Davis et al., J.C. Statistical Aspects of Tuning Simulators to Noisy Data, 3rd International Worjshop on Statistical Metrology, 1998, pp. 18-21.* |
Boning et al., “DOE/Opt: A System for Design of Experiments, Response Surface Modeling, and Optimization Using Process and Device Simulation”, IEEE Transactions on Semiconductor Manufacturing, vol. 7, Issue 2, pp. 233-244,May 1994.* |
Fallon, et al., “Integration of Costing, Yield and Performance Metrics into the TCAD Environment Through the Combination of DOE and RSM”, IEEE/USC/SEMI Inter. Symposium on Semiconductor Man., pp. 266-270, Sep. 1995.* |
Fukuda, et al. “Application of TCAD to Designing Advanced DRAM and Logic Devices”, SISPAD International Conference on Simulation of Semiconductor Processes and Devices, pp. 17-20, Sep. 1997.* |
Le Carval et al., “Methodology for Predictive Calibration of TCAD Simulators”, SISPAD International Conference on Simulation of Semiconductor Processes and Devices, pp. 177-180, Sep. 1997.* |
Kleijnen, J. P. C., “Five-Stage Procedure for the Evaluation of Simulation Models Through Statistical Techniques”, Proceedings Winter Simulation Conference 1996, pp. 248-254. |