A portion of the intermediate layer near the pole in the region(s) in which the shields are to be fabricated is removed, via step 18. Step 18 may include providing a mask that covers the main pole and etching the exposed intermediate layer. The side shields may then be provided, via step 20. Step 20 may include plating the magnetic materials, such as NiFe, for the shield.
After the side shields are provided, the trailing bevel is fabricated, via step 22. Step 22 may include providing a mask recessed from the air-bearing surface (ABS) and ion milling the portion of the transducer that has been fabricated. Thus, part of the main pole materials are removed at a nonzero angle from perpendicular to the ABS. In addition, a portion of the side shield material(s) are also removed.
A write gap or seed layer may be deposited, via step 24. This step is performed after the trailing bevel has been provided in step 22. Thus, a nonmagnetic layer is provided on the top (trailing bevel) surface of the main pole. A trailing shield is then provided, via step 26. Step 26 may include depositing the material(s) for the trailing shield. Thus, a wraparound shield including the side and trailing shields may be formed.
The main pole 60 resides on an underlayer 52 and includes sidewalls. The underlayer 52 may include a leading shield. The sidewalls of the conventional main pole 60 form an angle with the down track direction at the ABS and may form a different angle with the down track direction at the distance recessed from the ABS. The width of the main pole 60 may also change in a direction recessed from the ABS.
The side shields 70 are separated from the main pole 60 by a side gap 54. The side shields 70 extend a distance back from the ABS. As can be seen in
Although the conventional magnetic recording head 50 functions, there are drawbacks. In particular, the conventional magnetic recording head 50 may suffer from defects due to the seam between the trailing shield 90 and the side shields 70. For example, reliability and adjacent track interference may be adversely affected. Accordingly, what is needed is a system and method for improving the performance of a magnetic recording head.
A main pole including a trailing bevel is provided, via step 102. Step 102 includes forming a trench in the intermediate layer. The location and profile of the trench corresponds to the main pole. A seed layer, such as Ru, may be deposited in at least the trench. The seed layer may be nonmagnetic and may form at least part of a side gap for the transducer. The material(s) for the main pole may then be provided. For example, high saturation magnetization magnetic materials may be electroplated. The main pole material(s) may be planarized. The trailing bevel is then formed at the top of the main pole. For example, a portion of the top of the main pole recessed from the ABS may be covered by a mask. The main pole may then be ion milled at a nonzero angle from perpendicular to the ABS. A portion of the intermediate layer around the main pole may also be ion milled in this process.
After formation of the main pole, at least including the trailing bevel, the side shield(s) are provided, via step 104. In some embodiments, step 104 may include removing the intermediate layer adjacent to the main pole in the regions in which the side shield(s) are to be fabricated. For example, a gap layer may be provided on the main pole and a mask provided on the gap layer. The desired portion of the intermediate layer may then be removed, for example via a wet etch. A seed layer for the shield(s) may be deposited and the magnetic materials, such as NiFe, may be electroplated or otherwise deposited. Thus, a wraparound shield may be formed. In other embodiments, the trailing portion of the shield material(s) may be removed. Thus, side shields only can also be fabricated.
Using the method 100, a magnetic transducer having improved performance may be fabricated. The transition between the side shield and trailing shield may be interface-free. Thus, performance of the shield(s) may be improved. Further, fabrication of the transducer may be simplified.
The disk drive 200 includes media 202, a slider 210 and a write transducer 220. Additional and/or different components may be included in the disk drive 200. Although not shown, the slider 210 and thus the transducer 220 are generally attached to a suspension (not shown). The transducer 220 is fabricated on the slider 210 and includes an air-bearing surface (ABS) proximate to the media 202 during use. In general, the disk drive 200 includes a write transducer 220 and a read transducer (not shown). However, for clarity, only the write transducer 220 is shown. The transducer 220 includes a main pole 230, coils 222, shields 240, side gap 224 and top gap 226. In other embodiments, different and/or additional components may be used in the write transducer 220.
The coil(s) 222 are used to energize the main pole 230. Two turns 222 are depicted in
The main pole 230 includes a pole tip region 232 close to the ABS and a yoke region 234 recessed from the ABS. The pole tip region 232 is shown as having top and bottom bevels 231 and 233, respectively, near the ABS. The sidewalls and form sidewall angles with the down track direction.
Also shown are side gaps 224 and top gap 226 that separate the main pole 230 from the shield 240. As can best be seen in
The magnetic disk drive 200 may exhibit improved performance. The shield 240 does not include an interface between the trailing portion 244 and the side shields 242. Thus, the shield 240 is less prone to defects that adversely affect performance and reliability. For example, issues such as adjacent track interference may be mitigated. In addition, fabrication of the transducer 200 may be simplified. As a result, yield for the method 100 that is used to fabricate the transducer 200 may be improved.
