Claims
- 1. A low residue aqueous cleaning and disinfecting composition which comprises:
(A) at least one anionic a linear C6-C18 alkyl sulfate surfactant (B) at least one surfactant based on a glycoside; (C) a solvent system containing an alkylene glycol ether solvent, further with a C1-C6 alcohol; and (D) water.
- 2. The low residue aqueous hard surface cleaning and disinfecting composition according to claim 1, wherein the surfactant (A) is predominantly a linear lauryl sulfate.
- 3. The low residue aqueous hard surface cleaning and disinfecting composition according to claim 1, wherein the sole alkylene glycol ether solvents are propylene glycol n-butyl ether, and ethylene glycol hexyl ether.
- 4. The low residue aqueous hard surface cleaning and disinfecting composition according to claim 1, wherein the solvent system consists solely of propylene glycol n-butyl ether, ethylene glycol hexyl ether and a C1-C6 alcohol.
- 5. The low residue aqueous hard surface cleaning and disinfecting composition according to claim 1, wherein the solvent system consists solely of propylene glycol n-butyl ether, ethylene glycol hexyl ether and isopropanol.
- 6. A composition according to claim 1, further characterized in that the composition forms a substantially uniform film during evaporative drying subsequent to application on a hard surface.
- 7. A composition according to claim 1, which further comprises a pH adjusting agent or a pH buffering agent.
- 8. A composition according to claim 1, comprising per 100% wt.:
(A) 0.01-10% wt. of at least one anionic a linear C6-C18 alkyl sulfate surfactant; (B) 0.01-10% wt. of at least one surfactant based on a glycoside; (C) a solvent system containing: 0.01-11% wt. of one or more alkylene glycol ether solvents, and 0.1-10% wt. of a C1-C6 alcohol; (D) to 100% wt. water; a pH buffer or pH adjusting agent; and further 0-10% wt. of optional additives as described herein.
- 9. A composition according to claim 1, comprising per 100% wt.:
(A) 0.01-10% wt. of at least one anionic a linear C6-C18 alkyl sulfate surfactant; (B) 0.01-10% wt. of at least one surfactant based on a glycoside; (C) a solvent system containing: 0.01-6.0% wt. propylene glycol n-butyl ether, 0.1-5% wt. ethylene glycol hexyl ether and 0.1-10% wt. of a C1-C6 alcohol; (D) to 100% wt. water; a pH buffer or pH adjusting agent; and further 0-10% wt. of optional additives as described herein.
- 10. The composition according to claim 8, wherein the compositions are characterized by forming a substantially uniform film during evaporative drying after being applied to a hard surface.
- 11. The composition according to claim 9, wherein the compositions are characterized by forming a substantially uniform film during evaporative drying after being applied to a hard surface
- 12. A process for the cleaning and disinfecting of a hard surface in need of such treatment which comprises the step of:
applying an effective amount of the composition according to claim 1.
Priority Claims (1)
Number |
Date |
Country |
Kind |
9911818.4 |
May 1999 |
GB |
|
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application is a continuation of International Application No. PCT/GBOO/01859, filed May 19, 2000, which was published in the English language on Nov. 30, 2000 under International Publication No. WO 00/71661 A1 and the disclosure of which is incorporated herein by reference.
Continuations (1)
|
Number |
Date |
Country |
Parent |
PCT/GB00/01859 |
May 2000 |
US |
Child |
09990062 |
Nov 2001 |
US |