The invention relates to delay lines. More specifically, the present invention relates to compensating delay variations in a delay line.
Delay line is a device where an input signal reaches the output of the device after a known period of time has elapsed. Delay lines are used to derive precise delay in various electronic devices based on control parameters such as voltage and current. Based on control parameters, two types of delay lines are commonly known, Voltage Controlled Delay Line (VCDL) and Current Controlled Delay line (CCDL). The delay lines are critical functional blocks in Phase-locked loops (PLLs) and Delay-locked loops (DLLs). Delay lines also find applications in programmable devices such as Field Programmable Gate Array (FPGA) and Complex Programmable Logic Device (CPLD). Another application of delay line is in digital direct synthesis (DDS) to reduce time jitter of the signal by using virtual clock enhancement method.
A typical delay line includes multiple delay elements. The delay element is the basic component that generates delay in a delay line. Two commonly used delay elements are CMOS delay elements and differential delay elements. A very basic example of CMOS delay element is a CMOS inverter. Each of the delay element in the delay line is configured to produce a finite delay. However, delay at any chosen tap in a delay line vary over a relatively large range due to variations in operating conditions such as effects of temperature, supply voltage, and device parameter variations. The delay varies in a delay element due to bias current variation and load capacitance variation across process, temperature and supply variations. The process variation is defined in terms of variations in gate oxide thickness, doping concentration and geometry of the delay element. The process variations change the threshold voltage and mobility of the delay element. As a result, delay varies across multiple process corners in a delay line.
Various conventional methods have been used to achieve better delay accuracy and minimize delay variation. One such method employs closed loop feedback around the delay line for PVT compensation at the cost of power in milliwatts. The delay variation is minimized by using feedback in the form of phase or delay locked loop to adjust the delay by tracking the period of a reference clock. Other methods facilitate coarse delay tuning by choosing appropriate delay element and then varying control parameter for fine tuning. However, these schemes require closed loop architecture of delay line, resulting in extra hardware overhead and high current requirement. Therefore, the closed loop architecture is not suitable for low power applications. The method and system of the present invention enable low power open loop compensation of delay variations in a delay line.
It is an object of the invention to provide a method and system for low power open loop compensation of delay variations in a delay line. Another object of the present invention is to achieve a delay accuracy of ±10% across all process, temperature and supply voltage conditions.
The present invention provides a method and a delay compensation circuit for open loop compensation of delay variations in a delay line. The method comprises the steps of sensing the Process, Voltage, Temperature (PVT) variations in the delay line using a sensing circuit, generating a first and a second sensitive current based on the PVT variations and generating a first compensation current based on the first sensitive current and a first summing current. The first summing current is a reference current independent of the PVT variations. The method further comprises mirroring the first compensation current as a second summing current and generating a second compensation current from the second sensitive current and the second summing current. The second compensation current compensates the delay variations and has a sensitivity based on the sensitivities of the first and second sensitive currents.
a and 7b illustrate the simulation results of the input and output signal at the delay line and output at the interpolator respectively;
a and 8b illustrate variations in third sensitive current and third compensation current with process and temperature at typical supply condition;
a and 9b illustrate variations in third summing current with process and temperature at typical supply condition and delay versus process variations for compensated and uncompensated delay line; and
a and 10b illustrates delay versus temperature and supply voltage variations for compensated and uncompensated delay line.
Various embodiments of the present invention are described herein in the context of delay line systems. Those of ordinary skill in the art will realize that the following detailed description of the present invention is illustrative only and is not intended to be in any way limiting. Other embodiments of the present invention will readily suggest themselves to such skilled persons having the benefit of this disclosure. Reference will now be made in detail to implementation of the present invention as illustrated in the accompanying drawings. The same reference indicators will be used throughout the drawings and the following detailed description to refer to the same or like parts.
T
d
=V
DD
·C
L/2I
where C1 is load capacitor seen at the output node of the NP-current controlled delay element 100. ‘I’ is the bias current for the delay element and it can be changed by changing the bias voltages Vp and Vn. Further, Vdd is the voltage supply and can also be referred to as output swing (rail to rail swing).
