Claims
- 1. An improved apparatus arrangement for electrolytic processing of a longitudinally extended metal workpiece comprising:
- (a) means to pass a longitudinally extended metallic workpiece having at least one surface to be coated along a pass line through containment means for a body of electrolytic solution bathing such surface to be coated,
- (b) an electrode mounted closely adjacent the pass line of said metallic workpiece within said containment means in contact with said electrolytic solution,
- (c) at least one thin substantially solid laterally extended dielectric means substantially bathed by the electrolytic solution and extending adjacent to the electrode generally transversely of said longitudinally extended metallic workpiece to at least periodically contact the surface of the workpiece along a relatively narrow line of contact to simultaneously space the workpiece from the electrode and wipe the surface of the workpiece,
- (d) means to move the longitudinally extended workpiece along the pass line past the transversely extended dielectric means within the electrolytic solution, and
- (e) wherein the thin substantially solid laterally extended dielectric means is a portion of an extended unitary open-web, plastic mesh material.
- 2. An improved apparatus arrangement for electrolytic processing in accordance with claim 1 wherein the electrolytic processing apparatus arrangement is an electroplating apparatus arrangement.
- 3. An improved apparatus arrangement for electrolyte processing in accordance with claim 1 wherein the electrolytic processing apparatus arrangement is an anodizing apparatus arrangement.
- 4. An improved arrangement for electrolytic processing in accordance with claim 1 wherein the dielectric means extends from one side of the extended unitary open-web, plastic mesh material.
- 5. An improved apparatus arrangement for electrochemical processing of metal substrates comprising:
- (a) an electrochemical processing bath, (b) means to support a plurality of electrodes of opposite polarity in the electrochemical processing bath, one of said electrodes being a workpiece for treatment which is passed through the electrochemical processing bath,
- (c) a thin, substantially solid-laterally and longitudinally extended dielectric wiping and spacing means arranged for passage across the surface of at least one of the electrodes to at least partially remove a barrier layer of depleted electrolyte from the surface of such electrode while spacing the workpiece at least a critical distance from the electrode calculated to prevent arcing between the electrode and workpiece, and
- (d) wherein the dielectric wiping and spacing means is a component of an extended plastic member comprised of a unitary open-web, plastic mesh extending across the workpiece from side to side having a thickness sufficient to prevent arcing between the workpiece and the adjacent electrodes.
- 6. An improved apparatus arrangement for electrochemical processing in accordance with claim 5 wherein the workpiece is an elongated strip conducted past the electrodes and the dielectric wiping and spacing means is a portion of a laterally and longitudinally extended mesh of intersecting plastic members in the form of a unitary open-web plastic mesh.
- 7. An improved apparatus arrangement for electrochemical processing in accordance with claim 6 wherein dielectric wiping and spacing means extend from one side of the open-web, plastic mesh.
- 8. An improved arrangement for electrochemical processing in accordance with claim 7 wherein there are a plurality of dielectric wiping means extending from one side of the open-web, plastic mesh material.
- 9. An improved apparatus arrangement for electrochemical processing in accordance with claim 8 wherein the dielectric wiping and spacing means are arranged to actively pass over the surface of the elongated strip.
- 10. A method of electrochemical processing a continuous metal strip section comprising:
- (a) passing a charged continuous metal strip section through an electrochemical processing bath having a dielectric breakdown potential adjacent an oppositely charged electrode with respect to which the metal strip moves while applying electrical energy to said strip as a portion of an electrical circuit between said strip and the adjacent electrode,
- (b) maintaining a dielectric separation element extending generally transversely across the strip between the electrode and strip and in at least periodic contact with the strip to space the strip from the electrode a minimum sufficient distance to prevent arcing between the strip and electrode, at least at some power levels, and restricting the power applied to the circuit to less than sufficient to exceed the dielectric breakdown potential of the electrolyte for the minimum distance to be maintained between the strip and the electrode, and
- (c) wherein the dielectric separator element with respect to which the strip is passed is a unitary transversely extended open-web, plastic mesh dielectric section maintained generally parallel to and covering the strip surface.
