Lubricant compound for magnetic disk and magnetic disk

Abstract
A lubricant compound is contained in a lubrication layer of a magnetic disk in which at least a magnetic layer, a protective layer, and a lubrication layer are sequentially provided on a substrate, and the lubricant compound contains a component A represented by Chemical formula 1 and a component B represented by Chemical formula 2:
Description
CROSS REFERENCE TO RELATED APPLICATION

This application is a National Stage of International Application No. PCT/JP2010/55469 filed Mar. 27, 2010, claiming priority based on Japanese Patent Application No. 2009-080693, filed Mar. 28, 2009, the contents of all of which (including chemical formulas) are incorporated herein by reference in their entirety.


TECHNICAL FIELD

The present invention relates to a magnetic disk to be mounted on a magnetic disk device such as a hard-disk drive (hereinafter abbreviated as HDD) and a lubricant compound for a magnetic disk.


BACKGROUND ART

With the recent trend to higher-capacity information processing, various information recording technologies have been developed. Particularly, a surface recording density of an HDD using the magnetic recording technology has continuously increased by the rate of approximately 100% a year. In recent years, an information recording capacity exceeding 250 GB per disk is required for a magnetic disk having a diameter of 2.5 inches used in HDD or the like, and in order to meet such demand, realization of an information recording density exceeding 400 Gbits per 1 square inch is in demand. In order to achieve the high recording density in a magnetic disk used in an HDD or the like, magnetic crystal grains constituting a magnetic recording layer handling recording of an information signal need to be refined, and its layer thickness needs to be reduced at the same time. However, in the case of a magnetic disk of an in-plane magnetic recording method (also referred to as longitudinal magnetic recording method or horizontal magnetic recording method) which has been merchandized, as the result of development of the refining of the magnetic crystal grains, a thermal fluctuation phenomenon in which thermal stability of the recording signal is damaged by a superparamagnetic phenomenon and the recording signal is lost begins to occur, which makes an obstructive factor to higher recording density of a magnetic disk.


In order to solve this obstructive factor, a magnetic recording medium for a perpendicular magnetic recording method has been proposed recently. In the case of the perpendicular magnetic recording method, unlike the in-plane magnetic recording method, a magnetization easy axis of a magnetic recording layer is adjusted to be oriented in the perpendicular direction with respect to a substrate surface. As compared with the in-plane recording method, the perpendicular magnetic recording method can suppress the thermal fluctuation phenomenon, and is suitable for higher recording density. This type of perpendicular magnetic recording mediums include a so-called two-layer type perpendicular magnetic recording disk provided with a soft magnetic underlayer made of a soft magnetic body on a substrate and a perpendicular magnetic recording layer made of a hard magnetic body as described in Japanese Unexamined Patent Application Publication No. 2002-74648, for example.


In a prior-art magnetic disk, a protective layer and a lubrication layer are provided on a magnetic recording layer formed on a substrate in order to ensure durability and reliability of the magnetic disk. Particularly, the lubrication layer used on the outermost surface requires various characteristics such as long-term stability, chemical substance resistance, friction property, heat resistant property and the like.


In order to accommodate such request, a perfluoropolyether lubricant having a hydroxyl group in the molecule has been widely used as a lubricant for a magnetic disk. For example, as in Japanese Unexamined Patent Application Publication No. S62-66417 (Patent Document 1), a magnetic recording medium in which a perfluoroalkylpolyether lubricant having a structure of HOCH2CF2O(C2F4O)p(CF2O)qCF2CH2OH having a hydroxyl group at both ends of the molecule is applied is well known. If there is a hydroxyl group in a molecule of a lubricant, it is known that an adhesion characteristic of the lubricant to the protective layer can be obtained by means of an interaction between the protective layer and the hydroxyl group.


CITATION LIST
Patent Literature

Patent Document 1: Japanese Unexamined Patent Application Publication No. S62-66417


SUMMARY OF INVENTION
Technical Problem

As described above, the information recording density of 400 Gbit/inch2 or more has been required for the recent HDD, but in order to effectively use a limited disk area, an LUL (Load Unload) type HDD has begun to be used instead of the prior-art CSS (Contact Start and Stop) method in a start/stop mechanism of the HDD. In the LUL method, when an HDD is stopped, a magnetic head is retreated onto an inclined base called a ramp located outside the magnetic disk and in a start operation, after the magnetic disk starts rotating, the magnetic head is made to slide from the ramp onto the magnetic disk, floated and flown for recording and reproducing. In a stop operation, the magnetic head is retreated to the ramp outside the magnetic disk and then, the rotation of the magnetic disk is stopped. This series of operations are called LUL operations. In a magnetic disk to be mounted on the LUL-method HDD, a contact sliding region (CSS region) with the magnetic head as in the CSS method does not have to be provided, and thus, a recording and reproducing area can be expanded, which is preferable for a higher information capacity.


In order to improve the information recording density under these circumstances, a spacing loss needs to be reduced as much as possible by reducing a floating amount of the magnetic head. In order to achieve the information recording density of 400 Gbits or more per 1 square inch, the floating amount of the magnetic head needs to be at least 5 nm or less. In the LUL method, unlike the CSS method, a projection and recess shape for the CSS does not have to be provided on the magnetic disk surface, whereby the magnetic disk surface can be made extremely smooth. Thus, in the magnetic disk to be mounted on the LUL method HDD, the magnetic-head floating amount can be further lowered as compared with the CSS method, whereby a higher S/N ratio of the recording signal can be realized, and contribution can be made to a higher recording capacity of a magnetic disk device, which is an advantage.


Due to the further decrease of the magnetic-head floating amount promoted by recent introduction of the LUL method, a stable operation of the magnetic disk even with a low floating amount not more than 5 nm is in demand at the present. Particularly, as described above, the recording method of the magnetic disk has been changing from the in-plane magnetic recording method to the perpendicular magnetic recording method, and an increase in the capacity of a magnetic disk and a decrease in a flying height in compliance with that are in strong demand.


