MASK FILM FORMATION METHOD AND MASK FILM FORMATION APPARATUS

Abstract

A substrate and a mask are closely adhered to each other with a high alignment accuracy. While the both ends of the substrate are sandwiched between a substrate supporting member and a planar member, the center portion of the substrate is bent in a convex fashion by means of a substrate pressing member. On a mask pedestal, the mask is also bent in a convex fashion with respect to the substrate by means of a mask pressing member. After alignment in the plane direction between the mask and the substrate is performed, the mask and the substrate are made to approach each other and the convex portion is closely adhered to each other at an initial stage, and then the respective whole surfaces of the mask and the substrate are closely adhered to each other, while the substrate pressing member and the mask pressing member are moved backward. The mask pressing member may be omitted.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B are schematic diagrams each showing a mask film formation apparatus utilized in Example 1 or Example 4.

FIG. 2 is a plan view showing the position of a substrate supporting member and alignment marks in FIG. 1.

FIG. 3 is a view showing the shape of an alignment mark in a substrate.

FIG. 4 is a view showing the openings (mask pattern) of a mask and alignment marks.

FIGS. 5A and 5B are views for explaining comparative examples.

Claims

1. A film formation method for forming a film on a substrate by applying a film forming material through an opening of a mask, the method comprising: an alignment step of bending at least one of the substrate and the mask, and making the substrate and the mask align with each other along a ridge-line portion;a line contact step of bringing the substrate and the mask into contact with each other along the ridge-line portion; anda face contact step of bringing the substrate and the mask into face contact with each other.

2. The film formation method according to claim 1, wherein the line contact step has a step of abutting a planar member on the bent substrate or mask at a symmetric position with respect to a ridge line of the ridged-line portion.

3. The film formation method according to claim 1, wherein the face contact step further includes a step of fixing the substrate and the mask which are in face contact with each other through magnetism.

4. The film formation method according to claim 1, wherein the line contact step is a step of bringing the substrate and the mask into contact with each other along the ridge-line portion by use of a pressing means.

5. A mask film formation apparatus for forming a film on a substrate through an opening in a mask with the mask being closely adhered to the substrate, the apparatus comprising: a substrate supporting means for supporting the substrate in a state that the substrate is bent in a convex fashion; anda mask supporting means for supporting the mask,wherein, in the state that the substrate is bent in a convex fashion, the substrate supporting means and the mask supporting means are made to approach each other, a ridge-line portion of the substrate and the mask are brought into contact with each other, and then the substrate and the mask are closely adhered to each other.

6. The mask film formation apparatus according to claim 5, further comprising a magnetic suction means for fixing the substrate and the mask in a state that the substrate and the mask are closely adhered to each other.

7. A mask film formation apparatus for forming a film on the substrate through an opening with the mask being closely adhered to the substrate, the apparatus comprising: a mask support means for supporting the mask;a mask pressing means, capable of moving forward and backward, for bending the mask supported by the mask support means in a convex fashion; anda substrate supporting means for supporting the substrate,wherein, in a state that the mask is bent in a convex fashion by the mask pressing means, the substrate support means and the mask support means are made to approach each other and a ridge-line portion of the mask and the substrate are brought into contact with each other, and then the substrate and the mask are closely adhered to each other.

8. The mask film formation apparatus according to claim 7, further comprising a magnetic suction means for fixing the substrate and the mask in a state that the substrate and the mask are closely adhered to each other.