- 11. A method of electrochemical processing in accordance with claim 10 wherein the dielectric separator element with respect to which the strip is passed is a combination of flexible wiping blades continuously maintained against the strip and transversely extended open-web, plastic mesh dielectric sections disposed between the flexible wiping blades.
- 12. A strip positioning and wiping means for an electrochemical processing operation on strip material comprising:
- (a) a thin unitary laterally extended open-web, plastic mesh adapted for positioning between a moving metal strip and an adjacent electrode in an electrocoating bath,
- (b) said plastic mesh having a thickness of from one thirty-second to three eights of an inch and having a ratio of open-mesh area to plastic web area of from 1 to 1 to 20 to 1,
- (c) said thin unitary laterally extended open-web, plastic mesh being mounted between a strip and an electrode in an electrochemical processing line in at least periodic contact with the strip to provide a minimum spacing between the strip and the electrode of from one thirty-second of an inch to three eights of an inch.
- 13. A strip positioning and wiping means for an electrochemical processing operation in accordance with claim 12 wherein the thickness of the unitary, laterally extended open-web plastic mesh is from one sixteenth to one quarter inch to provide a minimum spacing between the strip and the electrode of between one-sixteenth and one-quarter inch.
- 14. A strip positioning and wiping means for an electrochemical processing operation in accordance with claim 13 wherein the unitary laterally extended open-web, plastic mesh is dynamically disposed adjacent the strip and dynamically movable with respect to the moving strip.
- 15. A strip positioning and wiping means for an electrochemical processing operation in accordance with claim 13 wherein the unitary laterally extended open-web, plastic mesh is statically disposed adjacent the strip and the strip moves past the electrode.
- 16. A strip positioning and wiping means for an electrochemical processing operation in accordance with claim 15 wherein statically disposed unitary laterally extended the open-web, plastic mesh overlies and shields from damage a cloth filter fabric between the electrode and the moving strip.
- 17. A strip positioning and wiping means in accordance with claim 15 wherein the unitary laterally extended open-web, plastic mesh is positioned longitudinally between laterally extended flexible wiping blades which extend past the open-web plastic mesh toward and continuously contact the surface of the strip at intervals longitudinally along the strip.
- 18. A wiping arrangement for use in an electrolytic processing bath to contact and position a strip passing through such electrolytic coating bath comprising:
- (a) an electrolytic coating bath,
- (b) means to pass an extended strip longitudinally along a pass line through the coating bath,
- (c) an open-web plastic mesh wiping means positioned on at least one side of the pass line of the strip through the bath, said open-web plastic mesh having individual web thicknesses between the openings in the open-web plastic mesh less than the thickness of the open-web plastic mesh as a whole in its narrowest dimension, the positioning of the open-web plastic mesh being sufficiently close to the strip pass line to at least periodically contact the strip as its passline oscillates from side to side and prevent it from contacting electrodes adjacent to the passline of the strip as well as wiping the surface of the strip.
- 19. A wiping arrangement in accordance with claim 18 wherein the open-web plastic mesh is arranged to continuously contact the side of the strip to continuously wipe the strip surface.
- 20. A wiping arrangement in accordance with claim 19 wherein there is a honeycomb section wiper on both sides of the strip and at least one of such wipers is mounted such that it may move away from the other to accommodate camber and other possible defects in the strip as the strip passes between the two.
- 21. A wiping arrangement in accordance with claim 18 wherein the open-web plastic mesh is in the form of a honeycomb section to wipe the strip surface and is sufficiently extended along the length of the strip so that the side of the strip on the average is wiped by contact with the honeycomb section on every portion during one pass along the honeycomb section to remove gas bubbles and depleted electrolytic solution from the strip surface.
- 22. A wiping arrangement in accordance with claim 21 wherein there is a honeycomb section on both sides of the strip to at least periodically wipe both sides of the strip.
