Although the conventional method 10 may provide the conventional PMR transducer 50, there may be drawbacks. At smaller track widths and device sizes, the write field capable of being produced by a smaller device may also be reduced. As a result, the conventional pole 60 may be unable to deliver a sufficiently high field at lower track widths. Accordingly, what is needed is an improved method for fabricating a PMR transducer.
A magnetic transducer having an air-bearing surface (ABS) is described. The magnetic transducer includes a pole and at least one coil for energizing the pole. The pole has a pole tip proximate to the ABS, a yoke distal from the ABS, and a bottom surface including a bottom bevel. At least the yoke includes at least one sidewall having a first angle and a second angle. The first angle is between the bottom surface and the at least one sidewall. The second angle is a constant distance along the at least one sidewall from the first angle.
The underlayer 152 has a bevel 153 and a yoke region. The bevel 153 is closer to the ABS than the yoke region and is thicker than the yoke region. For example, the bevel 153 may be approximately 2600 Angstroms thick at the ABS, while the yoke region may be approximately 1300 Angstroms thick. However, other thicknesses may be used. The bevel 153 is thus sloped at an angle greater than zero and less than ninety degrees from the ABS. In some embodiments, the bevel 153 in the underlayer 152 is separated from the ABS by a short portion perpendicular to the ABS. In some embodiments, the underlayer 152 is nonmagnetic. In other embodiments, the underlayer 152 may be magnetic. In such embodiments, a nonmagnetic gap is provided at least between the underlayer 152 and the pole 160.
In the embodiment shown, the intermediate layer 154 is substantially conformal with the underlayer 152. Stated differently, the top surface of the intermediate layer 154 has a topology that is substantially the same as the top surface of the underlayer 152. The thickness of the intermediate layer 154 is thus substantially constant above the bevel 153 and the yoke region of the underlayer 152. For example, in some embodiments, the thickness of the intermediate layer 154 is approximately 1300 Angstroms throughout the intermediate layer 154. The intermediate layer 154 is also nonmagnetic and, in some embodiments, insulating. In some embodiments, the intermediate layer 154 includes aluminum oxide. In some such embodiments, the intermediate layer 154 consists of aluminum oxide.
The hard mask layer 156 is on the intermediate layer 154. One portion of the hard mask layer 156 has a top surface substantially perpendicular to the ABS while another portion has a bevel 164. In some embodiments, however, the bevel 164 may be omitted. In such embodiments, the entire top surface of the hard mask layer 156 may be perpendicular to the ABS. Thus, the topology of the top of the hard mask layer 156 may be substantially flat even though the hard mask layer 156 is above the topology of the underlayer 152 and the intermediate layer 154. The hard mask 156 is, therefore, not conformal to underlying layer(s). In some embodiments, the hard mask layer 156 is desired to be removable using a different process than the intermediate layer 154. For example, materials such as Cr may be used for the hard mask layer 156. The hard mask layer 156 is also desired to be thick. For example, the portion of the hard mask layer 156 above the yoke of the underlayer 152 may be on the order of 2600 Angstroms thick. In some embodiments, the hard mask layer 156 and/or the intermediate layer 154 may have multiple sublayers. In such embodiments, each sublayer may serve as a hard mask for the layer below. In some embodiments, these sublayers are conformal to the layer below except for the top sublayer. The top sublayer, and thus the top of the hard mask 156 is still desired to be flat. However, formation of bevel 164 in the pole 160 may also form a bevel 164 in the hard mask 156.
The trench 158 has been formed in the intermediate layer 154 and the hard mask layer 156. A pole 160 has been formed in the trench 158. In some embodiments, the pole 160 is a PMR pole. In the embodiment shown, the entire pole 160 is within the trench 158. However, in other embodiments, a portion of the pole 160 may be outside of the trench 158. The pole 160 includes a ferromagnetic material that may have a high saturation magnetization. In some embodiments, a seed layer (not explicitly shown) also resides in the trench. If the seed layer is magnetic, then the seed layer may be considered part of the pole 160. However, if a nonmagnetic seed layer is used, then the pole 160 is considered separate from the seed layer.
