1. Field of the Invention
The present invention relates to a memory unit, more particularly, a memory unit using dynamic threshold voltage wordline transistors
2. Description of the Related Art
Referring to
Therefore, if the currents of the wordline transistors 11 and 12 are increased, the reading speed of the memory will be faster. Similarly, when data bit is written into the memory cell 13, the writing speed of the memory will be also faster if the currents of the wordline transistors 11 and 12 is large. However, the greater the current is, the more power dissipates. However, if low threshold voltage is adopted by the wordline-controlled transistors 11 and 12 to generate great currents, unnecessary power consumption will be introduced due to increased leakage current caused by the low threshed voltage of the transistors in the idle state.
Currently, there are several ways to increase operation speed of the memory. For example, a current-mode sense amplifier is used to accelerate reading speed by taking advantage of detecting current as compared with that of the voltage-mode sense amplifier. Another approach is to increase the current of wordline transistor in the memory cell by using low threshold voltage transistors as the wordline transistors. However, low threshold voltage will increase leakage current, which in turn results in large power consumption.
Therefore, it is necessary to provide a memory unit to resolve the above problems.
One objective of the present invention is to provide an integrated circuit memory unit comprising: a memory cell, a switched bulk DC voltage source and a plurality of wordline-controlled transistors. Each wordline-controlled transistors has a bulk connected to the switched bulk DC voltage source. Thus, the threshold voltage of each wordline-controlled transistor is controlled by the switched bulk DC voltage source. When a data bit is read from the memory cell or the data bit is written into the memory cell, the bulks of the wordline-controlled transistors are switched to a first voltage level from the switched bulk DC voltage source. When the memory unit is in an idle mode, the bulks of the wordline-controlled transistors are switched to a second voltage level from the switched bulk DC voltage source. The first voltage level is higher than the second voltage level.
According to the invention, the memory unit can realize high speed operation in the memory cell using dynamic threshold voltage wordline transistors by changing the bulk voltage of the wordline-controlled transistor while data are read from the memory cell or data are written into the memory cell (i.e. in the access mode).
Besides, the memory unit of the invention can decrease leakage current when the memory cell is in the idle state by changing the bulk voltage of the wordline-controlled transistors, therefore saving idle state power consumption.
Referring to
Therefore, a threshold voltage of each wordline-controlled transistors is controlled by the switched bulk DC voltage source 24. When the data bit is read from the memory cell or the data bit is written into the memory cell, that is, in the access state, the bulk of the wordline-controlled transistors is switched to a first voltage level from the switched bulk DC voltage source 24. When in the idle mode, the bulks of the wordline-controlled transistors are switched to a second voltage level from the switched bulk DC voltage source 24. The first voltage level is higher than the second voltage level.
Deep submicron drain saturation current formula is shown in Equation (1), wherein Vsat is the saturation velocity of carriers when the transistors are conducted. Obviously, if Vth is decreased, the drain saturation current will be increased such that the accessing speed of the memory will be increased. In the formulas about Vth, as shown in Equations (2) and (3), φMS is the distance between polysilicon gate and bulk. φF=(kT/q)ln(Nsub/ni), wherein Nsub is the doping concentration of bulk. Qdep is the charge of the depletion region. Generally, φF=0.25˜0.35V, Qdep=√{square root over (4q∈si|φF|Nsub)}, ∈si is dielectric constant of silicon crystal. γ=√{square root over (2q∈siNsub)}/Cox and generally, γ=0.3˜0.4V1/2. Among the above parameters, except for VSB, all the others including VTH0, γ and φF are determined by semiconductor process. Therefore, VTH0, γ and φF may be regarded as constant and γ>0. When √{square root over (|2φF+VSB|)}=0, there will be a minimum value of Vth. Thus, when 2φF=−VSB, i.e., 2φF=VBS=0.5˜0.7V, Vth is at its minimum value while drain current is at the maximum value.
In
Leakage current is one of the sources for power consumption when the memory is in the idle state. The leakage current is analyzed in the following equations:
wherein Wo and Io are gate width and drain current, S is subthreshold swing parameter, VT is thermal voltage, Cd is the junction capacitance of source and drain. As shown in Equation (5) and (6), if the threshold voltage is higher, the leakage current is lower; on the contrary, if the threshold voltage is lower, the leakage current is higher, resulting in the increased power consumption. Therefore, the bulk voltage VBS is switched to 0V when the memory cell is in the idle state so as to obtain a higher threshold voltage and decrease the leakage current.
Given the above, referring to
To demonstrate advantage of the memory unit of the invention, according to the first embodiment, the memory unit 20 is manufactured by the actual process of 0.18 μm 1P6M CMOS process technology provided by Taiwan Semiconductor Manufacturing Co., Ltd. Referring to
Referring to
As for power dissipation, a 4 Kb memory is simulated and the power consumption of the memory cells is calculated when the wordline-controlled transistor is provided a dynamic threshold voltage by VBS=0V or 0.7V. Power consumption is only 182 mW while the power of the same size memory using a fixed low threshold voltage wordline controlled transistors is 221 mW. Therefore, the memory unit of the invention has a power saving of 17.6% than the conventional memory unit using the low threshold voltage.
Referring to
Similarly, when the data bit is read from the memory cell 73 or the data bit is written into the memory cell 73, that is, in an access state, the bulks of the wordline-controlled transistors are switched to a first voltage level from the switched bulk DC voltage source 74. When in an idle mode, the bulks of the wordline-controlled transistors are switched to a second voltage level from the switched bulk DC voltage source 74. The first voltage level is higher than the second voltage level.
Referring to
Similarly, when the data bit is read from the memory cell 83 or data is written into the memory cell 83, that is, in an access state, the bulks of the wordline-controlled transistors are switched to a first voltage level from the wordline-controlled transistors are switched to a second voltage level from the switched bulk DC voltage source 84. The first voltage level is higher than the second voltage level.
Referring to
Similarly, when the data bit is read from the memory cell 93 or the data bit is written into the memory cell 93, that is, in an access state, the bulks of the wordline-controlled transistors are switched to a first voltage level from the switched bulk DC voltage source 94. When in an idle mode, the bulks of the wordline-controlled transistors are switched to a second voltage level from the switched bulk DC voltage source 94. The first voltage level is higher than the second voltage level.
Referring to
Similarly, when the data bit is read from the memory cell 120 or the data bit is written into the memory cell 120, that is, in an access state, the bulks of the wordline-controlled transistors are switched to a first voltage level from the switched bulk DC voltage source 130. When in an idle mode, the bulks of the wordline-controlled transistors are switched to a second voltage level from the switched bulk DC voltage source 130. The first voltage level is higher than the second voltage level.
Therefore, the memory unit of the invention is applicable for SRAM, DRAM, output buffer, etc. When the data bit is read from the memory cell or it is written into the memory cell, the switched bulk DC voltage source provides the bulk of the wordline-controlled transistors with the first voltage level so as to increase the drain current and obtain faster operation speed. When in an idle mode, the switched bulk DC voltage source provides the bulk of the wordline-controlled transistors with the second voltage level so as to obtain higher threshold voltage and decrease leakage current.
While an embodiment of the present invention has been illustrated and described, various modifications and improvements can be made by those skilled in the art. The embodiment of the present invention is therefore described in an illustrative, but not restrictive, sense. It is intended that the present invention may not be limited to the particular forms as illustrated, and that all modifications which maintain the spirit and scope of the present invention are within the scope as defined in the appended claims.