This application claims priority of Taiwanese Patent Application No. 105123152, filed on Jul. 22, 2016.
The disclosure relates to a method for analyzing stress in an object, and more particularly to a method for analyzing stress in an object with photoelasticity.
Conventional methods for analyzing stress in an object with photoelasticity involve complex computing algorithms for converting wrapped phases, which are constrained in either an interval of (−π, π] or an interval of [0,2π), into unwrapped phases. Generally, a spatial phase unwrapping algorithm or a temporal phase unwrapping algorithm can be used to convert the wrapped phases into the unwrapped phases in the conventional methods for stress analysis. However, conversion of the wrapped phases into the unwrapped phases demands lots of computing resources and time since the algorithms involve modulo operation on the wrapped phases (e.g., π modulo and 2π modulo). Another conventional method for stress analysis in an object is an iterative method. However, the iterative method compares spectrum data of the object with a mass of spectrum data pre-stored in a database one by one, which requires a considerable amount of time and thus reduces overall efficiency.
Furthermore, light rays used in photoelasticity to generate spectrum data for stress analysis must have different wavelengths λ1, λ2, λ3. The wavelengths λ1, λ2, λ3 must satisfy a specific condition
Therefore, an object of the disclosure is to provide a method for analyzing stress in an object that can alleviate at least one of the drawbacks of the prior art.
According to the disclosure, the method for analyzing stress in the object according to spectrum data is provided. The spectrum data is obtained from an interference fringe pattern of the object that results from performing photoelasticity. The method includes the steps of:
analyzing the spectrum data to obtain three sets of intensity data that are related respectively to different wavelengths of light used in photoelasticity;
calculating three wrapped phases according to the three sets of intensity data, respectively;
calculating three preliminary stress values according to the wrapped phases, respectively, wherein each of the preliminary stress values is directly proportional to a product of a corresponding one of the wrapped phases and a linear function of a corresponding one of the wavelengths;
determining a system of stress equations according to a relation among the preliminary stress values; and
calculating an estimated stress value based on the preliminary stress values using the system of stress equations.
Other features and advantages of the disclosure will become apparent in the following detailed description of the embodiments with reference to the accompanying drawings, of which:
Referring to
The photoelasticity measuring system 2 includes a light source 21, a first linear polarizer 22, a first quarter-wave plate 23, a holder 24, a second quarter-wave plate 25, a second linear polarizer 26 and a spectrometer 27. The holder 24 is configured to hold the object 3 and is able to apply an external force to the object 3. In this embodiment, the light source 21 is a non-monochromatic light source capable of emitting non-monochromatic light that has various wavelengths (such as a light source that emits white light), thereby facilitating user selection of three different wavelengths. In other embodiments, the light source 21 may be a quasi-monochromatic light source capable of emitting at least three different monochromatic light rays or a light ray having wavelengths within a specific range. The light rays emitted by the light source 21 pass through the first linear polarizer 22, the first quarter-wave plate 23, the object held by the holder 24, the second quarter-wave plate 25 and the second linear polarizer 26 in sequence, and generate an interference fringe pattern (IFP) due to photoelasticity.
The first linear polarizer 22 and the first quarter-wave plate 23 are used to circularly polarize the light emitted from the light source 21, and the second quarter-wave plate 25 is used to linearly polarize the light that is circularly polarized and that passes through the object 3. The second linear polarizer 26 and the optical spectrometer 27 are used together to record the spectrum data obtained from the IFP of the object 3. The spectrum data is to be sent to the computing apparatus 1 for analyzing stress in the object 3. It is should be noted that configuration of the photoelasticity measuring system 2 may be varied according to different requirements, and is not limited to this embodiment. In other embodiments, the second quarter-wave plate 25 can be removed, or both the first and second quarter-wave plates (23,25) can be removed to perform photoelasticity only with the light that is linearly polarized.
