phase on TiO2, Pt/TiO2 and WO3/TiO2 catalysts,” Journal of Catalysis 215 (2003), pp. 129-138. |
| Kobayashi et al., “V2 O5-WO3/TiO2-SiO2-SO42−catalysts: Influence of active components and supports on activities in the selective catalytic reduction of NO by NH3 and in the oxidation of SO2” App. Cat. B: Enviro 63. (2006), pp. 104-113. |
| Kobayashi et al., “V2O5−WO3/TiO2−SiO2−SO42−catalysts: Influence of active components and supports on activities in the selective catalytic reduction of NO by NH3 and in the oxidation of SO2,” Applied Catalysis B: Environmental 63 (2006), pp. 104-113. |
| Lassaletta et al., “Spectroscopic Characterization of Quantum-Sized TiO2 Supported on Silica: Influence of Size and TiO2-SiO2 Interface Composition”, J. Phys. Chem., 1995, 99, 484-1490. |
| Lo et al., “Influence of Target Structure on Film Stress in WTI Sputtering,” Mat. Res. Soc. Symp. Proc. vol. 505, 1998, pp. 427-432. |
| Manfred Von Ardenne, “The Effects of Physics and Their Applications,” Verlag Harri Deutsch, Thun and Frankfurt am Main, 1997, 4 pages. |
| Manfred Von Ardenne, “The Effects of Physics and Their Applications,” Verlag Harri Deutsch, Thun and Frankfurt am Main, 1997, 7 pages (English Translation). |
| Matthews et al., “An Adsorption Water Purifier with in Situ Photocatalytic Regeneration”, J. Catal. 1988, 113, pp. 549-555. |
| MikroElektronick—High-rate Sputtering System for Two-Sided Coating (HZS-04). |
| Minero et al., “Role of Adsorption in Photocatalyzed Reactions of Organic Molecules in Aqueous of TiO2 Suspensions”, Langmuir, 1992, 113, pp. 481-486. |
| Miyashita et al., “Spectrum response of the vacuum-deposited SiO2/TiO2 multilayer film with improved photo-catalytic activity”, Journal of Materials Science Letters, 2001, 20, 2137-2140. |
| Miyashita, et al., “Enhanced Effect of Vacuum-deposited SiO2 Overlayer on Photo-induced Hydrophilicity of TiO2 Film”, Journal of Materials Science 36 (2001) p. 3877-3884. |
| Miyauchi et al., “A Highly Hydrophilic Thin Film Under 1 μW/cm2 UV Illumination,” Adv. Mater. 2000, 12, pp. 1923-1927. |
| Nakamura, et al., “Hydrophilic property of SiO2/TiO2 double layer films” Photocatalytic Coatings, Panel Session, pp. 345-350. |
| Niwa et al., Ammoxidation of Toluene Over SiO2-Al2O3 ZrO2-SiO2 and TiO2-SiO2, J. Catal. 1981, 69, pp. 69-76. |
| Novotná, et al., “Photocatalytical TiO2/SiO2—PDMS layers on glass” Photocatalytic Coatings, Panel Session, pp. 383-387. |
| Obee et al., “A Kinetic Study of Photocatalytic Oxidation of VOCs on WO3 Coated Titanium Dioxide,” 11th Conference on TiO2 Photocatalysis: fundamentals & Applications (Sep. 25-28, 2006, Pittsburgh, PA). |
| Ohsaki, et al., “Photocatalytic properties of SnO2/TiO2 multilayers” Photocatalytic Coatings, Panel Session, pp. 369-376. |
| Okimura et al., “Characteristics of rutile TiO2 films prepared by R.F. magnetron sputtering at a low temperature,” Thin Solid Films 281-282 (1996) pp. 427-430. |
| Ramana et al., “Structural Stability and Phase Transitions in WO3 Thin Films,” J. Phys Chem B (2006), pp. 10430-10435. |
| Ramirez-Del-Solar et al., “Effect of the Method of Preparation on the Texture of TiO2-SiO2 Gels”, J. Non-Cryst. Solids 1990, 121, pp. 84-89. |
| Richardson et al., “Tungsten-Vanadium Oxide Sputtered Films for Electrochromic Devices,” http://btech.lbl.gov/papers/42381.pdf. |
| Saeki et al., “The Photoelectrochemical Response of TiO2- Wo3 Mixed Oxide Films Prepared by Thermal Oxidation of Titanium Coated with Tungsten,” J. Electrochem. Soc., vol. 143, No. 7, Jul. 1996, pp. 2226-2229. |
| Salvado et al., “TiO2-SiO2 glasses prepared by the alkoxide route”, J. Non-Cryst. Solids 1992, 147/148, pp. 256-261. |