Also, in recent years, the magnetic disk devices are widely used not only as a storage device of a conventional personal computer but in mobile applications including a mobile phone, a car-navigation system and the like, and due to diversification of the applications, environmental resistances required for the magnetic disk has been extremely severe. Therefore, in view of these situations, further improvement of durability of the magnetic disk or durability of a lubricant constituting a lubrication layer is more imminent than ever.


Also, with the recent rapid improvement of the information recording density of the magnetic disk, further reduction of a magnetic spacing between the magnetic head and the recording layers of the magnetic disk is in demand in addition to the decrease of the floating amount of the magnetic head, and a lubrication layer located between the magnetic head and the recording layer of the magnetic disk needs to be further thinned. A lubricant used for the lubrication layer on the outermost surface of the magnetic disk has a large influence on durability of the magnetic disk, but even if it is made into a thin film, stability and reliability are indispensable for the magnetic disk.


Hitherto, since favorable adhesion properties of the lubricant to the protective layer can be obtained by the interaction between a carbon protective layer and the hydroxyl group in the lubricant molecule due to presence of a polar group such as the hydroxyl group in the molecule of the lubricant, particularly a perfluoropolyether lubricant having a hydroxyl group at both ends of the molecule has been favorably used.


Particularly, in magnetic disks for mobile applications, FOMBLIN Z-TETRAOL (product name) by Solvay Solexis, Inc., which is a perfluoropolyether lubricant, has been widely used as the lubricant, for example. As this lubricant, those refined by various refining methods including supercritical extraction, distillation and the like are used in many cases. It is known by examination by the inventor that this FOMBLIN Z-TETRAOL (product name) lubricant contains a component having various terminal groups.


A bis-form component expressed as follows:




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(hereinafter referred to as a component D), which is one of such terminal groups, binds with (is adsorbed by) a protective film particularly strongly, and thus, it works to reduce abrasion of the protective film or physical damage on the magnetic recording medium during LUL or in head contact. However, on the other hand, since the component D is contained, it has a defect that problems such as aggregation of the lubricant and pickup of the lubricant (a phenomenon in which the lubricant transfers to the head side) can easily occur. The lubricant pickup is considered to be caused by contact of the head with the lubricant which has increased its thickness by aggregation. Reduction of the aggregation of the lubricant, the lubricant pickup or physical damage on the magnetic recording medium is an important and imminent problem to be solved in realizing a narrower head clearance in the future.


Recently, in the magnetic head, reduction of spacing has rapidly progressed due to introduction of the Dynamic Flying Height (DFH) technology in which a magnetic pole distal end portion is thermally expanded by generating heat through energization of a thin-film resistance body provided inside an element, and development of a medium which satisfies a back-off margin of a DFH element at 2 nm or less is needed. As described above, realization of a magnetic disk having high reliability is in demand under the circumstances of lower floating amount of the magnetic head and reduction of the magnetic spacing involved with the recent higher recording density.


The present invention was made in view of the above-described prior-art problems and has an object to provide a magnetic disk that can realize further reduction of the magnetic spacing and moreover, has high reliability under the lower floating amount of the magnetic head involved with the recent rapid increase in the recording density and extremely severe environmental resistance involved with diversification of the applications and a lubricant compound for a magnetic disk used for the lubrication layer of the magnetic disk.


Solution to Problem

The inventor has found that the above-described problems can be solved by the following invention as the result of keen examination and completed the present invention.


That is, the present invention has the following configuration:


(Composition 1)


A lubricant compound for a magnetic disk characterized in that the lubricant compound contained in a lubrication layer of a magnetic disk in which at least a magnetic layer, a protective layer, and the lubrication layer are sequentially provided on a substrate, in which the lubricant compound contains a component A represented by Chemical formula 1 and a component B represented by Chemical formula 2:




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wherein X in Chemical formula 1 represents OH




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wherein X in Chemical formula 2 represents OCH2CH(OH)CH2OH,


and the lubricant compound further contains at least one type of a component C, wherein the component C is selected from compounds C-1, C-2 and C-3 represented by the following formulae:




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    • wherein Rf represents —(OC2F4)m(OCF2)n-, and m and n each represents an integer of not less than 1, and

    • PN is represented from one of the following formulae:







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    • wherein x and y each is an integer of 5 when C is compound (C-1) and an integer of 4 when C is compound (C-2).





(Composition 2)


The lubricant compound for a magnetic disk described in the composition 1, characterized in that in the lubricant compound, the ratio of the component C among the component A, the component B, and the component C is 5 to 20 weight %.


(Composition 3)


The magnetic disk, characterized in that at least a magnetic layer, a protective layer, and a lubrication layer are sequentially provided on a substrate, in which the lubrication layer contains the lubricant compound described in the composition 1 or 2.


(Composition 4)


The magnetic disk described in the composition 3, characterized in that the protective layer is a carbon protective layer formed by a plasma CVD method.


(Composition 5)


The magnetic disk described in the composition 3 or 4, characterized in that the magnetic disk is a magnetic disk mounted on a magnetic disk device whose start/stop mechanism is of a load-unload type and used under the head floating amount of 5 nm or less.


Advantages of the Invention

According to the present invention, a lubricant compound for a magnetic disk which can realize further reduction of the magnetic spacing and moreover, in which drawbacks such as the lubricant aggregation, pickup or the like does not occur, and has high reliability under a low floating amount of a magnetic head involved with the recent rapid increase in the recording density and under extremely severe environmental resistance involved with diversification of the applications, and a magnetic disk provided with the lubrication layer containing the lubricant compound can be provided.





BRIEF DESCRIPTION OF THE DRAWINGS


FIG. 1 is a graph illustrating a fixed-point floating test result after silicon exposure.



FIG. 2 is a graph illustrating a fixed-point floating test result after silicon exposure.





BEST MODE FOR CARRYING OUT THE INVENTION

The present invention will be described below in detail by using an embodiment.


