Claims
- 1. A method of automatically cleaning contaminants from a surface moving in rotational motion, with said surface having a width along the longitudinal axis of said rotational motion, comprising the steps of:
- orienting at least one polishing block for polishing said moving surface with the longitudinal axis of said polishing block parallel to the longitudinal axis of said rotational motion;
- swingingly engaging said polishing block with said moving surface about an axis of rotation; and
- reciprocally scrubbing said moving surface with said polishing block being reciprocally moved along the width of said moving surface.
- 2. The method recited in claim 1, wherein said reciprocal scrubbing step includes reciprocating said polishing block from said axis of rotation to said moving surface.
- 3. The method recited in claim 2, wherein said reciprocal scrubbing step includes reciprocally scrubbing the entire width of said moving surface simultaneously.
- 4. The method recited in claim 3, wherein said swingingly engaging step further includes the step of force biasing said polishing block against said moving surface.
- 5. The method recited in claim 4, wherein said force biasing step further includes continuously force biasing said polishing block against said moving surface for continuous cleaning of the width of said moving surface.
- 6. The method recited in claim 4, wherein said force biasing step further includes selectively force biasing said polishing block against the width of said moving surface for intermittent cleaning the width of said moving surface.
- 7. The method recited in claim 1, wherein said at least one polishing block comprises a plurality of polishing blocks.
- 8. The method recited in claim 7, wherein said reciprocal scrubbing step includes reciprocating said plurality of polishing blocks from said axis of rotation to said moving surface.
- 9. The method recited in claim 8, wherein sid reciprocal scrubbing step includes reciprocally scrubbing the entire width of said moving surface simultaneously.
- 10. The method recited in claim 9, wherein said swingingly engaging step further includes the step of force biasing said polishing block against said moving surface.
- 11. The method recited in claim 10, wherein said force biasing step further includes continuously force biasing said plurality of polishing blocks against said moving surface for continuous cleaning of the width of said moving surface.
- 12. The method recited in claim 10, wherein said force biasing step further includes selectively force biasing said plurality of polishing blocks against the width of said moving surface for intermittent cleaning the width of said moving surface.
Parent Case Info
This is a division of application Ser. No. 222,773 filed July 22, 1988, now U.S. Pat. No. 4,887,329, the text of which is hereby incorporated by reference.
US Referenced Citations (4)
Divisions (1)
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Number |
Date |
Country |
Parent |
222773 |
Jul 1988 |
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