Claims
- 1. A method for bonding a first seal element comprising polytetrafluorethylene having predetermined physical properties to a second element capable of being heated by an induction heating apparatus so as to form a radial lip seal, wherein said method comprises:
- providing a layer of a fluorinated resin adhesive having a melting point lower than said polytetrafluorethylene between said first and second elements;
- contacting said first and second elements;
- induction heating said second element to a temperature of at least the melting temperature of polytetrafluoroethylene in less than about 60 seconds so as to melt said resin;
- maintaining said second element at said temperature of at least the melting temperature of polytetrafluoroethylene for a time period in which only a minor portion of said polytetrafluoroethylene is melted, said melting of said minor portion of said polytetrafluorethylene being insufficient to significantly alter the predetermined physical properties of unmelted portions of said first element;
- controlling said induction heating with a temperature signal representing the temperature of said second element; and
- cooling said first and second elements so as to form a bond therebetween.
- 2. A method for manufacturing a seal by bonding a sealing element wafer comprising polytetrafluoroethylene to an inductively heatable substrate, said wafer having first and second opposed sides separated by a predetermined thickness, said wafer being formed with predetermined physical properties, wherein said method comprises:
- interposing a layer of a fluorinated resin having a melting point below the melting point of said wafer between said substrate and at least a portion of said first side of said wafer; and
- applying inductively generated heat and external pressure to said wafer, to said substrate and to said resin to form a bond between a limited portion of said first side of said wafer and said substrate by rapidly melting said resin and only a portion of said thickness of said wafer adjacent said limited portion of said first side without melting said second side during formation of said bond by limiting application of said heat and external pressure to said bond within predetermined ranges for controlled periods of time such that said predetermined physical properties of unmelted portions of said wafer are not significantly altered.
- 3. The method of claim 2, wherein said substrate comprises a seal casing, wherein said wafer comprises a radial lip seal element having a contact sealing surface portion projecting from said casing, and wherein said melting is limited to a region separated from said contact sealing surface and located between said casing and said wafer.
- 4. The method according to claim 2, wherein said fluorinated resin is a fluorocarbon resin.
- 5. The method according to claim 2, wherein said fluorocarbon resin is fluorinated ethylene propylene.
- 6. The method according to claim 2, wherein said fluorinated resin is perfluoroalkoxy resin.
- 7. The method according to claim 2, wherein said substrate is heated to a temperature of at least the melting temperature of polytetrafluoroethylene in less than 10 seconds.
- 8. The method according to claim 2, wherein said substrate is heated to a temperature between 621.degree. and 800.degree. F.
- 9. The method according to claim 2, wherein said substrate is heated to a temperature of about 50.degree. to 90.degree. F. above the melting temperature of polytetrafluoroethylene.
- 10. The method according to claim 2, wherein said substrate is heated to a temperature of between 690.degree. and 710.degree. F.
- 11. The method according to claim 9, wherein said substrate is maintained at said temperature for up to 60 seconds.
- 12. The method according to claim 11, wherein said substrate is maintained at said temperature for at least 10 seconds.
- 13. The method according to claim 12, wherein said substrate is maintained at said temperature for about 15 to 30 seconds.
- 14. A radial lip seal, comprising:
- a wafer having predetermined physical properties and comprising polytetrafluoroethylene, said wafer having first and second opposed sides separated by a predetermined thickness, said wafer forming a contact sealing surface;
- an inductively heatable substrate for supporting said wafer; and
- a bond formed between said first side of said wafer and said substrate, said bond comprising a region of a fluorinated resin adhesive intermingled with said polytetrafluoroethylene, said adhesive having a melting point less than the melting point of said wafer, said bond being formed by heating by induction and cooling said substrate, said adhesive and said polytetrafluoroethylene, said bond extending through only a portion of said thickness of said wafer and separated from said contact sealing surface such that said predetermined physical properties of said wafer at said contact sealing surface are substantially unaffected by formation of said bond.
- 15. The seal of claim 14, wherein said adhesive comprises fluorinated ethylene propylene.
- 16. The seal of claim 14, wherein said adhesive comprises perfluoroalkoxy resin.
Parent Case Info
This is a continuation of application Ser. No. 259,068, filed Oct. 18, 1988, now abandoned.
US Referenced Citations (6)
Foreign Referenced Citations (5)
Number |
Date |
Country |
952997 |
Nov 1956 |
DEX |
2521734 |
Jan 1976 |
DEX |
3038069 |
Apr 1982 |
DEX |
41988A1 |
May 1986 |
DEX |
1495666 |
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Non-Patent Literature Citations (1)
Entry |
Vol. 4, No. 125 (M-30) (607) Sep. 3, 1980, p. 151M30 "Patent Abstracts of Japan", abstract only. |
Continuations (1)
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Number |
Date |
Country |
Parent |
259068 |
Oct 1988 |
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