A lubricant compound for a magnetic disk of the present invention is, as described in the composition 1, a lubricant compound contained in a lubrication layer of a magnetic disk in which at least a magnetic layer, a protective layer, and the lubrication layer are sequentially provided on a substrate, and the lubricant compound contains a component A represented by Chemical formula 1 and a component B represented by Chemical formula 2:




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    • wherein X in Chemical formula 1 represents OH







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    • wherein X in Chemical formula 2 represents OCH2CH(OH)CH2OH,

    • and the lubricant compound further contains at least one type of a component C, wherein the component C is selected from compounds C-1, C-2 and C-3 represented by the following formulae:







embedded image




    • wherein Rf represents —(OC2F4)m(OCF2)n-, and m and n each represents an integer of not less than 1, and

    • PN is represented from one of the following formulae:







embedded image




    • wherein x and y each is an integer of 5 when C is compound (C-1) and an integer of 4 when C is compound (C-2).





In the lubricant compound for a magnetic disk of the present invention, since the component D is not contained, aggregation or pickup of the lubricant hardly occurs, as compared with the FOMBLIN Z-TETRAOL (product name) lubricant, which has been used in general, and since the component C having an adsorption force to the protective film to the same degree as the component D, a function of reducing abrasion of the protective film or physical damage to the magnetic recording medium during LUL or in head contact is provided.


That is, since the prior-art component D has three hydroxyl groups for one terminal part, it can bind to the protective film extremely strongly, and thus, removal of the lubricant hardly occurs even in head contact, and abrasion of the protective film or physical damage to the magnetic recording medium can be reduced. However, since the positions of the hydroxyl groups in the molecule are close to the ends and they are close to each other in the component D, interactions such as hydrogen bonding can easily occur in the molecule or between the molecules, and aggregation of the lubricant can easily occur on the disk surface.


On the other hand, the component C contained in the lubricant of the present invention has fewer hydroxyl groups close to the end of the molecule than the component D, and aggregation between the molecules hardly occurs. Also, since it has a hydroxyl group not only at the end but also at the center part of the molecule as the compound C-3, the interaction between the molecules can be favorably suppressed. Also, by providing a phosphazene ring at the center part or end part of the molecule as a polar group (functional group) instead of the hydroxyl group as in the compounds C-1 and C-2, the interaction between the molecules can be favorably suppressed. Such component C can adsorb to the protective film not only at the end group but also at the center part of the molecule and has the adsorption force to the protective film equal to or larger than that of the component D, and thus, removal of the lubricant hardly occurs even in head contact, and abrasion of the protective film or physical damage to the magnetic recording medium can be reduced.


The lubricant compound for a magnetic disk of the present invention is a mixture of the component A, the component B, and the component C, and there is no particular need to restrict its mixing ratio in the present invention, but in order for the working effects by the present invention to exert better, the ratio of the component C is preferably 5 to 20 weight %. The component A and the component B can be also obtained by removing the component D from the commercially available FOMBLIN Z-TETRAOL (product name) lubricant, by appropriate refining, for example. Also, FOMBLIN Z-TETRAOL GT (product name) not containing the D component is also commercially available.


The content ratio between the components A and B is preferably anywhere between 1:3 and 1:10 (weight ratio).


Also, the component C is at least one type selected from the above compounds C-1, C-2, and C-3, but each compound may be used singularly or these compounds may be used at the same time as appropriate. Also, if these compounds are used at the same time, at least one type of the compounds C-1 and C-2 may be used at the same time with the compound C-3, for example. In the present invention, particularly the compounds C-2 and C-3 are preferable.


Each molecular weight of the component A, the component B, and the component C contained in the lubricant compound of the present invention is not particularly limited, but the number average molecular weight (Mn) is preferably within a range of 1000 to 10000, for example, and more preferably within a range of 1000 to 6000. That is because repairability by appropriate viscosity is provided, and favorable lubrication performances are exerted.


The lubricant compound of the present invention has the number average molecular weight (Mn) within a range of 1000 to 10000, for example, by an appropriate molecular weight fractionation. The method of molecular weight fractionation is not particularly limited in this case, and molecular weight fractionation using a gel permeation chromatography (GPC) method or molecular weight fractionation using a supercritical extraction method can be used, for example.


Also, the present invention is a magnetic disk in which at least a magnetic layer, a protective layer, and a lubrication layer are sequentially provided on a substrate, and the lubrication layer is also provided for the magnetic disk characterized by containing the lubricant compound for a magnetic disk of the present invention.


In forming the lubrication layer using the lubricant compound of the present invention, a film can be formed by application using a dip method, for example, using a solution in which the lubricant compound is dispersed and dissolved in a fluorine solvent or the like.


The film forming method of the lubrication layer is naturally not limited to the above dip method and a film forming method such as a spin coating method, a spraying method, a paper coating method and the like may be used.


In the present invention, in order to further improve an adhesion force of the formed lubrication layer to the protective layer, heating treatment or ultraviolet irradiation treatment may be conducted in which the magnetic disk is exposed to the atmosphere at 50 to 150° C. after the film formation.


The film thickness of the prior-art lubrication layer has been usually 15 to 18 Å, but in the present invention, the film thickness can be made thinner to the film thickness of approximately 10 to 13 Å, for example. If the thickness is less than 10 Å, lubrication performances as the lubrication layer might be lowered.


Also, as the protective layer in the present invention, a carbon protective layer can be favorably used. Particularly, an amorphous carbon protective layer is preferable. If the protective layer is a carbon protective layer, the interaction between the polar group (hydroxyl group or phosphazene ring) of the lubricant according to the present invention and the protective layer is further increased, and the working effect by the present invention is further exerted, which is a preferable mode.


In the carbon protective layer in the present invention, it is preferable that nitrogen is contained in the lubrication layer side of the protective layer so as to have a composition graded layer in which hydrogen is contained in the magnetic layer side, for example.


