METAL MATERIAL FOR A WIRING CONNECTOR

Abstract
A metal material for a wiring connector in wiring connection between metallic members, wherein at least one of the metallic members is comprised of copper or a copper alloy, wherein a connecting portion surface of at least one of the metallic members has an average roughness Ra of 0.3 μm or less and a maximum roughness Rt of 2.0 μm or less, and wherein the metal material is excellent in glow resistance.
Description
TECHNICAL FIELD

The present invention relates to a metal material for a wiring connector in which at least one metallic member of the wiring connector is comprised of copper or a copper alloy material. More specifically, the present invention relates to a metal material for a wiring connector capable of preventing occurrence of glow and proliferation of cuprous oxide.


BACKGROUND ART

A wiring connector has been widely used for a potion of electric connection, e.g. an outlet of an electrical appliance or a switch of illumination. A metal is generally used for the connecting portion, and metals are brought into contact with each other to carry out electric connection. Hitherto, heat generation at the connecting portion has been of concern. It has been known that micro-electric discharge (glow) occurs at a connecting portion, and proliferation of cuprous oxide is induced by the micro-electric discharge, to increase a contact resistance, thereby resulting in heat generation.


There has been proposed a copper alloy for a wiring connector with its alloy component reviewed so that said glow and proliferation of cuprous oxide hardly occur.


However, even investigation into an alloy component cannot prevent heat generation due to the occurrence of glow and the proliferation of cuprous oxide.


DISCLOSURE OF INVENTION

The inventors of the present invention, having made extensive studies on a connecting portion of a wiring connector, found that a roughness (degree of roughness) of a surface of a material and occurrence of glow are related to each other. The inventors have made further studies based on this finding, to attain the present invention.


According to the present invention, the following means are provided:


(1) A metal material for a wiring connector in wiring connection between metallic members, wherein at least one of the metallic members is comprised of copper or a copper alloy, wherein a connecting portion surface of at least one of the metallic members has an average roughness Ra of 0.3 μm or less and a maximum roughness Rt of 2.0 μm or less, and wherein the metal material is excellent in glow resistance; and


(2) The metal material for a wiring connector according to the above item (1), wherein a ratio Rt/Ra between the maximum roughness Rt and the average roughness Ra is 10 or less, and wherein the metal material is excellent in glow resistance.


In the metal material for a wiring connector of the present invention, the average roughness Ra and the maximum roughness Rt are limited, and, preferably, a ratio of the maximum roughness Rt to the average roughness Ra is controlled in the above-mentioned range. As a result, occurrence of glow and proliferation of cuprous oxide can be prevented, and heat generation can be suppressed. Therefore, the metal material is suitable for a wiring connector, such as an outlet of an electrical appliance, or a switch of illumination.


Other and further features and advantages of the invention will appear more fully from the following description, taken in connection with the accompanying drawing.




BRIEF DESCRIPTION OF DRAWING


FIG. 1 is a schematic view of an apparatus for measuring glow resistance and cuprous oxide proliferation resistance, which apparatus was used in the following example.




BEST MODE FOR CARRYING OUT THE INVENTION

A preferred embodiment of the present invention will be described in detail. In the present invention, roughness is defined in accordance with JIS B 0601:2001. That is, the average roughness Ra in the present invention refers to the arithmetic average roughness of JIS B 0601:2001 mentioned above, and, similarly, the maximum roughness Rt in the present invention refers to the maximum sectional height of the roughness curve of JIS B 0601:2001 mentioned above.


In the present invention, at least one of the metallic members in wiring connection between the metallic members is comprised of copper or a copper alloy.


In the present invention, the surface at the connecting portion (contact point) of at least one of the metallic members, has an average roughness Ra of 0.3 μm or less and a maximum roughness Rt of 2 μm or less, and the metallic members preferably each have an average roughness Ra of 0.3 μm or less and a maximum roughness Rt of 2 μm or less.


The present invention include the case in which a metallic member having an average roughness Ra of 0.3 μm or less and a maximum roughness Rt of 2 μm or less is comprised of copper or a copper alloy, and the case in which such metallic member is comprised of not copper or a copper alloy but other metal material e.g. an Ni alloy.


The average roughness Ra of 0.3 μm or less and maximum roughness Rt of 2 μm or less are preferable because occurrence of glow can be drastically reduced.


