Patent Grant
10046313
1. Field of the Disclosure
This disclosure relates to mesoporous materials and processes for making mesoporous materials, in particular, the synthesis of thermally stable mesoporous materials with controllable nano-sized wall crystallinity and mesoporosity. This disclosure also relates to a method of tuning structural properties of mesoporous materials, and a method of controlling nano-sized wall crystallinity and mesoporosity in mesoporous materials.
2. Discussion of the Background Art
Porous materials consist of micropores (<2 nm), mesopores (2-50 nm), macropores (>50 nm) and sometimes combinations of these. Considerable interest in the control of pore sizes and pore size distributions of such materials has been a focus for quite some time. Nano-size materials can have markedly different properties than similar compositions that are bulk size (μm and above). Control of morphologies of porous materials such as hollow spheres, rods, helices, spirals, and many other shapes has been a major focus of researchers over at least the last 10 years.
Such control comes from specific synthetic methods such as use of templates, structure directors, surfactants, core shell, self assembly, epitaxial growth, size reduction, capping agents, sol gel, and other methods. Morphologies can be controlled by compositions including dopants. The conditions during syntheses such as use of heat, humidity, light, pH, point of zero charge, stirring, high pressure, and others are also important.
Mesoporous materials with varied pore sizes and pore size distributions can be obtained for some systems such as silicon and titanium based oxide materials. However, control of pore size distributions to make single size pores and to systematically control such pore sizes and uniformity is difficult. Control of the structure of the material is also an issue. Many systems have both micropores and mesopores and pore interconnectivity is of interest with these materials. Enhanced mass transport for catalytic reactions might be realized by fine-tuning the porosity of such systems. Incorporation of biomolecules larger than the micropore regime also might be done using well ordered crystalline mesoporous materials.
Most studies of mesoporous materials have focused on mesoporous transition metal oxide (MTMO) materials of groups I-IV including Y, Ti, Hf, Zr, V, Nb, Ta, Cr, Mo, and W. These have low angle X-ray diffraction peaks indicative of mesostructural ordering and Type IV N2 sorption isotherms. These syntheses have focused on use of water or alcohol or water plus alcohol or various other organic solvents which yield micelle formation by selectively dissolving one part of surfactant. Acidity or basicity is precisely adjusted by adding acid or base or a compound that slowly decomposes to alter pH such as urea. Neutral surfactants (S) or a charged surfactant (S+ and S−) or any combination of these surfactants can be used to form strong S-I interaction. There are either strong Coulombic interactions (S+; I−; S−I+; S+X−I+; S−X+I−) or strong ligand metal interactions (I:S<2, very thin walls), and such systems have limited thermal stability and amorphous walls, where I=inorganic species, and X is a mediator. Such syntheses are open to air and various aging times and environmental conditions can influence the porosity of these materials.
Water content is a critical parameter with the synthesis of porous materials, e.g., porous transition metal oxides. Water competes with surfactants' ethoxy and other alkoxy groups for coordination to the metal or vice versa and also significantly affects hydrolysis and condensation rates. Since most syntheses are open to the air the water content is very difficult to control. On the other hand, water is essential for reaction. When the number of water molecules per metal atom (H) is >1 then phase separation and nonporous oxides result. When H is <1, ordered mesoporous materials are formed when the metal has empty t2g orbitals. These materials obtain water from the environment during synthesis. When H is <<1, strong surfactant/transition metal interactions occur with weak surfactant surfactant interactions and there is no reaction.
Thermodynamic interactions in such syntheses and factors influencing each term are given in Table 1 below. Table 1 sets forth thermodynamic parameters of surfactant (S) transition metal (M) mesopore syntheses.
In Equation 1 above, ΔGm is the formation energy of the mesostructured material; ΔGorg is the surfactant-surfactant interaction; ΔGI is the inorganic-inorganic interaction; ΔGinter is the surfactant-metal interaction at interface; and ΔGsol is the solvent interaction. It would be desirable to develop a process that minimizes the effects of ΔGI and ΔGsol, in order to make well ordered mesoporous materials. The absence of totally empty d orbitals restricts the strong interaction between surfactant and metal (ligand to metal charge transfer) which is generally accepted as essential for the formation of ordered materials. Filled t2g orbitals such as in systems containing Mn, Fe, Co, and others are difficult to make with the above methods since charge transfer reactions do not occur.
The present disclosure provides many advantages over the prior art, which shall become apparent as described below.
This disclosure relates in part to thermally stable mesoporous materials, e.g., metal oxides, sulfides, selenides, tellurides, and the like, and to controlling physicochemical properties of the mesoporous materials by the use of co-surfactants, organic and inorganic additives, mixed metal oxides, solvents and solvent mixtures, and acid mixtures, in the synthesis thereof. The mesoporous materials can be prepared by mixing one or more transition metal precursors with one or more of the co-surfactants, organic and inorganic additives, solvents and solvent mixtures, and acid mixtures. Physicochemical properties of the mesoporous materials such as unit cell size, pore size, pore type, pore volume, mesostructure type, and surface morphology, can be controlled by the use of co-surfactants, organic and inorganic additives, mixed metal oxides, solvents and solvent mixtures, and acid mixtures. These mesoporous materials preserve their unique properties such as crystalline wall structure, pore size, and unit cell expansion, upon heat treatment.
The inverted micelle controlled formation of the mesoporous materials of this disclosure makes the tuning of physicochemical properties of the materials possible by controlling micellization and inter-micellar interaction by using additives, i.e., co-surfactants, organic and inorganic additives, mixed metal oxides, solvents and solvent mixtures, and acid mixtures. This disclosure demonstrates fine tuning of these parameters by the use of co-surfactants, organic and inorganic additives, mixed metal oxides, solvents and solvent mixtures, and acid mixtures, in the synthesis of the mesoporous materials.
This disclosure also relates in part to a process for preparing a mesoporous material, said process comprising:
providing a micellar solution comprising one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and
heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous material.
This disclosure further relates in part to a process for preparing a mesoporous material, said process comprising:
preparing an acidic mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives;
aging the acidic mixture at a temperature and for a period of time sufficient to form a powder, film or gel; and
heating the powder, film or gel at a temperature and for a period of time sufficient to form the mesoporous material;
wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
This disclosure yet further relates in part to a process for preparing a mesoporous material, said process comprising:
providing an acid unmodified mesoporous material prepared by the micellization process described herein;
treating the acid unmodified mesoporous material with an acid to form an acid modified mesoporous material; and
heating the acid modified mesoporous material at a temperature and for a period of time sufficient to form the mesoporous material.
This disclosure also relates in part to a process for preparing a mesoporous material, said process comprising:
providing an acid unmodified mesoporous material having a first mesoporosity and crystalline structure, wherein the acid unmodified mesoporous material is prepared by the micellization process described herein;
treating the acid unmodified mesoporous material with an acid to form an acid modified mesoporous material having a second mesoporosity and crystalline structure; and
heating the acid modified mesoporous material at a temperature and for a period of time sufficient to form the mesoporous material having a third mesoporosity and crystalline structure;
wherein the second mesoporosity and crystalline structure is essentially the same as the first mesoporosity and crystalline structure, and the third mesoporosity and crystalline structure is essentially the same as the second mesoporosity and crystalline structure.
This disclosure further relates in part to a one step process for preparing a mesoporous material, said process comprising treating an acid unmodified mesoporous material with an acid to form said mesoporous material; wherein the treating is sufficient to preserve mesoporosity and crystalline structure of the mesoporous material; and wherein the acid unmodified mesoporous material is prepared by the micellization process described herein.
This disclosure yet further relates in part to a process for preparing mesoporous carbon, said process comprising:
providing a mesoporous metal oxide, sulfide, selenide or telluride material containing a surfactant; wherein the mesoporous metal oxide, sulfide, selenide or telluride material is prepared by the micellization process described herein;
heating the mesoporous metal oxide, sulfide, selenide or telluride material containing a surfactant at a temperature and for a period of time sufficient to form a powder; and
treating the powder to remove metal oxide, sulfide, selenide or telluride and to form the mesoporous carbon.
This disclosure also relates in part to a process for preparing mesoporous carbon, said process comprising:
providing a mesoporous SiO2 material containing a surfactant; wherein the mesoporous SiO2 material is prepared by the micellization process described herein;
heating the mesoporous SiO2 material containing a surfactant at a temperature and for a period of time sufficient to form a powder; and
treating the powder to remove silica and to form the mesoporous carbon.
This disclosure further relates in part to a process for preparing a mesoporous material, said process comprising:
preparing an acidic mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives;
aging the acidic mixture at a temperature and for a period of time sufficient to form a gel;
mixing the gel with urea in a urea:gel weight ratio of from about 0.5:1 to about 1.5:1; and
heating the mixture at a temperature and for a period of time sufficient to form the mesoporous material;
wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
This disclosure yet further relates in part to a process for preparing a mesoporous material, said process comprising:
providing a metal source material;
stabilizing the metal source material with a tetrahedrally coordinated transition metal or post transition metal to form a gel; and
heating the gel at a temperature and for a period of time sufficient to form the mesoporous material;
wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
This disclosure also relates in part to a process for preparing mesoporous tungsten material, said process comprising:
providing a metatungstate source material;
stabilizing the metatungstate source material with a tetrahedrally coordinated transition metal or post transition metal to form a gel; and
heating the gel at a temperature and for a period of time sufficient to form the mesoporous tungsten material;
wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
This disclosure further relates in part to a process for preparing a mesoporous rigid film, said process comprising:
providing a mesoporous film containing a surfactant; wherein the mesoporous film is produced from the mesoporous material by the micellization process described herein;
washing the mesoporous film containing a surfactant with an alcohol:water mixture; wherein the alcohol:water volume ratio is from about 1:1 to about 20:1; and
heating the washed mesoporous film at a temperature and for a period of time sufficient to form the mesoporous rigid film.
This disclosure yet further relates in part to a process for preparing a mesoporous material, said process comprising:
preparing an acidic mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives;
aging the acidic mixture at a temperature and for a period of time sufficient to form a gel; and
heating the gel at a pressure, temperature and for a period of time sufficient to form the mesoporous material;
wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
This disclosure also relates in part to a process for preparing a mesoporous material, said process comprising:
preparing a mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives;
adding an acid to the mixture to form a gel;
aging the gel at a temperature and for a period of time sufficient to promote condensation of inorganic framework and removal of solvent; and
heating the gel at a temperature and for a period of time sufficient to form the mesoporous material;
wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
This disclosure further relates in part to a mesoporous material produced by a process comprising:
providing a micellar solution comprising one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and
heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous material.
This disclosure yet further relates in part to a method of controlling nano-sized wall crystallinity and mesoporosity in mesoporous materials, said method comprising:
providing a micellar solution comprising one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and
heating the micellar solution at a temperature and for a period of time sufficient to control nano-sized wall crystallinity and mesoporosity in the mesoporous materials.
This disclosure also relates in part to a method of tuning structural properties of mesoporous materials, said method comprising:
selecting one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives;
providing a micellar solution comprising said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and
heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous materials.
This disclosure further relates in part to a process for preparing methyl levulinate or methyl lactate, said process comprising:
providing a carbohydrate or biomass source material;
providing a solid acid catalyst comprising an acid modified mesoporous material; and
reacting the carbohydrate or biomass source material in the presence of the solid acid catalyst at a temperature and pressure and for a period of time sufficient to form the methyl levulinate or methyl lactate;
Several advantages result from the processes of this disclosure. This disclosure provides a unique approach and method for the synthesis of thermally stable mesoporous metal (e.g., Cr, Zr, Nb, Hf, Ta, Nd, Sm, Ce, Gd and Sn) oxides, sulfides, selenides, tellurides, and the like, with controllable mesopore size (e.g., 2 nm-13 nm) and nano-sized crystalline walls for various sorptive, conductive, structural, catalytic, magnetic and optical applications. This disclosure not only makes the synthesis of mesoporous (metal, transition metal, Lanthanide metal, post-transition metal, metalloid) oxides, sulfides, selenides, tellurides, and the like, possible, but also allows one to precisely tune the structural properties of synthesized porous materials with simple heat treatment cycles. Moreover, the method of this disclosure is applicable to all transition metals, Lanthanide metals, post-transition metals and metalloids with modifications as appropriate in the synthesis procedure.
The high surface area mesoporous materials of this disclosure can have applications in catalysis, drug delivery systems, electrochemistry, HPLC, optical materials, semiconductors, and the like. The performance of a mesoporous material in various applications does not only depend on the metal system or systems used but also physicochemical properties of these materials such as mesostructure, pore size and pore volume. These physicochemical properties of mesoporous materials are the main determinants in performance. In accordance with this disclosure, the physicochemical properties of the mesoporous materials such as unit cell size, pore size, pore type, pore volume, mesostructure type, and surface morphology, can be controlled by the use of co-surfactants, organic and inorganic additives, mixed metal oxides, solvents and solvent mixtures, and acid mixtures.
In comparison with conventional mesoporous silica such as MCM-41, it has been surprisingly found that the mesoporous materials of this disclosure have totally different porous structures than the typical 2D hexagonal and cubic Si and Ti oxide systems, and are more stable for calcination. Traditional Si and Ti oxide materials have long tube channels, whereas the mesoporous materials of this disclosure are formed by assembly of nanoparticles. For Ti materials, the mesoporous materials of this disclosure have crystalline walls in which crystallinity can be controlled by various calcination procedures by preserving porosity. In comparison with conventional mesoporous silica such as MCM-41, the mesoporous materials of this disclosure exhibit pore expansion by calcination, thermal stability, and ability to incorporate various metals by preserving porosity and mesostructure.
Further objects, features and advantages of the present disclosure will be understood by reference to the following drawings and detailed description.
All numerical values within the detailed description and the claims herein are modified by “about” or “approximately” the indicated value, and take into account experimental error and variations that would be expected by a person having ordinary skill in the art.
