Patent Application
20150224704
This application claims priority to and the benefit of Korean Patent Application No. 10-2014-0016135, filed on Feb. 12, 2014, the content of which is hereby incorporated by reference in its entirety.
1. Field
Aspects of embodiments of the present invention relate to a master mold, an imprint mold, and a method of manufacturing a display device using (utilizing) the imprint mold. More particularly, aspects of embodiments of the present invention relate to a master mold and an imprint mold configured to accurately form a pattern on a display device, and a method of manufacturing a display device using (utilizing) the imprint mold.
2. Description of the Related Art
An imprint process is used to transfer an imprint pattern on a resin layer using an imprint mold on which the imprint pattern is formed. In particular, the imprint process is widely used to form a pattern on a thin film layer included in a display device. Forming the pattern on the thin film layer using the imprint process reduces process time and manufacturing cost as compared to forming the pattern using a photolithography process.
The imprint mold is typically manufactured using a master mold. Generally, since the imprint mold has better soft properties than a master mold, a lifespan of the imprint mold is often shorter than that of the master mold. Accordingly, when the imprint mold is utilized to mass produce display devices, the imprint mold may also be mass-produced using a master mold. Therefore, design of an imprint mold and a master mold in order to accurately form an imprint pattern on a thin film layer of a display device is critical.
Aspects of embodiments of the present invention are directed toward a master mold configured to accurately form a pattern on a display device.
Aspects of embodiments of the present invention are directed toward an imprint mold configured to accurately form a pattern on a display device.
Aspects of embodiments of the present invention are directed toward a method of forming a pattern on a display device using (utilizing) the imprint mold configured to accurately form a pattern on a display device.
According to one or more embodiments of the present invention, a master mold for manufacturing an imprint mold includes a base part and a plurality of protrusions extending from the base part. At least one first recess may be defined in a side portion of each of the protrusions of the plurality of protrusions.
Each of the protrusions may extend along a first direction, and the plurality of protrusions may be arranged on the base part along a second direction crossing the first direction to be spaced apart from each other.
The first recess may extend along the first direction, having its greatest depth at a centerline extending along the first direction at the side portion.
The first recess may be defined by a surface having a rounded shape.
At least one second recess may be defined in an upper portion of each of the protrusions.
The at least one second recess may extend along a centerline of the upper portion of each of the protrusions along the first direction.
Each of the protrusions may include auxiliary protrusions at two edges of an upper portion of each of the protrusions such that a corresponding one of the auxiliary protrusions is on each of the two edges.
Each of the auxiliary protrusions may have a polygonal cross-sectional shape.
At least one third recess may be defined on the base part and may extend along the first direction.
The first recess may be coupled to the third recess.
According to one or more embodiments of the present invention, an imprint mold for manufacturing a display device includes a base part and a plurality of protrusions extending from the base part. Each of the protrusions may include at least one first convex portion protruding from a side portion of each of the protrusions.
Each of the protrusions may extend along a first direction, and the protrusions may be arranged on the base part in a second direction crossing the first direction to be spaced apart from each other.
The first convex portion may extend in the first direction having a greatest thickness at a centerline extending along the first direction at the side portion.
Each of the protrusions may further include second convex portions at two upper edges facing each other such that a corresponding one of the second convex portions may be on each of the two upper edges.
Each of the second convex portions may have a polygonal cross-sectional shape.
The imprint mold may further include a third convex portion protruding from the base part and extending along the first direction between two adjacent protrusions of the plurality of protrusions. Each third convex portion may have a height less than that of each of the protrusions.
According to one or more embodiments of the present invention, a method of manufacturing a display device utilizing an imprint mold includes forming a pixel part on a first substrate, forming a preliminary grid polarization layer on at least one of the first substrate and a second substrate facing the first substrate, forming a resin layer on the preliminary grid polarization layer, imprinting the resin layer utilizing the imprint mold having a base part and a plurality of protrusions extending from the base part to form an imprinted resin layer, curing the imprinted resin layer to form mask layers, and patterning the preliminary grid polarization layer utilizing the mask layers as a mask to form grid polarization layers. A profile of a side portion of each of the mask layers may be flattened utilizing a first convex portion on a side portion of each of the protrusions during imprinting of the resin layer.
During the imprinting of the resin layer by the imprint mold, a profile of a residual layer under the mask layers may be flattened utilizing a second convex portion on an upper portion of each of the protrusions.
