Claims
- 1. A laser system, comprising:
- a laser crystal having an RE-doped MA.sub.2 X.sub.4 crystalline gain medium, where M is a divalent ion; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal,
- wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 2. The laser system of claim 1, wherein M is selected from a group consisting of Mg, Ca, Sr, Ba, Pb, Eu and Yb.
- 3. The laser system of claim 1, wherein A is selected from a group consisting of Al, Ga and In.
- 4. The laser system of claim 1, wherein X is selected from a group consisting of S, Se and Te.
- 5. The laser system of claim 1, wherein RE is selected from a group consisting of Ce.sup.3+, Nd.sup.3+, Pm.sup.3+, Sm.sup.3, Eu.sup.3+, Gd.sup.3+, Tb.sup.3+, Dy.sup.3+, Ho.sup.3+, Tm.sup.3+ and Yb.sup.3+.
- 6. The laser system of claim 1, wherein said pump source comprises a laser diode.
- 7. A laser system, comprising:
- a laser crystal having an RE-doped MA.sub.2 X.sub.4 crystalline gain medium, wherein M is selected from a first group consisting of divalent ions combined with roughly equal portions of monovalent and trivalent ions and a second group consisting of roughly equal portions of monovalent and trivalent ions; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal,
- wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 8. The laser system of claim 7, wherein said monovalent ions are selected from a group consisting of Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+.
- 9. The laser system of claim 7, wherein said trivalent ions are selected from a group consisting of the rare earths and Y.sup.3+.
- 10. The laser system of claim 7, wherein A is selected from a group consisting of Al, Ga and In.
- 11. The laser system of claim 7, wherein X is selected from a group consisting of S, Se and Te.
- 12. The laser system of claim 7, wherein RE is selected from a group consisting of Ce.sup.3+, Nd.sup.3+, Pm.sup.3+, Sm.sup.3+, Eu.sup.3+, Gd.sup.3+, Tb.sup.3+, Dy.sup.3+, Ho.sup.3+, Tm.sup.3+ and Yb.sup.3+.
- 13. The laser system of claim 7, wherein said pump source comprises a laser diode.
- 14. A laser system, comprising:
- a laser crystal having an Dy.sup.3+ -doped MA.sub.2 X.sub.4 crystalline gain medium, where M is a divalent ion; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal.
- 15. The laser system of claim 14, wherein M is selected from a group consisting of Mg, Ca, Sr, Ba, Pb, Eu and Yb.
- 16. The laser system of claim 14, wherein A is selected from a group consisting of Al, Ga and In.
- 17. The laser system of claim 14, wherein X is selected from a group consisting of S, Se and Te.
- 18. The laser system of claim 14, wherein said pump source is selected from a group consisting of a laser diode and an Nd:YAG laser operating at 1.3 microns.
- 19. The laser system of claim 14, wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 20. The laser system of claim 14, wherein said laser system is configured to emit laser light at about 4.3 microns.
- 21. A laser system, comprising:
- a laser crystal having an Dy.sup.3+ -doped MA.sub.2 X.sub.4 crystalline gain medium, wherein M is selected from a first group consisting of divalent ions combined with roughly equal portions of monovalent and trivalent ions and a second group consisting of roughly equal portions of monovalent and trivalent ions; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal.
- 22. The laser system of claim 21, wherein said monovalent ions are selected from a group consisting of Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+.
- 23. The laser system of claim 21, wherein said trivalent ions are selected from a group consisting of the rare earths and Y.sup.3+.
- 24. The laser system of claim 21, wherein A is selected from a group consisting of Al, Ga and In.
- 25. The laser system of claim 21, wherein X is selected from a group consisting of S, Se and Te.
- 26. The laser system of claim 21, wherein said pump source is selected from a group consisting of a laser diode and an Nd:YAG laser operating at 1.3 microns.
- 27. The laser system of claim 21, wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 28. The laser system of claim 21, wherein said laser system is configured to emit laser light at about 4.3 microns.
- 29. A laser system, comprising:
- a laser crystal selected from a group consisting Dy.sup.3+ -doped CaGa.sub.2 S.sub.4, SrGa.sub.2 S.sub.4, BaGa.sub.2 S.sub.4, CaGa.sub.2 Se.sub.4, SrGa.sub.2 Se.sub.4, and BaGa.sub.2 Se.sub.4 ; and
- a pump source to energize said crystal.
