Patent Application
20180030612
The present invention relates to a method for continuous electrolytic etching of a grain oriented electrical steel strip and an apparatus for continuous electrolytic etching of a grain oriented electrical steel strip.
A technology has conventionally been disclosed which improves the properties of a grain oriented electrical steel strip (hereinafter simply referred to as “steel strip” as appropriate) by printing an etch resist on a surface of the steel strip with an electrically insulating ink, and subsequently forming an etch pattern by an electrolytic etching process on the surface of the steel strip where the etch resist has been printed (refer to Patent Literature 1). An electrolytic etching process that is excellent in the stability of an etched state of a product has been requested to industrially perform such a technology for improving the properties of a steel strip using such an electrolytic etching process.
Patent Literature 2 proposes a method for obtaining the capability of uniform etching in a width direction of a steel strip by covering both sides of the steel strip and restraining the flow of an electrolyte in the width direction of the steel strip to obtain a uniform cross-sectional shape of a groove in the width direction.
Patent Literature 1: Japanese Examined Patent Application Publication No. H8-6140
Patent Literature 2: Japanese Patent Application Laid-open Patent Publication No. H10-204698
There is still room for improvement in increasing the stability of an etched state. If, for example, the width of an electrode is too large as compared to the width of a steel strip, the amount of electrolytic etching at an edge of the steel strip becomes larger than the amount of electrolytic etching at any other portions such as the center of the steel strip due to a current flowing from a portion of the electrode, the portion protruding outward of the steel strip. Accordingly, there arise problems such as the deepening of and the widening of a groove at the edge of the steel strip and the impossibility of obtaining a widthwise uniform shape of the groove.
An object of the present invention is to provide a method for continuous electrolytic etching of a grain oriented electrical steel strip and an apparatus for continuous electrolytic etching of a grain oriented electrical steel strip, which can restrain variations in the shapes of etched grooves along a width direction of a steel strip.
A method for continuous electrolytic etching of a grain oriented electrical steel strip according to the present invention includes a mask formation step of forming an etch mask on a surface of a grain oriented electrical steel strip cold-rolled to final thickness with a linear exposed portion exposed from the etch mask; a centering step of centering the grain oriented electrical steel strip with a position sensor and a centering apparatus, which are placed immediately upstream of an electrolytic etching apparatus; and a groove formation step of performing an electrolytic etching process in which electrolytic etching is performed in the electrolytic etching apparatus to form a linear groove on the surface of the grain oriented electrical steel strip by passing electric current between a conductor roll and an electrode placed in an electrolytic bath while the grain oriented electrical steel strip is brought into contact with the conductor roll, the grain oriented electrical steel strip is immersed in the electrolytic bath and the grain oriented electrical steel strip is facing the electrode.
Moreover, in the above-described method for continuous electrolytic etching of a grain oriented electrical steel strip according to the present invention, the groove formation step includes performing the electrolytic etching process using the electrode whose width is within ±10 mm of a steel strip width of the arain oriented electrical steel strip.
Moreover, in the above-described method for continuous electrolytic etching of a grain oriented electrical steel strip according to the present invention, the groove formation step includes performing the electrolytic etching process using the electrode whose side surface in the width direction is covered with an insulating material.
An apparatus for continuous electrolytic etching of a grain oriented electrical steel strip according to the present invention includes a mask-forming apparatus configured to form an etch mask on a surface of a grain oriented electrical steel strip cold-rolled to final thickness with a linear exposed portion being exposed from the etch mask; an electrolytic etching apparatus including an electrolytic bath, an electrode placed in the electrolytic bath, and a conductor roll, the electrolytic etching apparatus performing an electrolytic etching process in which electrolytic etching is performed to form a linear groove on the surface of the grain oriented electrical steel strip by passing electric current between the conductor roll and the electrode while the grain oriented, electrical steel strip is brought into contact with the conductor roll, the grain oriented electrical steel strip is immersed in the electrolytic bath, and the grain oriented electrical steel strip is facing the electrode; a position sensor, placed immediately upstream of the electrolytic etching apparatus, to detect a position of the grain oriented electrical steel strip in a width direction; and a centering apparatus, placed immediately upstream of the electrolytic etching apparatus, to center the grain oriented electrical steel strip on the basis of a detection result of the position sensor.
