Patent Application
20160074829
The present invention relates to a method and apparatus for producing liquid for sterilization which is used to sterilize a living body, medical equipment, and so on.
Low-temperature plasma generated under an atmospheric pressure has conventionally attracted attention in the medical field and other fields. Such plasma is sometimes called low-temperature plasma, atmospheric pressure plasma, atmospheric pressure low-temperature plasma, non-equilibrium plasma, Low Frequency (LF) plasma, or the like. An LF plasma jet which is an example of devices capable of generating such plasma is disclosed in WO2008/072390.
Application examples of such plasma include a technology for emitting plasma onto an object or a liquid such as water to purify or sterilize the object or the liquid (Japanese Unexamined Patent Application Publication Nos. 2009-22391, 2006-289236, 2010-523327, and 2012-96141).
There has, been proposed a technology for supplying steam to a tube where an object to be sterilized is placed, and causing discharge by electrodes placed inside the tube to sterilize the object (Japanese Unexamined Patent Application Publication No. 2009-22391).
Another technology has been proposed in which plasma discharge is generated by two electrodes one of which is disposed above a water tank for reserving water therein and the other of which is disposed in the bottom of the water tank, thereby to obtain plasma discharge treated water having high ozone concentrations (Japanese Unexamined Patent Application Publication No. 2006-289236).
According to yet another technology, water containing germs is flown into a stepwise flow passage. The water flowing like a film is exposed to plasma to generate O radicals and OH radicals. The O radicals and OH radicals thus generated are used to completely sterilize the germs contained in the water.
Further, it has been known that an enhanced microbicidal activity by which the time required for sterilization is reduced to approximately one hundredth is obtained by emitting plasma onto a liquid of which a pH value has been lowered (WO2009/041049). In the odontotherapy field, for example, sterilization has been performed using chemical agents, which unfortunately has caused a postoperative infectious disease due to insufficient sterilization. In contrast, sterilization using pH adjustment in a liquid and using plasma provides a further sterilizing effect.
However, in order to use plasma for odontotherapy, a plasma generation device should be installed in a place where a medical treatment is provided. Further, a pipe line for introducing atmospheric gases should be provided in order to generate plasma. According to circumstances, another pipe line is needed to discharge gases which are to be generated as a byproduct.
In the case of sterilizing and disinfecting medical equipment, it is necessary to install a plasma generation device in a clinical site and to secure necessary pipe lines.
In light of the foregoing, instead of using plasma to purify or sterilize an object or water directly, it is very useful to generate, in advance, a plasma-treated solution containing plasma therein, and to use the plasma-treated solution for sterilization at a time and location different from the time and location where the plasma-treated solution is generated.
The present invention has been achieved in light of such an issue, and therefore, an object of an embodiment of the present invention is to provide a method and apparatus for continuously generating a plasma-treated solution using plasma in an efficient manner.
An apparatus according to an embodiment of the present invention includes: a pipe line; a water supplying device for supplying the pipe line with water; a gas supplying device for supplying the pipe line with nitrogen gas; a plasma generation device having a high-voltage electrode and a ground electrode which are provided outside the pipe line to face each other with the pipe line interposed therebetween and applying a plasma treatment continuously to the water flowing in the pipe line by generating dielectric barrier discharge between the high-voltage electrode and the ground electrode; a cooling device for cooling the water flowing in the pipe line; and a vessel for holding the water flowing out of the pipe line; wherein the cooling device cools the water to have a low temperature of 10° C. or lower, the plasma treatment is applied to generate a plasma-treated solution in which superoxide anion radicals (O2−.) or a precursor thereof is diffused in the water and a microbicidal activity is sustained, and the plasma-treated solution is held in the vessel as the liquid for sterilization used to apply a sterilization treatment by applying the plasma-treated solution to an object.
Preferably, the pipe line is provided to have an inclination with respect to a horizontal plane, and the water flows in the pipe line by gravity of the water due to inclination of the pipe line.
According to the present invention, it is possible to continuously generate a plasma-treated solution using plasma in an efficient manner.
A method and device according to the present invention may be implemented as in various embodiments described below. The following embodiments are only examples and not limited to the embodiments presented.
An apparatus for producing liquid for sterilization use may be implemented as discussed below.
To be specific, the apparatus includes a pipe line; a water supplying device for supplying the pipe line with water; a gas supplying device for supplying the pipe line with nitrogen gas; a plasma generation device having a high-voltage electrode and a ground electrode which are provided outside the pipe line to face each other with the pipe line interposed therebetween and applying a plasma treatment continuously to the water flowing in the pipe line by generating dielectric barrier discharge between the high-voltage electrode and the ground electrode; a cooling device for cooling the water flowing in the pipe line; and a vessel for holding the water flowing out of the pipe line as the liquid for sterilization use.
For example, the pipe line is provided to have an inclination with respect to a horizontal plane, and the water flows in the pipe line by gravity of the water due to inclination of the pipe line.