The pole 160 has a pole tip proximate to the ABS, a yoke distal from the ABS, and a bottom bevel corresponding 162 to the bevel 153 in the underlayer 152. The pole 160 includes sidewalls. At least the yoke of the pole 160, each of the sidewalls has multiple sidewall angles. As can be seen in
In some embodiments, the layers 154 and 156 surrounding the pole tip may be removed and replaced by a gap layer and wraparound or side shield. Such shields would penetrate only a short distance from the ABS. For example, in such an embodiment, the shields would be present in the ABS view of
Because the sidewall angle φ is a constant distance from the bottom of the pole 160, the portion of the pole 160 above the sidewall angle φ increases through the bevel 162. This can be seen by a comparison of the pole 160 at the ABS as seen in
The transducer 150 may have improved performance. The pole 160 has multiple sidewall angles at least in the yoke region. As a result, a greater amount of magnetic material may be provided in the pole 160 without significantly altering the width of the device. For example, suppose the width of the device at the yoke is set as a design parameter. Multiple sidewall angles at the yoke allow for the pole 160 to contain more magnetic material while maintaining the width. This can be seen in
The pole 160′ is analogous to the pole 160. However, the pole 160′ only has a bottom bevel 162′ corresponding to the bevel 153′ in the underlayer 152′. Thus, the pole 160′ has multiple sidewall angles θ′ and φ′ at the ABS. In addition, the top surface of both the pole 160′ and the hard mask layer 156′ is perpendicular to the ABS.
The transducer 150′ may share the benefits of the transducer 150. In particular, the transducer 150′ may have an increased magnetic field and attendant improved ReOVW. The pole 160′ may also have an improved magnetic field gradient, which may improve the SNR. In some embodiments, the off track field may be maintained. In addition, the pole 160′ may have an increased pole tip magnetic volume, improve cross track magnetic anisotropy, and reduced domain lockup. Further, the transducer 150′ is consistent with current fabrication techniques. In some embodiments, in which the pole 160′ has multiple sidewall angles at the ABS, more magnetic material may be contained at the ABS without increasing the track width. Thus, performance of the pole may be enhanced while maintaining a lower track width.
The pole 160″ is analogous to the poles 160 and 160′. The pole 160″ also has bevels 162″ and 164″ analogous to the bevels 162 and 164. However, the ABS is not within the bevel 152″/162″ or the bevel 164″. Instead, the pole 160″ has substantially flat top and bottom close to the ABS. Thus, the height of the pole 160″ may not change much if the transducer 150″ is overlapped. Thus, the top and bottom surfaces the pole 160″ are substantially perpendicular to the ABS.
The transducer 150″ may share the benefits of the transducers 150 and 150′. In particular, the transducer 150″ may have an increased magnetic field and attendant improved ReOVW. The pole 160″ may also have an improved magnetic field gradient, which may improve the SNR. In some embodiments, the off track field may be maintained. In addition, the pole 160″ may have an increased pole tip magnetic volume, improved cross track magnetic anisotropy, and reduced domain lockup. Further, the transducer 150″ is consistent with current fabrication techniques. In some embodiments, in which the pole 160″ has multiple sidewall angles at the ABS, more magnetic material may be contained at the ABS without increasing the track width. Thus, performance of the pole may be enhanced while maintaining a lower track width.
The pole 160′″ is analogous to the poles 160, 160′, and 160″. The pole 160′″ also has bevels 162′″ and 164′″ analogous to the bevels 162 and 164. The pole 160′″ has sidewall angles θ′″ and φ′″. However, the transducer 150′″ is configured such that the ABS exposes both a portion of the pole 160′″ corresponding to the intermediate layer 154′″ and a portion of the pole 160′″ corresponding to the hard mask layer 160′″. As a result, the pole 160″ has two angles θ′″ and φ″ not only in the yoke region and bevel region, but also at the ABS.
The transducer 150′″ may share the benefits of the transducers 150, 150′, and 150″. In particular, the transducer 150′″ may have an increased magnetic field and attendant improved ReOVW. The pole 160′″ may also have an improved magnetic field gradient and improved SNR. In some embodiments, the off track field may be maintained. In addition, the pole 160′″ may have an increased pole tip magnetic volume, improved cross track magnetic anisotropy, and reduced domain lockup. Further, the transducer 150′″ is consistent with current fabrication techniques. In some embodiments, in which the pole 160′″ has multiple sidewall angles at the ABS, more magnetic material may be contained at the ABS without increasing the track width. Thus, performance of the pole may be enhanced while maintaining a lower track width.