The process of the present disclosure for making mesoporous materials, e.g., metal oxides, sulfides, selenides, tellurides, and the like, affords a high degree of control with respect to nano-sized wall crystallinity and mesoporosity. The mesoporous materials are useful in various applications including, but not limited to, catalytic, magnetic and optical applications. In particular, the metal oxides, sulfides, selenides, tellurides, and the like, are useful as catalysts, sensors, batteries and energy production, optical displays, environmental and sorbent applications.
In particular, this disclosure relates to new mesoporous materials including semiconductors (CdS, ZnS, CdxZnyS (x+y=1)), non-metals (C), post-transition metals (Sn), 1st (Cr, Zr), 2nd (Nb) and 3rd (Hf) row transition metal oxides, Lanthanides (Nd, Sm, Gd), high pressure oxides (Mn), high pressure acids (ZSM-5), solid acids (tungstated zirconia (WZr), phosphated zirconia (PZr), sulphated zirconia (SZr) and sulfated titania (STi)). These new materials show both desired mesostructure and mesoporosity.
This disclosure offers a new type of porous metal oxide, sulfide, selenide, telluride, and the like, family. It not only makes use of wide range of metals, e.g., transition metals, Lanthanide metals, post-transition metals and metalloids, but also provides more control on the structural properties of synthesized mesoporous metal oxides, sulfides, selenides, tellurides, and the like.
The method of this disclosure eliminates contribution of critical thermodynamic parameters such as strength of interaction at interface, hydrolysis and condensation rates of metal precursor and water content of reaction medium, thereby yielding totally reproducible porous metal oxides, sulfides, selenides, and tellurides. For example, thermodynamically solvation by water is eliminated or minimized by eliminating or minimizing the amount of water in the system. This in turn limits hydrolysis.
The present disclosure provides a simple wet-chemical process that enables the synthesis of nanometer-sized particles (50-300 nm) with tunable pore sizes in the range of 2-30 nm, preferably 2-20 nm, and more preferably 2-13 nm. This surfactant-mediated synthesis may be generalized to achieve various pore structures, including 3-D cubic Im3m, 3-D cubic Fm3m, 2-D hexagonal P6m, foam-like and worm-like pores, as well as different material compositions. The synthesis can produce ultrafine particles with well-defined mesopores, regular particle morphology and excellent pore accessibility. The mesopores are adjustable in size and have high structural ordering. The process uses a surfactant that may act as a supramolecular template for formation of the periodic mesostructure.
One of the unique features of the porous materials synthesized with this method is the tunable porosity. The pore diameter can be controlled between the super micropore range (e.g., about 2 nm) and the mid-mesopore range (e.g., about 13 nm) without losing available pore volume. A pore size of 13 nm is quite unusual for the mesoporous materials synthesized with various surfactant systems. The pore size of the synthesized materials increases with heat treatments applied which is also a unique discovery of this disclosure. This is a contradiction of pore size by heat treatment because of further condensation of wall structure and collapse of the structure with increased heat treatment duration and temperature applied. Tunable pore size might be useful for various catalytic applications in terms of size selective reactions and enhanced ion mobility for battery applications, etc.
Another unique advantage of this method is controlling the crystal structure of the nano-sized metal oxide, sulfide, selenide, and telluride walls. For instance, amorphous, bixbyite, hausmannite and manganite structures can be obtained for the manganese system. That makes possible the synthesis of target crystal structures for specific applications. Different crystal structures of metals show different optical, magnetic and catalytic properties which indicate that the method described herein is highly desirable for designing unique porous materials.
Other illustrative crystal structures of the nano-sized metal oxide, sulfide, selenide, and telluride walls include, for example, Cr2O3, ZrO2, Nb2O5, HfO2, Ta2O5, SnO2, CeO2, Nd2O3, Sm2O3 and Gd2O3, and the like. The method of this disclosure provides for controllable nano-sized wall crystallinity and the synthesis of target crystal structures for specific applications.
In accordance with this disclosure, well ordered crystalline mesoporous metal oxide, sulfide, selenide, and telluride systems can be prepared that can result in enhanced sorptive, conductive, structural, catalytic, magnetic and optical properties, in particular, enhanced catalytic activity and selectivity from better transport properties.
The mesoporous materials of this disclosure show tunable mesostructure and mesoporosity, controlled crystal structure, nano-sized crystallinity, and high thermal stability. The mesoporous materials of this disclosure are mesoporous analogues of some oxides (solid acids, oxidation and polymerization catalysts), non-metals (adsorbents), and sulfides (semiconductors) which are proven to be very promising in a variety of applications. Making these materials mesoporous offers improvement for desired applications.
The mesoporous materials of this disclosure can be synthesized with cheap precursors with high reproducibility and quality. All mesoporous materials can be synthesized in a short time and in one step reactions (except mesoporous carbon).
The process of this disclosure can serve as single step, fast synthesis route for mesoporous materials for the entire periodic table. The process of this disclosure is not limited to single metal systems but also can also be used to synthesize solid heterogeneous catalysts, semi-conductors, and adsorbent materials. These materials can be mixed oxides, sulfides, surface modified solid acids, and the like.
The process of this disclosure involves a sol-gel micelle based method as depicted in
During this process, surfactant is oxidized at long reaction times and formed carboxyl groups coordinated to oxomanganese clusters and competes with nitrate to exist in the micelles, although in some systems this is not the case. All samples regardless of reaction time show thermal stability up to 250° C. During the synthesis, carboxylate bands increase while nitrate bands decrease. Spectra are normalized with respect to the Mn—O stretching band (584 cm−1). The surfactant C—O stretching mode is between 1050 cm−1-1200 cm−1. The carboxyl groups are formed due to oxidation of the surfactant at long reaction times. These carboxyl groups are oxidized at 150° C. with a concomitant color change of the solution from black to brown. NO3− ions do not fully disappear until 200° C. The carboxyl groups need to be removed to preserve the mesoporous structure. Failure to remove the carboxylate groups leads to unstable mesoporous materials. Depending on reaction conditions, different manganese oxide structures (crystalline walls) can be formed.
In accordance with this disclosure, during thermal treatment, the d-spacings increase. The unit cell expands during heat treatment. The exact position of the d(100) peak depends on the heating temperature and time. Corresponding BET surface area (100-200 m2/g), pore size distributions, and pore volumes (up to 0.22 cc/g) show that mesporous materials are produced with excellent control of pore size distributions (monomodal). These materials are stable up to 550° C. Such control of pore size distribution, enhanced pore volumes, and thermal stabilities are significant advantages afforded with metal oxide, sulfide, selenide, and telluride mesoporous compositions prepared in accordance with the process of this disclosure.
As used herein, “thermal stability” means no, or essentially no, degradation of structure at a designated temperature. As used herein, “monomodal” means one, or essentially one, mode as in pore size distribution. As used herein, “control of mesoporosity” means uniform, or essentially uniform, control of pore size, pore size distribution, and shape.
Referring to
In the process of this disclosure, the acidic mixture may comprise water, and may be an aqueous mixture. The mixture may be a solution, a dispersion or an emulsion, a micellar solution, and may be a microemulsion. The mixture may have a pH between about 0.5 and about 5, or between about 1 and about 3. The surfactant may be anionic, cationic, non-ionic, zwitterionic, or mixtures thereof. The surfactant may be a polymeric surfactant, and may be a copolymer surfactant, for example a block copolymer surfactant. The surfactant may be an alkylene oxide block copolymer surfactant, e.g. an EO/PO block copolymer surfactant. The surfactant may be miscible or immiscible with the interface modifier.
In the process of this disclosure, the micellar solution may comprise water, and may be an aqueous solution. This may also be a solution, a dispersion or an emulsion, and may be a microemulsion. This solution may have a pH between about 0.5 and about 5, or between about 1 and about 3. The surfactant may be anionic, cationic, non-ionic, zwitterionic, or mixtures thereof. This may be a polymeric surfactant, and may be a copolymer surfactant, for example a block copolymer surfactant. The surfactant may be an alkylene oxide block copolymer surfactant, e.g. an EO/PO block copolymer surfactant. The surfactant may be miscible or immiscible with the interface modifier.
The metal precursors useful in the processes of this disclosure can be any water soluble metal salt, preferably metal salts with hydrotropic counter anions and alkoxide sources of any metal. The metal precursors also exhibit moderate alcohol solubility. The metal precursors are conventional materials known in the art and are commercially available.
One or more metal precursors are useful in the processes of this disclosure. Physicochemical properties of the mesoporous materials of this disclosure can be controlled by the use of mixed metal precursors in the synthesis thereof. The inverted micelle controlled formation of the mesoporous materials of this disclosure makes the tuning of physicochemical properties of the materials possible by controlling micellization and inter-micellar interaction using additives such as mixed metal precursors.
Illustrative metal precursors include, for example, metal halides, metal phosphates, metal acetates, metal nitrates, metal alkoxides, and MxOy oxides that are capable of dissolving in HNO3. More particularly, metal precursors include, for example, metal halides such as HfCl4 or NbCl4, M(NO3)x.yH2O (M=Mn, Fe, Co, Cu, Zn, Si), tetraethyl orthosilicate (TEOS), tetramethyl orthosilicate (TMOS), titanium isopropoxide, zirconium n-propoxide, zirconium butoxide, Ce(NO3)3.6H2O, Gd(NO3)3.6H2O, Sm(NO3)3.6H2O, and the like.
Other metal precursors useful in the process of this disclosure include, for example, metal Cl−, I−, SCN−, SO42−, F− salts, and the like. Preferably, any metal and metal oxide, sulfide, selenide, tellurides, and the like, which HNO3 can dissolve can be used. Any metal salt which does not form insoluble nitrate salts can be used.
The metal precursors useful in the process of this disclosure include precursors of transition metals, Lanthanide metals, post-transition metals, metalloids, and mixtures thereof. For example, the transition metal precursors comprise Group 3-12 transition metal precursors, in particular, Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursors. In an embodiment, the transition metal precursors are selected from Group 6-12 transition metal precursors including Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursors. Preferably, the Group 6-12 transition metal precursors include Mn, Fe, Co, Ni, Cu and Zn precursors. The Lanthanide metal precursors include La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursors, or any mixture thereof. The post-transition metal precursors include Al, Ga, In, Tl, Sn, Pb and Bi precursors, or any mixture thereof. The metalloid precursors include B, Si, Ge, As, Sb, Te, Po and At precursors, or any mixture thereof.
The concentration of the metal precursors used in the process of this disclosure can vary over a wide range and need only be at a concentration sufficient to form the mesoporous metal oxides, sulfides, selenides, and tellurides. The metal precursors can be present in a molar concentration ratio of from about 1×10−2M to about 10 M, preferably from about 1×10−1 M to about 5 M, and more preferably from about 5×10−1 M to about 1 M (based on a total volume of 10 milliliters).
The interface modifiers useful in the processes of this disclosure can be any aliphatic, alicyclic or aromatic hydrocarbons of between about 1 and about 20 carbon atoms, e.g., butanol. The interface modifiers are conventional materials known in the art and are commercially available. Any organic solvents that allow the surfactant to organize itself into inverse micelles are useful in the processes of this disclosure.
One or more interface modifiers, e.g., organic solvents, are useful in the processes of this disclosure. Physicochemical properties of the mesoporous materials of this disclosure can be controlled by the use of mixed interface modifiers in the synthesis thereof. The inverted micelle controlled formation of the mesoporous materials of this disclosure makes the tuning of physicochemical properties of the materials possible by controlling micellization and inter-micellar interaction using additives such as mixed interface modifiers.
Illustrative interface modifiers include, for example, aliphatic, alicyclic and aromatic hydrocarbons of between about 1 and about 20 carbon atoms, including mixtures thereof. The aliphatic hydrocarbons may be branched or straight chain. The aliphatic, alicyclic and aromatic hydrocarbons include, for example, n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, any carboxylic group containing organic molecule such as glucose, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, and the like, and mixtures thereof. The aliphatic, alicyclic and aromatic hydrocarbons may have between 1 and 20, 1 and 18, 1 and 16, 1 and 12, 1 and 10, or 1 and 8 carbon atoms.
The role of butanol is multiple and one role is to occupy the interface, since the butanol occupation is thermodynamically favored in the hydrophobic-hydrophilic interface of Pluronic® surfactants. However, an interface modifier (or co-surfactant in this context) may not be required and can be replaced by another surfactant.
In accordance with this disclosure, the use of butanol in different solvent systems can be replaced with other smaller alcohols, water, or a hydrotropic ion. The main purpose of butanol is to increase the surfactant solubility. In the absence of butanol, Pluronic® surfactants are not fully soluble in higher order alcohols. One can avoid the use of other additives to see the solvent effect and prevent possible confusion about observed physicochemical properties which can also be affected by additives.
Using higher order alcohols than ethanol yields formation of inverse micelles for the Pluronic® type surfactants. Considering that the inverse micelle formation is essential for mesoporous materials of this disclosure, one can use higher order alcohols or alcohol mixtures as solvents for the synthesis of the mesoporous materials. In theory, one can choose any organic solvent or solvent mixture or modified solvents yielding Pluronic® inverse micelles to synthesize the mesoporous materials of this disclosure.
The use of butanol as a co-surfactant helps all Pluronic® surfactants to be in uniform inverse micellar form by increasing its solubility. It is also possible to replace butanol by either charged or neutral co-surfactants in various solvent systems to increase Pluronic® surfactant solubility. Addition of more butanol to the system reverses the effect of pentanol since butanol is thermodynamically more stable in the interface. The necessity of the co-surfactant role can be satisfied by adding more butanol into the hexanol system. Butanol-hexanol mixtures can be considered as a pentanolic solution meaning that in a certain ratio mixing butanol and hexanol the solution behaves like pentanol.
In different solvents, butanol can be added to the system as a co-surfactant and hydrolysis-condensation regulator. The use of butanol is essential for Pluronic® surfactant systems in solvents or solvent mixtures, since butanol satisfies three critical roles in a given transition metal-Pluronic® surfactant system. First, butanol is an alcohol and helps controlling sol-gel chemistry of the transition metal. Secondly, butanol has a role as solvent to form an inverse micelle. The third role is being a co-surfactant in Pluronic® systems. Simply, butanol makes the micelle more thermodynamically stable which is also known as a geometric requirement. Further, the boiling point of butanol is just above the reaction temperatures. Chaotic environments created by boiling of solvents generally result in inhomogeneous condensation rates and perturbs the liquid crystal phase. Pressure-temperature relationships may be useful to eliminate boiling when using a high boiling point solvent.