- 23. A wiping arrangement in accordance with claim 18 wherein the open-web, plastic mesh is in the form of a thin, at least partially flexible open-web, plastic mesh having a thickness adapted to provide a minimum spacing between the strip surface and adjacent electrodes.
- 24. A wiping arrangement in accordance with claim 23 wherein the open-web, plastic mesh is arranged to continuously contact the surface of the strip.
- 25. A wiping arrangement in accordance with claim 23 wherein the open-web, plastic mesh is arranged to only intermittently contact the surface of the strip.
- 26. A wiping arrangement in accordance with claim 25 additionally comprising:
- (d) flexible wiping blade wipers arranged to continuously contact the strip and spaced periodically along the extent of the open-web, plastic mesh longitudinally along the strip.
- 27. An improved electrolytic processing line comprising:
- (a) containment means for an electrolytic processing bath,
- (b) means to pass a continuous strip along a pass line through said processing bath,
- (c) electrode means disposed adjacent the pass line of the strip in the electrolytic processing bath,
- (d) a plurality of transversely extended resilient wiping blades disposed along the strip pass line in a position to resiliently contact the strip adjacent to the electrodes,
- (e) open-web, plastic mesh spacers positioned along the strip passline between the flexible wipers and adjacent to the electrode surface, the thickness of the open-web, plastic mesh determining a minimum distance between the surface of the anodes and the strip surface.
- 28. An improved electrolytic processing line in accordance with claim 27 wherein the plurality of transversely extended resilient wiping blades are flexible wiping blades with their edges flexed against the strip adjacent the electrodes.
- 29. An improved electrolytic coating arrangement comprising:
- (a) a containment means for an electrolytic coating bath,
- (b) at least one soluble electrode positioned in the electrolytic coating bath,
- (c) a strip arranged to pass closely by the soluble electrode,
- (d) a filter cloth material effectively enveloping the soluble electrode to prevent discharge of insoluble contaminants into the electrolytic bath,
- (e) an open-web, plastic mesh disposed between the surface of the strip and the surface of electrode and over the filter cloth material to shield such filter material from possible rupture or other damage as a result of catching on inequalities on the strip surface.
- 30. An improved electrolytic coating arrangement in accordance with claim 29 wherein the thickness of the open-web plastic mesh also determines the minimum approach distance of the strip to the electrodes sufficient to prevent arcing between the strip and the electrode.
- 31. An improved electrolytic processing arrangement comprising:
- (a) containment means for an electrolytic coating bath,
- (b) electrode support means for electrodes in said electrolytic coating bath,
- (c) guide means for passing a continuous strip through said coating bath adjacent the electrode support means,
- (d) support means for strip surface wiping means disposed adjacent the electrodes,
- (e) said support means for strip surface wiping means being pivotable to remove the wiping means in an arcuate path from the electrolytic bath under the strip without adjusting the pass line position of the strip,
- (f) the support means for the electrodes and support means for the strip surface wiper means being substantially the same means and both the electrodes and associated wiper means being can be pivotable out from under the strip for maintenance/replacement without disturbing the position and passline of the strip, and
- (g) wherein the strip surface wiper means comprises an open-web, plastic mesh disposed on top of the electrodes.
- 32. An improved electrolytic processing line in accordance with claim 31 wherein the electrodes and open-web, plastic mesh are unitized as a combined electrode and wiping means secured to a single pivotable support arm and a series of such unitized support arm, electrode, wiper combinations are disposed in serial order along the strip to facilitate periodic individual removal and replacement without lengthy shutdown.
- 33. An improved electrolytic processing line in accordance with claim 31 wherein the wiper means supported by the support means is a transversely disposed flexible wiping blade adapted for flexing at one edge against the strip.
- 34. An improved electrolytic processing arrangement comprising:
- (a) a containment means for an electrolytic processing bath,
- (b) at least one electrode in the processing bath,
- (c) means for passing a continuous elongated strip through said processing bath,
- (d) dielectric contact means extending transversely across the strip surface in contact therewith and adapted by interposition between the strip and the electrode as well as contact with the strip to:
- (i) maintain a minimum separation between the strip and the electrode;
- (ii) remove a substantial proportion of any excessively heated barrier layer that may be carried along with the strip.