Referring to
The trailing bevel 233 is provided in the main pole, via step 116. Step 116 may include milling the pole tip region of the main pole while the yoke region is covered by a mask. Thus, the top surface of the main pole is at an acute angle from the direction perpendicular to the ABS.
The top gap 226 is provided, via step 118. In some embodiments, step 118 includes providing the write gap only. In such embodiments, the side gap is formed by the seed layer provided for the main pole. Thus, a nonmagnetic layer is provided on the top/trailing (e.g. beveled) surface 233 of at least the pole tip portion 232 of the main pole 230. In such embodiments, the thickness of the side gap may be tailored separately from the seed layer/write gap 226. In other embodiments, the top/trailing gap 226 and at least part of the side gap 224 are provided in step 118. The side gap 224 may have a conformal portion and a nonconformal portion. The conformal portion of the side gap is at least in the pole tip region.
The portion of the intermediate layer in at least the region in which the side shields are to be formed is removed, via step 120. Step 120 occurs after step 116. Thus, the trailing bevel is formed before the removal of the intermediate layer in step 210. In some embodiments, step 120 includes performing a wet etch. Thus, the seed layer provided in step 114 may be a stop layer for the wet etch.
The wraparound shield 230 is provided, via step 122. Step 122 thus includes providing magnetic material(s) for the side shield and trailing shield portions of the wraparound shield.
Using the method 110, a pole, side gap, and wraparound shield having the desired configuration may be provided for the transducer. More specifically, the wraparound shield may have no interface between the side shield and trailing shield portions. Reliability may be improved without significantly complicating fabrication and at relatively modest cost.
The intermediate layer(s) in which the pole is to be formed are provided, via step 152. Step 152 may include depositing multiple materials in different regions of the transducer. In other embodiments, a single layer may be provided. Step 152 may be carried out by providing aluminum oxide and/or silicon oxide layer(s).
A mask having an aperture corresponding to the trench is provided, via step 154. Step 154 may include multiple substeps. For example, hard mask layer(s) may be provided. A mask including line corresponding to the pole tip may be provided on an intermediate layer, on the hard mask layer(s). The line mask may be a photoresist mask. Hard mask layer(s) may be provided on the line mask and the line mask removed. The hard mask layer may thus have an aperture therein. The aperture corresponds to the location and shape of a trench desired to be formed in the intermediate layer for the pole.
The trench is then formed in the intermediate layer, via step 156. Step 156 may be using an aluminum oxide RIE. For example, an aluminum oxide RIE may be used for an aluminum oxide intermediate layer.
A seed layer that is resistant to an etch of the intermediate layer is deposited in the trench, via step 158. For example, step 158 may include depositing a Ru seed layer via chemical vapor deposition.
Materials for the pole are deposited, via step 160. Step 160 may include plating high saturation magnetization materials.
Excess pole materials may also be removed in step 162. For example, a chemical mechanical planarization (CMP) may be used to remove pole materials outside of the trench. In addition, an ion mill may be used to remove the portion of the seed layer 264 outside of the trench.
A trailing bevel is formed in the main pole 270′, via step 164. Step 164 may include providing a nonmagnetic layer on part of the main pole 270′ recessed from the ABS. An ion mill is carried out at a nonzero angle from the normal to the top (trailing) surface of the main pole.
After the trailing bevel has been formed in step 164, the top gap layer is provided, via step 166. Step 166 typically includes full film depositing a not least one nonmagnetic gap layer, such as Ru. In addition, a high moment seed layer for the shield may be full film deposited. This seed layer may be magnetic. The gap and seed layers may then be patterned. The portion of the gap layer on the pole 270″ is covered by a mask. The exposed portion(s) of the gap/seed layers may then be removed.
A portion of the intermediate layer 254″ outside of the trench may be removed, via step 168. Step 168 is performed after the bevel has been fabricated in step 164. This portion of the intermediate layer 254″ that has been removed corresponds to the location of the side shield(s) to be formed. For example, a mask having an aperture over these regions may be provided and a wet etch appropriate for this portion of the intermediate layer 254″ removed.
The side gap may optionally be configured to have conformal and nonconformal portions, via step 170. In some embodiments, this may include refilling a portion of the trench not filed with pole material(s) 270″ with nonmagnetic material(s). However, in other embodiments, step 170 may be skipped.
The shields are provided, via step 172. Step 172 may include depositing a high permeability material, such as NiFe, while the mask 282 is in place. This may include plating such a material. The mask 282 may then be removed.
Using the method 150, the magnetic transducer 250 may be provided. Thus, benefits analogous to those of the magnetic transducer 220 may be achieved. For example, reduced adjacent track interference and improved reliability may be attained for the transducer 250. This may be achieved while simplifying fabrication and at a reduced cost.
This application claims priority to provisional U.S. Patent Application Ser. No. 61/946,583 (Atty. Docket No. F6892.P), filed on Feb. 28, 2014, which is hereby incorporated by reference in its entirety.
Number | Date | Country | |
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61946583 | Feb 2014 | US |