During the imprinting of the resin layer by the imprint mold, a profile of an upper portion of each of the mask layers may be flattened utilizing a third convex portion on the base part.
The grid polarization layers may have a pitch shorter than a wavelength of a visible light, and the visible light may be polarized or reflected by the grid polarization layers.
According to additional embodiments of the present invention, a shape of the mask layer used (utilized) to pattern the grid polarization layers included in the display device may be easily adjusted by using (utilizing) the imprint mold. Therefore, the profile of the side portion of each of the mask layers patterned using (utilizing) the imprint mold may be adjusted or manipulated to be in a straight line, thus, preventing or reducing deterioration of the optical function of the grid polarization layers.
The above and other advantages of embodiments of the present invention will become readily apparent by reference to the following detailed description when considered in conjunction with the accompanying drawings wherein:
It will be understood that when an element or layer is referred to as being “on,” “connected to,” or “coupled to,” another element or layer, it can be directly on, connected to, or coupled to the other element or layer, or intervening elements or layers may also be present. In contrast, when an element is referred to as being “directly on,” “directly connected to,” or “directly coupled to” another element or layer, there are no intervening elements or layers present. Like numbers refer to like elements throughout. As used herein, the term “and/or” includes any and all combinations of one or more of the associated listed items.
It will be understood that, although the terms first, second, etc. may be used herein to describe various elements, components, regions, layers, and/or sections, these elements, components, regions, layers, and/or sections are not be limited by these terms. These terms are only used to distinguish one element, component, region, layer, or section from another component, region, layer, or section. Thus, for example, a first element, component, region, layer, or section discussed below could be termed a second element, component, region, layer, or section without departing from the teachings of the present invention.
Spatially relative terms, such as “beneath,” “below,” “lower,” “above,” “upper,” and the like, may be used herein for ease of description to describe one element or feature's relationship to another element(s) or feature(s) as illustrated in the figures. It will be understood that the spatially relative terms are intended to encompass different orientations of the device in use or operation in addition to the orientation depicted in the figures. For example, if the device in the figures is turned over, elements described as “below” or “beneath” other elements or features would then be oriented “above” the other elements or features. Thus, the exemplary term “below” can encompass both an orientation of above and below. The device may be otherwise oriented (rotated 90 degrees or at other orientations) and the spatially relative descriptors used herein interpreted accordingly.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting. As used herein, the singular forms, “a,” “an,” and “the” are intended to include the plural forms as well, unless the context clearly indicates otherwise. It will be further understood that the terms “includes” and/or “including,” when used in this specification, specify the presence of stated features, integers, steps, operations, elements, components, and/or groups, but do not preclude the presence or addition of one or more other features, integers, steps, operations, elements, components, and/or groups thereof.
Unless otherwise defined, all terms (including technical and scientific terms) used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. It will be further understood that terms, such as those defined in commonly used dictionaries, should be interpreted as having a meaning that is consistent with their meaning in the context of the relevant art and will not be interpreted in an idealized or overly formal sense unless expressly so defined herein.
Hereinafter, the present invention will be explained in further detail with reference to the accompanying drawings.
The master mold 100 shown in the embodiments in
The master mold 100, according to this embodiment, includes an inorganic material, e.g., silicon nitride, silicon oxide, etc., but is not limited thereto or thereby. According to another embodiment, the master mold 100 may include an organic material such as silicon resin, epoxy resin, etc.
The master mold 100, according to an embodiment, includes a base part BP and a plurality of protrusions CP. In an embodiment, the base part BP has a plate shape and the protrusions CP extend or protrude from the base part BP.
The protrusions CP, in this embodiment, are on the base part BP and extend in a first direction D1. The protrusions CP, in this embodiment, are also arranged in a second direction D2 crossing the first direction D1 at regular intervals. In this embodiment, the first direction D1 may be substantially perpendicular to (or crossing) the second direction D2. Hereinafter, one protrusion CP of the plurality of protrusions CP will be described in further detail as a representative example.
The protrusion CP, in an embodiment, includes side portions P1 with adjacent side portions P1 facing each other, and a first recess H1 defined in each of the side portion P1. As an example, the first recess H1 extends in the first direction D1 and has a rounded contour or cross-sectional shape. The first recess H1, in an embodiment, is defined by inwardly recessing or making concave a surface area of each of the side portions P1, for example in an elliptical or circular contour. Accordingly, if a first imaginary line LN1 were defined along the first direction D1 to halve each of the side portions P1, as shown in the embodiment in
According to another embodiment, although the depth DT of the first recess H1 is greatest on the first imaginary line LN1 as described above, surfaces defining the first recess H1 may have a flat cross-sectional shape.