- 35. An improved electrolytic processing arrangement in accordance with claim 34 wherein a substantial portion of any gas bubbles generated during electrolytic processing plus a substantial portion of any chemically depleted barrier layer are wiped from the surface of the strip by the dielectric contact means.
- 36. An improved electrolytic processing arrangement in accordance with claim 35 wherein the dielectric contact means extending transversely across and in contact with the strip surface comprises a narrow flexible wiping blade with one edge deflected against the surface of the strip.
- 37. An improved electrolytic processing arrangement in accordance with claim 35 wherein the dielectric contact means extending transversely across and in contact with the strip surface comprises an open-web, plastic mesh wiping means.
- 38. An improved electrolytic processing arrangement in accordance with claim 37 wherein the dielectric contact means in the form of an open-web, plastic mesh overlies a filter cloth material disposed over the surface of the electrode and such plastic mesh has a mesh size and thickness effective to prevent any portion of such filter cloth from protruding through the openings of said plastic mesh sufficiently to contact any portion of the strip.
- 39. An improved electrolytic processing arrangement in accordance with claim 37 wherein the dielectric contact means includes narrow wiping blades which are components of the open-web, plastic mesh wiping means.
- 40. An improved electrolytic processing arrangement in accordance with claim 39 wherein the narrow wiping blades depend from one side of the open-web, plastic mesh wiping means.
- 41. An improved arrangement for electrochemical processing comprising:
- (a) a containment means for an electrochemical processing bath,
- (b) means for passing continuous strip through said processing bath,
- (c) a rotatable electrode having a substantially cylindrical surface configuration about at least a portion of which the continuous strip is passed,
- (d) a dielectric spacer grid upon the surface of the cylindrical surface of the rotatable electrode having a thickness sufficient to prevent arcing between the strip surface and the surface of the electrode,
- (e) said dielectric spacer grid being comprised of a unitary open-web, plastic mesh upon the surface of the rotatable electrode.
- 42. An improved arrangement for electrochemical processing in accordance with claim 41 additionally comprising a guide roll adjacent the rotatable electrode around which the unitary open-web, plastic mesh passes before passing back to the rotatable electrode.
- 43. An improved arrangement for electrochemical processing in accordance with claim 41 wherein the rotatable electrode is segmented into separate sections with cooperating arcuate surfaces which sections are individually replaceable.
- 44. An improved arrangement for electrochemical processing in accordance with claim 43 wherein the segments of the rotatable electrode are formed in part of soluble electrode material and the individual segments are encased in filter cloth over the arcuate sections of which the open-web, plastic mesh is disposed.
- 45. An improved arrangement for electrochemical processing in accordance with claim 44 in which the electrode material is contained in corrosion resistant baskets forming at least a portion of the segments additionally comprising:
- (e) outwardly moveable shoes in each segment to urge the electrode material toward the outer perimeter of the basket,
- (f) biasing means attached to the outwardly movable shoes to move such shoes outwardly.
- 46. An improved arrangement for electrochemical processing in accordance with claim 45 wherein the biasing means are compressible resilient means.
- 47. An improved arrangement for electrochemical processing in accordance with claim 46 wherein the compressible resilient means comprise resilient springs.
- 48. An apparatus for electrochemical processing of metal strip material comprising:
- (a) a containment means for electrolytic solution arranged to expose at least one side of a metal strip to said solution,
- (b) an electrode exposed to said electrolytic solution,
- (c) means to pass metallic strip close to the electrode in contact with the electrolytic solution,
- (d) means to position a unitary generally planar open-web, plastic mesh parallel to and between the metallic strip and the electrode to space the strip from the electrode, said open-web, plastic mesh being at least periodically in content with said strip.
- 49. An apparatus for electroprocessing of metal strip material in accordance with claim 48 wherein the open-web, plastic mesh comprises a single layer of plastic material.