If the carbon protective layer is used in the present invention, a film can be formed by using a DC magnetron sputtering method, for example, but an amorphous carbon protective layer formed by the plasma CVD method is particularly preferable. By forming a film by the plasma CVD method, the surface of the protective layer is made uniform and closely formed. Therefore, formation of a lubrication layer according to the present invention on the protective layer formed by using the CVD method with smaller coarseness is preferable.


In the present invention, the film thickness of the protective layer is preferably 20 to 70 Å. If the thickness is less than 20 Å, performances as the protective layer might be lowered. The thickness exceeding 70 Å is not preferable from the viewpoint of film thinning.


In the magnetic disk of the present invention, the substrate is preferably a glass substrate. A glass substrate is rigid and is excellent in smoothness, which is preferable for higher recording density. As the glass substrate, an aluminosilicate glass substrate, for example, can be cited, and particularly a chemically-reinforced aluminosilicate glass substrate is preferable.


In the present invention, regarding coarseness of the main surface of the above substrate, the surface is preferably supersmooth with Rmax at 3 nm or less and Ra at 0.3 nm or less. The surface coarseness Rmax and Ra here are based on the specification by JIS B0601.


The magnetic disk obtained by the present invention is provided with at least a magnetic layer, a protective layer, and a lubrication layer on the substrate, but in the present invention, the magnetic layer is not particularly limited and may be either an in-plane recording type magnetic layer or a perpendicular recording type magnetic layer, but the perpendicular recording type magnetic layer is particularly preferable for realization of the recent rapid increase in recording density. Particularly, a CoPt magnetic layer is preferable since it can obtain both a high magnetic coercive force and a high reproduction output.


In the magnetic disk of the present invention, an underlayer can be provided between the substrate and the magnetic layer as necessary. Also, an adhesion layer or a soft magnetic layer or the like may be provided between the underlayer and the substrate. In this case, as the underlayer, a Cr layer, a Ta layer, a Ru layer or an alloy layer of CrMo, CoW, CrW, CrV, CrTi and the like can be cited, for example, and particularly the Ru layer is preferable in the perpendicular magnetic recording medium. As the adhesion layer, an alloy layer of CrTi, NiAl, AlRu and the like can be cited, for example. Also, as the soft magnetic layer, a CoZrTa alloy film, for example, can be cited.


According to the present invention, since the lubrication layer in which adhesion to the protective layer is high and aggregation or pickup of the lubricant, scratches and the like hardly occur can be formed, further reduction of the magnetic spacing can be realized, and moreover, under the circumstances of the super low floating amount (5 nm or less) of the magnetic head involved with the recent rapid increase in the recording density, a magnetic disk having high reliability under the extremely severe environmental resistance involved with diversification of applications can be obtained.


The magnetic disk of the present invention is preferable as a magnetic disk mounted particularly on an LUL-type magnetic disk device. A further decrease of the magnetic-head floating amount realized by introduction of the LUL method has required the magnetic disk to operate stably even with an extremely low floating amount of not more than 5 nm, for example, and the magnetic disk of the present invention having high reliability under the circumstance of the low floating amount is preferable.


EXAMPLES

The present invention will be described below in more detail by referring to examples.


Example 1

A magnetic disk of the present example has an adhesion layer, a soft magnetic layer, an under layer, a magnetic recording layer, a carbon protective layer, and a lubrication layer sequentially formed on a disk substrate.


(Manufacture of Magnetic Disk)


A 2.5-inch glass disk (outer diameter of 65 mm, inner diameter of 20 mm, and disk thickness of 0.635 mm) made of chemically reinforced aluminosilicate glass was prepared and used as a disk substrate. The main surface of the disk substrate was mirror-polished so as to have R max of 2.13 nm and Ra of 0.20 nm.


On this disk substrate, films of a Ti adhesion layer, a FeCoTaZr alloy thin-film soft magnetic layer, a NiW first underlayer, a RuCr second underlayer, and a CoCrPtSiO2 alloy thin-film magnetic recording layer were formed sequentially in an Ar gas atmosphere by the DC magnetron sputtering method. This magnetic recording layer was a perpendicular magnetic recording type magnetic layer.


Subsequently, a film of an amorphous diamond-like carbon protective layer was formed with the film thickness of 60 Å by the plasma CVD method using a lower straight-chain hydrocarbon gas.


Subsequently, a lubrication layer was formed as follows.


As the lubricant, a lubricant in which FOMBLIN Z-TETRAOL (product name) by Solvay Solexis, Inc. containing the component A and the component B (however, the component D is removed) and the compound C-2 (component C) (however, in the compound C-2, PN ring=P3N3(OC6H4CF3)x (x=4)) are mixed at 9:1 (weight ratio) and adjusted as above was dispersed and dissolved with concentration of 0.2 weight % in VERTREL XF UP (product name) by DU PONT-MITSUI FLUOROCHEMICALS COMPANY, LTD., which is a fluorinated solvent, to prepare a solution.


By using this solution as an application liquid, the magnetic disk on which films were formed up to the protective layer was immersed and the liquid was applied by the dip method, and a film of the lubrication layer was formed.


After the film formation, the magnetic disk was subjected to heating treatment in a vacuum firing furnace at 100° C. for 60 minutes. The film thickness of the lubrication layer was measured by a Fourier transform infrared spectrophotometer (FTIR), and the result was 12 Å. A magnetic disk of Example 1-1 was obtained as above.


A magnetic disk of Example 1-2 fabricated similarly except that the film thickness of the lubrication layer was 14 Å and a magnetic disk of Example 1-3 fabricated similarly except that the film thickness of the lubrication layer was 16 Å were obtained.


Example 2

The lubrication layer was formed as follows.


As the lubricant, a lubricant in which FOMBLIN Z-TETRAOL (product name) by Solvay Solexis, Inc. containing the component A and the component B (however, the component D is removed) and the compound C-3 (component C) are mixed at 5:1 (weight ratio) and adjusted as above was dispersed and dissolved with concentration of 0.2 weight % in VERTREL XF UP (product name) by DU PONT-MITSUI FLUOROCHEMICALS COMPANY, LTD., to prepare a solution. The compound C-3 was manufactured by reacting 2 equivalent weight of the perfluoropolyether compound having a perfluoropolyether main chain in the molecule and having a hydroxyl group at the end with 1 equivalent weight of a diepoxy compound having a hydroxyl group in the molecule and an epoxide structure at the end.