The pole 160″″ has sidewall angles θ″″ and φ″″. In addition, the pole 160″″ has sidewall angle ψ in the yoke region and part of the bevel. In the embodiment shown, he sidewall angle ψ corresponds to the transition between the two hard mask layers 156A and 156B. However, the additional sidewall angle ψ may be formed for another reason. However, like the angle φ, the angle ψ is measured from a direction parallel to the bottom of the pole 160″″. The transducer 150″″ is configured such that the ABS exposes only a portion of the pole corresponding to the bottom sidewall angle θ. In a part of the bevel shown in
The transducer 150″″ may share the benefits of the transducers 150, 150′, 150″, and 150′″. In particular, the transducer 150″″ may have an increased magnetic field and attendant improved ReOVW. The pole 160″″ may also have an improved magnetic field gradient and improved SNR. In some embodiments, the off track field may be maintained. In addition, the pole 160″″ may have an increased pole tip magnetic volume, improve cross track magnetic anisotropy, and reduced domain lockup. Further, the transducer 150″″ is consistent with current fabrication techniques. In some embodiments, in which the pole 160″″ has multiple sidewall angles at the ABS, more magnetic material may be contained at the ABS without increasing the track width. Thus, performance of the pole 160″″ may be enhanced while maintaining a lower track width.
An underlayer 152 is provided, via step 202. The underlayer 152 has a bevel 153 and a thinner region corresponding to the yoke. In some embodiments, the underlayer 152 also has a region opposite to the yoke region that has substantially the same height as the top of the bevel 153. The bevel 153 is sloped at an angle greater than zero and less than ninety degrees from the ABS. Step 202 may include depositing the underlayer, masking a portion of the underlayer close to the location of the ABS, and milling the exposed portion of the underlayer at a milling angle corresponding to the desired slope. However, in other embodiments, step 202 may be performed in another manner.
An intermediate layer 154 is conformally deposited, via step 204. The intermediate layer 154 is thus substantially conformal with the underlayer 152. Stated differently, the top surface of the intermediate layer 154 has a topology that is substantially the same as the top surface of the underlayer 152. The thickness of the intermediate layer 154 is thus the same above the bevel 153, and the region of the underlayer 152 in the yoke region. The intermediate 154 is also nonmagnetic and, in some embodiments, insulating. In some embodiments, step 204 includes performing atomic layer deposition (ALD) of a material such as aluminum oxide. In some such embodiments, fast ALD (FALD) is used. The intermediate layer 154 may also be relatively thick. For example, in some embodiments, the thickness of the intermediate layer 154 is approximately 1300 Angstroms.
A hard mask layer 156 is provided on the intermediate layer 154, via step 206. The hard mask layer 156 has a top surface substantially perpendicular to the ABS. Thus, the topology of the top of the hard mask 156 is substantially flat even though the hard mask is above the bevel 153 and yoke region of the underlayer 152. The hard mask layer 156 provided in step 202 is desired to be removable using a different process than the intermediate layer 154. For example, materials such as Cr may be used for the hard mask layer 156 when the intermediate layer 154 is aluminum oxide. The hard mask layer 156 is also desired to be thick. For example, the portion of the hard mask layer 156 above the yoke region of the underlayer 152 may be on the order of 2600 Angstroms thick. Step 206 may be performed in a variety of ways. A portion of the intermediate layer 154 close to the ABS may be masked before deposition of the hard mask layer 156. This mask may then be removed, a planarization such as a CMP performed, and the region exposed by the mask refilled. Thus, a flat top surface of the hard mask layer 156 may be formed. In other embodiments, the hard mask layer 156 deposited and a planarization stop structure may be provided away from the region in which the pole is to be formed. A planarization such as a CMP may then be performed to provide the flat top surface of the hard mask layer 156. In still other embodiments a self-leveling deposition process might be able to be used. Further, in some embodiments, the hard mask layer 156 may have multiple sublayers. In such embodiments, each sublayer may serve as a hard mask for the layer below. Thus, these sublayers are also removable using different processes. Alternatively, the intermediate layer may be formed of multiple sublayers. In other embodiments, both the intermediate layer and the hard mask layer may include sublayers.
