Claims
- 1. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette structured and arranged to be directly and substantially uniformly heated by resistance or impedance of the at least one spinnerette;
- a feeding mechanism effecting extrusion of polymer composition through said at least one spinnerette to extrude molten filaments; and
- a quenching system positioned to immediately quench molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 2. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- means for feeding polymer composition through said at least one spinnerette to extrude molten filaments;
- means for directly and substantially uniformly heating by resistance or impedance said at least one spinnerette to a temperature of at least about 230.degree. C.; and
- means for quenching molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 3. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- means for feeding polymer composition through said at least one spinnerette to extrude molten filaments;
- at least one apertured element positioned upstream of said at least one spinnerette;
- means for substantially uniformly heating said at least one apertured element to a temperature of at least about 250.degree. C.; and
- means for quenching molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 4. The apparatus according to claim 3, wherein said at least one apertured element is positioned about 1 to 4 mm upstream of said at least one spinnerette.
- 5. The apparatus according to claim 4, wherein said at least one apertured element comprises at least one apertured plate.
- 6. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- means for feeding polymer composition to said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette to extrude molten filaments;
- means for substantially uniformly heating said at least one spinnerette to obtain sufficient heating of the polymer composition to obtain a skin-core filament structure upon quenching in an oxidative atmosphere; and
- means for immediately quenching molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, so as to effect oxidative chain scission degradation of at least a surface of the molten filaments.
- 7. The apparatus according to claim 6, wherein said means for heating comprise elements for substantially uniformly heating said at least one spinnerette to a temperature of at least about 230.degree. C.
- 8. The apparatus according to claim 7, wherein said means for heating comprise elements for substantially uniformly heating said at least one spinnerette to a temperature of at least about 250.degree. C.
- 9. The apparatus according to claim 6, wherein said means for heating comprise elements for substantially uniformly heating said at least one spinnerette to a temperature of about 230.degree. C. to 370.degree. C.
- 10. The apparatus according to claim 8, wherein said at least one spinnerette comprises about 500 to 150,000 capillaries.
- 11. The apparatus according to claim 6, wherein said at least one spinnerette comprises about 500 to 150,000 capillaries.
- 12. The apparatus according to claim 11, wherein said at least one spinnerette comprises about 30,000 to 120,000 capillaries.
- 13. The apparatus according to claim 12, wherein said at least one spinnerette comprises about 30,000 to 70,000 capillaries.
- 14. The apparatus according to claim 13, wherein said at least one spinnerette comprises about 30,000 to 45,000 capillaries.
- 15. The apparatus according to claim 11, wherein said at least one spinnerette comprises capillaries having a cross-sectional area of about 0.02 to 0.2 mm.sup.2, and a length of about 1 to 20 mm.
- 16. The apparatus according to claim 15, wherein said capillaries have a recess at a lower portion.
- 17. The apparatus according to claim 16, wherein said recess has a cross-sectional area of about 0.05 to 0.4 mm.sup.2, and a length about 0.25 mm to 2.5 mm.
- 18. The apparatus according to claim 17, wherein said recess has a cross-sectional area of about 0.3 mm.sup.2 and a length of about 0.5 mm.
- 19. The apparatus according to claim 15, wherein said at least one spinnerette comprises capillaries having a cross-sectional area of about 0.07 mm.sup.2, and a length of about 1 to 5 mm.
- 20. The apparatus according to claim 19, wherein said at least one spinnerette comprises capillaries having a length of about 1.5 mm.
- 21. The apparatus according to claim 11, wherein said at least one spinnerette comprises capillaries having a tapered portion.
- 22. The apparatus according to claim 21, wherein said at least one spinnerette comprises countersunk capillaries having a total length of about 3 to 20 mm; a first cross-sectional area of about 0.03 mm.sup.2 to 0.2 mm.sup.2 at a lower portion; a maximum cross-sectional area at a surface of said at least one spinnerette of about 0.07 mm.sup.2 to 0.5 mm.sup.2 ; and said countersunk capillaries taper from said maximum cross-sectional area to said first cross-sectional area at an angle of about 20.degree. to 60.degree..
- 23. The apparatus according to claim 22, wherein said countersunk capillaries taper from said maximum cross-sectional area to said first cross-sectional area at an angle of about 35.degree. to 45.degree..