By using this solution as an application liquid, the magnetic disk on which films were formed up to the protective layer was immersed and the liquid was applied by the dip method, and a film of the lubrication layer was formed. After the film formation, the magnetic disk was subjected to heating treatment in a vacuum firing furnace at 100° C. for 60 minutes. The film thickness of the lubrication layer was measured by a Fourier transform infrared spectrophotometer (FTIR), and the result was 14 Å.


A magnetic disk of Example 2 fabricated similarly to Example 1 except the lubrication layer was obtained.


Example 3

The magnetic disk of Example 3 was obtained similarly to Example 1 except that as the lubricant, a lubricant in which FOMBLIN Z-TETRAOL (product name) by Solvay Solexis, Inc. containing the component A and the component B (however, the component D is removed) and the compound C-2 (component C) (however, in the compound C-2, PN ring=P3N3(OCH2CF3)y (y=4)) are mixed at 9:1 (weight ratio) and prepared was used. The film thickness of the lubrication layer was 14 Å.


Comparative Example 1

As the lubricant, a solution in which FOMBLIN Z-TETRAOL 2000S (product name) by Solvay Solexis, Inc. refined by the supercritical extraction method was dispersed and dissolved in VERTREL XF UP (product name) by DU PONT-MITSUI FLUOROCHEMICALS COMPANY, LTD. was used as an application liquid, the magnetic disk on which films were formed up to the protective layer was immersed therein and the liquid was applied by the dip method, and a film of the lubrication layer was formed. The film thickness of the lubrication layer was 14 Å. It was found that, as the result of NMR analysis, the lubricant has the component A at approximately 15%, the component B at approximately 70%, and the component D at approximately 15% (weight ratio).


A magnetic disk manufactured similarly to Example 1 except this point was obtained as Comparative Example 1.


Comparative Example 2

As the lubricant, a solution in which FOMBLIN Z-TETRAOL GT (product name) by Solvay Solexis, Inc. refined by the supercritical extraction method was dispersed and dissolved in VERTREL XF UP (product name) by DU PONT-MITSUI FLUOROCHEMICALS COMPANY, LTD. was used as an application liquid, the magnetic disk on which films were formed up to the protective layer was immersed therein and the liquid was applied by the dip method, and a film of the lubrication layer was formed. The film thickness of the lubrication layer was 14 Å. The concentration of the application liquid was adjusted, and those with the film thicknesses of the lubrication layer at 12 Å and 16 Å were also manufactured, respectively. It was found that, as the result of NMR analysis, the lubricant has the component A at approximately 85% and the component B at approximately 15% (weight ratio).


A magnetic disk manufactured similarly to Example 1 except this point was obtained as Comparative Example 2.


In FIG. 2, Comparative Examples 2-1 to 2-3 are illustrated and they indicate respective lots of the above tetraol GT.


Subsequently, the magnetic disks in Examples and Comparative Examples were evaluated by using the following test methods.


(Fixed-Point Floating Test)


After each magnetic disk is exposed to a silicon gas for 24 hours, a back-off amount was set to 1.5 nm by using DFH of magnetic head under a high-temperature condition at 75° C. and then, a fixed-point floating test at a position of 20 mm of the disk radius was conducted for continuous two hours. The result is shown in FIGS. 1 and 2. The results of Examples 2 and 3 are not illustrated in FIG. 1 but the result similar to Example 1 was obtained. Also, the magnetic disk manufactured similarly to Example 1 except that as the lubricant, the compound C-1 (however, in the compound C-1, PN ring=P3N3(OC6H4CF3)x (x=5)) was used instead of the compound C-2 was also evaluated similarly, and it was found that the head contamination level was approximately 1.0, which is poorer than Example 1.


In Examples 1, 2, and 3 and Comparative Example 1, a scratch was not observed in the medium but in Comparative Example 2, a crush failure occurred in the middle or a large number of scratches were observed in the medium.


Subsequently, regarding aggregation of the lubricant after the above fixed-point floating test, observation was made by using an optical surface analyzer (OSA). As a result, in Comparative Example 1, a large number of aggregated spots (Mogul spots) of 2000 or more were observed but in Examples 1, 2, and 3 and Comparative Example 2, the number of aggregated spots (Mogul spots) was 500 or less, which showed a favorable characteristic.


That is, the examples of the present invention show high abrasion properties represented by prevention of scratches and favorable characteristics in which the lubricant does not aggregate at the same time.