The protrusion CP, according to an embodiment, includes an upper portion P2 having a second recess H2 in the upper portion P2. The second recess H2, in this embodiment, extends along the first direction D1 and is located at a center of the upper portion P2 when viewed in the cross-sectional view. Therefore, if a second imaginary line LN2 were defined along the first direction D1 to halve the upper portion P2, as shown in the embodiment in
In this embodiment, surfaces defining the second recess H2 are flat, but are not limited thereto or thereby. According to another embodiment, the second recess H2 may be defined by a surface having a rounded contour or cross-sectional shape.
In an embodiment, third recesses H3 are defined in the base part BP. The third recess H3, according this embodiment, extend along the first direction D1 and are located at both or each respective side of the protrusion CP. In this embodiment, surfaces that define the third recesses H3 are flat, but are not limited thereto, and each third recess H3 may be defined by a surface having a rounded contour or cross-sectional shape.
Referring to the embodiments shown in
The protrusion CP-1, according to this embodiment, includes auxiliary protrusions P3. The auxiliary protrusions P3, in this embodiment, are on an upper portion P2-1 of the protrusion CP-1 and located at two edges EG of the upper portion P2-1 which face each other, in a one-to-one relationship. In addition, each of the auxiliary protrusions P3 may have a polyhedron cross-sectional shape, and, the auxiliary protrusions P3 may be integrally formed with the protrusion CP-1.
As shown in the embodiments in
The protrusion CP-1, in an embodiment, includes side portions P1-1 with adjacent side portions P1-1 facing each other, and a first recess H1-1 defined in each of the side portions P1-1. In this embodiment, the first recess H1-1 extends along the first direction D1 and is defined by removing or blocking-out a portion of each of the side portions P1-1. When viewed in a cross-sectional view, flat surfaces define the first recess H1-1 in this embodiment, but the first recess H1-1 is not limited thereto or thereby. For example, according to another embodiment, the first recess H1-1 may be defined by a rounded contour or cross sectional-shaped.
In an embodiment, third recesses H3-1 are defined in the base part BP-1. The third recesses H3-1, in this embodiment, extend along the first direction D1 and are located at both or each respective side of the protrusion CP.
In this embodiment, the first recesses H1-1 are connected to the third recesses H3-1 in a one-to-one relationship such that a volume of a connected combination of a first recess H1-1 and a third recess H3-1 may be substantially the same as a sum of a volume of each of the first recess H1-1 and the third recess H3-1 taken separately and then summed.
Flat surfaces may define a cross-section of the third recess H3-1. However, according to another embodiment, the third recess H3-1 may be defined by a rounded contour or cross-sectional-shape.
Referring to the embodiment shown in
The protrusion CP-2, in this embodiment, includes auxiliary protrusions P3-1. The auxiliary protrusions P3-1, in this embodiment, are on an upper portion P2-1 of the protrusion CP-2 and located at two edges EG (for example, as shown in
As shown in the embodiments in
Referring to the embodiment shown in
As described with reference to the embodiment shown in
In an embodiment, first recesses H1-2 are defined in adjacent side portions P1-2 facing each other at each of the protrusions CP-3, and third recesses H3-2 are formed in the base part BP-2 connected to the first recesses H1-2 in a one-to-one relationship. In the this embodiment, a surface defining each of the first recesses H1-2 and a surface defining each of the third recesses H3-2 may have a rounded contour or cross-sectional shape.
Referring to the embodiments shown in
The imprint mold 200, in an embodiment, includes an organic material, e.g., a silicon resin, an epoxy resin, etc. The imprint mold 200, in an embodiment, includes the base part BP′ and a plurality of protrusions CP′. In an embodiment, the base part BP′ has a plate shape and the protrusions CP′ extend from the base part BP′.
In an embodiment, the protrusions CP′ are on the base part BP′ and extend along a first direction D1. The protrusions CP′, in an embodiment, are also arranged along a second direction D2 crossing the first direction D1 at regular intervals. In an embodiment, the first direction D1 may be substantially perpendicular to the second direction D2. Hereinafter, one protrusion CP′ of the plurality of protrusions CP′ will be described in further detail as a representative example.