For example, the pipe line is made of a dielectric material such as a quartz glass, and the plasma generation device is so arranged that the pipe line functions as a dielectric for the dielectric barrier discharge.
For example, each of the high-voltage electrode and the ground electrode has a rectangular cross-section, is disposed along the pipe line, and has a width corresponding to a width of the pipe line. The high-voltage electrode is disposed above the pipe line, and the ground electrode is disposed below the pipe line.
For example, the cooling device has a cooling medium pipe line disposed to contact the high-voltage electrode and the ground electrode, and a cooling medium supplying device for supplying the cooling medium pipe line with a cooling medium.
For example, the pipe line has a circular cross-section and is closed to outside, and no oxygen gas is substantially present in the pipe line.
For example, the ground electrode is formed to have a hollow portion through which a cooling medium flows, and the ground electrode is a part of the cooling device.
For example, the pipe line is provided with a discharge gas supplying device for supplying the pipe lie with helium gas or argon gas.
For example, the pipe line is provided to meander on a base inclinable to the horizontal plane, and a speed of the water flowing in the pipe line is adjusted by varying an inclination angle of the base with respect to the horizontal plane.
A method for producing liquid for sterilization use may be implemented as discussed below.
To be specific, the method includes: supplying a pipe line with water and nitrogen gas; generating dielectric barrier discharge between a high-voltage electrode and a ground electrode which are provided outside the pipe line to face each other with the pipe line interposed therebetween while water flowing in the pipe line is cooled directly or indirectly by a cooling device, and continuously making plasma generated by the dielectric barrier discharge contact with the water flowing in the pipe line; and holding the water flowing out of the pipe line as the liquid for sterilization use.
For example, the pipe line is provided to have an inclination with respect to a horizontal plane, and the water flows in the pipe line by gravity of the water due to inclination of the pipe line.
For example, the pipe line has a circular cross-section and is closed to outside, and no oxygen gas is substantially present in the pipe line.
For example, freezing-point depressant is added to water to be supplied to the pipe line to lower a freezing point of the water, and the water is cooled by the cooling device to become 0° C. or lower but not to be frozen.
For example, water to be supplied to the pipe line is adjusted in advance to have a pH value of 4.8 or lower.
Another method for producing liquid for sterilization use may be implemented as discussed below.
To be specific, the method includes: supplying a pipe line with ice and nitrogen gas; applying a plasma treatment by emitting plasma to the ice from outside the pipe line and emitting the plasma to water obtained by melting the ice through emission of the plasma; and holding and obtaining, in a vessel, the water subjected to the plasma treatment as the liquid for sterilization use.
The description goes on to embodiments for the apparatus for producing liquid for sterilization use.
Referring to
The sterilization liquid production apparatus 1 is also provided with a water vessel 21, a water pump 22, a water supply pipe line 23, a treated solution vessel 24, a nitrogen tank 31, a helium tank 33, flow controllers 32 and 34, a gas pipe line 35, a high voltage power supply 41, a cooler 51, cooling medium pipe lines 52a and 52b, and so on in order to supply the plasma treatment mechanism PK with a high voltage Vc, water ML, gases GS, cooling medium RB, and so on.
The pipe line 11 is made of a dielectric material to have a circular tube shape and a linear shape along the length direction of the pipe line 11. In this embodiment, the pipe line 11 is made of a quartz glass. Instead of this, however, the pipe line 11 may be made of another dielectric material such as various types of resin, ceramics, or barium titanate.
The pipe line 11 may be set to have a diameter (external diameter) of, for example, approximately a few millimeters through a dozen millimeters, in particular, for example, 6 through 10 millimeters, more specifically, approximately 10 millimeters, for example. If the pipe line 11 has a thickness of, for example, 1 millimeter, then the pipe line 11 has an internal diameter of, for example, 4 through 8 millimeters. The pipe line 11 may be set to have a length of, for example, several tens of centimeters through a few meters, specifically, approximately 1 meter, for example.
The pipe line 11 is disposed at an angle of α relative to the horizontal plane so that the water ML flows therein by gravity. To be specific, the water ML flows, as a free stream, inside the pipe line 11 at an almost constant speed not by another pressure but only by gravity of the water ML due to the inclination of the pipe line 11. In some cases, however, the flow of the water ML is slightly influenced by a pressure of gases GS in the pipe line 11.
The water ML flows only in a part of the bottom of the pipe line 11, and does not flow so as to fill the entirety of the cross-sectional surface of the pipe line 11.
Referring also to
It is preferable that the level HG of the water ML falls within a range of approximately one-fifth through half of the height H of the pipe line 11. The larger the surface area of the water ML with respect to the volume thereof is, the easier active species by the plasma make contact with the water ML, which enables the active species to easily diffuse into the water ML. The water ML has a maximum surface area for the case where the level HG of the water ML is equal to a half of the height H of the pipe line 11. The surface area of the water ML is reduced as the water ML is further increased. The flow rate is reduced for the case where the level HG of the water ML is excessively low, which reduces production of treated solution MLp.