Claims
  • 1. A lubricant compound for a magnetic disk contained in a lubrication layer of a magnetic disk in which at least a magnetic layer, a protective layer, and a lubrication layer are sequentially provided on a substrate, characterized in that the lubricant compound contains a component A represented by Chemical formula 1 and a component B represented by Chemical formula 2:
  • 2. The lubricant compound for a magnetic disk according to claim 1, wherein in the lubricant compound, the ratio of the component C among the component A, the component B, and the component C is 5 to 20 weight %.
  • 3. A magnetic disk in which at least a magnetic layer, a protective layer, and a lubrication layer are sequentially provided on a substrate, characterized in that the lubrication layer contains the lubricant compound according to claim 1.
  • 4. The magnetic disk according to claim 3, wherein the protective layer is a carbon protective layer formed by a plasma CVD method.
  • 5. The magnetic disk according to claim 3, wherein the magnetic disk is mounted on a magnetic disk device whose start/stop mechanism is a load-unload type and used under the head floating amount of 5 nm or less.
  • 6. The magnetic disk according to claim 3, wherein a thickness of the lubrication layer is 10 to 13 Å.
  • 7. The lubricant compound for a magnetic disk according to claim 1, wherein a weight ratio between the components A and B is between 1:3 and 1:10.
Priority Claims (1)
Number Date Country Kind
2009-080693 Mar 2009 JP national
PCT Information
Filing Document Filing Date Country Kind 371c Date
PCT/JP2010/055469 3/27/2010 WO 00 12/13/2011
Publishing Document Publishing Date Country Kind
WO2010/116908 10/14/2010 WO A
US Referenced Citations (326)
Number Name Date Kind
6013161 Chen et al. Jan 2000 A
6063248 Bourez et al. May 2000 A
6068891 O'Dell et al. May 2000 A
6086730 Liu et al. Jul 2000 A
6099981 Nishimori Aug 2000 A
6103404 Ross et al. Aug 2000 A
6117499 Wong et al. Sep 2000 A
6136403 Prabhakara et al. Oct 2000 A
6143375 Ross et al. Nov 2000 A
6145849 Bae et al. Nov 2000 A
6146737 Malhotra et al. Nov 2000 A
6149696 Jia Nov 2000 A
6150015 Bertero et al. Nov 2000 A
6156404 Ross et al. Dec 2000 A
6159076 Sun et al. Dec 2000 A
6164118 Suzuki et al. Dec 2000 A
6200441 Gornicki et al. Mar 2001 B1
6204995 Hokkyo et al. Mar 2001 B1
6206765 Sanders et al. Mar 2001 B1
6210819 Lal et al. Apr 2001 B1
6216709 Fung et al. Apr 2001 B1
6221119 Homola Apr 2001 B1
6248395 Homola et al. Jun 2001 B1
6261681 Suekane et al. Jul 2001 B1
6270885 Hokkyo et al. Aug 2001 B1
6274063 Li et al. Aug 2001 B1
6283838 Blake et al. Sep 2001 B1
6287429 Moroishi et al. Sep 2001 B1
6290573 Suzuki Sep 2001 B1
6299947 Suzuki et al. Oct 2001 B1
6303217 Malhotra et al. Oct 2001 B1
6309765 Suekane et al. Oct 2001 B1
6358636 Yang et al. Mar 2002 B1
6362452 Suzuki et al. Mar 2002 B1
6363599 Bajorek Apr 2002 B1
6365012 Sato et al. Apr 2002 B1
6381090 Suzuki et al. Apr 2002 B1
6381092 Suzuki Apr 2002 B1
6387483 Hokkyo et al. May 2002 B1
6391213 Homola May 2002 B1
6395349 Salamon May 2002 B1
6403919 Salamon Jun 2002 B1
6408677 Suzuki Jun 2002 B1
6426157 Hokkyo et al. Jul 2002 B1
6429984 Alex Aug 2002 B1
6482330 Bajorek Nov 2002 B1
6482505 Bertero et al. Nov 2002 B1
6500567 Bertero et al. Dec 2002 B1
6528124 Nguyen Mar 2003 B1
6548821 Treves et al. Apr 2003 B1
6552871 Suzuki et al. Apr 2003 B2
6565719 Lairson et al. May 2003 B1
6566674 Treves et al. May 2003 B1
6571806 Rosano et al. Jun 2003 B2
6628466 Alex Sep 2003 B2
6664503 Hsieh et al. Dec 2003 B1
6670055 Tomiyasu et al. Dec 2003 B2
6682807 Lairson et al. Jan 2004 B2
6683754 Suzuki et al. Jan 2004 B2
6730420 Bertero et al. May 2004 B1
6743528 Suekane et al. Jun 2004 B2
6759138 Tomiyasu et al. Jul 2004 B2
6778353 Harper Aug 2004 B1
6795274 Hsieh et al. Sep 2004 B1
6855232 Jairson et al. Feb 2005 B2
6857937 Bajorek Feb 2005 B2
6893748 Bertero et al. May 2005 B2
6899959 Bertero et al. May 2005 B2
6916558 Umezawa et al. Jul 2005 B2
6939120 Harper Sep 2005 B1
6946191 Morikawa et al. Sep 2005 B2
6967798 Homola et al. Nov 2005 B2
6972135 Homola Dec 2005 B2
7004827 Suzuki et al. Feb 2006 B1
7006323 Suzuki Feb 2006 B1
7016154 Nishihira Mar 2006 B2
7019924 McNeil et al. Mar 2006 B2
7045215 Shimokawa May 2006 B2
7070870 Bertero et al. Jul 2006 B2
7090934 Hokkyo et al. Aug 2006 B2
7099112 Harper Aug 2006 B1
7105241 Shimokawa et al. Sep 2006 B2
7119990 Bajorek et al. Oct 2006 B2
