The present invention relates to a method and a plant for producing oxygen and rare gases by air distillation.
A weak krypton/xenon mixture is conventionally produced from a purge at the main vaporizer of a double air separation column (see “Tieftemperaturtechnik” by Hausen and Linde, 1985 edition, pp. 337-340 and “Separation of Gases” by Isalski, 1989 edition, pp. 96-98). The oxygen produced is then withdrawn from the low-pressure column a few stages above the vaporizer. If the oxygen is withdrawn in gaseous form, this arrangement allows a substantial fraction of the krypton present in the air and all of the xenon to be recovered.
However, in the case of a unit producing oxygen by what are called “pumped” methods, about 30% of the krypton and of the xenon present in the air are “lost” in the liquid oxygen withdrawn from the low-pressure column.
DE-A-2603505 discloses an air separation unit in which a fluid containing krypton and xenon is produced in a purification column fed with two streams of rich liquid coming from the medium-pressure column, the reboiling in the purification column being provided by a vaporizer fed with the overhead gas from an argon column.
One object of the present invention is to propose systems for increasing the krypton and xenon yield of units producing gaseous oxygen by pumping and vaporization of liquid oxygen (or more generally those with substantial withdrawal of liquid oxygen from the bottom of the low-pressure column) and, preferably, also producing argon.
Another object of the present invention is again to have a principal vaporizer with a high oxygen content and massively purged, and thus to greatly limit the concentration of hydrocarbons/impurities (the advantage of a pumped “oxytonne”), which is not the case with the conventional scheme producing a weak mixture of krypton and xenon.
One subject of the invention is a method for producing oxygen and rare gases by distillation in a column system comprising at least one medium-pressure column, one low-pressure column and one auxiliary column, in which method:
Preferably, the liquid stream sent as reflux to the auxiliary column is liquefied air and/or liquid enriched with nitrogen relative to a liquefied air stream sent to the medium-pressure column. According to optional aspects:
Another subject of the invention is a plant for producing oxygen and rare gases by distillation in a column system comprising at least one medium-pressure column, one low-pressure column and one auxiliary column, which plant comprises:
According to other optional aspects, the plant includes:
The invention will now be described with reference to FIGS. 1 to 9, which are diagrams showing the principle of plants according to the invention.
In the example shown in
An argon column K10 is fed with an argon-enriched fluid 7 coming from the low-pressure column K02 and an argon-enriched liquid 9 is returned from the argon column K10 to the low-pressure column K02. An argon-rich stream ARGON is withdrawn from the top of the column K10.
In the case of pumped units, a portion of the dry and decarbonized air is compressed in an air booster (not illustrated) up to the pressure sufficient to allow vaporization of the optionally pumped oxygen. It is then condensed in the main exchange line (not illustrated). At the cold end of the main exchange line, this flow is expanded in a valve or in a hydraulic turbine. The liquid phase LIQ AIR of this fluid can then be distributed as streams 1, 3 and 5 between the medium-pressure column K01, the low-pressure column K02 and the auxiliary column K05, respectively. The liquid contains 78 mol % nitrogen.
The other portion of the medium-pressure air MP AIR is cooled in the main exchange line and sent to the bottom of the medium-pressure column K01.
The principle of the present invention is to concentrate the krypton and the xenon in a rich liquid RL2, which will then be treated in an auxiliary column K05.
Two rich liquids RL1 and RL2 are therefore withdrawn from the medium-pressure column K01, namely a “conventional” rich liquid withdrawn from an intermediate level a few stages above the bottom of the column and containing a small quantity of krypton and of xenon, RL1, and a rich bottoms liquid concentrated with krypton and xenon, RL2. This “conventional” rich liquid RL1 can then be sent to the column K02 after having been subcooled.
