Claims
- 1. A method of forming a platinum deposit on a nonconductive substrate, comprising the steps of:
- hydrophobically treating a carbon black powder;
- forming chloroplatinic acid;
- suspending said hydrophobically treated carbon black powder in said chloroplatinic acid;
- immersing said nonconductive substrate in said chloroplatinic acid;
- adding formaldehyde to said chloroplatinic acid;
- said hydrophobically treated carbon black powder catalyzing and driving the reduction of platinum within said chloroplatinic acid toward said nonconductive substrate; and
- reducing said chloroplatinic acid to form metallic platinum on said nonconductive substrate.
- 2. The method of forming a platinum deposit on a nonconductive substrate, as recited in claim 1, wherein said hydrophobic treatment step comprises treating said carbon black powder with a CF.sub.4 gas plasma.
- 3. The method of forming a platinum deposit on a nonconductive substrate, as recited in claim 2, wherein said nonconductive substrate includes at least one wettable surface.
- 4. The method of forming a platinum deposit on a nonconductive substrate, as recited in claim 3, wherein said nonconductive substrate is a glass substrate.
- 5. The method of forming a platinum deposit on a nonconductive substrate, as recited in claim 4, wherein said glass substrate is a glass slide.
- 6. The method of forming a platinum deposit on a nonconductive substrate, as recited in claim 3, wherein said nonconductive substrate is a silicon wafer.
- 7. The method of forming a platinum deposit on a nonconductive substrate, as recited in claim 1, wherein said hydrophobic treatment step comprises treating said carbon black powder with an ether gas plasma.
- 8. A method of forming a platinum deposit on a glass substrate, comprising the steps of:
- hydrophobically treating a carbon black powder with a CF.sub.4 gas plasma;
- forming chloroplatinic acid;
- suspending said hydrophobically treated carbon black powder in said chloroplatinic acid;
- immersing said glass substrate in said chloroplatinic acid;
- adding formaldehyde to said chloroplatinic acid;
- said hydrophobically carbon black powder catalyzing and driving the reduction of platinum within said chloroplatinic acid toward said glass substrate; and
- reducing said chloroplatinic acid to form metallic platinum on said glass substrate.
- 9. The method of forming a platinum deposit on a glass substrate, as recited in claim 8, wherein said glass substrate is a glass slide.
- 10. The method of forming a platinum deposit on a glass substrate, as recited in claim 8, wherein said hydrophobic treatment step comprises treating said carbon black powder with an ether gas plasma.
GOVERNMENT INTEREST
The invention described herein may be manufactured, used and licensed by or for the Government of the United States of America without the payment to us of any royalties thereon.
US Referenced Citations (6)