METHOD AND APPARATUS FOR INSPECTING POSITIONING MACHINE BY LASER TRACKING INTERFEROMETER

Abstract

To inspect a positioning machine by a laser tracking interferometer that tracks a retroreflector using a laser beam, the positioning accuracy of the positioning machine is evaluated by comparing a distance Δdij,C with a distance Δdij,L measured by the laser tracking interferometer, the distance Δdij,C being acquired by orthogonal projection of the position vectors of measurement points pi and pj measured by the positioning machine to the straight line gk passing through the rotation center M of the laser tracking interferometer.

Description

CROSS-REFERENCE TO RELATED APPLICATION

The disclosure of Japanese Patent Application No. 2016-153262 filed on Aug. 3, 2016 including specifications, drawings and claims are incorporated herein by reference in its entirety.

TECHNICAL FIELD

The present invention relates to methods and apparatuses for inspecting a positioning machine by a laser tracking interferometer (also referred to as a laser tracker), and more particularly, to a method and an apparatus for inspecting a positioning machine by a laser tracking interferometer, the method and apparatus being suitably used for inspecting a machine having a positioning mechanism, such as a three-dimensional coordinate measuring machine (also referred to as the CMM), a machine tool, or a robot (collectively referred to as the positioning machine), by a laser tracking interferometer.

BACKGROUND ART

There is known a laser tracking interferometer which is configured from: a laser interferometer on which an optical axis shift detection sensor for detecting the amount of shift in the optical axis of return light is mounted; a biaxial rotation mechanism for directing the laser interferometer in an arbitrary direction; and a retroreflector that is secured to an object to be measured (see Japanese Patent Application Laid-Open. No. Sho. 63-231286 (hereafter referred to as Patent Literature 1) and Japanese Patent Application Laid-Open No. 2007-57522 (hereafter referred to as Patent Literature 2)). Here, the retroreflector is an optical element for collimating incident and reflected beams of light, and capable of interference measurement in a given direction by controlling the biaxial rotation mechanism so as to reduce the amount of shift in the optical axis to zero on the basis of an output from the optical axis shift detection sensor.

German Patent No. DE 102007004934 B4 (hereafter referred to as Patent Literature 3) describes a method for inspecting a geometric error of a positioning machine provided with a retroreflector using a laser tracking interferometer for measuring a distance by a laser beam that is rotatable to track the retroreflector, like those described above.

Referring to FIGS. 1 and 2, a description will be given of the technical outline of Patent Literature 3. Patent Literature 3 relates to a method for inspecting a geometric error of a positioning machine (herein, a CMM) 10 provided with a retroreflector 20 by a laser tracking interferometer 30 that measures a distance using a laser beam 32 rotatable to track the retroreflector 20.

FIG. 1 illustrates a base 12 of the positioning machine 10, a gate type frame 14 that is movable in the back-and-forth direction of the figure with respect to the base 12, a column 16 that is movable is the right-and-left direction along a horizontal beam 15 of the gate type frame 14, a slider 18 that is movable in the up-and-down direction with respect to the column 16, a personal computer (PC) 40, and communication cables 42 and 44. The tip end (the lower end in the figure) of the slider 18 is provided with a probe (for measurement) or the retroreflector 20 (for inspection).

As shown in FIGS. 1 and 2, claim 1 of Patent Literature 3 includes: a step of determining the coordinates of the rotation center M of the laser tracking interferometer 30 positioned in a work space of the positioning machine 10; a step of positioning the retroreflector 20 at at least two positions p_i that are substantially positioned on a straight line g_k extending through the rotation center M of the laser tracking interferometer 30, and detecting each of the coordinates of the retroreflector 20 by the positioning machine 10; a step of measuring, by the laser tracking interferometer 30, at least one distance difference Δd_ij,L between distances d_i from the at least two positions p_i to the rotation center M, respectively; a step of computing at least one distance difference Δd_ij,C from each of the coordinates of the retroreflector 20 measured by the positioning machine 10; and a step of comparing the at least one measured distance difference Δd_ij,L with the at least one calculated distance difference Δd_ij,C wherein a step of computing each coordinate vector r_M of the rotation center M includes:

(A) a step of moving the retroreflector 20 to a first position;

(B) a step of measuring the distance to the retroreflector 20 using the laser tracking interferometer 30;

(C) a step of repeatedly executing the steps (A) and (B) described above at other positions until the position (coordinate) vector r_M of the rotation center M can be determined; and

(D) a step of computing each coordinate vector r_M of the rotation center M from the measurement value of a measured distance.