In accordance with an embodiment of the present invention, one or more NP-current controlled delay elements 100 can be cascaded to form a Current Controlled Delay Line (CCDL). The total delay produced by a CCDL can be given by,
Total delay=N×Td
Where Td=delay/stage (Delay resolution)
In accordance with another embodiment of the present invention, the CCDL described here is for 26 delay taps to choose the delay in fixed steps. The CCDL presented in the present invention is an Analog Delay line (ADL) and uses 14-tap delay elements (TD) and 2-dummy delay (DD) elements to eliminate the asymmetric loading of the delay stages. The ADL is further explained in detail with reference to a delay line architecture in the
Each of the delay element has delay resolution as Td and this resolution is limited by the delay of single NP-current controlled delay element. Therefore, one level of interpolation can be used in order to improve the delay resolution Td. As illustrated in the figure, each delay element is connected to an interpolator, for example, delay element 100a is connected to the interpolator 206a, whereas delay element 100b is connected to the interpolator 206b. The input voltage Vin, is input to the interpolator 206a and the output of the delay element 200b is connected to the input of the interpolator 206b. Interpolation is a common technique to improve the delay resolution Td and the architecture of the interpolator is already known in the art. Therefore, the details of the interpolator have not been mentioned in the present invention.
However, the delay resolution Td of the NP-current controlled delay element 100 varies over a relatively large range due to variations in operating conditions such as effects of temperature, supply voltage and device parameter variations during manufacturing of the integrated circuit. As mentioned before,
Delay resolution Td=VDD·CL/2I (1)
From equation [1], the delay resolution term includes the load capacitance CL, the bias current I and the supply voltage Vdd of the NP-current controlled delay element 100. In an integrated circuit, load capacitance CL varies with process and temperature due to gate oxide thickness variation and geometrical variations of the device. The geometrical variations include variations in dW and dL due to oxide encroachment and lateral diffusion. Further, the bias current variation is due to variation in the supply voltage, threshold voltage and process gain of the device. These variations can be explained with reference to the following formulas:
C
L
=f(P,T)
I=f(P,T,VDD)
where
process, temperature and supply voltage are defined as continuous analog variables.
P: Process
T: Temperature
Vdd: Supply Voltage
From equation [1], the delay resolution Td term consists of load capacitor, bias current and supply voltage, hence it varies with respect to process, temperature and supply voltage. As a result, Td=f (P, T, VDD).
On the basis of above equation, the governing equation of the delay variation can be expressed as
delay variations with respect to process:
delay variations with respect to temperature:
and delay variations with respect to voltage supply:
In order to compensate the delay variations in the delay line 202 due to Process, Voltage Supply, Temperature (PVT) variations, the present invention provides a novel delay compensation circuit 204 for low power open loop compensation of delay variations. The delay compensation circuit 204 employs a forward open loop compensation scheme where the PVT variations are sensed and a control current profile is generated which compensates any variations in the delay. The control current profile can be referred to as compensation current and is used to control the bias voltages Vp and Vn of each of the delay elements 100a and 100b. The bias voltages Vp and Vn control the bias current of the each of the delay elements 100a and 100b and therefore control the delay variations.
The delay compensation circuit 204 uses a sensing circuit to sense the PVT variations. The sensing circuit is explained in detail with reference to
βP=process gain of PMOS 304
VGSP=Gate-source bias voltage at PMOS 304, where VGSP=VDD−VS
VDD=Voltage Supply
VTP=Threshold voltage of PMOS 304
The sink current IN at PMOS 304 can be written as
βN=process gain of NMOS 306
VGSN=Gate-source bias voltage at NMOS 306 and VGSN=VS
VTN=Threshold voltage of NMOS 306
In the sensing circuit 302, both source and sink currents IP and IN can be referred to as bias current I. Both threshold voltages VTP and VTN can be commonly referred to as VT. Further, for a NMOS/PMOS, VGSN and VGSP vary according to the variations in the voltage supply VDD. As a result, the bias current I vary with variations in β, VT, and VDD, and can be written as,
I=(β,VT,VDD)
The process gain β and threshold voltage VT varies with process and temperature, as illustrated below,
β=(P,T)
V
T=(P,T)
Therefore, it can be inferred that the bias current I across PMOS/NMOS varies with PVT variations and
I=(P,T,VDD)
The variation of bias current I with respect to process can be illustrated as:
The variation of bias current I with respect to temperature can be illustrated as:
are process gain variations with respect to process and temperature respectively, and
are threshold voltage variations with respect to process and temperature respectively.
In the sensing circuit 302, the geometrical variations are minimized by using large transistor lengths and widths. As a result, negligible mobility and geometrical variations lead to very less variation in process gain as compared to threshold voltage variation of the device. Hence,
can be neglected and the variation in bias currents of the PMOS 304 and NMOS 306 with respect to process can be written as
From the equations [2], it can be inferred that the variation in the bias currents with respect to process is based on the threshold voltage variation with process.