7147790 Wachenschwanz et al. Dec 2006 B2
7161753 Wachenschwanz et al. Jan 2007 B2
7166319 Ishiyama Jan 2007 B2
7166374 Suekane et al. Jan 2007 B2
7169487 Kawai et al. Jan 2007 B2
7174775 Ishiyama Feb 2007 B2
7179549 Malhotra et al. Feb 2007 B2
7184139 Treves et al. Feb 2007 B2
7196860 Alex Mar 2007 B2
7199977 Suzuki et al. Apr 2007 B2
7208236 Morikawa et al. Apr 2007 B2
7220500 Tomiyasu et al. May 2007 B1
7229266 Harper Jun 2007 B2
7239970 Treves et al. Jul 2007 B2
7252897 Shimokawa et al. Aug 2007 B2
7277254 Shimokawa et al. Oct 2007 B2
7281920 Homola et al. Oct 2007 B2
7292329 Treves et al. Nov 2007 B2
7301726 Suzuki Nov 2007 B1
7302148 Treves et al. Nov 2007 B2
7305119 Treves et al. Dec 2007 B2
7314404 Singh et al. Jan 2008 B2
7320584 Harper et al. Jan 2008 B1
7329114 Harper et al. Feb 2008 B2
7375362 Treves et al. May 2008 B2
7420886 Tomiyasu et al. Sep 2008 B2
7425719 Treves et al. Sep 2008 B2
7471484 Wachenschwanz et al. Dec 2008 B2
7498062 Calcaterra et al. Mar 2009 B2
7531485 Hara et al. May 2009 B2
7537846 Ishiyama et al. May 2009 B2
7549209 Wachenschwanz et al. Jun 2009 B2
7569490 Staud Aug 2009 B2
7597792 Homola et al. Oct 2009 B2
7597973 Ishiyama Oct 2009 B2
7608193 Wachenschwanz et al. Oct 2009 B2
7632087 Homola Dec 2009 B2
7656615 Wachenschwanz et al. Feb 2010 B2
7682546 Harper Mar 2010 B2
7684152 Suzuki et al. Mar 2010 B2
7686606 Harper et al. Mar 2010 B2
7686991 Harper Mar 2010 B2
7695833 Ishiyama Apr 2010 B2
7722968 Ishiyama May 2010 B2
7733605 Suzuki et al. Jun 2010 B2
7736768 Ishiyama Jun 2010 B2
7755861 Li et al. Jul 2010 B1
7758732 Calcaterra et al. Jul 2010 B1
7833639 Sonobe et al. Nov 2010 B2
7833641 Tomiyasu et al. Nov 2010 B2
7910159 Jung Mar 2011 B2
7911736 Bajorek Mar 2011 B2
7924519 Lambert Apr 2011 B2
7944165 O'Dell May 2011 B1
7944643 Jiang et al. May 2011 B1
7955723 Umezawa et al. Jun 2011 B2
7983003 Sonobe et al. Jul 2011 B2
7993497 Moroishi et al. Aug 2011 B2
7993765 Kim et al. Aug 2011 B2
7998912 Chen et al. Aug 2011 B2
8002901 Chen et al. Aug 2011 B1
8003237 Sonobe et al. Aug 2011 B2
8012920 Shimokawa Sep 2011 B2
8038863 Homola Oct 2011 B2
8057926 Ayama et al. Nov 2011 B2
8062778 Suzuki et al. Nov 2011 B2
8064156 Suzuki et al. Nov 2011 B1
8076013 Sonobe et al. Dec 2011 B2
8092931 Ishiyama et al. Jan 2012 B2
8100685 Harper et al. Jan 2012 B1
8101054 Chen et al. Jan 2012 B2
8125723 Nichols et al. Feb 2012 B1
8125724 Nichols et al. Feb 2012 B1
8137517 Bourez Mar 2012 B1
8142916 Umezawa et al. Mar 2012 B2
8163093 Chen et al. Apr 2012 B1
8171949 Lund et al. May 2012 B1
8173282 Sun et al. May 2012 B1
8178480 Hamakubo et al. May 2012 B2
8206789 Suzuki Jun 2012 B2
8218260 Iamratanakul et al. Jul 2012 B2
8247095 Champion et al. Aug 2012 B2
8257783 Suzuki et al. Sep 2012 B2
8298609 Liew et al. Oct 2012 B1
8298689 Sonobe et al. Oct 2012 B2
8309239 Umezawa et al. Nov 2012 B2
8316668 Chan et al. Nov 2012 B1
8331056 O'Dell Dec 2012 B2
8354618 Chen et al. Jan 2013 B1
8367228 Sonobe et al. Feb 2013 B2
8383209 Ayama Feb 2013 B2
8394243 Jung et al. Mar 2013 B1
8397751 Chan et al. Mar 2013 B1
8399809 Bourez Mar 2013 B1
8402638 Treves et al. Mar 2013 B1
8404056 Chen et al. Mar 2013 B1
8404369 Ruffini et al. Mar 2013 B2
8404370 Sato et al. Mar 2013 B2
8406918 Tan et al. Mar 2013 B2
8414966 Yasumori et al. Apr 2013 B2
8425975 Ishiyama Apr 2013 B2
8431257 Kim et al. Apr 2013 B2
8431258 Onoue et al. Apr 2013 B2
8453315 Kajiwara et al. Jun 2013 B2
8488276 Jung et al. Jul 2013 B1
8491800 Dorsey Jul 2013 B1
8492009 Homola et al. Jul 2013 B1
8492011 Itoh et al. Jul 2013 B2
8496466 Treves et al. Jul 2013 B1
8517364 Crumley et al. Aug 2013 B1
8517657 Chen et al. Aug 2013 B2
8524052 Tan et al. Sep 2013 B1
8530065 Chernyshov et al. Sep 2013 B1
8546000 Umezawa Oct 2013 B2
8551253 Na'Im et al. Oct 2013 B2
8551627 Shimada et al. Oct 2013 B2
8556566 Suzuki et al. Oct 2013 B1
8559131 Masuda et al. Oct 2013 B2
8562748 Chen et al. Oct 2013 B1
8565050 Bertero et al. Oct 2013 B1
8570844 Yuan et al. Oct 2013 B1
8580410 Onoue Nov 2013 B2
8584687 Chen et al. Nov 2013 B1
8591709 Lim et al. Nov 2013 B1
8592061 Onoue et al. Nov 2013 B2
8596287 Chen et al. Dec 2013 B1
8597723 Jung et al. Dec 2013 B1
8603649 Onoue Dec 2013 B2
8603650 Sonobe et al. Dec 2013 B2
8605388 Yasumori et al. Dec 2013 B2
8605555 Chernyshov et al. Dec 2013 B1
8608147 Yap et al. Dec 2013 B1
8609263 Chernyshov et al. Dec 2013 B1
8619381 Moser et al. Dec 2013 B2