| Satoh et al., “Sol-gel-derived binary silica glasses with high refractive index”, J. Non-Cryst. Solids 1992, 146, pp. 121-128. |
| Schiller et al., “Influence of Deposition Parameters on the Optical and Structural Properties of TiO2 Films Produced by Reactive D.C. Plasmetron Sputtering,” Thin Solid Films 83 (1981), pp. 239-245. |
| Schintlmeister et al., “Optical Coatings (nb2O5, Ta2O5 and WO3) for LAC-applications Obtained by DC Quaslreactive magnetron Sputtering of Ceramic Sputtering Targets,” 46th Annual Technical Conference Proceedings—Soc. Of Vacuum Coaters, May 3-8, 2003, pp. 296-301. |
| Schraml-Marth et al., “Porous silica gels and TiO2-SiO2 mixed oxides prepared via the sol-gel process: characterization by spectroscopic techniques”, J. Non-Cryst. Solids 1992, 143, pp. 93-111. |
| Schwarz et al., Thermal material spraying—an alternative technique for the production of special purpose sputtering targets—abstract. |
| Shen et al., “A new method to prepare tungsten and nitrogen co-doped titanium dioxide and its excellent photocatalytic activities irradiated by visible light,” 11th Conference on TiO2 Photocatalysis: fundamentals & Applications (Sep. 25-28, 2006, Pittsburgh, PA). |
| Shibata, K., et al., “Acidic Properties of Binary Metal Oxides”, Bull. Chem. Soc. Jpn. 1973, 46, pp. 2985-2988. |
| Shiyanovskaya et al., “Biocomponent WO3/TiO2 Films as Photoelectrodes,” J. Electrochemical Soc. 146 (1999), pp. 243-249. |
| Sinel'nikova et al., “Interaction of a Mixture of Oxides of Tungsten and Silicon With Carbon,” Soviet Powder Metallurgy and Metal Ceramics, vol. 29, No. 3(327), Mar. 1990, pp. 234-236. |
| Song et al., “Efficient degradation of organic pollutant with Wox modified nano TiO2 under visible irradiation,” J. of Photochemistry and Photobiology A: Chemistry 181 (2006), pp. 421-428. |
| Staffler et al, “Advanced Coating Technology Based Upon Sputtering Targets Produced by Powder Metallurgy,” Horizons of Powder Metallurgy Part I, Proceedings of the 1986 International Powder Metallurgy Conference and Exhibition, Jul. 7-11, 1986, pp. 219-222. |
| Stakheev, et al., “XPS and XAES Study of TiO2- Si2 Mixed Oxide System”, J. Phys. Chem. 1993, 97, pp. 5668-5672. |
| Stankova et al., “Thin (0 0 1) tungsten trioxide films grown by laser deposition,” App. Surface Science 247 (2005), pp. 401-405. |
| Stumpp et al, “Manufacturing of Superclean Refractory and Reactive Metals and Alloys in High Vacuum for Advanced Technologies,” 8th ICVM: Special Melting/Refining and Metallurgical Coating Under Vacuum or Controlled Atmosphere, vol. 2, Sep. 1985, pp. 1310-1324. |
| Su et al., “All Solid-State Smart Window of Electrodeposited WO3 and TiO2 Particulate Film With PTREFG Gel Electrolyte,” J. Phys Chem Solids, vol. 59, No. 8, 1998, pp. 1175-1180. |
| “Surface Hardening of Ceramic and Glass Materials,” IBM Technical Disclosure Bulletin, vol. 36, Issue 1 (Jan. 1993), p. 225. |
| “Surface Hardening of Ceramic and Glass Materials,” IBM Technical Disclosure Bulletin, vol. 36, Issue 3 (Mar. 1993), pp. 291-292. |
| Szczyrbowski et al., “Properties of TiO2-Layers Prepared by Medium Frequency and DC Reactive Sputtering,” 1997 Soc. Of Vacuum Coaters (1997), pp. 237-241. |
| Tada et al., “Deactivation of the TiO2 Photocatalyst by Coupling with WO3 and the Electrochemically Assisted High Photocatalytic Activity of WO3,” Langmuir 20 (2004), pp. 4665-4670. |
| Takeuchi, et al., “Preparation of Titanium-Silicon Binary Oxide Thin Film Photocatalysts by an Ionized Cluster Beam Deposition Method. Their Photocatalytic Activity and Photoinduced Super-Hydrophilicity”, J. Phys. Chem. 2003, 107, pp. 14278-14282. |