One can eliminate or replace the use of butanol in the synthesis of the mesoporous materials of this disclosure as long as the new system satisfies the following requirements: the role of butanol as a co-surfactant can be replaced with a different alcohol or smaller chain length surfactant; the role as solvent can be replaced with any organic solvent as long as a suitable alcohol is picked (for sol-gel chemistry) and reaction temperature adjusted considering the new solvent; and the use of a different surfactant which does not require co-surfactant or another co-surfactant to fulfill this requirement.
The concentration of the interface modifiers used in the process of this disclosure can vary over a wide range and need only be a concentration sufficient to form the mesoporous materials. The interface modifiers can be present in a molar concentration ratio of from about 1 M to about 40 M, preferably from about 2 M to about 15 M, and more preferably from about 5 M to about 10 M (based on a total volume of 10 milliliters).
The concentration of the interface modifiers used in the process of this disclosure can vary over a wide range depending on the interface modifier type. More hydrotropic or lyotropic ions should be used in smaller amounts of interface modifiers and vice versa. This ratio can reach 5-50 M since the interface modifier is evaporated and its upper limit can be varied. Also, scaling up the reaction can be done by varying this ratio.
The hydrotropic ion precursors, e.g., acids, useful in the processes of this disclosure can be any hydrotropic anion beyond chloride in the Hoffmeister series, including mixtures thereof. The hydrotropic and lyotropic ion precursors are conventional materials known in the art and are commercially available. Suitable acids include, for example, nitric acid, hydrochloric acid, sulfuric acid, and mixtures thereof.
One or more hydrotropic or lyotropic ion precursors are useful in the processes of this disclosure. Physicochemical properties of the mesoporous materials of this disclosure can be controlled by the use of mixed hydrotropic or lyotropic ion precursors in the synthesis thereof. The inverted micelle controlled formation of the mesoporous materials of this disclosure makes the tuning of physicochemical properties of the materials possible by controlling micellization and inter-micellar interaction using additives such as mixed hydrotropic or lyotropic ion precursors.
The acid is one of the main components of the method for the synthesis of mesoporous materials of this disclosure. The main role of the acid is to keep metals in their lowest possible oxidation state and prevent the condensation reaction until an intermediate liquid crystal phase has been achieved. Controlling the pH allows one to decide the path of condensation. The reactions conducted below the point of zero charge follow the cationic route and the pH values above this point follow the anionic route. The use of the acidic route is more pronounced then the basic route in synthesis of porous materials of transition metals by sol-gel chemistry. In principle, the synthesis of mesoporous materials of this disclosure is possible by following the basic route if a controlled condensation reaction environment is achieved. The rate control can be achieved by temperature decrease, aging times prior to the heating step, co-solvent, and some organic and inorganic additives.
Nitrate ion is another important and essential component of the method for the synthesis of mesoporous materials of this disclosure. Nitrate has multiple roles in the synthesis. The first role is the hydrotropic nature of this ion. Hydrotropic nitrate ions increase the surfactant solubility by hydrating the core of the inverted Pluronic® surfactant so the metal precursors use this water rich environment in the core either satisfying its water coordination or enhancing solvation of the oxo-metal clusters. The use of other metal sources with different counter anions rather than nitrate decreases the surfactant solubility and destroys the micelles. However, the use of more soluble smaller surfactants allows one to use other metal salts. The second role of nitrate is to adjust the pH of the reaction media.
In accordance with this disclosure, the right combinations of an acid source and hydrotropic ions can be chosen to mimic the same effect. In other words, the method allows the use of other acids such as HCl, H2SO4, H3PO4, HClO4 or a combination and other hydrotropic anions such as SCN−, ClO4− or ion combinations. The other parameter which can also effect the possible acid and ion combinations and amounts is the surfactant type and amount. This is so since, even in same class of surfactants or surfactant combinations the critical micelle concentration (CMC) and critical micelle temperature (CMT) vary.
The effect of nitrate on control of the pH can also be mimicked by careful titration or supplying oxygen or sulfur or selenide or hydrogen sulfide or air (any gas oxidizes the metal, helping to speed up the condensation reaction) reaction media to promote the condensation reaction yielding the final mesoporous material.
Illustrative hydrotropic ion precursors include, for example, HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, and the like. Illustrative hydrotropic ions include, for example, NO3−, SCN−, Br−, I−, an organic modifier such as ethylene glycol, and the like. A modifier can be used to modify the hydrotropic part such as F−, 3,3′,5,5′-tetramethylbenzidine (TMB), aromatic compounds, Cl−, SO42−, and the like.
The concentration of the hydrotropic or lyotropic ion precursors used in the process of this disclosure can vary over a wide range and need only be a concentration sufficient to form the mesoporous materials. The hydrotropic or lyotropic ion precursors can be present in a molar concentration ratio of from about 1×10−2M to about 15 M, preferably from about 1×10−1 M to about 10 M, and more preferably from about 1 M to about 5 M (based on a total volume of 10 milliliters).
The replacement of nitrate ions with a material that can gradually decrease the pH under process conditions may be useful in the process of this disclosure. Atmospheres of urea vapor or ammonia or other volatile bases may be useful in accomplishing the above. Hydrocyanation may be used, or HF or other acids. The concepts of the use of an acid or a base and controlling pH are embodiments of this disclosure.
The surfactants useful in the processes of this disclosure can be any anionic, cationic, non-ionic, zwitterionic surfactant, or mixtures thereof. The surfactants are conventional materials known in the art and are commercially available.
One or more surfactants, e.g., a surfactant and co-surfactant, are useful in the processes of this disclosure. Physicochemical properties of the mesoporous materials of this disclosure can be controlled by the use of mixed surfactants in the synthesis thereof. The inverted micelle controlled formation of the mesoporous materials of this disclosure makes the tuning of physicochemical properties of the materials possible by controlling micellization and inter-micellar interaction using additives such as mixed surfactants.
The use of a co-surfactant in the synthesis of mesoporous materials synthesized with Pluronic® P123 surfactant:co-surfactant significantly affects the inverted micelles obtained as well as the physicochemical properties obtained for the resulting mesoporous materials. Addition of a co-surfactant which is smaller than the major surfactant Pluronic® P123 mostly affects the hydrophilic interactions inside the micelle. The increase in the hydrophilic interaction converts the spherical micelles to elongated micelles. The increase in the hydrophilic interaction in the core region is not the only contribution of the co-surfactants. The smaller co-surfactants also satisfy the geometrical requirement and also limit the interface volume by increasing the hydrophilic-hydrophobic gradient between the core and outer corona region. Limiting the interface volume and swelling the core region results in bigger and monodisperse nano-crystals which can be realized from the position and relative sharpness of the low angle diffraction patterns.
Illustrative surfactants include, for example, anionic, cationic, non-ionic, zwitterionic, or mixtures thereof. This may be a polymeric surfactant, and may be a copolymer surfactant. The copolymer surfactant may be a block copolymer, or may be a random copolymer, an alternating copolymer or some other type of copolymer. The block copolymer may be a diblock, triblock or other copolymer. The block copolymer may have between 2 and 5 blocks or more than 5 blocks. The material may have an odd or an even number of blocks, and may have 2, 3, 4 or 5 blocks. The block copolymer may have hydrophilic blocks alternating with hydrophobic blocks. The terminal blocks may be hydrophobic, or may be hydrophilic, or one may be hydrophilic and one hydrophobic. The copolymer surfactant may have 2, 3, 4, 5 or more than 5 different types of blocks (i.e. different monomers). The material may be an alkylene oxide block copolymer surfactant. The system may be an EO/PO copolymer surfactant, e.g. an EO/PO block copolymer surfactant. Suitable surfactants include Pluronic® P65 (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H) or (EO20PO30EO20), Pluronic® P85 (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H) or (EO26PO40EO26), Pluronic® 25R4 (PO19EO33PO19), Pluronic® F108 (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H) or (EO129PO56EO129), Pluronic® P123 (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H) or (EO20PO70EO20) and Pluronic® F127 (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H) or (EO97PO69EO97). The surfactant may be miscible or immiscible, or may be partially miscible, with the interface modifier.
Preferred surfactants useful in the process of this disclosure can be represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m is a value from about 10 to about 150, preferably from about 20 to about 100, and more preferably from about 20 to about 70, and n is a value from about 5 to about 150, preferably from about 10 to about 70, and more preferably from about 10 to about 30.
Other preferred surfactants useful in the process of this disclosure can be represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18, preferably from about 1 to about 12, and more preferably from about 3 to about 7.
Other illustrative surfactants useful in the process of this disclosure include, for example, a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, or an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG).
Still other illustrative surfactants include an ethoxylated castor oil, an ethoxylated coconut fatty acid, or an amidified, ethoxylated coconut fatty acid. Natural surfactants and gemini (dimeric) surfactants can be useful in the process of this disclosure.
An ethoxylated castor oil can include, for example, a polyoxyethylene (20) castor oil, CAS No. 61791-12-6, PEG (polyethylene glycol)-10 castor oil, PEG-20 castor oil, PEG-3 castor oil, PEG-40 castor oil, PEG-50 castor oil, PEG-60 castor oil, POE (polyoxyethylene) (10) castor oil, POE(20) castor oil; POE (20) castor oil (ether, ester); POE(3) castor oil, POE(40) castor oil, POE(50) castor oil, POE(60) castor oil, or polyoxyethylene (20) castor oil (ether, ester).
An ethoxylated coconut fatty acid can include, for example, CAS No. 39287-84-8, CAS No. 61791-29-5, CAS No. 68921-12-0, CAS No. 8051-46-5, CAS No. 8051-92-1, ethoxylated coconut fatty acid, polyethylene glycol ester of coconut fatty acid, ethoxylated coconut oil acid, polyethylene glycol monoester of coconut oil fatty acid, ethoxylated coco fatty acid, PEG-15 cocoate, PEG-5 cocoate, PEG-8 cocoate, polyethylene glycol (15) monococoate, polyethylene glycol (5) monococoate, polyethylene glycol 400 monococoate, polyethylene glycol monococonut ester, monococonate polyethylene glycol, monococonut oil fatty acid ester of polyethylene glycol, polyoxyethylene (15) monococoate, polyoxyethylene (5) monococoate, or polyoxyethylene (8) monococoate.
An amidified, ethoxylated coconut fatty acid can include, for example, CAS No. 61791-08-0, ethoxylated reaction products of coco fatty acids with ethanolamine, PEG-11 cocamide, PEG-20 cocamide, PEG-3 cocamide, PEG-5 cocamide, PEG-6 cocamide, PEG-7 cocamide, polyethylene glycol (11) coconut amide, polyethylene glycol (3) coconut amide, polyethylene glycol (5) coconut amide, polyethylene glycol (7) coconut amide, polyethylene glycol 1000 coconut amide, polyethylene glycol 300 coconut amide, polyoxyethylene (11) coconut amide, polyoxyethylene (20) coconut amide, polyoxyethylene (3) coconut amide, polyoxyethylene (5) coconut amide, polyoxyethylene (6) coconut amide, or polyoxyethylene (7) coconut amide.
The surfactant can be, for example, one or more of Alfoterra® 123-8S, Alfoterra® 145-8S, Alfoterra® L167-7S, Ethox® HCO-5, Ethox® HCO-25, Ethox® CO-40, Ethox® ML-5, Ethal® LA-4, AG-6202, AG-6206, Ethox® CO-36, Ethox® CO-81, Ethox® CO-25, Ethox® TO-16, Ethsorbox® L-20, Ethox® MO-14, S-MAZ 80K, T-MAZ 60 K 60, Tergitol® L-64, Dowfax® 8390, Alfoterra® L167-4S, Alfoterra® L123-4S, and Alfoterra® L145-4S.
The surfactant can be, for example, one or more of castor oil, cocoa oil, cocoa butter, coconut oil, soy oil, tallow oil, cotton seed oil, a naturally occurring plant oil and a plant extract. Further, the surfactant can be, for example, one or more of an alkyl polyglucoside or an alkyl polyglucoside-based surfactant, a decyl polyglucoside or an alkyl decylpolyglucoside-based surfactant.
The mesoporous materials of this disclosure are unique types of materials that can be prepared by a synthesis using various surfactants and surfactant mixtures for fine tuning physicochemical properties of final mesoporous materials.
Surfactant types useful in this disclosure can synthetically be created by combination of nonionic and ionic functional groups mentioned above. A combination of ionic surfactants (anionic and cationic) can be useful in this disclosure since they may have different phase behavior. Multiple, strong hydrogen bonding interaction between two nonionic surfactants can yield a new type of nonionic surfactant having different phase behaviors than the behaviors of the individual surfactants used to form the new nonionic surfactant. A combination of ionic liquids and ionic surfactants can also yield a new type of surfactant useful in this disclosure.
Ionic surfactants have been found to be more effective for increasing the hydrophilic interaction since ionic character of the surfactants sucks more water into the core region. With the method of this disclosure, one can easily control the physicochemical parameters and the nano-crystal size and shape by using co-surfactants. Moreover, ionic surfactants also increase the obtained yield for the metal systems such as Fe, Mn, and Co.
Surfactant solubility and the metal source solubilizing potential of the surfactant are important parameters in this disclosure. Since, as long as the metal source is solubilized in the formed Pluronic® micelles a mesostructured material can be obtained. Regardless of the surfactant combination or metal mixture or solvent or acid source used, one can synthesize mesostructured materials with the method as long as a clear micellar solution is obtained before the reaction.
The concentration of the surfactant used in the process of this disclosure can vary over a wide range and need only be a concentration sufficient to form the mesoporous materials. The surfactant can be present in a molar concentration ratio of from about 1×10−5M to about 1 M, preferably from about 1×10−4M to about 1×10−1 M, and more preferably from about 1×10−3 M to about 1×10−2M (based on a total volume of 10 milliliters).