A portion of the hard mask layer 156 and the intermediate layer 154 is removed to provide a trench 158 therein, via step 208. The trench 158 has a bottom surface and sidewalls having multiple sidewall angles, θ and φ. Additional angles may also be provided using sublayers in the intermediate and/or hard mask layers. In other embodiments, a trench having multiple sidewall angles may be formed in another manner. Step 208 may include forming a photoresist mask on a portion of the hard mask layer corresponding to the trench, depositing an additional hard mask layer and removing the photoresist mask. Thus, an aperture corresponding to the trench is formed in the additional hard mask layer. One or more removal processes for the hard mask and intermediate layers may then be used. For example, a reactive ion etch (RIE) having a first etch chemistry may be used for the hard mask layer and a second RIE having a second etch chemistry may be used for the intermediate layer. Alternatively, other processes might be used for removing one or both of the hard mask and intermediate layers. If the intermediate and/or hard mask layer(s) include sublayers, then different removal processes may be used for each sublayer.
A pole 160 is provided, via step 210. At least a portion of the pole is in the trench formed in step 208. The pole has a pole tip proximate to the ABS, a yoke distal from the ABS, and a bottom bevel 162 corresponding to the bevel 153 in the underlayer. At least the yoke includes sidewalls, each of which has multiple sidewall angles corresponding to the angles θ and φ in the trench. Step 210 may include depositing a seed layer, depositing at least one magnetic pole layer, and planarizing the transducer. In some embodiments the seed layer may be magnetic, while in other embodiments, the seed layer may be nonmagnetic. The step of planarizing the transducer may include performing a CMP. Step 210 may also include forming a top, or trailing edge, bevel 164 in the pole 160. Thus, a pole 160, such as a perpendicular magnetic recording (PMR) pole may be formed. In some embodiments, the layers 154 and 156 around the pole 160 may be removed and a side gap and wraparound or side shield may also be formed.
Using the method 200, the PMR transducers 150, 150′, 150″, 150′″, and 150″″ may be fabricated. Thus, the benefits of the PMR transducers 150, 150′, 150″, 150′″, and 150″″ may be achieved.
Number | Name | Date | Kind |
---|---|---|---|
5801910 | Mallary | Sep 1998 | A |
6172848 | Santini | Jan 2001 | B1 |
6504675 | Shukh et al. | Jan 2003 | B1 |
6710973 | Okada et al. | Mar 2004 | B2 |
6722018 | Santini | Apr 2004 | B2 |
6731460 | Sasaki | May 2004 | B2 |
6738223 | Sato et al. | May 2004 | B2 |
6762911 | Sasaki et al. | Jul 2004 | B2 |
6813116 | Nakamura et al. | Nov 2004 | B2 |
6829819 | Crue, Jr. et al. | Dec 2004 | B1 |
6857181 | Lo et al. | Feb 2005 | B2 |
6870712 | Chen et al. | Mar 2005 | B2 |
6891697 | Nakamura et al. | May 2005 | B2 |
6903900 | Sato et al. | Jun 2005 | B2 |
6912106 | Chen et al. | Jun 2005 | B1 |
6944938 | Crue, Jr. et al. | Sep 2005 | B1 |
6947255 | Hsiao et al. | Sep 2005 | B2 |
6950277 | Nguy et al. | Sep 2005 | B1 |
6952325 | Sato et al. | Oct 2005 | B2 |
6975486 | Chen et al. | Dec 2005 | B2 |
