METHOD AND SYSTEM FOR ACOUSTIC CLEAVING

Abstract

An acoustic system is described that includes a piezoelectric device; an alternating current (AC) power supply for supplying an AC voltage; an AC-to-direct current (DC) converter coupled to the AC power supply for converting the AC voltage supplied by the AC power supply into DC voltage; a function generator for producing an input signal at a resonant frequency of the piezoelectric device; and an amplifier coupled to the AC-to-DC converter, the function generator, and the piezoelectric device, where the amplifier is for producing an output signal by amplifying the input signal according to the DC voltage and driving the piezoelectric device using the output signal.

Description

BACKGROUND

Field

Embodiments described herein relate to semiconductor manufacturing and equipment, and more particularly to layer transfer.

Background Information

As the photovoltaics and various power electronics industries move towards non-silicon materials, there is a related drive for growth of semiconductor devices on the same or dissimilar substrates including silicon (Si), gallium arsenide (GaAs), indium phosphide (InP), gallium nitride (GaN), silicon carbide (SiC), aluminum nitride (AlN), diamond, etc. In traditional fabrication technique the substrate may be removed by backgrinding after formation of a semiconductor device layer. The substrates, however, represent a significant percent of overall device cost. In order to recoup some of these costs it has been proposed to re-claim the growth substrates for multiple uses. Removal techniques such as laser lift-off commonly include intermediate layers that can affect device layer growth quality. Other techniques such as spalling are commonly performed at high temperatures and may have significant variation in the cleaved surface conditions. More recently it has been proposed in U.S. Pat. No. 10,828,800 to utilize sound-assisted crack propagation for semiconductor wafering. In such an implementation is it proposed to form a premade crack in a substrate, apply a first stress to the material below a critical point of the material that is insufficient to initiate cracking, then to apply a controlled ultrasonic wave to the material causing the total stress applied at the crack tip in the material to exceed a critical point. The ultrasound wave can then be controlled to propagate cracking of the material.

SUMMARY

An acoustic cleaving apparatus, acoustic system, acoustic circuit, and methods of use are described with respect to cleaving a workpiece. In an embodiment, an acoustic cleaving apparatus includes a crack initiator system to create an indentation on a workpiece, a base stress system to induce a base stress on the workpiece, and an acoustic system to emit acoustic waves into the workpiece to maintain a controlled crack propagation through a material of the workpiece. As such, the acoustic cleaving apparatus can include an aggregate of systems to prepare and cleave a workpiece.

According to an embodiment of the disclosure, the acoustic system includes: a piezoelectric device; an alternating current (AC) power supply for supplying an AC voltage; an AC-to-direct current (DC) converter coupled to the AC power supply for converting the AC voltage supplied by the AC power supply into DC voltage; a function generator for producing an input signal at a resonant frequency of the piezoelectric device; and an amplifier coupled to the AC-to-DC converter, the function generator, and the piezoelectric device, where the amplifier is for producing an output signal by amplifying the input signal according to the DC voltage and driving the piezoelectric device using the output signal.

In one embodiment, the acoustic system further includes a power factor correction (PFC) circuit coupled to the AC power supply and for correcting a power factor of the AC voltage supplied by the AC power supply. In another embodiment, the PFC circuit maintains the power factor at 0.9. In some embodiments, the acoustic system further includes a power converter coupled between the AC-to-DC converter and the amplifier, the power converter for converting the DC voltage to a driving voltage for the piezoelectric device. In another embodiment, the driving voltage is a first DC voltage, where the function generator is coupled to the power converter that provides a second DC voltage to the function generator.

In one embodiment, the function generator is coupled to the AC power supply and is powered using the AC voltage. In another embodiment, the piezoelectric device is a first piezoelectric device, where the acoustic system further includes: a second piezoelectric device coupled to the amplifier; a first switch coupled between the first piezoelectric device and the amplifier; a second switch coupled between the second piezoelectric device and the amplifier; and a controller configured to cause the first switch or the second switch to close to allow the amplifier to drive the first piezoelectric device or the second piezoelectric device, respectively. In another embodiment, the input signal is a first input signal, the resonant frequency is a first resonant frequency, and the output signal is a first output signal, where responsive to the controller causing the second switch to close, the function generator provides a second input signal at a second resonant frequency of the second piezoelectric device to the amplifier, which produces a second output signal based on the second input signal for driving the second piezoelectric device.

In one embodiment, the piezoelectric device is one of several of piezoelectric devices of the acoustic system, where the function generator is one of several function generators that are a part of a frequency selector circuit that is coupled to the amplifier, each function generator being configured to produce a particular input signal for driving a particular piezoelectric device of the several piezoelectric devices at the particular piezoelectric device's resonant frequency. In another embodiment, the acoustic system further includes a controller for causing the frequency selector circuit to output one input signal produced by one function generator of the several function generators at any given time. In another embodiment, the frequency selector circuit includes several switches, each switch coupled between at least one of the several function generators and the amplifier, where the controller causes the frequency selector circuit to output the one input signal by closing a switch coupled between the one function generator and the amplifier, while opening a remainder of switches of the several switches. In some embodiments, the several switches are a first several switches, where the acoustic system further includes a second several switches, each coupled between the amplifier and a different piezoelectric device of the several piezoelectric devices, where the controller is configured to cause one switch of the second several switches to close and to cause a remainder of switches of the second several switches to open based on the one input signal the frequency selector circuit is to output. In another embodiment, the first several switches are low-power switches, and the second several switches are high-power switches. In one embodiment, the amplifier is a single operational amplifier.

According to another embodiment of the disclosure, an acoustic system includes: a piezoelectric device having a resonant frequency; an alternating current (AC) power supply for supplying an AC voltage; a radio frequency (RF) amplifier coupled to the AC supply and the piezoelectric device; and a function generator coupled to the RF amplifier, the function generator for causing the RF amplifier to produce an output signal based on the AC voltage for driving the piezoelectric device, where the output signal has a frequency at the resonant frequency of the piezoelectric device.

In one embodiment, the acoustic system further includes a matching circuit coupled between the RF amplifier and the piezoelectric device for matching an input impedance of the piezoelectric device to an output impedance of the RF amplifier. In another embodiment, the input impedance is between 47 ohms and 50 ohms. In some embodiments, the function generator includes a sweeping generator for: performing a frequency sweep within a frequency range that includes an expected resonant frequency of the piezoelectric device; and determining, based on the frequency sweep, the resonant frequency of the piezoelectric device within the frequency range.

In one embodiment, the piezoelectric device is a first piezoelectric device, the RF amplifier is a first RF amplifier, the function generator is a first function generator, and the resonant frequency is a first resonant frequency, where the acoustic system further includes: a second piezoelectric device having a second resonant frequency; a second RF amplifier coupled between the AC supply and the second piezoelectric device; and a second function generator coupled to the RF amplifier, the function generator for causing the RF amplifier to produce another output signal based on the AC voltage for driving the second piezoelectric device and at the second resonant frequency. In another embodiment, the first and second function generators drive their respective piezoelectric devices simultaneously.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is an illustration of a flow chart for a sequence of cleaving a workpiece in accordance with an embodiment.

FIG. 2 is a schematic top view illustration of an acoustic cleaning apparatus in accordance with an embodiment.

FIG. 3 is a schematic cross-sectional side view illustration of a workpiece secured in an acoustic system in accordance with an embodiment.

FIG. 4 is a system level diagram of an acoustic system in accordance with an embodiment.

FIG. 5 is a schematic perspective view illustration of a workpiece including a device layer to be lifted off a growth substrate in accordance with an embodiment.

FIGS. 6A-6E are schematic perspective view illustrations for indentations formed on workpiece in accordance with embodiments.

FIGS. 7A-7C are illustrations for indentation patterns in accordance with embodiments.

FIGS. 8A-8B are schematic perspective view illustrations for base stressor layers in accordance with embodiments.

FIG. 9 is a schematic cross-sectional side view illustration of a base stress system in accordance with embodiments.

FIG. 10 is a schematic perspective view illustration of a base stress system in accordance with embodiments.

FIGS. 11A-11E are schematic perspective view illustrations of various arrangements of acoustic generators in accordance with embodiments.

FIGS. 12A-12D are schematic perspective view illustrations of an optional coupling agent utilized to couple one or more acoustic generators or acoustic enclosures to a workpiece in accordance with embodiments.

FIG. 13 is a schematic cross-sectional side view illustration of an acoustic enclosure that functions as an acoustic absorber in accordance with an embodiment.

FIG. 14 is a schematic cross-sectional side view illustration of an acoustic enclosure that functions as a diffuser in accordance with an embodiment.

FIG. 15 is a schematic cross-sectional side view illustration of an acoustic enclosure that functions as a scattering material in accordance with an embodiment.

FIG. 16 is a schematic cross-sectional side view illustration of an acoustic enclosure and transducer that functions to provide destructive interference in accordance with an embodiment.

FIG. 17 is a block diagram of an acoustic system in accordance with an embodiment.

FIG. 18 is another block diagram of the acoustic system in accordance with an embodiment.

FIG. 19 is a block diagram of an acoustic system for driving multiple piezoelectric devices in accordance with an embodiment.

FIG. 20 is another block diagram of the acoustic system for driving multiple piezoelectric devices in accordance with an embodiment.

FIG. 21 is a block diagram of an acoustic system for driving several piezoelectric devices in accordance with an embodiment.

FIG. 22 is a block diagram of an acoustic system in accordance with an embodiment.

FIG. 23 is another block diagram of an acoustic system in accordance with an embodiment.

FIG. 24 is a block diagram of a frequency selector in accordance with an embodiment.

FIG. 25 is a block diagram of an acoustic system that includes a radio frequency (RF) amplifier in accordance with an embodiment.

DETAILED DESCRIPTION

Embodiments describe an acoustic cleaving apparatus and methods of use to cleave workpieces, such as semiconductor growth substrates with heterogeneously or homogenously grown device layers. In one embodiment, the acoustic cleaving apparatus in accordance with embodiments can include an aggregate of systems to prepare and cleave a workpiece. For example, the acoustic cleaving apparatus can include a crack initiator system to create an indentation to promote fracture, a base stress system to approach the critical stress to start crack propagation, and acoustic system for controlled crack propagation. The crack initiator system may create an indentation or pattern of indentations that function as a nucleation site for crack propagation, or alternatively as part of a stressor for crack initiation at an alternative location. The base stress system may be configured to induce an initial stress to the workpiece through thermal, mechanical, and/or an acoustic source such as with the acoustic system. The acoustic system may include further subsystems such as an electronic system to generate an electrical signal via an energy (voltage) source and energy output control, an acoustic generator that is activated by the electronic system to emit acoustic waves that increase stress in the workpiece, and an optional acoustic enclosure near one, some, or all sides of the workpiece to affect interaction of the acoustic waves and the workpiece.

Another aspect of the disclosure includes an acoustic system designed to drive one or more piezoelectric devices of an acoustic generator at comparatively higher or lower voltages than the operating voltage that may be used to operate at least a portion of the system. In particular, the system includes an acoustic cleaving circuit that has a power amplifier that may be configured to supply power from a high-voltage power supply to a piezoelectric device. For instance, the power amplifier may include a push-pull amplifier circuit that includes a pair of switches that are driven at a high frequency out of phase (e.g., by 180°) to alternate between supplying current from the high-voltage power supply to the piezoelectric device and drawing current from the device into the power supply. As a result, the power amplifier provides a high-voltage output signal as a series of high-voltage pulses to the piezoelectric device to cause the device to oscillate according to (or based on) the frequency at which the pair of switches are driven. As a result, the amplifier produces an output signal by amplifying an input signal using power supplied by the power supply to drive the piezoelectric device.

