Lower shield for a substrate processing chamber

Information

  • Patent Grant
  • D931241
  • Patent Number
    D931,241
  • Date Filed
    Wednesday, August 28, 2019
    5 years ago
  • Date Issued
    Tuesday, September 21, 2021
    3 years ago
  • US Classifications
    Field of Search
    • US
    • D13 118
    • D13 133
    • D13 162
    • D13 182
    • D13 184
    • D13 199
    • D15 1441
    • D15 1442
    • D15 150
    • D15 199
    • D23 213
    • D24 232
    • CPC
    • H01L21/0226
    • H01L21/02263
    • H01L21/02266
    • H01L21/02269
    • H01L21/02271
    • H01L21/67742
    • H01L2221/68363
    • H01L2224/75186
    • H01L2224/76186
    • H01J37/32633
    • H01J37/32477
    • H01J37/32623
    • H01J37/32642
  • International Classifications
    • 1303
    • Term of Grant
      15Years
      Disclaimer
      This patent is subject to a terminal disclaimer.
Abstract
Description


FIG. 1 is a top isometric view of a lower shield for a substrate processing chamber, according to the novel design.



FIG. 2 is a top plan view thereof.



FIG. 3 is a bottom plan view thereof.



FIG. 4 is a front elevation view thereof.



FIG. 5 is a back elevation view thereof.



FIG. 6 is a right side elevation view thereof.



FIG. 7 is a left side elevation view thereof; and,



FIG. 8 is a cross-section view taken along line 8-8 in FIG. 2.


The dashed lines in FIGS. 1-8 are for the purpose of showing environmental structure, and form no part of the claimed design.


Claims
  • The ornamental design for a lower shield for a substrate processing chamber, as shown and described.
US Referenced Citations (22)
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Foreign Referenced Citations (6)
Number Date Country
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WO 2014014566 Jan 2014 WO
Non-Patent Literature Citations (2)
Entry
Search Report for Taiwan Design Application No. 109300802, dated Aug. 5, 2020.
International Search Report and Written Opinion for PCT/US2020/048303 dated Dec. 4, 2020.