The present invention relates to the field of imaging devices, and in particular to a shutter and readout technique for controlling image integration time in a CMOS imager.
Typically, a digital imager array includes a focal plane array of pixel cells, each one of the cells including a photoconversion device, e.g. a photodiode gate, photoconductor, or a photodiode. In a CMOS imager a readout circuit is connected to each pixel cell which typically includes a source follower output transistor. The photoconversion device converts photons to electrons which are typically transferred to a floating diffusion region connected to the gate of the source follower output transistor. A charge transfer device (e.g., transistor) can be included for transferring charge from the photoconversion device to the floating diffusion region. In addition, such imager cells typically have a transistor for resetting the floating diffusion region to a predetermined charge level prior to charge transference. The output of the source follower transistor is gated as an output signal by a row select transistor.
Exemplary CMOS imaging circuits, processing steps thereof, and detailed descriptions of the functions of various CMOS elements of an imaging circuit are described, for example, in U.S. Pat. No. 6,140,630 to Rhodes, U.S. Pat. No. 6,376,868 to Rhodes, U.S. Pat. No. 6,310,366 to Rhodes et al., U.S. Pat. No. 6,326,652 to Rhodes, U.S. Pat. No. 6,204,524 to Rhodes, and U.S. Pat. No. 6,333,205 to Rhodes. The disclosures of each of the foregoing are hereby incorporated by reference herein in their entirety.
In a digital CMOS imager, when incident light strikes the surface of a photodiode, electron/hole pairs are generated in the p-n junction of the photodiode. The generated electrons are collected in the n-type region of the photodiode. The photo charge moves from the initial charge accumulation region to a floating diffusion region or it may be transferred to the floating diffusion region via a transfer transistor depending upon the pixel configuration. The charge at the floating diffusion region is typically converted to a pixel output voltage by a source follower transistor.
Integration time is the amount of time that the pixel is receiving light photons, converting the photons to a charge and accumulating the charge, before the charge is stored or readout. Conventional CMOS imagers may utilize an electronic rolling shutter (ERS) readout technique to control integration time. ERS allows integration times to about one row time (e.g., {fraction (1/30,000)} for 1.3 million sensor at 30 frames per second). Imagers utilizing ERS techniques do not typically utilize a mechanical shutter. A limitation associated with the use of ERS is that images are readout row by row and therefore, fast moving objects may appear blurry due to the offset in integration times from one row to another. In addition, the relatively slow readout of an imager using ERS creates problems if a flash is to be used when capturing the image.
Other techniques for controlling integration time include the use of a mechanical shutter or an electronic global shutter. Each technique, however, has some drawbacks. For example, when using a mechanical shutter, the entire array must be completely reset prior to opening. In addition, the entire array must be readout after closing the shutter. The mechanical shutter must operate such that it can be precisely controlled for short exposure times at the opening and closing operations, which makes this technique more expensive than other techniques. An electronic global shutter can have leakage of ambient light signals into the imager's memory during readout, which is undesirable. Charge coupled device (CCD) imagers may utilize an electrical/mechanical shutter. In this type of imager, an electronic shutter is used to globally reset the array to initiate integration and a mechanical shutter is used to end the integration.
Thus, there is a desire and need for controlling integration time in a CMOS imager that does not suffer from the above drawbacks.
The present method provides a method and apparatus for controlling integration time in an imager. An embodiment of the invention provides a CMOS image sensor having a timing control unit that operates a global reset function, a mechanical shutter operation to mechanically end integration time and a rolling readout function. The use of a global reset to start an integration period and a mechanical shutter to end the integration period allows a rolling readout to be conducted without blurring the image.
Additional features of the present invention will be apparent from the following detailed description and drawings which illustrate exemplary embodiments of the invention, in which:
In the following detailed description, reference is made to the accompanying drawings, which form a part hereof and show by way of illustration specific embodiments in which the invention may be practiced. These embodiments are described in sufficient detail to enable those skilled in the art to practice the invention, and it is to be understood that other embodiments may be utilized, and that structural, logical, and electrical changes may be made without departing from the spirit and scope of the present invention.