Similarly, the variation in the bias currents with respect to temperature is based on the threshold voltage variation with temperature. This is illustrated from the below equations:
Above set of four equations [2] and [3] prove that the sensing circuit 302 acts as a threshold voltage sensor for process and temperature variations. Similarly, variation of bias currents IP and IN with respect to variations in the voltage supply can be given by,
From the equations [2], [3], and [4], it can be inferred that the current generated by the sensing circuit 302 varies according to the PVT variations and the sensing circuit 302 has non-zero sensitivity for variations in the voltage supply. As a result, the sensing circuit 302 is being used in the delay compensation circuit 204 to facilitate the generation of compensation current to compensate delay variations.
The first stage circuit 308 being connected to the sensing circuit 302 includes a first sensitive transistor 312 which is a PMOS. The first sensitive transistor 312 forms a current mirror with the sensing circuit 302 to generate a first sensitive current Ip1. Ip1 is the mirrored current from the sensing circuit 302. It can also be referred to as a first PVT sensitive current as it varies according to the PVT variations.
The first stage circuit 308 further includes a biasing transistor 310 such as a PMOS to provide a pbias (PB) voltage. The pbias voltage depends on the threshold voltage of the PMOS and is used to remove any asymmetries in the first sensitive current Ip1 due to process skew. The first stage circuit 308 also includes a constant current source to generate a reference current Iref, The reference current Iref is constant across all the PVT conditions and has zero sensitivity for the PVT variations. Zero sensitivity for the PVT variations implies that Iref is independent of the PVT variations. In accordance with an embodiment of the present invention, the constant current source generates a reference current of around 2 μA.
The first stage circuit 308 further includes a first compensating transistor 314. In accordance with an embodiment of the present invention, the first compensating transistor 314 is a PMOS and generates a first compensation current Ic1, by subtracting the first sensitive current from the reference current. The reference current is the sum of the first compensation current and the first sensitive current. Therefore, it can also be referred to as a first summing current. Writing Kirchhoff's Current Law (KCL) at summing junction ‘z1’ gives,
I
ref
=I
p1
+I
c1 [5]
The variations of the currents Iref, Ip1 and Ic1 with respect to process can be related by the following equation:
In the circuit analysis, the sensitivity of a first variable with respect to a second variable is a parameter that indicates the variations in the first variable with the variations in the second variable. Sensitivity analysis is usually carried out to analyze the effects of variation in one variable on other variables.
Lets consider when, SP=Sensitivity with respect to the process
Then, the sensitivities of currents Iref, Ip1 and Ic1 with respect to process can be related as,
I
REF
·S
P
I
=IP1·SPI
For the sake of clarity, all the sensitivity analysis in the present invention is shown with respect to the process variable; however, the sensitivity equations will remain valid for temperature and supply variables as well. Further, from the equation [6], it can be inferred that the first compensation current Ic1 has a sensitivity complement to the sensitivity of the first sensitive current Ip1. As a result, the sensitivity of the first compensation current Ic1 can be designed by establishing appropriate weighting for the first sensitive current and the first compensation current.
As mentioned before, that the biasing transistor 310 is being used to remove any asymmetries in the first sensitive current due to process skew. This means that the biasing transistor 310 takes care of the variations in the process. To explain further, there are three types of process variations that can be defined, slow-slow process, typical process and fast-fast process. When the process is slow-slow, the variations in the current with respect to process are less. When the process is fast-fast, the variations in current with respect to process are large. In case of a typical process, there is no variation in current with respect to the process. As a result, the sensitivity of the current towards the fast process corner is greater than the sensitivity towards slow process corner and can be illustrated from the below equation:
SP
The biasing transistor 310 alters the sensitivity of the first sensitive current towards fast process corner in a way such that it is equal to the sensitivity towards slow process corner. Let altered sensitivity of the first sensitive current with respect to process towards fast process corner be,
S′P
From equation [6],
Altered sensitivity towards fast
process corner gives,
The altered sensitivity towards fast process corner is less than the original sensitivity towards fast process corner, and can be written as,
S′P
As a result, sensitivity towards slow corner is equal to sensitivity towards fast corner,
S
P
I
=−S
P
I
The first compensation current Ic1 can control the bias voltages VP and VN and can be used to compensate the delay variations in the delay line 202. Further, the single stage delay compensation circuit 300 described in
A second compensating transistor 410 such as a PMOS generates a second compensation current Ic2 by subtracting the second sensitive current Ip2 from a second summing current I2. In accordance with an embodiment of the present invention, PMOS 316, NMOS 318 and NMOS 408 forms a first current mirror to mirror the first compensation current Ic1 as the second summing current I2.