In addition, the acoustic cleaving circuit may include one or more capacitors, as a capacitor bank, which may be in parallel with the push-pull circuit. In particular, the capacitor bank may be coupled to the positive and negative rails of the high-voltage power supply to supply additional energy as the circuit alternates current from the power supply. As described herein, the push-pull circuit may be driven at a high frequency in order to oscillate the piezoelectric device. As current is drawn from the high-voltage power supply and then provided back into the supply from the piezoelectric device, the supplied voltage may sag. In particular, the system may have a significant amount of transient current due to the high-voltage swings caused by the push-pull circuit switching at high frequency. Also, the high-voltage supply may not have enough stored voltage to drive the piezoelectric device at full power (e.g., due to the current being supplied by the power supply lagging the applied voltage). As a result, the capacitor bank may be arranged to maintain a constant voltage across the piezoelectric device as the current alternates, and may provide an improved power factor.

In various embodiments, description is made with reference to figures. However, certain embodiments may be practiced without one or more of these specific details, or in combination with other known methods and configurations. In the following description, numerous specific details are set forth, such as specific configurations, dimensions, and processes, etc., in order to provide a thorough understanding of the embodiments. In other instances, well-known processes and manufacturing techniques have not been described in particular detail in order to not unnecessarily obscure the embodiments. Reference throughout this specification to “one embodiment” means that a particular feature, structure, configuration, or characteristic described in connection with the embodiment is included in at least one embodiment. Thus, the appearances of the phrase “in one embodiment” in various places throughout this specification are not necessarily referring to the same embodiment. Furthermore, the particular features, structures, configurations, or characteristics may be combined in any suitable manner in one or more embodiments.

The terms “above”, “over”, “to”, “between”, “spanning” and “on” as used herein may refer to a relative position of one layer with respect to other layers. One layer “above”, “over”, “spanning” or “on” another layer or bonded “to” or in “contact” with another layer may be directly in contact with the other layer or may have one or more intervening layers. One layer “between” layers may be directly in contact with the layers or may have one or more intervening layers.

Referring now to FIG. 1, a flow chart is provided for a sequence of cleaving a workpiece in accordance with an embodiment. At operation 1010 indentations can be created in the workpiece with the crack initiator system 110. The indentation(s) may create a crack or provide an irregularity in one or more surfaces of the workpiece to promote the fracture of the workpiece at the indentation(s) or at another location within the workpiece. For example, in some embodiments a pattern of indentations can be formed on the back side of a growth substrate, while crack propagation proceeds in an orthogonal direction across the workpiece between the growth substrate and device layer. The crack initiator can be mechanical, chemical, or use optical methods (such as laser) to create the indentation. In accordance with embodiments, the crack initiator system 110 can form a pattern of indentation(s), including line(s), dots, etc. which can be on one or more sides of the workpiece in order to create one or more locations of weak points for crack formation and propagation (either at the location of the indentations or another location). For example, the shape can be one or several continuous or discontinuous line(s) or dots in a straight line or non-linear pattern. The location of indentation(s) can be on one or all edges/sides of the workpiece at a determined height, on top of and/or bottom surface close to the edge, far from the edge, or at the center of the workpiece. The location could follow one, some or all edges/sides. The length of the pattern/shape of indentation(s) can be from 1 μm to the entire length or width of the workpiece while the depth can be from 1 μm to 500 μm and the tip radius can be from 10 nm to 500 μm, for example.

At operation 1020 a base stress is generated in the workpiece 102 with the base stress system 120. The base stress can reach a critical stress to start a crack propagation in the workpiece, or it can be below the value so that a crack propagation will not initiate.

In a thermal system, one or a plurality of stressors (e.g., stressor layers) such as metal, polymer, ceramic, semiconductor with different coefficient of thermal expansion (CTE) from the workpiece can be attached to one or both (bottom/top) sides of the workpiece (and device layer to be cleaved) forming a composite with a stressor applicator. In operation a change in temperature from room temperature in the growth substrate, device layer, and stressor system creates a load and a moment in the workpiece due to differences in CTE. This stress generated in the workpiece is the base stress. In an exemplary embodiment, the base stress is introduced to the workpiece via the stressor layer(s) by the substrate holder, which can be a cold plate, or alternatively a hot plate.

In a mechanical system the base stress can be introduced from any or a combination of any of a tensile, compression, bending, fatigue, and/or shear stress created directly by one or several mechanical apparatuses. In an acoustic system the base stress can be introduced by the acoustic system 130, or a part thereof, such as dedicated piezoelectric materials.

Acoustic energy can then be applied simultaneously and/or subsequently to the workpiece at operation 1030 with the acoustic system 130 in order to maintain a controlled crack propagation through the workpiece material. A cleaved device layer may then be lifted off the growth substrate (or vice versa) at operation 1040.

FIG. 2 is a schematic top view illustration of an acoustic cleaving apparatus 100 in accordance with an embodiment. The cleaving apparatus 100 may include all systems and subsystems used to initiate crack propagation and lift-off a cleaved layer (e.g., device layer) from the workpiece. In accordance with embodiments, the various components of the acoustic cleaving apparatus form the crack initiator system 110, base stress system 120, and acoustic system 130. The crack initiator system 110 may include a mechanical, chemical or optical indenter which creates an indentation on the workpiece to promote the fracture of the workpiece on that indentation or another location. The base stress system 120 (which may be mechanical, thermal and/or acoustic/electrical) can be used to reach a critical stress to start a crack propagation, or a value below this stress where a crack propagation will not proceed. The acoustic system 130 may be configured to emit acoustic waves into the workpiece to maintain a controlled crack propagation through the materials of the workpiece. The acoustic system can include an electronic system, an acoustic generator, and an optional acoustic enclosure. The crack initiator system, base stress system and acoustic system may be located on the same or separate locations. The crack initiator system and base stress system may also be applied in an interchangeable order before the acoustic system.

In the particular embodiment illustrated in FIG. 2 the crack initiator system 110 includes a laser 112 that is positionable over, under, or laterally adjacent to a side surface of the workpiece 102. Workpiece 102 may be supported by the same or different substrate holder in the crack initiator system 110 as the base stress system 120 and acoustic system 130. For example, workpiece 102 may be supported by a substrate holder 111 in the crack initiator system 110, and then transferred to a substrate holder 114 for processing with the base stress system 120 and acoustic system 130. For example, wand 101, robotic arm 109, and translation track 113 may be used to move the workpiece 102 between systems. For example, wand 101 may be vacuum operated though other manners for holding the workpiece 102 are envisioned, including finger clamps, etc. In another embodiment the workpiece 102 need not be supported by a substrate holder 111 when processed by the crack initiatory system 110. For example, it may be sufficient to have the workpiece held by a wand 101 or mechanical gripper when processed by mechanical, chemical, or optical methods (e.g., laser 112) to form indentation(s).

In the particular embodiment illustrated in FIG. 2 the base stress system 120 is a thermal system where thermal stress is introduced to the workpiece 102 with the substrate holder(s) via an optional coupling agent (e.g., adhesive, gel, etc.). For example, the thermal stress can be applied with substrate holder 111 and/or substrate holder 114, which may be a cold plate (held below room temperature) or hot plate (held above room temperature).

The workpiece 102 may be secured in both the base stress system 120 and acoustic system 130 together as shown in FIG. 3. A high-level system diagram of an acoustic system 130 in accordance with embodiments is shown in FIG. 4.

Referring to each of FIGS. 2-4, the acoustic system 130 in accordance with embodiments may include a plurality of subsystems including an electronic system 140, an acoustic generator 132, and an optional acoustic enclosure 134. The acoustic generator 132 and/or acoustic enclosure 134 may each be in direct contact with the workpiece 102 or separated from and coupled to the workpiece with a coupling agent 135. In an embodiment, the acoustic enclosure 134 includes an (annular) opening 133 to receive the workpiece 102. The electronic system may generate an electrical signal via an energy source 142 (e.g., low-voltage power supply and high-voltage power supply), a signal generator 143 and an acoustic cleaving circuit 144 to control energy output to activate the acoustic generator 132 (e.g., piezoelectric material). As will become apparent in the following description the acoustic system and acoustic generators can be utilized across various systems. For example, the acoustic generator(s) 132 (e.g., piezoelectric material) can be used for crack propagation with the acoustic system 130 as well as for base stress generation in the base stress system 120.

The electronic system 140 can be any combination of an energy storage component (including but not limited to batteries, capacitor, and supercapacitors), switches, voltage sources, amplifiers, relays, pulsers, etc. The electronic system can have other circuit components designed to reduce or increase the inductance, voltage overshoots, current overshoots, ringing and flyback voltage of the system including opto-oscillators, Schmitt triggers, etc.

The electrical signal generated by the electronic system 140 in accordance with embodiments can be a combination of pulses with a voltage amplitude between 0 kV and 20 kV, or >20 kV. The width of each pulse can be varied between 10 ns and 10 s while the time t between each pulse can range from 20 ns and 1 s. The total amount of pulses “n” can be 1, 2 or more than 2. Each electrical pulse can have the same or different characteristics and can be sent to the same or different acoustic generators, or more particularly to piezoelectric materials. The signal can also be one or several chirps where the shape of the signal can be square, rectangular, triangular, saw toothed, sinusoidal, ramp or any combination of shapes. The voltage amplitude can be between 0 kV and 20 kV, or higher (>20 kV). The frequency of the signal frequency can be defined from 1 Hz to 100 MHz and the amount of repetitions “n” can be 1, 2 or more than 2. The electronic system 140 can be connected to the acoustic generator(s) 132 with leads 146, e.g., wires.

Each acoustic generator 132 in accordance with embodiments emits “acoustic waves” to increase the stress in the workpiece 102 and device layer to be cleaved from the workpiece 102. Each acoustic generator 132 can be located on one, some or every side of the workpiece. The type of acoustic waves generated can be planar or focused. The resonant frequency of the acoustic generator 132 may be between 1 kHz and 100 MHz. The acoustic generator(s) can be constructed by one or several layers of piezoelectric material. The assembly of several acoustic generators can form different patterns including but not limited to circular, square, or rectangular.

The acoustic generator(s) 132 can be in direct contact with the workpiece 102 (or device layer thereof) or separated and coupled through a coupling agent 135 (as shown in FIG. 3). The separation with the workpiece can be up to 50 mm and controlled with a robotic arm, spacers, or any other means. The coupling agent 135 can be located only between the workpiece 102 and the acoustic generator 132, or the entire system can be submerged in the coupling agent. In an embodiment, the acoustic generators 132 are utilized as part of the base stress system 120. Thus, acoustic generators 132, including separate groups thereof, can be used for crack propagation and/or base stress.

The acoustic system 130 may additionally include an acoustic enclosure 134 which can be located adjacent to, or surround, one, some or all sides of the workpiece. The acoustic enclosure 134 may affect (through reflection, absorption, etc.) acoustic waves emitted by the propagating crack during the fracture.