In order to allow the water ML to flow easily in the pipe line 11, a hydrophilic treatment using titanium oxide may be applied to the inner wall of the pipe line 11. In such a case, it is preferable to apply the hydrophilic treatment so as not to influence the active species generated by the plasma PM. Alternatively, before the water ML flows in the pipe line 11, discharge is generated, and the inner wall is exposed to the discharge. Thereby, the hydrophilic treatment may be applied.
Each of the high-voltage electrode 12a and the ground electrode 12b is made of a metallic material such as copper or aluminium and is formed to have a long bar shape. Each of the high-voltage electrode 12a and the ground electrode 12b has a rectangular cross-section. In other words, each of the high-voltage electrode 12a and the ground electrode 12b has a plate-like shape or square bar shape, and has a width which is equivalent to a width of the flow passage of the pipe line 11.
The high-voltage electrode 12a and the ground electrode 12b are disposed outside and along the pipe line 11. The high-voltage electrode 12a and the ground electrode 12b are disposed to face each other with the pipe line 11 interposed therebetween. To be specific, the high-voltage electrode 12a is disposed to contact an upper part of the pipe line 11, and the ground electrode 12b is disposed to contact a lower part of the pipe line 11. Disposing the ground electrode 12b in a lower part of the pipe line 11 makes it easy to install the plasma treatment mechanism PK. Instead of this, however, the ground electrode 12b may be disposed in an upper part of the pipe line 11 and the high-voltage electrode 12a may be disposed in a lower part thereof.
The high voltage power supply 41, described later, applies a high voltage between the high-voltage electrode 12a and the ground electrode 12b. This causes dielectric barrier discharge between the high-voltage electrode 12a and the ground electrode 12b. Plasma PM is generated by the dielectric barrier discharge. The plasma PM makes contact with the water ML flowing in the pipe line 11, so that a plasma treatment is applied to the water ML.
Each of the cooling pipe lines 13a and 13b is made of a metallic material having a good thermal conductivity. Each of the cooling pipe lines 13a and 13b is made to have a tubular shape. The cooling medium RB flows in each of the cooling pipe lines 13a and 13b. The cooling medium RB flows in a direction opposite to the direction of the flow of the water ML. In short, the water ML to be cooled flows in a direction opposite to the direction of the flow of the cooling medium RB.
Examples of the cooling medium RB are water, ice water (water cooled by ice cubes), water of which a freezing point is lowered by freezing-point depressant, and cooling medium gas such as fluorocarbon and ammonia. The cooling pipe lines 13a and 13b contact the high-voltage electrode 12a and the ground electrode 12b respectively so as to cool the high-voltage electrode 12a and the ground electrode 12b and to cool the water ML indirectly via the pipe line 11.
In order to bundle and retain the pipe line 11, the high-voltage electrode 12a, the ground electrode 12b, the cooling pipe lines 13a and 13b, a suitable holding device (not shown) is used. The holding device is provided with a frame member which surrounds all of the pipe line 11, the high-voltage electrode 12a, the ground electrode 12b, and the cooling pipe lines 13a and 13b. The holding device is so structured that a screw member or an elastic member applies pressure from above or below to make the pipe line 11, the high-voltage electrode 12a, the ground electrode 12b, and the cooling pipe lines 13a and 13b contact with one another. Such holding members may be placed at positions in the longitudinal direction of the plasma treatment mechanism PK. The holding members may be so structured to make an inclination angle α with respect to the plasma treatment mechanism PK including the pipe line 11.
Alternatively, it is possible to hold the plasma treatment mechanism PK together by winding the plasma treatment mechanism PK with an appropriate adhesive tape, Kapton (registered trademark) tape, or the like. Yet alternatively, it is possible to hold the plasma treatment mechanism PK together with a heat shrinkable tube.
The water vessel 21 contains the water ML therein. The water ML may be pure water, ultrapure water, or tap water. The water ML may be a liquid of which a pH value has been lowered by adding an acid liquid such as acetic acid (CHCOOH) or citric acid (C6H8O7) to the pure water, the ultrapure water, or the tap water. The water ML may be a liquid to which, as freezing-point depressant, salt such as calcium chloride (CaCl2) or sodium chloride (NaCl) is added to the pure water, the ultrapure water, or the tap water. The water ML may be physiological saline, another liquid, or an aqueous solution.
The plasma treatment lowers a pH value of the water ML; however, in terms of life time of biocidal activity in the treated solution MLp, it is preferable to make a pH value of the water ML as low as possible, as described later. For example, the water ML is adjusted in advance to have a pH value of 4.8 or lower. The pH value of the water ML may be adjusted to become 4.5 or lower, more preferably to become 2 or so. In practical use, the pH value of the water ML may be adjusted to become 3 or lower.