- 30. The laser system of claim 29, wherein said pump source is selected from a group consisting of an Nd:YAG laser operating at 1.3 microns and a laser diode.
- 31. A laser system, comprising:
- a laser crystal having an Er.sup.3+ -doped MA.sub.2 X.sub.4 crystalline gain medium, where M is a divalent ion; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal.
- 32. The laser system of claim 31, wherein M is selected from a group consisting of Mg, Ca, Sr, Ba, Pb, Eu and Yb.
- 33. The laser system of claim 31, wherein A is selected from a group consisting of Al, Ga and In.
- 34. The laser system of claim 31, wherein X is selected from a group consisting of S, Se and Te.
- 35. The laser system of claim 31, wherein said pump source comprises a laser diode.
- 36. The laser system of claim 31, wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 37. The laser system of claim 31, wherein said laser crystal has a phonon frequency of >350 cm.sup.-1.
- 38. A laser system, comprising:
- a laser crystal having an Er.sup.3+ -doped MA.sub.2 X.sub.4 crystalline gain medium, wherein M is selected from a first group consisting of divalent ions combined with roughly equal portions of monovalent and trivalent ions and a second group consisting of roughly equal portions of monovalent and trivalent ions; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal.
- 39. The laser system of claim 38, wherein said monovalent ions are selected from a group consisting of Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+.
- 40. The laser system of claim 38, wherein said trivalent ions are selected from a group consisting of the rare earths and Y.sup.3+.
- 41. The laser system of claim 38, wherein A is selected from a group consisting of Al, Ga and In.
- 42. The laser system of claim 38, wherein X is selected from a group consisting of S, Se and Te.
- 43. The laser system of claim 38, wherein said pump source is selected from a group consisting of a laser diode and an Nd:YAG laser operating at 1.3 microns.
- 44. The laser system of claim 38, wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 45. The laser system of claim 38, wherein said laser crystal has a phonon frequency of >350 cm.sup.-1.
- 46. A laser system, comprising:
- a laser crystal having an Pr.sup.3+ -doped MA.sub.2 X.sub.4 crystalline gain medium, where M is a divalent ion; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal.
- 47. The laser system of claim 46, wherein M is selected from a group consisting of Mg, Ca, Sr, Ba, Pb, Eu and Yb.
- 48. The laser system of claim 46, wherein A is selected from a group consisting of Al, Ga and In.
- 49. The laser system of claim 46, wherein X is selected from a group consisting of S, Se and Te.
- 50. The laser system of claim 46, wherein said pump source comprises a laser diode.
- 51. The laser system of claim 46, wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 52. The laser system of claim 46, wherein said laser crystal has a phonon frequency of >350 cm.sup.31 1.
- 53. A laser system, comprising:
- a laser crystal having an Er.sup.3+ -doped MA.sub.2 X.sub.4 crystalline gain medium, wherein M is selected from a first group consisting of divalent ions combined with roughly equal portions of monovalent and trivalent ions and a second group consisting of roughly equal portions of monovalent and trivalent ions; A is a trivalent ion; X is a chalcogenide ion; and RE is a trivalent rare earth ion; and
- a pump source to energize said laser crystal.
- 54. The laser system of claim 53, wherein said monovalent ions are selected from a group consisting of Li.sup.+, Na.sup.+, K.sup.+, Rb.sup.+, and Cs.sup.+.
- 55. The laser system of claim 53, wherein said trivalent ions are selected from a group consisting of the rare earths and Y.sup.3+.
- 56. The laser system of claim 53, wherein A is selected from a group consisting of Al, Ga and In.
- 57. The laser system of claim 53, wherein X is selected from a group consisting of S, Se and Te.
- 58. The laser system of claim 53, wherein said pump source is selected from a group consisting of a laser diode and an Nd:YAG laser operating at 1.3 microns.
- 59. The laser system of claim 53, wherein said laser system is configured to emit laser light at about 3 microns or greater.
- 60. The laser system of claim 53, wherein said laser crystal has a phonon frequency of >350 cm.sup.-1.
Government Interests
The United States Government has rights in this invention pursuant to Contract No. W-7405-ENG-48 between the United States Department of Energy and the University of California for the operation of Lawrence Livermore National Laboratory.
US Referenced Citations (2)
Number |
Name |
Date |
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3833862 |
Wickersheim et al. |
Sep 1974 |
|
5166948 |
Gavrilovic et al. |
Nov 1992 |
|