Referring now to FIG. 5, a schematic perspective view illustration is provided of a workpiece 102 including a device layer 106 to be lifted off in accordance with an embodiment. As shown, the workpiece 102 being worked upon in accordance with embodiments may include a growth substrate 104, followed by a buffer layer 504 to absorb stress and defects from lattice mismatch, followed by a various additional functional layers 506, 508, 510, 512 (e.g., charge transport layers, active layers, blocking layers, confinement layers, etc.) depending upon the device to be formed, current spreading layer 514, and electrode layer 516. The device layer may be utilized for a variety of electronic and optoelectronic functions, and may be based on III-V and/or II-VI semiconductor structures, for example. By way of exemplary illustration only, in one exemplary application of the growth substrate 104 may be GaAs, with a GaInP buffer layer, followed by device layers 506, 508, 510, 512 formed of material such as, but not limited to, GaAs, InAIP and GaInP, a GaAlAs current spreading layer 514 and metal (e.g., Au) electrode layer 516. It is to be appreciated that such a stack-up is provided for illustrational purposes only for cleaving of a device layer 106 from growth substrate 104, and embodiments are not limited to such an exemplary stack-up. As shown, cleaved surface 105 may occur at a location at, or just below the buffer layer 504 or within the buffer layer 504 so that the growth substrate 104 can be reclaimed and re-used multiple times for subsequent growth of device layers 106. In accordance with embodiments various indentation(s) can be formed on front/back sides and side surfaces of the workpiece. In particular, the indentations can be formed on a back side 107 of the growth substrate 104, and side 108 surface of the growth substrate 104 though embodiments are not so limited and indentations can also be formed on the device layer 106, such as top surface 103 (e.g., of the electrode layer 516). In yet other embodiments, the indentation(s) can be formed on the growth surface of the growth substrate 104 prior to forming the device layer 106.

Referring now to FIGS. 6A-6E schematic perspective view illustrations are provided for indentations 402 formed on a workpiece 102 in accordance with embodiments. For example, the indentation 402 patterns can be formed by laser 112, though embodiments are not so limited. As shown in FIG. 6A, the indentation 402 can be along side 108 surface of the workpiece 102, and more particularly of the growth substrate 104. The indentation 402 can be along one side 108 or several sides 108. As shown in FIG. 6B, the indentation 402 can be along all sides 108, for example, a continuous pattern around the workpiece 102, or growth substrate 104. In the embodiment illustrated in FIG. 6C, the indentation 402 is formed along a back side 107 of the growth substrate 104, or top surface 103 of the device layer 106. More particularly, the indentation 402 can be formed near an edge, or side 108. The indentation 402 may also be centered as shown in FIG. 6D, or around all edges/sides 108 on the back side 107 or top surface 103 as shown in FIG. 6E. A variety of options are available. The indentations 402 in accordance with embodiment can be singular, or patterns. For example, as shown in FIG. 7A the indentations may be continuous, for example, linear or other continuous patterns. As shown in FIG. 7B the indentations can be non-continuous, or dashed, in a linear or non-linear pattern. As shown in FIG. 7C the indentations can be a pattern of dots in a linear or non-linear pattern. A variety of configurations, and combination of shapes and patterns can be used to control crack formation and propagation.

In a particular configuration, a pattern of dashes or dotted indentations 402 is formed along the back side 107 and/or side 108 of the growth substrate 104. It has been observed that indentations along the back side 107 can increase stress by as much as 20% in the growth substrate 104 near regrowth interface with the device layer 106. Upon application of the base stressor (e.g., heat/cold) the additional stress generated across the heterogeneous or homogeneous system of the growth substrate 104 and device layer 106 can be at or above a critical stress sufficient to lift off the device layer 106.

Referring now to FIGS. 8A-8B various configurations are provided in which the base stressor system includes a base stressor layer used to transfer thermal energy to the workpiece 102. In the particular embodiment illustrated in FIG. 8A the base stressor system includes the substrate holder 114, which may be a hot/cold plate, and a lower base stressor layer 122 on a bottom side of the workpiece 102. For example, the lower base stressor layer 122 may be a polymer adhesive (e.g., epoxy, acrylic, etc.) that is deposited onto the workpiece then when cooled down it contracts more than the workpiece 102. For example, the base stressor layer material may be a thermoset. Mismatch in coefficient in thermal expansion (CTE) then causes the base stress. As shown in FIG. 8B an upper base stressor layer 124 can also, or alternatively, be provided on the top side of the workpiece 102, though this is not required. Materials other than polymer may also be used. In use, the base stressor layers can be sacrificial layers that also act as a handle for lift-off of the device layer. While illustrated as single layers, it is to be appreciated that the base stressor layers 122 and 124 can each include a single layer of material, or multiple layers of the same or different materials. A variety of configurations are possible. The base stressor layer(s) can then be removed. Particular orientation of the workpiece 102 may depend upon the particular circumstances, and thus, the topmost surface shown in FIG. 8A may be back side 107 of the growth substrate 104 or alternatively top surface 103 of the device layer 106.

In alternative configurations the base stress system 120 may include mechanical and/or electrical stressors. Referring now to FIGS. 9-10, FIG. 9 is a schematic cross-sectional side view illustration of a base stress system in accordance with embodiments; FIG. 10 is a schematic perspective view illustration of a base stress system in accordance with embodiments. In each of the embodiments illustrated in FIGS. 9-10 mechanical stress may be provided by a pneumatic positioning unit 702 where mechanical stress on the workpiece 102 can be controlled by pressure in the pneumatic positioning unit 702. Various components of the system can be maintained in precise location with an alignment feature 704 (e.g., frame, plate, etc.) and fasteners 706 (e.g., screws, micrometers, etc.). In the particular embodiment illustrated acoustic generators can be used for both base stress generation in the base stress system 120, and crack propagation within the acoustic system 130. Specifically, the acoustic generators 132A (e.g., piezoelectric material) can be used for base stress generation, such as tensile stress on the workpiece 102, and acoustic generators 132B (e.g., piezoelectric material) can be used for crack propagation, such as shear stress on the workpiece 102 that can be secured within cavity 710. In the illustrated embodiments, the acoustic generators 132A, 132B may be mounted onto one or more base stressor layers 124. An acoustic enclosure 134 may also be secured within the system. In such a configuration, the opening 133 of the acoustic enclosure 134 (sec FIG. 3) may define the cavity 710.

The acoustic generators 132, whether used for base stress generation or crack propagation, can include a variety of shapes and arrangements adjacent the workpiece (e.g., in direct contact or separated and coupled to the workpiece), and may be located on one, some or every side of the workpiece 102 in accordance with embodiments.

FIGS. 11A-11E are schematic perspective view illustrations of various arrangements of acoustic generators in accordance with embodiments. In the embodiment illustrated in FIG. 11A an acoustic generator may assume a similar shape (e.g., circular) and similar size as the workpiece 102. The acoustic generator 132 may be located on the back side 107 or top surface 103 of the workpiece 102 in accordance with embodiments, or on both sides as shown in FIG. 11B. The acoustic generator(s) 132 may also have dissimilar shape, such as rectangular or square, compared to the workpiece 102 as shown in FIG. 11C. The acoustic generator(s) 132 can also be patterned as shown in FIG. 11D. For example, a specific pattern may assist crack propagation direction. In the particular embodiment illustrated the acoustic generator(s) pattern includes a concentric ring surrounding a disc, though this is merely exemplary. If separate pieces, the acoustic generators 132 can be connected to different acoustic sources. For example, such a concentric pattern may be implemented where the crack starts in the center of the workpiece. Referring to FIG. 11E multiple acoustic generators 132 can be distributed across the workpiece 102, and may be connected to different voltage sources, or differently connected to the same voltage source, in order to apply acoustic energy at different locations, and/or different times to control crack propagation. In accordance with embodiments, a plurality or array of acoustic generators 132 can be used with timing difference, where the acoustic generators are triggered at different time and/or different voltages. In the particular embodiment illustrated in FIG. 11E a 2×2 array is illustrated though the array can be larger, such as 4×4, 8×8, etc. Such arrangements may be used to control crack propagation across the workpiece 102, from one side to an opposite side, in accordance with an embodiment.

In an embodiment, the one or more acoustic generators 132 (or arrays thereof) may optionally be held by a robotic arm 109 with actuator, for example, lowered down over workpiece 102 and in contact with the workpiece either directly, or with an optional coupling agent 135 such as a backing (e.g., adhesive layer) or ultrasonic gel applied to the workpiece 102 and/or acoustic generators 132. The acoustic system 130 in accordance with embodiment can additionally include an optional acoustic enclosure 134 that can be located adjacent to, or surround one, some, or all sides of the workpiece 102. The acoustic enclosure 134 may affect (through reflection, absorption, scattering, acoustic emission, etc.) acoustic waves emitted by the propagating crack during fracture.

Referring now to FIGS. 12A-12D various exemplary configurations are illustrated in which an optional coupling agent 135 is utilized to couple one or more acoustic generators 132 or acoustic enclosure(s) 134 to a workpiece 102 in accordance with embodiments. In the embodiment illustrated in FIG. 12A a coupling agent 135 such as adhesive backing or gel for example, can be applied to the back side 107 and/or top surface 103 of the workpiece 102 and/or acoustic generator 132 or acoustic enclosure 134. The coupling agent 135 may assist in transferring acoustic waves between the acoustic generator 132 and workpiece 102, or between the workpiece 102 and acoustic enclosure 134. As shown in FIG. 12B, the workpiece 102 may be immersed or fully covered with a coupling agent 135, such as a gel. In the schematic top view illustration of FIG. 12C, the coupling agent 135 may be applied to an acoustic enclosure 134 or acoustic generator 132 that laterally surrounds the workpiece 102. FIG. 12D illustrates a workpiece 102 immersed within a coupling agent 135, and top acoustic generator 132 over the coupling agent 135 in accordance with an embodiment. In an embodiment, the configurations of FIGS. 12C-12D are combined, such as with the illustrations of FIGS. 2-3. In such a configuration the acoustic enclosure 134 may act as a reservoir to contain the coupling agent 135.

Referring now to FIG. 13, in an embodiment the acoustic enclosure 134 functions as an acoustic absorber that absorbs waves emitted at the workpiece 102 boundary. For example, the acoustic enclosure can be formed of, or include, a material such as acoustic foam, vinyl sound barrier, damping compound, acoustic putty, etc.

In the embodiment illustrated in FIG. 14, the acoustic enclosure 134 may be a diffuser material that transmits the emitted waves and hinders their reflection as the workpiece 102 boundaries. In such a configuration the crack may propagate through the entire workpiece 102 before the waves reflected at the outer surface 139 of the diffuser material reach the crack front. This may be facilitated by material selection of the diffuser material and depth (D) of the diffuser material between the inner surface 137 laterally adjacent the workpiece 102 and outer surface 139 in the direction of the crack propagation (e.g., laterally surrounding the workpiece 102). Such a diffuser material may have an acoustic impedance matching the workpiece in order to transmit rather than reflect the waves. The acoustic impedance of the materials can define transmission of acoustic waves from material to material. If the acoustic impedance of both materials match, the acoustic waves can fully propagate into the diffuser material. If the mismatch is large, most of the acoustic waves may be reflected. The acoustic impedance of the diffuser material may range from 0.0001 MRayl to 200 MRayl, or higher, in accordance with embodiments. The difference in acoustic impedance between the workpiece and the diffuser material may be 100 MRayls or less in some embodiments.

In an embodiment illustrated in FIG. 15 the acoustic enclosure 134 functions as a scattering material that can scatter the waves emitted by the crack front. As shown, in FIG. 15 the inner surface 137 and/or outer surface 139 of the acoustic enclosure can be roughened, include irregularities, or an irregular array of cavities 138 that can scatter the waves emitted by the crack front in an alternate direction. The features of the surface roughness (e.g., average surface roughness, Ra), irregularities, or irregular array of cavities can match the wavelength of the acoustic waves applied, which can range from 1 nm to 1 mm, or more specifically 10 nm to 500 μm. In operation these scattered waves may have low enough energy to not affect the crack front. The waves could also be absorbed during the scattering event before they can reach the crack front.