- 24. The apparatus according to claim 23, wherein said countersunk capillaries taper from said maximum cross-sectional area to said first cross-sectional area at an angle of about 45.degree..
- 25. The apparatus according to claim 22, wherein said countersunk capillaries have a total length of about 7-10 mm.
- 26. The apparatus according to claim 25, wherein said countersunk capillaries have a maximum cross-sectional area of about 0.2 mm.sup.2.
- 27. The apparatus according to claim 26, wherein said countersunk capillaries include a distance between said maximum cross-sectional area to said first cross-sectional area of about 0.15 to 0.4 mm.sup.2.
- 28. The apparatus according to claim 21, wherein said at least one spinnerette comprises counterbored, countersunk capillaries.
- 29. The apparatus according to claim 28, wherein said counterbored, countersunk capillaries comprise an upper tapered portion having a diameter of about 0.6 mm and a length of about 0.5 mm; an upper capillary having a diameter of about 0.5 mm and a length of about 3.5 mm; a middle tapered portion having a length of about 0.1 mm; and a lower capillary having a diameter of about 0.35 mm and a length of about 1.5 mm.
- 30. The apparatus according to claim 21, wherein said at least one spinnerette comprises counterbored capillaries.
- 31. The apparatus according to claim 30, wherein said counterbored capillaries comprise an upper capillary having a diameter of about 0.5 mm and a length of about 4 mm; a middle tapered portion having a length of about 0.1 mm; and a lower capillary having a diameter of about 0.35 mm and a length of about 2 mm.
- 32. Apparatus for spinning polymer filaments comprising:
- at least one spinnerette;
- means for feeding polymer composition to said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette to extrude molten filaments;
- at least one heated apertured plate positioned upstream and in the vicinity of said at least one spinnerette; and
- means for immediately quenching molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, so as to effect oxidative chain scission degradation of at least a surface of the molten filaments.
- 33. The apparatus according to claim 32, wherein said means for heating comprise elements for heating said at least one heated apertured plate to a temperature of at least about 250.degree. C.
- 34. The apparatus according to claim 33, wherein said means for heating comprise elements for heating said at least one heated apertured plate to a temperature of about 250.degree. C. to 370.degree. C.
- 35. The apparatus according to claim 34, wherein said means for heating comprise elements for heating said at least one heated apertured plate to a temperature of about 280.degree. C. to 350.degree. C.
- 36. The apparatus according to claim 35, wherein said means for heating comprise elements for heating said at least one heated apertured plate to a temperature of about 300.degree. C. to 350.degree. C.
- 37. The apparatus according to claim 32, wherein said at least one heated apertured plate is positioned about 1 to 4 mm upstream of said at least one spinnerette.
- 38. The apparatus according to claim 37, wherein said at least one heated apertured plate is positioned about 2 to 3 mm upstream of said at least one spinnerette.
- 39. The apparatus according to claim 38, wherein said at least one heated apertured plate is positioned about 2.5 mm upstream of said at least one spinnerette.
- 40. The apparatus according to claim 32, wherein said at least one heated apertured plate and said at least one spinnerette comprise a corresponding number of capillaries and pattern.
- 41. The apparatus according to claim 32, wherein said at least one heated apertured plate and said at least one spinnerette comprise a different number of capillaries.
- 42. The apparatus according to claim 33, wherein said at least one heated apertured plate and said at least one spinnerette comprise a different pattern.
- 43. The apparatus according to claim 40, wherein capillaries in said at least one heated apertured plate comprise a cross-sectional area that is up to about 30% larger than a cross-sectional area of capillaries in said at least one spinnerette.
- 44. The apparatus according to claim 43, wherein said capillaries in said heated apertured plate comprise a cross-sectional area of about 0.03 mm.sup.2 to 0.3 mm.sup.2.
- 45. The apparatus according to claim 44, wherein said capillaries in said heated apertured plate comprise a cross-sectional area of about 0.1 mm.sup.2.
- 46. The apparatus according to claim 40, wherein said at least one spinnerette and said at least one heated apertured plate each comprise about 500 to 150,000 capillaries.
- 47. The apparatus according to claim 46, wherein said at least one spinnerette and said at least one heated apertured plate each comprise about 30,000 to 120,000 capillaries.
