Method and apparatus for making flat tension mask color cathode ray tubes

Abstract

A method is disclosed for use in the manufacture of a color cathode ray tube having a foil tension mask with a central pattern of apertures. A transparent flat front panel has a cathodoluminescent screen pattern on its inner surface. A plurality of mask support means, located on opposed sides of the screen pattern, have respective mask-receiving surfaces for receiving a shadow mask in tension. Q-height error data is developed according to the invention, and the aperture pattern of the mask in expanded and positioned in response to the error data to compensate for errors in Q-height to bring the mask apertures into registry with the screen pattern. Apparatus for measuring Q-height is also disclosed.

Description

BACKGROUND OF THE INVENTION

Field of the Invention

The invention applies to the manufacture of flat tension mask color cathode ray tubes. More specifically, the invention provides means for achieving registration of the aperture patterns of flat tension shadow masks and related cathodoluminescent screens.

In particular, the invention relates to a portion of the process steps employed in the manufacture of the faceplate assembly of a flat tension mask color cathode ray tube. The faceplate assembly includes a glass front panel, a support structure on the inner surface of the panel, and a tensed foil shadow mask affixed to the support structure.

In this specification, the terms "grille" and "screen" are used, and apply generally to the pattern on the inner surface of the front panel. The grille, also known as the black surround, or black matrix, is widely used to enhance contrast. It is applied to the panel first. It comprises a dark coating on the panel in which holes are formed to permit passage of light, and over which the respective colored-light-emitting phosphors are deposited to form the screen.

The holes in the grille must register with the columns of electrons passed by the holes or slots in the shadow mask. This is the primary registration requirement in a grille-equipped tube; the phosphor deposits may overlap the grille holes, hence their registration requirements are less precise.

In tubes without a grille, on the other hand, it is the phosphor deposits which must register with the columns of electrons. The word "screen", when used in the context of registration, therefore includes the grille where a grille is employed, as well as the phosphor deposits when there is no grille.

As used in this application, the terms "Q" and "Q-height" refer to the distance between the mask-receiving surface of a foil shadow mask support structure relative to the inner surface of a flat panel.

PROBLEMS IN THE CONVENTIONAL MANUFACTURING PROCESS

Historically, color cathode ray tubes have been manufactured by requiring that a shadow mask dedicated to a particular panel follow the panel through various stages of the manufacturing process. Such a procedure is more complex than might be obvious; a complex conveyer system is needed to maintain the marriage of each mask assembly to its associated panel throughout the manufacturing process. In several stages of the process, the panel must be separated from the mask, and the mating shadow mask cataloged for later reunion with its panel mate.

With the recent commercial introduction of the flat tension mask cathode ray tube, many process problems related to the curvature of the mask and panel have been alleviated or reduced. Necessarily, however, initial production of flat tension mask tubes has been based on continued use of the proven technology of mating a dedicated mask to a specific front panel throughout the manufacturing process. However, because the flat tension mask requires tension forces during the manufacturing process as well as after installation in a tube, somewhat cumbersome in-process support frames become necessary. These frames introduce complexity and expense in the manufacture of color cathode ray tubes of the tension mask type.

Thus the desirability of simplifying the conventional production process remains as great as ever in the manufacture of cathode ray tubes of the flat tension mask type.

It has been recognized that color tube manufacturing would be simplified if any mask could be registered with any screen (commonly termed an "interchangeable" mask), so that masks and screens would no longer have to be individually mated. Yet to this day, no commercially viable approach suitable for achieving such component interchangeability has been implemented or disclosed.

______________________________________Known Prior Art______________________________________2,625,734 Law2,733,366 Grimm3,437,482 Yamada et al3,451,812 Tamura3,494,267 Schwartz3,563,737 Jonkers3,638,063 Tachikawa3,676,914 Fiore3,768,385 Noguchi3,889,329 Fazlin3,894,321 Moore3,983,613 Palac3,989,524 Palac4,593,224 Palac4,692,660 Adler4,695,761 FendleyFR1,477,706 GobainGB2,052,148 Sony20853/65 Japanese______________________________________

Article "Improvements in the RCA Three Beam Shadow-Mask Color Kinescope," Grimes, 1954, Proceedings of the IRE, January, 1954, pgs. 315-326.

OBJECTS OF THE INVENTION

It is an object of this invention to provide manufacturing apparatus and process for color cathode ray tubes of the flat tension mask type wherein shadow masks and front panels are respectively interchangeable during mask-panel assembly.

It is also an object of the invention to provide a method for achieving practical interchangeability of shadow masks in the manufacture of flat tension mask color cathode ray tubes by providing automatic means for adjusting the position size and/or shape of a mask, and compensating for any variations in Q-height, such that the mask aperture pattern is brought into registration with a screen pattern.

It is a further object to provide such method and apparatus which compensate for errors in Q-height in foil shadow mask support structures used in interchangeable mask systems.

It is another object of this invention to provide for the correction of Q-errors by the same apparatus and method that provides for the correction of screen errors.

BRIEF DESCRIPTION OF THE DRAWINGS

The features of the present invention which are believed to be novel are set forth with particularity in the appended claims. The invention, together with further objects and advantages thereof, may best be understood by reference to the following description taken in conjunction with the accompanying drawings (noted as being not to scale), in the several figures of which like reference numerals identify like elements, and in which:

FIG. 1 is a view in perspective and partially cut away depicting a flat tension mask color cathode ray tube of the type with which this invention may be employed;

FIG. 2 is a perspective view of a universal holding fixture useful in the practice of the present invention;

FIG. 3 is a schematic view in elevation of a modified version of the universal holding fixture depicted in FIG. 2, adapted for use with a lighthouse;

FIG. 4 is a view similar to FIG. 3 of the fixture depicted FIG. 3 which represents a modification of the fixture to accommodate a wider tolerance in the Q-height of the mask support structure;

FIG. 5 is a plan view of a fixture enclosing an in-process shadow mask for adjusting the size, position, and/or shape of the mask in accordance with the principles of this invention;

FIG. 6 is a curve representing the distribution of required forces along one edge of the mask shown in FIG. 5;

FIG. 7 depicts schematically the use of levers for distributing forces along the edges of a mask shown in FIG. 5;

FIGS. 8a-8c depict modifications of the FIG. 5 fixture, in which:

FIG. 8a depicts an apparatus providing a reduced number of independently variable applied forces;

FIG. 8b depicts a variant of the FIG. 8a embodiment which has provision for the application of tangential forces to the edge of a mask; and

FIG. 8c is a diagrammatic view of means for the application of the tangential forces;

FIGS. 9 and 10 indicate the principles of operation of a quadrant detector optical sensing system used with the fixture of FIG. 5; the sequence of determining the location of sensing holes in a mask under tension relative to reference points independent of the mask is indicated;

FIG. 11 is a curve that indicates the output voltage from a matrixing circuit forming part of the quadrant detector optical sensor system;

FIG. 12 is a plan view representing schematically a system employing the principles of the invention, including multiple feed back loops;

FIGS. 13a-13f depict details of components and operation of a mask mounting fixture based on the system shown by FIG. 12, and include

FIGS. 13a, 13c, 13d and 13f, which are views in elevation depicting details of the components during the sequence of operation; and

FIG. 13b, which is a plan view of the fixture;

FIGS. 14a and 14b consist of two plan views of a cathode ray tube screen showing two undesired screen conditions:

FIG. 14a is a simplified plan view illustrating a screen pattern position as translated and/or rotated with respect to its nominal position; and,

FIG. 14b illustrates a condition in which the screen pattern geometry is distorted, i.e., the size and/or shape of the pattern is distorted;

FIG. 15 is a perspective view of a panel holding fixture which makes possible adjustment of the position of the contained panel;

FIG. 16 is a view in elevation of a representative section of a screen inspection designed to receive the adjustable fixture depicted in FIG. 15, and of a feedback loop for adjusting that fixture;

FIG. 17 is a more detailed view in elevation of a representative section of the same screen inspection machine;

FIGS. 18a-18c depict a grille aperture pattern as seen by a video camera and resulting pulse outputs:

FIG. 18a is a plan view, greatly enlarged, of one corner of a grille;

FIG. 18b is a waveform indicating the horizontal output signal from a specific scan line; and

FIG. 18c is a waveform indicating a vertical output signal;

FIG. 19 is a view in elevation of a representative section of a screen inspection machine designed specifically to accept a faceplate;

FIG. 20 is a detail view in elevation of a modified form of the assembly machine depicted in FIG. 13;

FIG. 21 is a partial views of an assembly machine providing for screen inspection and adjustment. FIG. 21a is a view in elevation of representative section of the machine; FIG. 21b is a view from the top of the machine;

FIG. 22 is a schematic diagram of a difference-forming circuit for controlling servo motors;

FIG. 23 depict a simplified version of the assembly machine of FIG. 21. FIG. 23a is a view in elevation of a representative section of the machine: FIG. 23b is a view from the top of the machine;

FIGS. 24a-24c depict diagrammatically means for developing error signals which indicate directly the position differences between a shadow mask and a grille, and include FIGS. 24a and 24b, which are views in elevation indicating the illumination of two specific apertures, and FIG. 24c, which is a greatly magnified plan view of the illuminated apertures;

FIG. 25 is an additional view of an assembly machine in which servo motors are mounted on a movable carrier;

FIG. 26a is a schematic view in elevation of a faceplate assembly indicating foil shadow mask support structures of equal but incorrect height;

FIG. 26b is a plan view of the apertured area of the foil shadow mask shown in FIG. 26a, illustrating how an adjustment of mask tension corrects for an error in support structure height;

FIG. 27a is a view similar to FIG. 26a in which two opposing foil shadow mask support structures of unequal height are indicated;

FIG. 27b is a plan view of the apertured area of the foil shadow mask shown in FIG. 27a, indicating the effect of corrective measures;

FIG. 27c is another plan view of the same foil shadow mask showing the effect of under-correction;

FIG. 28a is a plan view of the apertured area of a foil shadow mask in which the midpoints are locked in their nominal position;

FIG. 28b is a view similar to 28a but with tangential forces applied to the midpoints to minimize the average displacement in the central region of the mask; and

FIG. 29 is a view in elevation of a portion of a screen inspection machine comprising means for measuring Q-height of the support structure.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

FIGS. 1-3 describe apparatus and method according to the parent copending application Ser. No. 223,475 in which interregistry of a screen pattern with a tension mask aperture pattern is achieved by stretching or otherwise expanding the mask to a predetermined standard. FIGS. 4-25 illustrate method and apparatus according to the invention set forth in referent copending application Ser. No. 370,204 (a continuation-in-part of application Ser. No. 223,475), wherein errors in position (x-y rotation) and geometry (size and shape) of the screen are determined and compensated for. FIGS. 26-29 depict the effects of errors in Q-height and means for correcting such errors according to the present invention (which comprises a second continuation-in-part of the parent application, Ser. No. 223,475).