Furthermore, claim 2 of Patent Literature 3 further specifies the method according to claim 1. The method is characterized in that the retroreflector 20 is moved to at least three positions and particularly, to four positions P_i, and the step (B) includes a step of using the laser tracking interferometer 30, when the retroreflector 20 is moved from one position P_i to another position P_i, to measure the distances from the rotation center M to the at least three positions P_i and measure a difference Δd_ij,L between the measurement values, so that each coordinate vector r_M of the rotation center M is determined by each measured distance difference Δd_ij,L and the coordinate vector P_i measured by the positioning machine 10.

SUMMARY OF INVENTION

Technical Problem

However, according to the inspecting method of Patent Literature 3, the measurement point p_i not precisely placed on a certain straight line g_k would not allow the pitch Δd_ij along the straight line g_k to be inspected with high accuracy.

That is, in the method according to Patent Literature 3, the following (Equation 1) is used to compute the distance difference Δd_ij,C between two measurement points pi (here, expressed as p_i and p_j), measured by the positioning machine 10, with the rotation center M at the origin.

Δd_ij,C=|{right arrow over (p)}_j−{right arrow over (p)}_i|  (Equation 1)

Furthermore, the distance difference Δd_ij,L measured by the laser tracking interferometer 30 is computed as

Δd_ij,L=|d_j,L−d_i,L|  (Equation 2), and

the error of the positioning machine 10 is considered as

Δd_ij,C−Δd_ij,L  (Equation 3).

Thus, if the measurement points p_i and p_j that are the positions of the retroreflector 20 are precisely placed on a certain straight line g_k, the inspection is carried out with no problem by Equations 1 to 3. However, in actual measurements, even if the measurement points p_i and p_j are set on the straight line g_k, the measurement points may not be positioned precisely on the straight line g_k.

For simplicity's sake, suppose that as shown in FIG. 3, the measurement points p_i and p_j are such that d_i,L=d_j,L=1000 mm and Δd_ij,C=|vector p_j−vector p_i|=10 μm. Considering the error of the positioning machine 10 along the straight line g_k, the computation result of the error is desired to be 0 μm. However, since Equations 1 to 3 are used according to the conventional method of Patent Literature 3, the error Δd_ij,C−Δ_ij,L is inevitably computed to be 10 μm.

The present invention has been made to address the aforementioned conventional problems and provide improved accuracy of inspection of a positioning machine by a laser tracking interferometer.

Solution to Problem

The present invention addresses the aforementioned problems by a method for inspecting a positioning machine by a laser tracking interferometer that tracks a retroreflector using a laser beam. The method includes the steps of: mounting the retroreflector on the positioning machine; determining a position vector r_M of a rotation center M of the laser tracking interferometer positioned in a work space of the positioning machine; positioning the retroreflector at at least two positions p_i located in a vicinity of one straight line g_k extending through the rotation center M of the laser tracking interferometer, and detecting each of position vectors p_i of the retroreflector by the positioning machine; measuring a distance d_i,L from each of the at least two positions p_i to the rotation center M using the laser tracking interferometer and computing at least one distance difference Δd_ij,L from a difference between the at least two distances d_i,L; performing coordinate transformation of each of the position vectors p_i of the retroreflector to a position vector p′_i with the rotation center M at the origin; calculating a distance d_i,C acquired by orthogonal projection of each of the at least two position vectors p′_i to a unit direction vector g_k of the straight line g_k; computing at least one distance difference Δd_ij,C from the at least two distances d_i,C; and comparing the at least one distance difference Δd_ij,L measured by the laser tracking interferometer with the at least one distance difference Δd_ij,C measured by the positioning machine.

