Metallated metal-organic frameworks

Abstract

Porous metal-organic frameworks (MOFs) and metallated porous MOFs are provided. Also provided are methods of metallating porous MOFs using atomic layer deposition and methods of using the metallated MOFs as catalysts and in remediation applications.

Description

BACKGROUND

Metal-organic frameworks (MOFs) are a class of hybrid materials comprising inorganic nodes and organic linkers. In many instances coordinatively unsaturated metal sites—either at the linkers or the nodes—are essential for engendering desired functional behavior. These sites can facilitate catalysis, gas storage, and gas separation.

MOFs have been metal-functionalized from the condensed phase (i.e., solution) either in de novo fashion or via post-synthesis modification. (See, Gordon, R. G.; Hausmann, D.; Kim, E.; Shepard, J. Chem. Vapor Depos. 2003, 9, 73.) Unfortunately, considerable effort (in the form of purification and activation) is necessary to ensure that excess metals, and/or undesired solvent and other reagents, are removed from solution-metallated MOFs. Solvent molecules can also irreversibly ligate otherwise coordinatively unsaturated metal sites, yielding, in turn, less-than-desirable materials properties.

Meilikhov et al. demonstrated that a variety of metal inclusion compounds (i.e., “metal@MOF” host-guest complexes) could be synthesized utilizing chemical vapor infiltration from volatile metal complexes under “sublimation-like” conditions. (See, Meilikhov, M.; Yusenko, K.; Esken, D.; Turner, S.; Van Tendeloo, G.; Fischer, R. A. Eur. J. Inorg. Chem. 2010, 3701.) However, little control can be obtained over the spatial distribution of the metal species within the MOF and, in some instances, the resulting metal@MOF structures are unstable.

SUMMARY

Porous metal-organic frameworks , metallated porous metal-organic frameworks and methods of making and using them are provided.

The methods of metallating a porous metal-organic framework comprise depositing a film comprising a metal on the surfaces within the pores of the metal-organic framework via atomic layer deposition. An example of a porous metal-organic framework suitable for metallation has the formula Zr₆ (μ₃-OH)₈(OH₈)(TBAPy)₂.

In some embodiments of the metallated metal-organic frameworks the metal film comprises catalytic sites. Such embodiments can be used to catalyze a reaction by exposing chemical reactants to the metallated metal-organic framework under conditions in which the metal film catalyzes the reaction.

In some embodiment of the metallated metal-organic frameworks the metal film comprises sorption sites. Such embodiments can be used in remediation applications by exposing a sample to the metallated metal-organic framework, whereby species in the sample are adsorbed or absorbed at the sorption sites of the metallated metal-organic framework, and removing the metallated metal-organic framework and adsorbed or absorbed species from the sample.

Other principal features and advantages of the invention will become apparent to those skilled in the art upon review of the following drawings, the detailed description, and the appended claims.

BRIEF DESCRIPTION OF THE DRAWINGS

Illustrative embodiments of the invention will hereafter be described with reference to the accompanying drawings.

FIG. 1. An illustration of metallation by ALD in a MOF (AIM).

FIG. 2. Relevant structural features and representations of NU-1000. For simplicity hydrogen atoms are not shown.

FIG. 3. PXRD Patterns of NU-1000 simulated (Sim.), NU-1000 experimental (Exp.), Zn-AIM, and Al-AIM.

FIG. 4. DFT pore size distributions and N₂ adsorption isotherms (inset) for NU-1000, Zn-AIM, and Al-AIM.

FIG. 5. DRIFTS spectra for NU-1000, Zn-AIM and Al-AIM.

FIG. 6A. SEM-EDX images and spectra of NU-1000. FIG. 6B. SEM-EDX images and spectra of Zn-AIM. FIG. 6C. SEM-EDX images and spectra of and Al-AIM. The dashed line indicates where the EDX scan was taken.

FIG. 7. Residual electron density plots of the secondary framework observed within the mesopores of NU-1000.

FIG. 8. A Zr₆-based node of NU-1000 comprising a staggered mixed proton topology with the molecular formula [Zr₆(μ₃-O)₄(μ₃-OH)₄(OH)₄(H₂O)₄]⁸⁺.

DETAILED DESCRIPTION

Porous MOFs and metallated porous MOFs are provided. Also provided are methods of metallating the porous MOFs using atomic layer deposition and methods of using the metallated MOFs as catalysts and in remediation applications.

