Claims
- 1. A method of coating a surface of a moving substrate, comprising:
- providing a nozzle for atomizing a liquid to be applied to a moving substrate;
- providing means for supplying the liquid to the nozzle;
- providing means for moving the substrate;
- providing control means for changing the rate of supply of liquid to the nozzle and changing the speed of the moving substrate;
- providing a time delay means in connection with the control means to change the speed of the substrate at a predetermined time after changing the rate of supply of liquid to the nozzle; and
- actuating the control means whereby a change in the rate of supply of liquid to the nozzle is first made and a change in speed of the substrate is made at a predetermined time thereafter.
- 2. Apparatus for applying a coating on a moving substrate, comprising:
- a nozzle;
- means for supplying a liquid to the nozzle;
- means for moving a substrate to be coated;
- control means for controlling the speed of the substrate and changing the rate of supply of liquid to the nozzle proportionate to a change in the speed of the substrate; and
- a time delay means connected to the control means for sequentially changing the speed of the substrate at a predetermined time interval after changing the rate of supply of liquid.
- 3. A method for electrostatically applying a very thin and uniform liquid coating to a moving substrate comprising:
- pumping liquid coating material to a nozzle to atomize the liquid;
- supplying atomizing air to the nozzle at a substantially constant and relatively high pressure to form a relative fine mist of the atomized liquid;
- moving a substrate to be coated through a deposition chamber;
- transporting the mist from the nozzle to the deposition chamber in a stream of air at a substantially constant velocity for application to the moving substrate in a relatively thin uniform coating;
- controlling the amount of coating applied to the substrate by controlling the amount of liquid forced through the nozzle and the speed of the substrate through the chamber; and
- varying the amount of liquid forced through the nozzle, without changing the pressure of the air supplied to the atomizing nozzle, to vary the amount of coating material supplied to the deposition chamber.
- 4. A method as set forth in claim 3 in which the volume of liquid supplied to the nozzle is varied in proportion to the change in speed of the substrate to maintain the application of a relatively thin uniform thickness.
- 5. A method as set forth in claim 3 in which a metering pump is used to force the liquid coating material through the nozzle, and the speed of the pump is varied to vary the amount of liquid so forced.
- 6. A method as set forth in claim 3 in which a control valve is used to vary the amount of liquid forced through the nozzle.
- 7. Apparatus for applying a very thin and uniform a coating on a moving substrate comprising:
- a nozzle;
- a pump for supplying a liquid to said nozzle for atomization of the liquid, said pump being controllable to meter the amount of liquid that it supplies to the nozzle;
- means for supplying substantially constant, relative high pressure air to the nozzle to form a fine mist of the atomized liquid;
- an electrostatic deposition chamber;
- means for transporting the fine mist of atomized liquid to said deposition chamber;
- means for moving a substrate to be coated through the deposition chamber;
- means for controlling said pump and the speed of the moving substrate to thereby control the amount of coating applied to the substrate; and
- means for varying the speed of the pump to control the amount of liquid supplied to said deposition chamber.
Parent Case Info
This application is a continuation, of application Ser. No. 912,422, filed Sept. 29, 1986, now abandoned.
US Referenced Citations (7)
Foreign Referenced Citations (1)
Number |
Date |
Country |
500845 |
Apr 1976 |
SUX |
Continuations (1)
|
Number |
Date |
Country |
Parent |
912422 |
Sep 1986 |
|