| Veersamy, et al., “Optical and Electronic Properties of Amorphous Diamond.” Diamond and Related Materials, vol. 2 (1993), pp. 782-787. |
| Wachs et al., “Catalysis science of the solid acidity of model supported tungsten oxide catalysts,” Catalysis Today 116 (2006), pp. 162-168. |
| Wilhartitz et al., “3D-SIMS analysis of ultra high purity molybdenum and tungsten: a characterisation of different manufacturing techniques,” Fresenius J Anal chem. (1995) 353: pp. 524-532. |
| Yamamoto et al., “Characteristics of Tungsten Gate Devices for MOS VLSI's,” Materials Research Society, 1986, pp. 297-311. |
| Yamamoto et al., “Fabrication of Highly Reliable Tungsten Gate MOS VLSI's,” J. Electrochem. Soc., vol. 133, No. 2, Feb. 1986, pp. 401-407. |
| Yamauchi et al., “Development of W-Ti Binary Alloy Sputtering Target and Study of its sputtering Characteristics,” Nippon Tungsten Review, vol. 22 (1989), pp. 55-72. |
| Yoo et al., “Effects of annealing temperature and method on structural and optical properties of TiO2 films prepared by RF magnetron sputtering at room temperature,” App. Surface Science 253 (2007), pp. 3888-3892. |
| Yoon et al., “Growth kinetics and oxidation behavior of WSi2 coating formed by chemical vapor deposition of Si on W substrate,” J. Alloys and Compounds 420 (2006), pp. 199-206. |
| Yu et al., “The grain size and surface hydroxyl content of super-hydrophilic TiO2- SiO2 composite nanometer thin films” J. Mat. Sci. Lett. (2001) 20, pp. 1745-1748. |
| Zanhai et al., “Preparation of W-Ti Sputtering Targets under Inert Atmosphere,” Chinese Journal of Rare Metals, vol. 30, No. 5, 2006, Abstract. |
| Zanhai et al., “Tungsten-Titanium Targets and Manufacturing Technology,” Chinese Journal of Rare Metals, vol. 30, No. 1, 2006, Abstract. |
| Zemen et al., “Self-cleaning and antifogging effects of TiO2 films prepared by radio frequency magnetron sputtering,” J. Vac. Sci. Technol. A, Mar./Apr. 2002, pp. 388-393. |
| International Preliminary Report on Patentability, dated Oct. 22, 2008 for PCT Application No. PCT/US2007/066685, 7 pages. |
| International Search Report and Written Opinion, dated Sep. 1, 2009 for PCT Application No. PCT/US2008/076183, 10 pages. |
| International Search Report and Written Opinion, dated Apr. 17, 2009 for PCT Application No. PCT/US2008/076157, 18 pages. |
| Hans-Joachim Becker et al., “Herstellung and Eigenschaften von Flachgläsern, die mittels Hochvakuum-zerstäubungsverfahrens beschichtet wurden” Magazine Silikattechnik 36 (1985) Issue 5. |
| Hans-Joachin Gläser, “Beschichtung groβflächiger Substratscheiben durch Kathodenzerstaubung” Glastechnische Berichte 56 (1983) No. 9. |
| Ion-Based Methods For Optical Thin Film Deposition (Journal of Material Science; J.P. Marting, 21 (1986) 1-25). |
| Vakuumbeschichtung 5 Anwendungen Teil II, VDI Verlag 1993, ISBN 3-18-401315-4. |
| English-language abstract for JP 2005-213585 (Konica Minolta), (2005). |
| English-language abstract for DE 39 06 453 (Leybold AG), (1990). |
| Spectrum Response of the Vacuum-Deposited SiO2/TiO2 Multilayer Film With Improved Photo-Catalytic Activity, Journal of Materials Science Letters 20, 2001, pp. 2137-2140. |
| Abstract—Japanese Patent Publication 4-276066. |
| Abstract—Japanese Patent Publication 5-214525. |
| Abstract—Japanese Patent Publication 6-330297. |
| Abstract Japanese Patent Publication 08158048A. |
| Number | Date | Country | |
|---|---|---|---|
| 60587210 | Jul 2004 | US | |
| 60659491 | Mar 2005 | US |
| Number | Date | Country | |
|---|---|---|---|
| Parent | 11179852 | Jul 2005 | US |
| Child | 13271776 | US |