The organic and inorganic additives useful in the processes of this disclosure can be any suitable organic or inorganic additives, including mixtures thereof. The organic and inorganic additives are conventional materials known in the art and are commercially available.
One or more organic and/or inorganic additives are useful in the processes of this disclosure. Physicochemical properties of the mesoporous materials of this disclosure can be controlled by the use of mixed organic or inorganic additives in the synthesis thereof. The inverted micelle controlled formation of the mesoporous materials of this disclosure makes the tuning of physicochemical properties of the materials possible by controlling micellization and inter-micellar interaction using additives such as mixed organic and/or inorganic additives.
Illustrative organic additives include, for example, urea, hydrocarbons (decane, octane etc.), benzene, mesitylene or trimethyl benzene (TMB), substituted benzene (tri-isopropylene, ethylbenzene, etc.), polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules (brilliant green, methylene blue, methyl orange, perylene bisimide, congo red etc.), naphthalene, phenolic compounds, formaldehyde, PPO, PEO, sugars (D-fructose, glucose, sucrose, cellulose, starch, etc.), citric acid, phenol, aromatic alcohols (benzyl alcohol, etc.), alcohols (pentanol, hexanol, 2-propanol, etc.), carboxylic acids (heptanic acid), phosphates (trimethyl phosphate), oleyl ether, lysine, glycine, glutamic acid, tosylate, and carboxyl.
In particular, illustrative organic additives include, for example, aliphatic, alicyclic and aromatic hydrocarbons of between about 1 and about 20 carbon atoms, including mixtures thereof. The aliphatic hydrocarbons may be branched or straight chain. The aliphatic, alicyclic and aromatic hydrocarbons include, for example, n-butanol, pentanol, hexanol, higher carbon-containing alcohols, TMB, acetylacetonate, lauric acid, toluene, benzene, cyclohexene, any carboxylic group containing organic molecule such as glucose, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, and the like, and mixtures thereof. The aliphatic, alicyclic and aromatic hydrocarbons may have between 1 and 20, 1 and 18, 1 and 16, 1 and 12, 1 and 10, or 1 and 8 carbon atoms.
Mesitylene (1,3,5-trimethylbenzene) (TMB) and other benzene organic derivatives can be used in the synthesis of mesoporous materials as pore swelling agent and increasing the meso-order of the synthesized Pluronic® surfactant based mesoporous materials. Organic additives might vary depending on the surfactant system. The key in selecting an organic additive is synergy between the additive and surfactant. Aromatic molecules are known to have a strong interaction with the relatively hydrophobic polypropylene oxide group (PPO) of the Pluronic® surfactants. TMB can be replaced with another benzene derivative or any organic molecule containing an aromatic ring including dye molecules. Another surfactant having different hydrophilic-hydrophobic groups or different types of surfactants such as star type, bis, charged surfactants can use other types of organic additives such as polyethylene glycol, and n-alcohols.
In the mesoporous materials of this disclosure, organic additives have an effect different than regular systems. The outer swelled outer region of the inverted micelles leads them to pack in a different mesostructure. Despite the resulting materials not showing any surface area enhancement, they have significantly higher pore volume. This is because packing of inverted micelles move from random hexagonal packing to the least effective packing which is body centered cubic (bcc) packing. The micelle formation and intermicellar interaction can be controlled or modified easily by additives. The key is to choose appropriate additives for each surfactant system studied. The used organic additive for manipulation of surfactant packing and interaction is strictly surfactant dependent.
Organic additives are generally effective on non-ionic surfactants, on the other hand ionic surfactant packing or interaction control can more easily be done by inorganic additives. Inorganic additives are not only effective for controlling the ionic surfactants but also they are found to be very effective in non-ionic surfactant assembly. The effect of inorganic additives on non-ionic surfactant assembly is generally known as the Hoffmeister effect created by Hoffmeister series ions. The Hoffmeister series is a series of anions and cations which are sorted by their ability to increase surfactant solubility (hydrotropic) or decrease surfactant solubility (lyotropic).
Illustrative inorganic additives include, for example, aprotic and protic ionic liquids (ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, and ClO4−.
The concentration of the organic or inorganic additives used in the process of this disclosure can vary over a wide range and need only be a concentration sufficient to form the mesoporous metal oxides. The organic or inorganic additives can be present in a molar concentration ratio of from about 1×10−2M to about 15 M, preferably from about 1×10−1 M to about 10 M, and more preferably from about 1 M to about 5 M (based on a total volume of 10 milliliters).
The step of preparing the micellar solution may comprise combining the metal precursor with an interface modifier, a hydrotropic or lyotropic ion precursor, and a surfactant. The media may be a solution, a microemulsion, an emulsion, a dispersion or some other type of mixture. The ratio of metal precursor to surfactant may be between about 1:100 and about 1:2 on a w/w, v/v or w/v basis, and may be about 1:20. Before, during and/or after the combining, the micellar solution may be agitated, e.g. shaken, stirred, swirled, sonicated or otherwise agitated. The mixture may have a pH between about 0.5 and about 5, or between about 1 and about 3.
The metal precursor, interface modifier, hydrotropic or lyotropic ion precursor, and surfactant may be added to the micellar solution in any combination or at any stage during the process of preparing the micellar solution. The metal precursor, interface modifier, hydrotropic or lyotropic ion precursor, and surfactant may be added with or without agitation. Ti and Zr are exceptions. In these preparations, HNO3 is first diluted in butanol.
The process may comprise the step of agitating the micellar solution to form a solution, a dispersion or an emulsion. The emulsion may be a microemulsion. The agitating may be vigorous, moderate or mild. This mixing may comprise shaking, stirring, sonicating, ultrasonicating, swirling or some other form of agitation. The step of reacting may comprise the step of agitating the micellar solution or the step of agitating the micellar solution may be a separate step conducted before the step of reacting.
In accordance with the process of this disclosure, the micellar solution is heated at a temperature and for a period of time sufficient to form the mesoporous material. In particular, the micellar solution is heated at a temperature and for a period of time sufficient to form a dried powder. The dried powder is first washed with an alcohol, e.g., ethanol, to remove organic components, e.g., surfactant, and then heated at a temperature and for a period of time sufficient to form the mesoporous material. The heating may be in air, or in some other gas, for example, oxygen, nitrogen, carbon dioxide, helium, argon or a mixture of any two or more of these.
The micellar solution is heated sequentially in the following manner. The micellar solution can be first heated at a temperature from about 75° C. to about 150° C., preferably from about 85° C. to about 140° C., and more preferably from about 90° C. to about 130° C., for a period from about 1 to about 12 hours, preferably from about 1 to about 10 hours, and more preferably from about 1 to about 8 hours. Thereafter, the micellar solution can be heated at a temperature from about 40° C. to about 80° C., preferably from about 45° C. to about 75° C., and more preferably from about 50° C. to about 70° C., for a period from about 1 to about 12 hours, preferably from about 1 to about 10 hours, and more preferably from about 1 to about 8 hours, to form the dried powder. Then the material is washed with ethanol to remove surfactant. This sequential heating is carried out in a manner sufficient to remove chemisorbed and/or physisorbed NO3− and any left over NOx. The second heating step at the lower temperature is for removing the NOx species.
The dried powder is heated sequentially in the following manner. Firstly, the dried powder is heated at a temperature from about 100° C. to about 200° C., preferably from about 125° C. to about 175° C., and more preferably from about 140° C. to about 160° C., for a period from about 2 to about 20 hours, preferably from about 4 to about 18 hours, and more preferably from about 6 to about 16 hours. Secondly, the dried powder is heated at a temperature from about 200° C. to about 300° C., preferably from about 225° C. to about 275° C., and more preferably from about 240° C. to about 260° C., for a period from about 1 to about 10 hours, preferably from about 2 to about 8 hours, and more preferably from about 2 to about 6 hours. Thirdly, the dried powder is heated at a temperature from about 300° C. to about 400° C., preferably from about 325° C. to about 375° C., and more preferably from about 340° C. to about 360° C., for a period from about 1 to about 8 hours, preferably from about 1 to about 7 hours, and more preferably from about 1 to about 6 hours. Fourthly, the dried powder is heated at a temperature from about 400° C. to about 500° C., preferably from about 425° C. to about 475° C., and more preferably from about 440° C. to about 460° C., for a period from about 0.5 to about 5 hours, preferably from about 1 to about 4 hours, and more preferably from about 1 to about 3 hours. Fifthly, the dried powder is heated at a temperature from about 500° C. to about 600° C., preferably from about 525° C. to about 575° C., and more preferably from about 540° C. to about 560° C., for a period from about 0.1 to about 2 hours, preferably from about 0.25 to about 2 hours, and more preferably from about 0.5 to about 2 hours.
In an embodiment, the micellar solution is heated sequentially as follows: at a temperature of about 100° C.-120° C. for a period of about 2-7 hours; and at a temperature of about 60° C. for a period of about 8-12 hours (e.g., overnight). In another embodiment, the dried powder is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The process of this disclosure can be conducted at a pressure sufficient to form the mesoporous materials. Positive or negative pressures may be useful in the process of this disclosure. Suitable combinations of pressure, temperature and contact time may be employed in the process of this disclosure, in particular, temperature-pressure relationships that give mesoporous materials having desired properties and/or characteristics. The pressure may range between about ambient and about 50 atmospheres, preferably between about ambient to about 40 atmospheres, and more preferably between about ambient to about 25 atmospheres. Normally the process is carried out at ambient pressure.
The process may additionally comprise washing the dried powder, e.g., nanoparticulates, for a period of time sufficient to remove organic components therefrom. The washing liquid may be water, or an aqueous liquid, or with a non-aqueous liquid, or an organic liquid (e.g., ethanol), or some combination of these. The particles may be washed once or more than once, and may be washed between 1 and about 10 times or more. Each wash may be with the same washing liquid as any other wash, or may be with a different washing liquid. The washing may comprise exposing the nanoparticulates to the washing liquid, e.g. suspending the nanoparticulates in the washing liquid, and then separating the nanoparticulates from the washing liquid, using any of the separating processes described herein. In particular, the dried powder is washed with ethanol for a period of time sufficient to remove surfactant therefrom.
The process may additionally comprise at least partially separating the nanoparticulates from a fluid (e.g., washing fluid) in which they are located (optionally suspended or dispersed). This may comprise filtering, settling, decanting, centrifuging, vacuum filtering, dialysis, membrane filtering, magnetic separation, or some other suitable process, and may comprise more than one of these.
In an embodiment, the mesoporous materials can be nanoparticulates having a particle size between about 1 and about 500 nm, or between about 50 and about 300 nm, and a mean pore size between about 1 and about 50 nm, or between about 1 and about 30 nm or greater than 2 nm, or between about 2 and 13 nm. The nanoparticulates may have a 3-D cubic or 3-D foam-like mesostructure, or may have a 2-D hexagonal or wormlike mesostructure. The mesoporous nanoparticulates may comprise mesoporous transition metal oxides, sulfides, selenides, and tellurides, Lanthanide metal oxides, sulfides, selenides, and tellurides, post-transition metal oxides, sulfides, selenides, and tellurides and metalloid oxides, sulfides, selenides, and tellurides. The mesoporous metal oxides, sulfides, selenides, and tellurides may be doped with other elements, for example titanium, aluminum or zirconium. The mesoporous nanoparticulates may be spherical or some other regular shape. There is also provided a plurality of mesoporous nanoparticulates. The mean particle size of the nanoparticulates may be between about 1 and about 500 nm. The particle size distribution may be broad or narrow. There may be less than about 50% of nanoparticulates having a particle size more than 10% different from (greater than or less than) the mean particle size.
The mesoporous metal oxides, sulfides, selenides, and tellurides prepared by the process of this disclosure include oxides, sulfides, selenides, and tellurides of transition metals, Lanthanide metals, post-transition metals, metalloids, and mixtures thereof. For example, the transition metal oxides, sulfides, selenides, and tellurides comprise Group 3-12 transition metal oxides, sulfides, selenides, and tellurides, in particular, Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxides, sulfides, selenides, and tellurides. In an embodiment, the transition metal oxides, sulfides, selenides, and tellurides are selected from Group 6-12 transition metal oxides, sulfides, selenides, and tellurides including Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxides, sulfides, selenides, and tellurides. Preferably, the Group 6-12 transition metal oxides, sulfides, selenides, and tellurides include Mn, Fe, Co, Ni, Cu and Zn oxides, sulfides, selenides, and tellurides. The Lanthanide metal oxides, sulfides, selenides, and tellurides include La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxides, sulfides, selenides, and tellurides, or any mixture thereof. The post-transition metal oxides, sulfides, selenides, and tellurides include Al, Ga, In, Tl, Sn, Pb and Bi oxides, sulfides, selenides, and tellurides, or any mixture thereof. The metalloid oxides, sulfides, selenides, and tellurides include B, Si, Ge, As, Sb, Te, Po and At oxides, sulfides, selenides, and tellurides, or any mixture thereof.
The surface area of the mesoporous material particulates, e.g. BET surface area, maybe between about 50 and about 1000 m2/g, and may be between about 60 and 500, 70 and 200 and 80 and 190, m2/g, and may be about 50, 75, 100, 125, 150, 175 or 200 m2/g.
The pore volume (BJH) may be between about 0.05 and about 2 cm3/g, or between about 0.075 and 2, and 0.1 and 2 cm3/g, and may be about 0.05, 0.1, 0.15, 0.2 or 0.25 cm3/g.
The pore size (diameter), e.g., BJH desorption, may be between about 1 and 25 nm, or between about 1.5 and 20 nm, 2 and 15 nm, and 2 and 13 nm, and may be about 2.0, 2.5, 3.0, 3.5, 4.0, 4.5, 0.5.0, 5.5 and 6 nm
The wall thickness (2 d/√3-PD, where d is the d-spacing and PD is the pore diameter) may be between about 2 and about 20 nm, or between about 3 and about 16 nm, 4 and 14 nm, or 5 and 12 nm, and may be about 5.0 5.5, 6.0, 6.5, 7.0, 7.5, 8.0, 8.5, 9.0, 9.5 and 10.0 nm. The formula applies to 2-dimensional hexagonal materials.