The water pump 22 pumps the water ML contained in the water vessel 21 at a predetermined flow rate, and supplies the water ML through the water supply pipe line 23 to the inlet side (the upstream side) of the pipe line 11. The water pump 22 may be a pump which is driven, for example, by a motor and of which a discharge amount is adjusted by controlling the speed of the motor. The water pump 22 may be PERISTA PUMP sold by ATTO products.
The amount of the water ML to be supplied to the pipe line 11 by the water pump 22 may be, for example, an amount falling within the range of approximately a few tenths of a milliliter through a few milliliters per minute, more specifically, may be, for example, an amount falling within the range of approximately 0.3 through 3.0 milliliters per minute, and, more concretely, may be, for example, approximately 2 milliliters per minute.
The treated solution vessel 24 receives the water ML flowing from the pipe line 11 to hold the water ML as the treated solution MLp. The treated solution MLp produced in the foregoing manner is an example of the “liquid for sterilization use” recited in the present invention. The treated solution vessel 24 is desirably cooled by a cooling device (not shown) and the like to be kept at a low temperature.
For example, the treated solution vessel 24 is formed by using a metallic material and is placed on a base. The cooling medium pipe line 52a is provided to pass through the base, so that the base is cooled. The cooled base then cools the treated solution vessel 24.
In order that the treated solution vessel 24 certainly receives the water ML flowing from the pipe line 11, it is possible to fix an appropriate piping member such as an elbow at the flow outlet (the downstream end) of the pipe line 11.
Referring to
The water ML flows, in the pipe line 11, at a speed depending on the inclination angle α of the pipe line 11, and passes through the groove 111a to flow smoothly from the flow outlet. The water pump 22 supplies the water ML to replenish the amount corresponding to the water ML flowing from the flow outlet.
The stopper 111, the groove 111a, and the elbow 112 may be integrally formed, for example, with synthetic resin.
In the case where the flow outlet of the pipe line 11 has to be drawn from the high-voltage electrode 12a and the ground electrode 12b, auxiliary electrodes 121a and 121b shown in
As the treated solution vessel 24, or, instead of the treated solution vessel 24, a device may be used which receives the treated solution MLp and carries the treated solution MLp continuously to another location. Alternatively, a device may be used which receives the treated solution MLp and instantly fills and packs a predetermined amount of the treated solution MLp into an appropriate case in real time. Yet alternatively, a device may be used which receives the treated solution MLp, freezes the treated solution MLp rapidly, and makes solid ice blocks (frozen ice blocks) each of which has a predetermined amount.
The nitrogen tank 31 contains, as liquid nitrogen or high-pressure nitrogen for example, nitrogen which is a gas for generating active species. The helium tank 33 contains, as liquid helium or high-pressure helium for example, helium which is a gas for generating plasma (discharge). The flow controllers 32 and 34 adjust flow rates of the gases GS to reach the set flow rates. An example of the flow controllers 32 and 34 is a mass flow controller sold by KOFLOC Co., Ltd.
The flow rates of the gases GS supplied from the nitrogen tank 31 and the helium tank 33 are adjusted by the flow controllers 32 and 34. After that, the gases GS are mixed in the gas pipe line 35 and the resultant is supplied to the inlet side of the pipe line 11. The gas pipe line 35 and the pipe line 11 are connected to each other by, for example, a piping member to prevent outside leakage of the gases GS.
For example, output sides of the flow controllers 32 and 34 are formed to join together by using a tee-piece or an appropriate manifold to be provided as one gas pipe line 35, and the resultant is connected to the inlet side of the pipe line 11. The end of the gas pipe line 35 is connected to the pipe line 11 by using a tee-piece or an appropriate manifold, and the end of the water supply pipe line 23 is connected to the pipe line 11. This enables the water ML and the gases GS to be supplied to the pipe line 11 concurrently.
The nitrogen tank 31, the flow controller 32, the gas pipe line 35, and so on are examples of the “gas supplying device” recited in the present invention. The helium tank 33, the flow controller 34, the gas pipe line 35, and so on are examples of the “discharge gas supplying device” recited in the present invention. In this embodiment, the nitrogen gas (approximately 1%) is mixed with the helium gas in the gas pipe line 35. Only nitrogen is used as the gas for generating active species, and no oxygen is used. Stated differently, since no oxygen gas is supplied to the pipe line 11, no oxygen is present substantially inside the pipe line 11.
Referring to
The tee-piece 352 has another opening connected to a joint nipple 354. The joint nipple 354 has, for example, a tube insertion portion. The joint nipple 354 tightens, by means of a sleeve and a cap nut, the gas pipe line 35 which is made of a resin tube and is inserted into the tube insertion portion, and fixes the gas pipe line 35 to the tube insertion portion.