- 48. The apparatus according to claim 47, wherein said at least one spinnerette and said at least one heated apertured plate each comprise about 30,000 to 70,000 capillaries.
- 49. The apparatus according to claim 48, wherein said at least one spinnerette and said at least one heated apertured plate each comprise about 30,000 to 45,000 capillaries.
- 50. The apparatus according to claim 40, wherein said at least one spinnerette and said at least one heated apertured plate comprise capillaries having a cross-sectional area of about 0.03 mm.sup.2 to 0.3 mm.sup.2, and a length of about 1 to 5 mm.
- 51. The apparatus according to claim 50, wherein said at least one spinnerette and said at least one heated apertured plate comprise capillaries having a cross-sectional area of about 0.1 mm.sup.2.
- 52. The apparatus according to claim 51, wherein said at least one spinnerette and said at least one heated apertured plate comprise capillaries having a length of about 1.5 mm.
- 53. The apparatus according to claim 41, wherein said at least one spinnerette and said at least one heated apertured plate each comprise about 500 to 150,000 capillaries.
- 54. The apparatus according to claim 41, wherein said at least one spinnerette and said at least one heated apertured plate comprise capillaries having a cross-sectional area of about 0.03 mm.sup.2 to 0.3 mm.sup.2, and a length of about 1 to 5 mm.
- 55. The apparatus according to claim 42, wherein said at least one spinnerette and said at least one heated apertured plate each comprise about 500 to 150,000 capillaries.
- 56. The apparatus according to claim 42, wherein said at least one spinnerette and said at least one heated apertured plate comprise capillaries having a cross-sectional area of about 0.03 mm.sup.2 to 0.3 mm.sup.2, and a length of about 1 to 5 mm.
- 57. The apparatus according to claim 6, wherein said means for quenching comprise means for radial quenching.
- 58. The apparatus according to claim 57, wherein said means for radial quenching comprise means for effecting flow of an oxidative gas at a flow rate of about 3,000 to 12,000 ft/min.
- 59. The apparatus according to claim 58, wherein said means for radial quenching comprise means for effecting flow of an oxidative gas at a flow rate of about 4,000 to 9,000 ft/min.
- 60. The apparatus according to claim 59, wherein said means for radial quenching comprise means for effecting flow of an oxidative gas at a flow rate of about 5,000 to 7,000 ft/min.
- 61. The apparatus according to claim 6, wherein said means for quenching comprise means for blowing an oxidative gas through at least one nozzle.
- 62. The apparatus according to claim 61, comprising means for adjustably directing flow of oxidative gas from said at least one nozzle to a central portion of said at least one spinnerette.
- 63. The apparatus according to claim 62, wherein said means for blowing comprise means for effecting flow of an oxidative gas at a flow rate of about 3,000 to 12,000 ft/min.
- 64. The apparatus according to claim 63, wherein said means for blowing comprise means for effecting flow of an oxidative gas at a flow rate of about 4,000 to 9,000 ft/min.
- 65. The apparatus according to claim 64, wherein said means for blowing comprise means for effecting flow of an oxidative gas at a flow rate of about 5,000 to 7,000 ft/min.
- 66. The apparatus according to claim 62, wherein said at least one nozzle has an angle of about 0.degree. to 60.degree. with respect to a plane longitudinally passing through said at least one spinnerette.
- 67. The apparatus according to claim 66, wherein said angle is about 10.degree. to 60.degree..
- 68. The apparatus according to claim 66, wherein said angle is about 0.degree. to 45.degree..
- 69. The apparatus according to claim 68, wherein said angle is about 0.degree. to 25.degree..
- 70. The apparatus according to claim 6, including an additional means for heating the polymer composition to a temperature of about 200.degree. C. to 300.degree. C. prior to the polymer composition reaching said means for heating.
- 71. The apparatus according to claim 6, wherein said means for heating comprise means for directly heating said at least one spinnerette by impedance or resistance.
- 72. The apparatus according to claim 6, wherein said means for heating comprise means for inductance heating.
- 73. The apparatus according to claim 6, wherein said means for heating comprise means for magnetic heating.
- 74. The apparatus according to claim 6, wherein said means for feeding a polymer composition to said at least one spinnerette is capable of obtaining a spinning speed of about 80 to 100 meters per minute through said at least one spinnerette.