FIG. 1 depicts a flat tension mask color cathode ray tube 1 including a glass front panel 2 hermetically sealed to an evacuated envelope 5 extending to a neck 9 and terminating in a connection plug 7 having a plurality of stem pins 13.

Internal parts include a mask support structure 3 permanently attached to the inner surface 8 of the panel 2 which supports a tension shadow mask 4. The mask support structure 3 is machine ground to provide a planar surface at fixed "Q" distance from the plane of the inner surface 8. On the inner surface 8 of the panel 2 is deposited a screen 12 comprising a black grille, and a pattern of colored-light-emitting phosphors distributed across the expanse of the inner surface 8 within the inner boundaries of the support structure 3. The phosphors 12, when excited by the impingement of an electron beam, emit red, green and blue colored light.

The shadow mask 4 has a large number of beam-passing apertures 6, and is permanently affixed as by laser welding to the ground surface of the support structure 3.

In the neck 9 of tube 1 there is installed a cluster 10 of three electron guns identified as r, g and b. The electron guns emit three separate electron beams designated as r', g' and b' directed toward the mask 4. The electron beams are electronically modulated in accordance with color picture signal information. When deflected by magnetic fields produced by a yoke 9a external to the tube, the electron beams r', g', and b' are caused to scan horizontally and vertically such that the entire surface of the mask 4 is swept in a periodic fashion to form an image extending over substantially the entire area of the screen 12 within the inner boundaries of the mask support structure 3.

At positions on the mask 4 where there is an aperture 6, each of the three electron beam passes through the mask and impinges on the screen 12. Thus, the position of the mask 4 with its pattern of apertures 6, the positions of the electron guns r, g and b at 10, and the height of the support structure 3 control the locations where the electron beams r', g' and b' impinge on the screen 12.

For proper operation of the tube 1, there must be on the screen 12, a light emitting phosphor deposit of the proper color characteristic corresponding to the color information of the impinging electron beam r', g' or b'. Further, for proper operation, the center of the area of impingement of the electron beam must coincide within a narrow tolerance with the center of the associated phosphor deposit.

When these conditions are met over the entire surface of the screen, then mask and screen are said to be registered.

The rectangular area within which images are displayed, i.e., the area covered by the electron beams on the screen, is larger than the corresponding area on the mask through which those electron beams pass; the linear magnification from mask to screen is of the order of a few percent. Detailed studies have shown that this magnification varies slightly across the screen. Therefore, when a phrase such as "registration between mask and screen patterns" or "registration between the aperture pattern of the mask and the screen pattern" is used in this specification, it does not mean that the two patterns are congruent like a photographic negative and its contact print. Rather, it means that the two patterns are related to each other as required in a color tube of the flat construction described, using a support structure of predetermined height and having a predetermined spacing from mask to screen. Such registration of mask and screen is with respect to the electron beam center of deflection. As noted, in color tubes of conventional construction, registration is facilitated by using pairing dedicated shadow masks and front panels.

Conventional shadow masks are produced by photoetching the apertures in a flat metal sheet, then deforming the flat sheet into a bowl shape. After this deformation process, the formed masks are not interchangeable. However, with a mask that remains flat, the original interchangeability of flat sheets photoetched from a common master is retained. This is an important factor in the method and apparatus hereinafter described.

In a flat tension mask tube, the tension mask is typically made of steel foil about 0.001 inch thick. The mask is under substantial mechanical tension; the stress may be between 30,000 and 50,000 pounds per square inch. The mask is therefore stretched to a significant degree, the elastic deformation exceeding one part in one thousand; e.g., the conventional flat tension mask manufacturing method puts each mask into an elastically deformed condition before producing, by photolithography, the screen which will be used with that mask.

The invention set forth in referent copending application Ser. No. 370,204, on the other hand, calls for all screens to be made from a common master so that they are interchangeable. It also recognizes that the unstretched masks, as mentioned earlier, are very nearly alike, and it takes advantage of the elastic deformation of a mask that occurs when a mask is stretched. By applying controlled forces to a plurality of clamps gripping peripheral portions of the mask, each mask may be stretched in such a manner that its size and shape conform to a predetermined standard. If desired, the required forces may be substantially reduced by heating the mask during the stretching process.

The same clamps and forces also permit centering of the mask by moving it along its x and y axes (the major and minor dimensions in the plane of the mask), and by rotating it if need be, until multiple reference masks on the mask are aligned with corresponding fixed markers to indicate that position, size and shape of the mask now conform to a predetermined standard. Once this is achieved, a panel carrying a standardized screen and the mask are registered, in a manner to be described, with the mask contacting the mask support structure. The mask is then affixed to the mask support structure, as by laser welding.

FIG. 2 depicts a six-point universal holding fixture 30 for glass front panel assemblies to be used during all manufacturing processes requiring reproducible positioning of a panel 2a in reference to an established set of datum coordinates. Panel 2a, carrying mask support structure 3a, is shown on a fixture plate 18, using a holding method comprising three half-ball locators 22a, 22b and 22c, attached to posts designated as 19a, 19b and 19c, to control lateral position, while three vertical stops 20a, 20b and 20c control vertical position. Vertical stops 20a, 20b and 20c are provided with firm but relatively soft contact surfaces 17a, 17b, and 17c made of a material such as Delrin (.TM.) to protect the inner surface of panel 2a. A pressure device 21, shown in phantom lines below panel 2a, exerts an upward vertical force P to assure firm contact between the inner surface and the three vertical stops 20a, 20b, and 20c. A second pressure device 24, exerting a horizontal force F in the direction toward the corner between posts 19b and 19c, assures firm contact between the panel 2a and the three half-balls, 22a, 22b, and 22c.

Vertical stops 20a and 20b are co-located with posts 19a and 19b, but the third vertical stop 20c is completely separated from post 19c. By controlling within close limits the position of the three half-ball locators 22a, 22b, and 22c, as well as the plane defined by the three vertical stops 20a, 20b, 20c in different work stations in the manufacturing process, the position of a given panel in each of such work stations may be accurately duplicated. FIG. 3 illustrates a modification of the universal holding fixture 30 adapted to a lighthouse 40. It will be noted that the panel 2A and the vertical stops, two of which are depicted (20a and 20c), have been inverted, while the posts, two of which are depicted (19a and 19c), remain upright to allow insertion of panel 2A from above. Pressure device 21 is optional in this modification, since the weight of panel 2A may suffice to ensure proper seating on the vertical stops.

As is well known in the art of manufacturing color cathode ray tubes, a lighthouse is used for photoexposing light-sensitive materials applied to the inner surface 8A of panel 2A. Four separate exposures in four different lighthouses are needed to produce the black background pattern and the three separate colored light emitting phosphor patterns which comprise the screen 12. Photoexposure master 33 is permanently installed in lighthouse 40, with the image-carrying layer facing upward and spaced a very small distance (0.010", e.g.) from the inner surface of the panel 2A. At a fixed distance "f" from the plane of the photoexposure master 33 is placed an ultraviolet light source 34 which emits light rays 35 which simulate the electron beam path in a completed tube.

A shader plate 36 modifies the light intensity over the surface of the mask so as to compensate for the variation of distance from the light source and for the variation of angle of incidence, thereby achieving the desired exposure in all regions. Lens 38 provides for correction of the paths of the light rays so as to simulate more perfectly the trajectories of the electron beams during tube operation.

Experience has indicated that screen patterns produced by following the procedures just described are sufficiently accurate for use in high resolution tubes, provided that the Q height of support structure 3A, measured from the inner surface 8A of panel 2A to the machine ground top surface of the support structure, is held to a very close tolerance.

A modification of FIG. 3, depicted in FIG. 4 accommodates a wider tolerance in the Q height of the mask support structure. Here the vertical stops are replaced by half-balls 31, and the panel 2A rests, not on its inner surface, but on the ground top surface of support structure 3A. If, for example, that structure on a given panel is 0.002" too high, that panel in consequence sits that much higher during exposure, and the light pattern recorded on it is larger than normal. This is exactly what is required; when a mask is eventually affixed to this support structure, it will be 0.002" farther away from the panel, causing the electron beams also to form a larger pattern, and thus compensate for the excess vertical height Q. In effect, then, an interchangeable screen is produced in spite of the 0.002" error in support structure height Q.

The process for producing the screen pattern described in connection with FIGS. 3 and 4 differs from the conventional process in that for each of the four photo exposures, a permanent master is used rather than an individual mask uniquely associated with a particular screen. However, because the invention makes it unnecessary to match each screen to a particular mask, other more economical processes may be used to manufacture the screen pattern. Well-known printing processes such as, for example, offset printing, are particularly well adapted to producing the required precise screen pattern on flat glass plates. The important aspect of using offset printing is that four separate processes of photo-exposure, development and drying, followed by coating for the next process, are no longer required. In effect, offset printing offers the possibility of inexpensively producing an interchangeable screen pattern.

If offset printing or a similar process is employed, the height Q of support structure 3A must be controlled to an accuracy appropriate to the special requirements of the application.

FIG. 5 depicts schematically a machine 50 for applying controlled forces to a plurality of clamps gripping peripheral portions of the mask, capable of moving and elastically deforming the mask until its position, size and shape conform to a predetermined standard. The machine is also equipped to move a screened panel into a specified position adjacent to the mask and to weld the mask to the support structure; these features, not shown in FIG. 5, will be described in detail later.