In an embodiment illustrated in FIG. 16, the acoustic enclosure 134 can be an acoustic generator 132 that emits characteristic waves that destructively interact with the waves emitted by the crack front (i.e., noise cancelation). The frequency, shape and amplitude of the applied acoustic waves could stay constant with time, or they could be modified as the crack front propagates.

As used herein, a “coupling” of at least two components may refer to electrically coupling a lead or connector of one electronics component with lead or connector of another electronics component. For example, two electronics components may be electrically coupled such that a current may flow from (or out of) one component to (or into) another component. In particular, two components may be electrically coupled such that components may (unilateral or bi-directional) communicate with each other by transmitting and/or receiving input analog signals and/or input digital signals. In one embodiment, components may be coupled such that they are directly connected with each other. In another aspect, components may be removably coupled together via one or more connectors. In which case, components may be removed and replaced as needed.

FIG. 17 is a block diagram of an acoustic system 130 in accordance with an embodiment. As described herein, may be configured to drive an acoustic generator with one or more piezoelectric devices (or materials) with an electrical output signal (as a series of high-voltage pulses) in order to acoustically cleave a workspace (or substrate). As shown, the acoustic system 130 includes an operating (or low-voltage) power supply 154, a signal generator 143, a high-voltage power supply 152, an acoustic cleaving circuit 144, and an acoustic generator 132, which may include a piezoelectric device (or material) 161. In one embodiment, the acoustic system 130 may include more or less elements. For example, the acoustic system may include multiple (or two or more) acoustic cleaving circuits 144, each acoustic cleaving circuit configured to drive (or control) one or more acoustic generators 132. In one embodiment, the multiple acoustic cleaving circuits may be configured to drive (e.g., an array of) one or more piezoelectric devices (of one or more acoustic generators). More about controlling multiple piezoelectric devices (and/or acoustic generators) is described herein.

The acoustic system 130 includes a housing 151 or enclosure that houses at least some of the elements of the system 130. As shown, the housing 151 includes the low-voltage supply 154, the signal generator 143, the high-voltage power supply 152, and the acoustic cleaving circuit 144. For instance, the housing may be formed of any material, such as a metal, an alloy, and/or a plastic in which the elements may be coupled (or connected). In one embodiment, the housing may include one or more openings or access points, which allow elements to be added and/or removed. In another aspect, the housing may not include at least some of the elements shown herein. For instance, the signal generator 143 may be a separate electronic device that may be coupled (e.g., via one or more connectors of the housing 151) to the acoustic cleaving circuit 144. For example, the housing includes two connectors 157 and 158, which may be arranged to couple the acoustic generator to the acoustic cleaving circuit 144 with leads. In one embodiment, the connectors may be any type of connector, which may allow connectors of the acoustic generator to be removably coupled to the housing 151. For example, the connectors 157 and 158 may be banana jacks, which connect to the acoustic generator via banana plugs (of the generator). In another aspect, the housing may include additional connectors, such as having one or more connectors that may be arranged to couple to the signal generator 143, which may be an external device, as described herein.

As described herein, the acoustic generator 132 may include one or more piezoelectric devices 161 that may be driven by the acoustic system 130 to oscillate (or actuate) at high frequencies (e.g., between 1 kHz to 100 MHZ) in order to acoustical cleave the workpieces. In particular, the piezoelectric device(s) may be arranged to actuate in one direction in response to a positive voltage cycle of an amplified output signal, S_out, produced by the acoustic cleaving circuit 144, and may be arranged to actuate in another (e.g., opposite) direction in response to a negative voltage cycle of S_out. More about driving the piezoelectric device(s) is described herein.

In one embodiment, the low-voltage power supply 154 may be arranged to provide power at a low voltage (below a voltage threshold) to operate one or more of the components of the system, such as the signal generator 143 and the acoustic cleaving circuit 144. For example, the low voltage power supply may be a 24-volt (V) direct current (DC) power supply. In another aspect, the low-voltage power supply may be arranged to provide power at other voltages, such as being a 12V supply. The high-voltage power supply 152 may be arranged to provide high voltage supply (e.g., above the voltage threshold) DC power to one or more components of the acoustic system 130. In particular, the supply 152 includes a positive voltage rail, +V_H, and a negative voltage rail, −V_H, for supplying driving power to the acoustic generator 132. For example, the high-voltage power supply may be arranged to provide a maximum voltage (e.g., per rail) between 0 V and 20 kV. In one embodiment, each rail may range between −20 kV to +20 kV. In another aspect, the high-voltage power supply may provide a maximum voltage between 3 kV and 20 kV. In some aspects, the maximum voltage may be greater than 20 kV. In one embodiment, the power supply may be arranged to provide power across for one or more voltages (e.g., across one or more voltage rails).

The signal generator 143 may be arranged to provide at least one input electrical signal, S_in, for driving the piezoelectric device(s) 161. In some embodiments, the signal generator may be arranged to provide one or more electrical signals. For example, the generator may be arranged to provide multiple input signals for driving multiple piezoelectric devices of the acoustic generator 132. More about driving multiple devices is described herein.

In one embodiment, S_in may be any type of signal that may include a positive cycle and a negative cycle, such as a sinusoidal wave, a square wave, etc. In one embodiment, the input signal may have a frequency from 1 Hz to 100 MHz. In another aspect, the input signal may have a time period from 10 ns to 10 s. In another aspect, the input signal may include one or more electrical pulses that may be supplied at a particular frequency. In another aspect, the input signal may have a pulse width that varies between 10 ns and 10 s, while the time period between each pulse may range from 20 ns to 10 s. In another aspect, the acoustic cleaving circuit 144 may be arranged to condition S_in to produce the series of pulses, which may be used to drive the acoustic generator. More about the acoustic cleaving circuit is described herein.

In one embodiment, S_in provided by the signal generator 143 may be used to resonate the (piezoelectric device 161 of the) acoustic generator 132 at a driving frequency, which may be the same as the resonant frequency of the piezoelectric device, its frequency overtones, or other frequencies. In which case, S_in may include (or have) a frequency at the resonant frequency of the piezoelectric device. More about how the input signal, S_in, drives the acoustic generator is described herein.

In one embodiment, the acoustic cleaving circuit 144 may be arranged to drive the (e.g., piezoelectric device 161 of the) acoustic generator 132 in response to receiving an input signal, S_in, from the signal generator 143. In particular, the acoustic cleaving circuit may include an amplifier that produces S_out for driving the piezoelectric device based on a series of pulses received from (or based on S_in received from) the signal generator. For example, the acoustic cleaving circuit may include two switches, a first (or bottom) switch 159 and a second (or top) switch 160 in a push-pull amplifier arrangement that may supply an amplified output signal, S_out, that may alternate the supply of current to the piezoelectric device 161 in order to actuate the device. For example, during a positive cycle of the S_in the acoustic cleaving circuit may be in a first configuration in which the switch 160 is closed and switch 159 is open, thereby causing the acoustic cleaving circuit 144 to provide power from the high-voltage power supply 152 at or near +V_H to the piezoelectric device 161. In which case, the piezoelectric device 161 may extend (or displace) along one direction. During a negative cycle of S_in, however, the acoustic cleaving circuit may be in a second configuration in which the switch 160 is open and switch 159 is closed, causing the acoustic cleaving circuit to supply current to the low-voltage power supply 152 at or near −V_H. In this case, the piezoelectric device 161 may retract along an opposite direction from its extended displacement (e.g., back to its original position). In one embodiment, these two configurations may be repeated at a high frequency in order to oscillate the piezoelectric device 161 back and forth. More about the acoustic cleaving circuit 144 is described herein.

The acoustic system 130 also includes a controller 205 that may be configured to perform one or more operations. The controller 205 may be a special-purpose processor such as an application-specific integrated circuit (ASIC), a general-purpose microprocessor, a field-programmable gate array (FPGA), a digital signal controller, or a set of hardware logic structures (e.g., filters, arithmetic logic units, and dedicated state machines). The controller is configured to perform operations to cause the system 130 to drive the piezoelectric device 161. More about the operations that may be performed by the controller are described herein.

The controller 205 may be configured to control the signal generator 143 by causing the generator to produce S_in. The controller may be communicatively coupled to least some elements of the system 130, such as the signal generator 143. In one embodiment, the controller may be a separate device from the signal generator and/or the housing 151, or may be a part of the housing and/or signal generator. In one embodiment, the controller may be configured to initiate operations of the system 130, such as initiating the driving of the switches 160 and 159 based on one or more conditions. For example, the controller may cause the signal generator to start driving the switches upon detecting that the power supply 152 has been activated (e.g., switched on). In one embodiment, operations performed by the controller may be implemented in software (e.g., as instructions stored in memory and executed by either controller) and/or may be implemented by hardware logic structures.

FIG. 18 is another block diagram of the acoustic system 130 in accordance with an embodiment. In particular, this figure shows an expanded view of the acoustic cleaving circuit 144. As shown, the circuit includes several electronic components, which may be housed, a part of, or disposed on the acoustic cleaving circuit 144. For instance, the acoustic cleaving circuit 144 may include one or more printed circuit boards (PCBs) on which one or more of the components of the circuit are mounted and/or may be communicatively coupled.

The acoustic cleaving circuit 144 includes several isolators 174a-174c, several inverters 175a-175f, several gate drivers 177a and 177b, one or more capacitors 178a-178n (as a capacitor bank 173), the pair of switches 159 and 160, a pre-charging circuit 201, and several terminals 180, 181, and 182. In one embodiment, the acoustic cleaving circuit 144 may include more or less components. For example, the acoustic cleaving circuit may include more inverters, or may include less isolators. As another example, the circuit 144 may not include the pre-charging circuit 201.

The acoustic cleaving circuit 144 may include several components that may be made up of one or more components described herein. For instance, the acoustic cleaving circuit 144 includes a first (or bottom) driving circuit 171 that includes a signal path for driving the switch 159, and a second (or top) driving circuit 170 that includes a signal path for driving the switch 160. The circuit 144 includes an input signal driving circuit 183 that includes one or more signal paths based on an input signal, e.g., S_in, received from the signal generator 143. The circuit 144 also includes a push-pull circuit 172 that includes both switches 159 and 160, and may be coupled to the high-voltage power supply 152 via terminal 181 (a positive voltage terminal) and terminal 182 (a negative voltage terminal). Although each circuit may be illustrated has having specific components of the circuit 144, one or more circuits may include components of one or more other circuits.

The isolators 174a-174c may be any type of isolator that may be designed to receive an electrical signal (or voltage) as input and pass through (or transfer) at least a portion of the signal as output. In particular, the isolators may be any type of (e.g., digital) isolator that may be arranged to electrically isolate one or more components of the acoustic system 130. As an example, the isolator 174a may be arranged to isolate the inverter 175a from the signal generator 143. In one embodiment, the isolators may be opto-isolators that isolate two or more components within their signal paths using light transmission.

The inverters 175a-175f may be any type of inverter that may be arranged to receive an electrical signal and produce an inverted version of the electrical signal. For instance, when the input signal is a sine wave, the inverter may apply a 180° phase shift. In one embodiment, at least some of the inverters may be inverting Schmitt triggers that may be arranged to pass through an inverted version of an input signal as an output signal. In one embodiment, the Schmitt triggers May be designed to mitigate noise from high-voltage swings and mitigate transient currents caused by the push-pull circuit 172 from feeding back into the input signal.