Here, the step of determining the position vector r_M of the rotation center M includes the steps of: (a) moving the retroreflector to a desired position P_i; (b) measuring a position vector P_i of the retroreflector by the positioning machine; (c) measuring the distance d_i,L to the retroreflector by the laser tracking interferometer; and (d) repeating the steps (a) to (c) at at least a total of four positions until the position P_i of the retroreflector is changed and then the position vector r_M of the rotation center M of the laser tracking interferometer can be computed, so that the position vector r_M of the rotation center M of the laser tracking interferometer can be determined from the distance d_i,L and the position vector P_i which have been measured.

Furthermore, the present invention also addresses the aforementioned problems by an apparatus for inspecting a positioning machine, to which a retroreflector is mounted, by a laser tracking interferometer for tracking the retroreflector using a laser beam. The apparatus includes: a circuit for determining a position vector r_M of a rotation center M of the laser tracking interferometer positioned in a work space of the positioning machine; a circuit for positioning the retroreflector at at least two positions p_i located in a vicinity of one straight line g_k extending through the rotation center M of the laser tracking interferometer, and detecting each of position vectors p_i of the retroreflector by the positioning machine; a circuit for measuring a distance d_i,L from each of the at least two positions p_i to the rotation center M using the laser tracking interferometer and computing at least one distance difference Δd_ij,L from a difference between the at least two distances d_i,L; a circuit for performing coordinate transformation of each of the position vectors p_i of the retroreflector to a position vector p′_i with the rotation center M at the origin; a circuit for calculating a distance d_i,C acquired by orthogonal projection of each of the at least two position vectors p′_i to a unit direction vector g_k of the straight line g_k; a circuit for computing at least one distance difference Δd_ij,C, from the at least two distances d_i,C; and a circuit for comparing the at least one distance difference Δd_ij,L measured by the laser tracking interferometer with the at least one distance difference Δd_ij,C measured by the positioning machine.

Here, the circuit for determining the position vector r_M of the rotation center M includes: (a) a circuit for moving the retroreflector to a desired position P_i; (b) a circuit for measuring a position vector P_i of the retroreflector by the positioning machine; (c) a circuit for measuring the distance d_i,L to the retroreflector by the laser tracking interferometer; and (d) a circuit for repeating the steps (a) to (c) at at least a total of four positions until the position P_i of the retroreflector is changed and then the position vector r_M of the rotation center M of the laser tracking interferometer can be computed, so that the position vector r_M of the rotation center M of the laser tracking interferometer can be determined from the distance d_i,L and the position vector P_i which have been measured.

Furthermore, as the value of the position vector P_i, it is possible to employ a pre-specified command value in place of a measurement value by the positioning machine.

Furthermore, of the at least total of four positions, at least one position may be a position that is not present on the same plane.

Furthermore, the distance difference Δd_ij,C may be computed by orthogonal projection of a vector of a difference between the respective position vectors p′_i of the retroreflector to the unit direction vector g_k of the straight line g_k.

Furthermore, the position vector p_i or P_i of the retroreflector may be measured by the positioning machine while the retroreflector is being moved.

Furthermore, the positioning machine may be a three-dimensional coordinate measuring machine (CMM).

Advantageous Effects of Invention

The present invention allows a geometric accuracy inspection of a positioning machine to be performed with high accuracy along a straight line g_k, even when measurement points p_i are not exactly disposed on the straight line g_k. This is implemented by comparing a distance Δd_ij,C with a distance Δd_ij,L measured by a laser tracking interferometer, the distance Δd_ij,C having been acquired by orthogonal projection of a position vector p_i of a measurement point measured by the positioning machine to the straight line g_k passing through the rotation center M of the laser tracking interferometer.

These and other novel features and advantages of the present invention will become apparent from the following detailed description of preferred embodiments.