A degree of roughness is an indication for irregularities of the surface of a material. It is assumed that voltages applied to the tips of the irregularities may converge to cause glow discharge.


In the present invention, when the average roughness Ra is more than 0.3 μm, it results that glow discharge be apt to occur. The average roughness Ra is preferably 0.2 μm or less.


On the other hand, similarly to the above, when the maximum roughness Rt is more than 2 μm, it results that glow discharge be apt to occur. The maximum roughness Rt is preferably 1 μm or less.


The average roughness Ra and maximum roughness Rt are preferably as small as possible. The lower limits of said average roughness Ra and maximum roughness Rt are not limited in particular, but generally the average roughness Ra is preferably 0.01 μm or more, and generally the maximum roughness Rt is preferably 0.05 μm or more.


The ratio Rt/Ra of the maximum roughness Rt to the average roughness Ra in the present invention is preferably 10 or less.


When the ratio Rt/Ra of the maximum roughness Rt to the average roughness Ra is 10 or less, occurrence of glow can be more effectively reduced. It is assumed that when the Rt/Ra is too large, it causes a site having large irregularities to be locally present so that glow discharge may be apt to occur at the site.


In the present invention, the ratio Rt/Ra is preferably 5 or less. The ratio Rt/Ra is preferably as small as possible. The lower limit of said ratio Rt/Ra is not limited in particular, but generally the ratio Rt/Ra is preferably 2 or more.


Any one of metals excellent in mechanical strength and electric conductivity is generally used for the metal material of the present invention for a wiring connector, because the metal material is required to have a contact pressure and electrical conductivity at a contact point. Of such metals, a stainless steel, a Ni alloy, and a copper alloy are preferable because they are excellent in mechanical strength and conductivity. It is more preferable that the metal material has a tensile strength of 500 MPa or more and/or a conductivity of 30% IACS or more.


Examples of the more preferable metal material include:

  • (1) a copper alloy comprising Sn 0.1 to 10 mass %, and P 0.001 to 0.5 mass %, the balance being copper and an inevitable impurity(s);
  • (2) a copper alloy comprising Cr 0.1 to 1.0 mass %, and 0.05 to 5 mass % of at least one element of Sn and Zn, the balance being copper and an inevitable impurity(s);
  • (3) a copper alloy comprising Ni 1.0 to 5.0 mass %, Si 0.3 to 1.3 mass %, and 0.05 to 5.0 mass % in total of at least one element of Mg, Sn, and Zn, the balance being copper and an inevitable impurity(s); and
  • (4) a copper alloy comprising Fe 0.5 to 3.0 mass %, and P 0.1 to 1.0 mass %, the balance being copper and an inevitable impurity(s).


The metal material for a wiring connector of the present invention can be produced by means of a general production method involving appropriate repetition, for example, of casting, hot-rolling, cold-rolling, and heat-treating. Further, the average roughness Ra and maximum roughness Rt can be controlled by washing the surface of the metal material with an acid, an alkali, or the like, or by changing the degree of roughness of a roll in a cold-rolling step.


EXAMPLE

The present invention will be described in more detail based on examples given below, but the invention is not meant to be limited by these.


Commercially available sheet materials each composed of a copper alloy or non-ferrous material with thickness 0.15 to 0.25 mm were obtained, and tensile strength, hardness, and conductivity of them were measured. Regarding tensile strength, a JIS-5 test piece was cut out from a direction parallel to the direction rolled, and its tensile strength was measured in accordance with JIS Z 2241. The hardness of the surface of the material was measured in accordance with JIS Z 2244 under a load of 100 g-wt. Regarding electrical conductivity (EC), a test piece with width 10-mm and length 150-mm was cut out from a direction parallel to the direction rolled, and its electrical conductivity was measured in accordance with JIS H 3200 with a distance between terminals of 100 mm. Tables 1 and 2 show the results. Please note that some of the samples given below had different values of mechanical strength, hardness, and electric conductivity, even though they had the same alloy composition, which was resulted due to the fact that their tempers or production conditions were not same each other.