FIG. 5 depicts a rectangular in-process shadow mask 4A having a wide peripheral portion. This is the form in which the mask emerges from the photoetching process. The central apertured region of the mask is bounded by rectangle 43. Outside this rectangle and surrounding it there is a row of widely spaced position-sensing apertures 47. Optical markers attached to machine 50, to be described in detail later, serve as position references and present in this embodiment the afore-discussed predetermined standard. It is the task of machine 50 to apply a distribution of forces to the mask such as to bring all apertures 47 into coincidence with their corresponding optical markers.

Located around the periphery of mask 4A is an array of clamps 44 which may each comprise a pair of actuatable jaws. For purposes of illustration, twenty-eight clamps are depicted. The reason for having a plurality of clamps on each side is that the individual clamps must be free to move apart as needed when the mask is stretched. The same plurality also permits application of a desired distribution of forces about the periphery of the mask 4A.

It must be kept in mind that the apertured central region of the mask inside rectangle 43 has an average elastic stiffness considerably smaller than that of the solid peripheral portion. Since it is desirable in the stretching process to essentially maintain the rectangular configuration of the central apertured region, stretching forces must be graded, with the magnitude of each force related to the local elastic stiffness encountered at each clamp 44. For example, the opposing clamps 101 and 115 act on solid material at one end of the mask; they therefore require considerably greater force than opposing clamps 104 and 118 which act on a portion containing largely apertured material.

FIG. 6 depicts a curve 51 representing the distribution of required force along one edge of mask 4A. It is seen that the force required near the corners is about 70% higher than that near the center.

In principle, it would be possible to control the forces applied to a large number of clamps, say twenty-eight as in FIG. 5, individually. But in practice, mass-produced masks are very much alike and there is no need for such a large number of independently variable forces. In fact, if the photoetched masks were exactly alike in thickness, elastic properties and detailed geometry, the forces to be applied to them to obtain a standard shape would always be the same. Such forces could be pre-programmed, and no feedback would be required.

In practice there are unavoidable variations in thickness between masks as a whole, as well as across each mask, and there may be slight variations in geometry caused, for example, by temperature variations during manufacture. To compensate for these variations, some force adjustments are necessary, and these are controlled by feedback.

It is evident that the number of independent adjustments required in a specific case depends on the accuracy with which the masks are manufactured and on the tolerance required for the particular tube design. In an extreme case where tolerances are fairly wide, thickness variation between different lots of masks may be the only significant variation. In this case only two independent adjustments, namely the total forces applied in the x and y directions, need to be controlled by feedback. The distribution 51 of applied forces within each coordinate axis may then be achieved by purely mechanical means such as, for example, a system of levers.

FIG. 7 illustrates the use of levers to distribute forces according to predetermined ratios. The figure shows six clamps labeled 109-114, assumed to be attached to one of the short edges of the mask. The desired forces, in arbitrary units, are, in this example: 1.7, 1.3, 1, 1, 1.3, 1.7. Forces along the pull rods are underlined in the figure; the figures associated with the levers indicate lever ratios. It is seen that any desired ratio of forces for any desired number of clamps along one edge can be so generated.

FIG. 8a illustrates a modification of FIG. 5, where there are still 28 clamps but only eight position-sensing apertures 47, and a total of twelve independently variable forces. Adjacent clamps are interconnected by levers as just explained, with the result that there are just three independent forces along each side. The four position-sensing apertures located in the corners are designed to detect position errors along both the x and y axes; those four apertures positioned near the center of each side respond only to radial, i.e., inward or outward displacements. Thus the total number of position error signals is twelve, equal to the number of independently controllable forces.

In addition to applying forces which act at right angles to the edges of the mask, it may sometimes be desirable to apply tangential forces in a direction parallel to an edge. FIG. 8b illustrates such an arrangement, using as an example a tension mask in which apertures 406 within boundary 443 are parallel slots rather than round holes. Slot masks are commonly used in color cathode ray tubes intended for television receivers. The slots conventionally run along the vertical (y) direction; they are not continuous from top to bottom, but are bridged at regular intervals by tie-bars to increase the mechanical stability of the mask.

In a color cathode ray tube of the flat tension mask type, a similar pattern of apertures, i.e., slots parallel to the y-axis and bridged at regular intervals, may be used. Only the x-coordinate of the mask pattern need register with the screen pattern, assuming that the phosphor stripes are continuous. Parallel to the slots, along the y-axis, high mechanical tension is applied; the amount of this tension is not critical so long as the elastic limit of the mask material is not exceeded. Along the x-axis, a carefully controlled amount of tension is applied; because the mechanical stiffness of the delicate bridges (not shown) is rather small, the tension in this direction must also be low.

Machine 450 in FIG. 8b is designed to apply controlled forces, including tangential forces, to a slot mask 404. Along the two vertical edges, clamps 444 are pulled outwardly by forces acting at right angles to those edges. The four clamps located near the middle of each edge are interconnected by levers. Six independently controllable forces F.sub.1 through F.sub.6 are applied to these two edges.

Turning now to the two horizontal edges, predetermined forces F.sub.0 which need not be controlled by feedback are applied at right angles to these edges near the four corners of the mask. However, the two middle clamps on each horizontal edge are pulled generally outward by forces F.sub.R (1), F.sub.R (2) which are not perpendicular to the edge but have a controllable tangential component.

FIG. 8c shows how such a force may be generated. Two stepping motors 424a and 424b are mounted on the frame 432 of machine 450 under angles of plus and minus 45 degrees as indicated. The motors carry reduction gears 428a, 428b terminating in pull rods 431a and 431b, respectively. A third pull rod 430, linked to the first two pull rods by springs 425a, 425b, connects to the lever which drives the two middle clamps. Clamps 460 along the horizontal edges are constructed somewhat differently from clamps 444. They are pivoted as shown so as to permit the application of tangential force components without producing local moments at the edge of the mask.

In operation, the two motors are caused to advance their respective pull rods 431a, 431b until a predetermined force F.sub.0, is generated on pull rod 430. This force acts at right angles to the edge, and its exact value is not critical.

Assume now that to compensate for a variation in mask thickness, the center portion of the mask needs to be pulled to the right as illustrated by F.sub.R (1) as shown in FIG. 8b. To this end, stepping motor 424a is advanced so that its pull rod 431a is pulled closer to the frame. At the same time, motor 424b is backed up so that pull rod 431b is extended beyond its normal position. As a consequence, the lower end of pull rod 430 moves to the right, and tangential force component F.sub.T (1) is generated. This together with the perpendicular component F.sub.0, produces the desired resultant force F.sub.R (1). Eight position sensors (not depicted) using position-sensing apertures 447 are designed to respond solely to positioning errors in x. There are also eight independently controllable forces: F.sub.1 through F.sub.6, and the two tangential components F.sub.T (1) and F.sub.T (2), of which only the first is shown in FIG. 8c.

The technique described for applying tangential force components to a mask edge is by no means limited to the execution shown in FIG. 8b. A more comprehensive application of the principles described would have provision for applying tangential forces to all clamps. Further, the technique could be applied to masks of other types such as "dot" masks (masks with round apertures). The technique could be applied to clamps in a non-levered clamping arrangement, as depicted in FIG. 5.

FIG. 9 illustrates the principle of operation of a commercially available quadrant detector optical sensor 89 which may be used in machine 450 to generate the needed positioning error signals. Such a sensor is sold by United Detector Technology of California and consists of a semiconductor chip having a photosensitive region in the shape of a circular disc which is divided into four 90-degree sectors. The photocurrent from each sector is separately available externally.

In FIG. 9, mask 4A is assumed to be in the correct state of tension with the position sensing apertures 47 in registration with optical detection light sensors 89. Each aperture 47 is fully illuminated by a light source 87 emitting a light beam 88. Light beam 88 may be produced by a laser or by a more conventional optical source.

A plurality of quadrant detector light sensors 89 is mounted on a plate 91 whose position with reference to the frame of machine 450 is precisely defined, as described in detail later in connection with FIG. 13a-13f. The active area 92 of the quadrant detector light sensor is in vertical alignment with the desired position of position sensing aperture 47. The illuminated area 47a represents the image of aperture hole 47 projected on active surface 92 of quadrant detector light sensor 89.

The diameter of light beam 88 is larger than the diameter of the active area 92 of quadrant detector light sensor 89, while the diameter of position-sensing aperture 47 is substantially smaller. If a position-sensing aperture is in exact concentric alignment with the active area 92 of its quadrant detector light sensor 89, all four sectors produce the same photocurrent; a matrixing circuit well known in the art, designed to indicate any unbalance between the sector currents, will then indicate zero position error in both x and y coordinates. More specifically, the matrixing circuit provides two outputs. The first indicates the difference between the sum of the two left sector currents, and the sum of the two right sector currents; this indicates an error in the x coordinate. The second output indicates the difference between the sum of the two upper sector currents and the sum of the two lower sector currents, thereby signaling an error in the y coordinate.

FIG. 10 illustrates a condition where a position-sensing aperture 47 is not aligned with the active area 92 of quadrant detector sensor 89; therefore, the projected image 47a is not aligned, the four sectors are unequally illuminated, and a non-zero output signal is generated. In the specific case, the sum of the left sector currents is larger than that of the right sector currents, producing an output in the x coordinate indicating that aperture 47 is too far to the left.

FIG. 11 indicates the output voltage V from a matrixing circuit of the type described, plotted against the displacement delta x of the aperture. The steep center portion a corresponds to displacements smaller than the radius of position sensing aperture 47. For larger displacements, the output becomes constant (shown at b). Further displacement causes the image of position sensing aperture 47 to cross the edge of active area 92; the output, shown at c, decreases and reaches zero (d) as the image of aperture 47 leaves the active area. The distance between point d and the center of the plot indicates the maximum positioning error which this particular sensor and position-sensing aperture combination can read.

Optical detection is by no means the only way of determining position errors. For example, very precise position measurements can be made using a combination of air nozzles, mask apertures, and flow or pressure gages.

The position-error signals are utilized, as previously explained, to correct any errors in mask position and orientation, to stretch the mask, and to adjust its shape. Some of these operations may require certain clamps 44 to back up, i.e. to provide slack so that other clamps can move outward without increasing mask tension. However, the force exerted by each clamp always remains directed outward; backup is achieved by reducing the force exerted by one clamp momentarily below the force of the opposing clamp or clamps.

