Claims
- 1. An improved arrangement for anodizing of an elongated flexible metallic substrate comprising:
- (a) means to pass a longitudinally extended anodic workpiece having at least one surface to be anodized through containment means for a body of electrolytic solution,
- (b) a cathode mounted closely adjacent a path of said anodic workpiece within said containment means in contact with said body of electrolytic solution,
- (c) at least one elongated resilient narrow surface contact dielectric means arranged generally transversely of said longitudinally extended anodic workpiece to resiliently contact a surface of the said workpiece along an extended narrow contact interface between said surface of the workpiece and the resilient narrow surface contact dielectric means while submersed in the body of electrolytic solution
- (d) said elongated resilient narrow surface contact dielectric means serving to remove bubbles of oxygen plus any thin surface layer of unsuitable electrolyte from a surface of the workpiece and space the workpiece from the electrode to prevent arcing.
- 2. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 1 additionally comprising:
- (f) a series of openings in the cathode through which electrolytic solution may freely pass.
- 3. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 2 wherein the elongated resilient narrow surface contact dielectric means comprises a strip of resilient plastic resistant to the electrolytic solution mounted with one side deflected against a surface of the extended anodic workpiece to be anodized.
- 4. An improved arrangement for anodizing of an elongated flexible substrate in accordance with claim 3 wherein the resilient narrow surface contact dielectric means comprises a strip of plastic resistant to the electrolytic solution resiliently mounted to bear directly along one edge upon the surface of the extended anodic workpiece to be coated.
- 5. An improved arrangement for anodizing of an elongated, flexible metallic substrate in accordance with claim 3 wherein the elongated resilient narrow surface contact dielectric means is between one-quarter and one-thirty-second inch in thickness.
- 6. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 4 wherein a resilient biasing means is in contact with the elongated surface contact dielectric means to bias said dielectric means against the surface of the extended anodic workpiece to be anodized.
- 7. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 3 wherein there are a plurality of elongated resilient narrow surface contact dielectric means positioned at intervals along an extended anode assembly.
- 8. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 7 wherein the plurality of elongated resilient narrow surface contact dielectric means are positioned on both sides of the longitudinally extended anodic workpiece.
- 9. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 7 wherein the plurality of elongated resilient narrow surface contact dielectric means are positioned at an angle transversely with respect to travel of the longitudinally extended anodic workpiece.
- 10. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 9 wherein the plurality of elongated resilient narrow surface contact dielectric means are movable longitudinally along their length to, at least periodically, contact fresh unworn surfaces against the surface of said longitudinally extended anodic workpiece.
- 11. An improved arrangement for anodizing of a elongated flexible metallic substrate in accordance with claim 9 wherein the elongated resilient narrow surface contact dielectric means is extended at other than a right angle transversely across the longitudinally extended anodic workpiece.
- 12. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 11 wherein the angle of the elongated resilient narrow surfaces contact dielectric means is positioned transversely with respect to travel of the longitudinally extended anodic workpiece and additionally comprising exhaust manifold means adjacent to the downstream ends of the angled narrow surface contact means to actively draw away electrolytic solution passing to the downstream end of the resilient narrow surface contact means.
- 13. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 8 wherein the plurality of elongated resilient narrow surface contact dielectric means on both sides of the longitudinally extended anodic workpiece are paired with each other on both sides.
- 14. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 2 wherein the openings in the cathode are positioned in a staggered arrangement with respect to each other to effectively equalize the time during which any given portion of the longitudinally extended anodic workpiece passes open and closed portions of the cathode relative to other portions of the longitudinally extended anodic workpiece.
- 15. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 14 wherein the openings in the cathode are larger directly behind the elongated resilient narrow surface contact dielectric means with regard to passage of the longitudinally extended anodic workpiece than in front of said elongated resilient narrow surface contact dielectric means.
- 16. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 13 wherein the elongated resilient narrow surface contact dielectric means have a chevron configuration.
- 17. An improved arrangement for anodizing of an elongated flexible metallic substrate in accordance with claim 16 wherein the chevron configuration of the elongated resilient narrow surface contact dielectric means is modified to provide a curved apex to such chevron configuration.
- 18. A method of anodizing a metallic workpiece comprising:
- (a) passing a longitudinally extended thin anodic workpiece past a series of dielectric spacers in the form of thin extended contact blades mounted between a cathode and said longitudinally extended thin anodic workpiece within an electrolytic liquid containing space,
- (b) establishing an electric potential between the cathode and anodic workpiece, and
- (c) wiping the surface of as well as stabilizing the position of the anodic workpiece with respect to the cathode by means of the thin extended contact blades mounted adjacent the cathode as the longitudinally extended thin anodic workpiece passes the cathode.
- 19. A method of anodizing a metallic workpiece in accordance with claim 18 wherein the cathode is perforated and the thin extended contact blades force electrolyte from in front of the blades through orifices in the cathode in front of the such blades and draws fresh solution through orifices in the cathode behind the thin extended contact blades to the vicinity of the surface as such anodic workpiece moves past said thin extended contact blades.
- 20. A method of anodizing a metallic workpiece in accordance with claim 18 wherein the thin extended contact blades in contact with the anodic workpiece force a heated surface layer of electrolyte to the sides of the thin extended contact blades and additional electrolytic solution is drawn from the electrolytic bath to replace said heated surface layer through orifices in the cathodes the flow of electrolyte being at least partially under the influence of operating pump means effectively positioned at the sides of the extended contact blades adjacent the side of the anodic workpiece.