The computing apparatus 1 includes a processing unit 11, a storage unit 12 and an input/output (I/O) unit 13. The processing unit 11 is, for example, a central processing unit (CPU), and is configured to analyze the spectrum data and to control operation of the storage unit 12 and the I/O unit 13. The storage unit 12 is electrically connected to the processing unit 11, and is configured to store the spectrum data and an analysis software program 121 which, when executed by the processing unit 11, causes the processing unit 11 to perform a method for analyzing stress in the object 3. The I/O unit 13 is electrically connected to the processing unit 11, and is configured to receive the spectrum data from the photoelasticity measuring system 2 and to output an analysis result obtained by the processing unit 11 to an external device, such as a display device.
Further referring to
Before the computing apparatus 1 implements the method for analyzing stress in the object 3, a user sets up the computing apparatus 1 and the photoelasticity measuring system 2, and places the object 3 on the holder 24. The photoelasticity measuring system 2 is operated. Accordingly, the IFP of the object 3 is generated and imaged on the spectrometer 27, and then the spectrum data is obtained.
In step S0 of the method, the I/O unit 13 receives the spectrum data from the photoelasticity measuring system 2. The spectrum data is sent to the storage unit 12, and the spectrum data is stored therein.
In step S1, the processing unit 11 analyzes the spectrum data to obtain at least three sets of intensity data that are related respectively to different wavelengths of the light emitted from the light source 21. In particular, when the analysis software program 121 is activated by the user, the processing unit 11 executes the analysis software program 121 to access the spectrum data from the storage unit 12. The user can select a first wavelength λ1, a second wavelength λ2 and a third wavelength λ3 in the spectrum data, wherein the first wavelength λ1 is the longest and the third wavelength λ3 is the shortest (i.e., λ1>λ2>λ3). In the method according to embodiments of this disclosure, it is unnecessary to select the three wavelengths λ1, λ2, λ3, to satisfy a specific condition
After the three wavelengths λ1, λ2, λ3 are selected, the processing unit 11 analyzes the spectrum data to obtain the three sets of intensity data related respectively to the first wavelength λ1, the second wavelength λ2 and the third wavelength λ3.
In step S2, the processing unit 11 calculates three wrapped phases according to the three sets of intensity data, respectively. Since intensity data is a sine function of the wrapped phase, the three wrapped phases can be obtained by calculating an inverse sine function of the three sets of intensity data, respectively. It should be noted that each of the three wrapped phases calculated from the inverse sine function has a value between 0 to π, and thus, an additional modulo operation on the wrapped phases with 2π modulo is not required. It also should be noted that calculation of the wrapped phases is not limited to the inverse sine function described in this embodiment. In other embodiments, the wrapped phases can be obtained by calculating inverse cosine function and/or inverse tangent function of the three sets of intensity data, respectively.
In step S3, the processing unit 11 calculates three preliminary stress values according to the three wrapped phases, respectively. Each of the preliminary stress values is directly proportional to a product of a corresponding one of the wrapped phases and a linear function of a corresponding one of the wavelengths. More specifically, each of the preliminary stress values is obtained through the equation
where Sw denotes the preliminary stress value, λ denotes a corresponding one of the wavelengths, A and B are known parameters related to characteristics of material of the object 3, and δw denotes a corresponding one of the wrapped phases. As a result, the processing unit 11 can obtain a first preliminary stress value Swλ
In step S4, the processing unit 11 normalizes the preliminary stress values Swλ
The effect resulted from the step S4 is shown in
In step S5, the processing unit 11 determines a system of stress equations according to a relation among the preliminary stress values Swλ
In step S6, the processing unit 11 calculates an estimated stress value S based on the preliminary stress values Swλ
The estimated stress values S calculated in step S6 may be inaccurate due to environment disturbance and operation error. In particular, the estimated stress values S may have significant deviation and inaccurate values when the preliminary stress values Swλ
In step S8, the processing unit 11 controls the I/O unit 13 to output the estimated stress values S to a display device, a storage device, etc.