The MOFs have a structure comprising inorganic (e.g., metal) nodes, also referred to as centers, coordinated via organic molecular linkers to form a highly connected porous network. The surfaces of the interior pores of the MOF can be metallated using atomic layer deposition (ALD). ALD is a vapor-phase synthetic technique for depositing thin-films. Unlike other vapor-phase deposition techniques (e.g., chemical vapor deposition/infiltration) the precursor molecules in ALD deposit only at chemically reactive surface sites and do not react with themselves—that is, the reactions are self-limiting. As a result, ALD can be used in a layer-by-layer film deposition process using cycle exposures of precursor molecules with intervening purge cycles. The process for metallating a MOF via ALD is referred to herein as AIM (metallation by ALD in a MOF).

The MOFs used in the AIM process are desirably characterized by the following properties: (1) they have mesoporous channels in order to facilitate the diffusion of ALD reactants within the MOF; (2) they are thermally and hydrolytically stable at temperatures in the range from 100-300° C.; and (3) the surfaces of their pores are functionalized with spatially oriented functional groups that are able to react with ALD precursors to facilitate self-limiting film-forming reactions via ALD. As used herein, the term mesoporous refers to porous materials having an average pore size in the range from about 2 to about 50 nm. Methods of measuring pore sizes are described in the example. Hydroxyl groups (—OH) are an example of a functional group that reacts with ALD precursor molecules. Other examples of suitable functional groups include water (H₂O), carboxylic acids (R—COOH), amine groups having a lone pair of electrons or a basic proton (e.g., ethylenediamine or triethylenediamine), and base groups comprising one or more O, S, P or C atoms, such as those from sulfonic acid (R—SO₃H) and phosphonic acid (e.g., R—PO₃H).

Examples of MOFs having all of the above-referenced properties are zirconium MOFs constructed from hexa-Zr^IV nodes and tetratopic linkers. Such MOFs are stable to 500° C., can contain mesoporous channels and can contain spatially oriented —OH groups. (See, Cavka, J. H.; Jakobsen, S.; Olsbye, U.; Guillou, N.; Lamberti, C.; Bordiga, S.; Lillerud, K. P. J. Am. Chem. Soc. 2008, 130, 13850; Morris, W.; Volosskiy, B.; Demir, S.; Gándara, F.; McGrier, P. L.; Furukawa, H.; Cascio, D.; Stoddart, F. J.; Yaghi, O. M. Inorg. Chem. 2012, 51, 6443.) A specific example of a zirconium MOF that can be metallated using the AIM process has the molecular formula Zr₆(μ₃-OH)₈(OH)₈(TBAPy)₂ and the structure shown in FIG. 2. This MOF is referred to herein as NU-1000. Alternative formulations of the structure of NU-1000 comprise oxo and aquo ligands in place of hydroxo ligands. Both of these alternative formulations are capable of undergoing AIM to provide a metallated MOF.

Thus, for embodiments of the MOFs comprising aquo ligands, the molecular formula for the MOF can be described more generally as having nodes represented by the formula [Zr₆(μ₃-O)₈(O)₈(H₁₆)]⁸⁺ bridged by tetracarboxylate linkers. An example of a node comprising aquo ligands in place of some hydroxo ligands is depicted in FIG. 8. This isomer of the node, comprises a staggered mixed proton topology with the formula [Zr₆(μ₃-O)₄(μ₃-OH)₄(OH)₄(H₂O)₄]⁸⁺.

A schematic diagram illustrating the AIM process is shown in FIG. 1, where the MOF structure is represented by a matrix of hexagonal pores. In this embodiment, the interior surfaces of the pores are functionalized by hydroxyl groups that react with a metal-containing ALD precursor molecule, such as a metal-organic molecule, to provide a film comprising the metal on the surface of the pores. The ALD process illustrated in this figure uses cyclic exposures of trimethylaluminum, as the metal-containing precursor molecule, with a nitrogen purge cycle.

The films deposited within the pores of the MOF include films comprising a single metal element and films comprising a plurality of metal elements, such as films comprising a binary combination of metal elements. Aluminum and zirconium are examples of metals that can be deposited using ALD. Other metals that can be deposited include Mg, Si, Ca, Ti, V, Cr, Mn, Fe, Co, Ni, Cu, Zn, Ga, Ge, As, Se, Sr, Y, Nb, Mo, Ru, Rh, Pd, Ag, Cd, In, Sn, Sb, Ba, La, Hf, Ta, W, Re, Os, Ir, and Pt. Moreover, although much of the present disclosure focuses on the use of ALD to form metal films, oxide films, such as metal oxide films, can also be formed in the pores of the MOFs via ALD using, for example, repetitive metal-containing precursor/water exposure cycles.

The metallated MOFs can be used as catalysts for chemical reactions and in remediation applications. For example, some embodiments of the metallated MOFs comprise Lewis acidic sites that catalyze condensation reactions, as illustrated in the example below. Some embodiments of the metallated MOFs comprise sorption sites onto which species (e.g., metal elements, molecules or ions) from a sample (e.g., a vapor phase or liquid phase sample) are adsorbed or absorbed. For example, the metallated MOFs may be used for the capture of heavy toxic metals in water remediation application, or to remove harmful chemical and/or biological agents from the environment.