TABLE 1SheetmaterialMain componentStrengthHardnessECNo.mass %MPaHv% IACS1Cu—0.15Sn443150882Cu—3.9Sn—0.15P422144193Cu—3.9Sn—0.15P655217174Cu—5.8Sn—0.12P688227145Cu—7.9Sn—0.2P721237136Cu—21Zn412141347Cu—32Zn482163288Cu—32Zn610203289Cu—0.55Cr5821947410Cu—0.29Cr—0.25Sn—0.5Zn5501847711Cu—0.28Cr—0.8Sn—0.45Zn5281775512Cu—0.28Cr—0.8Sn—0.45Zn6682215213Cu—0.3Cr—2Sn6852264114Cu—0.21Cr—0.11Zr—0.2Zn5221752215Cu—2.6Ni—0.55Si—0.1Mg5671897516Cu—2.3Ni—0.5Si—0.1Mg—0.15Sn—0.5Zn6802254217Cu—2.3Ni—0.5Si—0.1Mg—0.15Sn—0.5Zn7222384118Cu—3.7Ni—0.9Si—0.1Mg—0.15Sn—0.5Zn8152673519Cu—2.5Ni—0.55Si7122354120Cu—2.5Ni—0.55Si—0.5Zn73424148201Cu—0.25Cr—0.77Sn—0.3Zn67023151202Cu—0.25Cr—0.77Sn—0.3Zn69324151203Cu—0.3Cr—0.84Sn—0.4Zn68123550204Cu—0.3Cr—0.84Sn—0.4Zn70225050













TABLE 2








Sheet






material
Main component
Strength
Hardness
EC


No.
mass %
MPa
Hv
% IACS



















21
Cu—0.1Fe—0.04P
422
144
90


22
Cu—1Fe—0.5Sn—0.5Zn
534
179
55


23
Cu—2.4Fe—0.2P
534
179
64


24
Cu—1Ni—0.05P—0.9Sn
523
175
38


25
Cu—0.8Mg—0.05P
511
172
61


26
Cu—3.8Ti
882
288
11


27
Cu—0.15Ag
515
173
96


28
Cu—0.15Zr
498
168
94


29
Cu—0.2Be—1.1Ni
783
257
37


30
Cu—0.2Fe—0.05P—0.96Sn—0.1Ni—0.03B
511
172
75


31
Cu—0.1Fe—0.1Ni—0.05P—0.11Ni—0.04B
533
179
34


32
Cu—3.1Ni—0.68Si—0.3Zn
588
196
54


33
Cu—2.1Sn—0.1Fe—0.03P
562
188
35


34
Cu—2.1Ni—0.53Si—1Zn—0.5Sn
641
212
38


35
Cu—25Zn—0.6Sn
882
288
22


36
Al—0.4Si—0.4Fe—0.1Cu—0.33Mn—4.2Mg—0.1Cr
320
112
18


37
Fe—17Cr—7Ni
1823
582
4


38
Fe—18Cr—8Ni
1432
460
6


39
Fe—36Ni
634
210
3


40
Ni
622
206
18









The surface of the sheet materials was abraded with emery papers (abrasive papers having abrasive particles of SiC adhering to the papers' surface) of various counts of yarn in the same direction as the direction rolled, i.e. the direction parallel to the direction rolled, to obtain materials different from each other in surface roughness. That is, a sample sheet material was fixed on a smooth platen and abraded with emery paper, whose count of yarn was sequentially increased from #230 to #4,000 in eight stages, 30 times in the number of abrasion, and then the resultant surface was washed. It was judged that the abrasion could remove cuprous oxide on a surface layer, and the resultant was subjected to the following evaluation.


A surface roughness was measured in accordance with JIS H 3406. A sample material was scanned with a stylus (probe) by 4 mm in a direction perpendicular to the direction in which the material was abraded with emery papers or the direction rolled. The measurement was repeated three times, and the average value of the measurements was determined.


The resultant sheet materials were evaluated for glow resistance and cuprous oxide proliferation resistance.



FIG. 1 shows a schematic view of an apparatus for measuring glow resistance and cuprous oxide proliferation resistance.


