Claims
- 1. A method for constructing an array of MEMS devices, comprising the steps of:dicing a MEMS wafer to separate individual dies from the MEMS wafer; placing the die in a holder; bringing the die in said holder into proximity to a second wafer; adjusting the orientation of the die relative to the second wafer; and then connecting said die onto said second wafer.
- 2. The method of claim 1, further comprising the step of:rotating said die out of the original plane of fabrication, before connecting to said second wafer.
- 3. The method of claim 1, further comprising the step of:applying light to said die; measuring the intensity of light scattered by said die; and using a light intensity measurement to adjust the orientation of said die.
- 4. The method of claim 1, further comprising the step of:connecting said die electrically to said second wafer.
- 5. The method of claim 1, further comprising the step of applying heat to a contact area between said die and said wafer, in order to cure a bonding adhesive.
- 6. The method of claim 5, further comprising the step of applying a light source to a contact area between said die and said second wafer, in order to cure a bonding adhesive.
- 7. The method of claim 5, further comprising the step of:packaging the array in a eutectic seal.
- 8. The method of claim 5, in which the contact area for bonding is on both sides of the die.
- 9. The method of claim 8 in which the bonding areas are metals.
- 10. The method of claim 5, further comprising the step of:hermetically enclosing a gas within the sealed package.
- 11. The method of claim 10, wherein the enclosed gas is xenon.
- 12. The method of claim 10, wherein the enclosed gas is helium.
- 13. A method for constructing an array of MEMS devices, comprising the steps of:dicing a MEMS wafer to separate individual rows from the MEMS wafer; selecting from the row, a set of contiguous devices within the row; discarding from the row the devices not selected; placing the row in a holder; bringing the row in said holder into proximity to a second wafer; adjusting the orientation of the row relative to the second wafer; and connecting said devices onto said second wafer.
- 14. The method of claim 2, wherein the rotating step comprises the step of:rotating said die out of the original plane of fabrication, and into a generally orthogonal orientation, and connecting to said second wafer with said MEMS die in said generally orthogonal orientation.
- 15. The method of claim 13, wherein the step of adjusting the orientation of the row relative to the second wafer, comprises adjusting the orientation of the row to be in an orthogonal orientation, before connecting said devices onto said second wafer.
CROSS REFERENCE TO RELATED APPLICATIONS
This U.S. patent application is being filed concurrently with U.S. patent application Ser. No. 09/765522, entitled OPTICAL CROSS-CONNECT SWITCH WITH MICRO-ELECTRO-MECHANICAL ACTUATOR CELLS, by Hichwa, et al., and U.S. patent application Ser. No. 09/764919, entitled LOW INERTIA LATCHING MICROACTUATOR, by Feierabend, et al.; and U.S. patent application Ser. No. 09/769520, entitled OPTICAL SWITCH WITH LOW-INERTIA MICROMIRROR, by Hichwa, et al., the disclosures of which are hereby incorporated in their entirety for all purposes.
US Referenced Citations (6)