The gate drivers 177a and 177b may be any type of gate drivers that are arranged to receive an input electrical signal, and based on the input signal produce an output driving signal (e.g., voltage) to drive one or more switches.

As described herein, the push-pull circuit 172 may include switch 159 and switch 160 in a push-pull arrangement. In particular, the switches may be any type of high-power switches that are designed to turn on and off, based on an input signal, at high frequencies to provide high power to a load, which in this case may be (one or more piezoelectric devices of) the acoustic generator 132. In one embodiment, each of the switches may be the same type of switch. For example, the switches 159 and 160 may be insulated-gate bipolar transistors (IGBTs). Specifically, both the IGBTs may be n-channel transistors, as shown. In another embodiment, the switches may be Gallium Nitride (GaN) field-effect transistors (FETs). In some embodiments, the switches may be any type of transistor. In one embodiment, discharge circuitry may also be accomplished using a resistor divider which monitors voltage on the capacitor(s) that triggers a Zener diode at a particular rail voltage based on the configuration of the circuit. This may result in the Zener diode triggering a silicon-controlled rectifier (SCR) which may transfer the energy present on the capacitor bank onto the piezoelectric device through a switch wholes turn on may be controlled through optocoupler based on user input.

A description of the acoustic cleaving circuit 144 and the signal path(s) of an input signal produced by the signal generator 143 will now be described. As shown, the signal generator 143 may be coupled to the input signal driving circuit 183, which may be arranged to produce one or more input signals based on an input signal, S_in, received from the signal generator 143 for driving the push-pull circuit. In particular, the circuit 183 includes the isolator 174a, which (e.g., has an input terminal that) may be coupled to the signal generator 143 and (e.g., has an output terminal that) may be coupled to inverter 175a, which may also be coupled to inverter 175b. The input signal driving circuit 183 may be coupled to both driving circuits 170 and 171 as follows to create at least two signal paths, one for each of the driving circuits. In particular, inverter 175a may be coupled to the driving circuit 170 and may be coupled to inverter 175d. In addition, inverter 175d may be coupled to driving circuit 171. Thus, the inverter 175a may be coupled between the signal generator 143 and the driving circuit 170, whereas both inverters 175a and 175d may be coupled between the signal generator 143 and the driving circuit 171. As a result, the driving circuit 170 may receive an inverted version of the S_in received by the input signal driving circuit 183 from the signal generator 143, whereas the driving circuit 171 may receive a non-inverted version of S_in (e.g., the original input signal). For example, the signal generator 143 may be configured to produce S_in, such as an analog or digital (DC) signal, or a digital (DC) signal, such as a square wave. The acoustic cleaving circuit 144 may be arranged to receive the input signal from (e.g., through a coupling with) the signal generator 143. In particular, the isolator 174a may receive S_in and pass or transfer (at least a portion) of the input signal through to the inverter 175a, which may perform a 180° phase shift and provide the phase-shifted signal to the driving circuit 170 and to the inverter 175d. Inverter 175d may perform another 180° phase shift and provide the non-phase shifted input signal (e.g., the original input signal or a version of the original input signal received from the signal generator 143) to the driving circuit 171.

As shown, both of the driving circuits 170 and 171 may be coupled between the input signal driving circuit 183 and the push-pull circuit 172. In particular, the driving circuit 171 may be coupled to switch 159, and driving circuit 170 may be coupled to switch 160. Both of the driving circuits may have the same components (e.g., coupled in series) in a same arrangement, since both driving circuits are receiving input signals that are phase shifted with respect to each other. For example, the driving circuit 171 may include inverter 175e that may be coupled between inverter 175d and isolator 174c, which may be coupled to another inverter 175f that may be coupled to gate driver 177b. The driving circuit 170 may include inverter 175b that may be coupled between inverter 175a and isolator 174b, which may be coupled to inverter 175c that may be coupled to gate driver 177a.

In one embodiment, as a result of having the same arrangement, both driving circuits may drive their respective switches out of phase. For instance, driving circuit 170 may be configured to generate a driving signal that may be an inverted version of the input signal from the signal generator for driving switch 160, whereas driving circuit 171 may be configured to generate a driving signal that may be a non-inverted version of the input signal for driving switch 159.

The push-pull circuit 172 may be coupled to both driving circuits 170 and 171 and to the high-voltage power supply 152. In particular, a gate of the first switch 159 may be coupled to the driving circuit 171 and the emitter of the switch 159 may be coupled to the negative terminal 182 that may be coupled to the negative voltage rail, −V_H, of the high-voltage power supply 152 that may be arranged to provide negative voltage supply. Similarly, the gate of the second switch 160 may be coupled to the driving circuit 170 and the collector of the switch 160 may be coupled to the positive terminal 181 that may be coupled to the positive voltage rail, +V_H, of the high-voltage power supply 152 that may be arranged to provide positive voltage supply.

Each of the switches may be coupled together. In particular, the collector of the first switch 159 may be coupled to the emitter of the second switch 160 via an output terminal 180 of the push-pull circuit 172. In addition, the acoustic cleaving circuit 144 may be coupled to the acoustic generator 132 via at least some of the terminals. In particular, the acoustic generator 132 may be coupled to the output terminal 180 and the negative terminal 182. In addition, the capacitor bank 173 that may include one or more capacitors 178a-178n may be coupled in parallel to the push-pull circuit 172. In particular, the capacitor bank 173 may be coupled to the high-voltage power supply 152 via terminals 181 and 182. In one embodiment, the capacitors may be any type of capacitor (e.g., ceramic, film, etc.) that may be rated for high-voltages, such as rated up to 20 kV. In particular, the capacitors may be rated for the output voltage of the voltage supply 152, which may be applied across the push-pull circuit 172. In one embodiment, each of the capacitors may be the same type of capacitor. In another embodiment, each of the capacitors may have a capacitance within a range of 5 nF and 500 mF.

As described herein, the push-pull circuit may be an amplifying circuit that may be arranged to produce an amplified output signal, S_out, (at the output terminal 180) for driving the acoustic generator 132, in response to receiving one or more input signals from the driving circuits 170 and 171. For instance, as the driving circuits 170 and 171 receive input signals based on an input signal, S_in, provided by signal generator 143, which may have oscillating negative and positive cycles at high frequencies, the switches 159 and 160 may be driven to open and close in order to supply high power from the power supply 152 to the acoustic generator in a push-pull fashion, where the capacitor bank 173 may provide energy during operation of the amplifier in order to reduce voltage sag due to the piezoelectric material load.

The circuit 144 also includes a pre-charging circuit 201 that may be coupled between the capacitor bank 173 and the high-voltage power supply (e.g., terminal 181). The pre-charging circuit 201 may be configured to charge the capacitor bank before the push-pull circuit 172 produces an amplified output signal to drive the piezoelectric device 161. In particular, the circuit 201 may limit current drawn from the power supply 152 by the capacitor bank 173 as the capacitor bank charges from a discharged state, such as when the circuit is initially activated. The pre-charging circuit 201 includes a relay 200 that is in parallel with a relay 202 and a resistive element 203, such as one or more resistors. In one embodiment, the circuit 201 may include one or more other electronic elements, such as a capacitor and/or an inductor. When the circuit 144 is in a first (or initial) configuration, the relay 200 may be in an open state and relay 202 may be in a closed state, thereby causing the resistive clement 203 to be in series with the capacitor bank. In one embodiment, the circuit may be in this initial configuration for a period of time until the capacitor bank reaches the same voltage as the power supply 152. In one embodiment, this first configuration may occur when the circuit is initially activated and/or while the capacitor bank 173 is not fully charged (discharged). As a result, the capacitor bank may charge without pulling a significant amount of current (e.g., infinite current) from the power supply due to the resistive element 203. Limiting the current during a charging period may prevent circuitry and components of the circuit 144 from damage. In one embodiment, the first configuration may occur during a predefined period of time, such as a time constant of the circuit 144. After the period of time, the circuit 144 may switch to a second (e.g., active) configuration in which relay 200 is closed and relay 202 is open, thereby connecting the capacitor bank 173 to the terminal 181 and allowing the circuit 144 to drive the piezoelectric device 161. In one embodiment, the relays 200 and 202 may be controlled by one or more control circuits (not shown).

In one embodiment, the configuration of the circuit 144 may be controlled by controller 205. In which case, the controller may be communicatively coupled to relays 200 and 202, and may be configured to control the relays based on which configuration the circuit 144 is to operate.

As described thus far, the acoustic system 130 may be configured to drive a piezoelectric device 161 of the acoustic generator 132, which may be used to create an indentation upon a workpiece in order to promote fracture of the piece. In another embodiment, the system 130 may be configured to drive multiple (e.g., similar, or different) piezoelectric devices to cleave a workpiece. In particular, the system may control multiple piezoelectric devices in order to create an indentation to promote a fracture, and to provide a controlled crack propagation along the workpiece. For example, the system 130 may control an array of one or more piezoelectric devices (e.g., at least partially in a sequential manner) to initiate and form (or propagate) a crack along a path of the workpiece. For instance, the array of piezoelectric devices may be controlled at least partially in a sequential manner to create a crack along a path that may coincide with an arrangement of the array of piezoelectric devices. FIGS. 19-21 provide examples of block diagrams of the acoustic system 130 that is capable of driving multiple piezoelectric devices.

Turning to FIG. 19, this figure shows a block diagram of the acoustic system 130 for driving multiple piezoelectric devices 161 and 161′ of the acoustic generator 132 in accordance with an embodiment. As shown, the system 130 includes multiple signal generators 143 and 143′ and multiple power supplies 152 and 152′. Each of the signal generators is producing one or more input signals, S_in and S_in′, for driving one or more piezoelectric devices. For example, S_in may be used to drive piezoelectric device 161, while S_in′ may be used to drive piezoelectric device 161′, as shown. Each of the high-voltage power supplies may be arranged to supply one or more output voltages for driving one or more piezoelectric devices. In particular, each of the supplies may provide power at a same voltage, or may provide power at different voltages. For example, supply 152′ provides power over rails +V_H′ and −V_H′, which may provide power at a different voltage than supply 152 that supplies +V_H and −V_H. In one embodiment, the system 130 may drive one or more piezoelectric devices at differing voltages for various reasons. For example, differing voltages may result in differences in displacement of piezoelectric devices. As an example, one voltage may displace one piezoelectric device more than another voltage applied upon another piezoelectric device. In another embodiment, different piezoelectric devices may be rated different, such as some requiring one output voltage to be driven, while one or more other devices may require a different output voltage. In one embodiment, applying varying voltages may also allow for controlling the amount of stress introduced at a crack front and a crack velocity.

As shown, the power supplies 152 and 152′ and the signal generators 143 and 143′ may be separate (independent) electronic devices. In another embodiment, at least some of the devices may be a part of (or form) one electronic device. For example, although supplies 152 and 152′ are shown as separate blocks, they may be a part of one power supply. In which case, a power supply of the system 130 may provide one or more output voltages, across multiple pairs of positive and negative rails. In another embodiment, the signal generators may be a part of one generator.