The protrusion CP′, in an embodiment, includes side portions P1′ with adjacent side portions P1′ facing each other, and a first convex portion C1 protruding from each of the side portions P1′. The first convex portion C1 may be defined by a surface extending along the first direction D1 and having a rounded convex contour or cross-sectional shape. More specifically, the first convex portion C1, in an embodiment, is defined by a protrusion outward at the center of each of the side portions P1′, as shown in
According to another embodiment, although the thickness WT of the first convex portion C1 is greatest on the third imaginary line LN3 as described above, surfaces defining the first convex portion C1 may have a flat cross-sectional shape.
The protrusion CP′, according to an embodiment, includes an upper portion P2′ having second convex portions C2 formed on the upper portion P2′. The second convex portions C2, in this embodiment, are at two edges of the upper portion P2′ which face each other, and each of the second convex portions C2 has a polygonal contour or cross-sectional shape. According to another embodiment, each of the second convex portions C2 may have a semi-circular contour or cross-sectional shape.
In this embodiment, the imprint mold 200 further includes third convex portions C3 extending from the base part BP′ along the first direction Dl. The protrusion CP′, in this embodiment, is between two adjacent third convex portions C3, and each of the third convex portions C3 has a first height HT1 less than a height HT2 of the protrusion CP′ (measured to the upper portion P2′). Each of the third convex portions C3, in this embodiment, has a polygonal contour or cross-sectional shape, but is not limited thereto or thereby. For example, according to another embodiment, each of the third convex portions C3 has a semi-circular contour or cross-sectional shape.
Referring to the embodiments illustrated in
In this embodiment, after the resin layer 200-1 imprinted on the master mold 100 is cured by the ultraviolet ray UV, the master mold 100 is separated from the resin layer 200-1. As a result, the pattern of the master mold 100 is transferred to the resin layer 200-1, creating the imprint mold 200. Since the imprint mold 200 is manufactured by imprinting the master mold 100, in this embodiment, the first convex portions C1 are formed on the imprint mold 200 corresponding to and/or complementary with the first recesses H1 of the master mold 100 in a one-to-one relationship. In this embodiment, the third convex portions C3 are formed on the imprint mold 200 corresponding to and/or complementary with the second recesses H2 of the master mold 100 in a one-to-one relationship, and the second convex portions C2 are formed on the imprint mold 200 corresponding to and/or complementary with the third recesses H3 in a one-to-one relationship.
Referring to the embodiment illustrated in
The thin film transistor TR, in an embodiment, is formed by forming a gate electrode GE on the first substrate SB1, forming an active pattern AP on the gate electrode GE with a first insulating layer L1 between the gate electrode GE and the active pattern AP, and forming a source electrode SE and a drain electrode DE on the active pattern AP and on the first insulating layer L1, the source electrode SE and the drain electrode DE being spaced apart from each other and overlapping the active pattern AP.
In an embodiment, after forming the thin film transistor TR, a second insulating layer L2 that covers the thin film transistor TR and a third insulating layer L3 are sequentially formed and a contact hole is formed through the third insulating layer L3. The pixel electrode PE, in this embodiment, is formed on the third insulating layer L3 and connected or coupled to the drain electrode DE through the contact hole in the third insulating layer L3. As a result, a display substrate 110 including the pixel part PXL is manufactured, according to the embodiment described above.
In an embodiment, to manufacture an opposite substrate 120 coupled to the display substrate 110, a color filter CF and a light blocking layer BM are formed on a second substrate SB2. The color filter CF, in this embodiment, is formed at a position corresponding to that of the pixel electrode PE, and the light blocking layer BM is formed at a position corresponding to that of the thin film transistor TR. According to this embodiment, a common electrode CE is formed to cover the light blocking layer BM and the color filter CF, thus, completing the manufacturing process of the opposite substrate 120, according to an embodiment.
The manufacturing method of the display substrate 110 and the opposite substrate 120 is not limited to the above-mentioned method. For example, the color filter CF may be formed on the first substrate SB1 instead of the third insulating layer L3 of the display substrate 110.
In an embodiment, after the display substrate 110 and the opposite substrate 120 have been manufactured, a liquid crystal layer LC is formed between the display substrate 110 and the opposite substrate 120, with the display substrate 110 and the opposite substrate 120 being coupled to each other to complete the manufacture of the display panel 150.