The flow rate of the nitrogen to be supplied to the pipe line 11 may be, for example, a value falling within the range of approximately several tens of milliliters through a hundred and several tens of milliliters per minute, more specifically, may be, for example, approximately 50 milliliters per minute. The flow rate of the helium to be supplied to the pipe line 11 may be, for example, a value falling within the range of approximately several hundreds of milliliters through a thousand and several hundreds of milliliters per minutes, more specifically, may be, for example, approximately 500 milliliters per minute or approximately 1000 milliliters per minute.
The pressure of the gases GS in the pipe line 11 is almost atmospheric pressure.
The helium gas is used in this embodiment; however argon gas may be used. The dielectric barrier discharge can be generated without the helium gas by increasing an electric field by increasing the high voltage Vc described below. Therefore, a gas for discharge such as the helium gas is not always necessary as long as the dielectric barrier discharge is generated.
The high voltage power supply 41 produces a pulse train of the high voltage Vc having a predetermined frequency. The high voltage Vc has a voltage value of, for example, approximately 10 kV and a frequency of, for example, approximately 10 kHz. The voltage value and the frequency of the high voltage Vc may be values different from those above.
The high voltage Vc temporally changing is applied between the high-voltage electrode 12a and the ground electrode 12b, so that dielectric barrier discharge is generated in the pipe line 11. At this time, the pipe line 11 itself functions as a dielectric in the dielectric barrier discharge. The plasma PM generated by the dielectric barrier discharge in the pipe line 11 makes contact with the water ML, so that plasma treatment is applied to the water ML.
To be specific, the plasma PM generated by the dielectric barrier discharge causes active species to be generated. The active species make contact with the water ML and are diffused in the water ML. As the active species, in particular, superoxide anion radicals (O2−.) and the derivative (or precursor) thereof are important. The active species are diffused in the water ML, so that the water ML turns into the treated solution MLp.
The treated solution MLp has a microbicidal activity and the microbicidal activity is sustained. The microbicidal activity of the treated solution MLp is associated with acid dissociation equilibrium of the superoxide anion radicals. To be specific, the superoxide anion radicals and the derivative (or precursor) thereof exist in the treated solution MLp. The derivative generates the superoxide anion radicals gradually, so that the biocidal activity is sustained.
As a method for bringing the active species into contact with the water ML, it is preferable to emit the plasma PM to the water ML in a manner to make direct contact therewith. Even when the plasma PM does not make direct contact with the water ML, the active species may be electrophoresed to make the plasma PM contact with the water ML. In such a case, an electric field is created which is directed from the ground electrode 12b toward the high-voltage electrode 12a. The active species which are minus ions move toward the water ML by the electric field.
In order to enhance a sterilization effect in the treated solution MLp, it is necessary to adjust the treated solution MLp to have a pH value of 4.8 or lower before the treated solution MLp is applied to an object. The pH value of the treated solution MLp may be adjusted to become 4.8 or lower at a time point when the treated solution MLp is held in the treated solution vessel 24. Alternatively, the pH value of the treated solution MLp may be adjusted to become 4.8 or lower at a time point when the treated solution MLp is used to sterilize the object. Yet alternatively, the pH value of the water ML contained in the water vessel 21 may be adjusted in advance to become 4.8 or lower. The pH value of the treated solution MLp may be adjusted to become 4.5 or lower.
In order to adjust the pH value of the treated solution MLp in the foregoing manner, a pH adjustment device having an appropriate structure may be used. In order to adjust the pH value by using the pH adjustment device, there are provided: a method of charging acid, or salt that indicates acidity into the water ML or the treated solution MLp; a method of blowing a carbonic acid gas into the water ML or the treated solution MLp; and so on. For example, acidic liquid such as citric acid or acetic acid used in food is preferably charged into the water ML or the treated solution MLp. In this way, when the pH value is adjusted to make the water ML or the treated solution MLp acidic, protons (hydrogen ions) H+ in the water ML increase.
The cooler 51 is an example of the “cooling medium supplying device” recited in the present invention. The cooler 51 is operable to supply the cooling medium RB having a cooling capability to the cooling medium pipe line 52a, and circulates the cooling medium RB into the cooling pipe lines 13a and 13b; thereby the water ML in the pipe line 11 is cooled through the high-voltage electrode 12a and the ground electrode 12b.
As described earlier, the appropriate base is used to cool the treated solution vessel 24 and the treated solution MLp. The cooling medium pipe line 52b may be used to cool the water vessel 21 and the water supply pipe line 23; thereby to cool the water ML to be supplied to the pipe line 11 in advance.
The cooler 51 may be a device for implementing a refrigeration cycle, for example, a compressor. In such a case, the cooling medium RB may be a cooling medium gas such as fluorocarbon or ammonia. The cooler 51 may be an ice machine or produced ice cubes. In such a case, ice water, water of which a freezing point has been lowered by the freezing-point depressant, or another aqueous solution is used as the cooling medium RB and is pumped by the pump.
The cooler 51, and the cooling medium pipe lines 52a and 52b constitute a cooling device RS.
