Claims
- 1. A process for preparing a supported cyclopentadiene-type compound comprising contacting a cyclopentadiene-type compound having an active halogen with an inorganic support having surface hydroxyl groups under suitable conditions to cause a reaction between the active halogen and a hydroxyl group on the support so that the cyclopentadiene-type group becomes chemically bound to the support.
- 2. A process according to claim 1 wherein said cyclopentadiene-type compound is selected from unbridged cyclopentadiene-type compounds.
- 3. A process according to claim 2 wherein said cyclopentadiene-type compound is selected from compounds of the formula Z--Si(R).sub.n --X.sub.3-n wherein n is a number in the range of 0 to 2, X is a halogen, R is an alkyl or aryl group, and Z is a cyclopentadienyl-type radical selected from the group consisting of substituted unsubstituted cyclopentadienyl, indenyl, and fluorenyl radicals.
- 4. A process according to claim 3 carried out in the presence of a basic organic liquid.
- 5. A process according to claim 4 wherein said basic organic liquid is pyridine.
- 6. A process according to claim 5 wherein at least two different cyclopentadienyl-type compounds are employed, each of which is selected from those the formula Z--Si(R).sub.n --X.sub.3-n wherein n is a number in the range of 0 to 2, X is a halogen, R is an alkyl or aryl group, and Z is a cyclopentadienyl-type radical selected from the group consisting of substituted and unsubstituted cyclopentadienyl, indenyl, and fluorenyl radicals.
- 7. A process according to claim 1 employing a bridged cyclopentadienyl-type compound of the formula Z--R'--Z wherein each Z can be the same or different and is selected from the group consisting of substituted and unsubstituted cyclopentadienyl, indenyl, and fluorenyl radicals and R' is a bridge connecting the two Z radicals, said bridge containing an active halogen.
- 8. A process according to claim 7 wherein R' has the formula ##STR5## wherein R is selected from the group consisting of halides, alkyl radicals, and aryl radicals and X is a halide.
- 9. A process according to claim 8 carried out in the presence of a basic organic liquid.
- 10. A process according to claim 9 wherein said basic organic liquid comprises pyridine.
- 11. A process according to claim 10 wherein said support consists essentially of silica.
- 12. A process according to claim 7 wherein R' has a substituent of the formula ##STR6## wherein X is a halide, each R can be the same or different and is selected from the group consisting of halides, hydrogen, alkyl, and aryl radicals, R" is hydrogen or a hydrocarbyl group having 1 to 10 carbon atoms, and R'" is a hydrocarbyl group having 1 to 10 carbon atoms.
- 13. A process according to claim 12 wherein each R is Cl.
- 14. A process according to claim 13 wherein the two Z's are separated by a single carbon atom.
- 15. A process according to claim 13 wherein each R is a methyl radical and the two Z's are separated by a single carbon atom.
- 16. A process according to claim 13 wherein the two Z's are bound to a methyl silylene radical.
- 17. The solid product of the process of claim 16.
- 18. A process according to claim 13 wherein said cyclopentadienyl-type compound is selected from the group consisting of 2-(bis-9-fluorenyl methylsilyl)-1-trichlorosilyl ethane, 5-cyclopentadienyl-5-(9-fluorenyl)-1-trichlorsilyl hexane, and 1-chlorodimethyl silyl-5-cyclopentadienyl-5-(9-fluorenyl)hexane.
- 19. The solid product of the process of claim 18.
- 20. The solid product of the process of claim 1.
- 21. A process according to claim 1 wherein at least two different cyclopentadienyl-type compounds having active halogen are reacted with said support.
- 22. The solid product produced by the process of claim 21.
- 23. A process for producing a metallocene comprising reacting the supported cyclopentadienyl-type product produced by the process of claim 1 with a transition metal compound.
- 24. A supported metallocene produced by the process of claim 23 wherein the cyclopentadienyl-type product is produced by reacting a bridged cyclopentadienyl-type compound in which the bridge contains an active halogen with said inorganic support.
- 25. A process for polymerizing an olefin comprising contacting said olefin under suitable polymerization conditions with the supported metallocene of claim 24.
- 26. A process according to claim 25 wherein said supported metallocene contains at least two different metallocenes.