Evaluation for glow resistance was performed as described below. That is, a copper wire 2 with diameter 2 mm was attached to a holder 1 equipped with a load applier, and a sample 3 of any one of the examples according to the present invention or the comparative examples was placed on a sample holder 4. Then, the sample was brought into contact with the copper wire 2, and a current flowing between the copper wire 2 and the sample 3 was adjusted to 4A, by means of Slidac (an autotransformer, trade name, manufactured by Toshiba) 8 and a variable resistor 6. Then, the sample holder 4 was vibrated with a vibrator 5, and the wave form of a voltage between the copper wire 2 and the sample 3 was observed with an oscilloscope 7. When glow (micro-electric discharge) occurred between the copper wire 2 and the sample 3, it changed the wave form on the oscilloscope 7. A frequency (the number of times vibrated) applied until the occurrence of the change in wave form was utilized to evaluate glow resistance. With respect to evaluation of grow resistance, when the number of vibration applied until occurrence of the change in wave form, which means occurrence of grow, is 1,000 or less, it is judged to be “poor”; when said number is more than 1,000 but not more than 2,000, it is judged to be “satisfactory”; and when said number is more than 2,000, it is judged to be “good”.


Then, evaluation for cuprous oxide proliferation resistance was performed as described below. Vibration with the vibrator 5 was stopped simultaneously with the confirmation of the occurrence of glow, and then the sample 3 was left to stand for 60 minutes. Then, the sample 3 was taken out, and then cuprous oxide formed on the surface of the sample 3 was collected, to measure the mass thereof. The mass, i.e. the proliferated amount of cuprous oxide (mg), was utilized to evaluate cuprous oxide proliferation resistance. With respect to evaluation of cuprous oxide proliferation resistance, when the mount of cuprous oxide formed (mg) is 200 mg or less, it is judged to be “good”; when said amount is more than 200 mg but not more than 250 mg, it is judged to be “satisfactory”; and when said amount is more than 250 mg, it is judged to be “poor”.


Tables 3 to 7 show the results.

TABLE 3GlowCuprousresist-oxideSheetanceproliferationmaterialRaRt×1,000resistanceNo.No.μmμmRt/Ra(times)(mg)Remarks110.120.826.83200153This210.211.718.146583invention320.151.238.04128133420.171.398.114676530.121.058.75212155630.221.778.017395740.191.527.97221157840.231.848.186180950.161.318.0929701050.161.358.291311201160.221.697.791721461260.161.348.1787961370.201.658.323301811470.171.307.7377801580.141.117.9334761680.181.447.8454821790.050.488.93971221890.181.397.60808719100.070.517.4941918020100.271.887.97294821110.070.628.7215314122110.252.008.02436523120.070.527.9111312824120.301.928.021259925130.070.608.01519426130.221.567.2018012727140.050.437.8412713328140.241.847.8323813929150.090.657.4530817130150.161.298.072543
