BRIEF DESCRIPTION OF DRAWINGS

The preferred embodiments will be described with reference to the drawings, wherein like elements have been denoted throughout the figures with like reference numerals, and wherein:

FIG. 1 is an explanatory schematic perspective view illustrating the inspecting method disclosed in Patent Literature 3 and an applicable target of an embodiment of the present invention;

FIG. 2 is a view illustrating a method for computing an error in the inspecting method disclosed in Patent Literature 3;

FIG. 3 is a view illustrating a problem of the aforementioned method for computing an error;

FIG. 4 is a flowchart of the entire procedure is an embodiment of the present invention;

FIG. 5 is a flowchart of the procedure for computing a position vector of the rotation center of the laser tracking interferometer in the embodiment of the present invention;

FIG. 6 is a view schematically illustrating measurement points in the embodiment of the present invention;

FIG. 7 is a view schematically illustrating as operation of the embodiment of the present invention; and

FIG. 8 is a view schematically illustrating an example to which the present invention is effective.

DESCRIPTION OF EMBODIMENTS

Embodiments of the present invention will be described below in detail with reference to the drawings. It should be noted that the present invention is not limited to the contents described in the following embodiments and practical examples. The components of the embodiments and practical examples described below may include ones easily conceivable by those skilled in the art, substantially identical ones, and ones within the range of equivalency. The components disclosed in the embodiments and practical examples described below may be combined as appropriate, and may be selected and used as appropriate.

The applicable target of the embodiment of the present invention is the same as that of the conventional technique disclosed in Patent Literature 3. That is, as shown in FIG. 1, an apparatus is used in which a laser tracking interferometer 30 is positioned within the work space of a positioning machine (OEM) 10 on which the retroreflector 20 is mounted (the range in which a slider 18 on a base 12 is operated, and the surrounding thereof); to acquire a position vector p_i of the retroreflector 20 measured by the positioning machine 10 into a PC 40, the PC 40 and the positioning machine 10 are connected together by a communication cable 42 such as a USB or LAN; and to acquire a distance d_i,L to the retroreflector 20 measured by the laser tracking interferometer 30 into the PC 40, the PC 40 and the laser tracking interferometer 30 are connected together by a communication cable 44 such as a USB or LAN.

The PC 40 includes a data storage device (not shown) in which measurement results or a program for controlling the CMM 10 are stored.

In the embodiment of the present invention, as the entire procedure is shown in FIG. 4, Steps 1 to 9 below will be followed to inspect the geometric accuracy of the positioning machine 10.

(Step 1) As the procedure is shown in FIG. 5, Steps 1A to 1E below will be followed to compute a position vector r_M of the rotation center M of the laser tracking interferometer 30.(Step 1A) As illustrated in FIG. 6, the retroreflector 20 is first positioned at a desired position P_i.(Step 1B) Subsequently, the laser tracking interferometer 30 is used to measure the distance d_i,L from the rotation center M of the laser tracking interferometer 30 to the position P_i.(Step 1C) The positioning machine 10 is used to measure the position vector P_i of the retroreflector 20.(Step 1D) Step 1A to Step 1D are repeatedly carried out for at least a total of four positions P_i while the position P_i of the retroreflector 20 is being varied, until the position vector r_M of the rotation center M can be computed.(Step 1E) The position vector r_M of the rotation center M is computed from the distance d_i,L and the position vector P_i which have been measured.

Here, as for the positions P_i of the retroreflector 20, it is necessary to select at least one point that is a position not on the same plane because the position vector r_M of the rotation center M cannot be computed if all the positions P_i are on the same plane.

After Step 1E of FIG. 5 is ended, the process returns to Step 2 of FIG. 4 and executes Steps 2 to 9 below.

(Step 2) As illustrated in FIG. 7, the process computes the unit direction vector g_k of one straight line g_k that extends, in a direction in which the inspection is to be carried out, through the rotation center M of which position vector r_M was computed in Step 1, and then the retroreflector 20 is positioned at the position p_i in the vicinity of the straight, line g_k.(Step 3) The position vector p_i of the retroreflector 20 is measured by the positioning machine 10, and the laser tracking interferometer 30 is used to measure the distance d_i,L from the rotation center M to the position p_i of the retroreflector 20.(Step 4) The retroreflector 20 is moved to another position in the vicinity of the straight line g_k, and then the process conducts Steps 2 to 3 again. The retroreflector 20 is moved and measured repeatedly for a required number of times.(Step 5) At least two position vectors p_i measured by the positioning machine 10 are each changed by coordinate transformation to the position vector p′_i with the rotation center M at the origin.