A method for continuous electrolytic etching of a grain oriented electrical steel strip and an apparatus for continuous electrolytic etching of a grain oriented electrical steel strip according to the present invention can suppress variations in the shapes of etched grooves in a width direction of a steel strip.
A method for continuous electrolytic etching of a grain oriented electrical steel strip and an apparatus for continuous electrolytic etching of a grain oriented electrical steel strip according to an embodiment of the present invention are described in detail hereinafter with reference to the drawings. The invention is not limited by the embodiment. Moreover, components in the following embodiment include those that are easily conceivable by a person skilled in the art, or substantially the same ones.
The embodiment is described with reference to
As illustrated in
(Mask Formation Step)
The mask formation step is the step of forming an etch mask 1a on a surface 11 of a grain oriented electrical steel strip 1 cold-rolled to final thickness with linear exposed portions 1b being exposed from the etch mask 1a (refer to
(Centering Step)
The centering step is the step of centering the grain oriented electrical steel strip 1 with the position sensor 9 and the centering apparatus 8, which are placed immediately upstream of the electrolytic etching apparatus 4. The centering step restrains a displacement of the grain oriented electrical steel strip 1 from a line center. Consequently, variations in current densities in the electrolytic etching process are restrained; accordingly, linear grooves of a uniform shape are formed.
(Groove Formation Step)
The groove formation step is the step of performing the electrolytic etching process in which electrolytic etching is performed in the electrolytic etching apparatus 4 to form the linear grooves on the surface 11 of the grain oriented electrical steel strip 1 by passing electric current between conductor rolls 43a and 43b and an electrode 42 placed in an electrolytic bath 46 while the grain oriented electrical steel strip 1 is brought into contact with the conductor rolls 43a and 43b, the grain oriented electrical steel strip 1 is immersed in the electrolytic bath 46 and the grain oriented electrical steel strip 1 is facing the electrode 42.
The etch mask 1a is removed by the etch-resist-removing apparatus 5 from the surface 11 of the grain oriented electrical steel strip 1 on which the linear grooves have been introduced. The grain oriented electrical steel strip 1 is then cleaned in the water rinse tank 6 and the rinse tank 7. The method for continuous electrolytic etching of a grain oriented electrical steel strip and the apparatus 100 for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment are described in detail below.
The grain oriented electrical steel strip 1 cold-rolled to the final thickness is carried by transport devices such as transport rolls sequentially to the etch-resist-coating apparatus 2, the drying-and-baking apparatus 3, the electrolytic etching apparatus 4, the etch-resist removing apparatus 5, the water rinse tank 6, and the rinse tank 7 in. this order. The etch-resist-coating apparatus 2 coats the surface 11 of the grain oriented electrical steel strip 1 with an etch resist. The etch-resist-coating apparatus 2 of the embodiment coats the surface 11 of the grain oriented electrical steel strip 1, except the linear exposed portions 1b, with the etch resist by gravure offset printing.
Returning to
The drying-and-baking apparatus 3 dries and bakes the etch resist ink applied to the surface 11 of the grain oriented electrical steel strip 1. Consequently, the etch mask 1a is formed on the surface 11 of the grain oriented electrical steel strip 1, with the linear exposed portions 1b being exposed from the etch mask 1a.