The crystal structures of the nano-sized metal oxide, sulfide, selenide, and telluride walls include, for example, CeO2, Mn2O3, Mn3O4, Fe2O3, Fe3O4, Co3O4, ZnO, CuO, TiO2 (Anatase or Rutile), ZrO2, NiOOH, and the like.
The mesoporous particulates may be round or spherical, or may be oblate spherical, rod-like, aggregated, ellipsoid, ovoid, a modified oval shape, dome shaped, hemispherical; a round ended cylinder, capsule shaped, discoid, prismatic, acicular or polyhedral (either regular or irregular) such as a cube, a rectangular prism, a rectangular parallelepiped, a triangular prism, a hexagonal prism, rhomboid or a polyhedron with between 4 and 60 or more faces, or may be some other shape, for example an irregular shape.
The mesoporous materials of this disclosure exhibit properties that are advantageous for specific applications. For example, the mesoporous metal oxides, sulfides, selenides, and tellurides can exhibit thermal stability up to a temperature of about 350° C., preferably up to a temperature of about 450° C., and more preferably up to a temperature of about 550° C., and even more preferably up to a temperature of about 800° C. Also, the mesoporous metal oxides, sulfides, selenides, and tellurides can exhibit high pore volume after heat treatment cycles. For example, the unit cell expansion and pore-size increase do not cause a significant change at pore volume. In other words, ideally for a given material, one can change the pore size from the super micropore region (about 2 nm) to the mid mesopore region (about 20 nm) by preserving pore volume. Further, the mesoporous metal oxides, sulfides, selenides, and tellurides can exhibit physicochemical properties after catalytic reactions under high pressure and temperature. For example, catalytic tests done on mesoporous ZrO2 and CeO2 under 20 bar pressure of N2 or H2 at 150° C. did not cause any change of physicochemical properties of the materials.
The mesoporous material nanoparticulates, or a plurality thereof, can be useful for a variety of applications including, for example, catalysis, gas adsorption, synthesis of quantum dots and magnetic nanoparticles in functional materials and bioimaging applications, and as carriers for drugs, genes and proteins for biomedical applications. In particular, the mesoporous metal oxides are useful as catalysts, sensors, batteries and energy production, optical displays, environmental and sorbent applications.
There are several advantages afforded by the method of this disclosure including, for example, control of the crystal structure of the wall during heating, the possibility of synthesis without surfactant, precise control of pore size, and the method can be extended to a variety of transition metal oxides, sulfides, selenides, and tellurides, Lanthanide oxides, sulfides, selenides, and tellurides, post-transition metal oxides, sulfides, selenides, and tellurides and metalloid oxides, sulfides, selenides, and tellurides. The Pluronic® P123 surfactant is non-ionic and low foaming. Other advantages of the process of this disclosure for the synthesis of mesoporous materials are that H+ is not a concern, in principle the process is applicable to all transition metals, Lanthanide metals, port-transition metals and metalloids, different types of surfactants can be used, gelation is not required, the crystal structure (i.e., for manganese oxides, Hausmannite, Pyrolusite, Bixbyite) can all be formed, thickness of walls can be controlled, fine tuning of magnetic and optical properties is possible, and pore expansion on heat treatment of the mesoporous materials occurs. Highly optically pure glass materials, light sensitive lenses and ultraviolet absorbing lenses for plastic or glass materials may be made in accordance with the process of this disclosure.
Applications
The mesoporous materials of this disclosure can be used in many fields including industrial and medical fields. Some potential uses of these new materials are described herein.
Semiconductors: Semiconductor mesoporous materials with nano-sized crystalline domains exhibit different optical and electronic properties than their bulk analogues. Quantum confinement effect is the idea behind the tuning of these properties. Going from oxides to sulfides (or selenides or tellurides) band gap shifts to visible region by narrowing the band gap and increasing potential applications.
Non-metals (C): Carbon can be used in many different fields such as adsorption, separation, catalysis (with a proper modification), air purification, chromatography, and energy storage due to its high specific surface area (low density), chemical inertness, mechanical stability and unique electronic structure. The synthesis of mesoporous carbon with ordered mesoporosity and high surface area can serve an improvement in these applications.
Post-transition metals (Sn): A wide band gap semiconductor tin oxide has many applications in fabricating electronic and optic devices. One of the properties for electronic applications is the use of tin oxide in dye sensitized solar cells (DSSC). The wide band gap of SnO2 in the UV-range and less oxygen defects increases the lifetime of adsorbed dye molecules. Nano-sized crystalline domains can provide further advantages by both increasing the surface area (more adsorbed dye) and tuning the band gap. Moreover, SnO2 is a good Lewis acid and a good support for creating strong solid acids.
Transition Metal Oxides (Nb, Hf, Ta): Slow sol-gel chemistry of these transition metals brings more control of the structural properties. One can synthesize and control the structural parameters of these oxides for optical applications, capacitor fabrication, and oxidation catalysts.
Lanthanides (Nd, Sm, Gd): Nano-sized lanthanides (oxides) have many applications, for example, in MRI imaging (Gd2O3), synthesis, in neutron and infrared absorbing materials (Sm2O3), fabrication of colored glasses, and synthesis of polymerization catalysts (Nd2O3).
High pressure reactions (Mn and ZSM-5): High pressure synthesis of heterogeneous catalysts has been widely used in industry especially for the synthesis of zeolites. The use of high pressure can be essential for obtaining certain crystal phases with desired crystallinity. In accordance with this disclosure, manganese and aluminosilicate systems, for example, have been evaluated, and the crystal structures obtained for these systems cannot be obtained at atmospheric pressures. The use of higher pressures than atmospheric pressure can be used in mesoporous systems to develop or obtain unique materials for desired applications. In addition, the use of gels as precursors for unique materials further increases the importance of this approach.
Solid acid catalysts (sulfated, phosphated, tungstated, and tin loaded solid acids): Most of the major catalytic routes for biomass, biodiesel, organic synthesis of fine chemicals require an acid catalyst. The uses of homogeneous catalysts have some disadvantages such as corrosion and recyclability. Therefore, the need for solid acid catalysts has merged. Tunable acid strength, acid type and number of acid sites are required in the solid acid catalysts. The creation of mesoporosity along with high surface can increase the catalytic performance of these important types of solid acids. The mesoporous materials of this disclosure having tunable mesoporosity and high surface area can satisfy these requirements.
Synthesis of Methyl Levulinate or Methyl Lactate from Carbohydrates and Biomass Resources
In accordance with this disclosure, solid phase nanoparticles (e.g., UCT-48 sulfated titanium oxide anatase) can directly catalyze carbohydrates and wood chips to methyl levulinate or methyl lactate. Methyl levulinate is one of the most promising biofuel additives for biomass refineries. Methyl lactate is used chiefly as a solvent for cellulose acetate. The highly dispersed nanoparticles can be prepared as described herein under very mild conditions, obtaining single crystal phase (pure anatase) materials with average grain sizes of 4 nm. The catalyst can provide remarkably high yields (up to 80%) and excellent selectivity (up to 99%) with respect to products in the liquid phase. The biomass processes can be conducted at low temperatures (120° C. to 200° C.). The catalysts can also be recycled and reused.
Currently people are approaching the peak-high rate in consuming petroleum for chemicals and energy. The exhaustion of fossil fuel resources and issues of global warming make it very important to synthesize useful organic chemicals and fuels from carbohydrates (sugars) and biomass resources. Among various chemicals that can be synthesized from carbohydrates and biomass resources, methyl levulinate, which can be used as oxygenated diesel and gasoline fuel additives respectively, is one of the most promising biofuel additive for biomass refineries. Methyl levulinate can also be used as a precursor to various useful chemicals such as fuel additives, polyacrylates, polycarbonates, biodegradable herbicides, and photosynthesis promoters.
Levulinate acid is formed from sugars in the presence of large amounts of mineral acids as catalysts. For example, Biofine Corporation developed the first practical process for synthesis of levulinate acid from carbohydrate biomass, in which more than 300 mol % of H2SO4 was used. Several other syntheses of levulinate acid from biomass resources using metal chlorides as the catalysts have also been reported. However, all the reported methods used homogeneous based catalysts. The removal of the catalysts from the products, the strong reactor corrosion issue, and recycling of the catalysts are problematic. Therefore, the process of this disclosure is highly desirable in that it affords a less expensive but efficient heterogeneous catalyst to directly synthesize methyl levulinate from carbohydrates and biomass resources.
Preferred Embodiments
A process (1) for preparing a mesoporous material, said process comprising: providing a micellar solution comprising one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous material.
The above process (1) which is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (1) wherein the heating step comprises: heating the micellar solution at a temperature and for a period of time sufficient to form a dried powder; and heating the dried powder at a temperature and for a period of time sufficient to form the mesoporous material.
The above process (1) wherein the micellar solution is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the dried powder is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the dried powder is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above process (1) further comprising washing the dried powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the dried powder with ethanol for a period of time sufficient to remove surfactant therefrom.
The above process (1) wherein the mesoporous material comprises an oxide, a sulfide, a selenide or a telluride of the following: a transition metal selected from Cr, Zr, Nb, Hf and Ta; a Lanthanide selected from Nd, Sm, Ce and Gd; a post-transition metal comprising Sn; or a mixed metal or a solid acid selected from P—Zr, W—Zr, S—Ti, Sn—Zr and S—Zr; or wherein the mesoporous material comprises: a transition metal oxide selected from Cr2O3, ZrO2, Nb2O5, HfO2 and Ta2O5; a post-transition metal oxide comprising SnO2; and a Lanthanide oxide selected from CeO2, Nd2O3, Sm2O3 and Gd2O3; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
The above process (1) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above process (1) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above process (1) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (1) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above process (1) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, hydrochloric acid, sulfuric acid, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above process (1) wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (1) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above process (1) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5M to about 1 M.
The above process (1) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (1) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+ 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above process (1) wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (1) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above process (1) which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
A mesoporous material produced by the above process (1).
A process (2) for preparing a mesoporous material, said process comprising: preparing an acidic mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; aging the acidic mixture at a temperature and for a period of time sufficient to form a powder, film or gel; and heating the powder, film or gel at a temperature and for a period of time sufficient to form the mesoporous material; wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (2) wherein the mesoporous material comprises an oxide, a sulfide, a selenide or a telluride of the following: a transition metal selected from Cr, Zr, Nb, Hf and Ta; a Lanthanide selected from Nd, Sm, Ce and Gd; a post-transition metal comprising Sn; or a mixed metal or a solid acid selected from P—Zr, W—Zr, S—Ti, Sn—Zr and S—Zr; or wherein the mesoporous material comprises: a transition metal oxide selected from Cr2O3, ZrO2, Nb2O5, HfO2 and Ta2O5; a post-transition metal oxide comprising SnO2; and a Lanthanide oxide selected from CeO2, Nd2O3, Sm2O3 and Gd2O3; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (2).
The above process (2) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above process (2) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above process (2) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof; or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (2) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above process (2) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above process (2) wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (2) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant
The above process (2) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5 M to about 1 M.
The above process (2) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (2) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above process (2) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above process (2) wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (2) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above process (2) further comprising heating the powder, film or gel at a temperature and for a period of time sufficient to tune the structural properties of the mesoporous material.
The above process (2) wherein the powder, film or gel is heated at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein the powder, film or gel is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the powder, film or gel is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the powder, film or gel is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above process (2) which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
The above process (2) further comprising washing the powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the powder with ethanol for a period of time sufficient to remove surfactant therefrom.
A process (3) for preparing a mesoporous material, said process comprising: providing an acid unmodified mesoporous material prepared by the above process (1); treating the acid unmodified mesoporous material with an acid to form an acid modified mesoporous material; and heating the acid modified mesoporous material at a temperature and for a period of time sufficient to form the mesoporous material.
The above process (3) which is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (3) wherein the mesoporous material comprises a solid acid catalyst; or wherein the solid acid catalyst comprises: sulfated zirconium oxide, phosphated zirconium oxide or tungstated zirconium oxide; sulfated titanium oxide, phosphated titanium oxide or tungstated titanium oxide; sulfated tin oxide, phosphated tin oxide or tungstated tin oxide; or sulfated silicon oxide, phosphated silicon oxide or tungstated silicon oxide.
The above process (3) wherein the mesoporous material is selected from ZrO2, TiO2, SnO and SiO2; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (3).
The above process (3) wherein the acid is selected from sulfuric acid (as sulfate source), phosphoric acid (as phosphate source) and ammonium metatungstate (as tungsten source); or wherein the acid is a Lewis acid or a Brönsted acid.
The above process (3) wherein the treating is sufficient to preserve mesoporosity and crystalline structure of the mesoporous material; or wherein the heating is sufficient to preserve mesoporosity and crystalline structure of the mesoporous material.
The above process (3) further comprising heating the acid modified mesoporous material at a temperature and for a period of time sufficient to tune the structural properties of the solid acid catalyst; or wherein the acid modified mesoporous material is heated at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein the acid modified mesoporous material is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the acid modified mesoporous material is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the acid modified mesoporous material is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
A process (4) for preparing a mesoporous material, said process comprising: providing an acid unmodified mesoporous material having a first mesoporosity and crystalline structure, wherein the acid unmodified mesoporous material is prepared by the above process (1); treating the acid unmodified mesoporous material with an acid to form an acid modified mesoporous material having a second mesoporosity and crystalline structure; and heating the acid modified mesoporous material at a temperature and for a period of time sufficient to form the mesoporous material having a third mesoporosity and crystalline structure; wherein the second mesoporosity and crystalline structure is essentially the same as the first mesoporosity and crystalline structure, and the third mesoporosity and crystalline structure is essentially the same as the second mesoporosity and crystalline structure.
The above process (4) which is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (4) wherein the mesoporous material comprises a solid acid catalyst.
A one step process (5) for preparing a mesoporous material, said process comprising treating an acid unmodified mesoporous material with an acid to form said mesoporous material; wherein the treating is sufficient to preserve mesoporosity and crystalline structure of the mesoporous material; and wherein the acid unmodified mesoporous material is prepared by the above process (1).