EXAMPLE

The example illustrates the synthesis and characterization of a Zr-based MOF (NU-1000), as well as the use of NU-1000 as a platform for quantitative, self-limiting metallation by AIM.

Materials

All compounds and solvents: 1,3,6,8-Tetrabromopyrene (Aldrich, 97%), (4-(methoxycarbonyl)phenyl)boronic acid (Combi-Blocks, 98%), K₃PO₄ (Aldrich), tetrakis(triphenylphosphine) palladium(0) (Strem Chemicals, 99%), benzoic acid (Aldrich, 99.5%), ZrCl₄ (Aldrich, 99.5%), hydrochloric acid (Aldrich, 37%), neat diethylzinc (ZnEt₂) (Aldrich, Zn 52 wt % minimum) and 1.1 M solution in toluene (Aldrich), neat trimethylaluminum (AlMe₃) (Aldrich, ≧36.3% Al) and 2.0 M solution in toluene (Aldrich), acetone (Macron, 98%), chloroform (BDH, 99.8%), 1,4-dioxane (Aldrich, 99.8%, anhydrous), N,N-dimethylformamide (DMF) (Macron, 99.8%), tetrahydrofuran (THF) (Macron, 99.0%), deuterated chloroform (d-CDCl₃) (Cambridge, 99.8%), deuterated dimethylsulfoxide (d₆-DMSO) (Cambridge, 99%), deuterated sulfuric acid (D₂SO₄) (Cambridge, 96-98% solution in D₂O) were used as received without further purification. n-pentane was dried on solvent still station before use.

Instrumentation.

¹H NMR spectra were recorded on a 500 MHz Varian INOVA spectrometer and referenced to the residual solvent peak. Single crystals of NU-1000 were mounted in inert oil and transferred to the cold gas stream of a Bruker Kappa APEX CCD area detector equipped with a CuKα microsource with MX optics. Powder X-ray diffraction measurements were carried out on a Bruker MX IμS microsource with Cu Kα radiation and an Apex II CCD detector. The samples were mounted in capillaries as powders, sealed with wax and placed on a goniometer head. The data were collected on an area detector with rotation frames over 180° in φ and at 2θ values of 12, 24, and 36° being exposed for 10 min at each frame. Overlapping sections of data were matched, and the resulting pattern was integrated using Bruker's APEX2 phase ID program. The powder patterns were treated for amorphous background scatter. Optical images of NU-1000, crystals synthesized out of DEF, were obtained using a Nikon SMZ1500 stereozoom microscope coupled to a digital camera and PC (video monitor). Thermogravimetric analysis (TGA) was performed on a Mettler Toledo TGA under N₂ flow and heated from room temperature to 700° C. (at 10° C./min). Metallation reactions by ALD were carried out in a Savanah S100 system (Ultratech Cambridge Nanotech) under N₂. Inductively coupled plasma-optical emission spectroscopy (ICP-OES) data were collected on Varian Vista MPX instrument. Diffuse reflectance infrared spectra (DRIFTS) were recorded on a Nicolet 7600 FTIR spectrometer equipped with an MCT detector. The spectra were either collected under Ar atmosphere (samples loaded in a drybox under Ar) or in a KBr mixture under N₂ purge (samples prepared in atmosphere). In both instances KBr was utilized as the background. N₂ adsorption isotherms were collected on either a Tristar II 3020 (Micromeritics) or ASAP 2020 (Micromeritics). All pore size distributions were obtained using a carbon slit pore model with a N₂ kernel (Micromeritics). Scanning electron microscopy images and energy dispersive spectroscopy profiles were collected on a Hitachi 5-4800-II.

Synthesis of 1,3,6,8-tetrakis(p-benzoic acid)pyrene 1,3,6,8-tetrakis(p-benzoic acid)pyrene (TBAPy).

1,3,6,8-tetrakis(4-(methoxycarbonyl)phenyl)pyrene. A mixture of (4-(methoxycarbonyl)phenyl)boronic acid (1.040 g, 5.80 mmol), 1,3,6,8-tetrabromopyrene (0.500 g, 0.97 mmol), tetrakis(triphenylphosphine) palladium(0) (0.030 g 0.026 mmol), and potassium tribasic phosphate (1.100 g, 5.30 mmol) in dry dioxane (20 mL) was loaded (in a glovebox) into a 20 mL microwave vial (Biotage) and capped. This mixture was stirred under argon for 72 h at 130° C. in an oil bath. The reaction mixture was evaporated to dryness and the solid residue was washed with water to remove inorganic salts. The insoluble material was extracted with chloroform (three times by 50 mL), the extract was dried over magnesium sulfate, and the solvent volume was reduced under vacuum. The residue was boiled in tetrahydrofuran for 2 h and filtered; the resulting filtrate contained mainly impurities. This procedure gave 0.58 g of 1,3,6,8-tetrakis(4-(methoxycarbonyl)phenyl)pyrene (82% yield).