As illustrated in
The electrolytic etching apparatus 4 includes an electrolytic etching cell 41, the electrode 42, the conductor rolls 43a and 43b, backup rolls 44a and 44b, sink rolls 45a and 45b, the electrolytic bath 46, and a power supply 47. The electrolytic etching apparatus 4 immerses a part of the grain oriented electrical steel strip 1 in the electrolytic bath 46 by the sink rolls 45a and 45b in a state where the conductor rolls 43a and 43b are in contact with the grain oriented electrical steel strip 1 and makes the grain oriented electrical steel strip 1 face the electrode 42 between the sink rolls 45a and 45b. The electrolytic etching apparatus 4 passes electric current between the conductor rolls 43a and 43b and the electrode 42 and forms the linear grooves by the electrolytic etching process in the surface 11 of the grain oriented electrical steel strip 1.
The electrolytic bath 46 is stored in the electrolytic etching cell 41. The electrolytic bath 46 is an electrolyte such as a NaCl solution or KCl solution. The electrode 42 is placed in the electrolytic bath 46. The conductor rolls 43a and 43b and the backup rolls 44a and 44b are placed above a liquid level of the electrolytic bath 46 in the electrolytic etching cell 41. The inlet-side conductor roll 43a and the inlet-side backup roll 44a are placed on an inlet side in the electrolytic etching cell 41. The outlet-side conductor roll 43b and the outlet-side backup roll 44b are placed on an cutlet side in the electrolytic etching cell 41. The conductor rolls 43a and 43b are anodes that come into contact with the grain oriented electrical steel strip 1. The grain oriented electrical steel strip 1 is sandwiched between the inlet-side conductor roll 43a and the inlet-side backup roll 44a to maintain the state where the grain oriented electrical steel strip 1 and the inlet-side conductor roll 43a are in contact with each other. Moreover, the grain oriented electrical steel strip 1 is sandwiched between the outlet-side conductor roll 43b and the outlet-side backup roll 44b to maintain the contact state of the grain oriented electrical steel strip 1 and the outlet-side conductor roll 43b.
The sink rolls 45a and 451 are immersed in the electrolytic bath 46 to immerse the grain oriented electrical steel strip 1 in the electrolytic bath 46. In the electrolytic etching cell 41, the inlet-side sink roll 45a is placed on the inlet side and the outlet-side sink roll 45b on the outlet side. The grain oriented electrical steel strip 1 is carried in the electrolytic etching cell 41 in a state of being wound around the inlet-side backup roll 44a, the inlet-side sink roll 45a, the outlet-side sink roll 45b, and the outlet backup roll 44b. The grain oriented electrical steel strip 1 to be carried enters the electrolytic bath 46 between the inlet-side backup roll 44a and the inlet-side sink roll 45a, passes below the sink rolls 45a and 45b, and goes out of the electrolytic bath 46 between the outlet-side sink roll 45b and the outlet-side backup roll 44b.
The electrode 42 is a cathode paired with the conductor rolls 43a and 43b. The electrode 42 is connected to a cathode side of the power supply 47, and the conductor rolls 43a and 43b are connected to an anode side of the power supply 47. In the electrolytic etching apparatus 4, a current circuit is configured including the power supply 47, the conductor roll 43a, 43b, the grain oriented electrical steel strip 1, the electrolytic bath 46, and the electrode 42. The current density in the electrolytic etching process is preferably in a range of 1 to 100 [A/dm2]. If the current density is too low, a sufficient etching effect cannot be obtained. Moreover, if the current density is too high, the etch mask 1a is damaged.
As illustrated in
Moreover, in the electrolytic etching apparatus 4 of the embodiment, side surfaces 42a of the electrode 42 in the width direction are covered with an insulating material 48 as illustrated in
Examples are described. Table 1 illustrates test conditions and results of first to sixth examples and the comparative example. In the examples and the comparative example, the grain oriented electrical steel strip 1 is a steel strip with a thickness of 0.22 [mm] containing Si: 3.0 [mass %]. A steel strip width L1 after the final cold rolling is 1,000 [mm]. A resist ink containing epoxy-based resin as a main ingredient was used as the etch resist. The drying and baking temperature are 100 [° C.]. The thickness of an etch mask is 3 [μm].
