This invention relates in general to optical systems, and more particularly to method and system for a semiconductor laser light source.
Within the optics industry, many systems applications use light sources producing visible radiant power in the milliwatt to hundreds of watts range. Examples of display applications that use visible light sources include front projection, high-definition television, and cinema displays. In some display applications, these light sources must withstand a range of environmental conditions such as high humidity, large temperature excursions, and mechanical shock as well as meet other design constraints including, for example, brightness, efficiency, cost, étendue, heat generation, and/or size. Solid state light sources such as lasers and LEDs are more robust to many environmental factors and often have advantages in brightness, efficiency, cost, etendue, and overall size, as well as producing light with accurate color relative to filament, arc, or gas phase sources.
In accordance with the present disclosure, a method and system for a semiconductor laser light source is provided.
In accordance with one embodiment of the present disclosure, a laser module includes a Distributed Bragg Reflector semiconductor laser light source that is operable to generate a light beam having a stabilized frequency and spatial mode. A periodically poled, nonlinear optical device is operable to receive the light beam, and frequency-convert the light beam.
Technical advantages of certain embodiments of the present disclosure include enhanced laser light sources with nonlinear optics tuned to the particular frequency of the light received from a laser emitter. Some such embodiments may include multiple integrated light sources and corresponding NonLinear Optic (NLO) sections all coupled to a common submount and operable to generate light beams in multiple frequency ranges.
Other technical advantages of the present disclosure will be readily apparent to one skilled in the art from the following figures, descriptions, and claims. Moreover, while specific advantages have been enumerated above, various embodiments may include all, some, or none of the enumerated advantages.
For a more complete understanding of the present disclosure and its advantages, reference is now made to the following description, taken in conjunction with the accompanying drawings, in which:
In accordance with the present disclosure, a method and system for a semiconductor laser light source is provided. The method and system may be used in any of a variety of optical applications, including, for example, display applications. Examples of such display applications include home-theater projectors, high-definition televisions (HDTV), and cinema projectors, including those using DLP® technology developed by Texas Instruments Incorporated. Particular examples specified throughout this document are intended for example purposes only, and are not intended to limit the scope of the present disclosure. In particular, this document is not intended to be limited to particular optical application or technology, such as, a display application using DLP® technology.
As described further below with reference to
Diode 103 generally refers to any device capable of converting optical energy to electrical energy. In this example, the converted electrical energy is typically transmitted in the form of an analog signal or digital signal to a processor 105. One example of processor 105 is a digital signal processor (DSP) 105. Processor 105 generally processes, using real-time computing, the digital conversion of analog electrical signals received from diode 103. The analog-to-digital conversion may be performed, for example, by processor 105 or by some other intermediary device (not explicitly shown). Processor 105 is operable to output a signal indicative of an optical characteristic of light beams 104 generated by laser modules 102. For example, processor 105 may output signals indicative of respective intensity levels for light beams 104a, 104b, and 104c.
Optics 106 generally refers to any optical device(s) capable of directing light beams 104. In the example embodiment, optics 106a, 106b, 106c, and 106d are wavelength specific fold mirrors; however, any suitable optics may be used.
Formatter 108 generally refers to any hardware, software, other logic, or any suitable combination of the preceding that is capable of interfacing with laser modules 102 and/or modulator 110. In the example embodiment, formatter 108 is an application-specific integrated circuit (ASIC) that is further capable of processing input signals. The input signals may include, for example, information corresponding to a photolithographic pattern, an image, or a video stream; however, any suitable input signal may be used. Formatter 108 outputs control signals 109 to light modulator 110 that correspond to the processed input signals. Control signals 109 at least partially control modulator 110 operation. In addition, formatter 108 may output control signals to laser modules 102. For example, formatter 108 may respond to feedback signals received from processor 105 by outputting control signals that adjust the intensity level output of laser modules 102.