6995949 | Nakamura et al. | Feb 2006 | B2 |
7006326 | Okada et al. | Feb 2006 | B2 |
7070698 | Le | Jul 2006 | B2 |
7100266 | Plumer et al. | Sep 2006 | B2 |
7133252 | Takano et al. | Nov 2006 | B2 |
7133253 | Seagle et al. | Nov 2006 | B1 |
7139153 | Hsiao et al. | Nov 2006 | B2 |
7159302 | Feldbaum et al. | Jan 2007 | B2 |
7185415 | Khera et al. | Mar 2007 | B2 |
7206166 | Notsuke et al. | Apr 2007 | B2 |
7212379 | Hsu et al. | May 2007 | B2 |
7245454 | Aoki et al. | Jul 2007 | B2 |
7251878 | Le et al. | Aug 2007 | B2 |
7253992 | Chen et al. | Aug 2007 | B2 |
7296338 | Le et al. | Nov 2007 | B2 |
7324304 | Benakli et al. | Jan 2008 | B1 |
7369359 | Fujita et al. | May 2008 | B2 |
7392577 | Yazawa et al. | Jul 2008 | B2 |
7430095 | Benakli et al. | Sep 2008 | B2 |
7441325 | Gao et al. | Oct 2008 | B2 |
7464457 | Le et al. | Dec 2008 | B2 |
7469467 | Gao et al. | Dec 2008 | B2 |
7508626 | Ichihara et al. | Mar 2009 | B2 |
7535675 | Kimura et al. | May 2009 | B2 |
7558019 | Le et al. | Jul 2009 | B2 |
7580222 | Sasaki et al. | Aug 2009 | B2 |
7639451 | Yatsu et al. | Dec 2009 | B2 |
7639452 | Mochizuki et al. | Dec 2009 | B2 |
7643246 | Yazawa et al. | Jan 2010 | B2 |
7663839 | Sasaki et al. | Feb 2010 | B2 |
7672079 | Li et al. | Mar 2010 | B2 |
7726009 | Liu et al. | Jun 2010 | B1 |
7748104 | Bonhote et al. | Jul 2010 | B2 |
7796360 | Im et al. | Sep 2010 | B2 |
7796361 | Sasaki et al. | Sep 2010 | B2 |
7841068 | Chen et al. | Nov 2010 | B2 |
7916425 | Sasaki et al. | Mar 2011 | B2 |
7924528 | Sasaki et al. | Apr 2011 | B2 |
8027125 | Lee et al. | Sep 2011 | B2 |
8116033 | Kameda et al. | Feb 2012 | B2 |
8125732 | Bai et al. | Feb 2012 | B2 |
8141235 | Zhang | Mar 2012 | B1 |
8149536 | Yang et al. | Apr 2012 | B1 |
8184399 | Wu et al. | May 2012 | B2 |
8233233 | Shen et al. | Jul 2012 | B1 |
8233234 | Hsiao et al. | Jul 2012 | B2 |
8233235 | Chen et al. | Jul 2012 | B2 |
8248728 | Yamaguchi et al. | Aug 2012 | B2 |
8254060 | Shi et al. | Aug 2012 | B1 |
8264792 | Bai et al. | Sep 2012 | B2 |
8270109 | Ohtsu | Sep 2012 | B2 |
8289649 | Sasaki et al. | Oct 2012 | B2 |
8305711 | Li et al. | Nov 2012 | B2 |
8320076 | Shen et al. | Nov 2012 | B1 |
8347488 | Hong et al. | Jan 2013 | B2 |
8400731 | Li et al. | Mar 2013 | B1 |
20030076630 | Sato et al. | Apr 2003 | A1 |
20040061988 | Matono et al. | Apr 2004 | A1 |
20040184191 | Ichihara et al. | Sep 2004 | A1 |
20050117251 | Matono et al. | Jun 2005 | A1 |
20060044677 | Li et al. | Mar 2006 | A1 |
20060158779 | Ota et al. | Jul 2006 | A1 |
20060174474 | Le | Aug 2006 | A1 |
20060225268 | Le et al. | Oct 2006 | A1 |
20060288565 | Le et al. | Dec 2006 | A1 |
20070211380 | Akimoto et al. | Sep 2007 | A1 |
20070236834 | Toma et al. | Oct 2007 | A1 |
20070247746 | Kim et al. | Oct 2007 | A1 |
20070258167 | Allen et al. | Nov 2007 | A1 |
20070263324 | Allen et al. | Nov 2007 | A1 |
20070283557 | Chen et al. | Dec 2007 | A1 |
20080002309 | Hsu et al. | Jan 2008 | A1 |
20080151437 | Chen et al. | Jun 2008 | A1 |
20090279206 | Yang et al. | Nov 2009 | A1 |
20100146773 | Li et al. | Jun 2010 | A1 |
20100277832 | Bai et al. | Nov 2010 | A1 |
20110051293 | Bai et al. | Mar 2011 | A1 |
20110222188 | Etoh et al. | Sep 2011 | A1 |
20120268845 | Sahoo et al. | Oct 2012 | A1 |