8623528 Umezawa et al. Jan 2014 B2
8623529 Suzuki Jan 2014 B2
8634155 Yasumori et al. Jan 2014 B2
8658003 Bourez Feb 2014 B1
8658292 Mallary et al. Feb 2014 B1
8665541 Saito Mar 2014 B2
8668953 Buechel-Rimmel Mar 2014 B1
8674327 Poon et al. Mar 2014 B1
8685214 Moh et al. Apr 2014 B1
8696404 Sun et al. Apr 2014 B2
8711499 Desai et al. Apr 2014 B1
8743666 Bertero et al. Jun 2014 B1
8758912 Srinivasan et al. Jun 2014 B2
8787124 Chernyshov et al. Jul 2014 B1
8787130 Yuan et al. Jul 2014 B1
8791391 Bourez Jul 2014 B2
8795765 Koike et al. Aug 2014 B2
8795790 Sonobe et al. Aug 2014 B2
8795857 Ayama et al. Aug 2014 B2
20020060883 Suzuki May 2002 A1
20030022024 Wachenschwanz Jan 2003 A1
20040022387 Weikle Feb 2004 A1
20040072034 Shimokawa et al. Apr 2004 A1
20040132301 Harper et al. Jul 2004 A1
20040202793 Harper et al. Oct 2004 A1
20040202865 Homola et al. Oct 2004 A1
20040209123 Bajorek et al. Oct 2004 A1
20040209470 Bajorek Oct 2004 A1
20050036223 Wachenschwanz et al. Feb 2005 A1
20050142990 Homola Jun 2005 A1
20050150862 Harper et al. Jul 2005 A1
20050151282 Harper et al. Jul 2005 A1
20050151283 Bajorek et al. Jul 2005 A1
20050151300 Harper et al. Jul 2005 A1
20050155554 Saito Jul 2005 A1
20050167867 Bajorek et al. Aug 2005 A1
20050217353 Ishiyama Oct 2005 A1
20050263401 Olsen et al. Dec 2005 A1
20050282045 Sonoda Dec 2005 A1
20060147758 Jung et al. Jul 2006 A1
20060181697 Treves et al. Aug 2006 A1
20060207890 Staud Sep 2006 A1
20070070549 Suzuki et al. Mar 2007 A1
20070245909 Homola Oct 2007 A1
20080075845 Sonobe et al. Mar 2008 A1
20080093760 Harper et al. Apr 2008 A1
20090023017 Tomiyasu et al. Jan 2009 A1
20090117408 Umezawa et al. May 2009 A1
20090136784 Suzuki et al. May 2009 A1
20090169922 Ishiyama Jul 2009 A1
20090191331 Umezawa et al. Jul 2009 A1
20090202866 Kim et al. Aug 2009 A1
20090311557 Onoue et al. Dec 2009 A1
20100028721 Hamakubo et al. Feb 2010 A1
20100143752 Ishibashi et al. Jun 2010 A1
20100190035 Sonobe et al. Jul 2010 A1
20100196619 Ishiyama Aug 2010 A1
20100196740 Ayama et al. Aug 2010 A1
20100209601 Shimokawa et al. Aug 2010 A1
20100215992 Horikawa et al. Aug 2010 A1
20100232065 Suzuki et al. Sep 2010 A1
20100247965 Onoue Sep 2010 A1
20100261039 Itoh et al. Oct 2010 A1
20100279151 Sakamoto et al. Nov 2010 A1
20100300884 Homola et al. Dec 2010 A1
20100304186 Shimokawa Dec 2010 A1
20110097603 Onoue Apr 2011 A1
20110097604 Onoue Apr 2011 A1
20110171495 Tachibana et al. Jul 2011 A1
20110206947 Tachibana et al. Aug 2011 A1
20110212346 Onoue et al. Sep 2011 A1
20110223446 Onoue et al. Sep 2011 A1
20110244119 Umezawa et al. Oct 2011 A1
20110299194 Aniya et al. Dec 2011 A1
20110311841 Saito et al. Dec 2011 A1
20120069466 Okamoto et al. Mar 2012 A1
20120070692 Sato et al. Mar 2012 A1
20120077060 Ozawa Mar 2012 A1
20120127599 Shimokawa et al. May 2012 A1
20120127601 Suzuki et al. May 2012 A1
20120129009 Sato et al. May 2012 A1
20120140359 Tachibana Jun 2012 A1
20120141833 Umezawa et al. Jun 2012 A1
20120141835 Sakamoto Jun 2012 A1
20120148875 Hamakubo et al. Jun 2012 A1
20120156523 Seki et al. Jun 2012 A1
20120164488 Shin et al. Jun 2012 A1
20120170152 Sonobe et al. Jul 2012 A1
20120171369 Koike et al. Jul 2012 A1
20120175243 Fukuura et al. Jul 2012 A1
20120189872 Umezawa et al. Jul 2012 A1
20120196049 Azuma et al. Aug 2012 A1
20120207919 Sakamoto et al. Aug 2012 A1
20120225217 Itoh et al. Sep 2012 A1
20120251842 Yuan et al. Oct 2012 A1
20120251846 Desai et al. Oct 2012 A1
20120276417 Shimokawa et al. Nov 2012 A1
20120308722 Suzuki et al. Dec 2012 A1
20130040167 Alagarsamy et al. Feb 2013 A1
20130071694 Srinivasan et al. Mar 2013 A1
20130165029 Sun et al. Jun 2013 A1
20130175252 Bourez Jul 2013 A1
20130216865 Yasumori et al. Aug 2013 A1
20130230647 Onoue et al. Sep 2013 A1
20130314815 Yuan et al. Nov 2013 A1
20140011054 Suzuki Jan 2014 A1
20140044992 Onoue Feb 2014 A1
20140050843 Yi et al. Feb 2014 A1
20140151360 Gregory et al. Jun 2014 A1
Foreign Referenced Citations (12)
Number Date Country
62-066417 Mar 1987 JP
10-143838 May 1998 JP
10143838 May 1998 JP
2001-052327 Feb 2001 JP
2002-294266 Oct 2002 JP
2002293787 Oct 2002 JP
2004-152460 May 2004 JP
2006-012215 Jan 2006 JP
2007-193924 Aug 2007 JP
2010-108583 May 2010 JP
2008038799 Apr 2008 WO
WO 2008038799 Apr 2008 WO
Non-Patent Literature Citations (1)
Entry
Solvay Solexis. Fomblin Z Derivatives: Product Data Sheet, 2002.
Related Publications (1)
Number Date Country
20120127601 A1 May 2012 US