- 50. An apparatus for electroprocessing of metal strip material in accordance with claim 49 wherein the unitary planar generally planar open-web, plastic mesh is between one thirty-second and three-eighth inches in thickness to establish a minimum distance of such dimensions between the strip and the electrode.
- 51. An apparatus for electroprocessing of metal strip material in accordance with claim 50 wherein the unitary, generally planar open-web, plastic mesh has a thickness between one-sixteenth and one-quarter inch.
- 52. An apparatus for electroprocessing of metal strip material in accordance with claim 51 wherein the thickness of the web material between the openings in the open-web, plastic mesh is less than the thickness of the plastic mesh at least in a transverse direction forming integral wiping blades extending transversely of the strip.
- 53. An apparatus for electroprocessing of metal strip in accordance with claim 52 wherein there are generally transverse flexible wiping blades extending downwardly from one surface of the open-web plastic mesh in contact with the strip.
- 54. An apparatus for electroprocessing of metal strip material in accordance with claim 52 wherein the strip and open-web, plastic mesh are maintained in substantially continuous contact.
- 55. An apparatus for electroprocessing of metal strip material in accordance with claim 54 wherein the open-web, plastic mesh is oriented in the apparatus parallel to the plane of the strip.
- 56. An apparatus for electroprocessing of metal strip in accordance with claim 54 wherein the open-web, plastic mesh is moved in a plane parallel to the strip with respect to the apparatus as well as relative to the strip.
- 57. An apparatus for electroprocessing of metal strip in accordance with claim 54 wherein the open-web, plastic mesh has a large plurality of openings with from 50 to 95 percent of the open-web, plastic mesh constituting such openings.
- 58. An apparatus for electroprocessing of metal strip in accordance with claim 57 wherein from 75 to 95 percent of the open-web, plastic mesh constitutes such openings.
- 59. An apparatus for electroprocessing of metal strip in accordance with claim 58 wherein the individual openings are small enough to prevent any filter net on one side of such openings from protruding through.
- 60. A method of electrochemical processing a continuous metal strip section comprising:
- (a) passing a charged continuous metal strip section through an electrochemical processing bath having a dielectric breakdown potential adjacent an oppositely charged electrode with respect to which the metal strip moves while applying electrical energy to said strip as a portion of an electrical circuit between said strip and the adjacent electrode,
- (b) maintaining a dielectric separation element extending generally transversely across the strip between the electrode and strip and in at least periodic contact with the strip to space the strip from the electrode a minimum sufficient distance to prevent arcing between the strip and electrode, and restricting the power applied to the circuit to less than sufficient to exceed the dielectric breakdown potential of the electrolyte for the minimum distance to be maintained between the strip and the electrode, and wherein the dielectric separator element with respect to which the strip is passed is a combination of flexible wiping blades continuously maintained against the strip and transversely extended open-web, plastic mesh dielectric sections disposed between the flexible wiping blades.
- 61. An improved electrolytic processing arrangement comprising:
- (a) containment means for an electrolytic coating bath,
- (b) electrode support means for electrodes in said electrolytic coating bath,
- (c) guide means for passing a continuous strip through said coating bath adjacent the electrode support means,
- (d) support means for strip surface wiping means disposed adjacent the electrodes,
- (e) said support means for strip surface wiping means being pivotable to remove the wiping means in an arcuate path from the electrolytic bath under the strip without adjusting the pass line position of the strip, and
- (h) wherein the wiper means supported by the support means is a transversely disposed flexible wiping blade adapted for flexing at one edge against the strip.
RELATED APPLICATIONS
This application is a continuation-in-part of U.S. application Ser. No. 08/316,530 filed Sep. 30, 1994 now U.S. Pat No. 5,476,578 as well as PCT application PCT/US95 111,232 filed Aug. 30, 1995 and U.S. application 08/533,500 filed Sep. 25, 1995, now U.S. Pat No. 5,679,233
US Referenced Citations (6)
Continuation in Parts (2)
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Number |
Date |
Country |
Parent |
316530 |
Sep 1994 |
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Parent |
533500 |
Sep 1995 |
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