The present invention relates to a method for low-pressure spray cleaning and residual contaminant analysis of components using a low-pressure spray module.
At the present time, residual cleaning and residual contaminant determination of components is performed using the dipping method including ultrasonic testing, if necessary. Using such a method, it is possible to ensure that the outer surfaces of components are cleaned. In contrast, cleaning of internal areas of components, e.g., through holes or blind holes, is not ensured in every case. In some cases, wash stands are also used for cleaning, in which a cleaning medium is pumped through the component in a closed circuit at high pressures using adapters.
Accordingly, the described methods for residual cleaning and residual contaminant determination of components have the disadvantages that in many cases, it is not possible, or is very difficult, to clean through holes and blind holes; the cleaning modules used are usually only adapted to specific component geometries; and the cleaning modules frequently require a costly filtering method due to the closed circuit of the flushing medium.
Therefore, an object of the present invention is to avoid the above-described disadvantages and provide a method for low-pressure spray cleaning and residual contaminant analysis, as well as a low-pressure spray module, such that controlled internal cleaning of even poorly accessible areas, such as through holes and blind holes, is feasible using simple filter technology, and which method is compatible with various component geometries.
A low-pressure spray module provides a particle-free pressurization which is carried out without a pump, using a receiver tank which contains a flushing medium pressurized with compressed air. Ab exchangeable spray lance having a variable diameter, shape and length is attached on the outlet side of the receiver tank, it being possible to couple the spray lance to a metering diaphragm valve; if nozzles are used, external cleaning of the components is also possible, and furthermore, the particle-containing flushing medium arising during the spray cleaning is collected in a collection tank in which an analysis filter is installed, which filters the particles out of the flushing medium and preserves them for later analysis.
A method for low-pressure spray cleaning and residual contaminant analysis of components, using the above-described low-pressure spray module, includes the following steps:
In one example, filtering out of the particles by suction of the flushing medium is supported using a vacuum pump situated at the outflow side of the collection tank downstream of the analysis filter. The residual contaminant analysis of the particles filtered out may be performed by optical microscopy or scanning electron microscopy. These features provide the following advantages of the method and the low-pressure spray module according to the present invention:
As shown in
Receiver tank B1 is first filled with a filtered flushing medium via line 2. The tank may be operated by connecting it to a compressed air system (line 1) as a compressed air source at a maximum pressure of approximately 6 bar. The tank pressure is controlled or regulated by a valve V1 located in compressed air line 1. The flushing medium may also be supplied to long through holes via spray unit S1 having a lance. To ensure the necessary movability of flushing lance S1, flushing lance S1 is connected to prefilter F1 via a flexible hose 4. A second regulating/setting valve V2 is located in line 3 between prefilter F1 and receiver tank B1 for a requirements-based regulation/setting of the pressure and/or the volume of the flushing medium to prefilter F1 or to flushing lance S1. The exchangeability of spray lance S1, the diameter and length of which may vary depending on the component, and flexible line 4 make it possible to flush, i.e., spray out, components of complex design, i.e., including through holes and blind holes produced in the component from different sides.
The particle-containing flushing medium is collected in receiver tank B2 after the components are sprayed out. To that end, the upper opening of collection tank B2 advantageously widens toward the top in the shape of a funnel. The particle-containing medium collected in collection tank B2 is drawn off via inline analysis filter F2 using the vacuum pump (not shown). Immediately afterwards, it is possible to examine the filter and analyze it for the determination of residual contamination.
An undesired alternative avoided by the present invention would be to generate the pressure for the flushing medium via pumps, which would necessitate a costly filter technology for the flushing medium in order to ensure that it would have high purity. Furthermore, a high pressure drop arises, which must be accounted for in the pump power output. In contrast, an open circuit is used in the method of the present invention, in which the pressure is variable in a simple manner and no costly filter technology is needed.
The method described for low-pressure spray cleaning and residual contaminant analysis of components, and the low-pressure spray module used for such method, may be used on components having purity-critical internal areas, for example, high pressure pumps for diesel injection systems, injection nozzles, hydraulic power units for ABS systems, and other components of motor vehicle injection systems.
Number | Date | Country | Kind |
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103 16 644.0 | Apr 2003 | DE | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/DE04/00603 | 3/24/2004 | WO | 3/20/2006 |