The principle for selecting the system of stress equations to be used in step S6 from the sixteen systems of candidate equations is described in the following.
The estimated stress value S can be expressed by a general equation S=2i(Aλ+B)±Sw, where i denotes a rounding integer part of a fringe order of the IFP corresponding to the wavelength λ. By substituting one of the first wavelength λ1, the second wavelength λ2 and the third wavelength λ3, and a corresponding one of the first preliminary stress value Swλ
S=2i1(Aλ1+B)±Swλ
S=2i2(Aλ2+B)±Swλ
S=2i3(Aλ3+B)±Swλ
In the system of preliminary stress equations (P1), i1, i2, i3 denote fringe orders corresponding to the first, second and third wavelength λ1, λ2, λ3, respectively, and the parameters A, B, λ1, λ2, λ3, Swλ
Further, the preliminary stress values Sw can be converted by two conversion equations (E1) and (E2).
S′
w=2(A λ+B)−Sw (E1)
S″
w
=−S
w (E2)
Based on the two conversion equations (E1) and (E2), the second preliminary stress value Swλ
S′
wλ
=2(Aλ2+B)−Swλ
S″
wλ
=−S
wλ
S′
wλ
=2(Aλ3+B)−Swλ
S″
wλ
=−S
wλ
where S′wλ
The use of the two conversion equations (E1) and (E2) are explained with reference to
Referring to
The relations among the first, second and third preliminary stress values Swλ
Referring to
In sub-step S510, the processing unit 11 determines whether the first, second and third preliminary stress values Swλ
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+Swλ
When the determination made in the sub-step S510 is negative, it means that the preliminary stress values Swλ
In sub-step S521, the processing unit 11 further determines whether the relation between the second and third preliminary stress values Swλ
In sub-step S522, the processing unit 11 makes the second system of candidate equations (T-2) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)−S″wλ
S=2i1(Aλ3+B)−S″wλ
In sub-step S523, the processing unit 11 further determines whether the relation between the second and third preliminary stress values Swλ
In sub-step S524, the processing unit 11 makes the third system of candidate equations (T-3) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(A λ3+B)+S′wλ
In step S525, the processing unit 11 makes the fourth system of candidate equations (T-4) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+S′wλ
S=2i1(Aλ3+B)+S′wλ
On the other hand, when the determination made in the step S520 is negative, the processing unit 11 proceeds to step S530 to further determine whether the relation among the preliminary stress values Swλ
In sub-step S531, the processing unit 11 further determines whether the relation between the first and second preliminary stress values Swλ
In sub-step S532, the processing unit 11 makes the fifth system of candidate equations (T-5) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)−Swλ
S=2i1(Aλ3+B)+Swλ
In sub-step S533, the processing unit 11 makes the sixth system of candidate equations (T-6) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+S′wλ
When the determination made in the step S530 is negative, it means the relation among the preliminary stress values Swλ
When the determination made in the sub-step S530 is negative, it means that the estimated stress value S lies in one of the regions (D-401) of the graph of
When the determination made in sub-step S5401 is affirmative, the flow goes to sub-step S5402.
In step S5402, the processing unit 11 further determines whether the relation among the first preliminary stress value Swλ
In sub-step S5403, the processing unit 11 makes the seventh system of candidate equations (T-7) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)−Swλ
S=2i1(Aλ3+B)−Swλ
In sub-step S5404, the processing unit 11 makes the eighth system of candidate equations (T-8) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+Swλ
When the determination made in the sub-step S5401 is negative, the processing unit 11 proceeds to sub-step S5405 (see
In sub-step S5406, the processing unit 11 further determines whether the second preliminary stress value Swλ
When the determination made in sub-step S5406 is affirmative, it means that the estimated stress value S lies in one of the regions (D-407) of the graph of
The flow goes to sub-step S5408 when the determination made in sub-step S5407 is affirmative, and goes to sub-step S5409 when otherwise.
