Claims
- 1. A method for measuring strain, comprising the steps of:
providing a substrate surface coated with at least one coating layer, said coating layer providing both luminescence and photoelasticity; illuminating said coating layer with excitation light, wherein longer wavelength light is emitted having a polarization dependent upon stress or strain in said coating layer; measuring at least one characteristic of said emitted light, and determining strain on said substrate surface from said characteristic.
- 2. The method of claim 1, said coating layer includes at least one luminophore for providing said luminescence.
- 3. The method of claim 2, wherein said luminophore is a polarization preserving material.
- 4. The method of claim 1, wherein said coating layer is polarization generating, wherein said excitation light is non-polarized light.
- 5. The method of claim 1, wherein said excitation light comprises polarized light.
- 6. The method of claim 5, wherein said polarized light comprises elliptically polarized light.
- 7. The method of claim 1, wherein said characteristic comprises at least one selected from the group consisting of the maximum principal strain, the minimum principal strain and the maximum shear strain on said substrate surface.
- 8. The method of claim 1, wherein said characteristic comprises directions of maximum principal strain and the minimum principal strain on said substrate surface.
- 9. The method of claim 1, wherein said coating layer consists of only a single layer.
- 10. The method of claim 1, wherein said at least one coating layer comprises at least two layers, said at least two layers comprising a luminescent layer disposed on said substrate surface and a photoelastic layer disposed on said luminescent layer.
- 11. The method of claim 10, wherein said luminescent layer includes a first luminophore and said photoelastic coating includes a second luminophore, wherein said first and second luminophore provide different emission wavelengths.
- 12. The method of claim 11, wherein an emission wavelength of said first luminophore corresponds to an absorption spectrum of said second luminophore.
- 13. The method of claim 1, further comprising the step of optical filtering to selectively pass said higher wavelength light and reject said excitation light.
- 14. The method of claim 1, further comprising the steps of providing said strain on said substrate surface to an analytical model and updating said analytical model based on differences between said strain on said substrate surface and strain data generated by said analytical model.
- 15. The method of claim 1, wherein said illuminating step comprises a process comprising oblique incidence, said determining step providing individual values for maximum principal strain and minimum principal strain on said substrate exclusively using said method.
- 16. The method of claim 1, further comprising the step of scanning said excitation light across said substrate surface, wherein regions of high strain are identified.
- 17. An apparatus for measuring strain, comprising:
an excitation light source for illuminating a surface of a substrate, said substrate including a coating which provides both luminescence and photoelasticity; a detector for measuring light emitted by said substrate surface responsive to said excitation light, said emitted light being at a longer wavelength and having a polarization modified as compared to said excitation light based upon stress or strain on said coating, and a computer for processing to determine strain on said substrate surface from said emitted light.
- 18. The apparatus of claim 17, wherein said excitation light source provides polarized light.
- 19. The apparatus of claim 17, wherein said computer provides at least one selected from the group consisting of the maximum principal strain, the minimum principal strain and the maximum shear strain on said substrate surface.
- 20. The apparatus of claim 17, wherein said wherein said computer provides directions of maximum principal strain and the minimum principal strain on said substrate surface.
- 21. The apparatus of claim 17, further comprising a linear polarizer or a combination of a quarter wave plate and linear polarizer disposed between said object and said detector.
- 22. A coating for indicating strain of an underlying surface, comprising:
at least one coating layer, said coating layer providing luminescence and photoelasticity, wherein said coating layer emits longer wavelength light having an altered polarization responsive to illumination with excitation light.
- 23. The coating of claim 22, wherein said coating layer includes at least one polarization preserving luminophore.
- 24. The coating of claim 22, wherein said coating layer is polarization generating.
- 25. The coating of claim 22, wherein said coating layer consists of a single layer.
- 26. The coating claim 22, wherein said at least one coating layer comprises at least two layers, said at least two layers comprising a luminescent layer disposed on said substrate surface and a photoelastic layer disposed on said luminescent layer.
- 27. The coating of claim 26, wherein said luminescent layer includes a first luminophore and said photoelastic coating includes a second luminophore, wherein said first and second luminophore provide different emission wavelengths.
- 28. The coating of claim 27, wherein an emission wavelength of said first luminophore corresponds to an absorption spectrum of said second luminophore.
- 29. The coating of claim 22, wherein said coating layer comprises a bisphenol A diglycidyl ether or a bisphenol A glycerolate diacrylate based polymer.
- 30. A coated structural member, comprising:
a substrate having a substrate surface, and a coating layer disposed on said substrate surface, said coating layer including at least one layer and providing both luminescence and photoelasticity, wherein said coating layer emits longer wavelength light having a polarization dependent upon stress or strain on said coating layer upon illumination with excitation light.
- 31. The coated member of claim 30, wherein said coating layer includes at least one polarization preserving luminophore.
- 32. The coated member of claim 30, wherein said coating layer consists of only a single layer.
- 33. The coated member claim 30, wherein said at least one coating layer comprises at least two layers, said at least two layers comprising a luminescent layer disposed on said substrate surface and a photoelastic layer disposed on said luminescent layer.
- 34. The coated member of claim 33, wherein said luminescent layer includes a first luminophore and said photoelastic coating includes a second luminophore, wherein said first and second luminophore provide different emission wavelengths.
- 35. The coated member of claim 34, wherein an emission wavelength of said first luminophore corresponds to an absorption spectrum of said second luminophore.
- 36. The coated member claim 30, wherein said coating layer comprises a bisphenol A diglycidyl ether or a bisphenol A glycerolate diacrylate based polymer.
- 37. A method for real-time monitoring of strain on surfaces of mechanical components, comprising the steps of:
providing a mechanical element having at least one surface, said surface including at least one coating layer for indicating strain on said surface, said coating layer providing both luminescence and photoelasticity, wherein said coating layer emits longer wavelength light having a polarization dependent upon stress or strain on said coating responsive to illumination with excitation light; utilizing said mechanical element in a stress inducing application; monitoring strains developed on said mechanical element during said utilizing step, said monitoring step comprising illuminating said surface with said excitation light, measuring at least one characteristic of said emitted light, and determining strain on said surface from said measured characteristic.
- 38. The method of claim 37, said coating layer comprises at least two layers, said at least two layers comprising a luminescent layer disposed on said substrate surface and a photoelastic layer disposed on said luminescent layer.
- 39. The method of claim 38, wherein said luminescent layer includes a first luminophore and said photoelastic coating includes a second luminophore, wherein said first and second luminophore provide different emission wavelengths.
- 40. The method of claim 39, wherein an emission wavelength of said first luminophore corresponds to an absorption spectrum of said second luminophore.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] This application claims the benefit of U.S. Provisional Application No. 60/416,105 entitled METHOD AND APPARATUS FOR MEASURING STRAIN, filed on Oct. 4, 2002, the entirety of which is incorporated herein by reference.
Provisional Applications (1)
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Number |
Date |
Country |
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60416105 |
Oct 2002 |
US |