Claims
- 1. A method of polishing a glass workpiece using an abrasive article comprising:
- a backing; and
- at least one polishing layer comprising cerium oxide particles dispersed within a binder, the binder bonded to a surface of the backing, the abrasive article is capable of reducing an initial Rtm of about 0.8 .mu.m or greater on a glass test blank to a final Rtm of about 0.3 .mu.m or less in about one minute using the RPE procedure.
- 2. An abrasive article comprising:
- a backing having at least one surface; and
- at least one polishing layer bonded to the at least one surface of the backing, wherein the at least one polishing layer comprises a plurality of abrasive particles dispersed in a binder, the binder formed from a binder precursor comprising:
- a tetra-functional acrylate monomer resin; and
- a mono-functional acrylate monomer resin.
- 3. The abrasive article of claim 2 wherein the plurality of abrasive particles comprise cerium oxide particles.
- 4. The abrasive article of claim 2 wherein the binder precursor further comprises from about 60 to about 40 parts tetra-functional acrylate monomer resin and from about 40 to about 60 parts mono-functional acrylate monomer resin.
CROSS REFERENCE TO RELATED APPLICATION
This application is a divisional application of application Ser. No. 09/197,656, filed on Nov. 23, 1998, now U.S. Pat. No. 5,989,711; which is a divisional application of application Ser. No. 08/778,501, filed on Jan. 3, 1997, now U.S. Pat. No. 5,876,268, which is incorporated herein by reference.
US Referenced Citations (44)
Foreign Referenced Citations (17)
Number |
Date |
Country |
0 291 100 A2 |
Nov 1988 |
EPX |
0 345 239 A1 |
Dec 1989 |
EPX |
0 400 658 A2 |
Dec 1990 |
EPX |
650803 |
May 1995 |
EPX |
0 655 297 A1 |
May 1995 |
EPX |
2 330 502 |
Jun 1977 |
FRX |
63-196363 |
Aug 1988 |
JPX |
63-185 579 |
Aug 1988 |
JPX |
04201181 |
Jul 1992 |
JPX |
06 071 544 |
Mar 1994 |
JPX |
07068469 |
Mar 1995 |
JPX |
2 094 824 |
Sep 1982 |
GBX |
WO 9507797 |
Mar 1995 |
WOX |
WO 9519242 |
Jul 1995 |
WOX |
WO 9522436 |
Aug 1995 |
WOX |
WO 9527595 |
Oct 1995 |
WOX |
WO 9711484 |
Mar 1997 |
WOX |
Non-Patent Literature Citations (5)
Entry |
R. Jairath et al., "Role of Consumables in the Chemical Mechanical Polishing (CMP) of Silicon Oxide Films" (undated), 6 pages. |
Billmeyer, Jr., F.W., Text Book of Polymer Science, Third Edition, Title Page, Table of Contents, pp. v-xvii (1984). |
Cook, L.M. "Chemical Processes in Glass Polishing", J. Non-Crystalline Solids, 120, 152-171 (1990). |
Product Brochure for "Surtronic 3"; Rank Taylor-Hobson, Leicester, England; 3 pgs (undated). |
T.R. McGibbon et al., "Surface Finish: A 3-Dimensional View", Brochure of 3M Industrial Abrasives Division, St. Paul, MN, pp. 1-5 (undated). |
Divisions (2)
|
Number |
Date |
Country |
Parent |
197656 |
Nov 1998 |
|
Parent |
778501 |
Jan 1997 |
|