The cooling device RS is capable of cooling the water ML of which a temperature rises due to the plasma PM to approximately a room temperature, to 20° C. or lower, or to approximately 2° C. Depending on the cooling medium RB to be used, the temperature of the water ML may be lowered to a temperature immediately before a temperature at which the water ML is frozen. When normal water is used as the water ML, the temperature thereof may be lowered to 0° C. or so. When water of which a freezing point has been lowered is used as the water ML, the temperature thereof may be lowered to a temperature in the vicinity of the freezing point.
For example, the water ML of which the freezing point has been lowered by the freezing-point depressant is cooled to become 0° C. or lower but not to be frozen. For example, the water ML to which alcohol is added is cooled, in the form of liquid, to approximately −20° C., and then the plasma treatment is applied to the resultant. The temperature of the water ML and the treated solution MLp is kept as low as possible. This enables the treated solution MLp having a high concentration of active species to be generated, and also extends a life time of the biocidal activity.
As described earlier, the treated solution MLp in which the active species are diffused has biocidal activity. The biocidal activity of the treated solution MLp is, however, gradually lost as time advances. As the experiments proceed, it is found that, in order to produce the treated solution MLp and to prolong the biocidal activity of the treated solution MLp, lowering the temperature of the plasma-treated solution MLp is important.
To be specific,
As shown in
As indicated in
As known from
Lowering the temperature of the treated solution MLp increases the half-life of the active species. Therefore, even if a constant amount of active species are supplied by plasma per unit time, a final reached concentration of the active species changes. To be specific, for a short half-life, the active species disappear rapidly while being supplied. Accordingly, it is difficult to observe the increase in concentration.
In
As shown in
As known from the above, the time from when the treated solution MLp is generated until when the treated solution MLp is applied to an object is preferably as short as possible. For example, in a room temperature of approximately 25° C., it is possible to carry out sufficient sterilization treatment by applying the treated solution MLp to an object within 1 minute or so from the generation of the plasma-treated solution MLp.
When the temperature of the water ML or the treated solution MLp is set at 10° C. or lower, it is possible to secure the time necessary to apply the treated solution MLp to carry out sterilization treatment. In other words, for generating and storing the treated solution MLp, it is important to keep the temperature of the water ML and the treated solution MLp as low as possible.
For the purpose of cooling the water ML or the treated solution MLp to have a low temperature of 10° C. or lower and keeping the low temperature, the cooling device RS described above is used.
In order to store the treated solution MLp for a further longer period of time, it has been known that the treated solution MLp is preferably frozen to solid ice, and the solid ice is preferably frozen and stored at a temperature of −18° C. or lower, further, at a temperature of −30° C. or lower.
The description goes on to results of experiments conducted on biocidal activities of the treated solution MLp and the solid ice thereof.
For the experiment, the treated solution MLp is frozen rapidly to produce solid ice blocks. The solid ice blocks are frozen and stored at a temperature of −18° C., −30° C., and −85° C., respectively. After a predetermined lapse of time, the frozen solid ice blocks are thawed on ice to mix with a set of microbial suspension buffer solution. The mixture is left as-is at a room temperature for 5 minutes, serially diluted, applied onto a plate, and measured for the number of colonies.
According to the graphs of
In contrast, in the case where the frozen treated solution is stored at −30° C. or lower, the biocidal activity still remains high even two weeks later.
As known from the experiment results, it is possible to transport and store the treated solution MLp with the biocidal activity maintained by rapidly freezing the treated solution MLp and storing the same at −30° C. or lower.
An experiment of producing the treated solution MLp was made by means of a test model of the sterilization liquid production apparatus 1.
In the test model, the pipe line 11 has an external diameter of 10 millimeters, an internal diameter of 8 millimeters, and a length of approximately 1 meter. The flow rate of the treated solution MLp flowing from the flow outlet of the pipe line 11 is set at approximately 2 milliliters per minute. The discharge flow rate from the water pump 22 is set at approximately 2 milliliters per minute. In such a case, the flow rate of the water ML in the pipe line 11 is approximately 2 milliliters per minute. A period of time Tp for the water ML to be present in the pipe line 11, namely, the period of time Tp for the water ML to be exposed to the plasma PM is set at, approximately 2 minutes.
In the cooler 51, water cooled by ice blocks are pumped out by the pump. The ice water is supplied, as cooling water, from the cooling medium pipe line 52a to the cooling pipe lines 13a and 13b and is flown therein.
A DPD reagent is used to measure the concentration of biocidal activity species of the treated solution MLp produced. For comparison, such a measurement is similarly made on the treated solution MLp which is produced with no cooling water flown.
Referring to
The absorbance described herein is a value obtained by dividing the absorbance measured on the diluted treated solution MLp by the dilution ratio to convert the resultant into a value corresponding to the undiluted solution. In general, a measurement for absorbance can be made only up to 4 or so. For the convenience of experiment, a measurement is necessary after the treated solution MLp is diluted by using ultrapure water. For standardization, the absorbance measured by the measurement device is converted from the dilution ratio to the value corresponding to the undiluted solution.