The terms “wafer” and “substrate,” as used herein, are to be understood as including silicon, silicon-on-insulator (SOI) or silicon-on-sapphire (SOS) technology, doped and undoped semiconductors, epitaxial layers of silicon supported by a base semiconductor foundation, and other semiconductor structures. Furthermore, when reference is made to a “wafer” or “substrate” in the following description, previous processing steps may have been utilized to form regions, junctions, or material layers in or over the base semiconductor structure or foundation. In addition, the semiconductor need not be silicon-based, but could be based on silicon-germanium, germanium, gallium arsenide or other semiconductors.
The term “pixel,” as used herein, refers to a photo-element unit cell containing a photoconversion device for converting photons to an electrical signal. For purposes of illustration, a single representative pixel and its manner of formation is illustrated in the figures and description herein; however, typically fabrication of a plurality of like pixels proceeds simultaneously. Accordingly, the following detailed description is not to be taken in a limiting sense, and the scope of the present invention is defined only by the appended claims.
Now referring to the figures, where like reference numbers designate like elements,
A source follower transistor 40 and row select transistor 42 with associated gates are also included in the pixel sensor cell. The output of the row select transistor 42 is connected with a column readout line 31. The remaining structures shown in
Although shown in
An exemplary output timing for the method of controlling integration time is depicted in
At this point indicated as t, in
After the end of the integration period, the reset transistor 28 is turned on a second time and a reset voltage (Vrst) is readout. The Vrst is read out by operating a gate of row select transistor 42 and is sampled by an associated sample and hold circuit 261 in response to reset sample signal SHR. The signals for the readout and sampling operation for the reset signal Vrst for a first row readout are shown by the left-most dotted circle 300 in
Accumulated charge from the photodiode 50 for a given row is transferred to floating diffusion region 16, after floating diffusion region 16 is reset and sampled, by turning transfer gate transistor 26 (TG) on a second time. The charge received at the floating diffusion region 16 from photodiode 50 is applied to the gate of source follower transistor 40, which is translated to a voltage (Vsig) and subsequently sampled by sample and hold circuitry 261 in response to a signal sample signal SHS and then readout. The signals for readout of Vsig for a first row are shown by the dotted circle 320 in
Thus, each successive row is readout as shown in
In another exemplary embodiment, the invention employs a five-transistor (5T) pixel sensor cell such as the one illustrated in
The operation of the pixel sensor cell of
When the mechanical shutter is closed and the integration period ends, reset transistor 28 is turned on and a reset voltage (Vrst) is readout. The Vrst is readout by operating a gate of row select transistor 42 and then sampling by an associated sample and hold circuit 261 in response to the reset sample signal SHR. The signals for reading out Vrst for a first row are denoted by the dotted circle 340. Each successive row is readout in a similar fashion as indicated by the signals in dotted circles 340′ and 340″.
After a pixel is reset by reset signal 28 and the reset voltage Vrst sampled, charge accumulated in the photodiode 50 is transferred to floating diffusion region 16 by turning transfer gate transistor 26 (TG) on. The charge on the floating diffusion region 16 is applied to the gate of source follower transistor 40, which is translated to a voltage (Vsig) and sampled. The signals for reading out Vsig for a first row are depicted by dotted circle 350. The differential signal (Vrst-Vsig) developed by differential amplifier 262 (
The image sensor having a timing control unit that operates a global reset function, a mechanical shutter operation to mechanically end integration time and a rolling readout function allows a rolling readout to be conducted without blurring the image.
The processes and devices described above illustrate preferred methods and typical devices of many that could be used and produced. The above description and drawings illustrate embodiments which achieve the objects, features, and advantages of the present invention. However, it is not intended that the present invention be strictly limited to the above-described and illustrated embodiments. Any modifications, though presently unforeseeable, of the present invention that come within the spirit and scope of the following claims should be considered part of the present invention.