Method for assembling a panel for an LCD

Abstract

A method for assembling a liquid crystal display includes providing a thin-film-transistor substrate and a color-filter substrate having an active area and a non-active area, wherein plural spacers are formed in the in the active area of the color-filter substrate. At least two spacing-pads are individually formed in the surrounding non-active area at different locations adjacent to the edge of the active area, and the top of the spacing-pad is as high as the spacer in the active area. The color-filter substrate and the thin-film-transistor substrate are sealed.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a top view of a CF substrate having a forbidden area;

FIGS. 2( a) and 2(b) are cross-section views of the process for preparing photo spacers on the CF substrate;

FIG. 3 illustrates a panel showing the mura phenomenon after the CF substrate having a forbidden area is sealed with a TFT array substrate;

FIG. 4 is a top view of a CF substrate in a preferable embodiment of the present invention;

FIGS. 5( a) and 5(b) are cross-section views of the process for preparing photo spacers on the CF substrate of a preferable embodiment of the present invention;

FIG. 6 illustrates that a panel assembled by sealing a CF substrate with a TFT array substrate shows no mura phenomenon; and

FIG. 7 is a top view of the CF substrate of another preferable embodiment of the present invention.

Claims

1. A method for assembling a panel of a liquid crystal display device, comprising the following steps: a) providing a thin-film-transistor substrate and a color-filter substrate, wherein the color filter substrate comprises a non-active area, and an active area having plural spacers formed in the active area of the color-filter substrate, at least two spacing-pads are individually formed in two opposite regions close to an edge of the active area and in a corresponding periphery of the non-active area adjacent to the edge of the active area, and the height of the spacing-pad is as same as those of the spacers in the active area; andb) sealing the color-filter substrate and the thin-film-transistor substrate.

2. The method of claim 1, wherein the materials of the spacers and spacing-pads are photoresist.

3. The method of claim 1, wherein the color-filter substrate is formed by a photolithographic process.

4. The method of claim 3, wherein the photolithographic process is performed with a mask having a pattern of photo spacers and spacing-pads.

5. The method of claim 1, wherein the thickness of the spacers and that of the spacing-pads is different.

6. The method of claim 1, wherein the spacing-pads are formed at two sites opposite to each other on the edge of the non-active area.

7. The method of claim 1, wherein the shape of the spacing-pads is in a shape of a rectangle, a circle or a U-shape.

8. The method of claim 1, further comprising a step (c) after step (b), of depositing a liquid crystal in the panel.

9. The method of claim 1, wherein the color-filter substrate further comprises a plurality of pixel units and at least one electrode structure.

10. The method of claim 1, wherein the thin-film-transistor substrate comprises a transparent electrode.

11. A method for preparing a color filter substrate having spacing-pads, the steps comprising: (a) providing a color-filter substrate having an active area and a non-active area; and(b) forming plural spacers in the active area, and forming at least two spacing-pads individually in the surrounding non-active area; wherein the at least two spacing-pads are individually formed in two opposite regions close to an edge of the active area and in a corresponding periphery of the non-active area adjacent to the edge of the active area, and the height of the spacing-pads is as same as those of the spacers in the active area.

12. The method of claim 11, wherein the wherein the materials of the spacers and spacing-pads are photoresist.

13. The method of claim 11, wherein the spacers and spacing-pads are formed by a photolithographic process.

14. The method of claim 13, wherein the photolithographic process is performed in conjunction with a mask having a pattern of photo spacers and spacing-pads.

15. The method of claim 11, wherein the thickness of the spacers and that of the spacing-pads is different.

16. The method of claim 11, wherein the spacing-pads are formed at two sites opposite to each other on the edge of the non-active area.

17. The method of claim 11, wherein the spacing-pads are in a shape of a rectangle, a circle, or U.

18. A color-filter substrate having spacing-pads, comprising: an active area having a plurality of photo-spacers; anda non-active area having at least two spacing-pads; wherein the at least two spacing-pads are individually formed in two opposite regions close to an edge of the active area and in a corresponding periphery of the non-active area adjacent to the edge of the active area, and the height of the spacing-pads is as same as those of the spacers in the active area.

19. The color-filter substrate of claim 18, wherein the materials of the spacers and spacing-pads are photoresist.

20. The color-filter substrate of claim 18, wherein the thickness of the spacers and that of the spacing-pads is different.

21. The color filter substrate of claim 18, wherein the spacing-pad are formed at two sites opposite to each other on an edge of the non-active area.

22. The color filter substrate of claim 18, wherein the spacing-pads are in a shape of a rectangle, a circle, or U.