Claims
- 1. An improved apparatus arrangement for electrolytic processing of a longitudinally extended metal workpiece comprising:(a) means to pass a longitudinally extended metallic workpiece having at least one surface to be coated along a pass line through containment means for a body of electrolytic solution bathing such surface to be coated, (b) an electrode mounted closely adjacent the pass line of said metallic workpiece within said containment means in contact with said electrolytic solution, (c) at least one thin substantially solid laterally extended dielectric means substantially bathed by the electrolytic solution and extending adjacent to the electrode generally transversely of said longitudinally extended metallic workpiece to at least periodically contact the surface of the workpiece along a relatively narrow line of contact to simultaneously space the workpiece from the electrode and wipe the surface of the workpiece, (d) means to move the longitudinally extended workpiece along the pass line past the transversely extended dielectric means within the electrolytic solution, and (e) wherein the thin substantially solid laterally extended dielectric means has a workpiece contacting surface formed from a high lubricity plastic material.
- 2. An improved apparatus arrangement in accordance with claim 1 wherein the high lubricity plastic comprises polytetrafluoroethylene.
- 3. An improved apparatus arrangement in accordance with claim 1 wherein the high lubricity plastic comprises polychlorosulfonatedethylene.
- 4. An improved apparatus arrangement in accordance with claim 1 wherein substantially the entire laterally extended dielectric means is formed from a high lubricity plastic material.
- 5. A method of electrolytic coating comprising:(a) passing a longitudinally extended thin cathodic workpiece past a series of dielectric spacers in the form of thin extended contact blades mounted between a series of anodes and said thin cathodic workpiece within an electrolytic liquid containing space, (b) establishing a charge between the anodes and cathodic workpiece, and (c) wiping the surface and stabilizing the position of the workpiece with respect to the anodes by contact with the thin extended contact blades mounted adjacent the anodes as the longitudinally extended thin cathodic workpiece passes the anodes, and (d) wherein the charge established between the anodes and cathodic workpiece is limited to a difference in potential insufficient to cause arcing between the anodes and cathodic workpiece at the distance between such anodes and cathodic workpiece established by the interposition of the thin extended contact blades.
- 6. A method of electrolytic coating in accordance with claim 5 wherein the anodes are perforated and the thin extended contact blades force electrolyte through orifices in the anode from in front of the blade and draw fresh solution through orifices in the anode behind the thin extended contact blade to the surface being coated as the cathodic workpiece moves past said thin extended contact blades.
- 7. A method of electrolytic coating in accordance with claim 5 wherein the thin extended contact blades wipe a depleted surface layer of electrolyte from in front of the thin extended contact blades and additional electrolytic solution is drawn from the electrolytic bath to replace the depleted electrolyte through orifices in the anodes at least partially under the influence of pump means effectively positioned at the sides of the extended contact blades adjacent the side of the cathodic workpiece.
- 8. An improved arrangement for electrochemical processing of metal substrates comprising:(a) an electrochemical processing bath, (b) means to support a plurality of electrodes of opposite polarity in the electrochemical processing bath, one of said electrodes being a workpiece for treatment which is passed through the electrochemical processing bath, (c) a thin substantially solid laterally extended dielectric wiping and spacing means arranged between at least two of the electrodes for passage across the surface of the workpiece to at least partially remove a barrier layer of depleted electrolyte from the surface of such electrode while spacing the workpiece at least a critical distance from the electrode calculated to prevent arcing between the electrode and workpiece, (d) the laterally extended dielectric wiping and spacing means being formed of a high lubricity dielectric material.
- 9. An improved arrangement in accordance with claim 8 wherein the high lubricity dielectric material comprises a polymeric fluorocarbon compound.
- 10. An improved arrangement in accordance with claim 9 wherein the high lubricity dielectric material comprises polytetrafluoroethylene.
- 11. An improved arrangement in accordance with claim 8 wherein the high lubricity dielectric comprises polychlorosulfonatedethylene.
- 12. A strip processing apparatus in an electroprocessing operation comprising:(a) a thin unitary laterally extended open-web, plastic mesh adapted for positioning between a moving metal strip and an adjacent electrode in an electroprocessing bath, (b) said open-web, plastic mesh serving as a dielectric minimum arc distance separator for the particular electroprocessing bath and being positioned between the moving metal strip and the electrode, (c) a thin dielectric masking element supported by the open-web, plastic mesh, said masking element being adapted to at least partially close off a portion of the openings in the plastic mesh and positioned upon the open-web, plastic mesh to affect the degree of electroprocessing of a discrete portion of the moving metal strip.
- 13. A strip processing apparatus in accordance with claim 12 wherein the dielectric masking strip is secured in place on the open-web, plastic mesh adjacent to a portion of the moving metal strip upon which it is desired to have a lesser electroprocessing reaction than in other portions.
- 14. A strip processing apparatus in accordance with claim 12 wherein the thin dielectric masking element is secured to the open-web, plastic mesh by plastic clip means.
