METASURFACE OPTICAL DEVICE AND FABRICATION METHOD

Abstract

A metasurface optical device includes a substrate and a plurality of nano-pillars disposed at an end surface of the substrate. The plurality of nano-pillars is made of at least two kinds of materials, and dispersion coefficients of the at least two kinds of materials compensate or cancel each other or are configured to realize a pre-determined function.

Description

Claims

1. A metasurface optical device comprising: a substrate; anda plurality of nano-pillars disposed at an end surface of the substrate;wherein the plurality of nano-pillars are made of at least two kinds of materials, and dispersion coefficients of the at least two kinds of materials compensate or cancel each other or are configured to realize a pre-determined function.

2. The metasurface optical device of claim 1, wherein the plurality of nano-pillars include: a first nano-pillar entirely made of a first material of the at least two kinds of materials; anda second nano-pillar including a second material of the at least two kinds of materials, the second material being different from the first material.

3. The metasurface optical device of claim 2, wherein: the second nano-pillar is made of a single material of the at least two kinds of materials that is different from the first material.

4. The metasurface optical device of claim 2, wherein: the second nano-pillar is made of the at least two kinds of materials.

5. The metasurface optical device of claim 1, wherein: each of the plurality of nano-pillars includes the at least two kinds of materials.

6. The metasurface optical device of claim 1, wherein: one nano-pillar of the plurality of nano-pillars includes the at least two kinds of materials arranged layer by layer in a direction perpendicular to the end surface of the substrate.

7. The metasurface optical device of claim 6, wherein: the at least two kinds of materials are arranged sequentially in the direction perpendicular to the end surface of the substrate to form the one nano-pillars.

8. The metasurface optical device of claim 1, wherein: one nano-pillar of the plurality of nano-pillars includes the at least two kinds of materials combined in a direction perpendicular to the end surface of the substrate.

9. The metasurface optical device of claim 8, wherein the one nano-pillar includes: a cladding layer made of a first material of the at least two kinds of materials; anda pillar core surrounded by the cladding layer and made of: a second material of the at least two kinds of materials; orthe at least two kinds of materials formed layer by layer in the direction perpendicular to the end surface of the substrate.

10. The metasurface optical device of claim 1, wherein: light absorptions of the at least two kinds of materials are less than a preset value; andrefractive indices of the at least two kinds of materials are different.

11. The metasurface optical device of claim 1, wherein: a shape of any material of any nano-pillar of the plurality of nano-pillars includes a circle, a square, a star, a ring, a pentagon, or a hexagon.

12. A method of fabricating a metasurface optical device comprising: forming a first material on an end surface of a substrate;etching a portion of the first material to expose a portion of the end surface of the substrate;forming a second material, the second material and the first material being arranged side by side in a direction parallel to the end surface of the substrate or being stacked in a direction perpendicular to the end surface of the substrate, a dispersion coefficient of the second material and a dispersion coefficient of the first material compensating each other; andetching the second material and the first material to obtain a plurality of nano-pillars.

13. The method of claim 12, wherein forming the second material includes: forming the second material on the exposed portion of the end surface of the substrate to a thickness same as a thickness of the first material, to obtain a first material film arranged side by side with a second material film.

14. The method of claim 12, wherein forming the second material includes: forming a sacrificial material or a filling material on the end surface of the substrate after etching, a thickness of the sacrificial material or the filled material being same as a thickness of the first material; andforming the second material on the end surface formed with the sacrificial material or the filling material and the first material, to obtain the first material film and the second material film stacked in the direction perpendicular to the end surface of the substrate.

15. The method of claim 14, wherein etching the second material and the first material to obtain the plurality of nano-pillars includes: etching a portion of the end surface of the substrate formed with the sacrificial material to obtain the plurality of nano-pillars.

16. A method of fabricating a metasurface optical device comprising: forming a sacrificial material on an end surface of a substrate;etching a portion of the sacrificial material to expose a portion of the end surface of the substrate to obtain at least two columnar spaces;forming different kinds of nano-materials in the at least two columnar spaces, such that the nano-materials in different columnar spaces are different, or at least one columnar space contains at least two kinds of nano-materials stacked, dispersion coefficients of different kinds of nano-materials compensating each other; andetching the second material and the first material to obtain a plurality of nano-pillars.