{right arrow over (p)}′ _i ={right arrow over (p)} _i −{right arrow over (r)} _M  (Equation 4)

(Step 6) The process calculates distances d_i,C, acquired by orthogonal projection of the at least two positon vectors p′_i to the unit direction vectors g_k of the straight line g_k for the respective position vectors p′_i.

d _i,C ={right arrow over (p)}′ _i ·{right arrow over (g)} _k  (Equation 5)

(wherein the sign “·” means “inner product”)

(Step 7) The process computes at least one distance difference Δd_ij,C from the difference between the at least two distances d_i,C and d_ij,C.

Δd_ij,C=d_i,C−d_j,C  (Equation 6)

(Step 8) The process computes at least one distance difference Δd_ij,L from the difference between the at least two distances d_i,L and d_j,L measured in step 3 using the laser tracking interferometer 30.

Δd_ij,L=d_i,L−d_j,L  (Equation 7)

(Step 9) The process compares the at least one distance difference Δd_ij,C measured by the positioning machine 10 with the at least one distance difference Δd_ij,L measured using the laser tracking interferometer 30, thereby evaluating the positioning accuracy of the positioning machine 10.

In the case as shown in FIG. 3, when the aforementioned method is used, the computation result of the error of the positioning machine 10 along the straight line g_k is 0 μm, and the method is thus capable of performing inspection with improved accuracy as compared with the method disclosed in Patent Literature 3.

Note that a laser interferometer to be mounted on the laser tracking interferometer 30 may be of either the incremental type or the absolute type.

Furthermore, in Step 1, the position vector P_i employs a value measured by the positioning machine 10. However, it is also possible to employ a pre-specified command value instead.

Furthermore, the measurement of the position vector p_i by the positioning machine 10 in Step 2 may be performed in synchronism with the measurement of the distance d_i,L by the laser tracking interferometer 30 in Step 3, thereby performing these measurements while the retroreflector 20 is being moved.

Furthermore, to set the straight line g_k in an arbitrary direction, a plane mirror may be used to change the direction of a laser beam 32 emitted from the laser tracking interferometer 30 for inspection.

Furthermore, in place of the measurement of the distance d_i,L by the laser tracking interferometer 30 in Step 3, the distance difference Δd_ij,L may be directly measured.

Furthermore, when the distance difference Δd_ij,C is computed in Step 6 and step 7, the distance difference Δd_ij,C is computed from the distances d_i,C that are acquired by orthogonal projection of the position vectors p′_i to the unit direction vectors g_k of the straight line g_k. However, the distance difference Δd_ij,C may be computed by computing the vector Δp′_ij of the difference between the position vectors of two points and subjecting it to the orthogonal projection to the unit direction vector g_k.

As shown in FIG. 8, when measurements are performed, for example, from a certain point p₁ sequentially in the order of p₁ to p₂, and p₂ to p₃, the vectors p₁ to p₂, p₂ to p₃, and . . . have a high gradient to the straight line g_k, and thus the present invention provides significant effects.

Note that in the embodiments mentioned above, the positioning machine 10 was a CMM having a gate type frame. However, the type of the positioning machine is not limited thereto, and may also be another type of CMM having a cantilever type frame, a machine tool, a robot, or the like.

It should be apparent to those skilled in the art that the above-described embodiments are merely illustrative which represent the applicable examples of the principles of the present invention. Numerous and varied other examples can be readily devised by those skilled in the art without departing from the spirit and the scope of the present invention.

Claims

1. A method for inspecting a positioning machine by a laser tracking interferometer that tracks a retroreflector using a laser beam, the method comprising: mounting the retroreflector on the positioning machine;determining a position vector rM of a rotation center M of the laser tracking interferometer positioned in a work space of the positioning machine;positioning the retroreflector at at least two positions pi located in a vicinity of one straight line gk extending through the rotation center M of the laser tracking interferometer, and detecting each of position vectors pi of the retroreflector by the positioning machine;measuring a distance di,L from each of the at least two positions pi to the rotation center M using the laser tracking interferometer and computing at least one distance difference Δdij,L from a difference between the at least two distances di,L;performing coordinate transformation of each of the position vectors pi of the retroreflector to a position vector p′i with the rotation center M at an origin;calculating a distance di,C acquired by orthogonal projection of each of the at least two position vectors p′i to a unit direction vector gk of the straight line gk;computing at least one distance difference Δdij,C from the at least two distances di,C; andcomparing the at least one distance difference Δdij,L measured by the laser tracking interferometer with the at least one distance difference Δdij,C measured by the positioning machine.