- 15. A strip processing apparatus in accordance with claim 12 wherein the thin dielectric element is secured to the open-web, plastic web by suitable plastic pin means.
- 16. A strip processing apparatus in accordance with claim 12 wherein the thin dielectric masking element is provided with orifices lesser in extent than the orifices in the open-web, plastic mesh.
- 17. A strip processing apparatus in accordance with claim 16 wherein the orifices in the thin dielectric masking element are of variable dimensions from one portion of the masking element to another.
- 18. A strip processing apparatus in accordance with claim 16 wherein the orifices in the thin dielectric masking element are variably spaced from one portion of the masking element to another.
- 19. A strip processing apparatus in accordance with claim 17 wherein the dimensions of the orifices in the masking element generally decrease from one to another toward the edge of the strip.
- 20. A strip processing apparatus in accordance with claim 18 wherein the spacing between the orifices in the masking element generally increase toward the edge of the strip.
- 21. A strip processing apparatus in accordance with claim 13 wherein the thin dielectric masking element is directly adhered to portions of the dielectric separator.
- 22. A strip processing apparatus in accordance with claim 21 wherein the dielectric masking element is formed of a polymeric composition applied in unconsolidated form to portions of the dielectric separator and allowed to harden to at least partially close off orifices in the dielectric separator.
- 23. A strip processing apparatus in accordance with claim 22 in which the hardened polymeric composition substantially closes off the orifices in the dielectric separation to which it is applied.
- 24. A strip processing apparatus in accordance with claim 21 wherein the dielectric masking element comprises a separate member adjacent one face of open-web, plastic mesh and is adhesively secured to said one face.
- 25. A strip processing apparatus in an electroprocessing operation comprising:(a) a thin unitary laterally extended open-web, plastic mesh adapted for positioning between a moving metal strip and an adjacent electrode in an electroprocessing bath, (b) said open-web, plastic mesh serving as a dielectric minimum arc distance separator for the particular electroprocessing bath, positioned between the moving metal strip and the electrode, (c) said open-web, plastic mesh having a surface facing the strip comprised of a high lubricity material.
- 26. A strip processing apparatus in accordance with claim 25 wherein the high lubricity material is polytetrafluoroethylene.
- 27. A strip processing apparatus in accordance with claim 26 wherein the surface only of the open-web, plastic mesh facing the strip is comprised of polytetrafluoroethylene.
- 28. A strip processing apparatus in accordance with claim 26 wherein at least a major portion of the open-web, plastic mesh is polytetrafluoroethylene.
- 29. A strip processing apparatus in accordance with claim 25 wherein the surface only of the open-web, plastic mesh facing the strip is comprised of polychlorosulfonatedeythelene (PCFE).
- 30. A strip processing apparatus in accordance with claim 25 wherein at least a major portion of the open-web, plastic mesh is PCFE.
- 31. A strip processing apparatus in accordance with claim 29 wherein the surface only of the open-web, plastic mesh facing the strip is comprised of PCFE.
- 32. An improved apparatus arrangement for electrolytic processing of a longitudinally extended metal workpiece comprising:(a) means to pass a longitudinally extended metallic workpiece having at least one surface to be coated along a pass line through containment means for a body of electrolytic solution bathing such surface to be coated, (b) an electrode mounted closely adjacent the pass line of said metallic workpiece within said containment means in contact with said electrolytic solution, (c) at least one thin substantially solid laterally extended dielectric means substantially bathed by the electrolytic solution and extending adjacent to the electrode generally transversely of said longitudinally extended metallic workpiece to at least periodically contact the surface of the workpiece along a relatively narrow line of contact to simultaneously space the workpiece from the electrode and wipe the surface of the workpiece, (d) means to move the longitudinally extended workpiece along the pass line past the transversely extended dielectric means within the electrolytic solution, and (e) wherein the thin substantially solid laterally extended dielectric means is a portion of an extended substantially unitary open-web, plastic mesh material formed from a high lubricity plastic material.
RELATED APPLICATIONS
This application is a continuation-in-part of U.S. application Ser. No. 08/574,416 filed Dec. 15, 1995 now U.S. Pat. No. 5,837,120 as well as U.S. application Ser. No. 08/316,530 filed Sep. 30, 1994 now U.S. Pat. No. 5,476,578 as well as U.S. application Ser. No. 08/533,500 filed Sep. 25, 1995 now U.S. Pat. No. 5,679,233 which is a National Stage Application of PCT/US95/11123, filed Aug. 30, 1995.
US Referenced Citations (11)
Continuation in Parts (3)
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Number |
Date |
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08/574416 |
Dec 1995 |
US |
Child |
09/111315 |
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US |
Parent |
08/316530 |
Sep 1994 |
US |
Child |
08/574416 |
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US |
Parent |
08/533500 |
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US |
Child |
08/316530 |
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US |