After the etch-resist-coating apparatus 2 and the drying-and-baking apparatus 3 form the etch mask 1a on the surface 11 of the grain oriented electrical steel strip 1, the electrolytic etching apparatus 4 performs an electrolytic etching process on the grain oriented electrical steel strip 1 by direct electrification. The electrolytic bath 46 is a NaCl solution. Target values of a groove shape of the linear groove are the width: 150 [μm], the depth: 20 [μm], and the groove interval: 3 [mm].
After the electrolytic etching process is performed, the grain oriented electrical steel strip 1 passes through the etch-resist-removing apparatus 5, the water rinse tank 6, and the rinse tank 7 to remove the etch mask 1a from the surface 11. The groove depth of the linear groove was measured after the etch mask 1a was removed. Ten points to measure the groove depth are set at regular intervals from one end to the other end along the width direction of the grain oriented electrical steel strip 1. The average and variation of the groove depths were calculated from the measurement values of the 10 points.
The grain oriented electrical steel strip 1 from which the etch mask 1a is removed is decarburized and annealed. Final annealing is subsequently performed on the grain oriented electrical steel strip 1. A magnetic property (iron loss W17/50 [W/kg]) of the grain oriented electrical steel strip 1 obtained in this manner was measured. 10 points to measure the magnetic property are set at regular intervals from one end to the other end along the width direction of the grain oriented electrical steel strip 1. The average and variation of the iron loss W17/50 were calculated from the measurement values of the 10 points.
In all the first to sixth examples, centering control is performed by the centering apparatus 8. The examples are different in the size of the width L2 of the electrode 42 and the presence or absence of the insulating material 48 covering the side surfaces 42a of the electrode 42 in the width direction. As illustrated in table 1, the first example is as follows: centering control: done, the width L2 of the electrode 42: 1,010 [mm] (the width L1 of the grain oriented electrical steel strip 1+10 [mm]), and the insulating material 48: absent. The second example is different from the first example in that the width L2 of the electrode 42 is 1,000 [mm]. The example 3 is different from the first example in that the width L2 of the electrode 42 is 990 [mm] (the width L1 of the grain oriented electrical steel strip 1−10 [mm]). The fourth example is different from the first example in that the insulating material 48 is present. The fifth example is different from the first example in the respects that the width L2 of the electrode 42 is 1,000 [mm], and the insulating material 48 is present. The sixth example is different from the first example in the respects that the width L2 of the electrode 42 is 990 [mm], and the insulating material 48 is present. The comparative example is as follows: centering control: not done, the width L2 of the electrode 42: 1,010 [mm], and the insulating material 48: absent.
As illustrated in table 1, the average groove depth deviates by 0.14 [μm] from a target value (20 [μm]) in the comparative example. In contrast, in the first to sixth examples, a deviation of the average from the target value of the groove depth is 0.04 [μm] at the maximum. Moreover, the distribution width of the groove depth is ±0.5 [μm] in the comparative example while the distribution width of the groove depth is reduced to ±0.09 [μm] at the maximum in the examples.
See the iron loss W17/50. The average is 0.752 [W/kg] in the comparative example while the averages are 0.720 to 0.731 [W/kg] in the examples, which are good. Moreover, the variation in the iron loss W17/50 is ±0.020 [w/kg] in the comparative example while the maximum variation is ±0.009 [W/kg] in the examples, which is less than half the variation of the comparative example. Among the examples, the fifth example is the best in the accuracy of the groove depth and the value of the iron loss W17/50. In other words, variations in the shapes of the etched grooves along the width direction of the grain oriented electrical steel strip 1 are effectively restrained by the multiplier effect due to the agreement of the width L2 of the electrode 42 with the width L1 of the grain oriented electrical steel strip 1, and the side surfaces 42a of the electrode 42 covered with the insulating material 48 in addition to the centering control effect. Moreover, an good value of the iron loss W17/50 is obtained accordingly.
