Claims
- 1. An apparatus for sensing hydrogen comprising:
a substrate wherein a plurality of nanoparticles is deposited on the substrate to form at least one nanoparticle path, wherein the at least one nanoparticle path exhibits an increase in electrical conductivity in the presence of hydrogen and a decrease of electrical conductivity in the absence of hydrogen and wherein the at least one nanoparticle path was formed in close proximity to the substrate using a side-wall plating technique, and wherein the electrical conductivity of the at least one nanoparticle path is readily discernable over the electrical conductivity of the substrate due to the non-conductive nature of the substrate.
- 2. The apparatus of claim 1 wherein the at least one nanoparticle path forms at least one nanowire.
- 3. The apparatus of claim 1 wherein the plurality of nanoparticles are deposited to at least one side-wall of a metal layer;
and wherein the metal layer is on the substrate while depositing the plurality of nanoparticles and the metal layer is removed from the substrate after depositing the plurality of nanoparticles.
- 4. The apparatus of claim 1 wherein the at least one nanoparticle paths is composed of a combination of Pd and Ag.
- 5. The apparatus of claim 1 wherein the substrate is composed of SiNx.
- 6. The apparatus of claim 1 wherein the substrate is composed of SiO2.
- 7. An apparatus for sensing hydrogen comprising:
a semiconductor substrate having a top surface; a layer of TiO2 disposed on the top surface of the semiconductor substrate, wherein the layer of TiO2 has a top surface; and a nanoparticle path disposed on the top surface of the layer of TiO2 wherein the nanoparticle path has a top surface and wherein the nanoparticle path exhibits an increase in conductivity in the presence of hydrogen.
- 8. The apparatus of claim 7 wherein the layer of TiO2 is formed by oxidizing a layer of Ti having a top surface and wherein the layer of Ti is oxidized after the nanoparticle path is disposed on the top surface of the layer of Ti.
- 9. The apparatus of claim 7 comprising a second nanoparticle path disposed on the top surface of the nanoparticle path after the layer of TiO2 is formed by oxidizing the layer of Ti.
- 10. An apparatus for sensing hydrogen comprising:
a semiconductor substrate having a top surface; a layer of SiNx disposed on the top surface of the semiconductor substrate wherein the layer of SiNx has a top surface; a Ti layer disposed on the top surface of the SiNx layer wherein the Ti layer has at least one side-wall; and a plurality of nanoparticles disposed on the top surface of the SiNx wherein the plurality of nanoparticles form a path of nanoparticles having higher conductivity in the presence of hydrogen than in the absence of hydrogen.
- 11. The apparatus of claim 10 wherein the plurality of nanoparticles is disposed on the SiNx layer by side-wall plating the plurality of nanoparticles to the at least one side-wall of the Ti layer.
- 12. An apparatus for sensing hydrogen comprising;
a semiconductor substrate having a top surface; a first metal layer deposited on the top surface of the semiconductor substrate wherein the first metal layer has a top surface; a second metal layer deposited on the top surface of the first metal layer creating a covered region of the top surface of the first metal layer and an exposed region of the top surface of the first metal layer, and wherein the second metal layer has at least one side-wall; and a plurality of nanoparticles disposed to the at least one side-wall of the second metal layer and a plurality of nanoparticles disposed to the exposed region of the first metal layer, wherein the plurality of nanoparticles form at least one nanoparticle path exhibiting increased conductivity in the presence of hydrogen.
CROSS-REFERENCE TO RELATED APPLICATIONS
[0001] The present invention claims priority to U.S. Provisional Application Ser. No. 60/475,558.
Provisional Applications (1)
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Number |
Date |
Country |
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60475558 |
Jun 2003 |
US |