Modulator 110 generally refers to any device capable of spatially modulating light. For example, modulator 110 may be a so called back illuminated liquid crystal display, an interferometric modulator, or a liquid crystal on silicon display. In the illustrated embodiment, however, modulator 110 is a digital micromirror device (DMD™) that constitutes a portion of DLP® technology. A DMD™ is a microelectromechanical system (MEMS) device comprising an array of hundreds of thousands of digital micromirrors. In the illustrated embodiment, deflection of each micromirror between “on” and “off” positions is effected by the attractive or repulsive electrostatic forces exerted thereon by electric fields. The electric fields result from the application of appropriate potentials as controlled by formatter 108. The pattern of “on” versus “off” (e.g., light and dark mirrors) forms an image that is projected by optics 112 to display 114. Of course, modulators other than DMDs™ may use the principles of the present disclosure. In addition, some alternative embodiments may include multiple modulators 110. For example, some cinema display applications may include plural modulators 110, each of which may receive a colored light beam generated by a respective laser module 102.
Optics 112 generally refers to any optical element(s) capable of directing the output of modulator 110 to display 114. In the example embodiment, optics 112 includes one or more lens. Display 114 generally refers to any display surface capable of receiving the output of modulator 110 as projected by optics 112. For example, display 114 may be a front or a rear projection screen.
In some applications, light sources are subjected to a range of environmental factors such as high humidity, large temperature excursions, and mechanical shock. In addition, the light sources of various applications have certain design constraints, including, for example, brightness, efficiency, cost, etendue, heat generation, and/or size. Accordingly, the teachings of some embodiments of the present disclosure provide an enhanced semiconductor laser light source 102 that adequately meets the aforementioned design constraints for certain applications. A better understanding of various aspects of some such semiconductor laser light sources may be had by making reference to
A periodic structure 210 generally provides a distributed reflector that provides laser oscillation feedback for emitter 202. As shown in
Laser modules 102 having single-frequency, single longitudinal modes of operation typically have significantly enhanced frequency-doubling efficiency relative to multi-frequency sources. Some single frequency structures that use quantum wells to confine charge, however, are inefficient photon waveguides because the quantum well is too thin to efficiently confine the emitted photons. In other words, the quantum wells may be considerably thinner than the wavelength of generated light. Accordingly, Second Confinement Heterostructure (SCH) layers 207a and 207b are high to low index structures on both sides of the quantum well layer 206 that may confine the generated photons to the quantum well plane. SCH layers 207a and 207b can use any of a number of index of refraction profiles, such as, for example, a step function grading or a parabolic grading. In this example, the product of the combined thickness of layers 206, 207a and 207b and the combined effective index of refraction is approximately equivalent to one wavelength of the light emitted from laser module 102, thereby efficiently confining emitted photons to a single mode.
DBR emitter 202 also includes a set of electrodes 212 that are capable of injecting charge into a structural or index of refraction ridge or region 209 containing the quantum well layer 206 and may contain all or parts of the SCH 207a and 207b. A region of the structure 209 can be defined by etching, ion implantation, diffusion, or other chemical or thermal process that further confine the emitted photons in a dimension transverse both to the quantum well and the propagation direction of the photon. That is, SCH layers 207a and 207b and transverse relief structure 209 collectively provide a two-dimensional waveguide for the photons produced in the quantum well.
A quantum facet 214 reflects and transmits portions of the received light. Quantum facet 214 is typically passivated to avoid optical damage. The passivation material may include, for example, Al2O3, ZnSe and Si. Various embodiments may diffuse a lifetime killing impurity into quantum facet 214 to prevent optical recombination from taking place in proximity to the quantum facet 214. Proper material selection for quantum facet 214 may further mitigate optical damage.
Designing DBR emitter 202 with good recombination lifetimes and minimal parasitic recombination paths, series resistance, and strain in layers 206, 207a, and 207b may stimulate highly efficient photon emission from quantum facets 214. However, to be generally useful for visual display applications, if the directly generated light is in the Near Infrared (NIR) it can be converted to the visible range via one of a number of nonlinear optical processes.