Referring to the embodiment illustrated in
In an embodiment, after the preliminary grid polarization layer L30 is formed, an auxiliary layer L20 is formed on the preliminary grid polarization layer L30 extending over the preliminary grid polarization layer L30. In an embodiment where the preliminary grid polarization layer L30 is formed of aluminum, the auxiliary layer L20 may be formed of titanium, thus preventing or reducing the occurrence of a hillock phenomenon due to protuberances formed on the surface of the preliminary grid polarization layer L30 while aluminum included in the preliminary grid polarization layer L30 expands at a high temperature.
In an embodiment, a resin layer L10 is formed on the auxiliary layer L20. In this embodiment, the resin layer L10 may include a polymer resin, e.g., an epoxy resin, and a photo-initiator.
Referring to the embodiments illustrated in
In an embodiment, when the resin layer L10 is pressed by the imprint mold 200, the resin of the resin layer L10, which is pressed by the protrusions CP of the imprint mold 200, reflows to form the residual layer RL, and substantially simultaneously, the concave portion CV is formed at a position corresponding and/or complementary to the protrusion CP. In addition, the first mask layers M1 are formed to correspond to the concave portions C1, C2, and C3 of the imprint mold 200 while the resin layer L10 is pressed by the imprint mold 200.
In an embodiment, the imprint mold 200 includes polymer resin, thus the imprint mold 200 has soft material properties. In this embodiment, the first mask layers M1 have a pitch that is tens of nanometers shorter than that of visible light. In an embodiment, the resin layer L10 includes a polymer resin having viscosity such that when the resin layer L10 is pressed by the imprint mold 200, a width in the concave portions of the imprint mold 200 becomes wider due to a low dispersion property of the polymer resin or attractive force occurring between molecules of the polymer resin.
In other examples, when the imprint mold 200 excludes the first, second, and third protrusions C1, C2, and C3, and each of the protrusions CP has a tetrahedral shape, the shape of the protrusions CP may not be maintained by the resin layer L10 while the resin layer L10 is pressed by the imprint mold 200. Accordingly, the profile associated with the first mask layers M1 may have a round shape along an imaginary line CL.
However, according to an embodiment, when the resin layer L10 is pressed by the imprint mold 200, a first force F1 is applied to the resin layer L10 by the first convex portions C1 such that the profile of side portions of the first mask layers M1 becomes flat near the straight line. In this embodiment, a second force F2 is applied to the resin layer L10 by the second convex portions C2 such that the profile of the upper portions of the first mask layers M1 becomes flat near the straight line. Further, in this embodiment, a third force F3 is applied to the resin layer L10 by the third convex portions C3 such that the profile of the residual layer RL becomes flat near the straight line.
Referring to the embodiments illustrated in
In an embodiment, the first mask layers M1 are partially etched to form second mask layers M2 when the residual layer RL, the auxiliary layer L20, and the preliminary grid polarization layer L30 are etched. Therefore, in this embodiment, each of the first mask layers M1 has a first thickness T1 and each of the second mask layers M2 has a second thickness T2 less than the first thickness T1.
Referring to the embodiment illustrated in
In other examples, when the cross-sectional profile of the first mask layers and the residual layer has a rounded shape along the imaginary line CL (as shown in
Referring to the embodiments illustrated in
In an embodiment, the grid polarization layers GP extend along the first direction D1 and are arranged along the second direction D2 at the pitch PT (as shown in
In an embodiment, the S-polarized light component reflected by the grid polarization layers GP is re-reflected by a reflection member included in the backlight unit BL and converted to a reflection light LT1 having another P-polarized light component and another S-polarized light component. The P-polarized light component of the reflection light LT1, in this embodiment, transmits through the grid polarization layers GP, and the S-polarized light component of the reflection light LT1 is re-reflected by the grid polarization layers GP. According to the above-mentioned function of the grid polarization layers GP, an efficiency of the emitted light LT0 used (utilized) to display an image on the display panel 150 may be improved as a result of the grid polarization layers GP.
Although embodiments of the present invention have been described above, it is understood that the present invention should not be limited to these exemplary embodiments, but various changes and modifications can be made by one ordinary skilled in the art within the spirit and scope of the present invention and as hereinafter claimed and equivalents thereof.
| Number | Date | Country | Kind |
|---|---|---|---|
| 10-2014-0016135 | Feb 2014 | KR | national |