The required pulling forces may be produced by hydraulic, pneumatic or electric drives. For example as depicted herein, electric stepping motors, geared down so as to produce large force with small displacement, are well adapted to be driven by computer controlled pulses. If one desires to produce an adjustable force rather than a controlled displacement, a spring may be inserted between motor and clamp.

It should be remembered that in practice, one motor may drive a plurality of clamps through a force distributor such as the one depicted in FIG. 7.

Computer means are provided for adjusting the force produced by each motor or other force generator. If there were only one motor and one error-sensing means, the feedback loop would be a simple servo and no computation would be needed. The same would be true if each motor influenced only the positioning error of one coordinate in one particular sensor location; a separate loop would then be required for each motor-sensor pair, but there would be no interaction between pairs.

In practice, the situation is more complex; each motor causes displacements at most or all sensor locations. These displacements are largest close to the clamp driven by the particular motor, and much smaller elsewhere, but if there are several or many independent motors, these contributions add up. Each such contribution can be characterized by a matrix coefficient, and for a given configuration of motors, clamps and sensor locations, these coefficients can be determined once and for all, and stored in computer memory. The problem of determining the values of the N forces required to reduce N position errors to zero is then merely that of solving N simultaneous linear equations, a task easily and rapidly performed by a computer.

The clamps used to transmit the controlled forces to the periphery of the mask must be capable of withstanding a pulling force of the order of 30 pounds per inch of width, with a sufficient safety margin. Uncoated steel jaws may be used, in which case clamping forces of several hundred pounds are needed for clamps about one inch wide; elastomeric coatings greatly reduce this requirement but may introduce an element of wear. Hydraulic drives are well adapted to produce the large static force required upon closure. The jaws are preferably held open by relatively weak springs when hydraulic pressure is not applied. During normal operation of machine 450, jaw pressure is applied or released in all clamps at the same time, so that only a single valve is required to apply or remove hydraulic pressure.

FIG. 12 is a schematic representation of the multiple feedback loops above described. Position error signals from position-sensing apertures 47 and quadrant detector light sensors 89 are analog signals; they are converted to digital signals in analog/digital converter 121 and are then sent to computer 122. The computer, having the appropriate matrix coefficients stored in its memory 123, calculates the forces to be generated by stepping motors 124 and, based on the known constants of springs 125 and of the force distribution system 126 which transmits the force generated by each motor to several clamps 44, computes the number of steps by which each motor should be advanced or retarded. It also generates the appropriate number and type (forward or backward) of pulses. These pulses are amplified in power amplifiers 127 and applied to the motors 124 which are equipped with reduction gears 128.

The computer also controls the opening and closing of hydraulic valve 129 which applies hydraulic pressure to clamps 44, forcing the jaws to close when the mask is to be clamped and allowing them to open when the mask is to be released.

The arrangement described in connection with FIG. 12 lends itself to the process of bringing the mask into registration with a predetermined standard pattern. FIGS. 13a-13f illustrate an environment in which this arrangement is used to manufacture mask-panel assemblies for flat tension mask color cathode ray tubes. It is to be understood that the machine 130 depicted in FIGS. 13a-13f comprises, or operates in connection with, the elements of FIG. 12.

The most important element of machine 130 is a rugged frame 131. One side of this frame is depicted in vertical section in FIG. 13a, and a view of the entire inside portion of the frame as seen from below is depicted in FIG. 13b. The top of the frame is a flat machined surface 132 on which clamps 44 can slide. The frame forms a window-like opening, somewhat smaller (for example, by one inch about both x and y) than the mask in its original, uncut form.

Four indexing stops 133a, 133b, 133c and 133d are shown as being attached to the inside of the frame. The stops 133a and 133b, placed symmetrically along a common edge, carry half balls 222a, 222b, as well as vertical stops 220a, 220b. The half-ball 222c is positioned around the corner from 222b, but the third vertical stop 220c is in the center of the edge opposite the 133a and 133b stops.

These six indexing elements, together with means (not shown) for pushing a panel upward and sideways to maintain contact at all six points, constitute a form of the six-point universal holding fixture 30 previously described.

A bottom plate 91, seen in section in FIGS. 13c and 13d, can also be pushed against the same indexing elements. It is large enough to nearly fill the window in frame 131, leaving just a narrow slit all around. It has four cut-out portions 138 to accommodate the six indexing elements, so that bottom plate 91 can be precisely seated. When plate 91 is so seated, its flat top surface 139 is horizontal, parallel to the machined top surface 132 of the frame 131, and coplanar with the top surface of the lower jaws of clamps 44 which rest on surface 132.

There is also a top plate 141 with a flat horizontal bottom surface 142 which can be brought down from above to set itself against the top surface 139 of bottom plate 91. Both bottom and top plates are equipped with optical devices to be described later.

Instead of the top plate, the welding head 143 of a high-powered laser (see FIG. 13f) may be brought down to where its focal point lies in a plane just above the machined top surface 139 of bottom plate 91.

In the starting condition of machine 130 shown in FIG. 13c, bottom plate 91 is seated against the six indexing elements. Two retractable locating pins (not shown) protrude from top surface 139. Clamps 44 are retracted. A mask 4A is now placed on surface 139, with appropriate pre-etched apertures to fit the two locating pins.

Next, top plate 141 is lowered until it seats itself against mask 4A. The two protruding locating pins slip into clearance holes (not shown) in the top plate. Clamps 44 are advanced until they overlap the mask enough to allow clamping; they are then closed (FIG. 13d). Thereupon, the top plate is lifted by a small amount to free the mask, and the two locating pins are retracted.

Corresponding to every position-sensing aperture 47 in the mask (not shown in FIGS. 13a-13f), there is a cylindrical hole 144 in the top and bottom plates. Top plate 141 carries a lamp 145 in a small housing 146 over hole 144. Bottom plate 91, which remains in contact with the mask, carries an optical system 147 consisting of a quadrant detector light sensor 89 at the end of a tube 148, and a lens 149, which serves to focus an image of the mask position-sensing aperture 47 upon the quadrant detector light sensor 89. The optical system 147 attached to the bottom of the bottom plate 91 is designed to allow small lateral mechanical adjustments so as to set its position with great accuracy.

Returning now to the operating sequence of machine 130, the feedback system for positioning, stretching and shaping the mask is energized next. Preferably this is done gradually, so as to avoid undesirable mechanical transients. Once all positioning errors are within tolerance, the clamp positions are frozen; for example, if stepping motors are used to pull the clamps, these motors are electrically locked in position.

Top and bottom plates 141 and 91 are then both withdrawn and moved out of the way (see FIG. 13e). A screened panel 2B is inserted into the machine and lifted up against the mask 4A until it is seated against the six indexing elements. At this point, the ground top surface of mask support structure 3A touches the underside of the stretched mask and, preferably, lifts it a few thousandths of an inch. Welding head 143 is now lowered (FIG. 13f) and the mask is welded to the support structure. While other ways are available, this may be done in accordance with copending application Ser. No. 058,095 filed Jun. 4, 1987, now U.S. Pat. No. 4,828,526 assigned to the assignee of this invention.

Next, the peripheral portion of the mask is cut off, preferably using the same laser, and the welding head 143 is lifted and moved out of the way. The clamps 44 are opened and retracted, leaving the cut-off peripheral portion of the mask to be discarded. Finally the completed assembly of panel 2B, and mask 4A--the latter now welded to mask support structure 3A--is lowered and removed from the machine. The two locating pins are once again extended, and the machine is ready for another cycle.

The process described in the preceding part of this specification is based on the assumption that when faceplate 2A is pressed against half-balls 22a, 22b and 22c, and the vertical stops 20a, 20b and 20c, the screen pattern is located precisely where it should be. But in practice, there are sometimes departures from the ideal situation. These departures fall into two categories:

(1) The entire screen pattern may be translated and/or rotated with respect to its nominal position, as indicated in FIG. 14a; note that there is no change in the geometry (i.e., size and shape) of the pattern;

(2) The screen pattern geometry may be distorted. The pattern may, for example, be stretched or narrowed in one or both dimensions, as indicated in FIG. 14b. Screen distortion may also occur in combination with pattern translation and/or rotation.

A certain measure of departure from the ideal must be expected in any production process. However, in this case, opportunities exist for eliminating or at least reducing the effect of such departures. These opportunities will now be reviewed.

ADJUSTING FACEPLATE POSITION TO CORRECT FOR TRANSLATION AND/OR ROTATION OF THE SCREEN PATTERN

If the screen is applied to the faceplate by offset printing or a similar process, it is probable that the predominant error will be a positioning error along one axis, i.e., x or y, caused by imperfect indexing of the translatory motion of the faceplate with the rotary motion of the printing cylinder. Other position errors resulting from a lateral displacement or slight rotation of the faceplate with respect to its nominal position in the printing press are also possible. On the other hand, there may be no significant distortion of the screen pattern geometry, so that repositioning the faceplate in the assembly machine would be all that is required.

Conceptually, the simplest approach is to follow the assembly procedure previously described in connection with FIG. 13, but to correct for any positioning errors of the screen pattern, i.e., translation or rotation with respect to its standard position, by adjusting the position of the panel before inserting it into the assembly machine, or at least before the mask is welded to support structure 3A. Methods for doing so are described in the following.

One method employs a modified form of the universal holding fixture 30 previously described in connection with FIG. 2. The modified fixture 400 is shown in FIG. 15 and defines a receptacle for receiving a faceplate (front panel). The fixed half-balls 22a, 22b and 22c of FIG. 2 are replaced in fixture 400 by adjustable half-balls 401a, 401b and 401c. Each of these half-balls is shown as being mounted at the end of a micrometer screw 402 which may be rotated by an individual stepping motor 404 through worm gears 406. By selectively adjusting the positions of the three half-balls, a contained faceplate may be moved with respect to fixture plate 416 so as to bring the screen pattern into a predetermined position with reference to the fixture plate.