The above process (5) which is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (5) wherein the mesoporous material comprises a solid acid catalyst; or wherein the solid acid catalyst comprises: sulfated zirconium oxide, phosphated zirconium oxide or tungstated zirconium oxide; sulfated titanium oxide, phosphated titanium oxide or tungstated titanium oxide; sulfated tin oxide, phosphated tin oxide or tungstated tin oxide; or sulfated silicon oxide, phosphated silicon oxide or tungstated silicon oxide.
The above process (5) herein the mesoporous material is selected from ZrO2, TiO2, SnO and SiO2; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (5).
The above process (5) wherein the acid is selected from sulfuric acid (as sulfate source), phosphoric acid (as phosphate source) and ammonium metatungstate (as tungsten source); or wherein the acid is a Lewis acid or a Brönsted acid.
The above process (5) wherein the acid is loaded from about 1% to about 30% (with respect to metal) in the mesoporous material.
The above process (5) wherein the mesoporous material comprises: sulfated zirconium oxide, phosphated zirconium oxide or tungstated zirconium oxide; sulfated titanium oxide, phosphated titanium oxide or tungstated titanium oxide; sulfated tin oxide, phosphated tin oxide or tungstated tin oxide; or sulfated silicon oxide, phosphated silicon oxide or tungstated silicon oxide.
The above process (5) further comprising heating the mesoporous material, wherein said heating is at a temperature and for a period of time sufficient to preserve mesoporosity and crystalline structure of the mesoporous material; or further comprising heating the mesoporous material at a temperature and for a period of time sufficient to tune the structural properties of the mesoporous material.
The above process (5) wherein the heating is sufficient to preserve mesoporosity and crystalline structure of the mesoporous material; or wherein the mesoporous material is heated at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein the mesoporous material is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the mesoporous material is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the mesoporous material is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
A process (6) for preparing mesoporous carbon, said process comprising: providing a mesoporous metal oxide, sulfide, selenide or telluride material containing a surfactant; wherein the mesoporous metal oxide, sulfide, selenide or telluride material is prepared by the above process (1); heating the mesoporous metal oxide, sulfide, selenide or telluride material containing a surfactant at a temperature and for a period of time sufficient to form a powder; and treating the powder to remove metal oxide, sulfide, selenide or telluride and to form the mesoporous carbon.
The above process (6) which is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (6) wherein said heating is at a temperature and for a period of time sufficient to preserve mesoporosity and crystalline structure of the mesoporous metal oxide material; or wherein said heating is at a temperature and for a period of time sufficient to cause carbonization.
The above process (6) wherein said heating is at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein said heating is sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above process (6) wherein treating the powder to remove metal oxide, sulfide, selenide or telluride is by chemical etching.
The above process (6) wherein the mesoporous metal oxide, sulfide, selenide or telluride material is comprised of interconnecting channels and the channels are filled with surfactant.
The above process (6) further comprising washing the powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the powder with ethanol for a period of time sufficient to remove surfactant therefrom.
A process (7) for preparing a mesoporous material, said process comprising: preparing an acidic mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; aging the acidic mixture at a temperature and for a period of time sufficient to form a gel; mixing the gel with urea in a urea: gel weight ratio of from about 0.5:1 to about 1.5:1; and heating the mixture at a temperature and for a period of time sufficient to form the mesoporous material; wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (7) wherein the mesoporous material comprises a mesoporous semiconductor material; or wherein the mesoporous material comprises a mesoporous metal sulfide; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (7).
The above process (7) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above process (7) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above process (7) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (7) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above process (7) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above process (7) herein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (7) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above process (7) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5 M to about 1 M.
The above process (7) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (7) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+ 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above process (7) wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (7) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above process (7) which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
The above process (7) further comprising washing the powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the powder with ethanol for a period of time sufficient to remove surfactant therefrom.
The above process (7) further comprising heating the mixture at a temperature and for a period of time sufficient to tune the structural properties of the mesoporous material; or wherein said heating is at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein said heating is sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
A process (8) for preparing a mesoporous material, said process comprising: providing a metal source material; stabilizing the metal source material with a tetrahedrally coordinated transition metal or post transition metal to form a gel; and heating the gel at a temperature and for a period of time sufficient to form the mesoporous material; wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (8) wherein the metal source material is a metatungstate source material and the tetrahedrally coordinated transition metal or post transition metal is Sn.
The above process (8) wherein the tetrahedrally coordinated transition metal or post transition metal is selected from Sn, Si, Ti and Zr.
The above process (8) further comprising heating the gel at a temperature and for a period of time sufficient to tune the structural properties of the mesoporous material.
The above process (8) wherein said heating is at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein said heating is sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above process (8) further comprising removing the tetrahedrally coordinated transition metal or post transition metal from the mesoporous material by chemical etching.
The above process (8) wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (8).
A process (9) for preparing mesoporous tungsten material, said process comprising: providing a metatungstate source material; stabilizing the metatungstate source material with a tetrahedrally coordinated transition metal or post transition metal to form a gel; and heating the gel at a temperature and for a period of time sufficient to form the mesoporous tungsten material; wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
A process (10) for preparing a mesoporous rigid film, said process comprising: providing a mesoporous film containing a surfactant; wherein the mesoporous film is produced from the mesoporous material by the above process (1); washing the mesoporous film containing a surfactant with an alcohol:water mixture; wherein the alcohol:water volume ratio is from about 1:1 to about 20:1; and heating the washed mesoporous film at a temperature and for a period of time sufficient to form the mesoporous rigid film.
The above process (10) which is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (10) further comprising heating the washed mesoporous film at a temperature and for a period of time sufficient to tune the structural properties of the mesoporous rigid film.
The above process (10) wherein the alcohol:water mixture comprises an ethanol:water mixture.
The above process (10) wherein the mesoporous rigid film comprises Cr2O3, ZrO2, TiO2, SiO2 or an aluminosilicate material; or wherein the mesoporous rigid film is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous rigid film produced by the above process (10).
The above process (10) wherein said heating is at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein said heating is sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
A process (11) for preparing a mesoporous material, said process comprising: preparing an acidic mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; aging the acidic mixture at a temperature and for a period of time sufficient to form a gel; and heating the gel at a pressure, temperature and for a period of time sufficient to form the mesoporous material; wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (11) wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (11).
The above process (11) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above process (11) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above process (11) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof; or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (11) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above process (11) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above process (11) wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (11) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above process (11) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5M to about 1 M.
The above process (11) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (11) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above process (11) wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (11) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above process (11) further comprising heating the gel at a pressure, temperature and for a period of time sufficient to tune the structural properties of the mesoporous material.
The above process (11) wherein said heating is at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein said heating is sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above process (11) wherein the pressure ranges from about 2 bar to about 40 bar.
The above process (11) which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
A process (12) for preparing a mesoporous material, said process comprising: preparing a mixture by mixing one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; adding an acid to the mixture to form a gel; aging the gel at a temperature and for a period of time sufficient to promote condensation of inorganic framework and removal of solvent; and heating the gel at a temperature and for a period of time sufficient to form the mesoporous material; wherein the process is a sol-gel micelle based process in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (12) wherein the mesoporous material comprises SnO or Cr2O3; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
A mesoporous material produced by the above process (12).
The above process (12) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above process (12) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above process (12) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof; or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (12) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above process (12) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above process (12) wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (12) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above process (12) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5M to about 1 M.
The above process (12) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above process (12) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above process (12) wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above process (12) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above process (12) which is conducted under process conditions sufficient to control pore size and pore size distribution of the metal oxide and crystal structure of nano-sized metal oxide walls.
The above process (12) further comprising heating the gel at a temperature and for a period of time sufficient to tune the structural properties of the mesoporous material.
The above process (12) wherein the gel is heated at a temperature from about 150° C. to about 700° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein said heating is sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein said heating is sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
A mesoporous material produced by a process comprising: providing a micellar solution comprising one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous material.
The above mesoporous material in which the process is a sol-gel micelle based process; or in which micellization and inter-micellar interaction in said process are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above mesoporous material wherein the heating step comprises: heating the micellar solution at a temperature and for a period of time sufficient to form a dried powder; and heating the dried powder at a temperature and for a period of time sufficient to form the mesoporous material.
The above mesoporous material wherein the micellar solution is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the dried powder is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the dried powder is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above mesoporous material further comprising washing the dried powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the dried powder with ethanol for a period of time sufficient to remove surfactant therefrom.
The above mesoporous material wherein the mesoporous material comprises an oxide, a sulfide, a selenide or a telluride of the following: a transition metal selected from Cr, Zr, Nb, Hf and Ta; a Lanthanide selected from Nd, Sm, Ce and Gd; a post-transition metal comprising Sn; or a mixed metal or a solid acid selected from P—Zr, W—Zr, S—Ti, Sn—Zr and S—Zr; or wherein the mesoporous material comprises: a transition metal oxide selected from Cr2O3, ZrO2, Nb2O5, HfO2 and Ta2O5; a post-transition metal oxide comprising SnO2; and a Lanthanide oxide selected from CeO2, Nd2O3, Sm2O3 and Gd2O3; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
The above mesoporous material wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above mesoporous material wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above mesoporous material wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof; or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or herein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above mesoporous material wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above mesoporous material wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, hydrochloric acid, sulfuric acid, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above mesoporous material wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above mesoporous material wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof or wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above mesoporous material wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5M to about 1 M.
The above mesoporous material wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above mesoporous material wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above mesoporous material wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above mesoporous material wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above mesoporous material which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
A method (1) of controlling nano-sized wall crystallinity and mesoporosity in mesoporous materials, said method comprising: providing a micellar solution comprising one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and heating the micellar solution at a temperature and for a period of time sufficient to control nano-sized wall crystallinity and mesoporosity in the mesoporous materials.
The above method (1) which is a sol-gel micelle based method; or in which micellization and inter-micellar interaction in said method are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above method (1) wherein the heating step comprises: heating the micellar solution at a temperature and for a period of time sufficient to form a dried powder; and heating the dried powder at a temperature and for a period of time sufficient to form the mesoporous material.
The above method (1) wherein the micellar solution is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the dried powder is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the dried powder is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above method (1) further comprising washing the dried powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the dried powder with ethanol for a period of time sufficient to remove surfactant therefrom.
The above method (1) wherein the mesoporous material comprises an oxide, a sulfide, a selenide or a telluride of the following: a transition metal selected from Cr, Zr, Nb, Hf and Ta; a Lanthanide selected from Nd, Sm, Ce and Gd; a post-transition metal comprising Sn; or a mixed metal or a solid acid selected from P—Zr, W—Zr, S—Ti, Sn—Zr and S—Zr; or wherein the mesoporous material comprises: a transition metal oxide selected from Cr2O3, ZrO2, Nb2O5, HfO2 and Ta2O5; a post-transition metal oxide comprising SnO2; and a Lanthanide oxide selected from CeO2, Nd2O3, Sm2O3 and Gd2O3; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
The above method (1) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above method (1) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above method (1) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above method (1) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above method (1) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, hydrochloric acid, sulfuric acid, or mixtures thereof or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above method (1) wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above method (1) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above method (1) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5 M to about 1 M.
The above method (1) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above method (1) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above method (1) wherein the one or more organic and/or inorganic additives are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above method (1) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above method (1) which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
A method (2) of tuning structural properties of mesoporous materials, said method comprising: selecting one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; providing a micellar solution comprising said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives; wherein said micellar solution comprises a dispersion of micelles in which at least a portion of said one or more metal precursors are solubilized in the micelles; and heating the micellar solution at a temperature and for a period of time sufficient to form the mesoporous materials.
The above method (2) wherein the structural properties are selected from unit cell size, pore size, pore type, pore volume, mesostructure type, and surface morphology.
The above method (2) which is a sol-gel micelle based method; or in which micellization and inter-micellar interaction in said method are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above method (2) wherein the heating step comprises: heating the micellar solution at a temperature and for a period of time sufficient to form a dried powder; and heating the dried powder at a temperature and for a period of time sufficient to form the mesoporous material.
The above method (2) wherein the micellar solution is heated sequentially as follows: at a temperature from about 75° C. to about 150° C. for a period from about 1 to about 12 hours; and at a temperature from about 40° C. to about 80° C. for a period from about 1 to about 12 hours; or wherein the dried powder is heated sequentially as follows: at a temperature from about 100° C. to about 200° C. for a period from about 2 to about 20 hours; at a temperature from about 200° C. to about 300° C. for a period from about 1 to about 10 hours; at a temperature from about 300° C. to about 400° C. for a period from about 1 to about 8 hours; at a temperature from about 400° C. to about 500° C. for a period from about 0.5 to about 4 hours; and at a temperature from about 500° C. to about 600° C. for a period from about 0.1 to about 2 hours; or wherein the dried powder is heated sequentially as follows: at a temperature of about 150° C. for a period of about 12 hours; at a temperature of about 250° C. for a period of about 4 hours; at a temperature of about 350° C. for a period of about 3 hours; at a temperature of about 450° C. for a period of about 2 hours; and at a temperature of about 550° C. for a period of about 1 hour.
The above method (2) further comprising washing the dried powder with an alcohol for a period of time sufficient to remove organic components therefrom; or further comprising washing the dried powder with ethanol for a period of time sufficient to remove surfactant therefrom.
