Patent Abstracts of Japan vol. 10, No. 34 (P-427) (2901) Feb. 8, 1986, and JP-A-62-182534 (Matsushita Denki Sangyo K.K) Sep. 18, 1985. |
Patent Abstracts of Japan, vol. 9, No. 270 (E-353) (1993) Oct. 26, 1985, and JP-A-60-115224 (Fuji Xerox K.K.) Jun. 21, 1985. |
Patent Abstracts of Japan vol. 10, No. 65 (E-388) (2122) Mar. 14, 1986, and JP-A-60-217627 (Hitachi Seisakusho K.K.) Oct. 31, 1985. |
Patent Abstracts of Japan vol. 10, No. 148 (C-350) May 29, 1986, and JP-A-61-005794 (Sumitomo Kagaku Kogyo K.K.) Jan. 11, 1986. |
Patent Abstracts of Japan vol. 13, No. 275 (C-610) (3623) Jun. 23, 1989, and JP-A-01-070168 (Hitachi Ltd.) Mar. 15, 1989. |
IBM Technical Disclosure Bulletin, vol. 17, No. 11, p. 3281, Apr., 1975 entitled Controlled gap photoresist spinning process. |
IBM Technical Disclosure Bulletin, vol. 19, No. 6, p. 2115, Nov. 1976 entitled Remover for Peripheral Resist Build-ups. |
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English Abstract of Japanese Ref.: 61-5794 (59-206077). |