The procedure based on this approach is to load a faceplate into holding fixture 400, insert the loaded fixture into a screen-inspection machine (to be described in connection with FIG. 16), have that machine adjust the three half-ball settings so that the screen is correctly positioned, and then insert the loaded fixture into the assembly machine where the mask is positioned and stretched to conform to a standard pattern in position and geometry; the mask is then welded to the support structure. This assembly machine is essentially the same as the one depicted by FIGS. 13a-13f, except for such modifications as are required to accept and precisely locate fixture plate 416 instead of a faceplate.

To ensure stable and precise seating of each faceplate within fixture 400, the fixture comprises vertical stops 408a, 408b and 408c, and three leaf springs 410 to press the plate against the vertical stops. Leaf springs 410 may be rotated about pivots 412 to permit insertion of the faceplate 413 from below through rectangular opening 414 on the fixture plate 416. To ensure that the faceplate makes contact with all three half-balls, O-shaped leaf spring 418, mounted on post 420, presses against one corner.

In operation, a faceplate is loaded into fixture 400, locked in place by rotating leaf springs 410 to the position shown, and the fixture is inserted into screen inspection machine 430 depicted in FIG. 16. Grille position errors dx and dy are measured at a number of points. From the measured data, required adjustments of the three micrometer screws 402 are computed, and appropriate pulses transmitted to the three stepping motors 404. Inspection of any residual positioning errors remaining after this first adjustment may call for further adjustments; a feedback or servo loop exists here, permitting very precise adjustment of the faceplate position. This loop is indicated in FIG. 16, which shows schematically a screen inspection machine 430 designed to accept fixture 400 shown by FIG. 15, a computer 432 to convert position error signals 434 from sensor 431 (which may comprise a video camera) to stepping motor pulses 440, a connector 438 to connect the computer output to the three stepping motors 404, and micrometer screws 402 to adjust the position of the faceplate. As previously explained, the adjusted fixture is then mated to a mask in an assembly machine generally constructed as shown in FIGS. 13a-13f, except that this machine is equipped to handle fixture plate 416 rather than the faceplate.

FIG. 17 shows one version of a screen-inspection machine in detail. This version can be used if, at the time of inspection, no aluminum film has been applied to the screen, or if the points to be measured, typically on the periphery of the viewing area, were masked off during application of the film, so that they remain unobscured. Faceplate 2B carrying grille 3 is locked in holding fixture 400 which in turn is inserted into inspection machine 430, lifted by table 362 and pressed upward against vertical stops 358 as well as laterally against half-balls 360, both mounted on brackets 359 (only one bracket is shown). Light sources 364 mounted on the lower face of table 362 illuminate small selected regions at the periphery of the grille through holes 366 in the table 362 and rectangular opening 414 in fixture plate 416. Video-camera-equipped microscopes 431, firmly attached to the frame 370 of machine 430, develop patterns corresponding to the grille configuration in the small selected region.

FIG. 18a shows, greatly magnified, the pattern representing one corner of the grille as seen by the video camera. In FIG. 18a, one horizontal scanning line 367 is marked; the corresponding output signal is shown in FIG. 18b. Other horizontal scanning lines will produce wider or narrower pulses, depending on where they cross the grille apertures. From the start and stop time of each pulse, the horizontal coordinates x of the hole centers can be calculated, and by using many scanning lines, readings can be averaged to reduce errors. Similarly, the vertical scan produces the sharp-edged pulses shown in FIG. 18c, thus providing information regarding the vertical coordinates y of the grille holes.

Computer 432 (FIG. 17) accepts this information, calculates the required adjustments of the three micrometer screws 402, and generates the appropriate pulses to stepping motors 404, as previously explained. This cycle may be repeated until residual errors are reduced below a predetermined tolerance level.

A different version of the screen inspection machine 430 shown by FIG. 17 must be used if the screen is fully aluminized at the time of inspection, so that even the peripheral portions of the grille are obscured. It then becomes necessary to inspect the grille from the outside, i.e., through the faceplate. For this purpose, fixture 400 shown by FIG. 15 may be inverted before insertion into machine 430; light sources 364, shown in FIG. 17, are replaced by light sources placed near video cameras 431. Video cameras 431 observe the grille through the full thickness of the faceplate 416. Faceplate thickness may vary, and the focus of the video cameras 431 must be adjusted to compensate for such variations. This may be done by a conventional automatic focusing system, or by a mechanism designed to sense the screen surface and arranged to respond to an increment S in faceplate thickness by retracting the cameras 431 by S(n-1)/n, where n is the refractive index of the faceplate glass.

Another method for correcting for screen pattern position errors avoids the use of a special holding fixture; the faceplate is directly inserted into the screen inspection machine depicted in FIG. 19. It will be noted that most of the important features of this machine 530, i.e., vertical stops 558 and half-balls 560, table 562, light source 564, hole 566, and video camera 531, have their counterparts in FIG. 17. The significant difference is the absence of holding fixture 400 and of the adjustable stops with their micrometer screws 402 and stepping motors 404. In addition, stops 558 and half-balls 560 are designed to accept the faceplate rather than the larger fixture plate 416.

Screen positioning errors are measured in machine 530 just as previously described in connection with machine 430 (FIG. 17), and micrometer adjustments required to correct for these errors are computed. However, in this case, no feedback loop exists; instead, the correction information is stored in the computer for later transfer to the assembly machine.

The assembly machine is a form of the machine shown by FIGS. 13a-13f. The modification consists in the fact that half-balls 222 have been made adjustable, as shown in the detail view, FIG. 20 (this figure should be compared with FIG. 13f). Half-balls 380 (only one is shown), are mounted on micrometer screws 382 which may be adjusted by stepping motor 384 through gears 386 and 388.

Before inserting a faceplate into the modified assembly machine indicated in FIGS. 13a-13f, as modified in FIG. 20, the stored correction data for that faceplate are transmitted to stepping motors 384. Thus, when that faceplate is inserted into the assembly machine, the screen is in the correct position. A mask positioned and stretched to conform to a standard position and geometry is therefore joined to this faceplate without any further measurements, and registry of apertures and screen patterns result.

The use of a separate machine dedicated to screen inspection makes it possible to attach the position sensors--for example, video cameras 431 or 531--rigidly to frame 370 or 570 of that machine (see respective FIGS. 17 and 19), thus ensuring good reproducibility of the measurements. The faceplate or holding fixture can be inserted and removed without having to move the sensors out of the way.

It is, however, also possible to inspect the screen in an assembly machine. This alternative eliminates the need for a separate screen inspection machine and the associated extra handling of the faceplate, at the price of greater complexity and a slower working cycle for the assembly machine, brought about by the additional operations which must now be performed in that machine.

An example of such a machine is illustrated in FIG. 21. This figure shows an assembly machine which comprises the basic features of the machine depicted FIGS. 13a-13f, modified to include adjustable half-balls 380 as shown in FIGS. 21a and 21b for adjusting the position of the faceplate, and further modified to include optical sensors for observing not only the mask but also the grille.

FIGS. 21a and 21b depict two similar gate-like structures 320a and 320b mounted above and below baseplate 321 of assembly machine 318, which, as noted, is generally analogous to the machine depicted in FIGS. 13a-13f. Structures 320a and 320b consist of crossbars 322a and 322b which are supported by columns 324a and 324b fastened to baseplate 321. A faceplate 330 with support structure 332 is shown inserted into the machine, and a mask 333 is under tension by virture of the forces exerted by pull-rods 334 upon clamps 356.

Cross bars 322a and 322b are equipped with extensions 336 which carry precision bearings 338. A cylindrical shaft 340 is free to rotate within these bearings. Two optical devices 342 and 344 are firmly mounted on this shaft by means of bars 346 and 348 and outriggers 350 and 352. They can be swung out of the way for the purpose of mask and faceplate insertion, welding and removal, or they may be moved into the position illustrated, where bar 348 contacts half-ball 354 which is attached to one of the columns 324b.

Each of the optical devices 342 and 344 comprise a light source and an optical sensor. For example, device 342 may contain means for projecting a convergent hollow cone of light through the mask toward the aluminized inside surface of the screen so as to form a brightly illuminated spot on the inside of the mask after reflection by the film. The optical sensor in device 342 may be composed of a combination of focusing lens and quadrant detector similar to elements 149 and 89 of FIG. 13d, for the purpose of measuring position errors in x and y of a predetermined mask aperture, and for developing error signals related to such position errors.

Optical device 344, on the other hand, has the task of measuring position errors in x and y of the grille at a predetermined location. It is assumed here that the grille at this location is obscured by the aluminum film, hence back-lighting may not be practical. Device 344, therefore, may contain means for illuminating a portion of the screen from the front, as well as a sensor, which may be a quadrant detector equipped with a focusing lens, but which preferably is a microscope with a video camera. As previously explained, the optical sensor in device 344 must be designed to compensate for variations in faceplate thickness, either by being equipped with an automatic focusing system, or by means of a mechanism designed to sense the screen surface.

The operation of assembly machine 318 is analogous to the procedure described previously in connection with the separate screen inspection machine (FIGS. 17 and 19): grille position information from the sensors of optical devices 344 (equivalent to sensor 431 in FIG. 16) is fed to a computer (equivalent to computer 432 in FIG. 16) which calculates the required corrections of the three half-balls (380 in FIG. 21) and supplies appropriate pulses to stepping motors 384 so as to adjust micrometer screws 382 through gears 386 and 388. This is a closed feedback loop, analogous to the one shown in FIG. 16; repeating the cycle causes the error in screen position to be reduced below a predetermined tolerance level.

Quite independently of the adjustment of the faceplate position just described, mask 333 is monitored by the sensors of optical device 342 and stretched, as well as positioned, by clamps 356 driven by servo motors (not shown) through pull rods 334, in the manner previously explained, until the mask conforms to an established standard position and geometry. As soon as faceplate and mask adjustments have been completed, optical devices 342 and 344 are swung out of the way; the mask is then welded to support structure 332, the excess material cut, and the assembly removed from the machine in the manner described in connection with FIGS. 13a-13f.

ADJUSTING MASK POSITION TO CORRECT FOR TRANSLATION AND/OR ROTATION OF THE SCREEN PATTERN

In the preceding part of this specification, methods were outlined for determining the departure of the grille (screen) from its nominal position, and for using this information to move the faceplate so that before the mask is welded to its support structure in the assembly machine, the grille is in its nominal position. There exists, however, an alternative way of using that same information. It is best illustrated by an example.

