Claims
- 1. A metal chalcogenide composite nano-particle comprising a metal capable of forming p-type semiconducting chalcogenide nano-particles and a metal capable of forming n-type semiconducting chalcogenide nano-particles, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said metal capable of forming p-type semiconducting chalcogenide nano-particles is at least 5 atomic percent of said metal and is less than 50 atomic percent of said metal.
- 2. Metal chalcogenide composite nano-particle according to claim 1, wherein said metal chalcogenide composite nano-particle comprises a p-type semiconducting metal chalcogenide phase and a n-type semiconducting chalcogenide phase, at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said p-type semiconducting metal chalcogenide in said metal chalcogenide composite nano-particle is at least 5 mole percent and is less than 50 mole percent.
- 3. Metal chalcogenide composite nano-particle according to claim 1, wherein said metal chalcogenide composite particle is a coprecipitated particle.
- 4. Metal chalcogenide composite nano-particle according to claim 1, wherein said metal chalcogenide composite particle is a metal sulphide composite particle.
- 5. Metal chalcogenide composite nano-particle according to claim 1, wherein said metal capable of forming n-type semiconducting chalcogenide nano-particles is selected from the group consisting of zinc, bismuth, cadmium, mercury, indium, tin, tantalum and titanium.
- 6. Metal chalcogenide composite nano-particle according to claim 1, wherein said metal capable of forming p-type semiconducting chalcogenide nano-particles is selected from the group consisting of copper, chromium, iron, lead and nickel.
- 7. Metal chalcogenide composite nano-particle according to claim 1, wherein said metal chalcogenide composite particle further contains a metal capable of forming spectrally sensitizing chalcogenide nano-particles with a band-gap between 1.0 and 2.9 eV.
- 8. Metal chalcogenide composite nano-particle according to claim 7, wherein said metal capable of forming spectrally sensitizing chalcogenide nano-particles is selected from the group consisting of silver, lead, copper, bismuth, vanadium and cadmium.
- 9. Metal chalcogenide composite nano-particle according to claim 1, wherein a stoichiometric deficit of the chalcogenide in said metal chalcogenide composite nano-particle is present.
- 10. A dispersion comprising a metal chalcogenide composite nano-particle comprising a metal capable of forming p-type semiconducting chalcogenide nano-particles and a metal capable of forming n-type semiconducting chalcogenide nano-particles, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said metal capable of forming p-type semiconducting chalcogenide nano-particles is at least 5 atomic percent of said metal and is less than 50 atomic percent of said metal.
- 11. A process for preparing a dispersion comprising a metal chalcogenide composite nano-particle comprising a metal capable of forming p-type semiconducting chalcogenide nano-particles and a metal capable of forming n-type semiconducting chalcogenide nano-particles, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said metal capable of forming p-type semiconducting chalcogenide nano-particles is at least 5 atomic percent of said metal and is less than 50 atomic percent of said metal, comprising the steps of preparing a composite metal chalcogenide nano-particle containing an n-type semiconducting chalcogenide and a p-type semiconducting p-type semiconducting chalcogenide, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV.
- 12. Process according to claim 11, wherein said process further includes a coprecipitation step, a metal ion conversion step and/or a sintering step.
- 13. Process according to claim 11, wherein said coprecipitation is carried out in a medium containing at least one compound selected from the group consisting of thiols, triazole compounds and diazole compounds.
- 14. Process according to claim 11, wherein said process includes the step of mixing said metal chalcogenide composite nano-particles with spectrally sensitizing chalcogenide nano-particles with a band-gap between 1.0 and 2.9 eV.
- 15. Process according to claim 11, wherein said process comprises the step of converting said metal chalcogenide composite nano-particles with metal ions.
- 16. Process according to claim 11, wherein said process further includes a diafiltration process.
- 17. Process according to claim 16, wherein the washing medium in said diafiltration process contains a phosphoric acid or a phosphoric acid salt.
- 18. A layer comprising metal chalcogenide composite nano-particles comprising a metal capable of forming p-type semiconducting chalcogenide nano-particles and a metal capable of forming n-type semiconducting chalcogenide nano-particles, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said metal capable of forming p-type semiconducting chalcogenide nano-particles is at least 5 atomic percent of said metal and is less than 50 atomic percent of said metal.
- 19. Layer according to claim 18, wherein said layer further contains at least one spectral sensitizer for said metal chalcogenide composite nano-particles.
- 20. Layer according to claim 19, wherein said at least one spectral sensitizer is selected from the group consisting of metal chalcogenide nano-particles with a band-gap between 1.0 and 2.9 eV, organic dyes, and metallo-organic dyes.
- 21. Layer according to claim 18, wherein said layer further contains a binder.
- 22. Layer according to claim 21, wherein said binder is poly(vinyl pyrrolidone).
- 23. A photovoltaic device comprising a layer comprising metal chalcogenide composite nano-particles comprising a metal capable of forming p-type semiconducting chalcogenide nano-particles and a metal capable of forming n-type semiconducting chalcogenide nano-particles, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said metal capable of forming p-type semiconducting chalcogenide nano-particles is at least 5 atomic percent of said metal and is less than 50 atomic percent of said metal.
- 24. A process for using a metal chalcogenide composite nano-particle comprising a metal capable of forming p-type semiconducting chalcogenide nano-particles and a metal capable of forming n-type semiconducting chalcogenide nano-particles, wherein at least one of said metal chalcogenides has a band-gap between 1.0 and 2.9 eV and the concentration of said metal capable of forming p-type semiconducting chalcogenide nano-particles is at least 5 atomic percent of said metal and is less-than 50 atomic percent of said metal, in a photovoltaic device.
Priority Claims (1)
Number |
Date |
Country |
Kind |
PCT/EP02/10268 |
Sep 2002 |
WO |
|
Parent Case Info
[0001] This application claims the benefit of U.S. Provisional Application No. 60/411,734 filed Sep. 18, 2002, which is incorporated by reference. In addition, this application claims the benefit of International Application No. PCT/EP 02/10268 filed Sep. 12, 2002, which is also incorporated by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60411734 |
Sep 2002 |
US |