¹H NMR (CDCl₃-d): δ 3.99 (s, 12H), 7.75 (d, 8H), 8.01 (s, 2H), 8.15 (s, 4H), 8.23 (d, 8H).

1,3,6,8-tetrakis(p-benzoic acid)pyrene. To a 250 mL round bottom flask containing 0.58 g (0.78 mmol) of solid 1,3,6,8-tetrakis(4-(methoxycarbonyl)phenyl)pyrene, a solution containing 1.5 g (37.5 mmol) NaOH in 100 mL of a THF/water (ratio 1:1) mixture was added and the resultant suspension was vigorously stirred under reflux overnight. The solvents were removed under vacuum and water was added to the residue which formed a clear yellow solution. The clear yellow solution was stirred at room temperature for 2 h and the pH value was adjusted to 1 using concentrated HCl. The resulting yellow solid was collected by filtration, and washed with water several times. The crude product was recrystallized from DMF, filtered, washed with chloroform and dried under vacuum. This gave 0.49 g (91%) of the pure product H4TBAPy.

¹H NMR (DMSO-d₆): δ 7.86 (d, 8H), 8.09 (s, 2H), 8.17 (d, 8H), 8.21 (s, 4H), 13.12 (s, 4H).

Synthesis of Zr₆(μ₃-OH)₈(OH)₈(TBAPy)₂ (NU-1000).

Synthesis of NU-1000 in DEF. 70 mg of ZrCl₄ (0.30 mmol) and 2700 mg (22 mmol) of benzoic acid were mixed in 8 mL of DEF (in a 6-dram vial) and ultrasonically dissolved. The clear solution was incubated in an oven at 80° C. for 1 h. After cooling down to room temperature 40 mg (0.06 mmol) of H₄TBAPy was added to this solution and the mixture was sonicated for 20 min. The yellow suspension was heated in an oven at 120° C. for 48 h. After cooling down to room temperature, yellow single crystals were present on the vial walls. The sample was washed with DMF and subsequently activated with HCl, as described below.

Synthesis of NU-1000 in DMF. 70 mg of ZrCl₄ (0.30 mmol) and 2700 mg (22 mmol) of benzoic acid were mixed in 8 mL of DMF (in a 6-dram vial) and ultrasonically dissolved. The clear solution was incubated in an oven at 80° C. for 1 h. After cooling down to room temperature 40 mg (0.06 mmol) of H₄TBAPy was added to this solution and the mixture was sonicated for 20 min. The yellow suspension was heated in an oven at 120° C. for 48 h. After cooling down to room temperature, yellow polycrystalline material was isolated by filtration (35 mg of activated material, 54% yield) and washed with DMF and subsequently activated with HCl, as described below.

Elemental analysis data for molecular formula Zr₆(OH)₈(TBAPy)₂(benzoic acid)₄: C, H, N, Cl Theoretical: 55.6%, 2.1%, 0%, 0%; Experimental: 53.8%, 3.1%, 0.1%, 0.4%. Elemental analysis data for molecular formula {0.75*[Zr₆(OH)₈(TBAPy)₂(benzoic acid)₄]+0.25·[Zr₆(O)₄(OH)₄]₂(TBAPy)₆]}: C, H, N, Cl Theoretical: 56.4%, 2.2%, 0%, 0%; Experimental: 53.8%, 3.1%, 0.1%, 0.4%.

Activation Procedure for NU-1000.

As synthesized NU-1000 was activated using a slightly modified method previously reported by Feng et al. (See, Feng, D.; Gu, Z.-Y.; Li, J.-R.; Jiang, H.-L.; Wei, Z.; Zhou, H.-C. Angew. Chem. Int. Ed. 2012, 51, 10307.) Approximately 40 mg of solvated (“wet”) material was soaked in 12 ml of DMF and 0.5 ml of 8 M aqueous HCl was added.

This mixture was heated in an oven at 100° C. for 24 h. After cooling to room temperature, the solution was removed and the material was washed twice with DMF to remove HCl impurities. Subsequently the solid residue was washed twice with acetone and soaked in acetone for additional 12 h. NU-1000 was filtered, briefly dried on a filter paper and activated at 120° C. under vacuum for 12 h on the preparation station of ASAP 2020 instrument. Shown below, the as synthesized NU-1000 sample was characterized by ¹H NMR, N₂ adsorption measurements, and DRIFTS. The data are consistent with the removal of benzoic acid from the Zr₆ node and the incorporation of —OH groups.

