Claims
- 1. A method for forming a ceramic layer on a component by electron beam physical vapor deposition, the method comprising the steps of:forming an alumina scale forming bond coat on a surface of the component; forming an alumina scale from a surface of the bond coat; and then depositing a ceramic material directly on the alumina scale by evaporating a ceramic material with an electron beam while the component is within a coating chamber at an absolute pressure of greater than 0.010 mbar and having an average oxygen partial pressure of greater than 50% of the absolute pressure, the ceramic material being evaporated with the electron beam to produce a vapor of the ceramic material, the vapor depositing on the alumina scale to form a layer of the ceramic material.
- 2. A method as recited in claim 1, wherein the partial pressure of oxygen within the coating chamber is at least 0.012 mbar.
- 3. A method as recited in claim 1, wherein the partial pressure of oxygen within the coating chamber is about 100% of the absolute pressure.
- 4. A method as recited in claim 1, further comprising the step of flowing oxygen and at least a second gas into the coating chamber during the evaporating step to maintain the absolute pressure of greater than 0.010 mbar and the average oxygen partial pressure of greater than 50% of the absolute pressure.
- 5. A method as recited in claim 1, further comprising the step of flowing only oxygen into the coating chamber during the evaporating step.
- 6. A method as recited in claim 1, wherein the layer of the ceramic material has a relative density of less than 76% of theoretical immediately following deposition on the surface of the component.
- 7. A method as recited in claim 1, wherein the ceramic material is yttria-stabilized zirconia.
- 8. A method as recited in claim 1, wherein the component is an airfoil.
- 9. A method for forming a ceramic layer on a component by electron beam physical vapor deposition, the method comprising the steps of:forming a bond coat on a surface of the component; forming an alumina scale on a surface of the bond coat; and then depositing a ceramic material directly on the alumina scale by evaporating a ceramic material with an electron beam while the component is within a coating chamber at an absolute pressure of greater than 0.010 mbar and having an average oxygen partial pressure of greater than 50% of the absolute pressure, the ceramic material being evaporated with the electron beam to produce a vapor of the ceramic material, the vapor depositing on the alumina scale to form a layer of the ceramic material; wherein the ceramic material is zirconia stabilized by about 7 weight percent yttria, and the layer of the ceramic material has a density of less than 4.6 g/cm3 immediately following deposition on the surface of the component.
Parent Case Info
This application claims benefit to U.S. provisional application Ser. No. 60/147,165, filed Aug. 4, 1999.
US Referenced Citations (10)
Non-Patent Literature Citations (2)
Entry |
Kreutz, E.W., et al.—A Comparative Study of ZrO2 Film Deposition by Electron and Laser Radiation—Jun. 14, 1993 (pp. 475-487) 5th International Conference on Welding & Melting by electron & laser beam in French & English. |
Hass, D.D., et al.—Electron beam directed vapor deposition of thermal barrier coatings—Nov. 1998 (pp. 3396-3401) J. Vac. Sci Technol. A16(6). |
Provisional Applications (1)
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Number |
Date |
Country |
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60/147165 |
Aug 1999 |
US |