TABLE 4













Glow
Cuprous








resist-
oxide



Sheet



ance
proliferation



material
Ra
Rt

×1,000
resistance


No.
No.
μm
μm
Rt/Ra
(times)
(mg)
Remarks






















31
16
0.02
0.14
7.03
343
80
This


32
16
0.12
0.97
8.39
90
127
invention


33
17
0.06
0.52
8.01
263
165


34
17
0.13
1.09
8.56
40
62


35
18
0.01
0.06
4.95
125
155


36
18
0.20
1.67
8.24
215
93


37
19
0.04
0.24
6.54
38
81


38
19
0.25
1.92
7.83
54
127


39
20
0.02
0.22
9.12
242
87


40
20
0.27
1.89
7.05
32
53


41
21
0.11
0.92
8.37
100
111


42
21
0.21
1.65
7.88
82
88


43
22
0.08
0.58
7.40
69
119


44
22
0.16
1.20
7.50
32
62


45
23
0.11
0.89
7.84
33
62


46
23
0.14
1.21
8.33
37
68


47
24
0.18
1.42
7.93
48
79


48
24
0.16
1.38
8.46
41
72


49
25
0.20
1.57
7.95
213
89


50
25
0.14
1.16
8.15
42
73


51
26
0.12
0.99
8.03
116
117


52
26
0.21
1.70
8.10
27
54


53
27
0.13
1.06
8.40
131
135


54
27
0.21
1.69
7.90
127
79


55
28
0.06
0.48
7.77
196
152


56
28
0.22
1.76
8.16
94
87


57
29
0.01
0.05
9.33
263
149


58
29
0.28
1.87
6.75
248
156


59
30
0.05
0.47
9.32
379
181


60
30
0.26
1.99
7.55
154
120


601
201
0.11
1.25
11.36
221
155


602
202
0.14
1.38
9.86
123
131


603
203
0.13
1.05
8.08
112
120


604
204
0.18
1.18
6.56
104
115























TABLE 5













Glow
Cuprous








resist-
oxide



Sheet



ance
proliferation



material
Ra
Rt

×1,000
resistance


No.
No.
μm
μm
Rt/Ra
(times)
(mg)
Remarks






















61
31
0.05
0.46
9.69
162
137
This


62
31
0.24
1.89
7.86
196
131
invention


63
32
0.03
0.25
7.44
188
161


64
32
0.18
1.38
7.78
185
140


65
33
0.08
0.61
7.94
352
181


66
33
0.22
1.92
8.86
108
105


67
34
0.15
1.31
8.62
190
143


68
34
0.19
1.81
9.44
102
110


69
35
0.11
0.91
8.37
92
119


70
35
0.20
1.36
6.92
34
55


71
36
0.18
1.49
8.08
68
106


72
36
0.28
1.85
3.83
398
162


73
37
0.12
0.88
7.45
30
70


74
37
0.17
1.89
4.04
175
126


75
38
0.09
0.64
6.94
42
85


76
38
0.21
1.87
4.43
64
75


77
39
0.17
1.35
7.94
41
84


78
39
0.25
1.64
6.67
218
136


79
40
0.20
1.56
7.97
175
147


80
40
0.28
1.92
6.77
68
93


81
3
0.23
1.93
8.36
212
155


82
7
0.23
1.88
8.25
114
101


83
14
0.29
1.85
6.28
114
113


84
18
0.23
1.97
8.41
123
136























TABLE 6













Glow
Cuprous








resist-
oxide



Sheet



ance
proliferation



material
Ra
Rt

×1,000
resistance


No.
No.
μm
μm
Rt/Ra
(times)
(mg)
Remarks






















85
1
0.35
2.84
8.11
9.3
394
Compar-


86
2
0.41
3.24
7.91
2.0
354
ative


87
4
0.35
2.54
7.31
0.7
322
example


88
5
0.47
3.76
7.96
2.3
320


89
6
0.41
4.03
9.80
0.7
288


90
8
0.54
4.25
7.91
5.9
374


91
9
0.40
4.35
11.01
2.3
361


92
10
0.59
4.71
8.02
2.1
367


93
11
0.26
4.00
15.28
5.1
386


94
12
0.58
4.70
8.11
3.2
348


95
13
0.56
4.48
8.06
1.5
316


96
15
0.34
2.52
7.39
5.4
350


97
16
0.32
2.70
8.46
3.0
395


98
17
0.57
4.52
7.87
0.7
328


99
19
0.33
2.94
8.99
0.7
302


100
20
0.48
3.88
8.04
4.5
385























TABLE 7













Glow
Cuprous








resist-
oxide



Sheet



ance
proliferation



material
Ra
Rt

×1,000
resistance


No.
No.
μm
μm
Rt/Ra
(times)
(mg)
Remarks






















101
21
0.39
3.20
8.22
3.3
327
Compar-


102
22
0.21
3.35
15.75
1.2
332
ative


103
23
0.22
3.36
15.23
1.0
311
example


104
24
0.44
2.54
5.72
3.4
328


105
25
0.23
3.45
15.05
8.2
366


106
26
0.13
2.41
18.28
2.0
305


107
27
0.49
3.86
7.93
6.1
375


108
28
0.23
2.90
12.55
6.1
376


109
29
0.26
2.89
11.08
5.8
377


110
30
0.45
3.62
8.00
0.9
422


111
31
0.36
3.11
8.53
1.8
330


112
32
0.41
3.28
8.02
3.8
404


113
33
0.28
3.81
13.73
5.9
407


114
34
0.45
3.57
7.90
9.5
428


115
35
0.49
3.96
8.04
8.7
410


116
36
0.29
3.92
13.60
3.8
365


117
37
0.27
3.57
13.02
1.1
320


118
38
0.33
2.70
8.18
9.0
425


119
39
0.64
5.16
8.04
0.7
378


120
40
0.70
5.60
8.01
1.2
340









As is apparent from Tables 3 to 7, the sheet materials Nos. 85-to 120 for comparison each had a too large Ra or too large Ra and Rt, so they showed a conspicuously large amount of cuprous oxide proliferated, or alternatively, they were poor in glow resistance and showed a conspicuously large amount of cuprous oxide proliferated.