Elemental analysis data for molecular formula Zr₆(OH)₈(TBAPy)₂: C, H, N, Cl Theoretical: 48.7%, 2.4%, 0%, 0%; Experimental: 49.1%, 3.0%, 0.3%, 0.4%. Elemental analysis data for molecular formula {0.75·[Zr₆(OH)₈(TBAPy)₂]+0.25·[Zr₆(O)₄(OH)₄]₂(TBAPy)₆]}: C, H, N, Cl Theoretical: 51.6%, 2.5%, 0%, 0%; Experimental: 49.1%, 3%, 0.3%, 0.4%.

Synthesis of Zn-AIM and Al-AIM by ALD.

Approximately 20-30 mg of NU-1000 was loaded into a home built stainless steel powder holder and subsequently placed into a ALD reactor. NU-1000 was allowed to equilibrate in the reactor for 0.5 h prior to the ALD deposition. The ALD reactions were carried out utilizing the following timing sequence (time in s): t₁-t₂-t₃, where t₁ is the precursor pulse time, t₂ the precursor exposure time (i.e., the time where the precursor is in contact with NU-1000 without pumping), and t₃ the N₂ purge time. ZnEt₂ was deposited at 140° C. utilizing five 1-120-120 sequences and AlMe₃ was deposited at 120° C. utilizing twenty 0.015-1-1 sequences. During t₁ and t₂ the N₂ flow rate was 5 sccm, while during t₃ the N₂ flow rate was 20 sccm.

Synthesis of Zn-NU-1000 and Al-NU-1000 from Solution.

Zn-NU-1000. In a glovebox, 30 mg (0.014 mmol) of activated NU-1000 was loaded into a 5 mL microwave vial (Biotage) and 4.0 mL of 1.1 M (4.4 mmol, ca. 20-fold excess per —OH group in NU-1000) ZnEt₂ in toluene was added. The vial was capped and left for 24 h at room temperature. The solution was removed and the remaining yellow solid was washed once with n-pentane and left soaked in 5 mL of pentane for additional 24 h to wash out unreacted ZnEt₂. Briefly dried Zn-NU-1000 was transferred in a glovebox to a Tristar sample tube and activated under vacuum on ASAP 2020 at 120° C. for 12 h. Approximately 2 mg of activated Zn-NU-1000 was exposed to air and digested in d₆-DMSO/D₂SO₄ mixture for ¹H NMR analysis.

Al-NU-1000. In a glovebox, 30 mg (0.014 mmol) of activated NU-1000 was loaded into a 5 mL microwave vial (Biotage) and 2.2 mL of 2 M (4.4 mmol) AlMe₃ in toluene was added dropwise. During addition of the organometallic compound intense gas evolution was observed and after few minutes initially yellow powder of NU-1000 turned orange. The vial was capped and left for 24 h at room temperature. The solution was removed and the remaining solid was washed once with n-pentane and left soaked in 5 mL of pentane for additional 24 h to wash out unreacted AlMe₃. Briefly dried Al-NU-1000 was transferred in a glovebox to a Tristar sample tube and activated under vacuum on ASAP 2020 at 120° C. for 12 h. Approximately 2 mg of activated Al-NU-1000 was exposed to air and digested in d₆-DMSO/D₂SO₄ mixture for ¹H NMR analysis.

Single Crystal X-Ray Structure of NU-1000 (from DEF).

Single crystals of C₈₈H₄₄O₃₂Zr₆ (NU-1000) were obtained from DEF, mounted in inert oil, and transferred to the cold gas stream of a Bruker Kappa APEX CCD area detector equipped with a CuKα microsource with MX optics.

NU-1000 Residual Electron Density Plots

During the structure refinement of NU-1000 the presence of a partially occupied, and disordered, framework within the mesopores of NU-1000 was observed. The residual electron density showed evidence of a disordered node and ligands. The essence of this secondary framework was captured in residual electron density plots (FIG. 7), which based on the Q peaks was estimated to be present in ˜20% of the mesopores of NU-1000.

ICP-OES Analysis.

Approximately 2 mg of sample (e.g., Zn-AIM) was weighed out on a TGA balance. The powder was transferred to a microwave vial (4 mL) and 0.25 mL concentrated H₂O₂ and 0.75 mL concentrated H₂SO₄ were added. The vial was capped and irradiated in a microwave oven at 150° C. for 5 min. The resultant clear solution was diluted to 25 mL with nanopure water and analyzed via ICP-OES. Zn and Al concentrations were calculated from external stock solutions and compared to the known Zr content of the MOF.