Let it be assumed that the screen is inspected in the machine shown in FIG. 19, and that the sensors find the grille displaced to the right by three mils, and upward by one mil, with 0.2 milliradians of clockwise rotational error. Following the procedures previously described, the micrometer screws in fixture 400 (FIG. 15), or in the assembly machine (FIGS. 20 or 21a-21b) would have been adjusted to move the faceplate three mils to the left and one mil down and rotating it counter-clockwise by 0.2 milliradians in order to bring the grille into its nominal position. But the same final result would have been obtained without making any mechanical adjustments to the faceplate, by moving the properly stretched mask three mils to the right and one mil up from its nominal position and rotate it clockwise by 0.2 milliradians. This can be done, for example, by first permitting the mask-stretching servo motors to position and stretch the mask to conform to the predetermined standard position and geometry, then disabling the servo loops and supplying appropriate input signals to the motors to displace the mask in an open-loop mode as required, without changing its size, shape or tension, i.e., while maintaining its geometry.

Another possibility lies in mounting all servo motors on a rigid carrier which is capable of being displaced as a whole, and applying the position correction to that carrier. This is illustrated in FIG. 25 which shows an assembly machine 600 including a frame 602, three half-balls 604 (only one of which is shown), and three vertical stops 606 (only two of which are shown) for locating faceplate 608, and a vertically movable table 609 for pressing the faceplate against the vertical stops. Frame 602 has plane top surfaces 610 which support frame-shaped carrier 612 through steel balls 614. Stepping motors 616 for stretching mask 618 through pull rods 620 and clamps 622 are all supported on the top surface of carrier 612.

The height of carrier 612 above the plane top surfaces 610 of frame 602 is precisely controlled by the steel balls. Its horizontal position may be adjusted by three micrometer screws 624 (only one is shown) which are controlled by stepping motors 626 through reduction gears 627 and 628. Only one stepping motor is shown, but three are required to uniquely define the horizontal position of the carrier; a compressed spring 630, shown schematically, ensures continuous contact between the tips of the three micrometer screws 624 and carrier 612.

To simplify the drawing, FIG. 25 shows no optical devices. Also, the horizontal dimension of the mask is shown reduced so that both sides of carrier 612 can be illustrated.

It is also possible to use the information from the screen inspection machine to bias the feedback loops which control the mask servo motors. This approach is illustrated in FIG. 22 for the case of analog signals. It is essential that both error signals are linear functions of the positioning errors, and that a given voltage corresponds to the same error for both sources (mask and grille). It will be obvious that a digital version of this circuit is also possible. In any case, the servo motors will move until the difference signal Xm-Xg, or Ym-Yg, is reduced to zero.

The three approaches just outlined have in common the principle that the mask is moved from its standard position to make up for a displacement of the grille. In all three cases, the mask is stretched to conform to a standard position and geometry and is also displaced. In the first and second approach, these two operations are carried out separately; in the third approach, they are merged. In all three cases, the instructions for the additional displacement come from a separate screen inspection machine, and there is no need for moving or looking at the faceplate in the assembly machine. Therefore, the assembly machine can take the simple form illustrated in FIGS. 13a-13f except for the addition of a laterally movable carrier for mounting the servo motors in the case of the second approach.

The methods described up to this point are all based on the assumption that the grille (screen) may be displaced from its nominal position, but that it has the correct size and shape, so that a mask stretched to conform to the standard geometry will always fit the grille, provided only that any relative displacements are corrected.

ADJUSTING MASK SHAPE TO A PARTICULAR SCREEN

The possibility of screen patterns being too large or too small, or having distortions such as indicated in FIG. 14b, cannot be ruled out. It is in the nature of the stretchable mask that it can compensate for small departures from the correct size and shape of the grille pattern. But to take advantage of this characteristic, the principle of stretching the mask to conform to a predetermined standard position and geometry must be replaced by the idea of stretching it to conform to an individual grille. When a screen inspection machine measures more than two points (for example, the four corners) on a displaced but undistorted grille, certain geometrical relationships exist between the measured data. For example, the horizontal displacements of the two upper corners are the same. Three independent measurements (for example, the vertical displacement of each upper corner and their common horizontal displacement) suffice to specify translation of the upper edge in x and y, as well as rotation. Measuring x and y displacements of all four corners provides welcome redundancy, which permits more accurate computation of the translational components of a chosen point (e.g., the center of the rectangle) as well as the rotation, using simple algorithms.

If the screen is not only displaced but also distorted, these algorithms can still be used to compute the translational and rotational components for the purpose of moving the faceplate or the mask to achieve compensation; but of course, such compensation will not be perfect because the distortion component is still present.

On the other hand, the last approach outlined in the preceding section, where the feedback loops are biased in accordance with grille position error signals derived from the screen inspection machine, will automatically cause the mask to depart from the standard geometry and to be stretched so as to at least partly compensate for screen distortion. Suppose, for example, that the grille is distorted as indicated in FIG. 14b, i.e., too long in the horizontal direction; then the horizontal displacements of the two upper corners will not be alike, the right top corner yielding a larger positive (or smaller negative) value of Xg than the left top corner. The two bias voltages (or digital bias signals) supplied to the left and right servo motors will therefore be different, causing the motors to come to rest in positions which stretch the mask more than the usual amount to compensate for the excess length of the grille.

The procedure just described represents an intermediate step between stretching the mask to conform to a standard position and geometry, and stretching it to conform to an individual grille: The mask is stretched to conform to the standard, but grille information is fed into the feedback loops to correct for the particular grille. This seems a roundabout approach, and it raises the question to what extent a standard is really needed in this embodiment.

FIG. 23 shows an assembly machine which is a simplified version of the machine shown in FIGS. 21a and 21b: the adjustable half-balls 321 included in FIGS. 21a and 21b are replaced by fixed half-balls. In the design of the upper sensors of optical device 342, which measure mask position errors with reference to a mask standard, and lower sensors of optical device 344, which measure grille position errors with reference to a grille standard, care is taken to make sure that equal position errors produce equal error voltages (or equal digital signals) from both sets of sensors. The sensor outputs are then connected into the difference-forming circuit of FIG. 22, and the outputs from this circuit are used to control the mask servo motors. When the servos come to rest, the mask fits the grille--distorted or undistorted--as well as is possible within the mechanical limitations of the system.

The common mounting of a pair of sensors (342 and 344) on a rigid shaft 340 is advantageous because the output signal from the difference-forming circuit (FIG. 22) is not sensitive to simultaneous displacement of both sensors by equal amounts.

FIGS. 24a and 21b indicate a more direct approach to developing error signals which indicate directly differences between mask and grille, by measuring the positions of selected points in the mask directly with reference to corresponding points on an individual grille. The arrangement of FIGS. 24a-24c modifies the assembly machine of FIGS. 13a-13f. No mask or grille standard is used. Specifically, FIGS. 24a and 24b indicate a point-like light source 302, preferably a gallium arsenide diode laser, illuminating two round apertures 304 (shown greatly magnified in FIG. 24c) in the peripheral region of the mask near support structure 3A outside the viewing area. Light passing through the two apertures strikes the black grille 306. The grille has a rectangular window 308 so positioned that when screen and mask are properly aligned, one-half the light passing through each of the two mask apertures 304 will also pass through the window. FIG. 24c illustrates the case where the screen, and thus window 308, is displaced to the left; as a consequence, more light from the left aperture than from the right now passes through the window. A balanced photodetector 310, consisting of two separate photodetectors connected in push-pull, is placed below the faceplate to develop an electrical output indicative of the unbalance, thus producing a position error signal. No difference-forming circuit of the type shown in FIG. 22 is needed here, since a difference signal is produced directly by the optical arrangement shown in FIGS. 24a and 24b.

The size of apertures 304 of window 308 depends on the magnitude of the expected initial screen-positioning errors of the mask relative to the grille. Space along the edge of the viewing area is at a premium; therefore, the apertures and window should not be made larger than necessary. A lower limit for the aperture size is set by the appearance of diffraction effects which tend to blur the shadow of the aperture edge on the grille.

If there is not enough space available between the viewing area and support structure 3A, apertures 304 and window 308 may be placed outside the support structure, as shown in FIG. 24b. The mode of operation is the same as that discussed in connection with FIG. 24a.

FIGS. 24a and 24b show the beam of light from source 302 striking apertures 304 under an angle .alpha.. It is preferred to make this angle, or at least its projection on a plane which contains the light source as well as the centers of apertures 304, substantially equal to the corresponding angle formed by the incident electron beams in the completed tube. This has the advantage that errors in the height of support structure 3A are compensated for; for example, if the support structure is too low, the shadow of apertures 304 will move to the right as shown in FIG. 24c and produce an error signal which calls for additional stretching of the mask.

The assembly procedure is analogous to that described in connection with FIGS. 13a-13f with the following changes: In the step depicted FIG. 13c, a plain bottom plate is substituted for the optics-equipped plate 91, simply to support the mask before it is clamped. After clamping, the bottom plate is withdrawn, a faceplate is inserted as in FIG. 13f; the optical components (which had to be moved out of the way to insert mask and faceplate) are put in their proper positions and the servo circuits are turned on. All mask positioning and stretching is done with reference to the grille; the clamp motors are controlled by the signals derived from balanced photodetectors 310, either individually (one motor--one photodetector), or preferably, collectively through the matrixing process described in connection with FIG. 12.

It was mentioned earlier that simple algorithms exist for extracting the translational and rotational components from measured displacements at selected points. This applies whether the displacements refer to mask vs. standard, grille vs. standard, or mask vs. grille. In all cases, the translational and rotational components may be compensated for by displacing the mask, the grille, or both. More specifically, the mask may be moved entirely by activating the clamping motors, or by mounting these motors on a carrier capable of translation and rotation in the x-y plane for mask position adjustments. The grille may be moved by the micrometer screws illustrated in several embodiments, or by other means capable of translating and rotating the faceplate in the x-y plane. These operations may be carried out in a closed-loop or open-loop mode. Selection of a particular combination is a matter of design choice.