The cleaving circuit 144 may be arranged to drive two (or more) piezoelectric devices 161 and 161′ with output signals, S_out and S_out′, respectively, responsive to the input signals S_in and S_in′ from the signal generators. In particular, the cleaving circuit 144 includes several switches in several push-pull configurations. For example, along with switches 159 and 160, the cleaving circuit 144 includes switches 159′ and 160′ in a push-pull configuration for driving the device 161's with the output signal S_out′. In which case, each signal generator may be configured to drive switches in a push-pull configuration (e.g., push-pull circuit) to provide output voltage from the switches' respective high-voltage power supply to their respective piezoelectric device. Thus, this system 130 allows for performing a cleaving propagation based on how the devices 161 and 161′ are controlled.

Thus, the system 130 allows for several piezoelectric devices to be driven, where the devices may be the same (e.g., rated the same) or may be different. In particular, as described herein, elements of the system 130 may be configured to drive different piezoelectric devices across different output voltages, which also allows for variation of how the devices are controlled. As a result, the system may provide better control of crack propagation.

FIG. 20 is another block diagram of the acoustic system 130 for driving multiple piezoelectric devices 161 and 161′ in accordance with an embodiment. As shown, the system 130 includes at least some components shown in FIG. 18. For example, the system 130 includes high-voltage power supply 152, which includes the two pairs of positive and negative rails for supplying one or more output voltages into the cleaving circuit 144. The system 130 includes the two signal generators 143 and 143′, the cleaving circuit 144, and the acoustic generator 132.

As shown, the cleaving circuit 144 includes at least some duplicated components illustrated in FIG. 18 for driving the piezoelectric devices 161 and 161′. In particular, the circuit 144 includes push-pull circuits 172 and 172′, coupled to piezoelectric devices 161 and 161′ respectively, where each push-pull circuit is for driving its respective piezoelectric device with power (output voltage) supplied by the power supply 152. In particular, the additional push-pull circuit 172′ includes switches 159′ and 160′ in a push-pull configuration, where switch 159′ is driven by driving circuit 171′, and switch 160′ is driven by driving circuit 170′. In one embodiment, the switches of the push-pull circuit 172′ may be of a same type as the switches of circuit 172. In another embodiment, they may be different. For example, the pair of switches of either of the circuits may be based on the rating (e.g., power requirements) of the piezoelectric devices of which the switches are driving in their push-pull configuration. In addition, input signal driving circuit 183′ may be arranged to receive signal S_in′ from the signal generator 143′ and to split the signal into two signals (one in phase with S_in′ and another out-of-phase with S_in′) and providing the signals to the driving circuits 170′ and 171′. In addition, circuit 172′ includes several terminals, where a first terminal 182′ may be coupled to the negative voltage rail −V_H′ and to the device 161′, a second terminal 181′ may be coupled to the positive voltage rail +V_H′, and terminal 180′ may couple switches 159′ and 160′ to piezoelectric device 161′ for providing the device with S_out′.

As shown, push-pull circuits 172 and 172′ may be coupled (in parallel) to capacitor banks 173 and 173′, respectively. In one embodiment, the capacitor banks may be rated the same. In another embodiment, they may be rated differently, based on the power output from the power supply 152 that may be drawn by a capacitor banks' respective push-pull circuit. In particular, the capacitor banks may be based on the output voltage across its terminals. For example, capacitor bank 173 (or capacitors of the bank) may have one capacitance, while the capacitor bank 173′ may have a different capacitance, based on the output voltage of the power supply 152.

In one embodiment, the system 130 may drive the piezoelectric devices 161 and 161′ in a similar or different manner. For example, both devices may be driven with similar (or the same) output signals (e.g., at a same driving frequency), such that both devices oscillate in a substantially similar manner and/or during similar (or same) time periods. In another embodiment, the piezoelectric devices may be driven differently. For example, both devices may be driven to oscillate differently (e.g., according to different driving frequencies of S_out and S_out′, based on their respective input signals), according to different (or similar) power levels. In addition, both devices may be driven at different periods of time. In particular, the signal generators 143 and 143′ may be arranged to independently drive the push-pull circuits 172 and 172′, respectively, during at least partial overlapping or non-overlapping periods of time. For example, the signal generator 143 may drive device 161 for a first time period, while signal generator 143′ may drive device 161′ for a second time period that may not overlap the first time period.

As described herein, the system 130 may be arranged to drive multiple piezoelectric devices. In one embodiment, the system may be arranged to drive two or more devices, where each device may be driven using at least some duplicated components of FIG. 17. In particular, each piezoelectric device may be driven with a respective push-pull circuit having (e.g., dedicated) switches operating in a push-pull configuration. In another embodiment, at least some circuitry of the cleaving circuit may be arranged to drive multiple piezoelectric devices. For example, two or more push-pull circuits may share common circuitry (e.g., at least one switch) for driving multiple piezoelectric devices. Such a design may allow circuitry of the system 130 to be more compact, thereby reducing complexity and cost of the system. FIG. 21 illustrates an example of a block diagram of the acoustic system for driving several piezoelectric devices.

Turning to FIG. 21, this figure shows the acoustic system 130 configured to drive multiple piezoelectric devices 161 and 161′ using common (shared) circuitry. In particular, this figure shows that the cleaving circuit 144 includes the push-pull circuit 172 that includes a pair of switches, switches 159 and 160, which may be coupled to the piezoelectric device 161, and may be arranged to drive the device with S_out. As described herein, the push-pull circuit 172 may couple to the piezoelectric device 161, via an output terminal 180. In addition, the circuit 172 may couple to the power supply 152 via terminals 181 and 182.

The cleaving circuit also includes another push-pull circuit 172′ with a second pair of switches, 159 and 160′, which may be coupled to the piezoelectric device 161, and may be arranged to drive the device with S_out′. Specifically, the push-pull circuit 172′ includes an output terminal 180 coupled to both switches 160′ and 159, and is coupled to the piezoelectric device 161′. The push-pull circuit 172′ is also coupled to rails +V_H′ and −V_H′ via terminals 181′ and 182′. As shown, the emitter of switch 159 may be coupled to both terminals 182 and 182′. As a result, both push-pull circuits share switch 159 as a common switch (e.g., coupled to both negative rails of the power supply 152). As described herein, the cleaving circuit 144 may be configured, based on input signals from the signal generator 143, to operate at least some of the switches in different push-pull configurations in order to drive one or more piezoelectric devices. More about the operation of the cleaving circuit 144 is described herein.

As shown, the cleaving circuit 144 includes at least some electronic components, as described herein. For example, the circuit 144 includes the first driving circuit 171 coupled between switch 159 and the signal generator 143, the second driving circuit 170 coupled between switch 160 and the signal generator 143. The circuit 144 also includes another driving circuit 170′ that may be coupled between switch 160′ and the signal generator 143. Both capacitor banks 173 and 173′ may be coupled to terminals of their associated push-pull circuits. For example, capacitor bank 173 may be coupled to terminal 181 and 182, while capacitor bank 173′ may be coupled to terminal 181′ and 182′.

The signal generator 143 may be configured to control the push-pull circuits 172 and 172′ to drive their respective piezoelectric devices. In one embodiment, the generator 143 may drive the piezoelectric devices during non-overlapping periods of time. For example, during a first period of time the signal generator 143 may supply input signals S_in and S_in′ to driving circuits 171 and 170, respectively, in order to control switches 159 and 160 to draw power from the power supply 152 and drive the piezoelectric device 161 with S_out, in a push-pull fashion as described herein. In one embodiment, both input signals may be the same, or may be different. For example, S_in′ may be an out-of-phase version of S_in. In particular, both input signals may oscillate out of phase between positive and negative cycles at a given frequency.

During a second period of time, which may be subsequent (and/or a non-overlapping period of time) to the first period of time, the signal generator 143 may cease producing at least one of the input signals, such as S_in′, and begin to provide input signals S_in and S_in″ to driving circuits 171 and 170′. In which case, switches 159 and 160′ may operate in a push-pull configuration to draw power from (e.g., rails +V_H′ and −V_H′) and drive device 161′ with S_out′. Thus, the signal generator 143 may generate pairs of input signals during different time periods to drive different pairs of switches in push-pull configurations. In one embodiment, S_in may be an out-of-phase version of either (or both) S_in′ and S_in″. In another embodiment, each pair of input signals may be different or similar to each other. In which case, the signal generator may drive different piezoelectric devices at different driving frequencies based on the input frequency of the input signals.

In another embodiment, the signal generator 143 may be configured to drive one or more of the piezoelectric devices 161 and 161′ using this configuration during at least partial overlapping periods of time. In which case, the signal generator may produce input signals S_in, S_in′ and S_in″ such that the switches 159, 160, and 160′ are driven at the same time (e.g., the switches receiving driving signals from their respective driving circuits at the same time). This may allow multiple (similar or different) piezoelectric devices to be controlled at any given time in order to propagate a crack, as described herein.

As a result, this design may allow for multiple pairs of switches, where each pair of switches may share a common switch, to be operated during overlapping or non-overlapping time periods in push-pull configurations.

In one embodiment, one or more of the examples described herein may include one or more pre-charging circuits, such as circuit 201 to pre-charge one or more capacitors. For example, a pre-charging circuit (and a relay) may be coupled between capacitor bank 173′ and terminal 181′. In one embodiment, each of the pre-charging circuits may be configured to charge their respective capacitor banks for a period of time from which the circuit 144 is activated, as described herein. As a result, pre-charging may occur during each startup of the equipment or tool, as described herein.

As described thus far, the acoustic system 130 may drive a piezoelectric device by oscillating the device back and forth at a high frequency. When the piezoelectric device oscillates at frequencies other than its resonant frequency, more power is required to drive the device. In particular, when driving a piezoelectric device at a frequency other than its resonant frequency, the device is less active, and as a result requires more power in order to drive the device harder. In order to optimize energy transfer, thereby requiring less driving voltage from the power supply into the piezoelectric device, the device may be driven at its resonant frequency. The following embodiments include examples of driving a piezoelectric device at its resonant frequency and/or at over tones (e.g., multiples of its resonant frequency) in order to optimize power transferred into the device.

Referring to FIG. 22, this figure includes a block diagram of an acoustic system 130 that is capable of driving a piezoelectric device 161 at its resonant frequency in order to optimize power transfer. The system 130 includes a power supply 210, a power factor correction (PFC) circuit 211, an alternating current (AC)-to-DC converter 212, and an acoustic cleaving system 213 that includes a power converter 214, a function (or signal) generator 215, an amplifier 216, and the piezoelectric device 161. In one embodiment, the acoustic system 130 may include less or more components. For example, the PFC circuit 211 may be an optional circuit. As another example, the system 130 may include one or more acoustic cleaving systems 213, where each system may be used to drive one or more piezoelectric devices. More about multiple acoustic cleaving systems is described herein.

The power supply 210 may be an AC power supply that may be arranged to supply AC power (e.g., at a high AC voltage) to a load. In one embodiment, the power supply 210 may be the AC mains, or may be a converter, such as a DC-to-AC converter that is designed to convert DC power into AC power. The PFC circuit 211 may be coupled between the AC power supply 210 and the AC-to-DC converter 212, and may be arranged to receive AC power and to correct a power factor of the AC voltage supplied by the AC power supply. In one embodiment, the PFC circuit may be an active or a switching circuit that uses one or more active devices, such as power switches, for correcting power factor. In another embodiment, the PFC circuit may be a passive circuit that uses non-active electronic components, such as diodes and capacitors, to correct the power factor of the supplied AC power. In one embodiment, the PFC circuit 211 may be arranged to maintain the power factor at or approximately 0.9. The AC-to-DC converter 212 may be coupled to the AC power supply 210, and may be arranged to convert the AC voltage supplied by the AC supply into a DC voltage. The converter 212 may be coupled to the AC power supply, when the system 130 does not include the PFC circuit 211. In another embodiment, the converter 212 may be coupled to the PFC circuit 211, and may convert AC power supplied by the circuit 211.