As described above, the method for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment includes the mask formation step, the centering step, and the groove formation step. In the centering step, the position sensor 9 and the centering apparatus 8, which are placed immediately upstream of the electrolytic etching apparatus 4, center the grain oriented electrical steel strip 1 to restrain the center line of the grain oriented electrical steel strip 1 from deviating in the width direction from the center line of the electrode 42. Consequently, the imbalance of the current density in the width direction of the grain oriented electrical steel strip 1 is restrained from occurring. Hence, the method for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment can restrain variations in the shapes of the etched grooves along the width direction of the grain oriented electrical steel strip 1.
The method for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment can provide a uniform shape of an etched groove in the width direction of the grain oriented electrical steel strip 1. Moreover, the current that does not contribute to the electrolytic etching process and the needless current for an unnecessary electrolytic etching process can be reduced; accordingly, the electrolysis efficiency can be increased. Moreover, interference caused by the meander in the electrolytic etching apparatus 4 can be prevented. The production occasion loss and the production yield loss due to a damage to an edge of the grain oriented electrical steel strip 1 can be reduced.
Moreover, the method for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment performs the electrolytic etching process in the groove formation step, using the electrode 42 whose width L2 is within ±10 mm of the width L1 of the grain oriented electrical steel strip 1. Consequently, the current density at the end of the grain oriented electrical steel strip 1 in the width direction is restrained from being different from the current density at the center. Hence, variations in the shapes of the etched grooves along the width direction of the grain oriented electrical steel strip 1 are restrained.
Moreover, the method for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment performs the electrolytic etching process in the groove formation step, using the electrode 42 whose side surfaces 42a in the width direction are covered with the insulating material 48. Consequently, the current is restricted in flowing between the grain oriented electrical steel strip 1 and the side surface 42a of the electrode 42. The current density at the end of the grain oriented electrical steel strip 1 in the width direction is restrained from becoming larger than the current density at the center. Hence, variations in the shapes of the etched grooves along the width direction of the grain oriented electrical steel strip 1 are restrained.
The apparatus 100 for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment includes the mask-forming apparatus (the etch-resist-coating apparatus 2 and the drying-and-baking apparatus 3), the electrolytic etching apparatus 4, the position sensor 9, and the centering apparatus 8. The centering apparatus 8 centers the grain oriented electrical steel strip 1 on the basis of a detection result of the position sensor 9. Accordingly, the center line of the grain oriented electrical steel strip 1 is restrained from deviating in the width direction from the center line of the electrode 42. Consequently, the imbalance of the current density in the width direction of the grain oriented electrical steel strip 1 is restrained from occurring. Hence, the apparatus 100 for continuous electrolytic etching of a grain oriented electrical steel strip of the embodiment can restrain variations in the shapes of the etched grooves along the width direction of the grain oriented electrical steel strip 1.
The etch-resist-coating apparatus 2, which coats the grain oriented electrical steel strip 1 with an etch resist, is not limited to the apparatus described above. The etch-resist-coating apparatus 2 can suitably use any method of gravure printing without an offset roll, flat offset printing, screen printing, and the like. Gravure offset printing is suitable since, for example, continuous printing for a coil is easily performed, a stable print surface can be obtained, and control over the thickness of a resist is easy.
The contents described in the above embodiments can be implemented in combination as appropriate.
The present invention can provide a method for continuous electrolytic etching of a grain oriented electrical steel strip and an apparatus for continuous electrolytic etching of a grain oriented electrical steel strip, which can restrain variations in the shapes of etched grooves along a width direction of a steel strip.
| Number | Date | Country | Kind |
|---|---|---|---|
| 2015-042745 | Mar 2015 | JP | national |
| Filing Document | Filing Date | Country | Kind |
|---|---|---|---|
| PCT/JP2016/053755 | 2/9/2016 | WO | 00 |