In the foregoing, it has been shown how a mask may be positioned and stretched so that its pattern attains a desired relation to a screen. The above discussion includes:

I. Stretching and positioning the mask, and positioning the screen, to conform to a common standard.

A. If the screen is known to be undistorted (that is, to have a "standard" geometry) and correctly positioned on the panel, by positioning and stretching the mask to conform to the predetermined standard mask position and geometry;

B. If the screen is known to be undistorted but not necessarily correctly positioned on the panel, by

1. providing an adjustable fixture (FIG. 15) for handling the panel which is independent of the assembly machine, inspecting screen position in a separate screen inspection machine (FIG. 17) and, through feedback (FIG. 16), adjusting the fixture, or 2. providing adjustment capability in the assembly machine (FIG. 20), with the information required to make the adjustment derived a. from a separate screen inspection machine (FIG. 19), or b. from screen inspection performed in the assembly machine itself (FIGS. 21a and 21b).

In all these cases, the panel is moved to correct for screen position errors, and the mask is positioned and stretched to conform to a standard position and geometry.

II. Conforming the mask to the screen

Another class of solutions shares the common feature that the mask is positioned and stretched--not to conform to a standard, but rather so as to reduce the differences between corresponding points on a particular mask and screen to a minimum (FIG. 22). This may be done by

A. Inspecting the screen in a separate machine (FIG. 19) to measure screen departures (Xg) from a standard position and geometry; in the assembly machine, measure mask departures (Xm) from the standard position and geometry; move and stretch mask to minimize Xm-Xg (FIG. 22).

B. Inspecting mask and screen simultaneously in an assembly machine; reduce difference between corresponding points to the minimum. This may be accomplished:

1. Separate optical systems may be employed to measure mask and screen position (FIGS. 23a and 23b), with the difference formed electronically (FIG. 22), or 2. A single optical system joining mask and screen may be used, with the difference formed optically (FIG. 24). No standard reference is used.

A number of approaches for eliminating or alleviating the effect of screen errors have been described. It will be understood that these alternatives are comprised of individual steps which permit other combinations in addition to those described.

The possibility of positioning and stretching any production mask to make it conform to an individual pattern, such as a particular distorted grille (screen), also provides an opportunity to compensate, according to the present invention, for another parameter which may vary in manufacturing--the height Q of support structure 3A (see, for example, FIG. 13f).

In the description of FIG. 3, it was pointed out that in high-resolution tubes the Q-height of support structure 3A, measured from the inner surface 8A of panel 2A to the machine-ground top surface of the support structure, must be held to a very close tolerance. A modification of FIG. 3 depicted in FIG. 4 accommodates a wider tolerance but can only be used if the screen (or at least its most critical portion, the grille) is made by a photolithographic process.

According to this invention, the very close tolerance on the height of support structure 3A which must be maintained if the screen is produced by another method such as, for example, offset printing, can be greatly relieved by a procedure comprising the following steps: (1) measuring the height of the support structure, preferably at several points; (2) computing corrections in the mask geometry and position required to compensate for the departures of the measured height from the nominal Q-height; (3) applying these corrections to the positions which selected points on the mask periphery would occupy if the support structure had the correct Q-height and the mask were stretched to conform to the particular screen as previously described; and (4), positioning and stretching the mask so that the selected points attain the corrected positions.

FIG. 26a explains the reasoning behind this procedure. It shows schematically, in side view, a faceplate 2A carrying on both sides support structures 3A, shown in solid lines. Welded to these support structures is a mask 4A, also shown solid. Support structures 3A are of equal but incorrect height; support structures of the correct height, substantially lower than structures 3A, are shown in dash lines and designated 3A.sub.o. The correct mask position is shown by a dash line designated 4A.sub.o.

Two electron beam trajectories are also illustrated. Electron beam e strikes the screen at a point S; before doing so, it passes through mask 4A at a point P. Had support structures 3A been of the correct height, then the mask would have been in the dashed position 4A.sub.o, and the point of intercept for electron beam e would have been at P.sub.o.

It is evident from FIG. 26a that mask 4A must be stretched less than would have been necessary had the height of support structures 3A been correct. Because these structures are too high, point P.sub.o on the mask must be allowed to move inward to position P, the displacement D.sub.x representing the difference between the x-coordinates of P and P.sub.o. Similar considerations hold for the displacement on the right side of the mask. Since the two displacements are of opposite polarity, a reduction of tension is required but there is no need to reposition the mask.

It must be kept in mind that the side view of FIG. 26a shows displacements about only one horizontal axis, here designated by x. A side view showing the y-axis would look quite similar to FIG. 26a, except that the displacements D.sub.y and -D.sub.y would be of different magnitude if the faceplate is rectangular rather than square. FIG. 26b shows the outline of the apertured area of the mask in plan view. The dashed rectangle denotes the nominal or correct position, while the solid rectangle indicates the position required to correct for the excessive height of the support structure. It is evident that mask tension must be relaxed by equal percentages along the x and y axes to achieve correction.

The real displacements D of points located, for example, near the corners of a rectangular mask are the orthogonal sum of the displacements along x and y, or ##EQU1##

A useful relationship is: ##EQU2## where Q and Q.sub.o are the actual and the nominal support structure height respectively and .phi..sub.x, .phi..sub.y are the angles between the z-direction (vertical in FIG. 26a) and the projection of the electron beam trajectory e upon the x-z or y-z plane, respectively.

In a practical high-resolution tube, .phi. is of the order of 45.degree. at the corners of the screen, hence tan .phi. is about unity and D equals the error in Q. With an aspect ratio of 3:4, D.sub.x =0.8 mils and D.sub.y =0.6 mils at the corners for a 1 mil error in Q. These displacements represent less than 10% of the displacement typically produced by stretching the mask to its nominal tension. Thus it can be seen that moderate Q-errors can easily be compensated for.

Up to this point it has been assumed that the support structure height Q is the same at all points supporting the mask, even though that height may depart from the nominal value Q.sub.o. Under these conditions, the procedure just described provides perfect compensation so long as upper and lower tension limits are not exceeded. The question arises to what extent variations of Q within a given support structure may also be accommodated.

FIG. 27a illustrates, again in side view,, a situation where Q.sub.L (on the left) is larger than the correct value Q.sub.o while Q.sub.R (on the right) is smaller by the same amount. As the figure shows, the displacements D.sub.L and D.sub.R required to compensate for the error in the x-components of P.sub.L and P.sub.R now point in the same direction. Correction of these components could therefore be achieved by simply moving the mask to the right, without any change in tension. Such repositioning would, however, introduce an error in the center where there was none before, opposite and equal to the original error at the left and right edges which it was intended to correct.

Both co-ordinates x and y are shown in FIG. 27b, where the dashed-line rectangle represents the apertured area of the mask in its nominal position, mounted on supports of correct height Q.sub.o and under uniform tension; the vertical centerline is also shown. The solid-line trapezoid shows the outline of the apertured area after the position corrections have been applied. Just as in the previous example shown in FIG. 26b, such corrections must be made in both x and y. However, in this case the y-corrections present a new problem: Because the left support structure is too high, the left edge of the mask must not only be moved toward the right, but must also be allowed to contract along y as shown in FIG. 27b in order to maintain vertical registration. Similarly, because the right support structure is too low, the right edge must not only be moved to the right but must also be stretched in the y-direction. Thus tension is higher than before on the right and lower than before on the left, causing the mask to distort. The centerline becomes curved as shown and produces a misalignment in the central region C which is even larger than the original error at the left and right edges.

To minimize this error, it is preferred to correct for no more than one-half (e.g., about 40%) of the tilt-related error component. This compromise produces opposite, approximately equal residual errors E at the edges and in the center, as shown in FIG. 27c. To reduce the curvature of the centerline, the y-component of the error may also be undercorrected.

In a color tube using an aperture mask, discoloration is the first indication of a registration error between mask and screen; this defect appears rather suddenly when the registration error exceeds a certain threshold. Therefore, reducing the maximum error by 40 percent can be highly useful.

The above-described compromise may be further improved by the use of tangential forces applied to the mid-portion of the mask. An arrangement for applying such forces was shown in FIG. 8b. Referring again to FIG. 27b, it appears that if displacements toward the right could be applied to the mask near its left and right edges while locking mid-portions M in place, even better compensation could be achieved.

However, external forces can only be applied to the edges. In the example shown in FIG. 8b, this limitation presents only a minor problem because the slot mask illustrated in that figure exhibits much less stiffness in the direction perpendicular to the slots than parallel to them, so that when tangential forces are applied as shown, the desired displacement occurs not just near the edges but also near the center of the mask, with the slots remaining substantially straight.

A tension mask with round apertures, having approximately equal stiffness in all directions, behaves quite differently. FIGS. 28a and 28b illustrate qualitatively the type of distortion which occurs in such a mask when the indicated displacements are applied to the edges. In both figures, the displacement of the left and right edges is the same as in FIG. 27b. The only difference between the three figures is the displacement at the midpoints M of the two horizontal edges.

In FIG. 27b, as previously explained, no tangential force is applied at the midpoints, with the result that the entire vertical centerline shifts toward the right.

FIG. 28a, on the other hand, shows the apertured area with the midpoints M locked in their nominal position. This leads to a substantial increase in the unbalance of tension between right and left and, therefore, in the curvature of the centerline. However, the displacement in the central region C is smaller than in FIG. 27b.

In FIG. 28b, the midpoints M are displaced slightly to the left of their nominal position. This causes a further increase in the tension unbalance and in the curvature of the centerline, but the net effect is a compromise: Displacements averaged along the entire centerline are now as small as they can be made, given the unbalance in support structure height which necessitated the initial displacements at the left and right edges.

It should now be evident that the mechanical tolerance on the height of the support structure can be substantially widened and manufacturing cost reduced by making appropriate adjustments to the position of the edges of the mask. To take advantage of the methods described, the actual height of the support structure must be accurately measured at a number of points. Preferably, this is done in the same machine which serves to inspect the screen or grille. FIG. 29 shows a portion of the screen inspection machine 530 previously illustrated in FIG. 19 and described in connection therewith, modified by the addition of precision height gages 580 of which only one is shown. Gage 580 is a mechanical gage of a kind commercially available; it carries a steel block 586 for contacting the top surface of support structure 3A and a feeler pin 588 for contacting the inner surface 8A of the faceplate. Gage 580 can move up and down freely above vertical stop 590. It is constrained to remain in a vertical position by parallel linkage 582 which, through bearings 584, is affixed to frame 570 of the inspection machine. The readings of gage 580 appear on output cable 592 in a digital format suitable for transmission to the computer where they are stored, to be used later in determining the mask displacement corrections previously discussed.

