Method for fabricating magnetic head

Abstract

The method for fabricating the magnetic head comprises the step of forming over a lower electrode a magnetoresistive effect film 16 with a polishing resistant film 20 formed over the upper surface, the step of forming a magnetic domain control film 24 over the entire surface of the lower electrode 12 including a region where the magnetoresistive effect film 16 has been formed, the step of selectively removing the magnetic domain control film 24 over the magnetoresistive effect film 16 by polishing with the polishing resistant film 20 as the stopper, the step of removing the polishing resistant film 20, and the step of forming an upper electrode 34 over the magnetoresistive effect film 16, from which the polishing resistant film 20 has been removed.

Description

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a front view of the magnetic head according to a first embodiment of the present invention.

FIGS. 2A-2D, 3A-3C and 4A-4D are sectional views of the magnetic head according to the first embodiment of the present invention in the steps of the method for fabricating the same.

FIG. 5 is a diagrammatic plan view of the magnetic recording device according to a second embodiment of the present invention.

FIG. 6 is a front view of the magnetic head of the magnetic recording device according to the second embodiment of the present invention.

Claims

1. A method for fabricating a magnetic head comprising the steps of: forming over a lower electrode a magnetoresistive effect film with a first polishing resistant film formed over an upper surface, the first polishing resistant film having a polishing selectivity to a magnetic material;forming a magnetic domain control film over an entire surface of the lower electrode including a region where the magnetoresistive effect film has been formed;selectively removing the magnetic domain control film over the magnetoresistive effect film by polishing with the first polishing resistant film as a stopper;removing the first polishing resistant film; andforming an upper electrode over the magnetoresistive effect film from which the first polishing resistant film has been removed.

2. A method for fabricating a magnetic head according to claim 1, further comprising, after the step of forming the magnetic domain control film, the step of forming a second polishing resistant film having a polishing selectivity to a magnetic material over the magnetic domain control film, whereinin the step of polishing the magnetic domain control film, the magnetic domain control film is polished with the first polishing resistant film and the second polishing resistant film as a stopper, andin the step of removing the first polishing resistant film, the first polishing resistant film and the second polishing resistant film are removed.

3. A method for fabricating a magnetic head according to claim 2, wherein in the step of forming the second polishing resistant film, a film thickness of the second polishing resistant film is so set that a height of a surface of the second polishing resistant film is equal to a height of a surface of the first polishing resistant film formed over the magnetoresistive effect film.

4. A method for fabricating a magnetic head according to claim 2, wherein the second polishing resistant film is formed selectively in an element forming region.

5. A method for fabricating a magnetic head according to claim 1, wherein the step of forming the magnetoresistive effect film includes the steps of: forming over the lower electrode an etching resistant film having an etching selectivity to the magnetoresistive effect film;forming the magnetoresistive effect film over the etching resistant film;forming the first polishing resistant film over the magnetoresistive effect film; andetching the first polishing resistant film and the magnetoresistive effect film with the etching resistant film as a stopper.

6. A method for fabricating a magnetic head according to claim 5, wherein in the step of etching the first polishing resistant film and the magnetoresistive effect film, the first polishing resistant film and the magnetoresistive effect film are etched by using a single-layer photoresist.

7. A method for fabricating a magnetic head according to claim 5, wherein in the step of etching the first polishing resistant film and the magnetoresistive effect film, the fist polishing resistant film and the magnetoresistive effect film are etched by reactive ion etching.

8. A method for fabricating a magnetic head according to claim 1, wherein in the step of removing the first polishing resistant film, the first polishing resistant film is removed by reactive ion etching.

9. A method for fabricating a magnetic head according to claim 1, wherein in the step of forming the magnetoresistive effect film, the magnetoresistive effect film with a cap layer of a non-magnetic material formed over the upper surface is formed.

10. A method for fabricating a magnetic head according to claim 1, wherein in the step of forming the magnetic domain control film, the magnetic domain control film with a cap layer of a non-magnetic material formed over an upper surface is formed.

11. A method for fabricating a magnetic head according to claim 1, wherein in the step of forming the magnetic domain control film, the magnetic domain control film is formed after an insulating film is formed over the entire surface of the lower electrode including the region where the magnetoresistive effect film has been formed.