The power converter 214 may be coupled between the converter 212 and the amplifier 216, and may be arranged to convert the DC voltage supplied by the converter 212 into another DC voltage (e.g., driving voltage) for driving the piezoelectric device 161. In one embodiment, the driving voltage may be a predefined voltage based on a specification of the piezoelectric device. In one embodiment, the power converter may include at least one of a buck, boost, and buck/boost converter that may be designed to produce an output DC voltage by increasing and/or decreasing an input DC voltage supplied by the converter 212. For example, the converter 214 may apply gain to the DC voltage supplied by the converter 212 to increase (e.g., boost) or decrease (e.g., buck) the input voltage from the AC-to-DC converter. In one embodiment, the power converter 214 may be an isolated converter that includes an input and output stage, where current may not flow between the two stages. The converter may be isolated using a (e.g., flyback or forward-mode) transformer that separates the two stages. In another embodiment, the power converter 214 may be a non-isolated converter, where current may flow between the input and output stages. An example of a non-isolated converter may include a boost or buck converter. In one embodiment, the non-isolated converter may not use a transformer for boosting the input DC voltage. In one embodiment, the power converter may include electronics that allow the converter to produce a desired DC voltage based on an input DC voltage. For instance, the converter may include control electronics (e.g., micro controller), a pulse-width modulator, and other power converter components (e.g., a transformer, in the case of an isolated topology).

The function generator 215 may be configured to produce an input signal, e.g., S_in, for driving the piezoelectric device. As described herein, the device 161 may be driven at its resonant frequency in order to optimize input power. In which case, the input signal produced by the function generator may be at (or have a frequency at) a resonant frequency of the piezoelectric device. In another embodiment, S_in may have an overtone frequency of the piezoelectric device's resonant frequency. For example, when the resonant frequency of the device 161 is 100 kHz, S_in's frequency may be defined as 100 kHz, 200 kHz, 300 kHz, etc., which may allow the system to drive the device 161 efficiently. In one embodiment, the frequency of the input signal may be set by a user, e.g., through an input device that may be coupled to the function generator. In one embodiment, S_in may be any type of input signal, such as a sine wave, square wave, etc.

In one embodiment, the function generator 215 may be coupled to and draw power from the AC power supply 210. In which case, the function generator is powered using the supplied AC voltage. In lieu of or in addition to drawing power from the AC power supply, the function generator may be (optionally) coupled to the power converter 214 and may be powered by the converter. In which case, the converter 214 may be configured to produce a different DC voltage for the function generator. In particular, the converter 214 may produce a first DC voltage for driving the piezoelectric device and may produce a second DC voltage for providing power to the generator 215. In one embodiment, the second DC voltage may be less than the first DC voltage.

The amplifier 216 may be coupled to the AC-to-DC converter 212, the function generator 215, and the piezoelectric device 161, where the amplifier may be arranged to produce an output signal, e.g., S_out, by amplifying the input signal, S_in, received from the function generator according to a DC voltage, which may be supplied by the converter 212 and/or 214, and drive the piezoelectric device using the S_out. In particular, the amplifier 216 may be coupled to the converter 214, which produces boosts and/or bucks the DC voltage from the converter 212, and receives the DC voltage, which the amplifier uses to amplify S_in. In which case, the amplifier may be an operational amplifier that may be configured to produce an output signal (e.g., sinusoidal, square, etc.) to apply −V (e.g., 0 volts) and +V across the piezoelectric device 161. The function generator controls the amplifier to modify an input signal, while the DC power drawn by the amplifier may be controlled by the converter 214. As a result, the switching of the DC voltage by the amplifier may be at the piezoelectric device's resonating frequency, thereby resulting in S_out being at the resonant frequency of the device 161. In one embodiment, the amplifier may be a voltage amplifier that increase the amplitude of S_in, according to DC power drawn from the converter 214. In one embodiment, the amplifier may be a single (e.g., operational) amplifier. In another embodiment, the amplifier 216 may be a bridge amplifier that uses two or more operational amplifiers for amplifying an input signal. As a result, the acoustic system 130 may be designed to drive the piezoelectric device at its resonant frequency, which allows the system to maximize power into the device 161.

As shown herein, the acoustic system 130 may be arranged to power the acoustic cleaving system 213 for driving the piezoelectric device 161. In one embodiment, the system may include one or more acoustic cleaving systems 213, each of which may be powered by the power supply 210. In which case, each acoustic cleaving system may draw power from the power supply and may be arranged to drive one or more piezoelectric devices. In one embodiment, each acoustic cleaving system may drive its respective piezoelectric device according to its respective resonant frequency and/or at a different DC voltage. For example, each system 213 may include a power converter that may be designed to produce a specific DC voltage that may be applied across its respective piezoelectric device. As a result, each acoustic cleaving system's respective amplifier may draw a specified DC power to drive the system's respective piezoelectric device at a resonant frequency of the respective piezoelectric device.

This system 131 allows for multiple piezoelectric devices (e.g., simultaneously) to be driven using a common power supply. Such a configuration, having multiple cleaving systems 213, requires one or more amplifiers for each system. In another embodiment, piezoelectric devices may be driven by a single amplifier, thereby reducing the footprint of the electronic components of the system 130. FIG. 23 illustrates an example of driving piezoelectric devices using an amplifier.

Turning to FIG. 23, this figure shows another block diagram of the acoustic system 130, which may be arranged to drive multiple piezoelectric devices using the (e.g., single) amplifier 216. The system includes the power supply 210, the PFC circuit 211, the AC-to-DC converter 212, the power converter 214, a frequency selector circuit 219, the amplifier 216, several (or one or more) switches 221, several (or one or more) piezoelectric devices 161, and the controller 205. In one embodiment, the system may include more or less components. For example, as shown, the system 130 may be arranged to drive (at least one of) two piezoelectric devices 161 and 161′, each of which may be coupled to the amplifier 216. In another embodiment, the system may include more than two piezoelectric devices, which may be individually driven by the system, as described herein. In another embodiment, the system may not include the PFC circuit 211.

The system 130 may be arranged to drive one or more piezoelectric devices. As described herein, the amplifier 216 may be configured to drive one of the piezoelectric devices 161 and 161′ at a time (e.g., over non-overlapping periods of time). The amplifier may drive a particular device based on at least one of the (e.g., open or closed) state of the switches 221 and 221′ and/or the input signal received from the frequency selector circuit. More above driving the amplifier is described herein.

The (first) switch 221 may be coupled between the first piezoelectric device 161 and the amplifier 216, and the (second) switch 221′ is coupled between the second piezoelectric device 161′ and the amplifier 216. In particular, each of the switches are coupled to negative voltage lines to their respective piezoelectric devices. For instance, switch 221 couples a negative voltage terminal of the amplifier to a corresponding negative voltage terminal of the device 161. In another embodiment, either (or both) of the switches may be coupled to a positive voltage line that couples the amplifier to a respective piezoelectric device.

In one embodiment, the switches 221 and 221′ may each be any type of high-power switches that are capable of switching between an open state and a closed state at a high-frequency. Examples of high-power switches may include IGBTs, GaN FETs, metal-oxide-semiconductor (MOS) FETs, etc.

The controller 205 may be communicatively coupled to each of the switches 221 and 221′, and may be configured to cause either of the switches to close (enter a closed state) to allow the amplifier 216 to drive its respective piezoelectric device. For example, to drive device 161, the controller may close switch 221, thereby coupling the negative voltage line of the amplifier to the piezoelectric device 161, and allowing the amplifier to apply voltage across the piezoelectric device 161. In addition, the controller 205 may open switch 221′ to disconnect the negative voltage line of the amplifier from the piezoelectric device 161′. In particular, while the switch 221 is closed and switch 221′ is open, a function generator of the system 130 may produce a first input signal to cause the amplifier to produce a first output signal, across +V and −V. Conversely, to drive device 161′, the controller may cause switch 221′ to close and switch 221 to open. In which case, the function generator may provide a second (different) input signal at a resonant frequency of the device 161′ to the amplifier, which produces a second output signal, across +V′ and −V′ for driving device 161′. In one embodiment, the controller 205 may be a part of the system 130, or may be an external controller that may not be a part of the system but may be communicatively coupled with one or more of the switches.

The frequency selector circuit 219 may be coupled to the power converter 214, the amplifier 216, and the controller 205, and may be arranged to drive one or more piezoelectric devices at a given frequency. In particular, the frequency selector circuit may be configured to provide the input driving signal to the amplifier for driving at least one of the piezoelectric devices of the system 130. In one embodiment, the controller 205 may be configured to cause the frequency selector circuit to produce a particular input signal at a frequency of a respective piezoelectric device, which may be amplified by the amplifier 216, as described herein.

Turning to FIG. 24, this figure illustrates a block diagram of the frequency selector circuit 219 that may be designed to drive one or more piezoelectric devices through the single amplifier 216. As shown, the frequency selector circuit 219 includes multiple function generators 240 and 240′, and multiple switches 241 and 241′. In one embodiment, the selector may include more or less components, as shown. In one embodiment, the frequency selector may include a number of components that allows the selector to drive a same number or lesser number of piezoelectric devices. The function generators may be coupled to the amplifier 216 via respective switches.

In one embodiment, each of the function generators may be configured to produce a particular input signal for driving a particular piezoelectric device (or one or more devices) at the device's particular resonant frequency. More about a function generator driving a particular piezoelectric device is described herein. Although illustrated as being separate function generators, the frequency selector circuit may include a function generator (or may include electronic components) that may be configured to produce two or more input signals, as described herein. Each of the function generators 240 and 240′ receives a respective DC voltage from the power converter 214. In particular, generator 240 receives a first DC voltage, V_dc, while the second function generator 240′ receives a second DC voltage, V_dc′. In one embodiment, these voltages may be the same or different. For example, each function generator may draw a different amount of power from the converter based on the input signal generated by the generator. In another embodiment, the power converter 214 may only produce one or more voltages for one or more function generators to operate at any given time. For example, a controller (e.g., controller 205 or a controller of the power converter) may be configured (e.g., based on user input) to drive only produce V_dc and not V_dc′, and in order for the function generator 240 to produce a driving signal instead of the function generator 240′. This may ensure that only function generators are producing output signals to drive corresponding piezoelectric devices. As described herein, each of the function generators 240 and 240′ may produce an input signal at a frequency that corresponds to a corresponding resonant frequency of a respective piezoelectric device of which the generator is to drive. For example, when the function generator 240 may be for driving piezoelectric device 161, the generator may produce an input signal at the resonant frequency of the device 161.

Each of the switches 241 and 241′ may be coupled between a respective function generator 240 and 240′ and the amplifier 216. For example, each switch may include an input (terminal) that may be coupled to an output of a respective function generator, while an output of each switch may be coupled together and/or to an input of the amplifier. In one embodiment, the switches 241 and 241′ may be low-power and high frequency switches, such as MOSFETs. In particular, the switches may be capable of operating at less power than switches 221 and 221′, since the input signals produced by the function generators may provide less power than the driving signals produced by the amplifier 216.