In the experiment, when ice water is supplied from the cooler 51, the temperature of each of the inlets of the cooling pipe lines 13a and 13b is 0 (zero) ° C., the temperature of each of the outlets thereof is 2° C., and the temperature of the treated solution MLp produced is 16-17° C. When no cooling water is supplied, the temperature of the treated solution MLp produced is 29-32° C.
In the experiment, when water having a room temperature (20° C.) is used as the cooling water, the temperature of each of the inlets of the cooling pipe lines 13a and 13b is 20° C., the temperature of each of the outlets thereof is 21° C., and the temperature of the treated solution MLp produced is 25-26° C.
As described above, the concentration of the biocidal activity species is greatly improved by cooling the water ML flowing in the pipe line 11 to a further lower temperature.
Referring to
The ground electrode 12Bb is formed to have a rectangular shape which allows the dielectric barrier discharge to spread as widely as possible in the pipe line 11. However, the shape is not limited thereto. The ground electrode 12Bb may have another shape such as a half circular shape, circular shape, and elliptical shape as long as the dielectric barrier discharge spreads sufficiently in the pipe line 11.
The structures and functions of the other parts of the sterilization liquid production apparatus 1B according to the second embodiment are similar to those of the sterilization liquid production apparatus 1 according to the first embodiment. Accordingly, description of the points common to the first embodiment shall be omitted.
According to the plasma treatment mechanism PKB of the second embodiment, the ground electrode 12Bb functions also as the cooling pipe line 13Bb. This simplifies the structure and improves the cooling effect because the ground electrode 12Bb cools the pipe line 11 directly.
As with the ground electrode 12Bb, the high-voltage electrode 12Ba may function also as a cooling pipe line.
With the plasma treatment mechanism PKC shown in
To be specific, the plate-like base 61 has, on its lower face, an adjustable leg 62 which enables adjustment of the inclination angle β on the horizontal plane. The base 61 has, on its upper face, the pipe line 11C meandering along the upper face.
When the inclination angle β is 0 (zero) degrees, the inclination angle α of the pipe line 11C is also 0 (zero) degrees. As the inclination angle β increases, the inclination angle α of the pipe line 11C also increases. In such a case, an amount of the change in the inclination angle α is small as compared to an amount of the change in the inclination angle β. Therefore, the inclination angle α can be adjusted precisely.
A high-voltage electrode 12Ca and a ground electrode 12Cb are disposed to face each other with the pipe line 11C interposed therebetween. The high-voltage electrode 12Ca is disposed above and along the pipe line 11C. The ground electrode 12Cb has a rectangular plate-like shape and a size sufficient to cover the entirety of the pipe line 11C. The ground electrode 12Cb is disposed below the pipe line 11C.
Cooling pipe lines 13Ca and 13Cb are disposed to contact the high-voltage electrode 12Ca and the ground electrode 12Cb, respectively.
The structures and functions of the other parts of the sterilization liquid production apparatus 1C according to the third embodiment are similar to those of the sterilization liquid production apparatus 1 according to the first embodiment. Accordingly, description of the points common to the first embodiment shall be omitted.
According to the plasma treatment mechanism PKC of the third embodiment, the pipe line 11C can be lengthened even in a small installation area. This enables the plasma treatment to be applied more efficiently. Further, the inclination angle α of the pipe line 11C can be adjusted precisely by adjusting the inclination angle β with the adjustable leg 62.
In the foregoing embodiments, the shape and dimensions of the pipe lines 11, 11B, and 11C may not be limited to the foregoing examples, and may be variously changed. For example, the shape of a cross-section may be a semicircle, eclipse, rectangle, or polygon. Increase in dimensions of the pipe lines 11, 11B, and 11C enables the treated solution MLp to be generated more.
For example, a pipe line 11D having a rectangular cross-section is used as shown in a plasma treatment mechanism PKD of
A dielectric material is used to form an upper wall portion 115a and a lower wall portion 115b of the pipe line 11D; thereby to generate dielectric barrier discharge inside the pipe line 11D. An insulating material having a low dielectric constant is used to form side wall portions 115c and 115d of the pipe line 11D. This prevents discharge and short-circuiting between the side wall portions 115c and 115d, and also prevents reduction in electric field.
A high-voltage electrode 12Da and a ground electrode 12Db are formed to have a plate-like cross-section and a band-like shape in the length direction along the upper wall portion 115a or the lower wall portion 115b of the pipe line 11D.
In order to cool the high-voltage electrode 12Da and the ground electrode 12Db of the sterilization liquid production apparatus 1E, a cooling pipe line having an appropriate shape is provided.
The use of the plasma treatment mechanism PKD enables mass production of the treated solution MLp.
The pipe line 11D may be formed to have a spiral shape. In such a case, the water ML is supplied from the upper end of the spiral, and the treated solution MLp is discharged from the lower end thereof.