Volumetric Isotherms for NU-1000, Zn-AIM, and Al-AIM.

Volumetric isotherms were calculated by using the metal loading, determined by ICP-OES, in Table 1. It was assumed that —Zn(C₂H₅) and —Al(CH₃)₂ were bound to the —OH groups of the Zr₆ nodes (i.e., the following stoichiometry was assumed Zn(C₂H₅)₂+Zr—OH→ZrO—Zn(C₂H₅) and Al(CH₃)₃+Zr—OH→ZrO—Al(CH₃)₂). The crystallographically predicted densities of 0.49 cc/g for NU-1000, 0.55 cc/g for Zn-AIM, and 0.59 cc/g for Al-AIM were used.

Results.

Solvothermal reactions of ZrCl₄, 1,3,6,8-tetrakis(p-benzoic acid)pyrene (H₄TBAPy), and benzoic acid in diethylformamide (DEF) yielded crystals suitable for single-crystal X-ray analysis. (See, Stylianou, K. C.; Heck, R.; Chong, S. Y.; Bacsa, J.; Jones, J. T. A.; Khimyak, Y. Z.; Bradshaw, D.; Rosseinsky, M. J. J. Am. Chem. Soc. 2010, 132, 4119; Stylianou, K. C.; Rabone, J.; Chong, S. Y.; Heck, R.; Armstrong, J.; Wiper, P. V.; Jeffs, K. E.; Zlatogorsky, S.; Bacsa, J.; McLennan, A. G.; Ireland, C. P.; Khimyak, Y. Z.; Thomas, K. M.; Bradshaw, D.; Rosseinsky, M. J. J. Am. Chem. Soc. 2012, 134, 20466.) The parent-framework node was composed of an octahedral Zr₆ cluster capped by eight μ₃-OH ligands. Eight of the twelve octahedral edges are connected to TBAPy units, while the remaining Zr coordination sites (after activation) are occupied by eight terminal —OH ligands. The 3-D structure can be described as 2-D Kagome sheets linked by TBAPy ligands. Four of the eight terminal —OH groups point into the mesoporous channels, while the remaining terminal hydroxyls lie in smaller apertures between the Kagome sheets. The resultant MOF (FIG. 2) has the molecular formula Zr₆(μ₃-OH)₈(OH)₈(TBAPy)₂, which we have designated NU-1000. We observe that ˜20-25% of the mesoporous channels contain a secondary structural element based on residual electron density plots and N₂ adsorption simulations. We modeled the secondary element as [Zr₆(μ₃-O)₄(μ₃-OH)₄]₂(TBAPy)₆ which connects to twelve Zr₆ nodes of the parent framework through six TBAPy ligands. Finally NU-1000 was activated with a HCl/N,N-dimethylformamide (DMF) mixture similar to the procedure of Feng et al. (See, Feng, D.; Gu, Z.-Y.; Li, J.-R.; Jiang, H.-L.; Wei, Z.; Zhou, H.-C. Angew. Chem. Int. Ed. 2012, 51, 10307.) ¹H NMR and diffuse reflectance infrared Fourier transform spectroscopy (DRIFTS) reveal that HCl removes benzoic acid from the Zr₆ nodes, leaving behind terminal —OH groups.

We initiated AIM (vide infra) with a microcrystalline powder of NU-1000, reasoning that this form would facilitate diffusion of ALD precursors within the MOF. The microcrystalline powder was obtained by switching to DMF as a synthesis solvent. The powder X-ray diffraction (PXRD) patterns of the DEF (simulated) and DMF prepared samples are identical and Pawley refinement of the DMF pattern demonstrates that the unit cell and symmetry are identical as well. The remainder of this example will discuss DMF prepared samples only.

The N₂ adsorption isotherm of NU-1000 is best described as type IVc (FIG. 4); NU-1000 has a Brunauer-Emmett-Teller (BET) surface area of 2320 m² g⁻¹ and a total pore volume of 1.4 cm³ g⁻¹. The experimentally measured surface area and total pore volumes are in excellent agreement with the theoretical values of 2280 m² g⁻¹ and 1.4 cm³ g⁻¹ obtained from grand canonical Monte Carlo simulations (GCMC) and subsequent BET analysis. DFT analyzed pore-size distributions indicate pores of diameter at ˜12 Å and 30 Å, consistent, respectively, with the triangular micropores and hexagonal mesopores of NU-1000. Thermal gravimetric analysis (TGA) of a sample activated at 120° C. demonstrated that NU-1000 is stable up to 500° C. The presence of —OH groups was confirmed by DRIFTS. Sharp peaks appear at wavenumbers 3674 and 3655 cm⁻¹ (black curve in FIG. 4), which we have assigned to the terminal and bridging —OH stretches of the Zr₆(μ₃-OH)₈(OH)₈ node. TGA and temperature-dependent-DRIFTS data are also quantitatively consistent with the assigned —OH content of NU-1000. In addition, the temperature-dependent DRIFTS data demonstrate that the —OH functionality persists under the conditions of our ALD experiments (vide infra).