- 75. The apparatus according to claim 6, wherein said at least one spinnerette has a width of about 30-150 mm and a length of about 300 to 700 mm.
- 76. The apparatus according to claim 75, wherein said at least one spinnerette has a width of about 40 mm and a length of about 450 mm.
- 77. The apparatus according to claim 75, wherein said at least one spinnerette has a width of about 100 mm and a length of about 510 mm.
- 78. The apparatus according to claim 6, wherein said at least one spinnerette has a diameter of about 100 to 600 mm.
- 79. The apparatus according to claim 78, wherein said at least one spinnerette has a diameter of about 400 mm.
- 80. The apparatus according to claim 78, wherein said means for quenching comprise means for radial quenching.
- 81. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- means for feeding polymer composition to said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette to extrude molten filaments;
- means for substantially uniformly heating said at least one spinnerette to a temperature of at least about 230.degree. C.; and
- means for immediately quenching molten filaments of extruded polymer in an oxidative atmosphere at a flow rate of about 3,000 to 12,000 ft/min, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 82. The apparatus according to claim 81, wherein said means for heating comprise elements for substantially uniformly heating said at least one spinnerette to a temperature of at least about 250.degree. C.
- 83. The apparatus according to claim 81, wherein said means for heating comprise elements for substantially uniformly heating said at least one spinnerette to a temperature of about 230.degree. C. to 370.degree. C.
- 84. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- means for feeding polymer composition to said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette to extrude molten filaments;
- at least one element positioned upstream of said at least one spinnerette, said at least one element permitting passage of polymer composition;
- means for substantially uniformly heating said at least one element to a temperature of at least about 250.degree. C.;
- said at least one element and said at least one spinnerette being positioned sufficiently close to each other so that as the polymer exits said at least one spinnerette the polymer maintains a sufficient temperature to obtain a skin-core structure upon quenching in an oxidative atmosphere; and
- means for immediately quenching molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 85. The apparatus according to claim 84, wherein said at least one element is positioned apertured plate is positioned about 1 to 4 mm upstream of said at least one spinnerette.
- 86. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- means for feeding polymer composition to said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette to extrude molten filaments;
- at least one apertured plate positioned upstream of said at least one spinnerette;
- means for substantially uniformly heating said at least one apertured plate to a temperature of at least about 250.degree. C.; and
- means for quenching molten filaments of extruded polymer in an oxidative atmosphere having a flow rate of about 3,000 to 12,000 ft/min, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 87. The apparatus according to claim 86, wherein said means for heating comprise elements for substantially uniformly heating said at least one apertured plate to a temperature of about 250.degree. C. to 370.degree. C.
- 88. The apparatus according to claim 87, wherein said means for heating comprise elements for substantially uniformly heating said at least one apertured plate to a temperature of about 280.degree. C. to 350.degree. C.
- 89. The apparatus according to claim 88, wherein said means for heating comprise elements for substantially uniformly heating said at least one apertured plate to a temperature of about 300.degree. C. to 350.degree. C.
- 90. The apparatus according to claim 86, wherein said at least one apertured plate is positioned about 1 to 4 mm upstream of said at least one spinnerette.