- 21. An improved arrangement for electrochemical processing of metal substrates comprising:
- (a) an electrolytic processing bath,
- (b) means to support a plurality of electrodes of opposite polarity in the electrolytic processing bath, one of said electrodes being an anodic workpiece for treatment,
- (c) a plurality of opposed pairs of thin resilient dielectric wiping means arranged for passage across the surface of the workpiece to remove any gas bubbles derived from electrolytic processing, aid in stabilizing the workpiece with respect to the other electrodes and deflect electrolyte from the surface of the workpiece whereby energy is saved in operating the electrochemical processing, and
- (d) the workpiece for treatment and the remainder of the electrodes being relatively movable with respect to each other.
- 22. An improved arrangement for electrochemical processing in accordance with claim 21 wherein the workpiece is an elongated thin resilient metal strip conducted past the remainder of the electrodes.
- 23. An improved arrangement for electrochemical processing in accordance with claim 22 wherein the thin resilient dielectric wiping means comprises at least one thin resilient laterally extended contact blade arranged to resiliently contact the surface of the workpiece.
- 24. An improved arrangement for electrochemical processing in accordance with claim 23 wherein the workpiece contacted is an anodic workpiece and overheated electrolyte is wiped from the surface of the workpiece.
- 25. An improved arrangement for electrochemical processing in accordance with claim 21 wherein the resilient dielectric wiping means is in the form of a row of closely spaced plastic bristles.
- 26. An improved arrangement for electrochemical processing in accordance with claim 21 wherein the resilient dielectric wiping means is mounted adjacent perforated electrodes.
- 27. An improved arrangement for electrolytic processing in accordance with claim 24 wherein the resilient dielectric wiping means is mounted integrally with the perforated electrode which is a perforated cathode in an anodizing bath.
- 28. An improved arrangement for electrochemical processing of metal substrates comprising:
- (a) an electrochemical processing bath,
- (b) means to pass an anodic metal strip workpiece through the electrochemical processing bath,
- (c) electrode means adjacent the path of the workpiece through the processing bath,
- (d) a dielectric wiping means positioned between the electrode means and the path of the workpiece through the bath,
- (e) said dielectric wiping means being in the form of a plastic mesh member having plastic grid walls with a thickness less than the transverse width of said walls from one surface of the plastic mesh to the other surface oriented between the workpiece path and the cathode such that the mesh pattern is oriented toward the workpiece and mounted such that said dielectric wiping means brushes the workpiece as it passes.
- 29. An improved arrangement for electrochemical processing in accordance with claim 28 wherein the dielectric plastic mesh wiping means with walls substantially wider than they are thick has a honeycomb-type configuration and such wiping means are located on opposite sides of the workpiece.
- 30. An improved arrangement for electrochemical processing in accordance with claim 29 wherein the dielectric plastic mesh wiper means are resiliently urged toward and against the surface of the workpiece.
- 31. An improved arrangement for electrochemical processing in accordance with claim 28 wherein the dielectric plastic mesh wiping means is elongated and has a length greater than the width of the workpiece and is arranged for movement transverse of the workpiece.
- 32. An improved arrangement for electrochemical processing in accordance with claim 31 wherein the elongated dielectric plastic mesh wiping means is in the form of a closed loop arranged to rotate past and contact the workpiece surface.
- 33. An improved arrangement for electrochemical processing in accordance with claim 32 wherein the closed loop of elongated dielectric plastic mesh wiping means is arranged to rotate past and contact both the workpiece surface and a cathode surface.
- 34. An improved arrangement for electrochemical processing in accordance with claim 33 wherein the dielectric plastic mesh wiping means has narrow flexible blade extensions from its surface.
- 35. An improved arrangement for electrochemical processing in accordance with claim 34 wherein the narrow flexible blade extensions are arranged transversely of the dielectric plastic mesh wiping means.
- 36. An improved arrangement for electrochemical processing in accordance with claim 35 wherein the narrow flexible blade-type extensions are arranged with a slanted orientation in relation to the movement of the work piece.
- 37. An improved arrangement for electrochemical processing in accordance with claim 34 wherein the narrow flexible blade extensions on the inside of the dielectric plastic mesh wiping means are transverse of said closed loop and on the outside are longitudinal of said closed loop.
- 38. An improved arrangement for electrochemical processing in accordance with claim 34 wherein the narrow flexible blade-type extensions on the inside of the closed loop of dielectric plastic mesh are transverse of said loop and the extensions on the outside of said loop have a slanted orientation with respect to both said loop and the travel of said strip.
RELATED APPLICATIONS
This application is a continuation-in-part of U.S. applications 08/179,520 filed Jan. 10, 1994 now U.S. Pat. No. 5,462,649 and U.S. application 08/316,530 filed Sep. 30, 1994 now U.S. Pat. No. 5,476,578 by the present inventors and from which priority and continuity is claimed.
US Referenced Citations (3)
Related Publications (1)
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Date |
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316530 |
Sep 1994 |
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Continuation in Parts (1)
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Number |
Date |
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179520 |
Jan 1994 |
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