Microcrystalline samples of NU-1000 were placed in an ALD reactor at 140° C. or 110° C. and exposed to diethylzinc (ZnEt₂) or AlMe₃. The ALD reactions were carried out with the following timing sequence (in seconds): t₁-t₂-t₃, where t₁ is the precursor pulse time, t₂ the precursor exposure time, and t₃ the N₂ purge time. Metallation was confirmed via inductively coupled plasma-optical emission spectroscopy (ICP-OES). The resultant materials have been termed Zn-AIM and Al-AIM for Zn- and Al-Atomic layer deposition In a MOF. On average we observe 0.5 Zn or 1.4 Al atoms per Zr atom, Table 1. These values correspond to three Zn, or eight Al, atoms for every Zr₆ node in NU-1000. Consistent with ALD-like behavior, longer exposure times, via repeated precursor exposure, did not lead to greater metal loading. To ascertain whether we were fully accessing NU-1000 under our ALD conditions, we extended exposure times to several hours, rather than seconds, by immersing samples in solutions containing ZnEt₂ or AlMe₃ (Table 1, Zn-NU-1000 and Al-NU-1000). The loadings obtained through extended solution-phase exposure are only slightly higher than those from transient ALD.

TABLE 1
ICP-OES, BET Surface Areas, and Pore Volumes for
NU-1000, Zn-AIM, Al-AIM, Zn-NU-1000, and Al-NU-1000.
			BET Surface	Pore Volume
MOF	Metal: Zr	Metal: Zr6	Area (m2 g−1)	(cm3 g−1)
NU-1000	—	—	2320	1.4
Zn-AIMa	0.5	3.0	1580	0.9
Al-AIMb	1.4	8.1	1160	0.7
Zn-NU-1000	0.6	3.6	1710	1.0
Al-NU-1000	1.7	10.0	1290	0.7
at1 = 1 s, t2 = 120 s, t3 = 120 s
bt1 = 0.015 s, t2 = 1 s, t3 = 1 s.

PXRD measurements (FIG. 3) showed that both Zn-AIM and Al-AIM retain their crystallinity. BET analyses of the N₂ adsorption isotherms (FIG. 4) indicate a decrease in surface area from 2230 m²/g for NU-1000, to 1580 and 1160 m²/g for Zn-AIM and Al-AIM. The gravimetric and volumetric surface areas, along with total pore volumes, decrease with increasing metal loading (Table 1). DFT pore-size distributions (FIG. 4), extracted from the N₂ isotherms, indicate that the average diameter of the mesopore shifts from ˜30 Å in NU-1000 to ˜27 Å for both Zn-AIM and Al-AIM.

DRIFTS measurements (FIG. 5) confirmed that metallation occurs by reaction with —OH groups. Clearly the sharp peaks at 3674 cm⁻¹ and 3655 cm⁻¹ have been significantly or completely reduced. The DRIFTS data suggest that ZnEt₂ is able to react with —OH groups pointing into the large hexagonal channels, while AlMe₃ reacts with all terminal —OH groups. To assess Zn and Al incorporation by individual MOF microcrystallites, we turned to scanning electron microscopy-energy dispersive X-ray spectroscopy (SEM-EDX). As shown in FIG. 6A, only Zr (upper trace) was detected in NU-1000; Zn (lowest trace) and Al (middle trace) do not rise above the baseline. The blue line indicates where, spatially in the image, the EDX scan was performed over. When scanning Zn- and Al-AIM (FIGS. 6B and 6C), Zn (lower trace) and Al (lighter trace) were detected throughout the entire NU-1000 crystal.

To demonstrate that AIM could be utilized to elicit new functional behavior we turned to chemical catalysis. The Knoevenagel condensation between ethyl cyanoacetate and benzaldehyde can be catalyzed by Lewis acids, albeit in limited scope and conversion rate. (See, Cui, H.-F.; Dong, K.-Y.; Zhang, G.-W.; Wang, L.; Ma, J.-A. Chem. Commun. 2007, 2284.) The Zr^IV sites in NU-1000 proved inactive towards the Knoevenagel condensation. In contrast, Zn-AIM and Al-AIM were active catalysts, which we attribute to the presence of Lewis acidic Al^III and Zn^II sites in Zn- and Al-AIM. While AIM, as implemented here, leaves methyl or ethyl ligand(s) on the incorporated metal ions, these are highly reactive and will be removed and released as methane or ethane shortly after exposure to benzaldehyde. After catalysis, the solutions were filtered to remove the MOF and examined by ICP-OES; consistent with the assignment of Zn- and Al-AIM as the catalysts, no Zn or Al was found in solution. The results demonstrate the potential for ALD to incorporate spatially oriented single-site-like catalytic moieties into ultrahigh-aspect-ratio MOFs.