- 27. A process for preparing a bridged metallocene comprising:
- (1) contacting a hydrocarbon having at least two acidic, replaceable hydrogens and having the formula of ZH.sub.2 with an organolithium and an organohalosilane to prepare a ligand precursor having the formula of HZ--EX.sub.n+1 wherein at least one X is a halogen; (2) contacting said ligand precursor with an organo alkali metal compound having the formula of HZMa to form a bridged ligand having the formula of ZH--EX.sub.n --ZH wherein at least one X is a halogen; (3) contacting said bridged ligand with an inorganic material QH to form a bridged ligand chemically bonded to inorganic moiety Q; (4) contacting said bridged ligand chemically bonded to inorganic moiety with an organolithium and a metal halide having the formula of MY.sub.m to prepare said bridged metallocene; wherein each Z is the same or different hydrocarbyl radical selected from the group consisting of cyclopentadienyl, indenyl, tetrahydroindenyl, fluorenyl, and mixtures thereof; each X can be the same or different and is selected from the group consisting of hydrogen, fluorine, chlorine, bromine, iodine, R, OR, NR.sub.2, PR.sub.2, and OQ, and mixtures thereof wherein the R is a C.sub.1 -C.sub.20 hydrocarbyl radical and Q is an inorganic moiety selected from the group consisting of silica, alumina, clay, phosphated alumina, and mixtures thereof; each Y can be the same or different and is selected from the group consisting of an alkyl group, hydrogen, fluorine, chlorine, bromine, iodine, and mixtures thereof; each E is Si; M is a metal selected from the group consisting of Ti, Zr, Hf, Sc, Y, V, La, and mixtures thereof; m is a number sufficient to fill out the remaining valences of metal M; Ma is an alkali metal; and n is 1 or 2.
- 28. A process according to claim 27 producing a metallocene selected from the group consisting of silica-O-1-cyclopentadienyl-1-cyclopentadienylmethylsilane zirconium dichloride, silica-O-bis(9-fluorenyl)phenylsilane zirconium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylsilane hafnium dichloride, silica-O-bis(9-fluorenyl)phenylsilane hafnium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylsilane vanadium dichloride, silica-O-bis(9-fluorenyl)phenylsilane vanadium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylsilane titanium dichloride, silica-O-bis(9-fluorenyl)phenylsilane titanium dichloride, silica-O-bis(2,8-difluoro-9-fluorenyl)methylsilane zirconium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylchlorosilane zirconium dichloride, silica-O-bis(9-fluorenyl)phenylchlorosilane zirconium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylchlorosilane hafnium dichloride, silica-O-bis(9-fluorenyl)phenylchlorosilane hafnium dichloride silica-O-1-cyclopentadienyl-9-fluorenylmethylchlorosilane vanadium dichloride, silica-O-bis(9-fluorenyl)phenylchlorosilane vanadium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylchlorosilane titanium dichloride, silica-O-bis(9-fluorenyl)phenylchlorosilane titanium dichloride, silica-O-bis(2,8-difluoro-9-fluorenyl)methylchlorosilane zirconium dichloride, silica-O-1-cyclopentadienyl-9-fluorenylmethylsilane zirconium dichloride, alumina-O-1-cyclopentadienyl-9-fluorenylmethylsilane zirconium dichloride, bentonite-O-1-cyclopentadienyl-9-fluorenylmethylsilane zirconium dichloride, and mixtures thereof.
- 29. A process according to claim 27 producing the metallocene silica-O-1-cyclopentadienyl-9-fluorenylmethylsilane zirconium dichloride.
Parent Case Info
This application is a continuation-in-part of U.S. patent application Ser. No. 75,712 filed Jun. 11, 1993, now U.S. Pat. No. 5,399,636; U.S. patent application Ser. No. 75,931 filed Jun. 11, 1993,now U.S. Pat. No. 5,347,026; U.S. patent application Ser. No. 984,054 filed Nov. 30, 1992, now U.S. Pat. No. 5,393,911; and U.S. patent application Ser. No. 734,853 filed Jul. 23, 1991 now U.S. Pat. No. 5,436,305 as a CIP of Ser. No. 697,363 filed May 9, 1991, now U.S. Pat. No. 5,191,132. The disclosures of all the above-mentioned applications are incorporated herein by reference.
US Referenced Citations (6)
Foreign Referenced Citations (1)
Number |
Date |
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292815 |
May 1988 |
EPX |
Continuation in Parts (2)
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75712 |
Jun 1993 |
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697363 |
May 1991 |
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