The above method (2) wherein the mesoporous material comprises an oxide, a sulfide, a selenide or a telluride of the following: a transition metal selected from Cr, Zr, Nb, Hf and Ta; a Lanthanide selected from Nd, Sm, Ce and Gd; a post-transition metal comprising Sn; or a mixed metal or a solid acid selected from P—Zr, W—Zr, S—Ti, Sn—Zr and S—Zr; or wherein the mesoporous material comprises: a transition metal oxide selected from Cr2O3, ZrO2, Nb2O5, HfO2 and Ta2O5; a post-transition metal oxide comprising SnO2; and a Lanthanide oxide selected from CeO2, Nd2O3, Sm2O3 and Gd2O3; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
The above method (2) wherein the one or more metal precursors are selected from a metal halide, a metal phosphate, a metal acetate, a metal nitrate, a metal alkoxide, and a MxOy oxide that is capable of dissolving in HNO3; or wherein the one or more metal precursors comprise a metal halide; or wherein the one or more metal precursors comprise HfCl4 or NbCl4; or wherein the one or more metal precursors are selected from a transition metal precursor, a Lanthanide metal precursor, a post-transition metal precursor, a metalloid precursor, and mixtures thereof; or wherein the transition metal precursor comprises a Group 3-12 transition metal precursor; or wherein the Group 3-12 transition metal precursor is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the transition metal precursor is selected from a Group 6-12 transition metal precursor; or wherein the Group 6-12 transition metal precursor is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg precursor; or wherein the Group 6-12 transition metal precursor is selected from a Mn, Fe, Co, Ni, Cu and Zn precursor; or wherein the Lanthanide metal precursor is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu precursor; or wherein the Lanthanide metal precursor is selected from a Ce, Sm and Gd precursor; or wherein the post-transition metal precursor is selected from an Al, Ga, In, Tl, Sn, Pb and Bi precursor; or wherein the metalloid precursor is selected from a B, Si, Ge, As, Sb, Te, Po and At precursor.
The above method (2) wherein the one or more metal precursors are present in a molar concentration ratio of from about 1×10−2M to about 10 M.
The above method (2) wherein the one or more interface modifiers comprise an aliphatic, alicyclic or aromatic hydrocarbon of between about 1 and about 20 carbon atoms, or mixtures thereof; or wherein the one or more interface modifiers comprise an organic solvent that allows the surfactant to organize itself into inverse micelles; or wherein the one or more interface modifiers comprise n-butanol, pentanol, hexanol, higher carbon-containing alcohols, trimethyl benzene (TMB), acetylacetonate, lauric acid, toluene, benzene, cyclohexene, a carboxylic group-containing organic molecule, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above method (2) wherein the one or more interface modifiers are present in a molar concentration ratio of from about 1 M to about 40 M.
The above method (2) wherein the one or more hydrotropic ion precursors comprise HNO3, NaNO3, KNO3, metal iodides, metal thiocyanides, hydrochloric acid, sulfuric acid, or mixtures thereof; or wherein the one or more hydrotropic ion precursors comprise a hydrotropic ion selected from NO3−, SCN−, Br−, and I−, and the one or more lyotropic ion precursors comprise a lyotropic ion selected from Cl−.
The above method (2) wherein the one or more hydrotropic or lyotropic ion precursors are present in a molar concentration ratio of from about 1×10−2M to about 15 M.
The above method (2) wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an anionic, cationic, non-ionic, or zwitterionic surfactant, or mixtures thereof; or wherein the one or more surfactants comprise an EO/PO copolymer surfactant, or a surfactant represented by the formula
(HO(CH2CH2O)n(CH2CH(CH3)O)m(CH2CH2O)nH)
wherein m and n are the same or different, m is a value from about 10 to about 150, and n is a value from about 5 to about 150, or a surfactant represented by the formula
(PPO)x(PEO)y(PPO)z
wherein PPO is polypropylene oxide, PEO is polyethylene oxide, and x, y and z are values sufficient for the surfactant to have a hydrophilic-lipophilic balance (HLB) from about 1 to about 18; or wherein the one or more surfactants comprise (HO(CH2CH2O)20(CH2CH(CH3)O)30(CH2CH2O)20H), (HO(CH2CH2O)26(CH2CH(CH3)O)40(CH2CH2O)26H), (HO(CH2CH2O)129(CH2CH(CH3)O)56(CH2CH2O)129H), (HO(CH2CH2O)20(CH2CH(CH3)O)70(CH2CH2O)20H), or (HO(CH2CH2O)97(CH2CH(CH3)O)69(CH2CH2O)97H); or
wherein the one or more surfactants comprise a Triton® surfactant, a Tween® surfactant, a star type branched surfactant, glucose, an AB or BC polymer surfactant, wherein A is polyisoprene butylene, B is styrene, and C is selected from glucose, amine, carboxyl group-containing compound, and polyethylene glycol (PEG); a natural surfactant, or a gemini (dimeric) surfactant.
The above method (2) wherein the one or more surfactants are present in a molar concentration ratio of from about 1×10−5M to about 1 M.
The above method (2) wherein the one or more organic additives comprise urea, decane, octane, benzene, trimethyl benzene or mesitylene (TMB), substituted benzene, polyethylene glycol, thiourea, ethylene diamime, styrene, pyrene, naphthalene, azobenzene, aromatic dye molecules, naphthalene, phenolic compounds, formaldehyde, PPO, PEO, D-fructose, glucose, sucrose, cellulose, starch, citric acid, phenol, aromatic alcohols, aliphatic alcohols, carboxylic acids, phosphates, oleyl ether, lysine, glycine, glutamic acid, tosylate, carboxyl, acetylacetonate, lauric acid, toluene, cyclohexene, terpene, terpenoid hydrocarbons, citrus terpenes, d-limonene, or mixtures thereof.
The above method (2) wherein the one or more inorganic additives comprise aprotic and protic ionic liquids, ethylammonium nitrate (EAN), ethanolammonium nitrate (EOAN), diethanolammonium formate (DEOAF), laponite, [C2H3Si(OC2H5)3, (TESE, capping agent), H+, 4R-ammonium, ammonium, K+, Na+, Li+, Mg2+, Ca2+, guanidinium, OSO3−, SO3−, OPO3−, F−, Cl−, Br−, I−, SO42−, SCN−, HPO42−, acetate, NO3−, ClO4−, or mixtures thereof.
The above method (2) wherein the one or more organic and/or inorganic additive are present in a molar concentration ratio of from about 1×10−2 M to about 15 M.
The above method (2) wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 20 nanometers; or wherein the mesoporous material has a pore size (diameter) between about 2 nanometers and about 13 nanometers.
The above method (2) which is conducted under process conditions sufficient to control pore size and pore size distribution of the mesoporous material and crystal structure of nano-sized mesoporous material walls.
A process (13) for preparing methyl levulinate or methyl lactate, said process comprising: providing a carbohydrate or biomass source material; providing a solid acid catalyst comprising an acid modified mesoporous material; and reacting the carbohydrate or biomass source material in the presence of the solid acid catalyst at a temperature and pressure and for a period of time sufficient to form the methyl levulinate or methyl lactate; wherein the mesoporous material is prepared by the above process (1).
The above process (13) in which the preparation of the mesoporous material is a sol-gel micelle based process; or in which micellization and inter-micellar interaction are controlled by said one or more metal precursors, one or more surfactants, one or more interface modifiers, one or more hydrotropic or lyotropic ion precursors, and optionally one or more organic and/or inorganic additives.
The above process (13) wherein the solid acid catalyst comprises: sulfated zirconium oxide, phosphated zirconium oxide or tungstated zirconium oxide; sulfated titanium oxide, phosphated titanium oxide or tungstated titanium oxide; sulfated tin oxide, phosphated tin oxide or tungstated tin oxide; or sulfated silicon oxide, phosphated silicon oxide or tungstated silicon oxide.
The above process (13) wherein the mesoporous material is selected from ZrO2, TiO2, SnO and SiO2; or wherein the mesoporous material is selected from a transition metal oxide, sulfide, selenide or telluride; a Lanthanide metal oxide, sulfide, selenide or telluride; a post-transition metal oxide, sulfide, selenide or telluride; a metalloid oxide, sulfide, selenide or telluride; and mixtures thereof; or wherein the transition metal oxide, sulfide, selenide or telluride comprises a Group 3-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 3-12 transition metal oxide, sulfide, selenide or telluride is selected from a Sc, Y, La, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the transition metal oxide is selected from a Group 6-12 transition metal oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Cr, Mo, W, Mn, Tc, Re, Fe, Ru, Os, Co, Rh, Ir, Ni, Pd, Pt, Cu, Ag, Au, Zn, Cd and Hg oxide, sulfide, selenide or telluride; or wherein the Group 6-12 transition metal oxide, sulfide, selenide or telluride is selected from a Mn, Fe, Co, Ni, Cu and Zn oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a La, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb and Lu oxide, sulfide, selenide or telluride; or wherein the Lanthanide metal oxide, sulfide, selenide or telluride is selected from a Ce, Sm and Gd oxide, sulfide, selenide or telluride; or wherein the post-transition metal oxide, sulfide, selenide or telluride is selected from an Al, Ga, In, Tl, Sn, Pb and Bi oxide, sulfide, selenide or telluride; or wherein the metalloid oxide, sulfide, selenide or telluride is selected from a B, Si, Ge, As, Sb, Te, Po and At oxide, sulfide, selenide or telluride.
The above process (13) wherein the acid is selected from sulfuric acid (as sulfate source), phosphoric acid (as phosphate source) and ammonium metatungstate (as tungsten source); or wherein the acid is a Lewis acid or a Brönsted acid.
The above process (13) wherein the reacting is sufficient to preserve mesoporosity and crystalline structure of the mesoporous material.
In the above detailed description, the specific embodiments of this disclosure have been described in connection with its preferred embodiments. However, to the extent that the above description is specific to a particular embodiment or a particular use of this disclosure, this is intended to be illustrative only and merely provides a concise description of the exemplary embodiments. Accordingly, the disclosure is not limited to the specific embodiments described above, but rather, the disclosure includes all alternatives, modifications, and equivalents falling within the true scope of the appended claims. Various modifications and variations of this disclosure will be obvious to a worker skilled in the art and it is to be understood that such modifications and variations are to be included within the purview of this application and the spirit and scope of the claims.
All reactions in the following examples were performed using as-received starting materials without any purification.
Synthesis of Mesoporous Materials—General Procedure
Single or Multi Component Systems
Various transition metal (Cr, Zr, Nb, Hf, Ta), lanthanides (Nd, Sm, Gd), post-transition metals (Sn), mixed metals (W—Zr), and solid acids (P—Zr, W—Zr, and S—Zr) were synthesized with the following procedure. Metal precursor(s) was (were) mixed with an acidic surfactant solution at room temperature. The clear solution was aged (RT-120° C.) for a certain time (1 hour to 2 weeks) and the resulting product (powder or film or gel) was subjected to heating cycles (150° C. to 700° C.) for a certain time (1 hour to 12 hours). The amounts of ingredients used, aging time and temperature, and heating time and duration along with the visual observations are set forth in
Mesoporous Carbon (UCT-33)
As-synthesized UCT-14 (mesoporous SiO2) was heated to 900° C. for 2 hours under an argon atmosphere. The resulting black powder was put in a warm 0.5 M NaOH solution and stirred for 6 hours to etch out the silica and obtain mesoporous carbon.
Mesoporous Semiconductors (UCT-28-31)
In a procedure for the synthesis of mesoporous metal sulfides, transition metals (Cd, Zn or Cd—Zn mixture) were mixed with an acidic surfactant solution at room temperature. The clear solution was aged (120° C.) for a certain time (1 hour) and the obtained gel was added to urea (urea:metal was 1:1) which was in a glass autoclave. The glass autoclave was sealed and placed in an oven (65° C.-75° C.) for 3-6 hours. The resulting powders were washed with water and then with ingredients used, aging time and temperature, and heating time and duration, along with visual observations are set forth in
Mesoporous materials were prepared in accordance with the conditions set forth in
Semiconductors (CdS, ZnS, CdxZnyS (x+y=1))
Crystalline size dependent band gaps are known properties for nano-sized semiconductor materials due to nano confinement effects. More specifically, decreasing the particle size of any semiconductor causes a blue shift at the absorption edge. This phenomenon allows one to precisely tune the band gap.
CdS (UCT-29 and UCT-30) and ZnS (UCT-28) consist of micron sized particles (
The process of this disclosure also allows the synthesis of single or mixed metal sulfides.
SEM images of mixed metal sulfides (UCT-31) show similar morphologies with their single metal analogues (
Modifying composition of mixed metal sulfides by also keeping them nano-sized can lead to precise control of the band gap energies of semiconductor materials. Incorporation of Zn in to CdS nanocrystals causes a band gap shift from 2.42 eV (band gap of mesoporous CdS) to 3.52 eV (band gap of mesoporous ZnS).
Formation of a second phase is one of the widely encountered problems in synthesis of mixed metal systems not only for sulfides but also for oxides. The problem arises from different formation rates and thermodynamic stabilities of the desired phases over single phases. XRD might not be conclusive in all cases. Therefore, several DR-UV-Vis spectra were collected and compared for single metal sulfides (UCT-28 and UCT-30), mixed metal sulfide (UCT-31), and a physical mixture of single metal sulfides.
Variations at the Reaction Rate (Sn and Cr)
Having a controlled reaction rate is one of the crucial requirements in traditional sol-gel chemistry for the synthesis of mesoporous materials. Since a fast reaction rate means inorganic-inorganic interaction is more favorable than organic-inorganic interaction resulting with bulk non-porous oxides. Similarly too slow reactions causes poorly condensed inorganic framework and causes thermally unstable mesoporous materials. The most powerful tools employed to succeed a moderate reaction rate are temperature, pH, humidity, concentration, and additives (organic and inorganic). However, reaction rates do not play a significant role in the synthesis for mesoporous materials. Depending on the nature of inorganic system used, one can desire a very fast reaction rate (Sn) or a very slow reaction rate (Cr). Only criteria are confining inorganic precursors in core of inverted micelles for mesoporous materials. This simple approach allows one to synthesize mesoporous materials by inorganic materials in various regions of the periodic table.
All mesoporous tin oxide samples were synthesized in a glove box because of air sensitivity tin butoxide precursors. After the initial preparation of gels with surfactants, tin precursors, and butanol; acid was added directly. Since acidic media are catalysts for hydrolysis and condensation of tin butoxide, an instant gel formation was observed. After stirring the gel another 1 h at room temperature, this became rigid. The rigid gel was aged at different times (4 h for UCT-32 and 12 h for UCT-33) in an oven running at 120° C. Aging promotes further condensation of the inorganic framework and helps solvent removal. Good quality mesoporous materials are generally obtained after removing excess solvent. Since inorganic precursor loaded inverted micelles are packed in a more ordered fashion in concentrated gels than dilute gels. After solvent evaporation, the thick gel was calcined in air.
