Claims
- 1. A method of forming a laminate structure useful for forming a food package for a microwave oven, which comprises:
- forming a first laminate comprising a layer of material defining a grid having an electroconductive surface surrounding transmissive apertures adhered to a polymeric film layer,
- directly depositing a thin layer of electroconductive material over said grid layer to adhere to said electroconductive surface and to said polymeric film layer in said apertures, said thin electroconductive material layer having a thickness sufficient to convert a portion of incident microwave energy to thermal energy, and
- adhering said thin electroconductive material layer to a substrate layer of microwave transparent material.
- 2. The method of claim 1 wherein said first laminate is formed by:
- laminating a layer of electroconductive material to said polymeric film layer, and
- effecting selective demetallization of said electroconductive material layer to form said grid.
- 3. The method of claim 2 wherein said selective demetallization is effected by:
- applying a pattern of etchant-resistant material to said electroconductive material layer in the pattern of said electroconductive surface in said grid, and
- applying an etchant for said electroconductive material to said electroconductive material layer to remove said electroconductive material from locations not bearing said etchant-resistant material, thereby forming said transmissive aperture.
- 4. The method of claim 3 wherein said thin layer of electroconductive material is applied by vapor deposition.
- 5. A method of forming a laminate structure useful for forming a food package for a microwave oven, which comprises:
- forming a first laminate comprising a layer of material defining a grid having an electroconductive surface surrounding transmissive apertures adhered to a thin layer of electroconductive material supported on a polymeric film layer, said thin electroconductive material layer having a thickness sufficient to convert a portion of incident microwave energy to thermal energy, and
- adhering said grid layer to a substrate layer of microwave transparent material.
- 6. The method of claim 5 wherein said first laminate is formed by:
- laminating a layer of electroconductive material to said thin layer of electroconductive material, and
- effecting selective demetallization of said electroconductive material layer to form said grid.
- 7. The method of claim 6 wherein said selective demetallization is effected by:
- applying a pattern of etchant-resistant material to said electroconductive material layer in the pattern of said electroconductive surface in said grid, and
- applying an etchant for said electroconductive material to said electroconductive material layer to remove said electroconductive material from locations not bearing said etchant-resistant material, thereby forming said transmissive apertures.
- 8. The method of claim 1 including applying a layer of etchant-resistant material to said thin layer of electroconductive material prior to laminating said layer of electroconductive material thereto.
Parent Case Info
This is a division of application Ser. No. 656,736 filed Feb. 19, 1991.
US Referenced Citations (4)
Divisions (1)
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Number |
Date |
Country |
Parent |
656736 |
Feb 1991 |
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