In step S5408, the processing unit 11 makes the ninth system of candidate equations (T-9) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+S′wλ
S=2i1(Aλ3+B)+S′wλ
In sub-step S5409, the processing unit 11 makes the tenth system of candidate equations (T-10) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)−Swλ
S=2i1(Aλ3+B)+Swλ
When the determination made in sub-step S5406 is negative, it means that the estimated stress value S lies in one of the regions (D-410) of the graph of
in order to further locate the estimated stress value S. The flow goes to sub-step S5411 when the determination made in sub-step S5410 is affirmative, and goes to sub-step S5412 when otherwise.
In sub-step S5411, the processing unit 11 makes the eleventh system of candidate equations (T-11) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)−Swλ
S=2i1(Aλ3+B)+Swλ
In sub-step S5412, the processing unit 11 makes the twelfth system of candidate equations (T-12) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+Swλ
In sub-step S5413, the processing unit 11 further determines whether the second preliminary stress value Swλ
When the determination made in sub-step S5413 is affirmative, it means that the estimated stress value S lies in one of the regions (D-414) of the graph of
in order to further locate the estimated stress value S. The flow goes to sub-step S5415 when the determination made in sub-step S5414 is affirmative, and goes to sub-step S5416 when otherwise.
In sub-step S5415, the processing unit 11 makes the thirteenth system of candidate equations (T-13) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+S′wλ
In sub-step S5416, the processing unit 11 makes the fourteenth system of candidate equations (T-14) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+S′wλ
S=2i1(Aλ3+B)+S′wλ
When the determination made in sub-step S5413 is negative, it means that the estimated stress value S lies in one of the regions (D-417) of the graph of
in order to further locate the estimated stress value S. The flow goes to sub-step S5418 when the determination made in sub-step S5417 is affirmative, and goes to sub-step S5419 when otherwise.
In sub-step S5418, the processing unit 11 makes the fifteenth system of candidate equations (T-15) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)−Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+Swλ
In sub-step S5419, the processing unit 11 makes the sixteenth system of candidate equations (T-16) the system of stress equations to be used in step S6.
S=2i1(Aλ1+B)+Swλ
S=2i1(Aλ2+B)+Swλ
S=2i1(Aλ3+B)+S′wλ
With sub-steps S510-S5419 described above with reference to
In sum, the method for analyzing stress in the object 3 according to this disclosure can be used to obtain the estimated stress value S without the limited condition of choosing the proper wavelengths of the light used in photoelasticity. Furthermore, instead of using complicated computing algorithms such as iterative method and/or converting the wrapped phase values, the processing unit 11 simply selects one of the first to sixteenth systems of candidate equations (T-1) to (T-16) that can be stored in advance, and calculates the estimated stress value S by directly using the selected one of the systems of candidate equations (T-1) to (T-16).
In the description above, for the purposes of explanation, numerous specific details have been set forth in order to provide a thorough understanding of the embodiments. It will be apparent, however, to one skilled in the art, that one or more other embodiments may be practiced without some of these specific details. It should also be appreciated that reference throughout this specification to “one embodiment,” “an embodiment,” an embodiment with an indication of an ordinal number and so forth means that a particular feature, structure, or characteristic may be included in the practice of the disclosure. It should be further appreciated that in the description, various features are sometimes grouped together in a single embodiment, figure, or description thereof for the purpose of streamlining the disclosure and aiding in the understanding of various inventive aspects.
While the disclosure has been described in connection with what are considered the exemplary embodiments, it is understood that the disclosure is not limited to the disclosed embodiments but is intended to cover various arrangements included within the spirit and scope of the broadest interpretation so as to encompass all such modifications and equivalent arrangements.
Number | Date | Country | Kind |
---|---|---|---|
105123152 | Jul 2016 | TW | national |