The rich bottoms liquid RL2 is sent to the K10 argon mixture condenser E10 after subcooling (not illustrated). Stages are installed above this equipment in order to concentrate the krypton and the xenon at the argon mixture condenser. This assembly constitutes the column K05. A portion of the reflux from this column is provided by a portion 5 of the liquid air LIQ AIR not feeding the column K01, after this has been subcooled. The other portion of the reflux is provided by a portion 15 of the mean liquid 11 conventionally sent to the column K02 via the line 13 and containing at least 80 mol % nitrogen. A gas 16 is withdrawn from the intermediate level of the column K05 below the points of reflux injection, and constitutes the vaporized rich liquid. It is then recycled in the column K02. The overhead gas WN2′ from the column K05 constitutes a portion of the waste gas WN2 leaving the cold box.
The purge PURGE from the mixture condenser E10 contains most of the krypton and xenon that are present in the air and have been treated by the columns K01 and K05. This flow feeds a device for concentrating the rare gases. For example, it may be sent into the weak krypton/xenon mixture column (K90). The bottom of this column contains the product to be beneficiated. The vapor 17 coming from the column K90 is sent back into the bottom of the column K05.
The column K90 is heated by a stream of air forming a fraction of the MP AIR. The liquefied air thus formed may be sent back to the medium-pressure column K01 and/or to the low-pressure column K02.
The production of liquid oxygen LO is withdrawn as bottoms from the column K02, level with the principal vaporizer E02. Unlike the conventional scheme for krypton and xenon production, the principal vaporizer is therefore massively purged.
The liquid oxygen LO is preferably pressurized by a pump and then vaporized in the exchange line or in a dedicated vaporizer, by heat exchange with the pressurized air. Alternatively, a nitrogen cycle may serve to vaporize the liquid oxygen LO.
In the following figures, various alternative embodiments deriving from
In the case of
In the case of
In addition, all of the liquid air LIQ AIR present at the outlet of the exchange line can be withdrawn from the column K01 (preferably at the point of introduction of the liquid air) and then distributed between the column K02 and the column K05 after having been subcooled, as shown in
In the case of
In the case of
In all the figures described above (FIGS. 1 to 7), it is possible to couple the plant with the conventional scheme for producing krypton and xenon. To do this, it is necessary to install stages for enrichment of the bottom in the column K02. The liquid oxygen LO is produced a few stages above the principal vaporizer E02. A purge 21 is withdrawn level with the principal vaporizer E02. It contains about 70 mol % krypton and all of the xenon present in the column K02. It is sent to the column K90 in order to recover the rare gases.
An example is given in
In all the above figures (FIGS. 1 to 8), the coproduction of argon is mentioned. However, it is possible to fit the plants described above to a unit that does not produce argon. For example, it is sufficient to install an exchanger for condensing a fraction of the gas 7 withdrawn from the column K02. Once liquefied, it is sent (9) into the column K02. This thus provides the reboiling in the column K05.
An example is given in
In the case of a scheme with a blowing turbine, the blown air is sent into the bottom of the column K05 so as to recover the krypton and xenon that it contains.
In addition, the schemes illustrated in FIGS. 1 to 9 may also include distillation assemblies, such as for example an Etienne column (a column that operates at an intermediate pressure between the medium and low pressures and fed with rich liquid). In this case, it is possible to modify the top condenser of an Etienne column, by replacing the argon column K10 of FIGS. 1 to 9 with an Etienne column according to the same principle: addition of stages above the condenser in order to concentrate the rare gases.
It is perhaps also advantageous not to send all of the liquid air into the top of the auxiliary column but to introduce, at this inlet of the column, only a stream that ensures an L/V (the ratio of the falling liquid flow rate to the rising gas flow rate in the distillation section) needed to concentrate the Kr and Xe in the bottom of K05, thereby limiting the oxygen concentration in the bottom of K05. The remainder of the liquid air stream is then sent, with the rich liquid RL2, into the bottom of the auxiliary column.
Number | Date | Country | Kind |
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02/10922 | Sep 2002 | FR | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
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PCT/FR03/02420 | 7/30/2003 | WO | 8/5/2005 |