Contrary to the above, it is found that the sheet materials of the present invention shown in Nos. 1 to 84 and 601 to 604 each were excellent, since they each were excellent in glow resistance and showed a drastically small amount of cuprous oxide proliferated.


INDUSTRIAL APPLICABILITY

In the metal material of the present invention for a wiring connector, the average roughness Ra and the maximum roughness Rt are limited, and, preferably, a ratio of the maximum roughness Rt to the average roughness Ra is controlled in a prescribed range. As a result, occurrence of glow and proliferation of cuprous oxide can be prevented, and heat generation can be suppressed. Therefore, the metal material of the present invention is preferable for use in a wiring connector, such as an outlet of an electrical appliance, or a switch of illumination.


Having described our invention as related to the present embodiments, it is our intention that the invention not be limited by any of the details of the description, unless otherwise specified, but rather be construed broadly within its spirit and scope as set out in the accompanying claims.

Claims
  • 1. A metal material for a wiring connector in wiring connection between metallic members, wherein at least one of the metallic members is comprised of copper or a copper alloy, wherein a connecting portion surface of at least one of the metallic members has an average roughness Ra of 0.3 μm or less and a maximum roughness Rt of 2.0 μm or less, and wherein the metal material is excellent in glow resistance.
  • 2. The metal material for a wiring connector as claimed in claim 1, wherein a ratio Rt/Ra between the maximum roughness Rt and the average roughness Ra is 10 or less, and wherein the metal material is excellent in glow resistance.
  • 3. The metal material for a wiring connector as claimed in claim 1, wherein the metal material has a tensile strength of 500 MPa or more, and an electric conductivity of 30% IACS or more.
  • 4. The metal material for a wiring connector as claimed in claim 1, wherein the metal material is comprised of a copper alloy comprising Sn 0.1 to 10 mass %, and P 0.001 to 0.5 mass %, the balance being copper and inevitable impurities.
  • 5. The metal material for a wiring connector as claimed in claim 1, wherein the metal material is comprised of a copper alloy comprising Cr 0.1 to 1.0 mass %, and 0.05 to 5 mass % of at least one element of Sn and Zn, the balance being copper and an inevitable impurities.
  • 6. The metal material for a wiring connector as claimed in claim 1, wherein the metal material is comprised of a copper alloy comprising Ni 1.0 to 5.0 mass %, Si 0.3 to 1.3 mass %, and 0.05 to 5.0 mass % in total of at least one element of Mg, Sn, and Zn, the balance being copper and an inevitable impurities.
  • 7. The metal material for a wiring connector as claimed in claim 1, wherein the metal material is comprised of a copper alloy comprising Fe 0.5 to 3.0 mass %, and P 0.1 to 1.0 mass %, the balance being copper and an inevitable impurities.
  • 8. The metal material for a wiring connector as claimed in claim 2, wherein the metal material has a tensile strength of 500 MPa or more, and an electric conductivity of 30% IACS or more.
  • 9. The metal material for a wiring connector as claimed in claim 2, wherein the metal material is comprised of a copper alloy comprising Sn 0.1 to 10 mass %, and P 0.001 to 0.5 mass %, the balance being copper and inevitable impurities.
  • 10. The metal material for a wiring connector as claimed in claim 2, wherein the metal material is comprised of a copper alloy comprising Cr 0.1 to 1.0 mass %, and 0.05 to 5 mass % of at least one element of Sn and Zn, the balance being copper and an inevitable impurities.
  • 11. The metal material for a wiring connector as claimed in claim 2, wherein the metal material is comprised of a copper alloy comprising Ni 1.0 to 5.0 mass %, Si 0.3 to 1.3 mass %, and 0.05 to 5.0 mass % in total of at least one element of Mg, Sn, and Zn, the balance being copper and an inevitable impurities.
  • 12. The metal material for a wiring connector as claimed in claim 2, wherein the metal material is comprised of a copper alloy comprising Fe 0.5 to 3.0 mass %, and P 0.1 to 1.0 mass %, the balance being copper and an inevitable impurities.
Priority Claims (2)
Number Date Country Kind
2005-061731 Mar 2005 JP national
2005-365616 Dec 2005 JP national
Continuations (1)
Number Date Country
Parent PCT/JP2006/304257 Mar 2006 US
Child 11851044 Sep 2007 US