2. The method according to claim 1, wherein: said determining the position vector rM of the rotation center M includes:(a) moving the retroreflector to a desired position Pi;(b) measuring a position vector Pi of the retroreflector by the positioning machine;(c) measuring the distance di,L to the retroreflector by the laser tracking interferometer; and(d) repeating (a) to (c) at at least a total of four positions until the position Pi of the retroreflector is changed and then the position vector rM of the rotation center M of the laser tracking interferometer can be computed, so that the position vector rM of the rotation center M of the laser tracking interferometer is determined from the distance di,L and the position vector Pi which have been measured.

3. The method according to claim 2, wherein a pre-specified command value is employed as a value of the position vector Pi in place of a measurement value by the positioning machine.

4. The method according to claim 2, wherein, of the at least total of four positions, at least one position is not present on a same plane.

5. The method according to claim 1, wherein the distance difference Δdij,C is computed by orthogonal projection of a vector of a difference between the respective position vectors p′i of the retroreflector to the unit direction vector gk of the straight line gk.

6. The method according to claim 1, wherein the position vector pi of the retroreflector is measured by the positioning machine while the retroreflector is being moved.

7. The method according to claim 1, wherein the positioning machine is a three-dimensional coordinate measuring machine (CMM).

8. An apparatus for inspecting a positioning machine, to which a retroreflector is mounted, by a laser tracking interferometer for tracking the retroreflector using a laser beam, the apparatus comprising: a circuit that determines a position vector rM of a rotation center M of the laser tracking interferometer positioned in a work space of the positioning machine;a circuit that positions the retroreflector at at least two positions pi located in a vicinity of one straight line gk extending through the rotation center M of the laser tracking interferometer, and that detects each of position vectors pi of the retroreflector by the positioning machine;a circuit that measures a distance di,L from each of the at least two positions pi to the rotation center M using the laser tracking interferometer, and that computes at least one distance difference Δdij,L from a difference between the at least two distances di,L;a circuit that performs coordinate transformation of each of the position vectors pi of the retroreflector to a position vector p′i with the rotation center M at an origin;a circuit that calculates a distance di,C acquired by orthogonal projection of each of the at least two position vectors p′i to a unit direction vector gk of the straight line gk;a circuit that computes at least one distance difference Δdij,C from the at least two distances di,C; anda circuit that compares the at least one distance difference Δdij,L measured by the laser tracking interferometer with the at least one distance difference Δdij,C measured by the positioning machine.

9. The apparatus according to claim 8, wherein the circuit that determines the position vector rM of the rotation center M includes:(a) a circuit that moves the retroreflector to a desired position Pi;(b) a circuit that moves a position vector Pi of the retroreflector by the positioning machine;(c) a circuit that measures the distance di,L to the retroreflector by the laser tracking interferometer; and(d) a circuit that repeats (a) to (c) at at least a total of four positions until the position Pi of the retroreflector is changed and then the position vector rM of the rotation center M of the laser tracking interferometer can be computed, so that the position vector rM of the rotation center M of the laser tracking interferometer is determined from the distance di,L and the position vector Pi which have been measured.

10. The apparatus according to claim 9, wherein a pre-specified command value is employed as a value of the position vector Pi in place of a measurement value by the positioning machine.

11. The apparatus according to claim 9, wherein, of the at least total of four positions, at least one position is not present on a same plane.

12. The apparatus according to claim 8, wherein the distance difference Δdij,C is computed by orthogonal projection of a vector of a difference between the respective position vectors p′i of the retroreflector to the unit direction vector gk of the straight line gk.

13. The apparatus according to claim 8, wherein the position vector pi of the retroreflector is measured by the positioning machine while the retroreflector is being moved.

14. The apparatus according to claim 8, wherein the positioning machine is a three-dimensional coordinate measuring machine (CMM).