While the use of support structure height gage 580 has been described in connection with the screen inspection machine of FIG. 19, it will be understood that other inspection machines such as those described in connection with FIGS. 17, 21a and 21b, and 23a and 23b also lend themselves to corresponding modifications. In practice, more than one gage would preferably be used; for example, eight gages--two along each side of the rectangular support structure--provide a fairly complete picture of Q-height variations.

Other types of gages, for example optical ones, may be used in place of the mechanical gage illustrated.

Once the support structure height Q has been measured at a number of points, the corrections to be applied to the positions of specific points on the edge of the apertured area can be determined as previously described. The procedure can be divided into three steps which represent successive approximations to perfect correction.

Let x and y be parallel to the sides of the rectangle delineating the apertured area, and z the axis perpendicular thereto. .phi..sub.x and .phi..sub.y, as previously defined, designate the angles between the z-axis and the projection upon the x-z plane and the y-z plane respectively, of the electron beam trajectory which passes through a given point.

To obtain the first order correction, the measured structure height values Q are averaged and the average height Qav is used to determine symmetrical displacements D.sub.x, -D.sub.x and D.sub.y, -D.sub.y all around the mask:

D.sub.x =(Qav-Q.sub.o) tan .phi..sub.x D.sub.y =(Qav-Q.sub.o) tan .phi..sub.y

Here Q.sub.o is the nominal structure height as previously defined.

The second order correction compensates in part for tilt of the mask, produced by asymmetries in the structure height. To determine the tilt along the x-axis, one forms the difference between the average of the Q values measured on the left, designated Qav.sub.L, and the corresponding average on the right, Qav.sub.R. The two displacements in x, analogous to D.sub.L and D.sub.R shown in FIG. 27a, are then

D.sub.x =0.5(Qav.sub.L -Qav.sub.R) tan .phi..sub.x, where .phi..sub.x refers to the left side.

An analogous equation applies to tilt along the y-axis. As explained in connection with FIG. 27b, the actual correction should be made smaller than the displacements just computed in order to minimize misregistration in the central region C. Using the compromise factor of approximately 40% suggested earlier, a preferred value for the constant in the above equation is 0.2 instead of 0.5.

The third order correction, discussed in connection with FIGS. 28a and 28b, involves the application of tangential forces to the midpoints M of at least two edges of the mask. In practice, with a rectangular apertured area, use of such forces is limited to the midpoints of the two longer edges. As discussed previously in connection with FIG. 8c, the mask stretching machine becomes more complex. Use of the third order correction is therefore a matter of engineering judgment. If the correction is to be used, the displacement at the midpoints M should be a fixed fraction, of the order of 10-20%, of the displacement at the two edges, and of opposite polarity. The exact optimum value is a function of the aspect ratio; it approaches zero for very large ratios, i.e. for a very slender rectangle.

For a given design, the nominal structure height Q.sub.o and angles .phi..sub.x and .phi..sub.y at specific selected points remain fixed. It is therefore easy to program a computer to calculate the required corrections from the measured values of actual structure height Q. These corrections may then be added to the screen errors measured during screen inspection, or they may be used in any other desired manner to correct the zero positions indicated by the mask sensors by the computed amount. The objective in all cases is to let the servo motors which control the stretching of the mask come to rest with the periphery of the apertured area in such a shape and position that the best possible compensation is achieved not only for screen errors but also for Q-errors.

While a particular embodiment of the invention has been shown and described, it will be readily apparent to those skilled in the art that changes and modifications may be made in the inventive means and method without departing from the invention in its broader aspects, and therefore, the aim of the appended claims is to cover all such changes and modifications as fall within the true spirit and scope of the invention.

Claims

1. In the manufacture of a tension mask color cathode ray tube, the method comprising:

providing a foil tension mask having a central pattern of apertures;

providing a front panel having a cathodoluminescent screen pattern on a flat inner surface thereof corresponding to said mask pattern, and having a plurality of mask support means having respective mask receiving surfaces for receiving a shadow mask in tension, said mask support means being located on opposed sides of said screen pattern;

determining the Q-height of said mask receiving surfaces relative to said front panel inner surface and developing Q-height error data containing information indicative of Q-height errors of said mask receiving surfaces relative to said panel inner surface;

expanding and positioning said mask such that its aperture pattern is registered with said screen pattern, said expanding and positioning being responsive in part to said Q-height error data such that said registry accounts for said Q-height errors; and

securing said mask to said panel under tension with said mask and screen pattern in registry.

2. In the manufacture of a tension mask color cathode ray tube having a rectangular front panel with a cathodoluminescent screen pattern on a flat inner surface thereof, and having on opposed sides of said screen pattern a plurality of mask support means having respective mask receiving surfaces for receiving a planar shadow mask in tension, a method of making a tube in which the mask support means undesirably have incorrect Q-height, said method comprising:

providing a rectangular foil tension mask having a central pattern of apertures corresponding to said screen pattern;

determining the Q-height of said mask receiving surfaces relative to said front panel inner surface and developing Q-height error data containing information indicative of Q-height errors of said mask receiving surfaces relative to said panel inner surface;

responsive to said Q-height error data, at least partiallty correcting for said Q-height errors while expanding said mask to bring said mask apertures into registry with said screen pattern, and

securing said mask to said panel under tension with said mask and screen patterns in registry.

3. In the manufacture of a tension mask color cathode ray tube having a rectangular front panel with a cathodoluminescent screen pattern on a flat inner surface thereof, and having on opposed sides of said screen pattern a plurality of mask support means having respective mask receiving surfaces for receiving a planar shadow mask in tension, a method of making a tube in which the mask support means undesirably have unequal Q-height which creates a tilt in the plane of a supported mask, the method comprising:

expanding said mask to bring said mask apertures into registry with said screen pattern, including differentially expanding said mask into a slightly trapezoidal shape with the wider end of the trapezoid being aligned with the downhill end of the mask in order to compensate for said unequal Q-height of said mask support means; and

securing said mask to said panel under tension with said mask and screen patterns in registry.

4. In the manufacture of a tension mask color cathode ray tube having a rectangular front panel with a cathodoluminescent screen pattern on a flat inner surface thereof, and having on opposed sides of said screen pattern a plurality of mask support means having respective mask receiving surfaces for receiving a planar shadow mask in tension, a method of making a tube in which the mask support means undesirably have unequal Q-height which creates a tilt in the plane of a supported mask, said method comprising:

providing a rectangular foil tension mask having a central pattern of apertures corresponding to saids screen pattern;

determining the Q-height of said mask receiving surfaces relative to said front panel inner surface and developing Q-height error data containing information indicative of Q-height errors of said mask receiving surfaces relative to said panel inner surface;

responsive to said Q-height error data, expanding said mask to bring said mask apertures into registry with said screen pattern including differentially expanding said mask into a slightly trapezoidal shape with the wider end of the trapezoid being aligned with the downhill end of the mask in order to compensate for said unequal Q-height of said mask support means; and

securing said mask to said panel under tension with said mask and screen patterns in registry.

5. In the manufacture of a tension mask color cathode ray tube, the method comprising:

providing a foil tension mask having a central pattern of apertures;

providing a front panel having a cathodoluminescent screen pattern on a flat inner surface thereof corresponding to said mask pattern, and having a plurality of mask support means having respective mask receiving surfaces for receiving a shadow mask in tension, said mask support means being located on opposed sides of said screen pattern;

determining the Q-height of said mask receiving surfaces relative to said front panel inner surface and developing Q-height error data containing information indicative of Q-height errors of said mask receiving surfaces relative to said panel inner surface;

responsive to said Q-height error data, determining hypothetical positions of selected points on the periphery of an expanded mask which is in optimum overall registry with an associated screen, which positions include compensation for Q-height errors in said mask receiving surfaces;

expanding and positioning said mask such that said selected points on the periphery thereof approximate or attain said hypothetical positions for optimum mask-screen registry; and

securing said mask to said panel under tension with said mask and screen patterns in registry.

6. In the manufacture of a tension mask color cathode ray tube, the method comprising:

providing a foil tension mask having a central pattern of apertures;

providing a transparent flat front panel having a cathodoluminescent screen pattern on an inner surface thereof corresponding to said mask pattern, and having a plurality of mask support means having respective mask receiving surfaces for receiving a shadow mask in tension, said mask support means being located on opposed sides of said screen pattern;

determining the Q-height of said mask receiving surfaces relative to said front panel inner surface and developing Q-height error data containing information indicative of Q-height errors of said mask receiving surfaces relative to said panel inner surface;

responsive to said Q-height error data, determining the hypothetical positions of selected points on the periphery of an expanded mask which represents optimum overall registry between said mask and screen pattern including compensation for Q-height errors in said mask receiving surfaces;

expanding and positioning said mask such that points on the periphery thereof which are above a nominal mask Q-height are positioned inwardly of, and points below said nominal mask Q-height are positioned outwardly of, a nominal position associated with a mask at a uniform height equal to said nominal Q-height; and

securing said mask to said panel under tension with said mask and screen patterns in registry.

7. In the manufacture of a tension mask color cathode ray tube, the method comprising:

providing a foil tension mask having a central pattern of apertures;

providing a transparent flat front panel having a cathodoluminescent screen pattern on an inner surface thereof corresponding to said mask pattern, and having a plurality of mask support means having respective mask receiving surfaces for receiving a shadow mask in tension, said mask support means being located on opposed sides of said screen pattern;

determining the Q-height of said mask receiving surfaces relative to said front panel inner surface and developing Q-height error data containing information indicative of Q-height errors of said mask receiving surfaces relative to said panel inner surface;

responsive to said Q-height error data, differentially tensing said mask at selected points on the periphery thereof in relation to said Q-height errors; and

securing said mask to said panel under tension with said mask and screen patterns in registry.