As a result, I2=Ic1 [7]
With reference to
I
2
=I
p2
+I
c2 [8]
Further, variations of the currents I2, Ip2 and Ic2 with respect to process can be defined as:
Therefore, the sensitivities of currents I2, Ip2 and Ic2 with respect to process can be related as,
I
2
S
P
I
I
P2
S
P
I
+I
C2
S
P
I
As a result,
From equation [9], it can be inferred that the sensitivity of the second compensation current depends on the sensitivity of the second sensitive current and the second summing current. Further, the equation [9] brings additional flexibility in adjusting sensitivity of the second compensation current by having non-zero sensitivity for the second summing current.
Further, based on the equations [5], [7] and [8],
I
c2
=I
2
−I
p2 and I2=Ic1
Therefore, Ic2=Ic1−Ip2
I
c1
=I
ref
−I
p1
As a result, Ic2=Iref−(Ip1+Ip2) [10]
Since the sensitivity of Iref is zero.
Therefore, sensitivities of the second compensation current, first and second sensitive currents are related as
−IC2·SPI
It can now be inferred that the sensitivity of the second compensation current depends on the sensitivity of the first and second sensitive currents. This adds flexibility to the system by making the second compensation current dependent on more than one PVT sensitive currents.
The method of compensation of delay variations in the delay line 202 using the two stage delay compensation circuit is explained in with reference to
The second compensation current Ic2 compensates the delay variations and has a sensitivity based on the sensitivity of the first sensitive current Ip1 and the second sensitive current Ip2.
The second compensation current Ic2 compensates the delay variations in the delay line 202 and can achieve ±25% delay accuracy across all the PVT conditions. To further enhance the delay accuracy, a three stage delay compensation circuit is provided by cascading three stages of the first stage circuit 308:
A third compensating transistor 610 generates a third compensation current Ic3 by subtracting the third sensitive current Ip3 from a third summing current I3. In accordance with an embodiment of the present invention, PMOS 412, NMOS 414 and NMOS 608 forms a second current mirror to mirror the second compensation current Ic2 as the third summing current I3.
As a result, I3=Ic2 [11]
With reference to the
I
3
=I
p3
+I
c3 [12]
Further, based on the equations [10], [11] and [12],
Ic3=I3−Ip3 and I3=Ic2
Therefore, Ic3=Ic2−Ip3
I
c2
=I
ref−(Ip1+Ip2)
Therefore, Ic3=Iref−(Ip1+Ip2+Ip3) [13]
From equation [13], it implies that the third compensation current Ic3 is dependent on the reference current Iref, the first sensitive current Ic3, the second sensitive current Ic3, the third sensitive current Ic3. As a result, the sensitivity of the third compensation current Ic3 is based on the sensitivity of the reference current, first, second and third sensitive currents.
Since the sensitivity of Iref is zero.
−IC3·SPI
From the above equation [14], the sensitivity of the third compensation current Ic3 depends on the sensitivity of the first, second and third sensitive currents. This adds flexibility to the delay compensation circuit 204 by making the third compensation current dependent on three PVT sensitive currents.
The third compensation current Ic3 performs low power compensation of the delay variations in the delay line 202 and can achieve ±10% delay accuracy across all the PVT conditions. Although various embodiments of the present invention have been explained with reference to single, two and three stages delay compensation circuit, the delay compensation circuit 202 can include more than three stages based on the process variations in the delay line.
Various simulations have been carried out for the three-stage delay compensation circuit 600 at 1.5 V, 130 nm CMOS process. The temperature range is taken as −40° C. to ±125° C. at ±10% supply variations across multiple process corners. In the simulation results, a fine delay resolution of 82 ps is achieved by inverter based interpolation technique with maximum delay spread of 2.5 ns at supply current <40 μA. Further, in typical condition of process, temperature and supply, static current consumption of the delay compensation circuit 600 is less than 30 uA (I(W.C)<40 uA).
a and 11b illustrates delay versus temperature and supply variations for compensated and uncompensated delay line. As shown in the
Number | Date | Country | Kind |
---|---|---|---|
986/MUM/2008 | May 2008 | IN | national |
Filing Document | Filing Date | Country | Kind | 371c Date |
---|---|---|---|---|
PCT/IN09/00273 | 5/8/2009 | WO | 00 | 2/18/2011 |