The word “illustrative” is used herein to mean serving as an example, instance, or illustration. Any aspect or design described herein as “illustrative” is not necessarily to be construed as preferred or advantageous over other aspects or designs. Further, for the purposes of this disclosure and unless otherwise specified, “a” or “an” means “one or more”.

The foregoing description of illustrative embodiments of the invention has been presented for purposes of illustration and of description. It is not intended to be exhaustive or to limit the invention to the precise form disclosed, and modifications and variations are possible in light of the above teachings or may be acquired from practice of the invention. The embodiments were chosen and described in order to explain the principles of the invention and as practical applications of the invention to enable one skilled in the art to utilize the invention in various embodiments and with various modifications as suited to the particular use contemplated. It is intended that the scope of the invention be defined by the claims appended hereto and their equivalents.

Claims

1. A metal-organic framework comprising: inorganic nodes that comprise an octahedral Zr6 cluster capped by eight μ3-ligands and have twelve octahedral edges, wherein the the μ3-ligands are hydroxo ligands, oxo ligands, aquo ligands, or a combination thereof; andorganic linkers connecting the inorganic nodes, the inorganic linkers comprising 1,3,6,8-tetrakis(p-benzoic acid)pyrene units;wherein eight of the twelve octahedral edges of the inorganic nodes are connected to the 1,3,6,8-tetrakis(p-benzoic acid)pyrene units.

2. The metal-organic framework of claim 1, wherein the μ3-ligands comprise hydroxo ligands.

3. A metallated metal-organic framework comprising: a porous metal-organic framework comprising: inorganic nodes that comprise an octahedral Zr6 cluster capped by eight μ3-ligands and have twelve octahedral edges, wherein the the μ3-ligands are hydroxo ligands, oxo ligands, aquo ligands, or a combination thereof; andorganic linkers connecting the inorganic nodes, the inorganic linkers comprising 1,3,6,8-tetrakis(p-benzoic acid)pyrene units;wherein eight of the twelve octahedral edges of the inorganic nodes are connected to the 1,3,6,8-tetrakis(p-benzoic acid)pyrene units; anda metal film on the surfaces within the pores of the porous metal-organic framework.

4. The metallated metal-organic framework of claim 3, wherein the μ3-ligands comprise hydroxo ligands.

5. The metallated metal-organic framework of claim 3, wherein the film comprises zinc.

6. The metallated metal-organic framework of claim 3, wherein the film comprises aluminum.

7. A method of catalyzing a reaction, the method comprising exposing chemical reactants to the metallated metal-organic framework of claim 3, whereby the metal film catalyzes a reaction between the chemical reactants.

8. The method of claim 7, wherein the reaction is a condensation reaction catalyzed by Lewis acidic sites on the metal film.

9. The method of claim 8, wherein the metal film comprises zinc and the Lewis acidic sties on the metal film are ZnII sites.

10. The method of claim 8, wherein the metal film comprises aluminum and the Lewis acidic sties on the film are AlIII sites.

11. A method of remediating species from a sample comprising the species, the method comprising: exposing the sample to the metallated metal-organic framework of claim 3, whereby the species in the sample are adsorbed or absorbed by the metallated metal-organic framework; andremoving the metallated metal-organic framework and the adsorbed or absorbed species from the sample.

12. The method of claim 11, wherein the species comprise, metal elements, molecules, or ions.

13. The method of claim 11, wherein species comprise heavy metals.

14. A metal-organic framework comprising: a porous metal-organic framework comprising: inorganic nodes that comprise an octahedral Zr6 cluster capped by eight μ3-ligands and have twelve octahedral edges, wherein the the μ3-ligands are hydroxo ligands, oxo ligands, aquo ligands, or a combination thereof; andorganic linkers connecting the inorganic nodes, the inorganic linkers comprising 1,3,6,8-tetrakis(p-benzoic acid)pyrene units;wherein eight of the twelve octahedral edges of the inorganic nodes are connected to the 1,3,6,8-tetrakis(p-benzoic acid)pyrene units; andan oxide film on the surfaces within the pores of the porous metal-organic framework.

15. The metal-organic framework of claim 14, wherein the oxide film comprises a metal oxide.