In this example, periodically poled, NonLinear Optic (NLO) device 204 is generally configured to frequency-convert light beams 303 received from respective DBR emitters 202. For example, the periodically-poled NLO device 204 may achieve phase or quasi-phased matching of fundamental frequency photons and corresponding harmonic photons through artificially structuring the material. In this manner, the NLO device 204 may convert NIR light beams 303 to higher frequencies within the green or blue color spectrum. As shown in
Such periodically poled NLOs 204 may achieve cost savings over designs using bulk phase matching, e.g. birefringent phase matching. Brirefringent phase matching typically requires using a precision cut crystal that is highly sensitive to temperature fluctuation. Periodically-poled NLO 204 may include any of a variety of crystalline compounds 216, such as, for example, Potassium Titanyl Phosphate (KTP), Potassium Lithium Niobate (PLN), Lithium Niobate (LN), Lithium Tantalate (LT), Lithium Borate (LBO), beta-Barium Borate (BBO), GaN and other III-V compounds.
In this example, periodically poled NLO device 204 is tuned to the particular frequency of the light received from DBR emitter 202 according to a mathematical relationship with periodic portion 210. In this manner, NLO device 204 may efficiently convert the frequency of light from DBR emitter 202. The mathematical relationship is described further below with reference to
λB=2neffT Equation 1
Where T is the period of the structure 210, that is periodic in index of refraction, and neff is the effective dielectric constant of the Bragg structure. The effective dielectric constant of periodic structure 210 is
The index of refraction for a given propagation direction in the crystal 216 can be calculated using Equation 3:
where na and nb are the indices of refraction for the a and b directions and θ is the angle formed between the a and b directions.
For efficient frequency doubling a fundamental wave, the fundamental and doubled wave may propagate thru a nonlinear crystal 216 at the same rate. The propagating waves for the fundamental and second harmonic can be described in terms of the magnitude, k, of the wavevector also known as the propagation constant. The difference between the propagation constants for the fundamental and second harmonic, Δk for the optical waves propagating in the Z direction in the figure can be written as:
where λ1 is the wavelength of the fundamental wave, nc(2ω1) is the index of refraction in the c direction at the second harmonic and nθ(ω1) is the index of refraction of the fundamental wave in the propagation direction. When Δk is approximately zero, crystal 216 of NLO device 204 may efficiently frequency double received light beam 303.
l
c
=π/Δk Equation 5
Again for a periodically poled nonlinear material, the spatial period of the poling, Λ is given by Equation 6:
The phase matching condition for the periodically poled case is given by
Δk=k
3−2k1−K Equation 7
Where K is the magnitude of the wavevector for the poled material and is given by:
Combining Equation 4 for Δk with direction with Equation 6 for Δk with poling we calculate the spatial poling period for a wavelength and a set of indices of refraction.
Thus, in some embodiments, periodically poled NLO 204 may be tuned to the particular frequency of the light received from DBR emitter 202 according to the mathematical relationships described with reference to equations 1 through 9. In this manner, NLO device 204 may efficiently frequency double the radiant power emitted from laser 102. In some alternative embodiments, NLO device 204 may be a multi-dimensional waveguide, as illustrated further with reference to
In this example, periodically poled NLOs 304 are each substantially similar in structure and function to periodically poled NLOs 204, with the exception that periodically poled NLOs 304 may spatially confine received light beams in one or two dimensions. Forming waveguides with the general structure illustrated in
Alternative embodiments may not include multi-dimensional waveguides 304. For example, some alternative embodiments may use a non-etched, periodically poled, continuous crystalline compound that is not singulated in a manner similar to poled regions 304a, 304b, 304c, 304d, 304e, and 304f. In other alternative embodiments, poled regions 304a, 304b, 304c, 304d, 304e, and 304f may have varying structural designs with respect to each other. Some embodiments may not include device 304 at all. For example, some applications may use Near Infrared (NIR) light beams generated by emitters 302 without the use of NLO devices.
As illustrated in
Although the present disclosure has been described with several embodiments, a myriad of changes, variations, alterations, transformations, and modifications may be suggested to one skilled in the art, and it is intended that the present disclosure encompass such changes, variations, alterations, transformations, and modifications as fall within the scope of the appended claims.
This application claims the benefit of priority under 35 U.S.C. §119(e) of U.S. Provisional Patent Application Ser. No. 60/877,687 entitled “Frequency Doubled Single Mode Laser for Display Illuminator Applications,” which was filed on Feb. 1, 2007.