The controller may be configured to cause the frequency selector circuit 219 to output one input signal produced by one function generator at any given time. In particular, the controller 205 may be communicatively coupled to each of the switches 241 and 241′ and may be configured to control the state (e.g., open state or closed state) of each switch. In particular, the controller may be configured to close a switch that corresponds to a function generator that is to drive one or more piezoelectric devices. For example, the function generator may be arranged to drive device 161. In which case, the controller may be configured to close switch 241 and open switch 241′ when function generator 240 is to drive device 161. Once switch 241 is closed, the input signal generated by the function generator 240 may pass to the amplifier 216.

Turning back to FIG. 23 and continuing with the previous example, when driving device 161, the controller 205 may be configured to close switch 221 and open switch 221′, while the amplifier 216 may drive electric device 161 by applying voltages +V and −V according to the input signal received from the frequency selector circuit 219 (e.g., from function generator 240).

In one embodiment, the controller 205 may dynamically adjust the state of the switches 221 and 241 based on which piezoelectric device the system 130 is to drive. In some embodiments, to determine which device to drive, the controller 205 may be configured according to user input and/or by a cleaving algorithm performed by the controller.

FIG. 25 is a block diagram of the acoustic system 130 that includes a radio frequency (RF) amplifier 250 for driving the piezoelectric device 161 in accordance with an embodiment.

The system 130 includes the AC power supply 210 for supplying an AC voltage, the piezoelectric device 161 that includes a resonant frequency, the RF amplifier 250 that may be coupled to the AC power supply and the piezoelectric device, a function generator 252, and a matching circuit 251.

The function generator 252 may be coupled to the RF amplifier and may be configured to cause the RF amplifier to produce an output signal based on the AC voltage for driving the piezoelectric device, where the output signal has a frequency at the resonant frequency of the piezoelectric device. In particular, the generator 252 may be designed to produce an input signal, as described herein. In one embodiment, the signal produced by the generator 252 may be an RF signal, having a frequency within the RF frequency spectrum (e.g., from 20 kHz to hundreds of GHz). In one embodiment, the function generator may be a sweeping generator that may be configured such that a switching frequency of the system is aligned with the resonant frequency of the piezoelectric device. For example, due to differences (e.g., manufacturing, materials, etc.) between piezoelectric devices, resonant frequencies may be different. As a result, resonant frequencies between devices may be shifted (e.g., one or more kHz) from expected resonant frequencies. In such cases, the sweeping generator may be configured to perform a frequency sweep around an expected resonant frequency to determine a target resonant frequency of a piezoelectric device. For example, the sweeping generator may produce a frequency sweep signal with a frequency that changes across a frequency range, which may include an expected resonant frequency of the piezoelectric device. Thus, the sweeping generator may drive the piezoelectric device across one or more frequencies over a period of time. The sweeping generator may determine, based on the frequency sweep, a target resonant frequency of the piezoelectric device within the frequency range. In one embodiment, a target resonant frequency may correspond to a maximum possible power a particular piezoelectric device may deliver. In which case, to determine the target resonant frequency, the system 130 may monitor power drawn by the piezoelectric device to determine which frequency within the frequency sweep corresponds to a maximum power drawn by the piezoelectric device. In one embodiment, once the target resonant frequency is determined, the function generator may be configured to produce a driving signal at the target resonant frequency, as described herein. Such operations may be performed in a controlled environment (e.g., in a laboratory).

The RF amplifier 250 may be coupled to the AC power supply 210 and to the function generator 252, and may be configured to convert the input signal, which may be a low-power signal, into a high-power RF signal according to the AC power supplied by the power supply 210. In one embodiment, the RF amplifier 250 may be any type of RF power amplifier, such as a Class A amplifier or a Class B amplifier.

The matching circuit 251 may be coupled between the RF power amplifier 250 and the piezoelectric device 161, and may be designed such that the input impedance of the piezoelectric device 161 matches the output impedance of (e.g., an output terminal of the) amplifier 250. In particular, the matching circuit is designed such that the output terminal of the RF amplifier looks at the input impedance of the piezoelectric device 161, which may range between 45 Ohms to 50 Ohms. In another aspect, the input impedance may range between 47 Ohms and 50 Ohms. In one embodiment, the input impedance may include the impedance of the piezoelectric device and/or the electronic components of the matching circuit. As a result, the matching circuit 251 allows for a combined input impedance of the piezoelectric device and the matching circuit to be equal to the output impedance of the RF amplifier, such that there may be minimum reflections in the circuit and maximum power may be delivered from the RF amplifier to the piezoelectric device at its resonant frequency.

In one embodiment, the matching circuit or equipment impedance matching network (EIMN) may include several electronic components, such as one or more inductors and/or one or more capacitors, which may be connected in different topologizes such that electrical inductive reactance of the matching circuit at the resonant frequency (or target resonant frequency) of the piezoelectric device may cancel out electrical capacitive reactance of the piezoelectric device. In one embodiment, the inductors and/or capacitors may translate resistance at the output of the RF amplifier to the resistance of the piezoelectric device at its resonant frequency.

In another embodiment, the matching circuit 251 may include one or more (e.g., step-up) transformers, which may have additional parallel inductance on a secondary side, which may resonate out the electrical capacitive reactance of the piezoelectric device at its resonant frequency. In some embodiments, the turns ratio of the transformer may be selected to translate resistance at the output of the RF amplifier 250 to the resistance of the piezoelectric device at its resonant frequency.

In some embodiments, the system 130 may include additional components for driving multiple piezoelectric devices. As shown, the system 130 includes additional (optional) components to drive piezoelectric device 161′. In particular, it includes an additional RF amplifier 250′, function generator 252′ and matching circuit 251′, which are designed to drive device 161′ at +/−V′. In this case, the additional RF amplifier 250′ may be coupled to the AC power supply, which may be arranged to provide power to both RF amplifiers 250 and 250′. In one embodiment, the AC power supply 210 may provide the same AC power (AC voltage) to each amplifier. The additional components may have a similar arrangement as the other components of the system, whereby the RF amplifier 250′ may also be coupled to the function generator 252′ and the matching circuit 251′ that is also coupled to device 161′ across positive voltage rail +V′ and negative voltage rail −V′. Such an arrangement allows the system to drive multiple piezoelectric devices at different frequencies.

In utilizing the various aspects of the embodiments, it would become apparent to one skilled in the art that combinations or variations of the above embodiments are possible for acoustic cleaving. Although the embodiments have been described in language specific to structural features and/or methodological acts, it is to be understood that the appended claims are not necessarily limited to the specific features or acts described. The specific features and acts disclosed are instead to be understood as embodiments of the claims useful for illustration.

Claims

1. An acoustic system comprising: a piezoelectric device;an alternating current (AC) power supply for supplying an AC voltage;an AC-to-direct current (DC) converter coupled to the AC power supply for converting the AC voltage supplied by the AC power supply into DC voltage;a function generator for producing an input signal at a resonant frequency of the piezoelectric device; andan amplifier coupled to the AC-to-DC converter, the function generator, and the piezoelectric device,wherein the amplifier is for producing an output signal by amplifying the input signal according to the DC voltage and driving the piezoelectric device using the output signal.

2. The acoustic system of claim 1 further comprising a power factor correction (PFC) circuit coupled to the AC power supply and for correcting a power factor of the AC voltage supplied by the AC power supply.

3. The acoustic system of claim 2, wherein the PFC circuit maintains the power factor at 0.9.

4. The acoustic system of claim 1 further comprising a power converter coupled between the AC-to-DC converter and the amplifier, the power converter for converting the DC voltage to a driving voltage for the piezoelectric device.

5. The acoustic system of claim 4, wherein the driving voltage is a first DC voltage, wherein the function generator is coupled to the power converter that provides a second DC voltage to the function generator.

6. The acoustic system of claim 1, wherein the function generator is coupled to the AC power supply and is powered using the AC voltage.

7. The acoustic system of claim 1, wherein the piezoelectric device is a first piezoelectric device, wherein the acoustic system further comprises: a second piezoelectric device coupled to the amplifier;a first switch coupled between the first piezoelectric device and the amplifier;a second switch coupled between the second piezoelectric device and the amplifier; anda controller configured to cause the first switch or the second switch to close to allow the amplifier to drive the first piezoelectric device or the second piezoelectric device, respectively.

8. The acoustic system of claim 7, wherein the input signal is a first input signal, the resonant frequency is a first resonant frequency, and the output signal is a first output signal, wherein responsive to the controller causing the second switch to close, the function generator provides a second input signal at a second resonant frequency of the second piezoelectric device to the amplifier, which produces a second output signal based on the second input signal for driving the second piezoelectric device.

9. The acoustic system of claim 1, wherein the piezoelectric device is one of a plurality of piezoelectric devices of the acoustic system, wherein the function generator is one of a plurality of function generators that are a part of a frequency selector circuit that is coupled to the amplifier, each function generator being configured to produce a particular input signal for driving a particular piezoelectric device of the plurality of piezoelectric devices at the particular piezoelectric device's resonant frequency.

10. The acoustic system of claim 9 further comprises a controller for causing the frequency selector circuit to output one input signal produced by one function generator of the plurality of function generators at any given time.

11. The acoustic system of claim 10, wherein the frequency selector circuit comprises a plurality of switches, each switch coupled between at least one of the plurality of function generators and the amplifier, wherein the controller causes the frequency selector circuit to output the one input signal by closing a switch coupled between the one function generator and the amplifier, while opening a remainder of switches of the plurality of switches.

12. The acoustic system of claim 11, wherein the plurality of switches are a first plurality of switches, wherein the acoustic system further comprises a second plurality of switches, each coupled between the amplifier and a different piezoelectric device of the plurality of piezoelectric devices, wherein the controller is configured to cause one switch of the second plurality of switches to close and to cause a remainder of switches of the second plurality of switches to open based on the one input signal the frequency selector circuit is to output.

13. The acoustic system of claim 12, wherein the first plurality of switches are low-power switches, and the second plurality of switches are high-power switches.

14. The acoustic system of claim 1, wherein the amplifier is a single operational amplifier.

15. An acoustic system comprising: a piezoelectric device comprising a resonant frequency;an alternating current (AC) power supply for supplying an AC voltage;a radio frequency (RF) amplifier coupled to the AC supply and the piezoelectric device; anda function generator coupled to the RF amplifier, the function generator for causing the RF amplifier to produce an output signal based on the AC voltage for driving the piezoelectric device, wherein the output signal has a frequency at the resonant frequency of the piezoelectric device.

16. The acoustic system of claim 15 further comprising a matching circuit coupled between the RF amplifier and the piezoelectric device for matching an input impedance of the piezoelectric device to an output impedance of the RF amplifier.

17. The acoustic system of claim 16, wherein the input impedance is between 47 ohms and 50 ohms.

18. The acoustic system of claim 15, wherein the function generator comprising a sweeping generator for: performing a frequency sweep within a frequency range that includes an expected resonant frequency of the piezoelectric device; anddetermining, based on the frequency sweep, the resonant frequency of the piezoelectric device within the frequency range.

19. The acoustic system of claim 15, wherein the piezoelectric device is a first piezoelectric device, the RF amplifier is a first RF amplifier, the function generator is a first function generator, and the resonant frequency is a first resonant frequency, wherein the acoustic system further comprises: a second piezoelectric device comprising a second resonant frequency;a second RF amplifier coupled between the AC supply and the second piezoelectric device; anda second function generator coupled to the RF amplifier, the function generator for causing the RF amplifier to produce another output signal based on the AC voltage for driving the second piezoelectric device and at the second resonant frequency.

20. The acoustic system of claim 19, wherein the first and second function generators drive their respective piezoelectric devices simultaneously.