With the sterilization liquid production apparatus 1E shown in
According to the sterilization liquid production apparatus 1E, the treated solution MLp can be generated at a temperature of 0 (zero) degrees or so. Therefore, the solid ice MS having a high concentration of active species can be generated successively in an efficient manner. In addition, the device may be simplified because the ice KLc functions as a cooling device.
The vessel 25 containing the treated solution MLp therein may be cooled by using the appropriate base as descried earlier. The opening of the vessel 25 may be sealed with a lid, which enables the treated solution MLp in the vessel 25 to be delivered to a location far from the installation site of the sterilization liquid production apparatus 1E.
Alternatively, the vessel 25 conveyed from the pipe line 11E may be cooled, and the treated solution MLp contained therein may be frozen rapidly to make a solid ice. The treated solution MLp can be stored for a longer period of time by freezing the treated solution MLp into a solid ice. In such a case, the process starting from the generation of the treated solution MLp to the generation of the solid ice MS may be performed in one identical vessel 25. The solid ice may be thawed at a place where sterilization treatment is applied, and the resultant may be applied to an object.
With the sterilization liquid production apparatus 1E, the size of the vessel 25, pipe line 11E, high-voltage electrode 12Ea, ground electrode 12Eb and so on, and the speed of the conveyor 26 are preferably adjusted so that ice KLc melts smoothly and the plasma treatment is applied to the water ML smoothly.
Instead of conveying the vessels 25 by the conveyor 26, another arrangement is possible in which the vessels 25 are pushed in, one by one, from the inlet of the pipe line 11E, and the vessels 25 are pushed out, one by one, from the outlet of the pipe line 11E.
A variety of shapes, sizes, and materials of the vessel 25 and the pipe line 11E may be used.
[Descriptions Using Flowchart]
The description goes on to a summary of a method for generating a liquid for sterilization use by means of the sterilization liquid production apparatus 1, 1B, or 1C with reference to a flowchart.
Referring to
The order of processes in Steps #11-#14 may be switched from one to another, or alternatively, may be concurrent with one another.
The sterilization liquid production apparatuses 1, 1B, 1C, and 1E according to the foregoing embodiments are capable of generating the treated solution MLp successively and efficiently.
The pipe line 11 is closed to the outside. Only water ML, nitrogen gas, and helium gas are present inside the pipe line 11, and no oxygen gas is present substantially. Therefore, no ozone is generated, and therefore, the treated solution MLp is not affected by ozone.
In the foregoing embodiments, the sizes and shapes of the high-voltage electrode 12a and the ground electrode 12b are not limited to the foregoing, and may be arbitrarily modified in various ways. For example, the high-voltage electrode 12a and the ground electrode 12b may be formed to have a shape along the surface of the pipe line 11, 11B, 11C, or 11E. In such a case, the high-voltage electrode 12a and the ground electrode 12b may be implemented by using a conductive tape, a copper foil, or a copper plate, for example, to attach the same to the surface of the pipe line 11, 11B, 11C, or 11E.
The layout of the high-voltage electrode 12a and the ground electrode 12b may differ from that in the foregoing examples. For example, the high-voltage electrode 12a may be disposed below the pipe line 11 and the ground electrode 12b may be disposed thereabove. Alternatively, the high-voltage electrode 12a and the ground electrode 12b may be laid out on the right and left of the pipe line 11.
In the foregoing embodiments, the sizes and shapes of the cooling pipe lines 13a and 13b are not limited to the examples, and may be arbitrarily modified in various ways. The cooling device RS may be an electronic cooling device using a Peltier element. In such a case, the Peltier element or the like may be attached to the high-voltage electrode 12a or the ground electrode 12b, or may be attached to the side face of the pipe line 11.
In the embodiments discussed above, the configurations of all or part of the pipe lines 11 and 11B-11E, the high-voltage electrode 12a, the ground electrode 12b, the cooling pipe lines 13a and 13b, the plasma treatment mechanisms PK, PKB, PKC, PKD, and PKE, the water vessel 21, the treated solution vessel 24, the vessel 25, the high voltage power supply 41, the cooler 51, and the sterilization liquid production devices 1, 1B, 1C, and 1E, structures, shapes, dimensions, quantities, materials, arrangements thereof, and so on may be arbitrarily modified in various ways within the spirit of the present invention.
Further, kinds, components, temperatures, pressures, speeds, and so on of the water ML or the gases GS may be arbitrarily selected within the spirit of the present invention.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2013-109827 | May 2013 | JP | national |
This application is a continuing application, filed under 35 U.S.C. §111(a), of International Application PCT/JP2014/002704, filed on May 22, 2014, the entire contents of which are incorporated herein by reference.
| Number | Date | Country | |
|---|---|---|---|
| Parent | PCT/JP2014/002704 | May 2014 | US |
| Child | 14949511 | US |
