This application is a continuation in part of copending U.S. Patent Application Serial No. 919,206 filed Oct. 14, 1986, from which issued U.S. Pat. No. 4,842,782.
Number | Name | Date | Kind |
---|---|---|---|
3410203 | Fischbeck | Nov 1968 | |
3440388 | Otstot et al. | Apr 1969 | |
3549733 | Caddell | Dec 1970 | |
3657085 | Hoffmeister et al. | Apr 1972 | |
3742182 | Saunders | Jun 1973 | |
3972599 | Engel et al. | Aug 1976 | |
4032861 | Rothrock | Jun 1977 | |
4081655 | Gale | Mar 1978 | |
4108659 | Dini | Aug 1978 | |
4128752 | Gravel | Dec 1978 | |
4147402 | Chown | Apr 1979 | |
4156124 | Macken et al. | May 1979 | |
4194814 | Fischer et al. | Mar 1980 | |
4219721 | Kamen et al. | Aug 1980 | |
4275288 | Makosch et al. | Jun 1981 | |
4307046 | Neefe | Dec 1981 | |
4323317 | Hasegawa | Apr 1982 | |
4370175 | Levatter | Jan 1983 | |
4402579 | Poler | Sep 1983 | |
4414059 | Blum et al. | Nov 1983 | |
4430548 | Macken | Feb 1984 | |
4450593 | Poler | May 1984 | |
4455893 | Astero | Jun 1984 | |
4473735 | Steffen | Sep 1984 | |
4510005 | Nijman | Apr 1985 | |
4556524 | Cullis et al. | Dec 1985 | |
4563565 | Kampfer et al. | Jan 1986 | |
4642439 | Miller et al. | Feb 1987 | |
4644130 | Bachmann | Feb 1987 | |
4652721 | Miller et al. | Mar 1987 | |
4665913 | L'Esperance, Jr. | May 1987 | |
4669466 | L'Esperance | Jun 1987 | |
4718418 | L'Esperance, Jr. | Jan 1988 | |
4721379 | L'Esperance, Jr. | Jan 1988 | |
4729372 | L'Esperance, Jr. | Mar 1988 | |
4732148 | L'Esperance, Jr. | Mar 1988 | |
4770172 | L'Esperance, Jr. | Sep 1988 | |
4773414 | L'Esperance, Jr. | Sep 1988 | |
4798204 | L'Esperance, Jr. | Jan 1989 | |
4842782 | Portney et al. | Jun 1989 | |
4856513 | Muller | Aug 1989 |
Number | Date | Country |
---|---|---|
1038935 | Sep 1978 | CAX |
2546692 | Apr 1977 | DEX |
2510768 | Jul 1982 | FRX |
29627 | Feb 1983 | JPX |
97787 | Jun 1984 | JPX |
WO8705496 | Sep 1987 | WOX |
Entry |
---|
"Laser Applications in Semiconductor Microlithography"; Kanti Jain; Lasers & Applications; Sept. 1983, pp. 49-56. |
"Effective Deep Ultraviolet Photoetching of Polymethyl Methacrylate by an Excimer Laser"; Y. Kawamura, K. Toyoda and S. Namba; Appl. Phys. Lett. 40(5), 1 Mar. 1982; pp. 374-375. |
"Deep-Ultraviolet Spatial-Period Division Using an Excimer Laser", A. M. Hawryluk and Henry I. Smith; Optic Letters; vol. 7, No. 9, Sept. 1983; pp. 402-404. |
"Laser Ablation of Organic Polymers: Microscopic Models for Photochemical and Thermal Processes"; B. Garrison et al., Journal of Applied Physics, 57(8); Apr. 15, 1985; pp. 2909-2914. |
"Kinetics of the Ablative Photodecomposition of Organic Polymers in the Far-Ultraviolet (193 nm)"; IBM Thomas J. Watson Research Center; pp. 1-11. |
"Action of Far-Ultraviolet Light on Organic Polymer Films: Applications to Semiconductor Technology", IBM Thomas J. Watson Research Center; pp. 1-9. |
Number | Date | Country | |
---|---|---|---|
Parent | 919206 | Oct 1986 |