- 91. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- a feeding mechanism effecting extrusion of polymer composition through said at least one spinnerette to extrude molten filaments;
- at least one apertured element positioned upstream and in the vicinity of said at least one spinnerette;
- elements associated with said apertured element to substantially uniformly heat said at least one apertured element to a temperature of at least about 250.degree. C.; and
- a quenching system adapted to quench molten filaments of extruded polymer in an oxidative atmosphere, as the molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 92. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- elements associated with said at least one spinnerette to substantially uniformly heat said at least one spinnerette to obtain sufficient heating of the polymer composition to obtain a skin-core filament structure upon quenching in an oxidative atmosphere;
- spinning elements associated with said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette; and
- a quenching system positioned to immediately quench molten filaments of extruded polymer in an oxidative atmosphere, as molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 93. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- elements associated with said at least one spinnerette to substantially uniformly heat said at least one spinnerette to a temperature of at least about 230.degree. C.;
- spinning elements associated with said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette; and
- a quenching system positioned to immediately quench molten filaments of extruded polymer in an oxidative atmosphere at a flow rate of about 3,000 to 12,000 ft/min, as molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 94. Apparatus for spinning polymer filaments, comprising:
- at least one spinnerette;
- spinning elements associated with said at least one spinnerette to obtain a spinning speed of about 10 to 200 meters per minute through said at least one spinnerette; and
- at least one element positioned upstream of said at least one spinnerette, said at least one element permitting passage of polymer composition;
- elements associated with said at least one element to uniformly heating said at least one element to a temperature of at least about 250.degree. C.;
- said at least one element and said at least one spinnerette being positioned sufficiently close to each other so that as the polymer exits said at least one spinnerette the polymer maintains a sufficient temperature to obtain a skin-core structure upon quenching in an oxidative atmosphere; and
- a quenching system positioned to immediately quench molten filaments of extruded polymer in an oxidative atmosphere, as molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 95. Apparatus for spinning polymer filaments in a short spin process, comprising:
- at least one spinnerette;
- elements associated with said at least one spinnerette to substantially uniformly heat said at least one spinnerette to obtain sufficient heating of the polymer composition to obtain a skin-core filament structure upon quenching in an oxidative atmosphere;
- spinning elements associated with said at least one spinnerette to obtain a short spin spinning speed through said at least one spinnerette; and
- a quenching system positioned to immediately quench molten filaments of extruded polymer in an oxidative atmosphere, as molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
- 96. Apparatus for spinning polymer filaments in a short spin process, comprising:
- at least one spinnerette;
- spinning elements associated with said at least one spinnerette to obtain a short spin spinning speed through said at least one spinnerette; and
- at least one element positioned upstream of said at least one spinnerette, said at least one element permitting passage of polymer composition;
- elements associated with said at least one element to uniformly heating said at least one element to a temperature of at least about 250.degree. C.;
- said at least one element and said at least one spinnerette being positioned sufficiently close to each other so that as the polymer exits said at least one spinnerette the polymer maintains a sufficient temperature to obtain a skin-core structure upon quenching in an oxidative atmosphere; and
- a quenching system positioned to immediately quench molten filaments of extruded polymer in an oxidative atmosphere, as molten filaments exit said at least one spinnerette, to effect oxidative chain scission degradation of at least a surface of the molten filaments to obtain filaments having a skin-core structure.
CROSS-REFERENCE TO RELATED APPLICATION
This application is a continuation of application Ser. No. 08/378,271, filed Jan. 26, 1995 and now abandoned, which is a divisional of application Ser. No. 08/080,849, filed Jun. 24, 1993, now abandoned, the disclosure of which applications are incorporated by reference in their entirety.
This application is related to application Ser. No. 08/598,168, filed on Feb. 7, 1996 and now U.S. Pat. No. 5,705,119 which is a continuation of application Ser. No. 08/378,667, filed Jan. 26, 1995 and now abandoned, which is a continuation of application Ser. No. 08/080,849, filed Jun. 24, 1993, now abandoned, and application Ser. No. 08/598,184, filed on Feb. 7, 1996 and now abandoned, which is a continuation of application Ser. No. 08/378,267, filed Jan. 26, 1995 and now abandoned, which is a divisional of application Ser. No. 08/080,849, filed Jun. 24, 1993 and now abandoned, the disclosures of which application are incorporated by reference in their entirety.
This application is also related to application Ser. No. 08/003,696, filed Jan. 13, 1993 and now U.S. Pat No. 5,629,080, in the name of Gupta et al., which is a continuation-in-part of application Ser. No. 07/943,190, filed Sep. 11, 1992, now abandoned which is a continuation-in-part of application Ser. No. 07/818,772, filed Jan. 13, 1992; now abandoned and application Ser. No. 07/474,897, filed Feb. 5, 1990, in the name of Kozulla, now abandoned its continuation application Ser. No. 07/887,416, filed May 20, 1992, now U.S. Pat. No. 5,281,378, its continuation-in-part application Ser. No. 07/683,635, filed Apr. 11, 1991, now U.S. Pat. No. 5,318,735 and its divisional application Ser. No. 07/836,438, filed Feb. 18, 1992, now abandoned and its continuation application Ser. No. 07/939,857, filed Sep. 2, 1992, now U.S. Pat. No. 5,431,994 the disclosures of which are hereby incorporated by reference in their entirety.
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