Different from the mesoporous tin oxide materials, the synthesis of mesoporous chromium requires long aging times (as long as 6 days). The reason for this long aging is the weak solubility and slow condensation rate of the chromium source. The reaction gel is almost six times more dilute than regular gels. Long aging time assures essential condensation before the solvent evaporates. Higher aging temperatures (>70° C.) results in crystallization of chromium out of the reaction gel.
N2 sorption measurements were conducted on UCT-37 (250° C.) and UCT-38 (350° C.) (
Nanocasting (C)
Carbon materials with high surface area are one of the widely used materials in many areas such as adsorption materials, catalyst supports, and anode materials. Syntheses of mesoporous carbon materials by nanocasting mesoporous silica have been widely investigated. One of the important findings is the role of interconnecting channels. After filling these channels with carbon, they become the backbone of the structure by supporting the mesostructure. Therefore, nanocasting with MCM-41 does not yield mesoporous carbon. Another important finding is the total carbon content of mesoporous template. Generally speaking, the use of surfactants as the only carbon source results in poorly ordered materials. Therefore, extra carbon sources (sucrose) are impregnated to increase the amount of carbon amount in the mesopores before the carbonization step. Moreover, nanocasting the mesopore structure also gives additional useful information about the template material.
In accordance with this disclosure, mesoporous carbon is synthesized by using mesoporous silicon dioxide (UCT-14). No additional carbon is introduced and surfactant is the only carbon source used. One can use other mesoporous materials as templates for the synthesis of mesoporous carbon.
Mesoporous silica sample (UCT-34) shows a Type IV adsorption isotherm followed by a Type I hysteresis loop indicating a regular mesopore structure (
Use of microporous silica (UCT-14 (450° C.)) as a hard template to synthesize mesoporous carbon (UCT-34) gives important information about the nature of mesoporous materials.
Transition Metal Oxides (Nb and Hf)
A limited number of nitrate and alkoxide sources used in making mesoporous oxides gives a limited number of materials. Therefore, the synthesis of mesoporous niobium (UCT-36) and hafnium (UCT-35) oxides with chloride sources makes the choice of source even more important. In addition, use of a lyotropic ion (Cl−) especially in dense micellar solutions is known to be problematic. However, by the current approach chloride sources do not cause a problem. UCT-35 (Hf) and UCT-36 (Nb) both have a single low angle diffraction line with positions of 6.9 nm and 8.3 nm, respectively (
Both Hf (UCT-35) and Nb (UCT-36) have Type IV adsorption isotherms and a Type I hysteresis loop (
SEM images of Nb (UCT-36) shows a porous structure (
Mesoporous Lanthanides (Nd, Sm, Gd)
Synthesis of mesoporous lanthanides is a field which is not as well known as transition metals. The first reason is that the sol gel chemistry of lanthanides is not well studied. The second reason is lack of strong interaction between the surfactant and lanthanides. Unlike transition metal surfactant interactions, lanthanide-surfactant interactions do not involve a charge transfer from surfactant to empty d orbitals. The process of this disclosure for the synthesis of mesoporous materials can overcome these above-mentioned problems. Therefore, the process of this disclosure makes the synthesis of mesoporous lanthanide oxides possible such as CeO2 (UCT-16), Nd2O3 (UCT-39), Sm2O3 (UCT-40), and Gd2O3 (UCT-41). A description of UCT-16 can be found, for example, in U.S. Patent Application Ser. No. 61/705,370, filed Sep. 25, 2012, and U.S. Patent Application Ser. No. 61/705,372, filed Sep. 25, 2012.
SEM analyses on synthesized UCT-39, UCT-40, and UCT-41 are shown in
Co-existence of mesopores and macropores can also be realized from N2 sorption data (
The process of this disclosure can be further modified to limit the porosity in the mesopore range. However, for certain applications the existence of macroporosity can be desired. In other words, a controlled macroporosity along with mesoporosity can be very useful.
High Pressure Reactions (Mn, Mn—K, Al—Si)
Mesoporous materials can be synthesized with various heating sources such as ovens, microwave devices, and ultrasound under atmospheric pressure (1 atm). The only requirement is the evaporation of solvent to promote packing of inverted micelles and the presence of oxygen for the oxidation of inorganic framework (for the atoms which need to get oxidize) species. The use of high pressure can be very important to obtain certain crystal structures for a given oxide material due to the thermodynamic stability of certain crystal structures. In principle, gels can be used as a precursor under high pressure conditions to obtain different crystal structures. For example, good quality zeolite materials can only be synthesized under high pressure. Aluminosilicate materials with similar chemical compositions of zeolites form amorphous materials at atmospheric pressure.
The manganese system has been studied to investigate the potential of use of high pressure in the synthesis of mesoporous materials.
Use of high pressure was also applied to the aluminosilicate system to synthesize one of the most famous members of the zeolite family (ZSM-5). Aged UCT-15 (aluminosilicate) with an Al:Si ratio of 1:100 was transferred to a high pressure reactor.
N2 sorption isotherms of UCT-44 show evidence for both microporosity and mesoporosity (
SEM analyses of UCT-44 samples show two different morphologies (
Other Synthetic Approaches for Mesoporous Materials (UCT-46 and UCT-47)
Depending on the metal source used two different types of products are obtained. Generally speaking, the use of salts (nitrate or chloride) results in product in a powder form and the use of alkoxide sources results in products in a rigid film form. Powder products are generally washed and were subjected to step wise heating cycles in order to tune the pore size from micropore to mesopore. However, products in film form were subjected to direct high temperature calcination, since any heat treatment below the burning temperature of the Pluronic® surfactant (400° C.) forms thermally stable coke. Washing these films as done with powder samples generally destroys the mesostructure. Therefore, a new approach was used to overcome this problem and obtain materials with tunable pore sizes which are a unique feature of mesoporous materials of this disclosure.
The problem arises from the poorly condensed inorganic framework after the reaction. Use of ethanol removes the surfactant but surfactant removal before total condensation causes the mesostructure to collapse. Therefore, as synthesized films were washed with an ethanol-water mixture (9:1 v:v). The role of ethanol is to remove surfactant and water promotes condensation and makes the mesostructure more stable.
Supported Materials (UCT-50 (W—Sn (9:1)))
Unlike most of the transition metals, tungsten has only limited available precursors. These sources generally have poor solubility and do not have the ability to be formed via sol-gel chemistry. One reason is the tendency of the tungsten to be in the form of a cluster rather than as individually solvated ions. A general approach is to prepare an alcohol soluble precursor by digesting ammonium metatungstate salt in peroxide. Even this approach is acceptable for formation of a precursor which has sol-gel chemistry. Tungsten is still in the form of big clusters and does not interact strongly with the surfactant micelles.
The current problem can be overcome with the following process of this disclosure. In this method, an insoluble metatungstate source is stabilized in gel form by use of tin (Sn). The same approach also allows one to use Si, Ti, and Zr for the same purpose. Tetrahedrally coordinated transition and post-transition metals stabilize the metatungstate source in gels (see also tungstated zirconia described herein). Metatungstate ion has almost no solubility in butanol, however incorporation of a tungsten source in a water-ethanol mixture gives a clear (or white) gel. Further heat treatments followed by a calcination step to remove surfactant results in mesoporous materials. The supporting metal can be removed by simple chemical etching.
Solid Acid Catalysts with Post Treatment (Sulphated Zirconia UCT-45)
Development of strong acid catalysts is essential for many industrial applications including biofuel production. Esterification and transesterification (biomass or biodisel) reactions are generally done under high pressure and temperature. Therefore, strong acid catalysts are stable under these conditions with tunable acid character (Lewis and Brönsted) and strength is essential. Some important catalysts which are known to be useful are sulfated, phosphated, and tungstated zirconia, titania, tin, and silica. H2SO4 (as sulfate source), H3PO4 (as phosphate source), ammonium metatungstate (as tungsten source) are most commonly used sources to bring super acidity to the support. Advantages of using mesoporous catalysts with high surface area and mesoporosity have been shown. However, one step synthesis of mesoporous solid acids is problematic. The above-mentioned sources affect both micellization of the surfactant and the sol-gel chemistry of the inorganic sources used. Therefore, a post treatment approach is more commonly employed to make mesoporous solid acid catalysts. Another important problem is the heat treatment temperature. These catalysts are activated by high calcination temperatures (as high as 800° C.). Generally speaking, high calcination temperatures increase the crystallinity of the inorganic framework and destroy the mesopore structure.
Mesoporous sulfated zirconia has been synthesized by using UCT-17 as a template and modifying the template material with sulfuric acid.
One Step Synthesis of Mesoporous Solid Acid Catalysts (S—Zr (UCT-48), S—Ti (UCT-49), P—Zr (UCT-50), W—Zr (UCT-51), Sn—Zr (UCT-53))
Sulfated zirconia and titania are one of the strongest solid acid catalysts and are known to have an acid strength close to sulfuric acid. As mentioned above the use of sulfuric and phosphoric acid during the synthesis to modify the mesopore surface is a challenge. The process of this disclosure for synthesizing mesoporous materials overcomes this problem. Sulfuric acid can be loaded up to 30% in Ti and Zr systems. 30% sulfuric acid (with respect to metal amount) is more than enough to cover the entire surface of the mesopores. The excess sulfate was removed by calcination.
Phosphated zirconia is another solid acid catalyst. Compared to S—Zr (UCT-48), P—Zr (UCT-50) has moderate acidity, which can be very important for selectively converting a material in a mixture. For example, a moderate acid can do acetalization of aldehydes but not ketalization of ketones. One can convert selectively aldehydes in an aldehyde-ketone mixture. With the current approach phosphoric acid can also be used to produce mesoporous solid acids.
Tungsten nanoclusters on amphoteric zirconia surfaces are also known to be effective to form strong solid acids. Mesoporous W—Zr (UCT-51) can also be synthesized with the current approach by using ammonium metatungstate as the tungsten source. Metatungstate is insoluble in reaction media and therefore was introduced by dissolution in water-ethanol mixtures. Immediately a white (opaque) gel formation was observed after addition of tungsten solution, indicating a strong interaction with zirconia gel.
Despite the strengths and amounts of acid sites being very important, the type of acid sites is also very crucial for selectivity. Sulfated and tungstated zirconia are two of the known Brönsted dominated solid acids. Tin doping is known to be a very useful tool to create strong Lewis acids on zirconia supports. Therefore tin chloride was used to synthesize mesoporous Sn—Zr (UCT-53) material. All UCT-53 samples have characteristic low angle diffraction lines indicating the mesostructured nature (
Synthesis of Methyl Levulinate from Carbohydrates and Biomass Resources
Titanium oxide nanoparticles were synthesized by co-precipitation of TiOSO4.xH2SO4 (Alfa Aesar) and ammonia solution in hot water (85° C.). The pH was controlled at 3 during the precipitation. The resultant suspension was then refluxed at 100° C. overnight. Impurities and by products, such as SO42− and NH4+ ions, were removed by filtration and washing with adequate amount of deionized water (D.I. water). The obtained powder was then dried overnight at 120° C.
All experiments were carried out in a 50 milliliter autoclave. In a typical reaction, 1 mmol of carbohydrate (0.18 grams of fructose/glucose or 0.09 grams of sucrose) or biomass resources (MW calculated as fructose), catalyst (0.01 to 0.2 grams), and solvent (methanol, 20 milliliters) were charged into the autoclave, followed by pressurizing with nitrogen (20 bar). The autoclave was heated to designated temperatures for various reaction times with stirring. After reaction was done, the autoclave was cooled in ice bath and the reaction mixture was filtered and analyzed.
Fourier transform infrared spectroscopy (FTIR) analysis indicated the surface functional groups (SO42−) of the synthesized TiO2 nanoparticles before and after the biomass reaction. After four recycling times, the functional groups still appear, showing the stability of the active sites of the nanoparticles. See
Thermogravimetric analysis (TGA) analysis showed around 10% mass loss at around 550° C. The mass loss is due to surface adsorbed water and the hydroxyl groups attached to the surface of the materials. The second mass change can be assigned to the loss of active SO42− groups on the surface as confirmed in FTIR analyses. See
High resolution scanning electron microscopy (HRSEM) shows the images of the synthesized titanium oxide nanoparticles, indicating the very fine particles obtained. The image of the used catalysts (
Surface are (SA) and porosity were evaluated. N2 physisorption for the obtained sulfated TiO2 nanoparticles showed a typical isotherm with hysteresis for that of porous materials. See
The catalytic activity of the synthesized TiO2 nanoparticles was evaluated for various biomass feeds.
All patents and patent applications, test procedures (such as ASTM methods, UL methods, and the like), and other documents cited herein are fully incorporated by reference to the extent such disclosure is not inconsistent with this disclosure and for all jurisdictions in which such incorporation is permitted.
When numerical lower limits and numerical upper limits are listed herein, ranges from any lower limit to any upper limit are contemplated. While the illustrative embodiments of the disclosure have been described with particularity, it will be understood that various other modifications will be apparent to and can be readily made by those skilled in the art without departing from the spirit and scope of the disclosure. Accordingly, it is not intended that the scope of the claims appended hereto be limited to the examples and descriptions set forth herein but rather that the claims be construed as encompassing all the features of patentable novelty which reside in the present disclosure, including all features which would be treated as equivalents thereof by those skilled in the art to which the disclosure pertains.
The present disclosure has been described above with reference to numerous embodiments and specific examples. Many variations will suggest themselves to those skilled in this art in light of the above detailed description. All such obvious variations are within the full intended scope of the appended claims.
This application claims the benefit, and is the U.S. national phase application under § 371, of International Application No. PCT/US14/37292, filed on May 8, 2014, which claims the benefit of U.S. Patent Application Ser. No. 61/822,685, filed May 13, 2013, and U.S. Patent Application Ser. No. 61/822,682, filed May 13, 2013, all of which are incorporated herein by reference in their entirety.
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| PCT/US2014/037292 | 5/8/2014 | WO | 00 |
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| WO2014/186210 | 11/20/2014 | WO | A |
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| 20160151768 A1 | Jun 2016 | US |
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| 61822685 | May 2013 | US | |
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